KR20160144385A - 노광 장치용 반사경 유닛 및 노광 장치 - Google Patents

노광 장치용 반사경 유닛 및 노광 장치 Download PDF

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Publication number
KR20160144385A
KR20160144385A KR1020167028553A KR20167028553A KR20160144385A KR 20160144385 A KR20160144385 A KR 20160144385A KR 1020167028553 A KR1020167028553 A KR 1020167028553A KR 20167028553 A KR20167028553 A KR 20167028553A KR 20160144385 A KR20160144385 A KR 20160144385A
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KR
South Korea
Prior art keywords
mask
mirror
holding plate
reflector
supporting
Prior art date
Application number
KR1020167028553A
Other languages
English (en)
Korean (ko)
Inventor
신이치로 하야시
Original Assignee
가부시키가이샤 브이 테크놀로지
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by 가부시키가이샤 브이 테크놀로지 filed Critical 가부시키가이샤 브이 테크놀로지
Publication of KR20160144385A publication Critical patent/KR20160144385A/ko

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Mounting And Adjusting Of Optical Elements (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020167028553A 2014-04-17 2015-04-17 노광 장치용 반사경 유닛 및 노광 장치 KR20160144385A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2014085770 2014-04-17
JPJP-P-2014-085770 2014-04-17
PCT/JP2015/061915 WO2015159989A1 (ja) 2014-04-17 2015-04-17 露光装置用反射鏡ユニット及び露光装置

Publications (1)

Publication Number Publication Date
KR20160144385A true KR20160144385A (ko) 2016-12-16

Family

ID=54324190

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020167028553A KR20160144385A (ko) 2014-04-17 2015-04-17 노광 장치용 반사경 유닛 및 노광 장치

Country Status (4)

Country Link
JP (1) JP6484853B2 (zh)
KR (1) KR20160144385A (zh)
CN (1) CN106687866B (zh)
WO (1) WO2015159989A1 (zh)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7017239B2 (ja) * 2018-06-25 2022-02-08 株式会社ブイ・テクノロジー 露光装置および高さ調整方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011028122A (ja) 2009-07-28 2011-02-10 Nsk Ltd 露光装置及び露光方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5684566A (en) * 1995-05-24 1997-11-04 Svg Lithography Systems, Inc. Illumination system and method employing a deformable mirror and diffractive optical elements
JPH10307202A (ja) * 1997-05-09 1998-11-17 Fujitsu General Ltd プロジェクタ用反射鏡及び光学歪み調整システム
JP2001042281A (ja) * 1999-07-29 2001-02-16 Nittetsu Yahata Eng Kk ミラー装置
JP4565908B2 (ja) * 2004-06-25 2010-10-20 株式会社大日本科研 非球面コリメートミラーの調整方法
JP2008129099A (ja) * 2006-11-17 2008-06-05 Funai Electric Co Ltd デフォーマブルミラー
US20110027542A1 (en) * 2009-07-28 2011-02-03 Nsk Ltd. Exposure apparatus and exposure method
JP5481400B2 (ja) * 2010-01-15 2014-04-23 株式会社日立ハイテクノロジーズ マイクロミラーデバイスの選別方法、マイクロミラーデバイス選別装置およびマスクレス露光装置
JP5456620B2 (ja) * 2010-08-30 2014-04-02 株式会社日立ハイテクノロジーズ プロキシミティ露光装置、プロキシミティ露光装置の露光光照射方法、及び表示用パネル基板の製造方法
DE102012223034A1 (de) * 2012-12-13 2013-12-12 Carl Zeiss Smt Gmbh Beleuchtungssystem einer Mikrolithographischen Projektionsbelichtungsanlage
JP6168957B2 (ja) * 2013-09-30 2017-07-26 キヤノン株式会社 光学装置、投影光学系、露光装置および物品の製造方法

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011028122A (ja) 2009-07-28 2011-02-10 Nsk Ltd 露光装置及び露光方法

Also Published As

Publication number Publication date
CN106687866B (zh) 2018-09-14
WO2015159989A1 (ja) 2015-10-22
CN106687866A (zh) 2017-05-17
JP6484853B2 (ja) 2019-03-20
JP2015212811A (ja) 2015-11-26

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