KR20170069914A - 감광성 수지 조성물, 그로부터 형성된 경화막, 및 경화막을 갖는 소자 - Google Patents

감광성 수지 조성물, 그로부터 형성된 경화막, 및 경화막을 갖는 소자 Download PDF

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Publication number
KR20170069914A
KR20170069914A KR1020160146020A KR20160146020A KR20170069914A KR 20170069914 A KR20170069914 A KR 20170069914A KR 1020160146020 A KR1020160146020 A KR 1020160146020A KR 20160146020 A KR20160146020 A KR 20160146020A KR 20170069914 A KR20170069914 A KR 20170069914A
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KR
South Korea
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substituted
unsubstituted
group
formula
compound
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KR1020160146020A
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English (en)
Korean (ko)
Inventor
김태수
김우한
백윤희
백택진
신동주
유홍정
Original Assignee
삼성에스디아이 주식회사
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Publication of KR20170069914A publication Critical patent/KR20170069914A/ko

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Materials For Photolithography (AREA)
KR1020160146020A 2015-12-11 2016-11-03 감광성 수지 조성물, 그로부터 형성된 경화막, 및 경화막을 갖는 소자 KR20170069914A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR20150176750 2015-12-11
KR1020150176750 2015-12-11

Publications (1)

Publication Number Publication Date
KR20170069914A true KR20170069914A (ko) 2017-06-21

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ID=59014349

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020160146020A KR20170069914A (ko) 2015-12-11 2016-11-03 감광성 수지 조성물, 그로부터 형성된 경화막, 및 경화막을 갖는 소자

Country Status (2)

Country Link
KR (1) KR20170069914A (fr)
WO (1) WO2017099365A1 (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110967927A (zh) * 2018-09-28 2020-04-07 三星显示有限公司 光敏树脂组合物和包括其的显示装置

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2021192802A1 (fr) * 2020-03-26 2021-09-30 富士フイルム株式会社 Procédé de production de composition de résine sensible au rayonnement et procédé de formation de motif

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11133592A (ja) * 1997-10-31 1999-05-21 Konica Corp 画像形成材料
TWI267703B (en) * 2003-10-07 2006-12-01 Hitachi Chemical Co Ltd Radiation-curing resin composition and preservation method thereof, forming method of curing film, forming method and operating method of pattern, electronic device and optical wave guide
US20070196773A1 (en) * 2006-02-22 2007-08-23 Weigel Scott J Top coat for lithography processes
JP5062352B2 (ja) * 2010-09-09 2012-10-31 Ｊｓｒ株式会社 レジストパターン形成方法
JP5853844B2 (ja) * 2011-05-20 2016-02-09 信越化学工業株式会社 マイクロ構造体の製造方法及び光パターン形成性犠牲膜形成用組成物

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110967927A (zh) * 2018-09-28 2020-04-07 三星显示有限公司 光敏树脂组合物和包括其的显示装置
TWI839391B (zh) * 2018-09-28 2024-04-21 南韓商三星顯示器有限公司 光敏樹脂組成物及包含其的顯示裝置

Also Published As

Publication number Publication date
WO2017099365A1 (fr) 2017-06-15

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