KR20160058738A - 블록 공중합체의 혼련물을 포함하는 나노구조의 집합체의 간격 조절 방법 - Google Patents
블록 공중합체의 혼련물을 포함하는 나노구조의 집합체의 간격 조절 방법 Download PDFInfo
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- KR20160058738A KR20160058738A KR1020160057779A KR20160057779A KR20160058738A KR 20160058738 A KR20160058738 A KR 20160058738A KR 1020160057779 A KR1020160057779 A KR 1020160057779A KR 20160057779 A KR20160057779 A KR 20160057779A KR 20160058738 A KR20160058738 A KR 20160058738A
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- block copolymer
- block
- block copolymers
- spacing
- copolymer
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- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
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- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
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- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
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- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
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- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
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- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
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- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
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- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29K—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES B29B, B29C OR B29D, RELATING TO MOULDING MATERIALS OR TO MATERIALS FOR MOULDS, REINFORCEMENTS, FILLERS OR PREFORMED PARTS, e.g. INSERTS
- B29K2995/00—Properties of moulding materials, reinforcements, fillers, preformed parts or moulds
- B29K2995/0037—Other properties
- B29K2995/0088—Molecular weight
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- B29L—INDEXING SCHEME ASSOCIATED WITH SUBCLASS B29C, RELATING TO PARTICULAR ARTICLES
- B29L2007/00—Flat articles, e.g. films or sheets
- B29L2007/008—Wide strips, e.g. films, webs
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
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- C08L2205/02—Polymer mixtures characterised by other features containing two or more polymers of the same C08L -group
- C08L2205/025—Polymer mixtures characterised by other features containing two or more polymers of the same C08L -group containing two or more polymers of the same hierarchy C08L, and differing only in parameters such as density, comonomer content, molecular weight, structure
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L2205/00—Polymer mixtures characterised by other features
- C08L2205/03—Polymer mixtures characterised by other features containing three or more polymers in a blend
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
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- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Life Sciences & Earth Sciences (AREA)
- Wood Science & Technology (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Thermal Sciences (AREA)
- Graft Or Block Polymers (AREA)
- Manufacture Of Macromolecular Shaped Articles (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR1358625A FR3010411B1 (fr) | 2013-09-09 | 2013-09-09 | Procede de controle de la periode d'un assemblage nano-structure comprenant un melange de copolymeres a blocs |
FR13.58625 | 2013-09-09 | ||
FR14.51491 | 2014-02-25 | ||
FR1451491A FR3010413B1 (fr) | 2013-09-09 | 2014-02-25 | Procede de controle de la periode d'un assemblage nano-structure comprenant un melange de copolymeres a blocs |
Related Parent Applications (1)
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KR20140120324A Division KR20150029600A (ko) | 2013-09-09 | 2014-09-11 | 블록 공중합체의 혼련물을 포함하는 나노구조의 집합체의 간격 조절 방법 |
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KR20160058738A true KR20160058738A (ko) | 2016-05-25 |
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KR1020160057779A KR20160058738A (ko) | 2013-09-09 | 2016-05-11 | 블록 공중합체의 혼련물을 포함하는 나노구조의 집합체의 간격 조절 방법 |
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KR (1) | KR20160058738A (fr) |
FR (1) | FR3010411B1 (fr) |
Families Citing this family (3)
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FR3032712A1 (fr) * | 2015-02-18 | 2016-08-19 | Arkema France | Procede d'obtention de films ordonnes epais et de periodes elevees comprenant un copolymere a blocs |
FR3032714A1 (fr) * | 2015-02-18 | 2016-08-19 | Arkema France | Procede de reduction du temps d'assemblage des films ordonnes de copolymeres a blocs |
FR3032713A1 (fr) * | 2015-02-18 | 2016-08-19 | Arkema France | Procede de reduction des defauts dans un film ordonne de copolymeres a blocs |
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WO2009151834A2 (fr) * | 2008-05-08 | 2009-12-17 | The Regents Of The University Of California | Compositions de copolymères séquencés supramoléculaires pour lithographie submicronique |
US8513356B1 (en) * | 2012-02-10 | 2013-08-20 | Dow Global Technologies Llc | Diblock copolymer blend composition |
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FR3010411A1 (fr) | 2015-03-13 |
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