KR20150060682A - Exposure/rendering device, exposure/rendering system, program, and exposure/rendering method - Google Patents

Abstract

An exposure drawing apparatus, an exposure drawing system, a program, and an exposure drawing method are provided that can prevent an image which does not correspond to each other on each surface when an image is drawn on both surfaces of the substrate. Which is represented by the first operation information 60A by exposing the first surface based on the first operation information 60A in which the image information representing the image to be drawn on the first surface of the substrate is associated with the exposure condition information, A plurality of second operation information (60B) in which image information representing an image to be drawn on the second surface of the substrate and exposure condition information are respectively associated with the second operation information On the basis of the second operation information (60B) having the same exposure condition information as the exposure condition information indicated by the first operation information (60A) used for drawing the image on the first surface of the information (60A) An image represented by the second job information is drawn on the second surface by exposing the second surface of the substrate to which the image is drawn.

Description

TECHNICAL FIELD [0001] The present invention relates to an exposure apparatus, an exposure system, a program, and an exposure method, and more particularly to a system and method for exposing /

The present invention relates to an exposure apparatus, an exposure imaging system, a program, and an exposure imaging method. More particularly, the present invention relates to an exposure apparatus and an exposure system for imaging an image on both surfaces of a substrate to be exposed, And an exposure imaging method for imaging an image on both sides of a substrate to be exposed.

Conventionally, an exposure apparatus for exposing a light beam modulated based on image information to a substrate, which is a printed substrate, and drawing an image on the substrate has been developed. In order to draw an image on both surfaces of the substrate to be exposed, two of these exposure apparatus are used in parallel so that one side is used for drawing the first side and the other side is used for drawing the second side opposite to the first side An exposure drawing system is also being developed. In this exposure drawing system, after the image is drawn on the first surface of the substrate to be exposed by the exposure apparatus for the first surface, the substrate is transported to a predetermined position of the exposure apparatus for the second surface, An image is drawn on the second surface of the substrate to be exposed by the apparatus.

As a technique related to this exposure drawing system, Japanese Patent Application Laid-Open No. 2005-325819 discloses a technique for improving the throughput of a process of conveying a substrate to be subjected to image drawing on the first and second surfaces of the substrate to be exposed using two exposure apparatuses An exposure system is disclosed.

Each of the exposure apparatus includes a stage on which a substrate is mounted, a stage moving means for moving the stage in a straight line, a beam scanning means for scanning the beam on the first surface of the substrate, And a drawing unit having means. Each of the exposure apparatus includes an upstream unit disposed on an upstream side of the drawing unit, and a downstream unit disposed on a downstream side of the drawing unit, the moving direction of the stage. Each of the exposure apparatus has a carrying means for holding the substrate of the upstream unit and moving the substrate in the drawing unit in such a manner that the substrate is moved in the same direction as the moving direction of the stage. Each of the exposure apparatus includes a carrying-out means for holding the substrate on the stage in the drawing unit and moving the substrate in the carrying direction to carry the substrate to the downstream unit.

In each of the exposure apparatus, when a light beam is scanned on the first surface of the substrate to be exposed, the stage is moved from the upstream side to the downstream side in the conveying direction, the substrate to be transferred is carried into the stage located on the upstream side, And the substrate to be exposed is carried out from the stage.

Japanese Patent Laid-Open No. 2002-341550

Generally, when an image is drawn on a substrate to be exposed using an exposure apparatus, an operator is required to specify the image to be drawn on the substrate to be exposed to the exposure apparatus and the operation information . When a same image is continuously drawn on a plurality of substrates to be exposed under the same exposure conditions, a series of processes in the job information are collectively shown. Then, the exposure apparatus draws an exposure pattern on the substrate based on the input operation information.

In the exposure system described in Patent Document 1, each of the two exposure apparatuses is used to image an image on one side of the substrate to be exposed. Therefore, the operator inputs the job information of the first side to one of the exposure apparatus, The operation information of the second side is input to the exposure apparatus of the side. In this way, since the operator inputs work information separately for each of the exposure apparatus, there is a problem that when the operator makes an input mistake, there is a possibility that an image not corresponding to each other on each surface of the substrate is drawn.

In addition, there is a case where the exposed substrate in one of the exposure apparatuses fails in the exposure imaging process and becomes a defective substrate. In this case, when the work information input to the other exposure apparatus is not updated even when the work information is input correctly, there is a possibility that an image which does not correspond to each other on each surface of the substrate is drawn .

SUMMARY OF THE INVENTION The present invention has been made in view of the above problems and provides an exposure apparatus, an exposure imaging system, a program, and a computer program product capable of preventing an image, which does not correspond to each other on each surface, from being drawn when an image is drawn on both surfaces of the substrate, And to provide an exposure drawing method.

In order to achieve the above object, an exposure apparatus according to the present invention is characterized in that the exposure apparatus is provided with an exposure apparatus for exposing a first surface of a substrate to be exposed, based on first operation information corresponding to image information representing an image to be imaged, A first drawing unit configured to draw an image represented by the first operation information on the first surface by exposing a surface of the substrate to be exposed on the first surface, and a second drawing unit configured to draw an image representing an image to be drawn on a second surface opposite to the first surface of the substrate, A storage means for storing a plurality of pieces of second operation information in which information and exposure condition information representing exposure conditions are respectively associated with the first operation information, Which is the same as the exposure condition information indicated by the first operation information used for drawing an image on the first surface And second drawing means for drawing an image represented by the second operation information on the second surface by exposing the second surface of the substrate to which the image is drawn on the first surface based on the second operation information, .

According to the exposure apparatus of the present invention, based on the first operation information associated with the image information representing the image to be imaged on the first surface of the substrate and the exposure condition information representing the exposure condition by the first imaging means, An image represented by the first job information is drawn on the first surface by exposing the first surface.

Here, in the present invention, a plurality of second operations, in which image information representing an image to be drawn on a second surface opposite to the first surface of the substrate to be exposed by the storage means and exposure condition information representing exposure conditions respectively correspond to each other Information is stored. In the present invention, among the plurality of second job information stored in the storage means by the second drawing means, the first drawing means is used for drawing the image of the first surface of the substrate, The second surface of the substrate to which the image is drawn on the first surface is exposed on the basis of the second operation information having the same exposure condition information as the exposure condition information indicated by the operation information, Is imaged on the second side.

As described above, according to the exposure apparatus of the present invention, the image is drawn on the second surface using the second operation information having the same exposure condition information as the exposure condition information of the first operation information used when the image is drawn on the first surface When an image is drawn on both surfaces of the substrate, it is possible to prevent an image that does not correspond to each other on each surface from being drawn.

Further, in the exposure apparatus according to the present invention, it is preferable that the exposure conditions include a size of the substrate to be exposed, a number of the substrate to be exposed on the substrate, and marks for determining an image drawing area on the substrate An arrangement pattern of the marks in the case of the first substrate, and a germanium pattern of the substrate. Thus, an image can be drawn on each surface of the substrate to be exposed under the applied exposure conditions.

According to another aspect of the present invention, there is provided an exposure system, comprising: a substrate; a first substrate; a first substrate; a first substrate; First drawing means for drawing an image represented by the first operation information on the first surface by exposing the first surface and second drawing means for drawing an image represented by the first operation information on the first surface by using the first drawing means And a transmission unit that transmits the exposure condition information of the first operation information to the second surface of the substrate, and a transmission unit that transmits the image information to the second surface opposite to the first surface of the substrate, The exposure condition information indicating the exposure condition information indicating the exposure condition information indicating the exposure condition information, And the second job information having the same exposure condition information as the exposure condition information received by the receiving means from the plurality of second job information stored by the storage means, And second drawing means for drawing an image represented by the second operation information on the second surface by exposing the second surface of the substrate to which the image is drawn by the drawing means on the second surface, And an exposure apparatus.

According to the exposure drawing system of the present invention, the first drawing operation of the first exposure apparatus in which the image information representing the image to be drawn on the first surface of the substrate is associated with the exposure condition information representing the exposure condition An image represented by the first job information is drawn on the first surface by exposing the first surface based on the information. The transmitting means of the first exposure apparatus transmits the exposure condition information of the first operation information used for drawing the image on the first surface of the substrate to be exposed by the first imaging means.

On the other hand, in the exposure drawing system according to the present invention, by the second storage means of the second exposure apparatus, image information representing an image to be drawn on the second surface opposite to the first surface of the substrate and exposure conditions And a plurality of pieces of second operation information corresponding to exposure condition information are stored. Further, the exposure condition information transmitted by the transmitting means is received by the receiving means of the second exposure apparatus. The second exposure apparatus may further include second exposure means for detecting exposure conditions of the second exposure apparatus based on the second exposure information stored in the storage means by the second imaging means of the second exposure apparatus, An image represented by the second work information is drawn on the second surface by exposing the second surface of the substrate to which the image is drawn by the first drawing means on the basis of the job information.

As described above, according to the exposure system of the present invention, by using the second operation information having the same exposure condition information as the exposure condition information of the first operation information used when the second exposure apparatus draws the image on the first surface, It is possible to prevent an image which does not correspond to each other on each surface when the image is drawn on both surfaces of the substrate.

Further, the exposure system according to the present invention may be configured such that the transmitting means of the first exposure apparatus transmits the exposure condition information when the drawing by the first drawing means is normally completed. Accordingly, it is possible to prevent an image that does not correspond to each other on each surface when the image is drawn on both surfaces of the substrate to be more reliably compared with the case where the present invention is not applied.

Further, in the exposure drawing system according to the present invention, when the drawing by the first drawing means is abnormally ended, the transmitting means of the first exposure apparatus may transmit error information indicating that an error has occurred. Accordingly, it is possible to prevent an image that does not correspond to each other on each surface when the image is drawn on both surfaces of the substrate to be more reliably compared with the case where the present invention is not applied.

The exposure system according to the present invention is characterized in that the second exposure apparatus includes exposure condition information identical to the exposure condition information received by the receiving means in the plurality of second operation information stored in the storage means Further comprising accepting means for accepting selection of any one of the second job information among the plurality of second job information when a plurality of the second job information exist, And the drawing means may draw an image on the second surface based on the second operation information received by the accepting means. Thus, even when there are a plurality of pieces of second work information having the same exposure condition information as the exposure condition information of the first work information used when the image is drawn on the first surface, when images are drawn on both surfaces of the substrate, It is possible to prevent images that do not correspond to each other from being drawn.

The exposure system according to the present invention may further comprise second storage means for storing the first operation information and the second operation information, and second exposure means for exposing the first operation information stored by the second storage means to the first exposure And a second transmitting means for transmitting the second operation information to the drawing apparatus and for transmitting the second operation information to the second exposure apparatus, wherein the first exposure apparatus comprises: Further comprising second receiving means for receiving the first job information obtained by the first receiving means, wherein the first drawing means of the first exposure apparatus uses the first job information received by the second receiving means, And the second exposure apparatus is configured to draw an image represented by the first job information on the first surface, Further comprising: a new device, and may be that the storage means of the second exposure drawing device for storing the plurality of the second operation information received by the third reception means. Accordingly, the entire system can be managed by the control device as a whole.

Particularly, in the exposure drawing system according to the present invention, the control device further includes second accepting means for accepting input of the first operation information and the second operation information, and the second storage means of the control device And the first job information and the second job information received by the second receiving means may be stored. Thus, it is possible to draw an image corresponding to each other on each surface of the substrate to be exposed using the operation information inputted by the user.

According to another aspect of the present invention, there is provided an exposure system, comprising: a substrate; a first substrate; a first substrate; a first substrate; First drawing means for drawing an image represented by the first operation information on the first surface by exposing the first surface and second drawing means for drawing an image represented by the first operation information on the first surface by using the first drawing means And a first transmission means for transmitting the exposure condition information of the first operation information to the second surface of the substrate, and a second transmission means for transmitting the image information representing the image to be drawn on the second surface opposite to the first surface of the substrate, Storage means for storing a plurality of pieces of second operation information each of which corresponds to exposure condition information indicating an exposure condition, A first receiving means for receiving the first job information and the second job information from the second receiving means, the first receiving means receiving the first job information and the second receiving means receiving the second job information, A second receiving means for receiving the second job information transmitted by the second transmitting means and a second receiving means for receiving the second job information received by the second receiving means A second drawing unit that draws an image represented by the second job information on the second surface by exposing the second surface of the substrate to which the image is drawn by the first drawing unit on the basis of the second drawing information, And a second exposure apparatus having a second exposure apparatus.

According to the exposure drawing system of the present invention, the first drawing operation of the first exposure apparatus in which the image information representing the image to be drawn on the first surface of the substrate is associated with the exposure condition information representing the exposure condition An image represented by the first job information is drawn on the first surface by exposing the first surface based on the information. In addition, the first transmitting means of the first exposure apparatus transmits the exposure condition information of the first operation information used for drawing the image on the first surface of the substrate to be imaged by the first imaging means.

On the other hand, in the exposure drawing system according to the present invention, the image information representing the image to be drawn on the second surface opposite to the first surface of the substrate to be exposed and the exposure condition information representing the exposure condition And a plurality of second job information corresponding thereto is stored. Further, the exposure condition information transmitted by the first transmitting means is received by the first receiving means of the control apparatus. The second job information having the same exposure condition information as the exposure condition information received by the first receiving means among the plurality of second job information stored by the storage means by the second transmitting means of the control device Is transmitted.

Further, in the exposure drawing system according to the present invention, the second operation information transmitted by the second transmitting means is received by the second receiving means of the second exposure apparatus, and the second operation information transmitted to the second drawing means of the second exposure apparatus And the second operation information received by the second receiving means is exposed by the first drawing means to expose the second surface of the substrate to which the image is drawn on the first surface, Is imaged on the second side.

As described above, according to the exposure system of the present invention, when the control device draws the image on the first surface received from the first exposure apparatus, the second operation information having the same exposure condition information as the exposure condition information of the first operation information It is possible to prevent an image which does not correspond to each other on each surface when the image is drawn on both surfaces of the substrate to be exposed without adding a new function to the exposure apparatus.

Further, in the exposure drawing system according to the present invention, it is preferable that the exposure conditions include a size of the substrate to be exposed, the number of the substrate to be exposed on the substrate to be exposed, and a mark formed to determine an image drawing area on the substrate An arrangement pattern of the marks in the case of the first substrate, and a germanium pattern of the substrate. Thus, an image can be drawn on each surface of the substrate to be exposed under the applied exposure conditions.

According to another aspect of the present invention, there is provided a program for causing a computer to function as a first operation A first control means for drawing an image represented by the first job information on the first surface by exposing the first surface on the basis of the information on the first surface of the substrate, Among a plurality of pieces of second operation information in which image information representing an image to be imaged on the opposite second surface and exposure condition information representing exposure conditions respectively correspond to each other, an image of the first surface of the substrate to be imaged On the basis of the second operation information having the same exposure condition information as the exposure condition information of the first operation information used for rendering the image on the first surface Hwahan by exposing the second surface of an exposed substrate to function as a second control means for imaging the image represented by the second work information to the second side.

Therefore, the program according to the present invention makes it possible to operate the computer in the same manner as the exposure apparatus according to the present invention. Therefore, when an image is drawn on both surfaces of the substrate to be exposed as in the exposure apparatus, Can be prevented from being drawn.

In order to attain the above object, according to the present invention, there is provided an exposure method, comprising: a first drawing operation, in which image information representing an image to be drawn on a first surface of a substrate is associated with exposure condition information representing an exposure condition, A first control step of drawing an image represented by the first job information on the first surface by exposing the first surface on the basis of information on the first surface of the substrate, Among a plurality of pieces of second operation information in which image information representing an image to be imaged on the opposite second surface and exposure condition information representing exposure conditions respectively correspond to each other, an image of the first surface of the substrate to be imaged On the first surface based on the second operation information having the same exposure condition information as the exposure condition information of the first operation information used for drawing the first operation information By exposing the second surface of an exposed substrate and a second control step for imaging the image represented by the second work information to the second side.

Therefore, according to the exposure imaging method of the present invention, similarly to the exposure imaging apparatus according to the present invention, when an image is drawn on both surfaces of the substrate to be exposed, an image not corresponding to each other on each surface is drawn You can prevent it from going away.

(Effects of the Invention)

According to the present invention, when an image is drawn on both surfaces of the substrate, it is possible to prevent an image which does not correspond to each other on each surface from being drawn.

BRIEF DESCRIPTION OF DRAWINGS FIG. 1 is a schematic plan view showing the entire configuration of an exposure and drawing system according to an embodiment; FIG.
2 is a perspective view showing a configuration of a first exposure apparatus and a second exposure apparatus according to the embodiment.
3A is a schematic plan view showing an exposure area of an exposure head and an arrangement pattern of an exposure head according to the embodiment.
3B is a schematic plan view showing an image area of an image to be imaged on the substrate to be exposed by the exposure head according to the embodiment.
4 is a partially cutaway perspective view showing a configuration of the reversing device according to the embodiment.
Fig. 5 is a block diagram showing the configuration of a front-end machine of the first and second exposure-drawing apparatuses according to the embodiment; Fig.
6 is a block diagram showing a configuration of a front machine of the control apparatus according to the embodiment.
7A is a schematic diagram showing an example of job information according to the embodiment.
7B is a schematic diagram showing an example of job information according to the embodiment.
8 is a flowchart showing the flow of processing of the job setting process program according to the first embodiment.
9 is a configuration diagram showing an example of the configuration of a job input screen according to the first embodiment.
10 is a schematic diagram provided for explanation of exposure drawing processing by the exposure drawing system according to the first embodiment.
11 is a flowchart showing the flow of processing of the first job execution processing program according to the first embodiment.
12 is a flowchart showing the flow of processing of the second job execution processing program according to the first embodiment.
13 is a configuration diagram showing a configuration example of a job selection screen according to the first embodiment.
14 is a flowchart showing the flow of processing of the job setting process program according to the second embodiment.
15 is a flowchart showing the flow of processing of the first job execution processing program according to the second embodiment.
16 is a flowchart showing the flow of processing of the job selection processing program according to the second embodiment.
17 is a flowchart showing the flow of processing of the second job execution processing program according to the second embodiment.

[First Embodiment]

Hereinafter, an exposure apparatus according to an embodiment will be described in detail with reference to the accompanying drawings. In each embodiment, the present invention is described as an example in which the present invention is applied to an exposure system for drawing a light beam onto a substrate (a substrate to be described later) to draw an image representing a circuit pattern. The substrate C is a flat board such as a printed wiring board or a glass substrate for a flat panel display.

1, the exposure and drawing system 1 according to the present embodiment includes a first exposure apparatus 2 for performing exposure on the first surface of the substrate C and a second exposure apparatus 2 for performing exposure on the substrate And a second exposure apparatus (3) for performing exposure on a second surface opposite to the first surface. The exposure system 1 includes an inverting device 4 and a pinhole device 4 disposed between the first and second exposure apparatus 2 and 3 for reversing the front and back surfaces of the substrate C, And a control device (5) for controlling exposure to the first and second surfaces of the optical substrate (C).

The second exposure apparatus 3 and the control apparatus 5 are connected by a wire cable 8a between the first exposure apparatus 2 and the control apparatus 5 and between the second exposure apparatus 3 and the control apparatus 5, Is communicated between the first and second exposure apparatus 2 and 3 via the cable 8a. Similarly, the first exposure apparatus 2 and the second exposure apparatus 3 are connected by a wire cable 8b, and each of these exposure apparatus is communicated via a wire cable 8b.

Next, the configurations of the first and second exposure apparatus 2 and 3 according to the present embodiment will be described. Since the first exposure apparatus 2 and the second exposure apparatus 3 have the same configuration, the first exposure apparatus 2 will be described here and the second exposure apparatus 3 will be described with reference to FIG. The description will be omitted.

As shown in Fig. 2, the first exposure apparatus 2 according to the present embodiment includes a stage 10 in the form of a flat plate for fixing the substrate C to be exposed. In addition, a plurality of suction holes (not shown) for sucking air are formed on the upper surface of the stage 10. When the substrate 10 is mounted on the stage 10, the air between the substrate 10 and the substrate 10 is sucked in through the suction holes so that the substrate 10 is held on the stage 10 Vacuum adsorbed.

The stage 10 is held in a flat plate-like base 12 movably provided on the upper surface of the base 11 in the form of a table. That is, one or a plurality (two in this embodiment) of the guide rails 14 are provided on the upper surface of the base 11. The base 12 is held so as to freely move along the guide rail 14, and is driven by a driving mechanism (a stage driving unit 42 described later) constituted by a motor and the like. The stage 10 moves along the guide rail 14 in association with the movement of the base 12.

In the following description, the direction in which the stage 10 is moved is defined as the Y direction, the direction perpendicular to the Y direction is defined as the X direction, and the direction orthogonal to the Y direction within the vertical direction is defined as the Z direction.

On the upper surface of the base 11, a door 15 of a door shape is installed so as to extend over two guide rails 14. The substrate (C) mounted on the stage (10) moves the opening of the gate (15) along the guide rail (14). An upper portion of the opening of the gate 15 is provided with an exposure section 16 for exposing a light beam toward the opening. The light beam is exposed on the upper surface of the substrate C mounted on the stage 10 when the stage 10 moves along the guide rail 14 and is located in the opening by the exposure unit 16. [

The exposure section 16 according to the present embodiment includes a plurality (16 in this embodiment) of exposure heads 16a. Each of the exposure heads 16a is arranged in a matrix form in the exposure section 16. [ The optical fiber 18 drawn out from the light source unit 17 to be described later and the signal cable 20 drawn out from the image processing unit 19 to be described later are connected to the exposure section 16, respectively.

Each of the exposure heads 16a has a digital microdevice (DMD) as a reflection type spatial light modulation element. The exposure head 16a modulates the light beam from the light source unit 17 by controlling the DMD based on the image information input from the image processing unit 19. [ The first exposure apparatus 2 exposes the substrate C to light by irradiating the substrate C with the modulated light beam. The spatial light modulation element is not limited to a reflection type, and may be a transmissive spatial light modulation element such as a liquid crystal.

As shown in Fig. 3A, the image area P1, which is an area exposed by the exposure head 16a, has a rectangular shape in which one side is inclined at a predetermined inclination angle with respect to the moving direction (Y direction) of the stage 10. 3A shows only a part of a plurality of exposure heads 16a according to the present embodiment. 3B, when the stage 10 is moved in the opening of the gate 15, the light beam is exposed to the substrate C by the exposure head 16a. As the stage 10 moves, The region P2 on which the strip-shaped exposure is completed is formed in the optical substrate C for each exposure head 16a. Each of the exposure heads 16a arranged in a matrix is arranged so that the length of the longer side of the image area P1 in the X direction is shifted by a distance that is a natural multiple (one time in this embodiment). Each of the regions P2 in which exposure has been completed is partially overlapped with the region P2 in which adjacent exposure is completed.

As shown in Fig. 2, on the upper surface of the base 11, there is further provided a gate-shaped gate 22 provided so as to extend over two guide rails 14. The substrate C mounted on the stage 10 moves the opening of the gate 22 along the guide rail 14.

In the upper part of the opening of the gate 22, one or a plurality of (three in this embodiment) photographing parts 23 for photographing the opening are attached. The photographing section 23 is a CCD camera or the like incorporating a strobe having a very short light emitting time. A rail 23a is provided in an upper portion of the opening of the gate 22 along a direction (X direction) perpendicular to the moving direction (Y direction) of the stage 10 in a horizontal plane, Each of which is guided by a rail 23a and is movably installed. The upper surface of the substrate C mounted on the stage 10 is photographed when the stage 10 moves along the guide rail 14 and is located at the opening by the photographing unit 23. [

1 and 2, the first exposure apparatus 2 includes a first transfer section 6 for transferring a substrate C from the outside to a predetermined position of the first exposure apparatus 2, And a second transport section 7 for transporting the substrate C from the first exposure apparatus 2 to a predetermined position of the inverting apparatus 4. [ Similarly, the second exposure apparatus 3 includes a first transfer section 6 for transferring the substrate C from the reversing device 4 to a predetermined position of the second exposure apparatus 3, C to the outside of the second exposure apparatus 3 by the second transfer section 7.

The first carry section 6 and the second carry section 7 have a plurality of rotating rollers and a driving motor for rotating the rotating rollers. Each of the plurality of rotating rollers is laid in parallel, and one end of the rotating roller is attached with a sprocket or a pulley receiving a rotational force transmitted by a belt or a wire. As means for transmitting the rotational force of the driving motor for rotating the rotating roller, a conveying method using a cylindrical magnet in addition to a belt or a wire may be adopted.

2, the first exposure apparatus 2 conveys the substrate C, which has been transported to the predetermined position by the first transport section 6, from the predetermined position to the stage 10 And an auto carrier hand (hereinafter referred to as an AC hand) The AC hand 24 is formed in a flat plate shape and is movable in X and Z directions. A plurality of suction holes (25) for sucking air are formed on the lower surface of the AC hand (24). When the lower surface of the AC hand 24 is moved to a position in contact with the upper surface of the substrate C to be exposed, the AC hand 24 moves the air between the AC hand 24 and the substrate C to the suction hole 25 So that the substrate C is vacuum-adsorbed on the lower surface of the AC hand 24 to be adsorbed and held. When the AC hand 24 is moved to the upper surface of the stage 10 with the substrate C being held on the lower surface of the AC hand 24, the substrate C is pushed downward A pressing portion 26 capable of moving in the Z direction to be pressed against the stage 10 is formed.

The AC hand 24 of the first exposure apparatus 2 attracts and holds the substrate C of the unexposed light carried to the first carrying section 6 and moves upward, . The AC hand 24 of the first exposure apparatus 2 can move the first surface mounted on the upper surface of the stage 10 upward by attracting and holding the exposed substrate C on which the exposure has been completed, The substrate C is moved to the second carry section 7. The exposed substrate C on which the first surface moved to the second carry section 7 has been exposed is carried out of the first exposure apparatus 2 by the second carry section 7. [

The AC hand 24 of the second exposure apparatus 3 is configured such that the first surface conveyed to the first conveying section 6 adsorbs and moves upward the exposed substrate C on which the exposure has been completed, The substrate 10 to be exposed is mounted on the upper surface of the stage 10. The AC hand 24 of the second exposure apparatus 3 is moved upward by attracting and holding the exposed substrate C on which the first surface and the second surface mounted on the upper surface of the stage 10 have been exposed And the substrate C is moved to the second transporting unit 7. Then, The exposed substrate C on which the first and second faces have been moved to the second carry section 7 is carried out of the exposure system 1 by the second carry section 7.

Next, the configuration of the reversing device 4 according to the present embodiment will be described.

As shown in Fig. 4, the reversing device 4 is provided with a flat sub-frame 30 rotatably supported on a rotary shaft L. The sub frame 30 reverses the front and back sides of the substrate C by rotating the substrate 180 in the state of holding the substrate C inside.

4, the substrate C is carried into the sub frame 30 on the side of the side of the sub frame 30 where the first exposure apparatus 2 is located An inlet 31 is formed. A plurality of roller pairs 34 driven by a motor 33 are provided in the subframe 30. The roller pair 34 carries the substrate C held inside the sub frame 30 in a sandwich state. The substrate C is conveyed by the pair of rollers 34 to the inside of the sub frame 30 via the inlet port 31 and the front and back sides are reversed by the rotation of the sub frame 30, 34 to the outside of the subframe 30 through the inlet 31. [ The sub frame 30 is rotated 180 degrees again to bring the next substrate C into the inside when the substrate C is taken out of the substrate.

Next, a description will be given of the construction of the entire first exposure apparatus 2 and the second exposure apparatus 3 according to the present embodiment. The first exposure apparatus 2 and the second exposure apparatus 3 will be described herein with respect to the first exposure apparatus 2 in order to have the same electrical machine configuration and the second exposure apparatus 3 ) Will be omitted.

5, the first exposure apparatus 2 is provided with a system control section 40 electrically connected to each unit of the apparatus. The system control section 40 controls the first exposure apparatus 2, Are controlled in a general manner. The first exposure apparatus 2 includes a work storage section 41, a stage driving section 42, a display device 43, an input device 44, a photographing drive section 46, and an external input / output section 48 I have.

The system control unit 40 has a CPU (Central Processing Unit), a RAM (Random Access Memory), a ROM (Read Only Memory), and a HDD (Hard Disk Drive). The system control unit 40 outputs the light beam from the light source unit 17 at the timing corresponding to the movement of the stage 10 by the CPU and outputs the corresponding image information by the image processing unit 19 . The system control unit 40 thus controls the exposure of the light beam to the substrate C by the exposure head 16a.

The job storage unit 41 has a RAM or a nonvolatile memory and stores job information indicating a job to be executed. In the operation in this embodiment, the same image is exposed on the first surface of one or a plurality of the substrate C of the same type under the same conditions, and the same image is also formed on the second surface under the same conditions And is a collective exposure processing request for exposure drawing. Details of the job information will be described later. In the present embodiment, the job storage unit 41 stores the job information of the job to be executed in a list format, but is not limited to this, and may be stored in a queue format.

The stage driving unit 42 has a driving mechanism configured by a motor or a hydraulic pump and drives the stage 10 under the control of the system control unit 40. [

The display device 43 is a display means such as a liquid crystal monitor for displaying various information under the control of the system control section 40. [

The input device 44 is an input means such as a touch sensor or an operation button for inputting various information by user's operation.

The photographing drive section 46 has a drive mechanism constituted by a motor or a hydraulic pump and drives the photographing section 23 under the control of the system control section 40. [

The external input / output unit 48 performs input / output of various information with the various information processing apparatuses including the second exposure apparatus 3 and the control apparatus 5 connected to the first exposure apparatus 2. The external input / output unit 48 of the second exposure apparatus 3 also includes a first exposure apparatus 2 connected to the second exposure apparatus 3 and various information processing apparatuses And outputs various kinds of information.

Next, the configuration of the electric machine of the control device 5 according to the present embodiment will be described.

As shown in Fig. 6, the control apparatus 5 is provided with a control section 50 for controlling the exposure drawing processing in the exposure drawing system 1. As shown in Fig. The control unit 5 also includes a storage unit 51 having a ROM and an HDD for storing programs and various data required for the exposure drawing process by the control unit 50. [ The storage unit 51 also stores job information, a job setting processing program, a first job execution processing program, a second job execution processing program, and a job selection processing program of the second embodiment.

The control device 5 includes a display section 52 such as a liquid crystal display for displaying various information under the control of the control section 50 and an input section 53 such as a keyboard or a mouse for inputting various information by user operation Respectively. The control device 5 also has a communication interface 54 for transmitting and receiving various information to the first and second exposure apparatus 2 and 3 under the control of the control unit 50 have.

Here, the control device 5 according to the present embodiment accepts input of information about a job by a user operation. The control device 5 also generates job information corresponding to each of the first and second exposure apparatus 2 and 3 when accepting the input of information about the job, To the corresponding exposure apparatus. The first exposure apparatus 2 and the second exposure apparatus 3 according to the present embodiment store the received job information in the job storage unit 41 when receiving the job information, The exposure processing of the substrate C is performed. At this time, when the first exposure apparatus 2 according to the present embodiment stores a plurality of pieces of job information, it executes the tasks represented by the pieces of job information in the order in which the pieces of job information are received. Further, the second exposure apparatus 3 according to the present embodiment sequentially executes the operations corresponding to the operations executed in the first exposure apparatus 2.

In generating the work information, the control device 5 controls the first exposure apparatus 2 to include operation information 60A for drawing an image on the first surface of the substrate C and a second exposure apparatus 3, the work information 60B for drawing an image on the second surface of the substrate C is generated. In other words, even in the case of the work for the same substrate C, the exposure information of the first surface and the surface of the second surface are respectively subjected to the exposure processing with the exposure apparatus, And job information 60B are separately generated.

The job information 60A and 60B are information in which the job identification information 61, the image information 62 and the exposure condition information 63 correspond to each job as shown in Figs. 7A and 7B as an example. The job identification information 61 is information for identifying each job. The image information 62 is information indicating an image to be rendered. The exposure condition information 63 is information indicating an exposure condition for exposing a light beam in order to image an image corresponding to the substrate C to be exposed. The exposure condition information 63 according to the present embodiment includes substrate size information indicating the substrate size of the substrate C to be imaged (hereinafter, referred to as " target substrate "), Information. The exposure condition information 63 according to the present embodiment includes mark information indicating the arrangement pattern of the mark when the mark for determining the drawing area of the image corresponding to the target substrate is formed, And information on germanium species indicating the germanium species. However, the information included in the exposure condition information 63 is not limited to these, and any information may be used as long as it is information used when performing the exposure operation such as information indicating the intensity of the light beam, information indicating the moving speed of the stage 10, .

The worker inputs each piece of information included in the work information 60A and 60B via the input unit 53 to the control device 5 (the second exposure apparatus 3) when the first exposure apparatus 2 and the second exposure apparatus 3 want to execute the work ). Accordingly, the control device 5 generates the job setting information 60A for the first side and the job information 60B for the second side on the basis of the input information, and stores the job setting information 60B for the second side in the storage section 51 I do.

Next, the operation of the exposure and drawing system 1 according to the present embodiment will be described with reference to FIG. 8 is a flowchart showing the flow of the process of the job setting process program executed by the control section 50 of the control device 5 when the execution instruction is inputted through the input section 53. [ The program is stored in a predetermined area of the ROM of the storage unit 51 in advance.

First, in step S101, control is performed to display a job input screen for assisting input of information about a job by the user on the display unit 52. [ As shown in Fig. 9, the job input screen 70 according to the present embodiment has a drawing target face selection box 71 for selecting whether the input is related to the job on the first side or the job on the second side. The job input screen 70 also has an image input column 72 for inputting image identification information representing an image to be rendered. The image identification information is a file name of a file including image information, a URL (Uniform Resource Locator) indicating a destination of an image file, and the like. The work input screen 70 has a substrate type input column 73 for inputting substrate type information indicating the substrate type of the substrate C to be subjected to the work to be input. The work input screen 70 has a drawing number input column 74 for inputting drawing number information indicating the number of drawings of the substrate C in the target work. In addition, the job input screen 70 has an input end button 75 for designating information indicating that input has been completed. Further, when each information is input to each of the input boxes, a selection candidate may be displayed for each input box by a list display or the like, and any one of the displayed selection candidates may be selected through the input unit 53. [ The user selects the face to be drawn in the drawing object face selection box 71 using the input unit 53 and designates the input end button 75 after inputting information corresponding to each input field.

Thus, in the next step S103, the process waits until the input end button 75 is designated, and waits until input of the information about the job is completed.

In the next step S105, the work information 60A, 60B is generated based on the drawing target plane selected by the drawing target face selection column 71 and each information input to each input column, and the generated work information 60A, 60B And stores it in the storage unit 51. At this time, when the first face is selected in the drawing object face selection box 71, the control unit 50 sets the image information of the image represented by the information input to the image input field 72 as the image information 62, And generates the job information 60A on the first side with the information inputted to the first side 74 as the drawing number information. In the work information 60A, substrate size information, mark information, and in-line type information are determined from the information input in the substrate type input column 73. [ That is, in the exposure and drawing system 1 according to the present embodiment, the substrate size information, the mark information, and the sensitive material information are associated with each substrate type of the substrate C and stored in the storage unit 51. In the exposure and drawing system 1 according to the present embodiment, substrate size information, mark information, and in-line type information corresponding to the substrate type indicated by the information input to the substrate type input column 73 are stored in the substrate of the work information 60A Size information, mark information, and in-line type information.

When the second face is selected in the drawing object face selection box 71, the control unit 50 sets the image information of the image represented by the information input to the image input field 72 as the image information 62, And generates the job information 60B on the second side as the drawing number information as the information inputted to the job information storage section 74. [ In addition, the control unit 50 determines and applies the substrate size information, mark information, and in-plane type information to the work information 60B in the same manner as the work information 60A.

In the next step S107, it is judged whether or not the job information generated in the process of the step S105 is the job information 60A of the first side. If an affirmative determination is made in step S107, the process proceeds to step S109, and the generated job information 60A is transmitted to the first exposure apparatus 2 via the wired cable 8a. On the other hand, the first exposure drawing device 2 stores the received job information 60A in its job storage unit 41. [

On the other hand, if a negative determination is made in step S107, it is regarded that the job information generated by the processing in step S105 is the job information 60B on the second side, and the process proceeds to step S111.

In step S111, after transmitting the created job information 60B to the second exposure apparatus 3 via the wired cable 8a, the present job setting processing program is terminated. On the other hand, the second exposure apparatus 3 stores the received job information 60B in the job storage unit 41 thereof.

As described above, in the exposure and drawing system 1 according to the present embodiment, as shown in Fig. 10, the control device 5 determines the operation information 60A on the first side and the operation on the second side Information 60B. The job information 60A on the first side generated by the control device 5 is stored in the order received in the job storage unit 41 of the first exposure apparatus 2, (60B) are stored in the order received in the job storage unit (41) of the second exposure apparatus (3).

When the first exposure apparatus 2 receives and stores the job information 60A from the control device 5, the first exposure apparatus 2 uses the stored job information 60A in accordance with a predetermined user operation, A first job execution process for drawing an image on one side is performed.

Next, the operation of the first exposure apparatus 2 at the time of executing the first job execution processing according to the present embodiment will be described with reference to Fig. 11 is a flowchart showing the flow of processing of the first job execution processing program executed by the system control unit 40 of the first exposure apparatus 2 at this time. The program is stored in a predetermined area of the ROM provided in the system control unit 40 in advance. The timing at which the program is executed is not limited to the timing according to the predetermined user operation, and may be the timing at which the task information 60A is received.

Initially, in step S200, control is performed to display the job information 60A stored in the job storage unit 41 on the display device 43. [ At this time, when a plurality of pieces of work information 60A are stored, the system control section 40 controls to display each piece of work information 60A in a list format. The user places the substrate C of the number of pixels indicated by the drawing number information of the job information 60A to be executed on the upstream side of the first carry section 6 of the first exposure apparatus 2 . Then, the user inputs an execution instruction of the job indicated by the specified job information 60A by selecting and designating the displayed job information 60A through the input device 44. [

In the next step S201, the process waits until the execution instruction of the job is input. In the next step S203, the job information 60A corresponding to the job for which execution is instructed (hereinafter referred to as " The image information 62 is acquired. In the present embodiment, when acquiring the image information 62 of the image to be rendered, the image information (image information 62 of the job information 60A) stored in the job storage unit 41 is acquired , But it is not limited thereto. That is, the image identification information may be given to the job information 60A, and the image information of the image to be drawn based on the image identification information may be acquired from the control device 5 or an external storage device.

In the next step S205, the exposure conditions at the time of drawing an image on the substrate C are determined by execution of the execution first surface operation. At this time, the system control unit 40 determines the exposure conditions based on the substrate size information, the drawing number information, the mark information, and the imprinting type information in the job information 60A of the execution first side job. In the present embodiment, first, the system control section 40 photographs the mark formed on the substrate C by the photographing section 23, and measures the position of the mark from the image obtained by photographing. Further, the system control section 40 determines a drawing area for drawing an image based on the position of the measured mark. In addition, the system control unit 40 transforms the image to be rendered on the basis of the determined size and shape of the rendering area. Then, the system control unit 40 determines the intensity of the light beam to be exposed, the moving speed of the stage 10 (or the exposure time of the light beam), and the like in accordance with the grading material indicated by the grading material information.

In the next step S207, exposure exposure processing for exposing a light beam to the substrate C in accordance with the determined exposure conditions to draw an image is started. In the exposure drawing processing according to the present embodiment, the system control section 40 draws the deformed image on the substrate C by exposing the light beam modulated based on the deformed image with the exposure head 16a.

In the next step S209, it is determined whether or not a predetermined error has occurred. At this time, the system control unit 40 controls the position of the portion to be used for performing the deformation and positioning defect of the substrate C, the exposure of the light source unit 17, the image processing unit 19, and the exposure unit 16 It is determined that an error has occurred, for example, when the exposure imaging process is stopped in the middle due to a failure or the like. If an affirmative determination is made in step S209, the process proceeds to step S211, and error information indicating that an error has occurred is sent to the control device 5 to end the main-job-1 job execution processing program. On the other hand, the control apparatus 5 that has received the error information performs control to display the error information on the display unit 52. [ Further, the system control unit 40 may transmit the error information to the second exposure apparatus 3. On the other hand, the second exposure apparatus 3 that receives the error information performs control to display the error information on the display device 43, or displays the operation information 60B ).

On the other hand, when an affirmative determination is made in step S209, the process proceeds to step S213.

In step S213, it is determined whether or not the exposure imaging operation on one substrate to be exposed C has been completed. If an affirmative determination is made in step S213, the process returns to step S209, whereas if an affirmative determination is made in step S213, the process proceeds to step S215.

In step S215, the exposure condition information 63 of the executed first surface operation is transmitted to the second exposure apparatus 3. In the present embodiment, the exposure condition information 63 for the first surface operation is transmitted from the first exposure apparatus 2 to the second exposure apparatus 3, but the present invention is not limited to this. That is, the information to be transmitted may be information that includes the exposure condition information 63 of the first surface operation of the second exposure apparatus 3, and therefore, for example, the operation information 60A itself may be used. The information to be transmitted may be predetermined information (for example, only the substrate size information, the substrate size and the mark information, etc.) included in the exposure condition information 63 of the execution first surface work.

In the next step S217, it is determined whether or not the execution first side work is completed. At this time, the system control unit 40 determines that the execution of the first side surface operation is completed when the number of times of the drawing operation indicated by the drawing information on the exposure condition information 63 is completed for the exposure substrate C .

If a negative determination is made in step S217, the process returns to step S209. On the other hand, if an affirmative determination is made, the first job execution processing program is terminated.

The second exposure apparatus 3 according to the present embodiment receives the exposure condition information 63 of the execution first surface operation from the first exposure apparatus 2 and outputs the exposure condition information 63 and the control apparatus 5, On the second surface of the substrate C, based on the work information 60B received from the second work execution unit 60B.

Next, referring to Fig. 12, the operation of the second exposure apparatus 3 at the time of executing the second job execution processing according to the present embodiment will be described. 12 is a flowchart showing the flow of processing of the second job execution processing program executed by the system control unit 40 of the second exposure apparatus 3 at this time. The program is stored in a predetermined area of the ROM provided in the system control unit 40 in advance. The timing at which the program is executed is not limited to the timing at which the job identification information of the job to be executed is received but may be the timing at which a predetermined execution instruction is input by the user through the input device 44. [

First, in step S301, the job information 60B having the same exposure condition information 63 as the received exposure condition information 63 of the executed first side job is stored in the job information 60B stored in the job storage unit 41 ) Are present in a plurality of areas.

If an affirmative determination is made in step S301, the process advances to step S303 to perform control to display on the display device 43 a job selection screen 76 for assisting the user in selecting a job. 13, the job selection screen 76 according to the present embodiment includes a selection button 77 for selecting any one of the job information 60B stored in the job storage unit 41, And a non-selection button 78, The user designates any one of the selection buttons 77 or non-selection buttons 78 by using the input device 44.

In the next step S304, the process waits until any of the selection buttons 77 or the non-selection buttons 78 is selected.

In the next step S305, it is determined whether or not any one of the jobs is selected. At this time, when any one of the selection buttons 77 is selected, the system control unit 40 determines that one of the jobs is selected (affirmative determination), and when the non-selection button 78 is selected, (Negative determination).

If an affirmative determination is made in step S305, the process proceeds to step S309, which will be described later, with the selected job as a target of execution (hereinafter referred to as " execution second side job "). On the other hand, if a negative determination is made in step S305, the process proceeds to step S317, and error information indicating that the job is not selected is sent to the control device 5 to end the second job execution processing program. On the other hand, the control unit 5 performs control to display the received error information on the display unit 52. [

On the other hand, if a negative determination is made in step S301, the process proceeds to step S307.

In step S307, the job information 60B stored in the job storage unit 41 indicates the job on the second side having the same exposure condition information 63 as the received exposure condition information 63 of the received first side job It is determined whether or not there is only one job information 60B.

If a negative determination is made in step S307, the process advances to step S317 to transmit error information indicating that there is no job to be executed to the control device 5 and ends the second job execution processing program. On the other hand, the control unit 5 performs control to display the received error information on the display unit 52. [

On the other hand, when an affirmative determination is made in step S307, the job information 60B determined to exist by the processing of step S307 is set as the execution second side job, and the process proceeds to step S309. At this time, the job information 60B judged to exist by the processing of the step S307 may be displayed on the display device 43, and the input of the execution instruction of the job indicated by the job information 60B may be received. In this case, after accepting the input of the execution instruction, the process proceeds to step S309.

In step S309, the image information 62 of the image to be drawn on the second surface of the substrate C is acquired from the job information 60B of the execution second surface job. In the present embodiment, when acquiring the image information 62, the image information (image information 62 of the job information 60B) stored in the job storage unit 41 is acquired. However, It does not. That is, the image identification information may be given to the job information 60B, and the image information of the image to be drawn based on the image identification information may be acquired from the control device 5 or an external storage device.

In the next step S311, an exposure condition for drawing an image on the substrate to be exposed C is determined in the execution second surface work which is a work to be executed. At this time, based on the substrate size information, the drawing number information, the mark information, and the reducing type information in the job information 60B of the executed second side job in the same manner as in step S205, the system control unit 40 sets the exposure conditions .

For example, as shown in FIGS. 7A and 7B, it is assumed that the job A and the job A 'have the same exposure condition information 63, and the job B and the job B' have the same exposure condition information 63. FIG. 10, in the first exposure apparatus 2, the operation information 60A of the operation A for drawing an image corresponding to the first surface, the operation information 60A of the operation B, and the like It is assumed that it is memorized. In the second exposure apparatus 3, it is assumed that the operation information 60B of the operation A 'and the operation information 60B of the operation B' for drawing an image corresponding to the second surface are stored. In this state, when the operation A is executed in the first exposure apparatus 2, the operation A 'having the same exposure condition information 63 as the operation A is executed in the second exposure apparatus 3.

In the next step S313, the exposure drawing processing for exposing the light beam to the substrate C in accordance with the determined exposure conditions in the same manner as the processing of step S207 of the above-described first job execution processing program and drawing an image is started.

In the next step S315, it is determined whether or not a predetermined error has occurred. At this time, the system control unit 40 controls the position of the portion to be used for performing the deformation and positioning defect of the substrate C, the exposure of the light source unit 17, the image processing unit 19, and the exposure unit 16 It is determined that an error has occurred, for example, when the exposure imaging process is stopped in the middle due to a failure or the like. If an affirmative determination is made in step S315, the process proceeds to step S317, and error information indicating that an error has occurred is transmitted to the control device 5 to end the second job execution processing program. On the other hand, the control unit 5 performs control to display the received error information on the display unit 52. [

On the other hand, when an affirmative determination is made in step S315, the process proceeds to step S319.

In step S319, it is determined whether or not the exposure imaging process on the substrate C is completed. If the determination is negative in step S319, the process returns to step S315. On the other hand, if the determination is affirmative, the process proceeds to step S321.

In the next step S321, it is determined whether or not the execution second side work has been completed. At this time, the system control unit 40 determines that the execution second surface operation is completed when the number of times of drawing of the exposure condition information 63 in the exposure condition information 63 is completed for the exposure substrate C . If a negative determination is made in step S321, the process proceeds to step S323.

In step S323, the process waits until it receives exposure condition information for drawing an image for the next substrate to be exposed C in the execution second surface operation.

In the next step S325, it is determined whether or not the received exposure condition information is the same as the exposure condition information of the operation information 60B of the execution second surface. When an affirmative determination is made in step S325, the execution of the execution second side job is continued, and the process proceeds to step S315. On the other hand, if a negative determination is made in step S325, the process proceeds to step S317, and error information indicating that exposure condition information different from the exposure condition information of the job information 60B of the execution second side job has been received is sent to the control device 5 to finish the first job execution processing program.

On the other hand, when an affirmative determination is made in the step S321, the main work execution processing program is terminated.

[Second Embodiment]

Hereinafter, the exposure and drawing system 1 according to the second embodiment will be described in detail with reference to the accompanying drawings.

In the first embodiment, the information indicating the execution of the first surface operation is transmitted from the first exposure apparatus 2 to the second exposure apparatus 3, and the operation corresponding to the second exposure apparatus 3 is selected . On the other hand, in the second embodiment, the information indicating the execution first side work is transmitted from the first exposure apparatus 2 to the control device 5 to select a corresponding job in the control device 5, 2 exposure-imaging apparatus 3. The exposure-

The configuration of the exposure system 1 according to the second embodiment is the same as that of the exposure system 1 according to the first embodiment, and a description thereof will be omitted here.

Next, the operation of the control device 5 when executing the job setting process according to the present embodiment will be described with reference to Fig. 14 is a flowchart showing the flow of processing of the job setting process program executed by the control section 50 of the control device 5 at this time. The program is stored in a predetermined area of the ROM of the storage unit 51 in advance.

First, in steps S401 to S405, the same processing as in steps S101 to S105 of the first embodiment is performed.

In the next step S407, the generated job information 60A on the first side is transmitted to the first exposure apparatus 2 via the wired cable 8a, and the job setting processing program is terminated. The first exposure apparatus 2 stores the received job information 60A in the job storage unit 41. [

The first exposure drawing device 2 stores the operation information 60A and performs a first operation for drawing an image on the first surface of the substrate C based on the operation information 60A in accordance with a predetermined user operation And performs execution processing.

Next, referring to Fig. 15, the operation of the first exposure apparatus 2 at the time of executing the first job execution processing according to the present embodiment will be described. 15 is a flowchart showing the flow of processing of the first job execution processing program executed by the system control unit 40 of the first exposure apparatus 2 at this time. The program is stored in a predetermined area of the ROM provided in the system control unit 40 in advance. The timing at which the program is executed is not limited to the timing according to the predetermined user operation, but may be the timing at which the task information 60A is received.

In steps S500 to S513, processing similar to steps S201 to S213 of the first embodiment is performed.

In step S515, exposure condition information 63 in the job information 60A of the first side job to be executed is transmitted to the control device 5. [

In the next step S517, the same processing as step S217 of the first embodiment is performed, and the first job execution processing program is terminated.

The control apparatus 5 according to the present embodiment receives the exposure condition information of the job information 60A from the first exposure apparatus 2 and displays the exposure information received from the job information 60B stored in the storage section 51 A work selection process for selecting the work information 60B having the same exposure condition information as the condition information is performed.

Next, the operation of the control device 5 when executing the job selection process according to the present embodiment will be described with reference to Fig. 16 is a flowchart showing the flow of processing of the job selection processing program executed by the control unit 50 of the control apparatus 5 at this time. The program is stored in a predetermined area of the ROM of the storage unit 51 in advance. The timing at which the program is executed is not limited to the timing at which the exposure condition information is received, but may be a timing at which a predetermined execution instruction is input by the user through the input unit 53, or the like.

First, in step S601, of the job information 60B on the second surface stored in the storage section 51, the exposure information 63 having the same exposure condition information 63 as the received exposure condition information 63 of the received first surface job It is determined whether or not the job information 60B on the two sides exists.

If the determination in step S601 is affirmative, the process proceeds to step S605. In step S605, the job information 60B of the second side having the same exposure condition information 63 as the exposure condition information 63 of the first side job is subjected to the second exposure To the drawing apparatus 3 via the wired cable 8a. The second exposure apparatus 3 stores the received job information 60B on the second surface in the job storage unit 41. [

On the other hand, if a negative determination is made in step S601, the process proceeds to step S605, and the job information 60B on the second side having the same exposure condition information 63 as the exposure condition information 63 of the first side job is present Is displayed on the display unit 52. The error information indicating that the error information is not displayed is displayed on the display unit 52. [

The second exposure apparatus 3 according to the present embodiment receives the job information 60B on the second side from the control device 5 and then outputs the job information 60B on the second side to the substrate C based on the received job information 60B, A second job execution process for drawing an image on the second side of the first job is executed.

Next, the operation of the second exposure apparatus 3 at the time of executing the second job execution processing according to the present embodiment will be described with reference to Fig. 17 is a flowchart showing the flow of processing of the second job execution processing program executed by the system control unit 40 of the second exposure apparatus 3 at this time. The program is stored in a predetermined area of the ROM provided in the system control unit 40 in advance. The timing at which the program is executed is not limited to the timing at which the task information 60B is received, but may be a timing at which a predetermined execution instruction is input by the user through the input device 44. [

First, in steps S701 to S705, the same processing as in steps S301 to S305 of the first embodiment is performed.

In steps S707 to S723, the same processing as in steps S309 to S325 of the first embodiment is performed to terminate the second job execution processing program.

1: Exposure imaging system 2: First exposure apparatus
3: second exposure apparatus 4: inverting apparatus
5: Control device 10: Stage
16a: Exposure head 40:
41: work storage unit 50: control unit
51: storage unit 60A: first job information
60B: second operation information C:

Claims (12)

Exposing the first surface on the basis of first job information in which image information representing an image to be rendered on a first surface of the substrate is associated with exposure condition information indicating exposure conditions, First drawing means for drawing the first surface on the first surface,
Storage means for storing a plurality of pieces of second operation information each of which is associated with image information representing an image to be drawn on a second surface opposite to the first surface of the substrate to be exposed and exposure condition information representing exposure conditions,
Which is the same as the exposure condition information indicated by the first operation information used for rendering the image on the first surface of the substrate to be exposed, by the first drawing means among the plurality of second operation information stored in the storage means Exposing the second surface of the substrate to which the image is drawn on the first surface based on the second operation information having the exposure condition information to draw an image represented by the second operation information on the second surface And a second drawing means for drawing an image on the screen. The method according to claim 1,
Wherein the exposure conditions are determined based on at least one of a size of the substrate to be exposed, an exposure number of the substrate to be exposed, an arrangement pattern of the mark when a mark for determining an image drawing area is formed on the substrate, And at least one of a germanium species of the optical substrate. Exposing the first surface on the basis of first job information in which image information representing an image to be rendered on a first surface of the substrate is associated with exposure condition information indicating exposure conditions, First drawing means for drawing the first surface on the first surface, and
And a transmitting means for transmitting the exposure condition information of the first job information used for drawing an image on the first surface of the substrate to be subjected to the first drawing means,
Storage means for storing a plurality of pieces of second operation information each of which is associated with image information representing an image to be drawn on a second surface opposite to the first surface of the substrate to be exposed and exposure condition information representing exposure conditions,
Receiving means for receiving the exposure condition information transmitted by the transmitting means,
Based on the second job information having the same exposure condition information as the exposure condition information received by the receiving means from the plurality of second job information stored by the storage means, And second drawing means for drawing the image represented by the second operation information on the second surface by exposing the second surface of the substrate to which the image is drawn on the surface thereof The exposure system comprising: The method of claim 3,
Wherein the transmitting means of the first exposure apparatus transmits the exposure condition information when the drawing by the first drawing means is normally completed. The method according to claim 3 or 4,
Wherein said transmitting means of said first exposure apparatus transmits error information indicating that an error has occurred when the drawing by said first drawing means has ended abnormally. 6. The method according to any one of claims 3 to 5,
The second exposure apparatus includes a second exposure information storage unit that stores the second exposure information stored in the second exposure information storage unit in a case where a plurality of second operation information items having the same exposure condition information as the exposure condition information received by the receiving unit exist And reception means for accepting the selection of any one of the second job information in the plurality of existing job information,
Wherein said second drawing means of said second exposure apparatus draws an image on said second surface based on said second operation information received by said accepting means. 7. The method according to any one of claims 3 to 6,
Second storage means for storing the first job information and the second job information,
And second transmitting means for transmitting the first operation information stored by the second storage means to the first exposure apparatus and transmitting the second operation information to the second exposure apparatus, Further comprising:
The first exposure apparatus includes second receiving means for receiving the first job information transmitted by the second transmitting means,
Wherein the first drawing means of the first exposure apparatus draws an image represented by the first operation information on the first surface by using the first operation information received by the second receiving means,
The second exposure apparatus includes third receiving means for receiving the second job information transmitted by the second transmitting means,
Wherein said storage means of said second exposure apparatus stores a plurality of said second job information received by said third receiving means. 8. The method of claim 7,
The control device further comprises second accepting means for accepting input of the first operation information and the second operation information,
Wherein the second storage means of the control device stores the first operation information and the second operation information received by the second reception means. Exposing the first surface on the basis of first job information in which image information representing an image to be rendered on a first surface of the substrate is associated with exposure condition information indicating exposure conditions, First drawing means for drawing the first surface on the first surface, and
And a first transmitting means for transmitting the exposure condition information of the first work information used for drawing an image on the first surface of the substrate to be subjected to the first drawing means,
Storage means for storing a plurality of pieces of second operation information each of which is associated with image information representing an image to be drawn on a second surface opposite to the first surface of the substrate to be exposed and exposure condition information representing exposure conditions,
First receiving means for receiving the exposure condition information transmitted by the first transmitting means,
And second transmitting means for transmitting the second job information having the same exposure condition information as the exposure condition information received by the first receiving means among the plurality of second job information stored by the storage means [0001]
Second receiving means for receiving the second job information transmitted by the second transmitting means, and
On the basis of the second job information received by the second receiving means, the second surface of the substrate to which the image is drawn by the first drawing means on the first surface, And second drawing means for drawing an image represented by the second image on the second surface. 10. The method according to any one of claims 3 to 9,
Wherein the exposure conditions include at least one of a size of the substrate to be exposed, a number of the exposure target of the substrate to be exposed, an arrangement pattern of the mark when the mark for determining the image drawing area is formed on the substrate, And at least one of a patterned substrate of the substrate to be exposed. Computer,
The first drawing information is exposed on the first drawing means based on the first operation information in which image information representing an image to be drawn on the first surface of the substrate is associated with exposure condition information indicating an exposure condition, First control means for rendering an image represented by said first image on said first surface,
Among the plurality of second operation information in which image information representing an image to be drawn on a second surface opposite to the first surface of the substrate to be exposed and exposure condition information representing an exposure condition are respectively associated with the second imaging means, And a second image forming unit for forming an image on the first surface based on the second operation information having the same exposure condition information as the exposure condition information of the first operation information used for drawing the image on the first surface of the substrate, And second control means for drawing an image represented by the second operation information on the second surface by exposing the second surface of the drawn substrate to be exposed. The first drawing information is exposed on the first drawing means based on the first operation information in which image information representing an image to be drawn on the first surface of the substrate is associated with exposure condition information indicating an exposure condition, A first control step of drawing an image represented by the first image on the first surface,
Among the plurality of second operation information in which image information representing an image to be drawn on a second surface opposite to the first surface of the substrate to be exposed and exposure condition information representing an exposure condition are respectively associated with the second imaging means, And a second image forming unit for forming an image on the first surface based on the second operation information having the same exposure condition information as the exposure condition information of the first operation information used for drawing the image on the first surface of the substrate, And a second control step of drawing an image represented by the second operation information onto the second surface by exposing the second surface of the drawn substrate to be exposed.

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