KR101325654B1 - Touch screen panel and manufacturing method - Google Patents

Touch screen panel and manufacturing method Download PDF

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Publication number
KR101325654B1
KR101325654B1 KR1020130067655A KR20130067655A KR101325654B1 KR 101325654 B1 KR101325654 B1 KR 101325654B1 KR 1020130067655 A KR1020130067655 A KR 1020130067655A KR 20130067655 A KR20130067655 A KR 20130067655A KR 101325654 B1 KR101325654 B1 KR 101325654B1
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South Korea
Prior art keywords
sensing
electrode layer
forming
sensing cell
transparent electrode
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KR1020130067655A
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Korean (ko)
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오광식
박선호
손현우
김영석
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에스맥 (주)
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    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B13/00—Apparatus or processes specially adapted for manufacturing conductors or cables
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B5/00—Non-insulated conductors or conductive bodies characterised by their form
    • H01B5/14—Non-insulated conductors or conductive bodies characterised by their form comprising conductive layers or films on insulating-supports
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04103—Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices

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  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Theoretical Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Human Computer Interaction (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Position Input By Displaying (AREA)

Abstract

According to an embodiment of the present invention, a first sensing electrode arranged in a line on an X-axis direction on a transparent substrate and a second sensing cell arranged in a line on a Y-axis direction do not overlap each other with the first sensing cell. A first transparent electrode layer forming step of forming a first transparent electrode layer formed of an X-axis connecting pattern portion connecting the two sensing electrodes and two neighboring first sensing cells in the X-axis direction by an etching process; and forming the first transparent electrode layer An insulating pad forming step of forming an insulating pad to cover the X-axis connection pattern portion on the transparent substrate after the step; and a third sensing cell having the same pattern as the first sensing cell on the insulating pad after the insulating pad forming step The fourth sensing electrode and the fourth sensing electrode arranged in a line are arranged in the Y-axis direction so as not to overlap with the third sensing electrode and the third sensing cell and having the same pattern as the second sensing cell. And a second transparent electrode layer forming step of forming, by an etching process, a second transparent electrode layer formed of a Y-axis connection pattern portion connecting two adjacent fourth sensing cells in the Y-axis direction. This is disclosed.

Description

Touch screen panel and manufacturing method

The present invention relates to a method of manufacturing a touch screen panel and a touch screen panel manufactured thereby, by patterning a first transparent electrode layer to electrically connect the sensing cells in the X-axis direction, and an insulating pad on the upper surface of the first transparent electrode layer Is formed by etching the second transparent electrode layer so as to electrically connect the sensing cells in the Y-axis direction with each other inserted, so that the insulating pads are not easily observed with the naked eye, and workability and mass production are compared to forming a bridge pattern by a conventional deposition method. The present invention relates to a method of manufacturing a touch screen panel having excellent rate and a touch screen panel manufactured thereby.

Computer-based systems for various purposes are being developed according to the development of computer technology, and there is an increasing demand for correctness, speed and convenience in using such systems.

In addition, there is a growing need for an input device capable of easily operating a device in a miniaturized and portable computer and a multimedia device, and an input device using a conventional keyboard or a mouse is limited in terms of movement and use A touch screen panel (Touch Sereen Panel) is used as an input device that can be input by direct contact with a hand or a pen on the screen.

Such a touch screen panel is an input device for inputting a user's command by selecting an instruction content displayed on a screen of a video display device or the like as a human hand or an object, and has recently been applied to various information processing devices. Such a touch screen panel is simple to operate, has less malfunctions, can input information without other input devices, and is integrated with a video display device, thereby increasing the portability of the product.

The touch screen panel is classified into a resistive type, a capacitive type, a surface ultrasonic type, and an infrared type depending on a method of sensing the contact portion, and a resistive type and a capacitive type are mainly used.

The resistance film method is a structure in which two sheets of substrates on which transparent electrodes are coated are bonded together. When the upper and lower electrode layers come into contact with each other by applying pressure with a finger or a pen, an electrical signal is generated to recognize the position. Such a resistive film method is inexpensive, has high accuracy, and is advantageous for miniaturization, but it is difficult to manufacture it firmly because two substrates are physically touched to recognize a touch.

On the other hand, the capacitive type uses a transparent substrate coated with a thin conductive water, and when a certain amount of current flows on the surface of the transparent substrate and the user touches the surface of the coated transparent substrate, a certain amount of current is absorbed into the user's body. The touched part is confirmed by recognizing a change in the amount of current on the contact surface.

In order to accurately determine the contact position on the contact surface, the touch screen panel has a transparent electrode layer formed of a first sensing cell and a second sensing cell on a transparent substrate for recognizing the X-axis coordinate and the Y-axis coordinate. This will be described with reference to Fig.

1 is a schematic view of a transparent substrate of a conventional touch screen panel. 1, a first sensing electrode 10 including a plurality of first sensing cells 12 arranged in a row in the X-axis direction of the transparent substrate 1 is formed, A second sensing electrode 20 including a plurality of second sensing cells 22 arranged in a line in the Y-axis direction of the transparent substrate 1 is formed so as not to overlap the first sensing electrode 12.

At this time, the first sensing cell 12 is formed with a connection pattern 14 for electrically connecting two neighboring first sensing cells 12, and the first sensing cell 12 and the connection pattern 14 Are arranged in a plurality alternately.

The second sensing cell 22 is arranged in a line in the transparent substrate 1 so as not to overlap with the first sensing cell 12, 2 sensing cell 22 is formed on the second surface of the substrate. In this case, the bridge pattern 24 connects the two second sensing cells 22 over the insulating pad 30 to intersect the connection pattern 14 without being in contact with the connection pattern 14.

The first sensing cell 12 and the second sensing cell 22 are formed in a rhombic shape except for forming the both ends of the first sensing cell 12 and the second sensing cell 22, And the second sensing electrode 20 including the plurality of second sensing cells 22 are connected to the first wiring portion 40 and the second wiring portion 50, respectively.

In this case, the first wiring part 40 connected to the first sensing electrode 10 and the second wiring part 50 connected to the second sensing electrode 20 are formed along the edge of the transparent substrate. The wiring unit 40 and the second wiring unit 50 are assembled to one side of the transparent substrate 1 and connected to an electrode pad 60 electrically connected to the flexible printed circuit board (FPCB) 70.

However, in the conventional touch screen panel as described above, since the insulating pad 30 is formed between the bridge pattern 24 and the connection pattern 14, the insulating pad 30 is easily observed by the naked eye.

In addition, a photosensitive layer is formed on the first sensing cell 12 and the second sensing cell 22 to cover the insulating pad 30 so as to form the bridge pattern 24 positioned on the insulating pad 30. After exposing the portion of the photosensitive layer on which the bridge pattern 24 is to be formed, the bridge pattern 24 is formed by depositing ITO on the exposed portion, but the deposition of ITO is not precisely performed on the exposed portion. There is a problem that the performance of the touch screen panel decreases or becomes a factor of inoperability.

Korea Patent No. 1118727 (2012.02.14) "Thin-film multi-touch screen panel and manufacturing method thereof"

The present invention is to solve the above problems, the second sensing arranged in the Y-axis direction is not observed with the insulation pad formed on the upper surface of the connection pattern for connecting the first sensing cells arranged in the X-axis direction It is an object of the present invention to provide a method for manufacturing a touch screen panel that can manufacture a bridge pattern connecting cells by an etching method.

Further, an object of the present invention is to provide a touch screen panel manufactured by the manufacturing method, in which an insulating pad is not visually observed, and having excellent electrical conductivity of a bridge pattern.

According to the technical idea of the present invention for achieving the above object, a first sensing electrode and the first sensing cell in which a transparent substrate, a first sensing cell provided on the transparent substrate and arranged in the X-axis direction are arranged in a line The first transparent electrode layer includes a second sensing electrode arranged in a row so that the second sensing cells arranged in the Y-axis direction do not overlap each other, and an X-axis connecting pattern portion connecting two neighboring first sensing cells in the X-axis direction. And a third sensing electrode and a second sensing electrode arranged on an upper surface of the X-axis connection pattern part, and a third sensing electrode arranged on the first transparent electrode layer and having the same pattern as that of the first sensing cell. A fourth sensing cell having the same pattern as the cell includes a fourth sensing electrode arranged in a line and a Y-axis connecting pattern portion connecting two fourth sensing cells adjacent to each other above the insulating pad in the Y-axis direction. And a second wiring part connected to the first sensing electrode or the third sensing electrode, and a second wiring part connected to the second sensing electrode or the fourth sensing electrode. Is achieved by

Here, the Y-axis connection pattern portion is preferably connected to the fourth sensing cell in a narrower area than the area of the insulating pad on the insulating pad.

In addition, the first transparent electrode layer and the second transparent electrode layer is preferably made of the same material.

On the other hand, according to another technical idea of the present invention for achieving the above object, the first sensing cells arranged in the X-axis direction on the transparent substrate do not overlap with the first sensing electrode and the first sensing cell arranged in a line. In the etching process, the first transparent electrode layer including the second sensing electrodes arranged in a row in the Y-axis direction and the X-axis connecting pattern portion connecting the two first sensing cells adjacent to each other in the X-axis direction is used as an etching process. Forming the first transparent electrode layer, forming an insulating pad to cover the X-axis connection pattern on the transparent substrate after forming the first transparent electrode layer, and forming a first insulating layer on the insulating pad after the forming of the insulating pad. The third sensing cells having the same pattern as the sensing cells are arranged in the Y-axis direction so as not to overlap with the third sensing electrodes and the third sensing cells arranged in a line and are the same as the second sensing cells. A second transparent electrode layer formed by an etching process comprising a fourth sensing electrode having a pattern including a fourth sensing electrode arranged in a line and a Y-axis connecting pattern portion connecting two neighboring fourth sensing cells in a Y-axis direction It is achieved by a method for manufacturing a touch screen panel comprising a transparent electrode layer forming step.

Here, the first transparent electrode layer forming step, (a) applying a conductive material for forming the first transparent electrode layer on the transparent substrate, (b) forming a photosensitive layer on the conductive material, (c) the photosensitive Exposing and developing a layer to form a mask pattern on the conductive material, (d) applying an etching material on the conductive material on which the mask pattern is formed, (e) a mask pattern of the conductive material with the etching material An X-axis connection pattern part which connects the first sensing cells and two first sensing cells adjacent to each other among the sensing cells in an X-axis direction by etching the unformed portion on the transparent substrate, and the first sensing cell Or forming a plurality of second sensing cells not in contact with the X-axis connection pattern portion, and (f) removing the mask pattern.

The forming of the insulating pad may include forming a photosensitive layer on the transparent substrate on which the first sensing cell, the X-axis connection pattern part, and the second sensing cell are formed, and exposing and developing the photosensitive layer. Forming a mask pattern to expose the axial connection pattern part, depositing an insulating material on a portion where the mask pattern is not formed, covering the X-axis connection pattern part with an insulating material, and removing the mask pattern; It is preferable.

The forming of the second transparent electrode layer may include applying a conductive material forming a second transparent electrode layer on the first sensing cell and the second sensing cell, forming a photosensitive layer on the conductive material; Exposing and developing the photosensitive layer to form a mask pattern on the conductive material, applying an etching material on the conductive material on which the mask pattern is formed, and etching the conductive material with the etching material to form a first sensing cell. Forming a Y-axis connection pattern part connecting a third sensing cell, a fourth sensing cell, and two neighboring fourth sensing cells in a Y-axis direction with each other, the third sensing cell having the same pattern as the second sensing cell; It is preferable to include the step of removing the mask pattern on the cell, the fourth sensing cell, the Y-axis connection pattern portion.

After the forming of the second transparent electrode layer, a wiring part forming step of forming a first wiring part connected to the first sensing electrode or the third sensing electrode and a second wiring part connected to the second sensing electrode or the fourth sensing electrode. It is preferable to further include.

The forming of the wiring part may include forming a photosensitive layer on the transparent substrate on which the first to fourth sensing electrodes are formed, and developing the photosensitive layer after exposing the photosensitive layer to detect the first sensing electrode or the third sensing electrode. Forming a mask pattern to partially expose an end of an electrode, an end of the second sensing electrode or a fourth sensing electrode, and the transparent substrate; depositing a conductive material on a portion where the mask pattern is not formed; and It is preferable to include the step of removing the mask pattern.

According to the method for manufacturing a touch screen panel according to the present invention, a second transparent electrode layer is formed on the first transparent electrode layer, and the second transparent electrode layer is patterned in the same manner as the first and second sensing cells through an etching method. By forming a third sensing cell and a fourth sensing cell, and forming a Y-axis connecting pattern portion connecting the fourth sensing cell in the Y-axis direction on the insulating pad, thereby forming a third sensing cell and a fourth sensing cell. 2, the transparent electrode layer is formed to produce a high quality touch screen panel in which the insulating pad is not easily observed by the naked eye.

In addition, according to the manufacturing method of the present invention, the Y-axis connection pattern portion connecting the fourth sensing cell can be manufactured by the etching method. As such, when the Y-axis connection pattern portion is formed by the etching method, the workability and mass production rate are excellent as compared with forming the bridge pattern for connecting the second sensing cell by the deposition method.

In addition, when the Y-axis connection pattern portion is formed by the etching method as described above, the Y-axis connection pattern portion is uniformly formed to a certain thickness to have excellent electrical conductivity, thereby manufacturing a high quality touch screen panel.

1 is a schematic view of a transparent substrate of a conventional touch screen panel.
2 is a perspective view illustrating a touch screen panel of the present invention.
3 is a front view illustrating a touch screen panel of the present invention.
4 is a side cross-sectional view schematically showing a touch screen module to which a touch screen panel of the present invention is mounted.
5 is a schematic diagram illustrating a first transparent electrode layer forming step in a process of manufacturing a touch screen panel of the present invention.
6 is a schematic diagram illustrating an insulating pad shape step of a manufacturing process of a touch screen panel of the present invention.
7 is a schematic diagram illustrating a second transparent electrode layer forming step in a process of manufacturing a touch screen panel of the present invention.
8 is a schematic diagram illustrating a wiring unit forming step of a touch screen panel manufacturing process of the present invention.

The terms and words used in the present specification and claims should not be construed as limited to ordinary or dictionary meanings and the inventor may properly define the concept of the term to describe its invention in the best possible way And should be construed in accordance with the principles and meanings and concepts consistent with the technical idea of the present invention.

Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings.

2 is an exploded perspective view of a touch screen panel according to an embodiment of the present invention, and FIG. 3 is a front view of the touch screen panel according to an embodiment of the present invention.

Referring to FIGS. 2 and 3, the touch screen panel according to the present invention includes a transparent substrate 100, a first sensing electrode 210 and a second sensing electrode 230 provided on the transparent substrate 100. The first transparent electrode layer 200, the insulating pad 300 disposed on the upper surface of the first transparent electrode layer 200, the third sensing electrode 410 and the fourth sensing electrode disposed on the upper surface of the insulating pad 300 ( A first wiring part 510 and a second sensing electrode 230 or fourth sensing connected to the second transparent electrode layer 400 and the first sensing electrode 210 or the third sensing electrode 410 having a 430. The second wiring part 530 connected to the electrode 430 is included.

In particular, the second transparent electrode layer 400 is provided on the first transparent electrode layer 200, and the third sensing electrode 411 having the same pattern as the first sensing cell 211 is arranged in a line. Fourth sensing cells 430 having the same pattern as the second sensing cells 231 and 410 and two fourth sensing cells neighboring each other above the fourth sensing electrode 430 and the insulating pad 300 arranged in a line. It consists of a Y-axis connection pattern portion 450 connecting the 431 in the Y-axis direction.

The transparent substrate 100 may be formed of various kinds of glass, such as a synthetic resin such as PET film, PEN film, PC, PMMA or the like, gorilla tempered glass, soda tempered glass, etc.

The touch screen panel according to the present invention electrically connects the plurality of first sensing cells 211 constituting the first sensing electrode 210 in the first transparent electrode layer 200 and the second transparent electrode layer 400. The fourth sensing cells 431 constituting the fourth sensing electrode 430 are formed to be electrically connected to each other. Hereinafter, the first transparent electrode layer 200 and the second transparent electrode layer 400 will be described in detail.

The first transparent electrode layer 200 includes the first sensing electrode 210 and the first sensing cell 211 having a plurality of first sensing cells 211 arranged in a line in the X-axis direction so as not to overlap each other. X-axis connection pattern unit 250 electrically connecting the second sensing electrode 230 having a plurality of second sensing cells 231 arranged in a line and the first sensing cells 211 adjacent to each other. It includes.

In addition, the second transparent electrode layer 400 is arranged in a line in the X-axis direction and has a third sensing electrode 410 having a plurality of third sensing cells 411 formed in the same pattern as the first sensing cell 211. ) And a fourth sensing cell 431 having a plurality of fourth sensing cells 431 disposed in a line in the Y-axis direction so as not to overlap with the third sensing cells 411 and formed in the same pattern as the second sensing cells 231. And a Y-axis connection pattern part 450 electrically connecting the sensing electrode 430 and the fourth sensing cell 431 adjacent to each other.

At this time, only the first sensing cell 211 is connected to the X-axis connection pattern part 250 in the first transparent electrode layer 200, and only the fourth sensing cell 431 is the Y-axis connection pattern in the second transparent electrode layer 400. It is connected to the unit 450. In addition, an insulating pad 300 is provided between the X-axis connection pattern part 250 and the Y-axis connection pattern part 450 so that the X-axis connection pattern part 250 and the Y-axis connection pattern part 450 are not electrically connected. Will be blocked.

In other words, the first sensing electrode 210 electrically connects a plurality of first sensing cells 211 arranged in a line on one surface of the transparent substrate 100 and two first sensing cells 211 adjacent to each other. It consists of an X-axis connection pattern portion 250. In this case, a plurality of first sensing cells 211 and the X-axis connection pattern unit 250 are alternately arranged.

In addition, the first sensing cell 211 has a rhombic shape except for constituting both ends of the first sensing electrode 210. Any one of the first sensing cells 211 formed in a rhombic shape is arranged in such a manner that the first sensing cells 211 having different rhombic shapes adjacent to the upper and lower and left and right sides and the respective vertexes of the first sensing cell 211 face each other.

In addition, the X-axis connection pattern unit 250 connects the vertices of two first sensing cells 211 that are adjacent to each other in the X-axis direction, so that the first sensing cell 211 and the X-axis positioned at the tip of the X-axis direction. The first sensing cell 211 positioned at the proximal end of the direction is energized, and the insulating pad 300 is formed on the X-axis connection pattern part 250 to connect the second transparent electrode layer 400 to the X-axis. The pattern unit 250 is blocked so that it is not energized.

The second sensing electrode 230 is formed by laminating a plurality of second sensing cells 231 arranged in the Y axis direction on one surface of the transparent substrate 100 so as not to contact the first sensing cells 211 do.

The second sensing cell 231 has a rhombic shape similar to that of the first sensing cell 211, except that the second sensing cell 231 constitutes both ends of the second sensing electrode 230. Each of the second sensing cells 231 in the shape of a rhombus is arranged in such a manner that the second sensing cells 231, which are adjacent to each other in the upper, lower, left, and right sides, and the other sensing cells 231 are opposed to each other.

As such, the first sensing cell 210 is formed on the first transparent electrode layer 200, which forms the first sensing electrode 210, the second sensing electrode 230, and the X-axis connecting pattern part 250 on the transparent substrate 100. A second transparent electrode layer 400 having the same pattern as the 211 and the second sensing cell 231 is formed.

The second transparent electrode layer 400 may include a third sensing electrode 410 including a third sensing cell 411 having the same pattern as the first sensing cell 211, and the same pattern as the second sensing cell 231. And a fourth sensing electrode 430 made of a fourth sensing cell 431 and a Y-axis connecting pattern part 450 connecting two fourth sensing cells 431 adjacent to each other in the Y-axis direction.

In this case, the Y-axis connection pattern portion 450 has an insulating pad 300 formed thereunder, so that the X-axis connection pattern portion 250 and the Y-axis connection pattern portion 450 are insulated from each other. The connection pattern part 450 is formed to connect the fourth sensing cell 431 in the Y-axis direction with an area equal to or smaller than the area of the insulating pad 300 on the insulating pad 300.

The first transparent electrode layer 200 and the second transparent electrode layer 400 are made of a conductive material, and the conductive material is indium-tin oxide (ITO), al-doped zinc oxide (AZO), or indium zinc (IZO). Transparent conductive oxides such as Oxide), Zinc Oxide (ZnO), Antimony-doped Tin Oxide (ATO), Fluorine-doped Tin Oxide (FTO), and Glium Oxide (GZO), or carbon-based transparency such as carbon nanotubes and graphene Material, or a transparent conductive polymer.

In addition, the insulating pad 300 formed between the X-axis connection pattern part 250 and the Y-axis connection pattern part 450 is provided on the transparent substrate 100 to cover the X-axis connection pattern part 250. As the insulating pad 300, various insulating materials capable of securing transparency including SiO 2 may be used.

As shown in FIG. 3, the insulating pad 300 covers only the X-axis connection pattern part 250 connecting the plurality of first sensing cells 211 in the X-axis direction. In some cases, the insulating pad 300 may be formed to cover a portion of a vertex of the second sensing cell 231 adjacent to the X-axis connection pattern part 250 including the X-axis connection pattern part 250.

2 and 3, the first wiring part 510 is connected to one end of the first sensing electrode 210 or the third sensing electrode 410, and the second wiring part 530. Is connected to one end of the second sensing electrode 230 or the fourth sensing electrode 430.

The first wiring part 510 and the second wiring part 530 may be connected to the first sensing electrode 210 or the third sensing electrode 410 and the second sensing electrode 230 or the fourth sensing electrode 430, And is electrically connected to a controller (not shown), and is made of a conductive material.

In addition, the first wiring part 510 and the second wiring part 530 may be made of the same material as the first transparent electrode layer 200 and the second transparent electrode layer 400, but as shown in FIG. 4, the window Since the portion is covered by the bezel 615 provided on the rear surface of the panel 610, it may be made of a non-transparent conductive material.

In addition, a single metal such as Al, Cu, Mo, Ni, Ag, Pd, or an alloy thereof may be used as another conductive material forming the first wiring part 510 and the second wiring part 530. The first wiring part 510 and the second wiring part 530 may be formed as a single film or a multilayer film.

As shown in FIG. 4, the touch screen panel according to the present invention configures the touch screen module 600 together with the window panel 610 and the image display device 620 for displaying an image. In addition, a shield panel 630 is disposed between the touch screen panel and the image display device 620 of the present invention.

Meanwhile, in the method of manufacturing the touch screen panel according to the present invention having the above structure, the transparent electrode layer 201 is formed on the transparent substrate 100, and the first sensing electrode 210 and the second sensing electrode 230 are formed through an etching process. ), The first transparent electrode layer forming step of forming the X-axis connection pattern portion 250, and the insulating pad 300 to cover the X-axis connection pattern portion 250 on the transparent substrate 100 after the first transparent electrode layer forming step. ) To form a second transparent electrode layer on the first transparent electrode layer after the insulating pad forming step and the insulating pad forming step, the transparent electrode layer 401 formed on the first transparent electrode layer through the etching process is the first sensing electrode 210 ) And the third sensing electrode 410 and the fourth sensing electrode 430 so as to have the same pattern as the second sensing electrode 230, and the fourth sensing cell 431 of the fourth sensing electrode 430 is Y. Second transparent electrode layer forming end forming the Y-axis connection pattern portion 450 to connect in the axial direction It consists of a.

The first transparent electrode layer forming step, the insulating pad forming step, and the second transparent electrode layer forming step will be described with reference to FIGS. 5 to 7.

5 is a schematic diagram illustrating a first transparent electrode layer forming step in a process of manufacturing a touch screen panel of the present invention. In the forming of the first transparent electrode layer, as shown in FIG. 5A, the transparent substrate 100 is prepared, and the transparent electrode layer 201 is formed on the transparent substrate 100.

The transparent electrode layer 201 may be formed by a chemical vapor deposition (CVD) method, a sputtering method, an E-beam evaporation method, a thermal evaporation method, a laser molecular beam epitaxy Or physical vapor deposition (PVD) such as pulsed laser deposition (PLD), or various other thin film forming techniques.

Next, as shown in FIG. 5B, the photosensitive layer 170a is laminated on the transparent electrode layer 201. Next, as shown in FIG. As the photosensitive layer 170a, photo-resist (PR) or dry film photo-resist (DFR) may be used. The photosensitive layer 170a may be formed on the transparent electrode layer 201 by various coating methods such as spin coating or various printing methods such as screen printing.

As such, the photosensitive layer 170a formed on the transparent electrode layer 201 may be subjected to a soft-baking process. The soft baking process can be performed by a heating method such as heating with a hot plate, heating with hot air, or heating with near-infrared rays.

After the photosensitive layer 170a is formed, the photosensitive layer 170a is formed in the form of the first sensing cell 211 and the second sensing cell 231 using a UV exposure device or an LDI (Laser Direct Imaging) system. Expose properly.

Thereafter, the exposed photosensitive layer 170a is developed to partially remove the photosensitive layer 170a, thereby forming a mask pattern 170b on the transparent electrode layer 201 as shown in FIG.

In this case, the mask pattern 170b is disposed on the transparent substrate 100 in the Y-axis direction such that the plurality of first sensing cells 211 and the first sensing cells 211 are not overlapped with each other. The plurality of second sensing cells 231 and two first sensing cells 211 neighboring each other are patterned on the transparent electrode layer 201 to form an X-axis connection pattern part 250 for connecting in the X-axis direction.

The mask pattern 170b thus formed may be subjected to a hard-baking process. Here, the hard baking process may be performed by a heating method such as heating with a hot plate, heating with hot air, or heating with near infrared rays.

Next, as shown in FIG. 5D, an etching material 180 is applied on the transparent electrode layer 201 on which the mask pattern 170b is formed. At this time, the etching material 180 may be an etching paste, and the etching paste is applied to the transparent electrode layer 201 through a screen printing method so as to fill the exposed portion of the transparent electrode layer 201, Lt; / RTI >

Next, the transparent electrode layer 201 is etched with the etching material 180 applied on the transparent electrode layer 201. At this time, when the etching material 180 is an etching paste, hot air or near-infrared rays may be supplied in the etching step to increase the etching efficiency.

As such, when the transparent electrode layer 201 is etched by the etching material 180, as illustrated in FIG. 5E, the first sensing cell 211 and the second sensing cell ( 231, an X-axis connection pattern part 250 is formed.

When the transparent electrode layer 201 formed on the transparent substrate 100 is etched as described above, when the first sensing cell 211, the second sensing cell 231, and the X-axis connection pattern part 250 are formed, the transparent substrate 100 is formed. ) Is washed with pure water to remove the etching material 180 remaining on the transparent substrate (100).

Next, as shown in FIG. 5F, the mask pattern 170b remaining on the first sensing cell 211, the second sensing cell 231, and the X-axis connection pattern part 250 is removed. . As the method of removing the mask pattern 170b, various known methods using various kinds of peeling solutions or acetone can be used.

As described above, after the first transparent electrode layer forming step of forming the first sensing cell 211, the second sensing cell 231, and the X-axis connecting pattern part 250 on the transparent substrate 100 is performed, the X-axis An insulating pad forming step of forming the insulating pad 300 over the connection pattern part 250 is performed. This will be described with reference to FIG.

6 is a schematic diagram illustrating an insulating pad forming step in a process of manufacturing a touch screen panel of the present invention. As shown in FIG. 6A, the photosensitive layer 172a is disposed on the transparent substrate 100 on which the first sensing cell 211, the second sensing cell 231, and the X-axis connection pattern part 250 are formed. Laminated.

The stacking process of the photosensitive layer 172a is the same as the process of forming the first sensing cell 211, the second sensing cell 231, and the X-axis connection pattern part 250 during the first transparent electrode layer forming step. . After the photosensitive layer 172a is formed, the photosensitive layer 172a is exposed to the shape of the insulating pad 140 to be formed using a UV exposure machine or an LDI system.

Thereafter, the exposed photosensitive layer 172a is developed to partially remove the photosensitive layer 172a, thereby forming a mask pattern 172b on the transparent substrate 100 as shown in FIG. The mask pattern 172b formed as described above may be subjected to a hard baking process.

Next, as illustrated in FIG. 6C, an insulating material is deposited on a portion where the mask pattern 172b is not formed to form an insulating pad 300. In this case, as the method of forming the insulating pad 300 using an insulating material, physical vapor deposition such as chemical vapor deposition, sputtering, electron beam deposition, thermal deposition, laser molecular beam deposition, pulse laser deposition, or various other thin film formation Method may be used.

After the insulating pad 300 is formed, the mask pattern 172b around the insulating pad 140 is removed as shown in FIG. 6D.

As described above, after the insulating pad forming step of forming the insulating pad 300 to cover the X-axis connection pattern part 250 is performed on the transparent substrate 100, the first sensing cell 211 and the second sensing cell. Y-axis connection pattern portion connecting the fourth sensing cell 431 to the third sensing cell 411, the fourth sensing cell 431, and the insulating pad 300 having the same pattern as the 231 in the Y-axis direction. A second transparent electrode layer forming step of forming 450 is performed. This will be described with reference to FIG.

7 is a schematic diagram illustrating a second transparent electrode layer forming step in a process of manufacturing a touch screen panel of the present invention. A transparent electrode layer 401 is formed on the first sensing cell 211 and the second sensing cell 231, as shown in FIG. 7 (a).

In this case, the transparent electrode layer 401 may be formed by the same method as the process of forming the transparent electrode layer 201 on the transparent substrate 100 during the first transparent electrode layer forming step described above.

Next, as shown in Fig. 7 (b), the photosensitive layer 174a is laminated on the transparent electrode layer 401. Next, as shown in Fig. At this time, the photosensitive layer 174a formed on the transparent electrode layer 401 may undergo a soft-baking process.

After the photosensitive layer 174a is formed, the photosensitive layer 174a is patterned according to the shapes of the first sensing cell 211 and the second sensing cell 231 using a UV exposure apparatus or an LDI (laser direct imaging) system. Exposure. Thereafter, the exposed photosensitive layer 174a is developed to partially remove the photosensitive layer 174a to form a mask pattern 174b on the transparent electrode layer 401 as shown in FIG. 7C.

At this time, the mask pattern 174b is formed so that the third sensing cell 411 and the fourth sensing cell 431 are formed in the same pattern as that of the first sensing cell 211 and the second sensing cell 231, (401) is patterned. In addition, the transparent electrode layer 401 is patterned to form a Y-axis connection pattern part 450 that connects two neighboring fourth sensing cells 431 in the Y-axis direction.

7 (d), the transparent electrode layer 401 is etched by applying the etchant 182 completely over the transparent electrode layer 401 having the mask pattern 174b formed thereon.

When the transparent electrode layer 401 is etched by the etchant 182 as described above, the first and second sensing cells 211 and 211 are formed in the shape of the mask pattern 174b as shown in FIG. 7 (e) The third sensing cell 411 and the fourth sensing cell 431 are formed on the first sensing cell 231 and the second sensing cell 231, respectively. In addition, the Y-axis connection pattern part 450 is formed on the insulating pad 300.

As described above, after the transparent electrode layer 401 formed on the first transparent electrode layer 200 is formed through the etching process, the third sensing cell 411, the fourth sensing cell 431, and the Y-axis connection pattern part 450 are formed. The remaining etching material 182 is removed.

Next, as shown in FIG. 7F, the first sensing cell 411, the fourth sensing cell 431, and the Y-axis connecting pattern part 450 formed of the second transparent electrode layer 400 remain. By removing the mask pattern 174b, the third sensing cell 411 and the fourth sensing cell 431 having the same pattern as the first sensing cell 211 and the second sensing cell 231 are removed by an etching method. The Y-axis connection pattern part 450 connecting the fourth sensing cell 431 in the Y-axis direction may be formed on the insulating pad 300.

Meanwhile, after the third sensing cell 411, the fourth sensing cell 431, and the Y-axis connection pattern part 450 are formed on the first transparent electrode layer 200 by the etching method as described above, the first wiring part ( A wiring part forming step of forming the 510 and the second wiring part 530 is performed. This will be described with reference to FIG.

8 is a schematic diagram illustrating a wiring unit forming step of a touch screen panel manufacturing process of the present invention. As shown in FIGS. 8A and 8B, the photosensitive layer is formed on the transparent substrate 100 on which the third sensing cell 411, the fourth sensing cell 431, and the Y-axis connection pattern part 450 are formed. 176a is laminated.

After exposing the photosensitive layer 176a to the shape of the first wiring part 510 and the second wiring part 530, the exposed photosensitive layer 176a is developed to develop the first wiring part 510 and A mask pattern 176b for forming the second wiring part 530 is prepared.

As illustrated in FIG. 8C, a conductive material is deposited on a portion where the mask pattern 176b is not formed to form the first wiring part 510 and the second wiring part 530.

Finally, as shown in FIG. 8D, when the mask pattern 176b on the transparent substrate 100 is removed, the touch screen panel according to the present invention can be manufactured.

According to the method of manufacturing a touch screen panel of the present invention as described above, the second transparent electrode layer 400 is formed on the first transparent electrode layer 200, and the first sensing cell 211 and the second sensing cell through an etching method. As in 231, the second transparent electrode layer 400 is patterned to form the third sensing cell 411 and the fourth sensing cell 431, and at the same time, the fourth sensing cell 431 is placed over the insulating pad 300. By forming the Y-axis connection pattern portion 450 connecting in the Y-axis direction, the second transparent electrode layer 400 made of the same material as the first transparent electrode layer 200 is formed on the insulating pad 300, thereby forming the insulating pad 300. Can produce a high quality touch screen panel that is not easily observed with the naked eye.

In addition, according to the manufacturing method of the present invention, the Y-axis connection pattern portion 450 connecting the fourth sensing cell 431 may be manufactured by an etching method. As such, when the Y-axis connection pattern part 450 is formed by the etching method, the workability and mass production rate are excellent as compared with forming the bridge pattern for connecting the second sensing cell 231 by the deposition method.

In addition, when the Y-axis connection pattern portion 450 is formed by the etching method as described above, the Y-axis connection pattern portion 450 is uniformly formed to a predetermined thickness to have excellent electrical conductivity, thereby producing a high quality touch screen panel. can do.

While the present invention has been described with reference to exemplary embodiments, it is to be understood that the invention is not limited to the disclosed exemplary embodiments, but, on the contrary, is intended to cover various modifications and equivalent arrangements included within the spirit and scope of the appended claims. .

100: transparent substrate 170a, 172a, 174a, 176a: photosensitive layer
170b, 172b, 174b, 176b: mask patterns 180, 182: etching material
200: first transparent electrode layer 210: first sensing electrode
211: first sensing cell 230: second sensing electrode
231: second sensing cell 250: X-axis connection pattern portion
300: insulating pad 400: second transparent electrode layer
410: third sensing electrode 411: third sensing cell
430: fourth sensing electrode 431: fourth sensing cell
450: Y-axis connection pattern portion 510: first wiring portion
530: second wiring unit 600: touch screen module
610: window panel 615: bezel
620: image display device 630: shield panel

Claims (9)

A transparent substrate;
A first sensing electrode arranged on the transparent substrate and arranged in the X-axis direction, the first sensing electrode arranged in a line, and the second sensing cell arranged in the Y-axis direction so as not to overlap with the first sensing cell; A first transparent electrode layer including a second sensing electrode and an X-axis connecting pattern portion connecting two neighboring first sensing cells in an X-axis direction;
An insulation pad disposed on an upper surface of the X-axis connection pattern portion;
A fourth sensing electrode arranged on the first transparent electrode layer and having third sensing cells having the same pattern as the first sensing cell in a row and fourth sensing cells having the same pattern as the second sensing cell in a row A second transparent electrode layer including a Y-axis connecting pattern portion connecting two fourth sensing cells adjacent to each other over the sensing electrode and the insulating pad in the Y-axis direction;
And a first wiring part connected to the first sensing electrode or a third sensing electrode, and a second wiring part connected to the second sensing electrode or the fourth sensing electrode.
The method according to claim 1,
The Y-axis connection pattern portion is a touch screen panel, characterized in that for connecting the fourth sensing cell to the area narrower than the area of the insulating pad on the insulating pad.
The method according to claim 1,
The first transparent electrode layer and the second transparent electrode layer is a touch screen panel, characterized in that made of the same material.
The first sensing electrode in which the first sensing cells arranged in the X-axis direction are arranged in a line on the transparent substrate, and the second sensing electrode in the line of the second sensing cells arranged in the Y-axis direction so as not to overlap with the first sensing cell. And a first transparent electrode layer forming step of forming, by an etching process, a first transparent electrode layer including an X-axis connection pattern portion connecting two first sensing cells adjacent to each other in the X-axis direction.
An insulating pad forming step of forming an insulating pad to cover the X-axis connection pattern portion on the transparent substrate after the first transparent electrode layer forming step;
After the insulating pad forming step, a third sensing cell having the same pattern as the first sensing cell on the insulating pad is disposed in the Y-axis direction so as not to overlap with the third sensing electrode and the third sensing cell arranged in a line, and the second sensing cell. Forming a second transparent electrode layer including a fourth sensing electrode having a same pattern as a fourth sensing electrode arranged in a line and a Y-axis connecting pattern portion connecting two neighboring fourth sensing cells in a Y-axis direction by an etching process Forming a second transparent electrode layer; Method of manufacturing a touch screen panel comprising a.
The method of claim 4,
Wherein the first transparent electrode layer forming step comprises:
(a) applying a conductive material forming a first transparent electrode layer on a transparent substrate;
(b) forming a photosensitive layer on the conductive material;
(c) forming a mask pattern on the conductive material by exposing and developing the photosensitive layer;
(d) applying an etching material onto the conductive material on which the mask pattern is formed;
(e) etching a portion of the conductive material on which the mask pattern is not formed using the etching material to form a plurality of first sensing cells on the transparent substrate, and two first sensing cells adjacent to each other among the sensing cells in the X- Forming a plurality of second sensing cells not in contact with the first sensing cell or the X-axis connection pattern unit;
(f) removing the mask pattern; and manufacturing the touch screen panel.
The method of claim 4,
The insulating pad forming step,
Forming a photosensitive layer on the transparent substrate on which the first sensing cell, the X-axis connecting pattern portion, and the second sensing cell are formed;
Exposing and developing the photosensitive layer to form a mask pattern to expose the X-axis connection pattern portion;
Depositing an insulating material on a portion where the mask pattern is not formed to cover the X-axis connection pattern portion with an insulating material; And
Removing the mask pattern; and manufacturing the touch screen panel.
The method of claim 4,
The second transparent electrode layer forming step may include:
Applying a conductive material forming a second transparent electrode layer on the first sensing cell and the second sensing cell;
Forming a photosensitive layer on the conductive material;
Exposing and developing the photosensitive layer to form a mask pattern on the conductive material;
Applying an etching material on the conductive material on which the mask pattern is formed;
Y, which connects the first sensing cell, the third sensing cell having the same pattern as the second sensing cell, the fourth sensing cell, and two neighboring fourth sensing cells in the Y-axis direction by etching the conductive material with the etching material. Forming an axial connection pattern portion;
And removing a mask pattern on the third sensing cell, the fourth sensing cell, and the Y-axis connecting pattern part.
The method of claim 4,
After the second transparent electrode layer forming step,
And a wiring part forming step of forming a first wiring part connected to the first sensing electrode or a third sensing electrode and a second wiring part connected to the second sensing electrode or the fourth sensing electrode. Method of manufacturing a screen panel.
The method according to claim 8,
The wiring part forming step,
Forming a photosensitive layer on the transparent substrate on which the first to fourth sensing electrodes are formed;
Exposing and developing the photosensitive layer to form a mask pattern to partially expose the end of the first sensing electrode or the third sensing electrode, the end of the second sensing electrode or the fourth sensing electrode, and the transparent substrate;
Depositing a conductive material on a portion where the mask pattern is not formed;
Removing the mask pattern; and manufacturing the touch screen panel.
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KR101406273B1 (en) 2013-11-13 2014-06-12 에스맥 (주) Film-type overcoat method of using the touch screen panel and ouch screen panel manufactured by the same
KR101426077B1 (en) 2013-03-13 2014-08-05 에스맥 (주) touch screen panel
KR101544611B1 (en) * 2015-03-25 2015-08-17 에스맥 (주) Touch Screen Panel and Manufacturing Method Therefor
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KR101426077B1 (en) 2013-03-13 2014-08-05 에스맥 (주) touch screen panel
KR101406273B1 (en) 2013-11-13 2014-06-12 에스맥 (주) Film-type overcoat method of using the touch screen panel and ouch screen panel manufactured by the same
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