KR20150109161A

KR20150109161A - Source Injection Apparatus and Thin Film Deposition Equipment Having the Same

Info

Publication number: KR20150109161A
Application number: KR1020140032256A
Authority: KR
Inventors: 김성수; 안민형; 황창훈
Original assignee: 엘아이지인베니아 주식회사
Priority date: 2014-03-19
Filing date: 2014-03-19
Publication date: 2015-10-01

Abstract

The present invention comprises: a neck having an introduction flow path into which source vaporized from a crucible apparatus flows; a distribution pipe having a plurality of distribution flow paths which have a structure branched from the introduction flow path and a source injection port interconnected to the distribution flow paths; and a plurality of linear heaters heating source moved along the introduction flow path and the distribution flow paths, thereby improving a degree of uniformity of a thin film by more uniformalizing characteristics of source injected to a substrate and heat distribution.

Description

(Source Injection Apparatus and Thin Film Deposition Equipment Having the Same)

The present invention relates to a device for spraying a source to deposit a thin film on a substrate and a thin film deposition apparatus including the same.

Generally, a process for manufacturing a semiconductor or a flat panel display (FPD) includes a thin film deposition process for depositing a thin film on a substrate. In the thin film deposition process, a chamber having an evaporation chamber capable of forming a vacuum atmosphere, a crucible assembly for evaporating a source (thin film material), evaporation from a crucible to a substrate carried in the evaporation chamber of the chamber, A source injector is used to provide the source to which the source is injected.

The crucible apparatus includes a crucible and a heating unit. The crucible contains a source therein, and the heating unit provides heat for evaporating the source contained in the crucible on the outer circumferential side of the crucible. The source evaporated by the action of the heating unit is supplied from the crucible to the source injector, then distributed by the source injector and injected toward the substrate side. The injected source is moved and deposited on the substrate to form a thin film.

The source supplied from the crucible to the source injector may not have uniform characteristics and thermal distribution depending on the source heating conditions of the crucible. Further, the source may be solidified during the process of being dispensed by the source injector or during the spraying process, and the characteristics may be changed from a uniform state to a non-uniform state.

In this case, a splash phenomenon occurs in which the source reaches the substrate, and the uniformity of the thin film is deteriorated. Accordingly, it is required to provide an improvement measure.

An embodiment of the present invention is directed to a source spray apparatus capable of spraying a source having a more uniform characteristic to a substrate and a thin film deposition apparatus including the source spray apparatus.

The problems to be solved by the present invention are not limited thereto, and other matters which are not mentioned can be understood by those skilled in the art from the following description.

According to an embodiment of the present invention, there is provided a vacuum cleaner comprising: a neck having an introduction flow path through which a vaporized source flows; A distribution pipe connected to the neck and having a plurality of distribution channels having a structure branched from the introduction channel and a source nozzle communicated with the distribution channel; And a distribution pipe heater composed of a plurality of linear heaters for heating a source moved along the distribution channel.

The plurality of linear heaters may be arranged on the outer circumference of the distribution pipe in the longitudinal direction of the distribution pipe and spaced apart from each other along the outer circumferential direction of the distribution pipe. At least one of the plurality of linear heaters may be disposed at a position adjacent to the source injection port.

A source spray apparatus according to an embodiment of the present invention includes a distribution pipe housing in which the distribution pipe is accommodated; And a reflection member disposed between the distribution pipe and the distribution pipe housing. The plurality of linear heaters may be positioned between the distribution pipe and the reflective member.

A guide portion may be provided between the introduction flow path and the plurality of distribution flow paths to naturally guide the flow of the source flowing out from the introduction flow path to each of the plurality of distribution flow paths. And the guide portion may be constituted by a guide channel which connects the introduction channel and the plurality of distribution channels respectively and is inclined from the introduction channel to the plurality of distribution channels.

The plurality of source injection openings may be provided in the distribution pipe at intervals along the longitudinal direction, and a nozzle may be coupled to each of the plurality of source injection openings.

The source spray apparatus according to the embodiment of the present invention may further include a neck heater composed of a plurality of linear heaters for heating a source moved along the introduction flow path.

According to an embodiment of the present invention, there is provided a vacuum cleaner comprising: a neck having an introduction flow path through which a vaporized source flows; A distribution pipe connected to the neck and having a plurality of distribution channels having a structure branched from the introduction channel and a source nozzle communicated with the distribution channel; A thin film evaporation source injection device including a neck heater composed of a plurality of linear heaters for heating a source moved along the introduction flow path may be provided.

According to an embodiment of the present invention, there is provided a plasma processing apparatus comprising: a deposition chamber having a gate; A source spray device accommodated in the deposition chamber and spraying a vaporized source onto a surface (deposition surface) of the substrate; A source chamber having a gate facing the gate of the deposition chamber; A crucible accommodated in the source chamber; And a crucible moving device for moving the crucible device so that the crucible device is detachable from the source spray device through the opposite gate, wherein the source spray device is connected to the crucible device, A neck having an introduction flow path through which the source flows; A distribution pipe connected to the neck and having a plurality of distribution channels having a structure branched from the introduction channel and a source nozzle communicated with the distribution channel; And a heater composed of a plurality of linear heaters for heating a source moved along at least one of the introduction channel and the distribution channel. Specifically, the crucible may be installed in the source chamber so as to be movable in a direction away from and approaching the opposing gate, and may be detachably attached to the source injector according to the direction of movement of the crucible moving device.

In the thin film deposition apparatus according to an embodiment of the present invention, the crucible includes: a crucible having a source storage chamber containing a source for thin film deposition and a source outlet through which the evaporated source is discharged from the source storage chamber; And a heating unit for providing heat to the crucible to evaporate the source. A radiating direction switching unit may be provided between the source housing chamber and the source outlet to guide the moving direction of the radiant heat emitted to the inside of the crucible to at least one of the source accommodation chamber side and the source outlet side.

Wherein the radiation direction switching means comprises: a first inclined portion whose periphery is reduced toward the source outlet side from the source accommodation chamber side and whose inside is directed toward the source accommodation chamber side; And a second inclined portion which is disposed so as to have the first inclined portion between the source accommodating chamber and the source accommodating chamber and whose periphery is reduced from the source exit side toward the source accommodating chamber side and whose inside is directed toward the source exit side and is connected to the first inclined portion can do.

The crucible may be provided with a plurality of ribs spaced along the circumferential direction in grooves between the first inclined portion and the second inclined portion on the outer circumference.

The crucible may have a heat transfer column protruding from the bottom of the source chamber to the center. The heat transfer column may have a cross-section of a radial structure and be formed to have a pointed end.

The thin film deposition apparatus according to an embodiment of the present invention may further include a buffer for absorbing an impact generated when the crucible is coupled to the source injection apparatus.

In the thin film deposition apparatus according to an embodiment of the present invention, the crucible moving apparatus includes an operating member connected to the crucible apparatus and moved together with the crucible apparatus; And driving means for moving the operation member. Further, the shock absorber may be disposed between the crucible apparatus and the operating member.

Wherein said buffering device comprises: a movable member movably installed in said crucible device in a direction away from and approaching said crucible device; And a shock absorbing member provided between the crucible device and the movable member.

According to an embodiment of the present invention, there is provided a plasma processing apparatus comprising: a deposition chamber having a gate; A source injector accommodated in the deposition chamber and injecting a vaporized source to the substrate; A source chamber having a gate facing the gate of the deposition chamber; A crucible accommodated in the source chamber; And a crucible moving device for moving the crucible device so that the crucible device is detachable from the source spray device through the opposite gate, wherein the source spray device is connected to the crucible device, A neck having an introduction flow path through which the source flows; A distribution pipe connected to the neck and having a plurality of distribution channels having a structure branched from the introduction channel and a source nozzle communicated with the distribution channel; And a heater composed of a plurality of linear heaters for heating a source moved along at least one of the introduction channel and the distribution channel, wherein the crucible device comprises: a source chamber in which a source for thin film deposition is contained; A crucible having a source outlet through which a vaporized source is emitted; And a heating unit for supplying heat to the crucible to evaporate the source, and a heating unit for heating the source in the crucible, and a heating unit for heating the source in the crucible, Wherein a neck portion of the necked structure is provided between the source chamber and the outlet of the source, and the periphery of the neck portion is reduced from the source chamber to the source outlet side, And the radiation direction switching means may be provided with the thin film deposition equipment including the inclined portion.

According to an embodiment of the present invention, there is provided a plasma processing apparatus comprising: a deposition chamber having a gate; A source injector accommodated in the deposition chamber and injecting a vaporized source to the substrate; A source chamber having a gate facing the gate of the deposition chamber; A crucible accommodated in the source chamber; And a crucible moving device for moving the crucible device so that the crucible device is detachable from the source spray device through the opposite gate, wherein the source spray device is connected to the crucible device, A neck having an introduction flow path through which the source flows; A distribution pipe connected to the neck and having a plurality of distribution channels having a structure branched from the introduction channel and a source nozzle communicated with the distribution channel; And a heater composed of a plurality of linear heaters for heating a source moved along at least one of the introduction channel and the distribution channel, wherein the crucible device comprises: a source chamber in which a source for thin film deposition is contained; A crucible having a source outlet through which a vaporized source is emitted; And a heating unit for supplying heat to the crucible to evaporate the source, wherein the crucible is provided with a thin film deposition apparatus having an electric heater protruding from a bottom of the source chamber to a central portion to transfer heat to the source .

Means for solving the problems will be more specifically and clarified through the embodiments, drawings, and the like described below. In addition, various solution means other than the above-mentioned solution means may be further proposed.

According to the embodiment of the present invention, since the source supplied to the source spray device is continuously heated by the neck heater and the distribution pipe heater in the course of spraying, the source can have more uniform characteristics and thermal distribution, Thus, the uniformity of the thin film can be improved.

1 and 2 are cross-sectional views illustrating a thin film deposition apparatus according to an embodiment of the present invention.
Fig. 3 is a cross-sectional view taken along line AA of Fig. 1, which shows a source injector.
4 is an enlarged view of a portion B in Fig.
5 is a perspective view showing part C of Fig.
Fig. 6 is a cross-sectional view showing a modified example of the source injection device shown in Figs. 1 and 2. Fig.
Fig. 7 is a sectional view showing the crucible shown in Figs. 1 and 2. Fig.
8 is a cross-sectional view showing the crucible shown in Fig.
9 is a sectional view taken along line DD of Fig.
10 is a perspective view showing the radiant heat transfer member shown in Figs. 7 and 8. Fig.

Hereinafter, preferred embodiments of the present invention will be described with reference to the accompanying drawings. For the sake of convenience, it is to be understood that the present invention is not limited to the above embodiments, and various changes and modifications may be made without departing from the scope of the present invention. Further, the terms used to describe the embodiments of the present invention are mainly defined in consideration of the functions of the present invention, and thus may be changed depending on the intentions and customs of the user and the operator. Therefore, the terminology should be interpreted based on the contents of the present specification throughout.

Embodiments of the present invention can be mainly used for manufacturing semiconductors, flat panel displays (FPD), solar cells, and the like. In particular, as a kind of flat panel display, it can be more suitable for manufacturing organic light emitting diodes (OLED), which are attracting attention as a next generation display due to high quality and simple manufacturing process.

1 and 2 are cross-sectional views illustrating a thin film deposition apparatus according to an embodiment of the present invention.

1 and 2, a thin film deposition apparatus according to an embodiment of the present invention includes a deposition chamber 10 having a gate 11 on a lower side thereof, a lower deposition chamber 10 disposed below the deposition chamber 10, A source chamber 20 provided with a gate 21 opposed to a gate 11 of the deposition chamber 10 and two gates 11 and 21 opposed to each other between the deposition chamber 10 and the source chamber 20 A gate valve 30 that connects or disconnects each other, a vacuum device 40 connected to the source chamber 20, a source injector 50 installed inside the deposition chamber 10, And a crucible moving device 70 for moving the crucible device 60. The crucible moving device 70 includes a crucible 60 and a crucible moving device 70,

The substrate 5 is brought into the deposition chamber 10 and is positioned above the source injection device 50 inside the deposition chamber 10. [ Although not shown, the deposition chamber 10 has a substrate entry / exit port through which the substrate 5 is loaded / unloaded, and the substrate entry / exit port can be opened / closed by an opening / closing device. Further, although not shown, the substrate 5 loaded into the deposition chamber 10 can be supported by the substrate holding apparatus.

When the gate valve 30 is operated to connect the two opposing gates 11 and 21 to each other and the vacuum device 40 is operated, the deposition chamber 10 and the source chamber 20 are brought together in a vacuum atmosphere . The vacuum device 40 may include a vacuum pump.

The crucible 60 is lifted by the crucible moving device 70 to couple the source spray device 50 and the crucible device 60 while the two gates 11 and 21 are connected to each other, The source of the thin film material is evaporated in the crucible apparatus 60 and the source injection apparatus 50 receives the evaporated source from the crucible apparatus 60 and injects the sprayed source, The source is moved to the upper substrate 5 and then deposited on the substrate 5 to form a thin film (see Fig. 2). At this time, the source which is a thin film material may be an organic material.

When the source is exhausted, the crucible 60 is lowered by the crucible moving device 70 to be separated from the source injection device 50, and the gate valve 30 is operated to close the two gates 11 and 21 (See Fig. 1), the vacuum atmosphere of the deposition chamber 10 can be maintained, and the source can be recharged to the crucible 60 in a state where only the vacuum atmosphere of the source chamber 20 is destroyed .

FIG. 3 is a cross-sectional view taken along the line AA in FIG. 1, FIG. 4 is an enlarged view of a portion B in FIG. 1, FIG. 5 is a perspective view showing a portion C in FIG. .

3 to 5, the source spray apparatus 50 includes a connection neck 51 having an introduction flow path 511 through which the evaporated source from the crucible apparatus 60 flows, a connection neck 51 A distribution pipe 52 having a plurality of distribution channels 521 having a structure branched from the introduction channel 511 of the connection channel 521 and a source injection port 525 communicating with the distribution channel 521, A distribution pipe housing 54 in which the neck housing 53 and the distribution pipe 52 are accommodated, a neck heater 55 for heating a source moved along the introduction channel 511, And a distributor pipe heater 56 for heating the discharge pipe heater 56.

The connecting neck 51 and the distributing pipe 52 may be made of a metal such as stainless steel, molybdenum, Mo, tungsten, W, or titanium. Alternatively, the connection neck 51 and the distribution pipe 52 may be made of alumina, zirconia, boron nitride (BN), pyrolytic boron nitride (PBN), aluminum nitride ) May be applied, or graphite or coated graphite may be applied.

The neck housing 53 and the distribution pipe housing 54 may also be made of the same or similar material as the connection neck 51 and the distribution pipe 52.

The introduction flow path 511 is formed so as to penetrate the connecting neck 51 in the vertical direction. 4, the connecting neck 51 is installed so that the inlet 512 of the introduction flow path 511 is opposed to the gate 11 of the deposition chamber 10 in the deposition chamber 10. Accordingly, the crucible 60 is coupled to the inlet 512 of the connection channel 51 at the inlet channel 511 side. For reference, a flange member for coupling the connecting neck 51 and the crucible 60 may be provided at the lower end of the connecting neck 51.

The distribution pipe 52 is connected to the upper end of the connection neck 51 which is the outlet 513 side of the introduction flow path 511. The distribution pipe 52 has a structure elongated in both the left and right directions from the outlet 513 of the introduction flow path 511. The distribution pipe 52 has a distribution channel 521 therein and the distribution channel 521 has a structure branched from the outlet 513 of the introduction channel 511 to the left and right. The distribution pipe 52 may be integrally formed with the connection neck 51.

The branching direction of the distribution passage 521 and the number of branching distribution passages 521 are not limited thereto and can be variously changed within a range capable of spraying the source to the substrate 5. [ In one example, the distribution flow path 521 may be provided in three or more and be disposed radially.

A flow of the source flowing out through the outlet 513 of the introduction flow path 511 is provided on the side of the outlet 513 of the introduction flow path 511 between the introduction flow path 511 and the plurality of distribution flow paths 521, And guide portions 515 for guiding each of them to the guide portion 521 side. The guide portion 515 is formed on the side of the outlet 513 of the introduction flow path 511 with inclined surfaces inclined to the left and right sides in the extension direction of the distribution flow path 521. [

A plurality of source injection ports 525 are provided. The source injection ports 525 are spaced apart from each other along the longitudinal direction of the distribution pipe 52 at the upper side of the distribution pipe 52. The source injection ports 525 may be arranged in a plurality of rows.

A nozzle 57 is detachably coupled to each of the source injection ports 525. And the discharge port of the nozzle 57 is exposed to the outside of the distribution pipe housing 54. A type in which some of the plurality of nozzles 57 have different injection quantities can be applied. Of course, by appropriately combining the nozzles 57 having different injection quantities through the replacement of the nozzles 57, the injection of the source may be performed in different amounts for each region.

The neck housing 53 and the distribution pipe housing 54 may be integrally formed. The neck heater 55 is composed of a plurality of linear heaters provided between the connection neck 51 and the neck housing 53 and located outside the connection neck 51. The distribution pipe heater 56 is connected to the distribution pipe 52 And a plurality of linear heaters provided between the distribution pipe housing 54 and the outside of the distribution pipe 52. The connection neck 51 and the distribution pipe 52 are heated by the neck heater 55 and the distribution pipe heater 56 and the source moved along the introduction channel 511 and the distribution channel 521 is heated by the heated connection neck The heat is radiated from the heat exchanger 51 and the distribution pipe 52, or the like.

For reference, the linear heater constituting the neck heater 55 and the distribution pipe heater 56 is a sheath type (a type in which a heating wire is inserted into a metal pipe and sealed with magnesium powder or aluminum oxide powder), a cartridge type Lt; / RTI >

The plurality of linear heaters constituting the neck heater 55 are arranged in the outer circumferential direction of the connection neck 51 and are spaced apart from each other along the longitudinal direction (vertical direction) of the introduction channel 511.

The plurality of linear heaters constituting the distribution pipe heater 56 are arranged in the longitudinal direction (lateral direction) of the distribution pipe 52 and spaced apart from each other along the outer peripheral direction of the distribution pipe 52.

3, at least one of the plurality of linear heaters constituting the distribution pipe heater 56 is disposed at a position close to the source injection port 525 on the upper side of the distribution pipe 52, and is arranged on the nozzle 57 side .

5, one or both ends of the plurality of linear heaters constituting the distribution pipe heater 56 are fixed in position through the ends of the distribution pipe housing 54, and the distribution pipe housing 54 May be coupled to a finishing cover 541 that protects the linear heater penetrating through the end portion.

The heat from the neck heater 55 and the distribution pipe heater 56 is reflected between the neck housing 53 and the neck heater 55 and between the distribution pipe housing 54 and the distribution pipe heater 56 to prevent heat loss Is disposed on the other side of the reflecting member (58, 59). The reflective members 58 and 59 may be attached to the inner surface of the neck housing 53 and the distribution pipe housing 54.

The vaporized source from the crucible device 60 is heated by the neck heater 55 in the process of passing through the introduction flow path 511 and flows into the distribution path 521 And is heated again by the distributor pipe heater 56 in the course of moving along the nozzle 57. In the process of being sprayed through the nozzle 57, the heater disposed on the nozzle 57 side among the linear heaters constituting the distributor pipe heater 56 And is heated again.

Therefore, even if the source supplied from the crucible apparatus 60 to the source injector 50 does not have uniform characteristics and thermal distribution, it is uniformly injected into the source injector 50, It is possible to have one characteristic and thermal distribution. Of course, it is also possible to prevent the characteristics of the source and the thermal distribution from being unevenly deteriorated in the process of being injected into the source spraying device 50 and being sprayed.

6 is a cross-sectional view showing a modified example of the source injecting apparatus 50. In the modification of FIG. 6, the same reference numerals as those of the source injecting apparatus 50 shown in FIG. (515-1). That is, the guide portion 515-1 of the modification of Fig. 6 has a structure that can more smoothly guide the flow of the source flowing out from the introduction flow path 511 toward the distribution flow paths 521, respectively. The guide portion 515-1 connects the introduction flow path 511 and the plurality of distribution flow paths 521 between the introduction flow path 511 and the plurality of distribution flow paths 521, To the side of the distribution passage 521 side.

According to the guide portion 515-1 as described above, the modification of Fig. 6 is constituted by a flow path which is inclined as a whole between the introduction flow path 511 and the distribution flow path 521, and the flow path from the introduction flow path 511 to the distribution flow path 521, The flow of the source can be naturally induced to the distribution flow paths 521 side without a large resistance. That is, it is possible to prevent the flow of the source from being delayed between the introduction flow path 511 and the distribution flow path 521.

Fig. 7 is a sectional view showing the crucible 60. Fig.

7, the crucible device 60 includes a crucible 61 containing a source, a crucible heating unit 62 provided so as to be positioned on the outer periphery of the crucible 61, A crucible housing 63 for housing the crucible housing 62, and a cooling unit 64 provided on the outer periphery of the crucible housing 63.

The crucible heating unit 62 provides heat for evaporating the source to the crucible 61 and the source contained in the crucible 61 is evaporated by the heating action of the crucible heating unit 62. That is, the crucible 61 is heated by the crucible heating unit 62, and the source is heated by radiant heat from the heated crucible 61, conductive heat or the like.

The crucible heating unit 62 may include a heater that surrounds the outer periphery of the crucible 61. The plurality of heaters of the crucible heating unit 62 are arranged so as to be located in different heating zones in the vertical direction and can be selectively controlled according to the height of the source contained in the crucible 61 individually controlled. As the heater of the crucible heating unit 62, there can be used an electric heating wire, a sheath heater (a heater in which a heating wire is inserted into a metal pipe and sealed with magnesium powder or aluminum oxide powder), a catridge heater and the like.

The crucible housing 63 includes a housing main body 631 formed to have a top opened structure and a reflective member 632 provided on the inner surface of the housing main body 631. Although not specifically shown, a heat insulating member may be interposed between the housing body 631 of the crucible housing 63 and the reflecting member 632. The housing main body 631 may be made of metal or ceramics capable of withstanding high temperatures. The reflecting member 632 of the crucible housing 63 reflects heat from the crucible heating unit 62 to prevent heat loss.

Although not specifically shown, the cooling unit 64 may include a cooling jacket and a cooling fluid supply means. The cooling jacket cools the crucible 61 by cooling the crucible housing 63 by the cooling fluid from the cooling fluid supply means.

8 is a cross-sectional view showing the crucible 61. Fig.

The crucible 61 may be made of stainless steel or a metal such as molybdenum (Mo), tungsten (W), or titanium (Ti). Alternatively, ceramics such as alumina, zirconia, boron nitride (BN), pyrolytic boron nitride (PBN), and aluminum nitride (AIN) may be used as the material of the crucible 61, and graphite or coated graphite may be applied.

8, the crucible 61 is provided with a source storage chamber 611 in which a source is contained and a source outlet 613 in which vaporized source from the source storage chamber 611 is discharged. And is provided between the source storage chamber 611 and the source outlet 613 to guide the moving direction of the radiant heat emitted into the crucible 61 toward the source storage chamber 611 side and the source outlet 613 side A direction changing means 614 is provided.

The crucible 61 is formed to have a structure in which the upper side is opened by the source outlet 613. The shape of the crucible 61 is generally cylindrical in shape as a whole (see Fig. 9)

The crucible 61 can be divided into upper, lower, and intermediate parts, and when the part is damaged, only the corresponding part can be replaced. Specifically, the crucible 61 includes a crucible main body 61A having a source containing chamber 611, a source emitting member 61B having a source outlet 613, a crucible main body 61A having a source outlet 613, And a radiation heat transfer member 61C having a radiation direction switching means 614.

The crucible main body 61A is formed so as to have the structure of a cylindrical container which is long and open on the top and bottom, and serves as a source containing chamber 611 inside. Both the source emitting member 61B and the radiant heat transmitting member 61C are formed so as to have a cylindrical structure with the top and bottom opened. The source emitting member 61B is formed to be flat and has the inside of the source outlet 613 communicating with the open top and bottom. Although not shown, a sealing member (not shown) that hermetically seals between the connecting neck 51 and the source emitting member 61B at the upper end of the source emitting member 61B when the source emitting device 50 and the crucible 60 are coupled, May be provided.

A radiating heat transfer member 61C is detachably coupled to the upper side of the crucible main body 61A and a source emitting member 61B is detachably coupled to the upper side of the radiant heat transmitting member 61C. The crucible main body 61A and the radiant heat transfer member 61C and the radiant heat transfer member 61C and the source emitting member 61B may be coupled to each other by a screw coupling method. For example, a male screw portion may be formed on the outer periphery of the upper side of the crucible main body 61A and a female screw portion may be formed on the inner circumference of the lower side of the radiating heat transfer member 61C to engage with the male screw portion on the upper side of the crucible main body 61A. A female screw portion may be formed on the inner circumference of the upper side of the radiant heat transmitting member 61C and a male screw portion may be formed on the outer circumference of the lower side of the source radiating member 61B to engage with the female screw portion of the upper side of the radiant heat transmitting member 61C.

9 is a sectional view taken along the line A-A in Fig. 8 (a cross-sectional view).

8 and 9, the crucible main body 61A has a heat transfer column 612 protruding upward from the bottom of the source storage chamber 611 at a predetermined height and positioned at the center of the source storage chamber 611 .

The heat transfer columns 612 are composed of a slender central portion erected in the vertical direction, a plurality of wing portions protruding from the central portion and spaced apart from each other along the outer circumferential direction and formed in a plate shape, thereby having a generally radial cross section. The heat transfer column 612 having such a radial structure has a heat transfer area that is further increased with respect to the source. Preferably, the heat transfer column 612 is formed with a pointed end.

When the wall and bottom of the crucible main body 61A are heated by the crucible heating unit 62, the heat transfer columns 612 receive heat mainly from the bottom of the crucible main body 61A by conduction phenomenon and are heated.

It is preferable that the heat transfer columns 612 are integrally formed in the crucible main body 61A on the effective heat conduction surface between the bottom of the crucible main body 61A and the heat transfer columns 612. [

According to such a crucible main body 61A, the sidewall located on the side of the edge portion of the source storage chamber 611 is mainly heated by the radiant heat and the conductive heat from the wall of the heated crucible main body 61A, 611 are heated mainly by the radiant heat and the conductive heat from the heated heat transfer columns 612. That is, the edge-side source and the center-side source of the source housing chamber 611 can be heated together.

10 is a perspective view showing the radiant heat transfer member 61C.

Referring to Figs. 8 and 10, the radiant heat transfer member 61C has a neck portion (refer to reference numerals 615 and 616) formed so that the intermediate portion has a constricted structure.

The neck portion has a first inclined portion 615 formed in such a shape that its periphery is gradually reduced from the upper side (the side of the source accommodating chamber 611 to the side of the source outlet 613), the first inclined portion 615 disposed on the upper side of the first inclined portion 615 And a second inclined portion 616 formed in a shape such that its circumference gradually decreases from the lower side (the direction of the source outlet chamber 613 side to the side of the source accommodating chamber 611). The upper end of the first inclined portion 615 and the lower end of the second inclined portion 616 are connected to each other.

According to the neck portion, the radiant heat-transfer member 61C has a constricted structure in the middle thereof, so that it has a larger absorption area with respect to radiant heat from the crucible heating unit 62. [

The radiant heat emitted from the first inclined portion 615 to the inside of the crucible 61 is directed toward the source accommodation chamber 611 side since the inside of the first inclined portion 615 faces the side of the source accommodation chamber 611 . The radiant heat from the first inclined portion 615 mainly heats the source contained in the source storage chamber 611 and evaporates in the source storage chamber 611 to heat the source moved to the inside of the radiant heat transfer member 61C ). &Lt; / RTI >

Since the inside of the second inclined portion 616 faces the side of the source outlet 613, the radiant heat emitted from the second inclined portion 616 to the interior of the crucible 61 is shifted toward the source outlet 613 side . Radiant heat from the second inclined portion 616 can be used to heat (prevent coagulation) of the evaporated source, which is mainly moved to the source outlet 613 side through the inside of the radiant heat transfer member 61C.

The first inclined portion 615 and the second inclined portion 616 that switch the moving direction of the radiant heat emitted from the neck portion to the inside of the crucible 61 toward the source housing chamber 611 side and the source outlet 613 side, (614).

The radiation heat transfer member 61C is formed with grooves along the outer circumferential direction between the first inclined portion 615 and the second inclined portion 616 on the outer circumference by the neck portion. The first inclined portion 615 and the second A plurality of ribs 617 are provided in the grooves between the inclined portions 616.

The plurality of ribs 617 may be spaced apart from each other along the circumferential direction of the radiant heat transfer member 61C in the groove between the first inclined portion 615 and the second inclined portion 616. [

According to the plurality of ribs 617, the radiant heat transfer member 61C has a structurally further improved strength and an increased absorption area for radiant heat from the crucible heating unit 62. [

1, 2 and 7, the crucible moving device 70 includes an operating member 71 and an operating member 71 which are connected to the bottom surface of the crucible housing 63 and moved together with the crucible 60, And a driving means (72) for moving the crucible (60) by moving the crucible (60).

The operating member 71 may extend downward from the crucible 60 and pass through the source chamber 20 so that the lower end thereof is exposed to the outside. The driving means 72 may include a screw rod that is rotated in both directions (positive and negative directions) by the motor and is screwed with the operating member 71. Alternatively, the drive means 72 may be of a type including a linear drive mechanism, such as a pneumatic or hydraulic cylinder.

7, a shock absorber 80 is provided between the crucible housing 63 and the actuating member 71 to absorb impact generated when the crucible 60 is coupled to the source injector 50 .

The shock absorber 80 includes a movable member 81 which is provided so as to be movable in the up and down direction (in a direction away from and approaching the crucible housing 63) on the bottom surface of the crucible housing 63, a movable member 81, And a plurality of shock absorbing members (82) provided between the first and second shock absorbing members (63).

The operating member (71) is coupled to the movable member (81). The shock absorbing member 82 may be a coil spring or a rubber pad capable of absorbing shock by using an elastic force.

The embodiment of the present invention as described has a heat transfer column 612 for heating the center side source in the source storage chamber 611 and a heat transfer column 612 for heating the center side source in the source storage chamber 611, A first inclined portion 615 and a second inclined portion 616 for switching the direction of movement of the radiant heat radiated into the inside of the source accommodating chamber 611 and the source outlet 613 side and the first inclined portion 615, The source and the center side source of the source storage chamber 611 are connected to the crucible heating unit 62 from the crucible heating unit 62 by the ribs 617 which increase the absorption area for heat between the first inclined portion 616 and the second inclined portion 616 The heat from the crucible heating unit 62 can be efficiently utilized.

Therefore, it is possible to prevent a relatively large amount of the source from remaining in the center portion side of the source accommodation chamber 611, and it is possible to prevent the evaporated source from having uneven characteristics such as a part of the source is incompletely evaporated or a part of the evaporated source is solidified. It is possible to improve the uniformity of the thin film.

Since the source supplied from the crucible apparatus 60 to the source spray apparatus 50 is continuously heated by the neck heater 55 and the distribution pipe heater 56, It is possible to uniformize the thermal distribution more reliably, thereby greatly improving the uniformity of the thin film.

On the other hand, unlike the above description, the crucible apparatus 60 may have a configuration in which the crucible housing 63 and the cooling unit 64 are excluded. The crucible 61 has a structure in which the heat transfer columns 612 and the radiation direction switching means 614 are excluded but a general type having the source storage chamber 611 and the source outlet 613 as they are .

A gate valve 35 is provided between the source chamber 20 and the vacuum device 40 and a vacuum device 40 is provided inside the source chamber 20, The vacuum chamber 40 and the source chamber 20 are connected to each other so that the vacuum atmosphere forming action of the vacuum chamber 40 can be applied.

While the present invention has been described in connection with what is presently considered to be the most practical and preferred embodiments, it is to be understood that the invention is not limited to the disclosed embodiments, but, on the contrary, is intended to cover various modifications and equivalent arrangements included within the spirit and scope of the invention.

For example, in the above, the radiation direction switching means 614 is constituted by the first inclined portion 615 and the second inclined portion 616, and the moving direction of the radiant heat emitted from the neck portion into the crucible 61 is the source The neck portion is configured to have only one of the first inclined portion 615 and the second inclined portion 616 so that it is possible to prevent the copying The direction switching means 614 may be configured to switch the moving direction of the radiant heat emitted from the neck portion to the inside of the crucible 61 only in one direction of the source housing chamber 611 side and the source outlet 613 side .

The source injection apparatus 50 and the crucible apparatus 60 are applied to the thin film deposition apparatus having the deposition chamber 10 and the source chamber 20 so that the crucible apparatus 60 is attached to the source injection apparatus 50 The source injection device 50 and the crucible device 60 may be installed together in one chamber. That is, the substrate carried in the chamber (upper region) is disposed, the crucible 60 is installed in a position (lower region) facing the substrate in the chamber, and the source spraying device 50 And may be mounted to the crucible device 60 to provide a vaporized source to the substrate.

5: substrate 10: deposition chamber
20: source chamber 30: gate valve
40: Vacuum device 50: Source injection device
51: connection neck 52: minute piping
53: neck housing 54: distribution pipe housing
55: Neck heater 56: Distribution pipe heater
57: nozzle 58, 59: reflective member
60: Crucible device 61: Crucible
61A: Crucible main body 61B: Source emitting member
61C: Radiation heat transfer member 62: Heating unit
63: crucible housing 64: cooling unit
70: Crucible moving device 511:
515: Guide part 521: Distribution channel
525: Source nozzle

Claims

A neck having an introduction flow path through which a vaporized source flows;
A distribution pipe connected to the neck and having a plurality of distribution channels having a structure branched from the introduction channel and a source nozzle communicated with the distribution channel;
And a plurality of linear heaters for heating a source moved along the distribution channel.
Thin film evaporation source injection device.

The method according to claim 1,
Wherein the plurality of linear heaters are arranged on the outer circumference of the distribution pipe in the longitudinal direction of the distribution pipe and spaced apart along the circumferential direction of the distribution pipe,
Thin film evaporation source injection device.

The method of claim 2,
Wherein at least one of the plurality of linear heaters is disposed at a position close to the source-
Thin film evaporation source injection device.

The method according to claim 1,
The source spray device includes a distribution pipe housing in which the distribution pipe is accommodated; And a reflecting member disposed between the distribution pipe and the distribution pipe housing,
Wherein the plurality of linear heaters are disposed between the distribution pipe and the reflective member,
Thin film evaporation source injection device.

The method according to claim 1,
And a guide portion for guiding a flow of a source flowing out from the introduction flow path to the plurality of distribution flow paths is provided between the introduction flow path and the plurality of distribution flow paths,
Thin film evaporation source injection device.

The method of claim 5,
Wherein the guide portion comprises a guide path connecting the introduction path and the plurality of distribution paths respectively and inclined from the introduction path to the plurality of distribution paths,
Thin film evaporation source injection device.

The method according to claim 1,
Wherein the plurality of source injection openings are provided in the distributing pipe at intervals along the longitudinal direction,
Thin film evaporation source injection device.

The method according to claim 1,
Further comprising a neck heater composed of a plurality of linear heaters for heating a source moved along said introduction flow path,
Thin film evaporation source injection device.

A neck having an introduction flow path through which a vaporized source flows;
A distribution pipe connected to the neck and having a plurality of distribution channels having a structure branched from the introduction channel and a source nozzle communicated with the distribution channel;
And a neck heater configured by a plurality of linear heaters for heating a source moved along the introduction flow path.
Thin film evaporation source injection device.

A deposition chamber having a gate; A source injector accommodated in the deposition chamber and injecting a vaporized source to the substrate; A source chamber having a gate facing the gate of the deposition chamber; A crucible accommodated in the source chamber; And a crucible moving device for moving the crucible device so that the crucible device can be detached from the source spray device through the opposite gate,
Wherein the source-
A neck coupled to the crucible apparatus and having an introduction flow path through which the evaporated source from the crucible apparatus flows;
A distribution pipe connected to the neck and having a plurality of distribution channels having a structure branched from the introduction channel and a source nozzle communicated with the distribution channel;
And a heater composed of a plurality of linear heaters for heating a source moved along at least one of the introduction channel and the distribution channel,
Thin Film Deposition Equipment.

The method of claim 10,
Further comprising a shock absorber for absorbing an impact generated when the crucible is coupled to the source sprayer,
Thin Film Deposition Equipment.