KR20150009195A - Lifting Apparatus and Apparatus for Transferring Substrate - Google Patents

Lifting Apparatus and Apparatus for Transferring Substrate Download PDF

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Publication number
KR20150009195A
KR20150009195A KR20130083350A KR20130083350A KR20150009195A KR 20150009195 A KR20150009195 A KR 20150009195A KR 20130083350 A KR20130083350 A KR 20130083350A KR 20130083350 A KR20130083350 A KR 20130083350A KR 20150009195 A KR20150009195 A KR 20150009195A
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KR
South Korea
Prior art keywords
coupled
transfer arm
arm
guide rail
substrate
Prior art date
Application number
KR20130083350A
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Korean (ko)
Inventor
윤대규
Original Assignee
현대중공업 주식회사
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Priority to KR20130083350A priority Critical patent/KR20150009195A/en
Publication of KR20150009195A publication Critical patent/KR20150009195A/en

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B25—HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
    • B25J—MANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
    • B25J11/00—Manipulators not otherwise provided for
    • B25J11/0095—Manipulators transporting wafers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B25—HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
    • B25J—MANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
    • B25J9/00—Programme-controlled manipulators
    • B25J9/10—Programme-controlled manipulators characterised by positioning means for manipulator elements
    • B25J9/102—Gears specially adapted therefor, e.g. reduction gears
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B25—HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
    • B25J—MANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
    • B25J9/00—Programme-controlled manipulators
    • B25J9/16—Programme controls
    • B25J9/1615—Programme controls characterised by special kind of manipulator, e.g. planar, scara, gantry, cantilever, space, closed chain, passive/active joints and tendon driven manipulators
    • B25J9/162—Mobile manipulator, movable base with manipulator arm mounted on it
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
    • H01L21/67742—Mechanical parts of transfer devices
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
    • H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
    • H01L21/68742—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a lifting arrangement, e.g. lift pins

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  • Engineering & Computer Science (AREA)
  • Robotics (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Orthopedic Medicine & Surgery (AREA)
  • General Health & Medical Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Abstract

The present invention relates to a lifting apparatus which includes a lifting frame having a transfer arm for supporting a substrate coupled to be liftable; a rack gear coupled to a first surface of the lifting frame along the lifting direction in which the transfer arm is lifted; a pinion gear coupled to the transfer arm, and geared to the rack gear; a driving mechanism coupled to the transfer arm, and rotating the pinion gear to lift the transfer arm; a first linear motion (LM) guide rail coupled to the first surface of the lifting frame to be apart from the rack gear in a first direction; and a first LM guide block coupled to the transfer arm, and coupled to the first LM guide rail to be movable; and a substrate transfer apparatus including the same. According to the present invention, the LM guide rail and the LM guide block are not easily damaged, thereby maintaining the state of the pinion gear accurately being engaged to the rack gear, and enabling the lifting apparatus to smoothly lift the transfer arm.

Description

BACKGROUND OF THE INVENTION 1. Field of the Invention [0001] The present invention relates to a lifting apparatus,

The present invention relates to a substrate transfer apparatus for transferring a substrate.

Display devices, solar cells, semiconductor devices, etc. (hereinafter referred to as "electronic components") are manufactured through various processes. Such a manufacturing process is performed using a substrate for manufacturing the electronic component. For example, the manufacturing process may include a deposition process for depositing a thin film of a conductor, a semiconductor, a dielectric material or the like on a substrate, an etching process for forming a deposited thin film in a predetermined pattern, and the like. These manufacturing processes are performed in a process chamber that performs the process. The substrate transfer apparatus is for transferring the substrate between the process chambers.

1 is a schematic block diagram of a substrate transfer apparatus according to the prior art.

Referring to FIG. 1, a conventional substrate transfer apparatus 100 includes a transfer arm 110, a lifting device 120, a swivel portion 130, and a traveling portion 140.

The transfer arm 110 transfers the substrate. The transfer arm 110 is coupled to the elevating device 120. Accordingly, the conveying arm 110 can be rotated together with the elevating device 120 as the elevating device 120 is rotated by the turning unit 130. The transfer arm 110 may include an arm base 111, an arm body 112, an arm unit 113, and a supporting hand 116.

The elevating device (120) lifts the transfer arm (110). Accordingly, the elevation device 120 can change the height at which the transfer arm 110 is positioned. The lifting device 200 includes a lifting frame 121 to which the transfer arm 110 can be lifted and lowered, a rack gear 122 for lifting and lowering the transfer arm 110, A pinion gear 123 coupled to the feed arm 110 to lift the feed arm 110 and an LM guide rail 124 for guiding the feed arm 110 up and down along the lift direction And an LM guide block 125 movably coupled to the LM guide rail 124.

The swivel part 130 rotates the elevating device 120. Accordingly, the swivel part 130 can change the direction in which the transfer arm 110 is directed. The swivel unit 130 rotates about the rotation axis in a state where the swivel unit 130 is coupled to the driving unit 140, thereby rotating the elevator apparatus 120.

The travel unit 140 moves the swivel unit 130 along the traveling direction. Accordingly, the travel unit 140 can move the substrate supported by the transfer arm 110 in the traveling direction.

2 is a schematic plan view for explaining a transfer arm coupled to a lifting apparatus according to the related art.

2, the lifting frame 121 includes a first surface 150 to which the rack gear 122 is coupled, and a second surface 160 to which the LM guide rail 124 is coupled. The first surface 150 and the second surface 160 are different surfaces among the surfaces of the lifting frame 121 and are surfaces oriented in directions perpendicular to each other.

Accordingly, the elevating device 120 according to the related art is configured such that the pinion gear 123 coupled to the conveying arm 110 rotates to rotate the rack 150 coupled to the first surface 150 of the lifting frame 121, The LM guide block 125 coupled to the transfer arm 110 is coupled to the LM guide rail 124 coupled to the second surface 160 of the lifting frame 121, As shown in FIG. That is, a driving region A in which a driving force for moving the transfer arm 110 is generated on the basis of the lifting frame 121 and a guide region B for guiding the transfer arm 110 are arranged in a direction .

Therefore, when the pinion gear 123 moves along the rack gear 122, the lifting device 120 according to the related art moves the lifting device 120 in the direction of separating from the LM guide rail 124 to the LM guide block 125 Moment (M) will act. Accordingly, the lifting apparatus 120 according to the related art has a problem that the LM guide rail 124 and the LM guide block 125 are easily damaged or damaged by repeatedly raising and lowering the transfer arm 110 . The lifting and lowering device 120 according to the related art also has a function of holding the LM guide rail 124 and the LM guide block 125 in a state where the pinion gear 123 is engaged with the rack gear 122 There is a problem that the pinion gear 123 can not be properly engaged with the rack gear 122 due to damage or breakage of the L guide rail 124 and the L guide block 125.

SUMMARY OF THE INVENTION The present invention has been made to solve the above-mentioned problems, and it is an object of the present invention to provide a lifting device for preventing a moment from being deflected to any one of a driving region and a guide region and a substrate transferring apparatus including the same.

In order to solve the above-described problems, the present invention can include the following configuration.

The lift device for a substrate transfer apparatus according to the present invention includes a lift frame for liftably coupling a transfer arm for supporting a substrate, a rack gear coupled to a first surface of the lift frame along a lift direction of the lift arm, A drive mechanism coupled to the transfer arm and coupled to the rack gear, a drive mechanism coupled to the transfer arm for rotating the pinion gear to raise and lower the transfer arm, A first LM guide rail coupled to a first surface of the frame, and a first LM guide block coupled to the transport arm and movably coupled to the first LM guide rail.

The lift device for a substrate transfer apparatus according to the present invention includes a second LM guide rail coupled to a first surface of the lifting frame so as to be spaced apart from the rack gear in a second direction opposite to the first direction, And a second LM guide block movably coupled to the second LM guide rail.

The lift mechanism for the substrate transfer device according to the present invention can be coupled to the first surface of the first lift frame such that the first and second LM guide rails are spaced apart from the rack gear by the same distance.

A substrate transfer apparatus according to the present invention includes a transfer arm for transferring a substrate, a pivoting portion for rotating the transfer arm so that a direction of the transfer arm is changed, a traveling portion for moving the pivoting portion along a traveling direction, And a lift device for moving the transfer arm so as to change the height of the arm.

The present invention prevents the moment from being deflected to any one of the driving region and the guide region, thereby making it possible to prevent the LM guide rail and the LM guide block from being easily damaged or broken.

Further, according to the present invention, the LM guide rail and the LM guide block are prevented from being easily damaged or broken, so that the pinion gear can be maintained in a state of being correctly engaged with the rack gear, which allows the lift device to move up and down smoothly .

1 is a schematic block diagram of a prior art substrate transfer apparatus;
FIG. 2 is a schematic plan view for explaining a coupling of a transfer arm to a lifting device according to the prior art; FIG.
3 is a schematic cross-sectional view illustrating a transfer arm coupled to an elevating apparatus for a substrate transfer apparatus according to the present invention
4 is a schematic perspective view for explaining a substrate transfer apparatus according to the present invention.

It should be noted that, in the specification of the present invention, the same reference numerals as in the drawings denote the same elements, but they are numbered as much as possible even if they are shown in different drawings.

Meanwhile, the meaning of the terms described in the present specification should be understood as follows.

The word " first, "" second," and the like, used to distinguish one element from another, are to be understood to include plural representations unless the context clearly dictates otherwise. The scope of the right should not be limited by these terms.

It should be understood that the terms "comprises" or "having" does not preclude the presence or addition of one or more other features, integers, steps, operations, elements, components, or combinations thereof.

It should be understood that the term "at least one" includes all possible combinations from one or more related items. For example, the meaning of "at least one of the first item, the second item and the third item" means not only the first item, the second item or the third item, but also the second item and the second item among the first item, Means any combination of items that can be presented from more than one.

A substrate transfer apparatus according to the present invention is for transferring a substrate. The substrate is for producing electronic components such as a display device, a solar cell, and a semiconductor device. For example, the substrate may be a glass substrate for manufacturing the electronic component. The substrate may be a metal substrate, a polyimide substrate, a plastic substrate, or the like. When the electronic component is a display device, the substrate may be a bonded substrate having two or more substrates bonded together. The substrate transfer apparatus according to the present invention can transfer the substrate between process chambers performing a manufacturing process such as a deposition process, an etching process, and the like on the substrate. The substrate transfer apparatus according to the present invention may transfer the substrate between the process chambers and a cassette in which the substrate is stored.

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, preferred embodiments of a lift device for a substrate transfer device according to the present invention will be described in detail with reference to the accompanying drawings.

FIG. 3 is a schematic cross-sectional view illustrating a transfer arm coupled to an elevating apparatus for a substrate transfer apparatus according to the present invention, and FIG. 4 is a schematic perspective view for explaining a substrate transfer apparatus according to the present invention.

Referring to FIG. 3, the elevating apparatus 200 for a substrate transfer apparatus according to the present invention is for preventing a moment from being deflected to any one of the driving region (E) to the guide region (F). To this end, the elevating apparatus 200 for a substrate transfer apparatus according to the present invention includes a lifting frame 210 to which a transfer arm 310 for supporting a substrate 340 is movably coupled, A pinion gear 230 coupled to the transfer arm 310, a driving mechanism 240 for rotating the pinion gear 230, a lifting frame 210 coupled to the lifting frame 210, A first LM guide rail 250 coupled to the first surface 290 of the transfer arm 310 and a first LM guide block 260 coupled to the transfer arm 310.

The rack gear 220 is coupled to the lifting frame 210 along the lifting and lowering direction in which the lifting and lowering arm 310 is lifted and lowered. The pinion gear 230 is engaged with the rack gear 220. The drive mechanism 240 is coupled to the transfer arm 310. The driving mechanism 240 rotates the pinion gear 230 to move the transfer arm 310 up and down. The first LM guide rail 250 is coupled to the lifting frame 210 in a first direction (C-axis direction) away from the rack gear 220. The first LM guide block 260 is movably coupled to the first LM guide rail 250.

Accordingly, the driving region E and the guide region F are disposed on the same surface of the lifting frame 210 in the elevating apparatus 200 for a substrate transfer apparatus according to the present invention. The driving region E is a region where the elevating apparatus 200 for a substrate transfer apparatus according to the present invention generates a driving force for moving the transfer arm 310 up and down. In the driving region E, the pinion gear 230 coupled to the transfer arm 310 rotates and moves along the rack gear 220 coupled to the lifting frame 210, so that the transfer arm 310 ). The guide region F is an area for guiding the transfer arm 310 so as to move along the vertical direction in which the transfer arm 310 ascends and descends. In the guide region F, when the driving force is generated in the driving region E, the first LM block 260 moves along the first LM guide rail 250.

Accordingly, the elevating apparatus 200 for a substrate transfer apparatus according to the present invention can achieve the following effects.

The driving region E and the guide region F are disposed on the same surface of the lifting frame 210 in the elevating apparatus 200 for a substrate transferring apparatus according to the present invention, E) to the guide area (F). Accordingly, the elevating apparatus 200 for a substrate transfer apparatus according to the present invention can prevent the first and second LM guide rails 250 and 260 from being easily damaged or broken.

The elevating apparatus 200 for a substrate transfer apparatus according to the present invention prevents the first and second LM guide rails 250 and 260 from being easily damaged or broken, Can be maintained in a state of being properly engaged with the rack gear 220. This makes it possible to move the transfer arm 310 smoothly.

Hereinafter, the lifting frame 210, the rack gear 220, the pinion gear 230, the driving mechanism 240, the first and second electromagnet guide rails 250 and 260, Will be described in detail with reference to the accompanying drawings.

Referring to FIG. 3, the transfer arm 310 is coupled to the lifting frame 210 to be movable up and down. The lifting frame 210 is movably coupled to a transfer arm 310 for supporting the substrate 340. The lifting frame 210 is formed long in the lifting direction in which the transfer arm 310 is lifted and lowered. The lifting frame 210 may be formed of a material or structure having sufficient rigidity to firmly support the substrate supported by the transfer arm 310.

The rack gear 220 is coupled to the first surface 290 of the lifting frame 210 along the lifting direction of the lifting and lowering of the transporting arm 310. The rack gear 220 is threaded on its outer surface. The rack gear 220 is engaged with the pinion gear 230 by a thread formed on the outer surface. The rack gear 220 guides the pinion gear 230 up and down along the lifting and lowering direction in which the transfer arm 310 ascends and descends.

The pinion gear 230 is coupled to the transfer arm 310. The pinion gear 230 is engaged with the rack gear 220. One end of the pinion gear 230 is coupled to the transfer arm 310 and the other end thereof is engaged with the rack gear 220. The pinion gear 230 has threads formed on its outer surface. The pinion gear 230 is engaged with the rack gear 220 by a thread formed on the outer surface thereof. The pinion gear 230 moves up and down along the rack gear 220. The pinion gear 230 is rotatably coupled to the drive arm 240 and is coupled to the transfer arm 310.

The drive mechanism 240 is coupled to the transfer arm 310. The driving mechanism 240 rotates the pinion gear 230 to move the transfer arm 310 up and down. The drive mechanism 240 rotates the pinion gear 230 so that each of the gear teeth of the pinion gear 230 is engaged with the tooth space of the rack gear 220 in turn. As the gears of the pinion gear 230 are in turn engaged with the grooves of the rack gear 220, the pinion gear 230 moves up and down. Accordingly, when the pinion gear 230 is lifted and lowered, the transfer arm 310 is lifted and lowered. For example, the driving mechanism 240 may be a motor.

The first LM guide rail 250 is coupled to the first surface 290 of the lifting frame 210. The first LM guide rail 250 is coupled to the lifting frame 210 in a first direction (C-axis direction) away from the rack gear 220. The first LM guide rail 250 is coupled to the lifting frame 210 along a lifting direction of the lifting and lowering of the transport arm 310. The first LM guide rail 250 may be coupled to the lifting frame 210 in parallel with the rack gear 220. The first LM guide rail 250 guides the first LM guide block 260 up and down along the vertical direction in which the transfer arm 310 ascends and descends.

The first LM block 260 is coupled to the transfer arm 310. The first LM guide block 260 is movably coupled to the first LM guide rail 250. The first LM guide block 260 ascends and descends along the first LM guide rail 250. The first LM guide block 260 may be coupled to the first LM guide rail 250 to keep the pinion gear 230 engaged with the rack gear 220.

The rack gear 220 and the first electromagnet guide rail 250 are coupled to the first surface 290 of the lifting frame 210, do. The pinion gear 230 meshes with the rack gear 220 to move up and down and the first LM guide block 260 is coupled to the first LM guide rail 250, The driving area E and the first guide area F are formed substantially simultaneously on the first surface 290 of the light guide plate 290. In this case, the driving region E may be positioned on the side facing the first direction C with respect to the center of the first surface 290 of the lifting frame 210. In addition, the guide region F may have a second direction (D-axis direction) opposite to the first direction (C-axis direction) with respect to the center of the first surface 290 of the lifting frame 210 It can be located on the side facing toward. In this case, the driving area E and the first guide area F may be located at equal distances from each other with respect to the center of the first surface 290 of the lifting frame 210 . The driving region E and the first guide region F may be positioned symmetrically with respect to the center of the first surface 290 of the lifting frame 210. Accordingly, since the driving area E and the first guide area F are disposed on the same surface of the lifting frame 210, the lifting device 200 for a substrate transfer device according to the present invention can reduce the moment M, Can be evenly dispersed in the driving area (E) and the first guide area (F).

Referring to FIG. 3, the second LM guide rail 270 is coupled to the first surface 290 of the lifting frame 210. The second LM guide rail 270 is coupled to the lifting frame 210 so as to be spaced apart from the rack gear 220 in the second direction (D-axis direction). The second LM guide rail 270 is coupled to the lifting frame 210 along the lifting direction of the lifting and lowering of the transport arm 310. The second LM guide rail 270 may be coupled to the lifting frame 210 in parallel with the rack gear 220. The second LM guide rail 270 guides the second LM guide block 280 up and down along the vertical direction in which the transfer arm 310 ascends and descends.

The second LM guide block 280 is coupled to the transfer arm 310. The second LM guide block 280 is movably coupled to the second LM guide rail 270. The second LM guide block 280 is moved up and down along the second LM guide rail 270. The second LM guide block 280 is coupled to the second LM guide rail 270 to keep the pinion gear 230 engaged with the rack gear 220.

Accordingly, the elevating apparatus 200 for a substrate transfer apparatus according to the present invention is characterized in that the rack gear 220, the first electromagnet guide rail 250, and the second electromagnet guide rail 250 are mounted on the first surface 290 of the lifting frame 210, The second LM guide rail 270 is engaged. The pinion gear 230 meshes with the rack gear 220 to move up and down. The first LM guide rail 260 is coupled to the first LM guide rail 260, The first lens guide block 280 is coupled to the second lens guide block 270 so that the first area 290 of the lifting frame 210 is provided with the driving area E, The second guide area F 'is formed substantially at the same time. In this case, the driving region E may be located in the middle of the first surface 290 of the lifting frame 210. The first guide region F may be positioned on the side facing the first direction (C axis direction) with respect to the center of the first surface 290 of the lifting frame 210. The second guide area F 'may be positioned on the side facing the second direction (D-axis direction) with respect to the center of the first surface 290 of the lifting frame 210. In this case, the first LM guide rail 250 and the second LM guide rail 270 are spaced apart from the rack gear 220 by the same distance, 290 < / RTI > The first guide region F and the second guide region F 'may be located at the same distance G toward the opposite directions with respect to the driving region E. [ The first guide area F and the second guide area F 'may be positioned symmetrically with respect to the driving area E. Accordingly, the elevating apparatus 200 for a substrate transfer apparatus according to the present invention is configured such that the driving region E, the first guide region F, and the second guide region F ' The moment M can be evenly dispersed in the driving area E and the guide area F by being disposed on the same plane.

4, a substrate transfer apparatus 300 according to the present invention includes a transfer arm 310 for transferring a substrate 340, a transfer arm 310 for transferring the substrate 340, A traveling part 330 for moving the pivoting part 320 along the traveling direction and a traveling part 330 for moving the pivoting part 320 in the traveling direction, And a landing gear. Since the lift device substantially coincides with the lift device 200 for a substrate transfer device according to the present invention, a detailed description thereof will be omitted.

Hereinafter, the transfer arm 310, the swivel unit 320, and the traveling unit 330 will be described in detail with reference to the accompanying drawings.

The transfer arm 310 transfers the substrate 340. The transfer arm 310 is coupled to the elevating device 200. Accordingly, the conveying arm 310 can be rotated together with the elevating device 200 as the elevating device 200 is rotated by the turning unit 320. The transfer arm 310 may include an arm base 311, an arm body 312, an arm unit 313, and a supporting hand 316.

The arm base 311 is vertically coupled to the elevating device 200. The arm base 311 is raised and lowered by the elevating device 200. Accordingly, the height at which the transfer arm 310 is positioned can be changed.

The arm body 312 is coupled to the arm base 311. When one side of the arm base 311 is coupled to the elevating device 200, the arm body 312 may be coupled to the other side of the arm base 311.

The arm unit 313 is movably coupled to the arm body 312. As the arm unit 313 moves, the supporting hand 316 can move together. The arm unit 313 can move the supporting hand 316 in a straight line. In this case, the arm unit 313 can move linearly, thereby moving the supporting hand 316 in a straight line. Although not shown, the arm unit 313 can be moved in a straight line by rotating the support hand 316. The arm unit 313 may include a first arm mechanism 314 and a second arm mechanism 315.

The first arm mechanism 314 is movably coupled to the arm body 312. The first arm mechanism 314 can be moved by a ball screw method using a motor and a ball screw. The first arm mechanism 314 includes a gear mechanism using a motor, a rack gear and a pinion gear, a belt mechanism using a motor, a pulley and a belt, a linear motor using a coil and a permanent magnet, (Linear Motor) method. When the arm unit 313 is configured to move linearly, the first arm mechanism 314 may be movably coupled to the arm body 312 in a straight line. When the arm unit 313 is rotationally moved, the first arm mechanism 314 may be rotatably coupled to the arm body 312.

The second arm mechanism (315) is movably coupled to the first arm mechanism (314). The first arm mechanism 314 can be moved in a belt manner using a motor, a pulley, and a belt. The first arm mechanism 314 may be moved by a ball screw system using a motor and a ball screw, a gear system using a motor, a rack gear, and a pinion gear, or a linear motor system using a coil and a permanent magnet. When the arm unit 313 is configured to move linearly, the second arm mechanism 315 may be movably coupled to the first arm mechanism 314 in a straight line. When the arm unit 313 is rotationally moved, the second arm mechanism 315 may be rotatably coupled to the first arm mechanism 314. The second arm mechanism 315 and the first arm mechanism 314 rotate in opposite directions to move the support hand 316 in a straight line.

The support hand 316 is coupled to the arm unit 313. The supporting hand 316 moves linearly as the arm unit 313 moves, so that the substrate 340 can be transferred. The support hand 316 may be coupled to the second arm mechanism 315.

The transfer arm 310 may be configured to transfer a plurality of substrates 340. In this case, the transfer arm 310 may include a plurality of the second arm mechanisms 315 and the support hands 316, respectively. For example, when the transfer arm 310 is configured to transfer two substrates 340, the transfer arm 310 may include two second arm mechanisms 315 and two support hands 316, . The second arm mechanisms 315 may be coupled to the first arm mechanism 314 so as to be positioned opposite to each other with reference to the first arm mechanism 314. The supporting hands 316 may be coupled to the second arm mechanisms 315 such that the elevating apparatuses 200 are positioned at different heights based on the direction in which the transfer arm 310 is moved up and down.

The swivel unit 320 rotates the elevating device 200. The pivoting unit 320 can rotate the transfer arm by rotating the elevating device 200. Accordingly, the swivel part 320 can change the direction in which the transfer arm 310 is directed. The swivel unit 320 is rotatably coupled to the traveling unit 330. The swivel unit 320 rotates around the rotation axis in a state of being coupled to the traveling unit 330, thereby rotating the elevator apparatus 200.

The traveling unit 330 moves the swivel unit 320 along the traveling direction. Accordingly, the traveling unit 330 can move the substrate 340 supported by the transfer arm 310 in the traveling direction. The traveling unit 330 can move the swivel unit 320 by using a rack, a pinion gear, a ball screw, or the like. The traveling unit 330 may include a traveling base 331 for supporting the swing unit 320 and a traveling frame 332 for traveling the traveling base 331 along the traveling direction. The pivot portion 320 may be rotatably coupled to the traveling base 331. [

It will be apparent to those skilled in the art that various modifications and variations can be made in the present invention without departing from the spirit or scope of the invention. Will be clear to those who have knowledge of.

200: Lift device for substrate transfer device
210: lift frame 211: first side
220: rack gear 230: pinion gear
240: drive mechanism 250: first electromagnet guide rail
260: first LM guide block 270: second LM guide rail
280: second LM guide block C: first direction
D: second direction E: driving area
F: first guide area F ': second guide area
300: substrate transfer device
310: transfer arm 311: arm base
312: arm body 313: arm unit
314: first arm mechanism 315: second arm mechanism
316: Supporting hand 320:
330: running part 331: running base
332: running frame 340: substrate

Claims (4)

A lift frame in which a transfer arm for supporting a substrate is movably coupled;
A rack gear coupled to a first surface of the lifting frame along a lifting direction in which the transfer arm ascends and descends;
A pinion gear coupled to the transfer arm and engaged with the rack gear;
A drive mechanism coupled to the transfer arm for rotating the pinion gear to raise and lower the transfer arm;
A first electromagnet guide rail coupled to a first surface of the lifting frame so as to be spaced apart from the rack gear in a first direction; And
And a first LM guide block coupled to the transfer arm and movably coupled to the first LM guide rail. The method according to claim 1,
A second electromagnet guide rail coupled to a first surface of the lifting frame so as to be spaced apart from the rack gear in a second direction opposite to the first direction; And
And a second LM guide block coupled to the transfer arm and movably coupled to the second LM guide rail. 3. The method of claim 2,
Wherein the first LM guide rail and the second LM guide rail are respectively coupled to the first surface of the first lift frame so as to be spaced apart from the rack gear by the same distance. A transfer arm for transferring the substrate;
A swivel unit for rotating the transfer arm so that a direction of the transfer arm is changed;
A traveling portion for moving the pivot portion along a traveling direction; And
And a lift device for raising and lowering the transfer arm so that the height of the transfer arm is changed.
KR20130083350A 2013-07-16 2013-07-16 Lifting Apparatus and Apparatus for Transferring Substrate KR20150009195A (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20170095441A (en) * 2016-02-12 2017-08-23 현대로보틱스주식회사 Robot for transferring substrate

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20170095441A (en) * 2016-02-12 2017-08-23 현대로보틱스주식회사 Robot for transferring substrate

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