KR20150112120A - Crucible Assembly - Google Patents
Crucible Assembly Download PDFInfo
- Publication number
- KR20150112120A KR20150112120A KR1020140035420A KR20140035420A KR20150112120A KR 20150112120 A KR20150112120 A KR 20150112120A KR 1020140035420 A KR1020140035420 A KR 1020140035420A KR 20140035420 A KR20140035420 A KR 20140035420A KR 20150112120 A KR20150112120 A KR 20150112120A
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- KR
- South Korea
- Prior art keywords
- crucible
- source
- heater
- housing
- heating wire
- Prior art date
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
- F27B14/00—Crucible or pot furnaces
- F27B14/08—Details peculiar to crucible or pot furnaces
- F27B14/10—Crucibles
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
- F27B14/00—Crucible or pot furnaces
- F27B14/08—Details peculiar to crucible or pot furnaces
- F27B14/14—Arrangements of heating devices
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
- F27B14/00—Crucible or pot furnaces
- F27B14/08—Details peculiar to crucible or pot furnaces
- F27B2014/0825—Crucible or pot support
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
- F27B14/00—Crucible or pot furnaces
- F27B14/08—Details peculiar to crucible or pot furnaces
- F27B2014/0837—Cooling arrangements
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
- F27B14/00—Crucible or pot furnaces
- F27B14/08—Details peculiar to crucible or pot furnaces
- F27B14/10—Crucibles
- F27B2014/102—Form of the crucibles
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- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Description
The present invention relates to a crucible for providing a source for thin film deposition.
Generally, a process for manufacturing a semiconductor or a flat panel display (FPD) includes a thin film deposition process for depositing a thin film on a substrate. In the thin film deposition step, a chamber having an evaporation chamber in which a vacuum atmosphere can be formed and into which a substrate is introduced, and a crucible for providing a source (thin film material) evaporated on a substrate of the evaporation chamber are used.
The crucible apparatus includes a crucible and a heating unit. The crucible contains a source therein, and the heating unit provides heat for evaporating the source contained in the crucible on the outer circumferential side of the crucible. The source evaporated by the action of the heating unit is ejected from the crucible and moved to the substrate side, and is deposited on the substrate to form a thin film.
In such a crucible apparatus, since the heating unit includes the heating wire, it is difficult and difficult to install the heating wire on the outer circumferential side of the crucible.
In addition, since there is a large difference (L1> L2) between the distance L1 from the heating unit to the source located at the center of the crucible and the distance from the heating unit to the source located at the edge of the crucible, There is a problem in that it can not be uniformly transmitted to the source. According to this, since the heating temperature H1 transmitted to the source on the center side of the crucible and the heating temperature H2 transmitted to the source on the edge side of the crucible are different (H1 <H2), the evaporated source has uniform characteristics and thermal distribution The splash phenomenon occurs in which the source reaching from the substrate splashes, and the uniformity of the thin film is lowered.
It is an object of the present invention to provide a crucible device or the like which is improved so as to be more advantageous in terms of performing a thin film deposition process.
The problems to be solved by the present invention are not limited thereto, and other matters which are not mentioned can be understood by those skilled in the art from the following description.
According to an embodiment of the present invention, a crucible containing a source for thin film deposition; A crucible heating unit for providing heat for evaporating a source contained in the crucible at an outer peripheral side of the crucible; A crucible housing for containing the crucible heating unit together with the crucible; And a crucible supporting member for supporting the crucible in the crucible housing and fixing the position of the crucible received in the crucible housing.
The crucible may be provided with a source outlet for emitting a vaporized source on the upper side, and a flange may be provided on an outer circumference on the source outlet side. The crucible supporting member may be composed of a single or a plurality of supporting walls positioned between the crucible heating unit and the crucible housing and supporting a flange of the crucible in a state of being raised on the bottom of the crucible housing.
The support wall may be provided with a stepped portion for supporting an edge portion of the flange at an upper end thereof. In addition, the supporting wall may be formed so that a part or all of at least one of the inner wall and the outer wall has a concave-convex structure.
The crucible apparatus according to an embodiment of the present invention may further include a single or multi-layered reflecting member provided between the crucible housing and the crucible supporting member for reflecting heat and / or a cooling unit provided on the outer circumferential side of the crucible housing .
The crucible may be provided with a source storage chamber in a lower region and a radiation direction switching means for guiding a movement direction of radiant heat radiated into the upper portion into the source chamber. The crucible heating unit includes: a lower heater disposed on an outer periphery of a lower region side of the crucible; And an upper heater of a multi-layer structure disposed on the upper side of the upper region of the crucible at an upper side of the lower heater and having a larger number of heater layers than the lower heater.
According to an embodiment of the present invention, a crucible containing a source for thin film deposition; And a heating unit for providing heat for evaporating the source contained in the crucible on the outer circumferential side of the crucible, wherein the heating unit is arranged in a zigzag manner along the circumferential direction of the crucible, A heater; And a heater holder for supporting the heating wire on an outer circumferential side of the crucible, wherein the heater holder is spaced apart from each other and formed in an annular shape so that the crucible is positioned at a center portion thereof and spaced apart from each other in a circumferential direction And the heating wire is hooked on the locking protrusions of the upper and lower rims so as to be arranged in a staggered manner.
Wherein the heating wire is composed of an inner heating wire and an outer heating wire disposed outside the inner heating wire, the locking protrusion being provided along the inner periphery and the outer periphery of the upper and lower rims, respectively, And the outer heat ray can be caught by the outer circumferential side locking projections of the upper and lower rims.
The heater holder may further include a finishing rim that covers the upper side of the upper rim and the lower side of the lower rim, respectively, to fix the position of the heating wire hooked on the locking projection.
According to an embodiment of the present invention, a crucible containing a source for thin film deposition; And a heating unit for providing heat for evaporating a source contained in the crucible on the outer circumferential side of the crucible, wherein a source storage chamber is provided in a lower region of the crucible, and an upper region of the crucible And a radiating direction switching means for guiding the moving direction of the radiant heat to the source chamber, wherein the heating unit comprises: a lower heater for heating a lower region of the crucible; And a top heater which heats the upper region of the crucible on the upper side of the lower heater and has a larger number of heaters than the lower heater.
Here, the heaters of the upper and lower heaters are composed of heating wires, and the upper heater has a larger number of heaters than the lower heater, and has a larger number of heaters than the lower heaters, The inner and outer heat lines may be arranged in a zigzag manner along the outer circumferential direction of the crucible so as to surround the upper region of the crucible in a multi-layered structure .
In the crucible, the crucible having the radiating direction switching means may have a source outlet from which the evaporated source is discharged from the source containing chamber. The radiating direction switching means may be configured to guide the moving direction of radiant heat to the inside of the crucible to the source outlet side.
Wherein the radiation direction switching means comprises: a first inclined portion whose periphery is reduced toward the source outlet side from the source accommodation chamber side and whose inside is directed toward the source accommodation chamber side; And a second inclined portion which is disposed so as to have the first inclined portion between the source accommodating chamber and the source accommodating chamber and whose periphery is reduced from the source exit side toward the source accommodating chamber side and whose inside is directed toward the source exit side and is connected to the first inclined portion can do.
The crucible may be provided with a plurality of ribs spaced along the circumferential direction in grooves between the first inclined portion and the second inclined portion on the outer circumference.
The crucible may have a heat transfer column protruding from the bottom of the source chamber to the center. The heat transfer column may have a cross-section of a radial structure and be formed to have a pointed end.
According to an embodiment of the present invention, there is provided a crucible apparatus comprising: a crucible apparatus for evaporating a source and having a configuration as described above; A source spray device for receiving a source of evaporated material from the crucible and spraying it onto the surface (deposition surface) of the substrate; And a crucible moving device for moving the crucible device so that the crucible device can be detached from the source spray device. Such a thin film deposition apparatus includes: a deposition chamber having a gate and the source spray apparatus accommodated; And a source chamber having a gate facing the gate of the deposition chamber and receiving the crucible. Specifically, the crucible is movable in a direction away from and approaching the source injector, and can be attached to and detached from the source injector according to the direction of movement of the crucible moving device.
The source spraying apparatus comprising: a neck coupled to the crucible and having an introduction flow path through which the evaporated source from the crucible is introduced; A distribution pipe connected to the neck and having a plurality of distribution channels having a structure branched from the introduction channel and a source nozzle communicated with the distribution channel; And a heater for heating a source moved along at least one of the introduction channel and the distribution channel. Preferably, both the neck heater for heating the source moved along the introduction path and the distribution pipe heater for heating the source moved along the distribution path are all included.
The distribution pipe heater may be composed of a plurality of linear heaters arranged on the outer circumference of the distribution pipe in the longitudinal direction of the distribution pipe and spaced apart from each other along the outer circumferential direction of the distribution pipe. At least one of the plurality of linear heaters may be disposed at a position adjacent to the source injection port.
The source spray device includes a distribution pipe housing in which the distribution pipe is accommodated; And a reflection member disposed between the distribution pipe and the distribution pipe housing. The distribution pipe heater may be disposed between the distribution pipe and the reflection member.
And a guide portion for guiding the flow of the outflowing source toward the plurality of distribution channels may be provided at the outlet side of the introduction channel.
The thin film deposition apparatus according to an embodiment of the present invention includes pressure measuring means for measuring a force (pressure) applied to the source injector by the crucible when the crucible is moved and combined with the source injector; And a control unit that determines whether or not the measured pressure from the pressure measuring unit belongs to a predetermined set pressure.
Preferably, the control unit controls the operation of the crucible moving device according to the determination result. More specifically, the control unit may stop the operation of the crucible moving apparatus when it is determined that the measured pressure from the pressure measuring unit exceeds the set pressure.
The pressure measuring means includes: a pressing member; And a pressure sensor for measuring a pressing force by the pressing member. More specifically, one of the pressure member and the pressure sensor (which may be a pressure member) is provided to move together with the crucible, and the other one of the pressure member and the pressure sensor (which may be a pressure sensor) The crucible can be placed in contact with the source injection device when the crucible is engaged with one of the pressure member and the pressure sensor (which may be a pressing member).
Here, the crucible moving device includes: an operating member connected to the crucible device and moved together with the crucible device; And one of the pressing member and the pressure sensor (which may be a pressing member) is installed on the operating member and can move together with the crucible.
The thin film deposition apparatus according to an embodiment of the present invention may further include a sensor for sensing whether a crucible moved in a direction to approach the source spray device for engagement with the source spray device has deviated from a predetermined travel path ; And a control unit that determines whether or not the crucible apparatus has deviated from the movement path through the detection result from the detection sensor.
Preferably, the control unit controls operation of the crucible moving device in accordance with the determination result. Specifically, when the crucible is determined to have departed from the movement path, the control unit may stop the operation of the crucible moving device.
Wherein the detection sensor is constituted by a plurality of contact sensors arranged around the gate of the source chamber in the source chamber and the control unit controls the crucible to move to the source spray device side It can be determined that the crucible is detached from the movement route when the contact is made with the contact sensor.
The thin film deposition apparatus according to an embodiment of the present invention may further include a shock absorber for absorbing an impact generated when the crucible is coupled to the source spray apparatus.
Wherein the buffer device comprises: a movable member movably installed between the crucible device and the operating member in a direction away from and approaching the crucible device; And an impact absorbing member that acts as a buffer between the crucible device and the movable member.
Means for solving the problems will be more specifically and clarified through the embodiments, drawings, and the like described below. In addition, various solution means other than the above-mentioned solution means may be further proposed.
According to the embodiment of the present invention, the source contained in the crucible can be evaporated more effectively, the crucible can be more easily manufactured, maintained, and repaired, and the heating wire can be installed more easily on the outer circumferential side of the crucible.
1 and 2 are cross-sectional views illustrating a thin film deposition apparatus according to an embodiment of the present invention.
Fig. 3 is a cross-sectional view taken along line AA of Fig. 1, which shows a source injector.
4 is an enlarged view of a portion B in Fig.
5 is a perspective view showing part C of Fig.
Fig. 6 is a cross-sectional view showing a modified example of the source injection device shown in Figs. 1 and 2. Fig.
Fig. 7 is a sectional view showing the crucible shown in Figs. 1 and 2. Fig.
8 is a cross-sectional view showing the crucible shown in Fig.
9 is a sectional view taken along line DD of Fig.
10 is a perspective view showing the radiant heat transfer member shown in Figs. 7 and 8. Fig.
11 is a plan view showing the upper heater shown in Fig.
12 is a plan view showing the lower heater shown in Fig.
13 is a perspective view showing the upper heater holder shown in Figs. 7 and 11. Fig.
14 is a developed view showing the upper heater shown in Figs. 7, 11 and 13. Fig.
Fig. 15 is a perspective view showing the lower heater holder shown in Figs. 7 and 12. Fig.
16 is a cross-sectional view showing the source chamber, the crucible apparatus and the crucible moving apparatus shown in Figs. 1 and 2. Fig.
17 is a plan view showing driving means of a thin film deposition apparatus according to an embodiment of the present invention.
18 is a sectional view taken along line BB of Fig.
19 is a block diagram showing a control apparatus of a thin film deposition apparatus according to an embodiment of the present invention.
Hereinafter, preferred embodiments of the present invention will be described with reference to the accompanying drawings. For the sake of convenience, it is to be understood that the present invention is not limited to the above embodiments, and various changes and modifications may be made without departing from the scope of the present invention. Further, the terms used to describe the embodiments of the present invention are mainly defined in consideration of the functions of the present invention, and thus may be changed depending on the intentions and customs of the user and the operator. Therefore, the terminology should be interpreted based on the contents of the present specification throughout.
Embodiments of the present invention can be mainly used for manufacturing semiconductors, flat panel displays (FPD), solar cells, and the like. In particular, as a kind of flat panel display, it can be more suitable for manufacturing organic light emitting diodes (OLED), which are attracting attention as a next generation display due to high quality and simple manufacturing process.
1 and 2 are cross-sectional views illustrating a thin film deposition apparatus according to an embodiment of the present invention.
1 and 2, a thin film deposition apparatus according to an embodiment of the present invention includes a
The
When the
The
When the source is exhausted, the
FIG. 3 is a sectional view taken along the line AA in FIG. 1, FIG. 4 is an enlarged view of a portion B in FIG. 1, FIG. 5 is a perspective view showing a portion C in FIG. .
3 to 5, the
The connecting
The
The
The
The branching direction of the
A flow of the source flowing out through the
A plurality of
A
The
For reference, as a linear heater constituting the
The plurality of linear heaters constituting the
The plurality of linear heaters constituting the
3, at least one of the plurality of linear heaters constituting the
5, one or both ends of the plurality of linear heaters constituting the
The heat from the
The vaporized source from the
Therefore, even when the source supplied from the
6 is a cross-sectional view showing a modified example of the
According to the guide portion 515-1 as described above, the modification of Fig. 6 is constituted by a flow path which is inclined as a whole between the
Fig. 7 is a sectional view showing the
7, the
The
The
8 is a cross-sectional view showing the
The
8, the
The
The
The crucible
A radiating
Fig. 9 is a cross-sectional view taken along the line D-D in Fig. 8 (a cross-sectional view).
8 and 9, a
The
When the wall and bottom of the crucible
It is preferable that the
According to such a crucible
10 is a perspective view showing the radiant
Referring to Figs. 8 and 10, the radiant
The neck portion of the radiant
The radiant heat emitted from the first
Since the inside of the second
The first
The radiation
The plurality of
According to the plurality of
The
Therefore, the embodiment of the present invention can prevent a relatively large amount of the source from remaining in the center portion side of the
The
The supporting wall constituting the
The reflecting
The mounting blocks 651 are provided with a pair (two) and are spaced apart in the vertical direction. The upper mounting block is detachably coupled to the upper end of the inner wall of the housing
Although not specifically shown, the cooling
On the other hand, in the
Unlike the above description, the
7, the
Figs. 11 to 15 show the
7, 11, 12 and 14, the
The
The
As shown in Figs. 11 and 12, the
As shown in Fig. 13, the
A plurality of locking projections 623A1 and 623A3 are provided on the inner periphery and the outer periphery of the upper and
As shown in Fig. 14, the inner heat wire 621A1 has its straight portion inserted into the inner peripheral side insertion groove portion 623A2 of the upper and
An upper finishing rim 625A is covered on the upper side of the
According to the upper and
As shown in Fig. 15, the
A plurality of locking projections 623B1 are provided on the inner circumference of the upper and
The
The
The
Although not shown, the
7, 13, and 15, the
A plurality of (four) engaging holes 625A3 are provided at the edges of the upper finishing rim 625A of the
A plurality of (four) engagement grooves 623A5 and 624A5 may be provided on the edge portions of the upper and
The edge portions of the
According to the
16 is a cross-sectional view showing the
1, 2, 7 and 16, the
The operating
The
The drive means 82 is shown in Fig. 17, the driving means 72 includes a
Two
The power transmission means is installed on the lower side of the
The first bevel gear set 723 may be disposed rearward (or forward) with respect to the operating
The third bevel gear set 726 and 727 may be composed of a sixth gear mounted on the upper end of the two
The second bevel gear sets 724 and 725 may be composed of third gears respectively mounted on the shafts of the two second gears and fourth gears respectively mounted on the shafts of the fifth gears and meshing with the third gears .
For reference, depending on the combination of the gears constituting the power transmitting means, the male screw of the two
On the other hand, as the driving means 72, a type including a linear driving mechanism such as a pneumatic or hydraulic cylinder may be applied.
7, a
The
The
The thin film deposition equipment according to the embodiment of the present invention further includes a control device for controlling the operation of the driving means 72 of the
Fig. 18 is a sectional view taken along the line E-E in Fig. 16, and Fig. 19 is a block diagram showing the control device.
16, 18, and 19, the control device displays the normal movement path (see the center line (dashed line) in Fig. 16) preset by the
Here, the
The path
As the path
The pressure measuring means 92 includes a
The
According to the path
When the
A
While the present invention has been described in connection with what is presently considered to be the most practical and preferred embodiments, it is to be understood that the invention is not limited to the disclosed embodiments, but, on the contrary, is intended to cover various modifications and equivalent arrangements included within the spirit and scope of the invention.
A
5: substrate 10: deposition chamber
20: source chamber 30: gate valve
40: Vacuum device 50: Source injection device
51: connection neck 52: minute piping
60: Crucible device 61: Crucible
61A: Crucible
61C: Radiant heat transfer member 62: Crucible heating unit
62A:
621A1: inner heat line 621A2: outer heat line
622A:
621B:
63: crucible housing 64: crucible supporting member
65: reflection member 66: cooling unit
70: crucible moving device 71: operating member
72: drive means 80: shock absorber
81: movable member 82: shock-absorbing member
91: path deviation detection sensor 92: pressure measurement means
93: control unit 94:
Claims (12)
A crucible heating unit for providing heat for evaporating a source contained in the crucible at an outer peripheral side of the crucible;
A crucible housing for containing the crucible heating unit together with the crucible;
And a crucible supporting member for supporting the crucible to the crucible housing and fixing the position of the crucible contained in the crucible housing.
Crucible device.
Wherein the crucible is provided with a source outlet for discharging a vaporized source on the upper side, a flange is provided on the periphery of the source outlet side,
Wherein the crucible supporting member is composed of a single or a plurality of supporting walls positioned between the crucible heating unit and the crucible housing and supporting a flange of the crucible in a state of being erected on the bottom of the crucible housing,
Crucible device.
Wherein the support wall has a stepped portion provided on an upper end thereof for supporting an edge portion of the flange,
Crucible device.
Wherein the support wall is formed so that at least one of the inner wall and the outer wall has a part or whole of a concavo-
Crucible device.
Wherein a reflecting member for reflecting heat is provided between the crucible housing and the crucible supporting member in a single layer or multi-
Crucible device.
Further comprising a cooling unit provided on an outer circumferential side of the crucible housing,
Crucible device.
The crucible is provided with a source storage chamber in a lower region and a radiation direction switching means for guiding a movement direction of radiant heat emitted to the inside into the source storage chamber in an upper region,
In the crucible heating unit,
A lower heater disposed on an outer periphery of the lower region side of the crucible;
And an upper heater of a multi-layer structure disposed on the upper side of the upper region side of the crucible at the upper side of the lower heater and having a larger number of heater layers than the lower heater.
Crucible device.
Wherein the heating unit comprises: a heater arranged in a staggered manner along an outer circumferential direction of the crucible to constitute a heating wire surrounding an outer periphery of the crucible; And a heater holder for supporting the heating wire on an outer circumferential side of the crucible,
The heater holder includes an upper rim and a lower rim spaced apart from each other and spaced apart from each other in a circumferential direction so that the crucible is positioned at the center of the crucible, Including,
Wherein the heating wires are arranged in a zigzag manner by being caught by a locking projection of the upper and lower rims,
Crucible device.
Wherein the heating wire is composed of an inner heating wire and an outer heating wire arranged outside the inner heating wire,
The locking protrusions are provided along the inner circumference and the outer circumference of the upper and lower rims, respectively,
The inner heat ray is caught by the inner circumferential side locking projections of the upper and lower rims,
Wherein the outer heat ray is caught by an outer circumferential side locking projection of the upper and lower rims,
Crucible device.
Wherein the heater holder further comprises a finishing rim that covers the upper side of the upper rim and the lower side of the lower rim, respectively, to fix the position of the heating wire hooked on the locking projection,
Crucible device.
A source storage room is provided in a lower region of the crucible and a radiation direction switching means is provided in an upper region of the crucible for guiding a movement direction of radiant heat emitted into the crucible to the source accommodation chamber side,
The heating unit includes: a lower heater for heating a lower region of the crucible; And an upper heater which heats the upper region of the crucible above the lower heater and has a larger number of heaters than the lower heater,
Crucible device.
The heaters of the upper and lower heaters are composed of heating wires,
The upper heater includes a larger number of heaters than the lower heater, and has a larger number of heaters than the lower heater,
Wherein the heating wire of the upper heater includes an inner heating wire and an outer heating wire disposed outside the inner heating wire,
The inner and outer heat lines are arranged in a zigzag manner along the outer circumferential direction of the crucible to surround the upper region of the crucible in a multi-
Crucible device.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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KR1020140035420A KR20150112120A (en) | 2014-03-26 | 2014-03-26 | Crucible Assembly |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020140035420A KR20150112120A (en) | 2014-03-26 | 2014-03-26 | Crucible Assembly |
Publications (1)
Publication Number | Publication Date |
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KR20150112120A true KR20150112120A (en) | 2015-10-07 |
Family
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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KR1020140035420A KR20150112120A (en) | 2014-03-26 | 2014-03-26 | Crucible Assembly |
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Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20180078486A (en) | 2016-12-30 | 2018-07-10 | 주식회사 에스에프에이 | Heating unit, evaporation source having the same and method for assembling the same |
KR20190101680A (en) * | 2018-02-23 | 2019-09-02 | 공주대학교 산학협력단 | Sheet type heater for inorganic matter and effusion cell apparatus for inorganic matter |
CN110257862A (en) * | 2019-06-26 | 2019-09-20 | 四川江铜稀土有限责任公司 | A kind of damage revamping method of Rare Earth Electrolysis crucible |
KR20190124502A (en) * | 2018-04-26 | 2019-11-05 | 주식회사 에스에프에이 | A evaporation source for deposition material |
KR20200045704A (en) * | 2018-10-23 | 2020-05-06 | 어플라이드 머티어리얼스, 인코포레이티드 | Evaporation Source For Automatic Exchange Of Crucible And Evaporation Deposition System Having The Same |
KR20200078850A (en) * | 2018-12-24 | 2020-07-02 | 주식회사 에스에프에이 | Linear evaporation source |
CN114836721A (en) * | 2022-04-25 | 2022-08-02 | 山东国晶新材料有限公司 | Ceramic point source for horizontal transverse arrangement |
-
2014
- 2014-03-26 KR KR1020140035420A patent/KR20150112120A/en not_active Application Discontinuation
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20180078486A (en) | 2016-12-30 | 2018-07-10 | 주식회사 에스에프에이 | Heating unit, evaporation source having the same and method for assembling the same |
KR20190101680A (en) * | 2018-02-23 | 2019-09-02 | 공주대학교 산학협력단 | Sheet type heater for inorganic matter and effusion cell apparatus for inorganic matter |
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CN112823219A (en) * | 2018-10-23 | 2021-05-18 | 应用材料公司 | Evaporation source capable of automatically replacing crucible and evaporation deposition system with evaporation source |
KR20200078850A (en) * | 2018-12-24 | 2020-07-02 | 주식회사 에스에프에이 | Linear evaporation source |
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CN114836721B (en) * | 2022-04-25 | 2024-01-26 | 山东国晶新材料有限公司 | Ceramic point source for horizontal transverse arrangement |
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