KR20150017284A - Touch Panel for Implementing Touch Sensor of One-Layer and Method for Making the Same - Google Patents

Abstract

A method for manufacturing a touch panel comprises a step for forming a plurality of first axis electrostatic electrodes, which corresponds to a window area of the touch panel and is separated at constant intervals, by using a transparent conductive layer and forming a plurality of metal leading wires, which is an edge area of the touch panel connected to the end unit of each second axis electrostatic electrode which is separated from each first axis electrostatic electrode at constant intervals, by using a metal layer; a step for forming a transparent photosensitive material on the front side of the touch panel and opening an area in which a metal electrode part of each metal leading wire is positioned in a position connected to the end unit of the second axis electrostatic electrode among the transparent photosensitive material; a step for forming a conductive transparent electrode on the front side of the touch panel, forming a plurality of second axis electrostatic electrodes comprising the conductive transparent electrode, and electrically connecting the end unit of each second axis electrostatic electrode and the metal electrode part of each metal leading wire; and a step for forming an upper insulating film layer by using an insulating material having a refractive index which is different from the refractive index of the conductive transparent electrode on the upper sides of the second axis electrostatic electrodes. The present invention is provided to simplify an existing process for manufacturing the touch panel, thereby improving productivity.

Description

BACKGROUND OF THE INVENTION 1. Field of the Invention [0001] The present invention relates to a touch panel and a method of manufacturing a touch sensor,

The present invention relates to a method of manufacturing a touch panel, and more particularly, to a touch panel which realizes a touch sensor of one layer by performing a jumping connection outside a window area without jumping connection with a bridge in a window area of the touch panel. And a manufacturing method thereof.

Generally, a touch panel is an input device that can be easily used by anyone by touching a button with a finger to operate a computer, etc. in a conversational and intuitive manner.

Such a touch panel uses a resistance film type, a capacitive type, an infrared type, an ultrasonic type, and the like, depending on the method of detecting the touch. Currently, the resistance film type is widely used. However, The use of capacitive systems will increase.

The touch panel of the capacitive type, particularly the touch screen, has an ITO (Indium Tin Oxide) structure made of a transparent conductor on a transparent insulating film such as PET (polyethylene terephthalate) or glass, and a silver paste Is laminated on top and bottom by adding an adhesive layer or an insulating layer.

Here, the ITO is made up of Y-axis ITO formed by equally spaced X-axis ITO and Y-axis Y-axis electrostatic electrodes formed with X-axis electrostatic electrodes at regular intervals on the X axis.

In the touch screen formed as above, the controller receives the touch signal corresponding to the user's touch and outputs the coordinate signal.

However, the electrostatic electrodes arranged side by side on the X axis or the Y axis are arranged with different distances from the lead wires. Since the other electrostatic electrodes are disposed therebetween, each of the electrostatic electrodes has different electrical characteristics when viewed from the portion where the lead wires are connected.

Hereinafter, the conventional art of such a touch panel will be described with reference to Figs. 1 to 4. Fig.

FIG. 1 is a view showing an X-axis electrode pattern in a conventional capacitive touch panel, FIG. 2 is a view illustrating a Y-axis electrode pattern in a conventional capacitive touch panel, and FIG. FIG. 4 is a view showing a layer structure in a state where an X-axis electrode pattern and a Y-axis electrode pattern are combined in a conventional capacitive touch panel. FIG. to be.

Fig. 1 shows a conventional bottom pattern layer and shows an X-axis electrode pattern. Fig. 2 shows a conventional top pattern layer and shows a Y-axis electrode pattern.

A top pattern having the X-axis electrostatic electrode 10 as shown in FIGS. 1 and 2 and a bottom pattern having the Y-axis electrostatic electrode 20 were manufactured, and then a window was attached after interlayer bonding to form a touch panel . A plan view of the touch panel completed by this manufacturing process is shown in Fig.

3, the conventional electrostatic-type touch panel includes a top pattern having an X-axis electrostatic electrode 10 as a transmitting electrode (driving electrode) and a Y-axis electrostatic electrode 20 serving as a receiving electrode (sensing electrode) And the connection electrodes 30 and 40 are formed on one side of the panel.

The layer structure of such a conventional electrostatic-type touch panel is shown in Fig.

Referring to FIG. 4, two ITO films used for a top pattern and a bottom pattern are required because a top pattern and a bottom pattern are manufactured, respectively.

Also, OCA should be added to the upper part of the ITO film. Two OCA films were required because two ITO films were used.

Therefore, the conventional touch panel has a disadvantage in that it is expensive because two ITO films and two OCA are used to make one touch panel product.

Since the conventional touch panel uses two layers as the transmitting electrode and the receiving electrode, it is difficult to reduce the thickness, high raw material cost and high process cost are generated, and the permeability is low.

In addition, the conventional touch panel is formed by a sheet by sheet method instead of a cell by cell method when laminating the top pattern layer and the bottom pattern layer. Therefore, Yield was not good. In particular, it is difficult to adjust the alignment tolerance for the layered joints, which results in poor yield and difficult tight tolerance management.

Therefore, it is necessary to develop a structure of a capacitive touch panel that can solve such a problem.

According to an aspect of the present invention, there is provided a touch panel for implementing a touch sensor of a single layer by performing a jumping connection outside a window area without jumping connection with a bridge in a window area of the touch panel, The purpose of the method is to provide.

In order to improve the visibility of the transparent electrode in the upper layer, a touch sensor of one layer is formed on the upper surface of the transparent electrode using an insulating material having a refractive index different from that of the transparent electrode to form an index- And a manufacturing method thereof.

According to an aspect of the present invention, there is provided a method of manufacturing a touch panel,

A plurality of first axial electrostatic electrodes formed corresponding to a window area of the touch panel and spaced apart at a predetermined distance from each other are formed as a transparent conductive layer and each of the first axial electrostatic electrodes spaced apart from the first axial electrostatic electrodes by a predetermined distance, Forming a plurality of metal conductive lines, which are edge regions of the touch panel, connected to one end of the electrostatic electrode as a metal layer;

Forming a transparent photosensitive material of transparent material on the front surface of the touch panel and then opening a region where the metal electrode portion of each metal wire is located at a position connected to one end of each second axis electrostatic electrode of the transparent photosensitive material;

A conductive transparent electrode is formed on the front surface of the touch panel and a plurality of second axis electrostatic electrodes formed of conductive transparent electrodes are formed and electrically connected to one end of each second axis electrostatic electrode and a metal electrode portion of each metal wire step; And

And forming an upper insulating film layer (Index-Matching) on the upper surface of the plurality of second axial electrostatic electrodes using an insulating material having a refractive index difference from the conductive transparent electrode.

A method of manufacturing a touch panel according to an aspect of the present invention includes:

A plurality of first axis electrostatic electrodes corresponding to the window area of the touch panel and spaced apart from each other by a predetermined distance are formed as a transparent conductive layer and a transparent conductive layer and a transparent conductive layer having a difference in refractive index are formed on the lower surface of the plurality of first axis electrostatic electrodes Forming a lower insulating film layer using a material;

Forming transparent transparent photosensitive material on the front surface of the touch panel and forming each of the second axial electrostatic electrodes spaced apart from the first axial electrostatic electrodes by a predetermined distance and intersecting in the perpendicular direction as conductive transparent electrodes; And

And forming an upper insulating film layer on the upper surface of the plurality of second axial electrostatic electrodes using an insulating material having a refractive index difference from the conductive transparent electrode.

In the touch panel according to the present invention,

An insulator layer made of an organic insulator or an inorganic insulator;

A lower insulating layer made of an insulating material having a refractive index difference with the transparent conductive layer formed on the upper layer on the upper surface of the insulating layer;

A transparent conductive layer formed on a top surface of the first insulating layer and having a plurality of first axis electrostatic electrodes spaced apart from each other by a predetermined distance corresponding to a window area of the touch panel;

A transparent photosensitive material of a transparent material formed on an upper surface of the transparent conductive layer;

A conductive transparent electrode comprising a first axis electrostatic electrode and a second axis electrostatic electrode spaced apart from each other by a predetermined distance and intersecting in a perpendicular direction; And

And an upper insulating layer formed on the upper surface of the plurality of second-axis electrostatic electrodes, the insulating transparent material having a refractive index difference with the conductive transparent electrode.

According to the above-described structure, the present invention can reduce the thickness of the one-layer touch sensor and reduce the raw material cost and the process cost.

The present invention performs jumping and bridging outside a window using a metal lead, which is an area outside a window area, without performing a bridge and jumping in a view area (a window area of a touch panel) The receiving sensitivity and visibility are improved.

The present invention not only improves the visibility of the view area, but also enhances reception sensitivity by forming only one bridge and jumping point.

The present invention has the effect of improving the productivity by simplifying the manufacturing process of the existing touch panel.

The present invention is designed to jump in the window area without jumping in the window area where the visibility is a problem, thereby increasing the reception sensitivity by forming only one bridge and the jumping point.

The present invention has the effect of improving the visibility of the transparent electrode in the upper layer by forming an insulation film layer (Index-Matching) on the upper surface of the transparent electrode in the upper layer with an insulating material having a difference in refractive index from the transparent electrode.

1 is a view showing an X-axis electrode pattern in a conventional capacitive touch panel.
2 is a diagram illustrating a Y-axis electrode pattern in a conventional capacitive touch panel.
FIG. 3 is a view showing a state where an X-axis electrode pattern and a Y-axis electrode pattern are combined in a conventional capacitive touch panel.
4 is a view showing a layer structure in a state where an X-axis electrode pattern and a Y-axis electrode pattern are combined in a conventional capacitive touch panel.
5 to 8 are views showing a method of manufacturing a touch panel using a window outside jumping bridge technique according to an embodiment of the present invention in a layer structure.
9 and 10 are plan views illustrating a method of manufacturing a touch panel using a window jumping bridge technique according to an embodiment of the present invention.
11 is a conceptual diagram for explaining a lower index matching layer (Index-Matching) for improving visibility of a transparent conductive layer in a lower layer according to an embodiment of the present invention.
12 is a conceptual diagram for explaining an upper index matching layer (Index-Matching) for improving the visibility of the conductive transparent electrode in the upper layer according to the embodiment of the present invention.

Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings so that those skilled in the art can easily carry out the present invention. The present invention may, however, be embodied in many different forms and should not be construed as limited to the embodiments set forth herein. In order to clearly illustrate the present invention, parts not related to the description are omitted, and similar parts are denoted by like reference characters throughout the specification.

Throughout the specification, when an element is referred to as "comprising ", it means that it can include other elements as well, without excluding other elements unless specifically stated otherwise.

FIGS. 5 to 8 are views showing a layer structure in a method of manufacturing a touch panel using a window outside jumping bridge technique according to an embodiment of the present invention. FIG. 9 and FIG. A method of manufacturing a touch panel using an outer jumper bridge technique.

As shown in FIGS. 5A and 9A, a method of manufacturing a touch panel according to an embodiment of the present invention includes forming a lower index-matching layer (Index-Matching) on an upper surface of an insulator layer 110 A transparent conductive layer 120 is formed on the transparent conductive layer 120, and a metal layer 130 is formed on the transparent conductive layer 120. Here, the insulator layer 110 is formed of an organic insulator or an inorganic insulator of a transparent material, and the insulator of the organic insulator may be a polyimide, a polyethylene terephthalate (PET), a polyethylene naphthalate (PEN), a polycarbonate PC) and acrylic plastic material, and the inorganic insulator is made of glass material and optically processed glass material.

As shown in FIG. 11, the lower index matching layer 112 may be formed by forming an insulating layer using an insulating material having a refractive index difference with respect to the transparent conductive layer 120, It is a coating which is treated so that the presence of ITO is not confirmed.

That is, the lower index matching layer 112 serves to improve the visibility phenomenon due to the difference in reflectance of the portion where the transparent conductive layer 120 does not exist after forming the pattern on the transparent conductive layer 120.

The lower index matching layer 112 is an insulating film layer having a refractive index capable of improving the visibility of the circuit of the transparent conductive layer 120 when a pattern is formed on the transparent conductive layer 120.

The lower index matching layer 112 means that the lower layer of the ITO 120 is subjected to optical processing so that the portion where the ITO exists and the portion where the ITO does not exist are not sensed by the eye when the ITO film is formed.

The lower index matching layer 112 may be raised by SiO ₂ , TiO ₂ CeO ₂ or the like by a dry method (vapor deposition), or may be subjected to chemical treatment by a wet method.

The lower index matching layer 112 may have an insulating film layer such as SiO ₂ , TiO ₂ Ceo _2, Nb ₂ O ₅ , or the like having a refractive index capable of compensating for the height of the transparent conductive layer 120, .

The transparent conductive layer 120 is formed of a transparent conductive material such as transparent conductive oxide (TCO), and specifically includes ITO or IZO (Indium Zinc Oxide) or ITO, IZO, SnO ₂ , AZO A transparent conductive material.

The transparent conductive layer (ITO film or the like) 120 of the present invention includes a lower index matching layer (insulating film layer) 112 on the lower surface.

The metal layer 130 may be formed of a metal such as APC, Cu, Cu alloy, Ag, Ag alloy, Ni + Cr, Ni + Ni alloy, Mo / Ag, Mo / Al / Mo, Ni + Cr / Cu / , And a conductive material such as Ni alloy / Cu / Ni alloy, Mo / APC, Cu / Ni + Cu + Ti, Ni + Cu + Ti / Cu / Ni + Cu + Ti, And a known technique of application.

For example, the metal layer 130 may be formed of a silver paste, or copper may be deposited.

The metal layer 130 may be made of copper or aluminum in consideration of ease of manufacture and electrical conductivity.

The metal layer 130 may be formed by a known method such as laminating, vapor deposition, or coating.

5 (b), 5 (c), 5 (d) and 9 (b), the present invention is characterized in that a first photosensitive material 140 is formed on the upper surface of the metal layer 130 The first photosensitive material 140 is patterned by using a first artwork film 142 having a pattern formed thereon to form a pattern on the first photosensitive material 140 and exposed using a weak alkaline solution. To form an opening pattern (development).

However, the present invention is not limited to this, and any pattern tool having a pattern may be used, and it is also possible to use any apparatus that directly implements a pattern without a pattern tool An exposure process may be performed.

In addition, the process of forming the first photosensitive material 140 is formed by coating a liquid photoresist or laminating a dry film. In addition, when liquid type silicon or epoxy material is used, the coating process is used. When SiO ₂ or TiO ₂ insulating material is used, a deposition process can be used.

Next, as shown in FIGS. 6 (e), 6 (f) and 9 (b), the transparent conductive layer 120 And the metal layer 130 are selectively etched and the first photosensitive material 140 is removed using a strong alkali chemical to form the electrostatic electrode pattern 122 and the wiring electrode pattern 132 (etching process and peeling process) . Here, FIG. 5 (a) is subjected to a laminating process, a light exposure process, a development process, an etching process, and a peeling process by a first photolithography process.

The electrostatic electrode pattern 122 represents a Y-axis bar pattern representing a plurality of Y-axis electrostatic electrodes spaced apart from each other by a predetermined distance in a portion corresponding to a window region (screen display region) of the touch panel, Represents a touch pattern area of the user.

The wiring electrode pattern 132 is a circuit for indicating the metal conductor of the edge area of the touch panel except for the window area. The wiring electrode pattern 132 is connected outward from one end of each Y-axis electrostatic electrode or each X- And a metal electrode part of an FPCB bonding area connected to one end of the lead wire electrode and exposed to the outside and coupled to a flexible printed circuit board (FPCB).

The wiring electrode pattern 132 of the embodiment of the present invention includes a first wiring electrode pattern 132a connected to one end of each Y-axis electrostatic electrode, and a first wiring electrode pattern 132a spaced apart from each Y- And a second wiring electrode pattern 132b connected to one end of the plurality of X axis electrostatic electrodes is formed through selective etching of the metal layer 130. [

Next, as shown in FIGS. 6 (g) and 9 (b), the present invention forms a metal layer (not shown) formed on the electrostatic electrode pattern 122, which is the window region of the touch panel, by the secondary photolithography process 130 are selectively removed and the transparent conductive layer 120 is left. Here, the secondary photolithography process is a laminating process, a light exposure process, a developing process, an etching process, and a peeling process, which are the same processes as the above-described primary photolithography process.

Hereinafter, the photolithography process is performed through laminating, exposure, development, etching, and peeling processes, so that duplicated description is omitted.

6 (f) and 9 (c), the present invention includes a wiring electrode pattern made up of the electrostatic electrode pattern 122 made of the transparent conductive layer 120 and the metal layer 130 132), and then a transparent photosensitive material 150 of transparent material is formed on the entire surface of the touch panel (laminating, coating, or vapor deposition process). Here, the transparent photosensitive material 150 is a photosensitive transparent insulating material, for example, a transparent dry film.

Next, as shown in FIGS. 7 (i), (j) and 9 (d), the present invention forms a second photosensitive material 152 on the upper surface of the transparent photosensitive material 150, The outer area 160 of the transparent photosensitive material 150 formed on the front surface of the touch panel is selectively removed by the exposure and development process.

Here, the window outer region 160 refers to a region where a metal electrode portion of the second wiring electrode pattern 132b is located at a position connected to one end of a plurality of X axis electrostatic electrodes.

More specifically, the present invention forms a pattern on the second photosensitive material 152 by exposure to UV using a second artwork film 154 having a pattern for opening the window area 160, , An open pattern is formed (developed) in the second photosensitive material 152 using a weak alkaline solution, and a pattern is formed on the transparent photosensitive material 150 by an etching and a peeling process.

7 (j) and 9 (d), a pattern formed on the transparent photosensitive material 150 is formed on the outer area 160 of the touch panel of the transparent photosensitive material 150 formed on the front surface of the touch panel, Is a pattern in which an area corresponding to the open area is opened.

However, the present invention is not limited to this, and any pattern tool having a pattern for opening the window area 160 may be used. The exposure process may be performed by using a device that implements the pattern.

Next, as shown in FIG. 7 (k), the conductive transparent electrode 170 is formed on the front surface of the touch panel. Here, the conductive transparent electrode 170 is formed of a transparent conductive material such as transparent conductive oxide (TCO). Specifically, ITO (Indium Tin Oxide), ZnO (Zinc Oxide), IZO (Indium Zinc Oxide) ), Carbon nanotubes (CNTs), graphene, silver nanowires (AGNW), and the like.

Next, as shown in FIGS. 7L and 10E, the present invention forms a transparent electrode pattern made of the conductive transparent electrode 170 by the third photolithography process .

Here, the transparent electrode pattern represents an X-axis bar pattern showing a plurality of X-axis electrostatic electrodes spaced apart from a plurality of Y-axis electrostatic electrodes by a certain distance and intersecting in a perpendicular direction.

The conductive transparent electrode 170 is removed by a third photolithography process (a conductive transparent electrode etching process) to form a window outer region 160, Axis electrode pattern of each X-axis electrostatic electrode is electrically connected to the metal electrode portion of the second wiring electrode pattern 132b located in the X-axis electrostatic electrode.

That is, the third photolithography process performs laminating, tertiary exposure, tertiary development, conductive transparent electrode etching, and peeling process.

Although a plurality of X-axis electrostatic electrodes and Y-axis electrostatic electrodes are formed in a bar pattern, the present invention is applicable to various shapes such as square, circular, diamond, polygonal, and random patterns.

Through the manufacturing method of the touch panel, the present invention can reduce the thickness of the one-layer touch sensor and reduce the raw material cost and the process cost.

The present invention performs jumping and bridging outside a window using a metal lead, which is an area outside a window area, without performing a bridge and jumping in a view area (a window area of a touch panel) The receiving sensitivity and visibility are improved.

The present invention not only improves the visibility of the view area, but also enhances reception sensitivity by forming only one bridge and jumping point.

8 (m) and 10 (f), the present invention is applied to a pad portion, which is an FPCB bonding region 200 exposed to the outside of a touch panel and to which an FPCB is coupled, with a photosensitive material 180 Is formed and masked by printing with the peelable ink 180. In this way, When masking with a photosensitive material, laminating, exposure, and development are required by the photolithography process.

Next, as shown in FIG. 8 (n) and FIG. 10 (g), the present invention uses an insulating material capable of offsetting the refractive index of the conductive transparent electrode 170 on the entire surface of the touch panel, (Index-Matching) 190 is formed.

The upper index matching layer 190 may have an insulating film layer of SiO ₂ , TiO ₂ Ceo _2, Nb ₂ O ₅ , or the like having a refractive index capable of compensating the height of the conductive transparent electrode 170, .

The upper index matching layer 190 may be composed of a single layer or a layer having a high refractive index and a layer having a low refractive index.

8 (o) and 10 (h), the present invention is characterized in that the photosensitive material 180 masked on the pad portion, which is the FPCB bonding region 200, is peeled by a strong alkali chemical The removed or masked fillable ink 180 is removed by a manual process.

12, the conductive transparent electrode 170 is processed to improve the visibility of the conductive transparent electrode 170, and then an insulating layer (an upper index matching layer) is formed on the conductive transparent electrode 170, (190) is added by coating, vapor deposition or the like to prevent the visibility of the circuit of the conductive transparent electrode 170.

The upper index matching layer 190 is formed on the upper surface of the conductive transparent electrode 170 to improve the visibility in the view area.

The embodiments of the present invention described above are not implemented only by the apparatus and / or method, but may be implemented through a program for realizing functions corresponding to the configuration of the embodiment of the present invention, a recording medium on which the program is recorded And such an embodiment can be easily implemented by those skilled in the art from the description of the embodiments described above.

While the present invention has been particularly shown and described with reference to exemplary embodiments thereof, it is to be understood that the invention is not limited to the disclosed exemplary embodiments, It belongs to the scope of right.

110: insulator layer
112: lower index matching layer
120: transparent conductive layer
122: electrostatic electrode pattern
130: metal layer
132: wiring electrode pattern
132a: first wiring electrode pattern
132b: second wiring electrode pattern
140: 1st photosensitive material
142: 1st artwork film
150: transparent photosensitive material
152: Second photosensitive material
154: 2nd artwork film
160: Outside the window
170: Conductive transparent electrode
180: Photosensitive material, fillable ink
190: upper index matching layer
200: FPCB bonding area

Claims (10)

A manufacturing method of a touch panel,
A plurality of first axis electrostatic electrodes formed corresponding to a window area of the touch panel and spaced apart at intervals of a predetermined distance are formed as a transparent conductive layer and each of the first axis electrodes, Forming a plurality of metal wires, which are edge regions of the touch panel, connected to one end of the biaxial electrostatic electrode as a metal layer;
Forming a transparent photosensitive material on the front surface of the touch panel, and forming a region where the metal electrode portion of each of the metal wires is located at a position connected to one end of each of the second axial electrostatic electrodes of the transparent photosensitive material Opening;
Wherein the conductive transparent electrode is formed on the front surface of the touch panel and the plurality of second axis electrostatic electrodes formed of the conductive transparent electrode are formed so that one end of each of the second axis electrostatic electrodes and the metal electrode portion of each of the metal conductors Electrically connecting the first electrode and the second electrode to each other; And
Forming an upper insulating layer (Index-Matching) on the upper surface of the plurality of second axial electrostatic electrodes using an insulating material having a refractive index difference with the conductive transparent electrode
The method comprising the steps of: The method according to claim 1,
Forming a lower insulating film layer (Index-Matching) on the lower surface of the plurality of first axial electrostatic electrodes made of the transparent conductive layer by using an insulating material having a refractive index difference from the transparent conductive layer
The method comprising the steps of: A manufacturing method of a touch panel,
A plurality of first axis electrostatic electrodes corresponding to a window area of the touch panel and spaced apart at a predetermined distance from each other are formed as a transparent conductive layer and a transparent conductive layer is formed on the lower surface of the plurality of first axial electrostatic electrodes, Forming a lower insulating film layer using an insulating material having a lower dielectric constant;
Forming transparent transparent photosensitive material on the front surface of the touch panel and forming each of the second axial electrostatic electrodes spaced apart from the respective first axial electrostatic electrodes and intersecting in a direction perpendicular to the first axial electrostatic electrodes as conductive transparent electrodes; And
Forming an upper insulating layer on the upper surface of the plurality of second axial electrostatic electrodes using an insulating material having a refractive index difference from the conductive transparent electrode;
The method comprising the steps of: The method of claim 3,
Forming a plurality of metal conductive lines, which are edge regions of the touch panel, connected to one end of each of the second axial electrostatic electrodes spaced apart from the first axial electrostatic electrodes by a predetermined distance, as a metal layer;
Opening a region where the metal electrode portion of each of the metal conductive lines is located at a position connected to one end of each of the second axial electrostatic electrodes among the transparent photosensitive materials; And
Electrically connecting one end of each of the second axial electrostatic electrodes to a metal electrode portion of each of the metal wires,
The method comprising the steps of: The method according to claim 1 or 3,
After each of the second axial electrostatic electrodes is formed as a conductive transparent electrode,
A photosensitive material is formed on a portion of a pad which is an FPCB bonding area exposed to the outside of the touch panel and to which a flexible printed circuit board (FPCB) is coupled, and is masked or printed with fillable ink to mask step;
Forming the insulating layer or the second insulating layer on a top surface of the plurality of second axial electrostatic electrodes; And
Removing the masked photosensitive material by a strong alkaline chemical in a peeling process or removing the masked peelable ink by a manual process
The method comprising the steps of: 4. The method according to any one of claims 1 to 3,
The lower insulating film layer may have a single or multiple layer structure of an insulating material having a refractive index that compensates for the height of the transparent conductive layer,
Wherein the upper insulating layer has a single or multiple layer structure of an insulating material having a refractive index that compensates for the height of the conductive transparent electrode. In the touch panel,
An insulator layer made of an organic insulator or an inorganic insulator;
A lower insulating layer made of an insulating material having a refractive index difference with the transparent conductive layer formed on the upper layer on the upper surface of the insulator layer;
A transparent conductive layer formed on an upper surface of the first insulating layer and having a plurality of first axis electrostatic electrodes spaced apart by a predetermined distance corresponding to a window area of the touch panel;
A transparent photosensitive material formed on an upper surface of the transparent conductive layer;
A conductive transparent electrode composed of a second axial electrostatic electrode spaced apart from the first axial electrostatic electrode by a predetermined distance and intersecting in a perpendicular direction; And
An upper insulating layer formed on an upper surface of the plurality of second axial electrostatic electrodes, the insulating material having a refractive index difference from the conductive transparent electrode,
. 8. The method of claim 7,
The lower insulating film layer may have a single or multiple layer structure of an insulating material having a refractive index that compensates for the height of the transparent conductive layer,
Wherein the upper insulating film layer has a single or multiple layer structure of an insulating material having a refractive index that compensates for the height of the conductive transparent electrode. 8. The method of claim 7,
A plurality of first metal conductors formed on a top surface of the transparent conductive layer and connected to one end of the plurality of first axial electrostatic electrodes and formed in an edge region of the touch panel; And
A plurality of second metal conductors formed on the upper surface of the transparent conductive layer and connected to one end of the plurality of second axial electrostatic electrodes and formed in the edge region of the touch panel,
And a touch panel. 10. The method of claim 9,
Wherein the transparent photosensitive material opens a region where the metal electrode portion of each second metal conductor is located at a position connected to one end of each of the second axis electrostatic electrodes.

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