KR20140121860A - Photosensitive composition, pattern, and display device having pattern - Google Patents
Photosensitive composition, pattern, and display device having pattern Download PDFInfo
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- KR20140121860A KR20140121860A KR1020147023704A KR20147023704A KR20140121860A KR 20140121860 A KR20140121860 A KR 20140121860A KR 1020147023704 A KR1020147023704 A KR 1020147023704A KR 20147023704 A KR20147023704 A KR 20147023704A KR 20140121860 A KR20140121860 A KR 20140121860A
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/02—Diffusing elements; Afocal elements
- G02B5/0205—Diffusing elements; Afocal elements characterised by the diffusing properties
- G02B5/0236—Diffusing elements; Afocal elements characterised by the diffusing properties the diffusion taking place within the volume of the element
- G02B5/0242—Diffusing elements; Afocal elements characterised by the diffusing properties the diffusion taking place within the volume of the element by means of dispersed particles
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/201—Filters in the form of arrays
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
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- Dispersion Chemistry (AREA)
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Abstract
A display device having a photosensitive composition, a pattern, and a pattern for forming a pattern having a light scattering function used in a display device is provided. The photosensitive composition for forming a pattern having a light scattering function that uses the display device, TiO 2 filler, an optical polymerizable (meth) containing acrylic monomer, an alkali-soluble resin, a photopolymerization initiator, and organic solvent, wherein the TiO 2 The ratio of the TiO 2 filler in the total amount of the filler, the photo-polymerizable (meth) acrylic monomer and the alkali-soluble resin is in the range of 10 to 35 mass%.
Description
The present invention relates to a display device having a photosensitive composition, a pattern and a pattern for forming a pattern having a light scattering function used in a display device.
Conventionally, a full-color display device using a backlight of white light instead of a self-emission type is mainly composed of the backlight and the optical shutter. For example, a liquid crystal display device includes a light source such as an LED or a cold cathode tube as a backlight, a light guide plate and an optical sheet, and a liquid crystal panel as an optical shutter. The liquid crystal panel is composed of two polarizing plates, a pair of substrates, and a liquid crystal layer sealed between the substrates. Each of the pair of substrates is provided with TFT patterns and red, green, A color filter CF is formed. Incidentally, since white light emitted from a light source is absorbed by a color filter other than the color, only about 1/3 of the white light is transmitted. In short, in the above-described configuration, the utilization efficiency of white light is low.
Therefore, in order to improve the utilization efficiency of light, a liquid crystal display device including a liquid crystal panel, a red phosphor that absorbs blue light and emits red light, and a green phosphor that absorbs blue light and emits green light, (
By the way, in each of the above-described configurations, the orientation characteristic of the red light emitted from the red phosphor and the green light emitted from the green phosphor exhibits a lambertian (light intensity distribution), while the blue light is used without being transmitted through the phosphor, , The blue light does not exhibit the lambertian alignment characteristic. In other words, the orientation characteristic of blue light is different from the orientation characteristic of red light and green light. Therefore, as the chromaticity change in the oblique direction with respect to the front direction in the liquid crystal display device increases, the display quality decreases.
Therefore, a liquid crystal display device has been proposed in which blue light is transmitted through a scattering layer having a light scattering function to reduce chromaticity variation in the oblique direction with respect to the front direction in the liquid crystal display device, thereby improving the
Recently, a variety of compositions for forming the scattering layer have been studied. For example, Patent Document 6 discloses a composition containing a carboxylic acid compound, a copolymer of an epoxy group-containing unsaturated compound and an olefinically unsaturated compound, a light scattering substance, A monomer, and a photopolymerization initiator.
However, the radiation sensitive composition described in Patent Document 6 aims at realizing surface illumination with high front luminance by efficiently scattering reflected light (described in paragraph [0006], etc.) No special considerations have been taken to prevent chromaticity changes (color shifts) from occurring in the front direction and the oblique direction. In short, in the radiation sensitive composition described in Patent Document 6, there is no particular consideration as to the light scattering function of scattering the blue light emitted from the light source at a wide angle.
In addition, a conventional light scattering film containing an acrylic filler or the like used in a display device has a narrow scattering angle of the light transmitted through the light scattering film to as small as 10 to 30 degrees. For this reason, the conventional light scattering film has a problem that blue light can not be scattered at a wide angle.
In order to prevent the chromaticity change (color shift) from occurring in the front direction (normal direction to the light-emitting surface) and the oblique direction in the display device, it is necessary that the alignment characteristic of the blue light also exhibits a lambertian (light intensity distribution). Further, in order to efficiently form a pattern, the composition forming the diffusion layer needs to have photolithography characteristics. That is, the pattern (scattering layer) formed by using the photosensitive composition needs to have a light scattering function of scattering blue light emitted from the light source at a wide angle. Therefore, in order to improve the display quality, a photosensitive composition having photolithography characteristics preferable for use in a display device and having light scattering properties for scattering blue light at a wide angle, that is, a photosensitive composition for forming a pattern having excellent light scattering function A composition is required.
The present invention has been made in view of the above problems, and its main object is to provide a photosensitive composition for forming a pattern having a light scattering function used in a display device. Another object of the present invention is to provide a pattern having a light scattering function formed by using the photosensitive composition and a display device having a pattern.
The photosensitive composition according to the present invention is a photosensitive composition for forming a pattern having a light scattering function to be used in a display device, in order to solve the above problems. The photosensitive composition includes a TiO 2 filler, a photopolymerizable (meth) acrylic monomer, Wherein the ratio of the TiO 2 filler in the total amount of the TiO 2 filler, the photopolymerizable (meth) acrylic monomer and the alkali-soluble resin is in the range of 10 to 35 mass% have.
According to the above configuration, since the TiO 2 filler is dispersed in the photopolymerizable (meth) acrylic monomer and the alkali-soluble resin, that is, in the negative-type photosensitive resin, a photosensitive composition having both photolithography and light scattering properties can be obtained. That is, it is possible to provide a photosensitive composition having photolithography characteristics preferable for use in a display device, and having light scattering property for scattering blue light by a TiO 2 filler at a wider angle of incidence than an incident angle.
The pattern according to the present invention is formed by using the above photosensitive composition in order to solve the above problems. The display device according to the present invention has the above pattern in order to solve the above problems.
According to the above configuration, since the alignment characteristic of the blue light exhibits a lambertian (light intensity distribution), it is possible to provide a display device improved in display quality in which chromaticity change (color shift) does not occur in the front direction and the oblique direction.
According to the photosensitive composition of the present invention, it is possible to provide a photosensitive composition having photolithography characteristics suitable for use in a display device and having a light scattering property to scatter blue light by a TiO 2 filler at a wider angle than an incident angle I will exert. Further, according to the pattern related to the present invention and the display device related to the present invention, since the alignment characteristic of blue light exhibits a lambertian (light intensity distribution), a display in which chromaticity change (color shift) does not occur in the front direction and the oblique direction It is possible to provide an improved display device.
1 is a block diagram showing a schematic configuration of an example of a display device according to the present invention.
2 is a block diagram showing a schematic configuration of another example of the display device according to the present invention.
Fig. 3 is a cross-sectional view showing an example of a main part of the above-described display device and showing a schematic configuration thereof.
4 is a cross-sectional view showing an example of a color conversion substrate provided in the display device and showing a schematic structure thereof.
5 is a cross-sectional view showing a schematic configuration of another example of the color conversion substrate provided in the display device.
Fig. 6 is a cross-sectional view showing another example of the color conversion substrate provided in the display device, and showing a schematic configuration thereof.
7 is a graph showing the light intensity distribution represented by the pattern in Example 1 of the present invention as a relative value when the light intensity in the front direction in the display device is " 1 ".
8 is a graph showing the light intensity distribution represented by the pattern in Comparative Example 1 as a relative value when the light intensity in the front direction in the display device is " 1 ".
Fig. 9 shows an example of a main part of the display device. Fig. 9 (a) is a sectional view and Fig. 9 (b) is a plan view of the display device.
Fig. 10 shows another example of the main part of the display device. Fig. 10 (a) is a sectional view and Fig. 10 (b) is a plan view of the display device.
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS In the following, the photosensitive composition, the pattern, and the display device will be described in detail in order of one embodiment of the present invention.
[Photosensitive composition]
The photosensitive composition according to the present invention, TiO 2 filler, an optical polymerizable (meth) acrylic monomer, an alkali-soluble resin, a photopolymerization initiator, and contains an organic solvent, wherein the TiO 2 filler, an optical polymerizable (meth) acrylic monomer and The proportion of the TiO 2 filler in the total amount of the alkali-soluble resin is within the range of 10 to 35 mass%. Hereinafter, each configuration will be described.
<TiO 2 filler>
The TiO 2 filler may be a particle or a shape capable of exhibiting a light scattering function for scattering blue light. Therefore, the particle size and shape are not particularly limited, but specifically, the average particle size is more preferably in the range of 100 to 1,000 nm, And more preferably in the range of 150 to 250 nm. When the average particle diameter is less than 100 nm, the light scattering function may be difficult to exhibit. When the average particle diameter exceeds 1,000 nm, blue light may be difficult to transmit through the pattern.
The proportion of the TiO 2 filler in the total amount of the TiO 2 filler, the photopolymerizable (meth) acrylic monomer and the alkali-soluble resin is preferably in the range of 10 to 35 mass%, more preferably in the range of 20 to 30 mass% desirable. If the ratio of the TiO 2 filler is less than 10% by mass, the light scattering function becomes difficult to exhibit. When the ratio of the TiO 2 filler exceeds 35 mass%, the blue light is less likely to transmit the pattern.
≪ Photopolymerizable (meth) acrylic monomer >
The photopolymerizable (meth) acrylic monomer may be prepared by reacting an acryloyl group (-CH = CH-CO-) or a methacryloyl group (-CH = C (CH 3 ) -CO-), which is a functional group containing an ethylenic unsaturated group, (Meth) acrylic monomer that can be photo-polymerized. The photopolymerizable (meth) acrylic monomer constitutes a negative photosensitive resin together with an alkali soluble resin.
The photopolymerizable (meth) acrylic monomer may be specifically at least one selected from monofunctional (meth) acrylic monomers and polyfunctional (meth) acrylic monomers. In short, the photopolymerizable (meth) acrylic monomer may be composed of a monofunctional (meth) acrylic monomer, or may be composed of a polyfunctional (meth) acrylic monomer, and may have a monofunctional (meth) Of a (meth) acrylic monomer.
Specific examples of the monofunctional (meth) acrylic monomer include (meth) acrylamide, methylol (meth) acrylamide, methoxymethyl (meth) acrylamide, ethoxymethyl (meth) (Meth) acrylamide, N-methylol (meth) acrylamide, N-hydroxymethyl (meth) acrylamide, (meth) acrylic acid, fumaric acid, maleic acid (Meth) acrylate, ethyl (meth) acrylate, ethyl (meth) acrylate, isopropyl (meth) acrylate, ethyl (Meth) acrylate, 2-hydroxyethyl (meth) acrylate, 2-ethylhexyl (meth) acrylate, cyclohexyl Acrylate, 2-hydroxybutyl (meth) acrylate (Meth) acryloyloxy-2-hydroxypropyl (meth) acrylate, 2-hydroxy-3-phenoxypropyl (Meth) acrylate, glycerin mono (meth) acrylate, tetrahydrofurfuryl (meth) acrylate, dimethylaminoethyl (meth) acrylate, glycidyl (Meth) acrylate, 2,2,2-trifluoroethyl (meth) acrylate, 2,2,3,3-tetrafluoropropyl (meth) acrylate and half . These monofunctional (meth) acrylic monomers may be used alone or in combination of two or more.
Specific examples of the polyfunctional (meth) acrylic monomer include ethylene glycol di (meth) acrylate, diethylene glycol di (meth) acrylate, tetraethylene glycol di (meth) acrylate, propylene glycol di (Meth) acrylate, 1,6-hexane glycol di (meth) acrylate, trimethylol di (meth) acrylate, neopentyl glycol di (Meth) acrylate, pentaerythritol tetra (meth) acrylate, pentaerythritol tetra (meth) acrylate, pentaerythritol tri (meth) acrylate, (Meth) acrylate, dipentaerythritol hexa (meth) acrylate, 2,2-bis (4- (meth) acryloxy diethoxyphenyl) propane, 2,2- Roxy poly (Meth) acryloyloxypropyl (meth) acrylate, ethylene glycol diglycidyl ether di (meth) acrylate, diethylene glycol diglycidyl ether di (Meth) acrylate, urethane (meth) acrylate (i.e., tolylene diisocyanate), glycerin triacrylate, glycerin polyglycidyl ether poly (meth) acrylate, phthalic acid diglycidyl ester di (Meth) acrylamide, (meth) acrylamide methylene ether, polyhydric alcohol and N-methylol (meth) acrylate, a reaction product of trimethylhexamethylene diisocyanate and hexamethylene diisocyanate and 2-hydroxyethyl (Meth) acrylic acid adduct of bisphenol A diglycidyl ether, and the like. As the polyfunctional (meth) acrylic monomer, triacryl can also be used. These polyfunctional (meth) acrylic monomers may be used alone or in combination of two or more.
Among the above-exemplified photopolymerizable (meth) acrylic monomers, preferred are 2- (meth) acryloyloxyethyl-2-hydroxypropyl phthalate, 2-hydroxy-3-phenoxypropyl (meth) acrylate, bisphenol A di (Meth) acrylic acid adduct of glycidyl ether is more preferable, and 2-methacryloyloxyethyl-2-hydroxypropyl phthalate, 2-hydroxy-3-phenoxypropyl acrylate, bisphenol A diglycidyl More preferred are methacrylic acid adducts of diesters.
<Alkali-soluble resin>
The alkali-soluble resin may be a resin that is soluble in an alkaline aqueous solution, and the structure thereof is not particularly limited, but it is more preferable that the acid value, which is an index of the solubility of the resin, is within the range of 50 to 250 mgKOH / g. If the acid value of the alkali-soluble resin is less than 50 mgKOH / g, it may be difficult to dissolve in an alkaline aqueous solution. If the acid value of the alkali-soluble resin exceeds 250 mgKOH / g, the alkali resistance may be lowered. The alkali-soluble resin may have an acryloyl group or a methacryloyl group in the molecule.
Examples of the monomer constituting the alkali-soluble resin include unsaturated carboxylic acids, acrylic acid esters, methacrylic acid esters, acrylamides, methacrylamides, allyl compounds, vinyl ethers, vinyl esters, styrene And the like. In short, the alkali-soluble resin is a polymer or a copolymer formed by polymerizing at least one of these monomers.
Specific examples of the unsaturated carboxylic acids include monocarboxylic acids such as acrylic acid, methacrylic acid and crotonic acid; dicarboxylic acids such as maleic acid, fumaric acid, citraconic acid, mesaconic acid and itaconic acid; And anhydrides of these dicarboxylic acids.
Specific examples of the acrylic acid esters include linear or branched acrylic acid esters such as methyl acrylate, ethyl acrylate, propyl acrylate, isopropyl acrylate, butyl acrylate, amyl acrylate, ethylhexyl acrylate, octyl acrylate and t- Branched chain alkyl acrylates such as cyclohexyl acrylate, dicyclopentanyl acrylate, 2-methylcyclohexyl acrylate, dicyclopentanyl acrylate, dicyclopentoxyethyl acrylate, and isobornyl acrylate; Alkyl acrylates such as methyl acrylate, ethyl acrylate, 2-hydroxyethyl acrylate, 2-hydroxyethyl acrylate, 5-hydroxypentyl acrylate, trimethylolpropane monoacrylate, pentaerythritol monoacrylate, Benzyl acrylate, methoxybenzyl acrylate, furfuryl acrylate Tetrahydrofurfuryl acrylate, aryl acrylate (for example, phenyl acrylate and the like), and the like.
Specific examples of the methacrylic acid esters include methyl methacrylate, ethyl methacrylate, propyl methacrylate, isopropyl methacrylate, n-butyl methacrylate, isobutyl methacrylate, sec Linear or branched alkyl methacrylates such as butyl methacrylate, t-butyl methacrylate, amyl methacrylate, hexyl methacrylate, and octyl methacrylate; alicyclic or branched alkyl methacrylates such as cyclohexyl methacrylate, dicyclopentanyl Alicyclic alkyl methacrylates such as methacrylate, 2-methylcyclohexyl methacrylate, dicyclopentanyloxyethyl methacrylate and isobornyl methacrylate; epoxy group-containing methacrylates such as glycidyl methacrylate; 2-hydroxyethyl methacrylate, 4-hydroxybutyl methacrylate, 5-hydroxypentyl methacrylate, 2,2-dimethacrylate 3-hydroxypropyl methacrylate, trimethylolpropane monomethacrylate, pentaerythritol monomethacrylate, cyclic ether group-containing methacrylates such as furfuryl methacrylate and tetrahydrofurfuryl methacrylate; Benzyl methacrylate, chlorobenzyl methacrylate, phenyl methacrylate, cresyl methacrylate, and naphthyl methacrylate; and the like.
Specific examples of the acrylamides include acrylamide and N-alkyl acrylamide (the alkyl group preferably has 1 to 10 carbon atoms, and examples thereof include a methyl group, an ethyl group, a propyl group, a butyl group, a t- (For example, an aryl group such as a phenyl group, a tolyl group, a nitrophenyl group, a naphthyl group, a hydroxy group, an isopropyl group, an isobutyl group, Phenyl group and the like), N, N-dialkyl acrylamide (the alkyl group preferably has 1 to 10 carbon atoms), N, N-aryl acrylamide (examples of the aryl group include a phenyl group and the like ), N-methyl-N-phenylacrylamide, N-hydroxyethyl-N-methylacrylamide and N-2-acetamidoethyl-N-acetyl acrylamide.
Specific examples of the methacrylamides include methacrylamide and N-alkylmethacrylamide (the alkyl group preferably has 1 to 10 carbon atoms, and examples thereof include a methyl group, an ethyl group, a t-butyl group, an ethylhexyl group (For example, a phenyl group and the like can be mentioned as an aryl group), N, N-dialkyl methacrylamide (an alkyl group is exemplified by an alkyl group, (E.g., an ethyl group, a propyl group or a butyl group), N, N-diarylmethacrylamide (examples of the aryl group include a phenyl group and the like), N-hydroxyethyl- N-methylmethacrylamide, N-methyl-N-phenylmethacrylamide, N-ethyl-N-phenylmethacrylamide and the like.
Specific examples of the allyl compound include allyl esters (for example, allyl acetate, allyl caproate, allyl caprylate, allyl laurate, allyl palmitate, allyl stearate, allyl benzoate, acetoacetic acid Allyl, and allyl lactate), allyloxyethanol, and the like.
Specific examples of the vinyl ethers include alkyl vinyl ethers (e.g., hexyl vinyl ether, octyl vinyl ether, decyl vinyl ether, ethylhexyl vinyl ether, methoxyethyl vinyl ether, ethoxyethyl vinyl ether, But are not limited to, ethyl vinyl ether, 1-methyl-2,2-dimethylpropyl vinyl ether, 2-ethylbutyl vinyl ether, hydroxyethyl vinyl ether, diethylene glycol vinyl ether, dimethylaminoethyl vinyl ether, Vinyl ethyl ether, vinyl vinyl ether, vinyl tetrahydrofurfuryl vinyl ether and the like), vinyl aryl ethers (e.g., vinylphenyl ether, vinyl tolyl ether, vinyl chlorophenyl ether, vinyl-2,4- Phenyl ether, vinyl naphthyl ether, and vinyl anthryl ether), and the like.
Specific examples of the vinyl esters include vinyl butyrate, vinyl isobutyrate, vinyl trimethylacetate, vinyl diethyl acetate, vinyl valerate, vinyl caproate, vinyl chloracetate, vinyl dichloroacetate, Vinyl acetate, vinyl butoxy acetate, vinyl phenyl acetate, vinyl acetoacetate, vinyl lactate, vinyl-β-phenyl butyrate, vinyl benzoate, vinyl salicylate, vinyl chlorobenzoate, vinyl tetrachlorobenzoate and vinyl naphthoate. have.
Specific examples of the styrenes include styrene, alkylstyrenes (e.g., methylstyrene, dimethylstyrene, trimethylstyrene, ethylstyrene, diethylstyrene, isopropylstyrene, butylstyrene, hexylstyrene, cyclohexylstyrene, (For example, methoxystyrene, methoxystyrene, 4-methoxy-3-methyl (methoxystyrene), benzylstyrene, chloromethylstyrene, trifluoromethylstyrene, ethoxymethylstyrene and acetoxymethylstyrene) Styrene, dimethoxystyrene and the like), halogen styrene (e.g., chlorostyrene, dichlorostyrene, trichlorostyrene, tetrachlorostyrene, pentachlorostyrene, bromostyrene, dibromostyrene, Fluorostyrene, trifluorostyrene, 2-bromo-4-trifluoromethylstyrene, 4-fluoro-3-trifluoromethylstyrene, and the like) have.
These monomers constituting the alkali-soluble resin may be used alone or in combination of two or more.
Of the above-exemplified monomers, methacrylic acid, methyl methacrylate, isobutyl methacrylate, glycidyl methacrylate and benzyl methacrylate are more preferable, and methacrylic acid, glycidyl methacrylate and benzyl methacrylate A combination of methacrylic acid, methyl methacrylate and isobutyl methacrylate is more preferable. In short, the alkali-soluble resin is more preferably a polymer or copolymer formed by polymerizing these monomers.
If the acid value is in the range of 50 to 250 mgKOH / g, the alkali-soluble resin may be a copolymer obtained by copolymerizing a monomer composition containing at least one of the above-exemplified monomers with a monomer composition containing other monomer.
The production method of the alkali-soluble resin, that is, the polymerization method of the monomer is not particularly limited, and conventionally known polymerization methods can be employed. The weight average molecular weight (Mw) of the alkali-soluble resin is not particularly limited, but it is more preferably in the range of 5,000 to 80,000.
≪ Photopolymerization initiator >
The photopolymerization initiator may be any initiator capable of photopolymerizing the photopolymerizable (meth) acrylic monomer and the alkali-soluble resin (provided that the acryloyl group or the methacryloyl group is contained in the molecule) A polymerization initiator can be used, and it is not particularly limited.
Specific examples of the photopolymerization initiator include 1-hydroxycyclohexyl phenyl ketone, 2-hydroxy-2-methyl-1-phenylpropan-1-one, 1- [4- 2-methyl-1-propan-1-one, 1- (4-isopropylphenyl) -2- 2-methylpropan-1-one, 2,2-dimethoxy-1,2-diphenylethan-1-one, bis (4-dimethylaminophenyl) 2-methyl-1- [4- (methylthio) phenyl] -2-morpholinopropane- -9-ethyl-6- (2-methylbenzoyl) -9H-carbazol-3-yl], 1- (o-acetyloxime), 2,4,6-trimethylbenzoyl di Dimethylaminobenzoic acid, methyl 4-dimethylaminobenzoate, ethyl 4-dimethylaminobenzoate, butyl 4-dimethylaminobenzoate, 4-dimethylamino-2 - ethylhexylbenzoic acid, Benzyl-β-methoxyethyl acetal, benzyl dimethyl ketal, 1-phenyl-1,2-propanedione-2- (o-ethoxycarbonyl) oxime, o-benzoyl There may be mentioned methyl benzoate, 2,4-diethyl thioxanthone, 2-chlorothioxanthone, 2,4-dimethyl thioxanthone, 1-chloro-4-propanedioxanthone, 2-ethyl anthraquinone, octamethylanthraquinone, 1,2-benzanthraquinone, 2,3-diethylanthraquinone, 2,3-diethylanthraquinone, 2-mercaptobenzooxazole, 2-mercaptobenzothiazole, 2- (o-tert-butyloxycarbonyl) benzothiazole, Chlorophenyl) -4,5-diphenylimidazole dimer, 2- (o-chlorophenyl) -4,5-di (methoxyphenyl) imidazole dimer, 2- (o- 4,5-diphenylimidazole dimer, 2- (o-methoxyphenyl) -4,5-diphenyl imide 2,4-triarylimidazole dimer, benzophenone, 2-chlorobenzophenone, 4 (4-methylphenyl) imidazole dimer, 2- , 4'-bisdimethylaminobenzophenone (i.e., Michler's ketone), 4,4'-bisdiethylaminobenzophenone (i.e., ethyl Michler's ketone), 4,4'-dichlorobenzophenone, Dimethyl-4-methoxybenzophenone, benzyl, benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzoin-n-butyl ether, benzoin isobutyl ether, benzoin- Ether, acetophenone, 2,2-diethoxyacetophenone, p-dimethylacetophenone, p-dimethylaminopropiophenone, dichloroacetophenone, trichloroacetophenone, pt-butyl acetophenone, p- butyltrichloroacetophenone, pt-butyldichloroacetophenone,?,? -dichloro-4-phenoxyacetophenone, thioxanthone, 2-methylthioxanthone, 2-isopropylthio (9-acridinyl) heptane, 1,5-bis- (9-acridinyl) heptane, 1,1-dimethyl-aminobenzoate, ) Pentane, 1,3-bis- (9-acridinyl) propane, p-methoxytriazine, 2,4,6-tris (trichloromethyl) Bis (trichloromethyl) -s-triazine, 2- [2- (5-methylfuran-2-yl) ethenyl] (Trichloromethyl) -s-triazine, 2- [2- (4-diethylamino-2-methylphenyl) ethenyl] 4,6-bis (trichloromethyl) -s-triazine, 2- [2- (3,4-dimethoxyphenyl) ethenyl] (Trichloromethyl) -s-triazine, 2- (4-ethoxystyryl) -4,6-bis (trichloromethyl) -s- Triazine, 2- (4-n-butoxyphenyl) -4,6-bis (trichloromethyl) -s- triazine, 2,4-bis- trichloromethyl-6- (3- -Methoxy) phenyl- 2,4-bis-trichloromethyl-6- (2-bromo-4-methoxy) phenyl-s-triazine, 2,4- Bromo-4-methoxy) styrylphenyl-s-triazine, 2,4-bis-trichloromethyl-6- (2- . IRGACURE OXE02 "," IRGACURE OXE01 "," IRGACURE 369 "," IRGACURE 651 "," IRGACURE 907 "(all trade names, product of BASF)," NCI-831 " ) Can also be used.
Among the above-exemplified photopolymerization initiators, for example, when the photopolymerizable (meth) acrylic monomer is 2- (meth) acryloyloxyethyl-2-hydroxypropyl phthalate, 2-hydroxy- Methyl-1- [4- (methylthio) phenyl] -2-morpholinopropane-1-one in the case of the (meth) acrylic acid adduct of bisphenol A diglycidyl ether desirable.
The addition amount of the photopolymerization initiator may be set according to the kind or ratio of the photopolymerizable (meth) acrylic monomer and the alkali soluble resin (provided that the acryloyl group or the methacryloyl group is contained in the molecule), and is not particularly limited , But it is more preferably in the range of 0.5 to 10 mass% with respect to the total amount (100 mass%) of the TiO 2 filler, the photopolymerizable (meth) acrylic monomer and the alkali soluble resin.
<Organic solvents>
The organic solvent may be any solvent capable of uniformly dissolving the photopolymerizable (meth) acrylic monomer and the alkali-soluble resin in a required concentration, and conventionally known organic solvents may be used without particular limitation.
Examples of the organic solvent include organic solvents such as saturated aliphatic hydrocarbons, aromatic hydrocarbons, terpene solvents, lactones, ketones, polyhydric alcohols, cyclic ethers, esters or ethylene glycol monoacetate, diethylene glycol monoacetate, Monoacetate and dipropylene glycol monoacetate; monoalkyl ethers such as monomethyl ether, monopropyl ether, monopropyl ether and monobutyl ether of the above-mentioned polyhydric alcohols or compounds having an ester bond; or A compound having an ether linkage such as monophenyl ether, and the like, and derivatives of polyhydric alcohols such as monohydric alcohols. Among the derivatives of the polyhydric alcohols, diethylene glycol monobutyl ether, propylene glycol monomethyl ether (PGME), propylene glycol monomethyl ether acetate (PGMEA) and propylene glycol monoethyl ether acetate are more preferable.
Examples of the saturated aliphatic hydrocarbons include linear, branched or cyclic hydrocarbons. Specific examples thereof include hexane, heptane, octane, nonane, methyloctane, decane, undecane, dodecane, tridecane , Branched hydrocarbons having 3 to 15 carbon atoms such as cyclohexane, cycloheptane, cyclooctane, decahydronaphthalene, p-menthane, o-menthane, m-menthane, diphenylmethane,? -Terpinene, ? -terpinene,? -terpinene, 1,4-terpine, 1,8-terpine, borane, norbornane, pyrazine,? -pinene,? -pinene, - cyclic hydrocarbons such as bull zone, carane, and longpolyene; and the like.
Specific examples of the aromatic hydrocarbons include anisole, ethylbenzyl ether, cresyl methyl ether, diphenyl ether, dibenzyl ether, phenetole, and butyl phenyl ether. Condensed poly-cyclic hydrocarbons may also be used as the aromatic hydrocarbons. The condensed polycyclic hydrocarbon is preferably a condensed ring hydrocarbon formed by feeding two or more monocyclic rings to each side of each ring and a hydrocarbon formed by condensing two monocyclic rings. Such hydrocarbons include a combination of a five-membered ring and a six-membered ring, or a combination of two six-membered rings. Examples of hydrocarbons obtained by combining a 5-atom ring and a 6-atom ring include indene, pentalene, indane, and tetrahydroindene. Examples of hydrocarbons combining two 6-membered rings include naphthalene , Tetrahydronaphthalene (tetralin), and decahydronaphthalene (decalin).
The terpene solvent has an oxygen atom, a carbonyl group, or an acetoxy group as a polar group. Specific examples of the terpene agent include geraniol, nerol, linarol, citral, citronerol, menthol, isomenthol, neomenthol,? -Terpineol,? -Terpineol, Terpinene-1-ol, terpinene-4-ol, dihydroterpineacetate, 1,4-cineole, 1,8-cineole, borneol, carbon, yonon, bullzone, camphor, etc. .
Specific examples of the lactones include? -Butyrolactone and the like.
Specific examples of the ketones include acetone, methyl ethyl ketone, cyclohexanone, methyl-n-pentyl ketone, methyl isopentyl ketone, and 2-heptanone.
Specific examples of the polyhydric alcohols include ethylene glycol, diethylene glycol, propylene glycol, dipropylene glycol and the like.
Specific examples of the cyclic ethers include dioxane and the like.
Specific examples of the esters include methyl lactate, ethyl lactate, methyl acetate, ethyl acetate, butyl acetate, methyl pyruvate, ethyl pyruvate, methyl methoxypropionate and ethyl ethoxypropionate.
These organic solvents may be used alone or in combination of two or more.
Among the above-exemplified organic solvents, for example, when the photopolymerizable (meth) acrylic monomer is 2- (meth) acryloyloxyethyl-2-hydroxypropyl phthalate, 2-hydroxy- (Meth) acrylic acid adduct of bisphenol A diglycidyl ether is more preferable, and derivatives of polyhydric alcohols are more preferable, and diethylene glycol monobutyl ether, propylene glycol monomethyl ether (PGME), propylene glycol mono Methyl ether acetate (PGMEA), and propylene glycol monoethyl ether acetate are more preferable.
The amount of the organic solvent to be used may be set according to the type and the ratio of the photopolymerizable (meth) acrylic monomer and the alkali-soluble resin, and is not particularly limited. However, the TiO 2 filler, the photopolymerizable (meth) acrylic monomer and the alkali- , More preferably in the range of 3 to 20 mass% with respect to the total amount (100 mass%).
≪ Method of producing photosensitive composition >
The total amount of the TiO 2 filler, the photopolymerizable (meth) acrylic monomer, the alkali-soluble resin, the photopolymerization initiator, and the organic solvent, and the total amount of the TiO 2 filler, the photopolymerizable (meth) acrylic monomer and the alkali- By controlling the ratio of the TiO 2 filler in the range of 10 to 35 mass%, the photosensitive composition according to the present invention is obtained. The order of mixing the TiO 2 filler, the photopolymerizable (meth) acrylic monomer, the alkali-soluble resin, the photopolymerization initiator, and the organic solvent is not particularly limited, but a TiO 2 filler, a photopolymerizable (meth) Acrylic monomer, and an alkali-soluble resin are added and mixed. As a mixing method, for example, a TiO 2 filler, a photopolymerizable (meth) acrylic monomer, an alkali-soluble resin, a photopolymerization initiator, and an organic solvent are placed in a container and stirred, roughly mixed, , And the like. However, the method may be any method that uniformly mixes the TiO 2 filler and uniformly disperses the TiO 2 filler, and is not particularly limited.
By optimizing the ratio and average particle diameter of the TiO 2 filler and the composition of the photopolymerizable (meth) acrylic monomer and alkali-soluble resin within the range of the present invention, it is possible to obtain a photo A photosensitive composition having lithography characteristics is obtained.
[pattern]
By polymerizing a photopolymerizable (meth) acrylic monomer and an alkali-soluble resin (when an acryloyl group or a methacryloyl group is contained in the molecule) contained in the photosensitive composition, the photosensitive composition having photolithographic properties For example, a transparent substrate, followed by drying, exposure and development to form a film, whereby a pattern having a light scattering function according to the present invention can be efficiently formed.
As a method for applying the photosensitive composition, for example, a method using an applicator can be mentioned, but the method can be applied in a uniform thickness according to the viscosity of the photosensitive composition, and is not particularly limited. The coating conditions such as temperature and humidity at the time of coating may be appropriately set according to the composition of the photosensitive composition and the like.
Examples of the method of drying the applied photosensitive composition include a method of heating (baking) using, for example, a heating apparatus such as a hot plate. However, the entire photosensitive composition may be uniformly heated to sufficiently volatilize the organic solvent The method is not particularly limited. The drying conditions such as the heating temperature and the heating time may be appropriately set according to the kind of the organic solvent or the thickness of the photosensitive composition.
As a method for exposing a dried photosensitive composition, for example, a method of irradiating light with a curing light source such as an ultra-high pressure mercury lamp or the like through a mask corresponding to a desired pattern can be cited, but the entire photosensitive composition may be uniformly exposed But the present invention is not limited thereto. The exposure conditions such as the type and intensity of the light, the irradiation time and the like may be suitably set in accordance with the kind of the photopolymerization initiator and the thickness of the photosensitive composition.
As a method for developing a photosensitive composition after exposure, a method of developing (spraying) an aqueous alkaline solution such as an aqueous solution of sodium carbonate (Na 2 CO 3 ), an aqueous solution of tetramethylammonium hydroxide, an aqueous solution of potassium hydroxide, an aqueous solution of sodium hydroxide . However, the method can sufficiently dissolve the alkali-soluble resin in the non-cured portion, that is, any method that can remove the photosensitive composition, and is not particularly limited. The developing conditions such as the type and concentration of the alkaline aqueous solution and the developing time may be suitably set in accordance with the kind of the alkali-soluble resin and the thickness of the photosensitive composition.
By developing the exposed photosensitive composition, a coating film which is a cured product, that is, a desired pattern having a light scattering function according to the present invention can be obtained efficiently. The pattern according to the present invention can be suitably used, for example, as a scattering layer of a display device. Since the pattern related to the present invention can be formed by photolithography, alignment can be performed with high precision with other patterns (base) formed before forming the scattering layer in the manufacturing method of the display device, and therefore, The pattern can be formed.
The film thickness of the film as the pattern formed by using the photosensitive composition according to the present invention is more preferably in the range of 5 to 20 占 퐉 and more preferably in the range of 5 to 15 占 퐉 for the scattering layer of the display device related to the present invention. Mu] m, and particularly preferably in the range of 7 to 12 [mu] m. By setting the thickness of the coating film within the above-mentioned range, it is possible to make both the alignment characteristic of blue light and the photolithography characteristic compatible. It is more preferable that the coating film as the pattern has the following physical properties preferable for use as the scattering layer of the display device related to the present invention. That is, the haze measured by using the haze meter is more preferably 90% or more, and the total light transmittance and the diffusion transmittance are preferably 30% or more. The orientation characteristic of blue light measured by using a spectroscopic colorimetric system is in a range of ± 5% which is acceptable as a product when viewed as display quality of a display device in comparison with a lambuster (light intensity distribution) It is more preferable that it is included in the deviation within the above range. Therefore, it is more preferable that the viewing angle is ± 80 degrees. The lambertian indicates the light intensity distribution (I ()) indicated by the formula "I (θ) = I0 × COSθ" when the light intensity in the normal direction (θ = 0) to the light emitting surface is I0 .
The pattern related to the present invention is used by forming a color conversion substrate together with a red phosphor and a green phosphor as a scattering layer of a display device according to the present invention, as described later. The red light emitted from the red phosphor and the green light emitted from the green phosphor exhibit a lambertian (light intensity distribution) in orientation characteristic. Therefore, in order to prevent color shift in the front direction and the oblique direction in the display device, it is necessary to indicate the lambda cyan also in the alignment characteristic of the blue light. The scattering layer, which is a pattern related to the present invention, has a light scattering function and exhibits a lambertian alignment characteristic. Therefore, it is possible to reduce the chromaticity change in the oblique direction with respect to the front direction in the display device, Can be improved.
[Display device]
1, a display device according to the present invention has a display device (display portion) at least composed of a
The
2, the display device according to the present invention may have a display device in which the
The
The case where the
3, the
As shown in Fig. 4, the
More specifically, the
The phosphor material constituting the
The
A
A black matrix (not shown) may be formed between the
When the
The pattern related to the present invention, that is, the
According to the above configuration, it is possible to provide a display device in which the chromaticity change (color shift) does not occur in the front direction and the oblique direction, and the display quality is improved.
5, the
The
10 (a) and 10 (b), the
Example
Hereinafter, the present invention will be described in more detail based on examples, but the present invention is not limited to the following examples.
[Example 1]
TiO 2 filler (average particle size 200 ㎚) and an optical polymerizable (meth) and 2-hydroxy-3-phenoxypropyl acrylate as the acrylic monomer, benzyl methacrylate (BZMA) / methacrylic acid as the alkali-soluble resin ( Methyl-1- [4- (methylthio) phenyl] -2-morpholinopropane-1-one as a photopolymerization initiator and an organic solvent Were mixed in a vessel so that the weight ratio of the mixed solvent of diethylene glycol monobutyl ether / propylene glycol monomethyl ether acetate was 30: 40: 30: 3: 100 in this order. The mixture was roughly mixed, Were further mixed together. Thus, a photosensitive composition in which the TiO 2 filler was uniformly dispersed was prepared.
The BZMA / MAA / GMA copolymer was prepared by copolymerizing BZMA, MAA and GMA in a weight ratio of 75: 16.8: 8.2 (GMA is a glycidyl group of MAA, so that the weight ratio of BZMA and MAA is 75:25). Respectively. The weight average molecular weight (Mw) of the BZMA / MAA / GMA copolymer was 10,000 and the acid value was 131 mgKOH / g. As a mixed solvent of diethylene glycol monobutyl ether / propylene glycol monomethyl ether acetate, a mixed solvent obtained by mixing diethylene glycol monobutyl ether and propylene glycol monomethyl ether acetate in a weight ratio of 1: 1 was used.
The obtained photosensitive composition was applied to a glass substrate made of soda glass using an applicator under a coating condition of a temperature of 23 캜 and a humidity of 40%. Then, the applied photosensitive composition was heated (baked) on a hot plate at 110 DEG C for 3 minutes to volatilize the mixed solvent. Thus, a coating film having a film thickness of 8 탆 was obtained.
Thereafter, the coating film was irradiated with light at 3,000 mJ /
The width (space width) of the obtained pattern was confirmed to be 35.9 占 퐉, and the pattern reproducibility was good. Therefore, it was found that it is possible to form a pattern having a light scattering function by photolithography.
The physical properties of the pattern, that is, the evaluation results were as follows. That is, the haze was 91.4%, the total light transmittance was 33.3%, and the diffusion transmittance was 30.4%, as measured using a haze meter (NDH2000, manufactured by Nippon Denshoku Industries Co., Ltd.). The alignment characteristics of blue light measured using a spectroscopic color difference meter (GC5000, manufactured by Nippon Denshoku Kogyo K.K.) substantially corresponded to the calculated lambertian (light intensity distribution) as shown in Fig. The viewing angle was ± 80 degrees. 7 shows the light intensity distribution represented by the pattern as the light receiving angle (degrees) and the vertical axis as the light intensity (intensity (au)) in the front direction of the display device Normal direction, light receiving angle = 0 deg.) Is " 1 ".
Therefore, it can be seen that the pattern formed by using the photosensitive composition according to the present invention can reduce the chromaticity change in the oblique direction with respect to the front direction in the display device, thereby improving the display quality of the display device .
The composition and pattern evaluation results of the photosensitive composition were summarized in Table 1. In Table 1, the case where the pattern reproducibility is good is indicated by "? &Quot;, and the case where the film is poor (or the coating film is not cured) is indicated by " X ". The case where the orientation characteristic of the pattern substantially indicates lambs cyan is represented by "?", The case where it is not indicated is indicated by "x", and the case where the orientation characteristic can not be confirmed is described as "-".
[Example 2]
TiO 2 filler, 2-hydroxy-3-phenoxypropyl acrylate, BZMA / MAA / GMA copolymer, 2-methyl-1- [4- (methylthio) phenyl] -2-morpholino propan-1 Except that the weight ratio of diethylene glycol monobutyl ether / propylene glycol monomethyl ether acetate mixed solvent was 10: 50: 40: 3: 100 in this order. To prepare a photosensitive composition and a pattern. The composition and the evaluation results of the obtained photosensitive composition were summarized in Table 1.
[Example 3]
The same operation as in Example 1 was conducted except that methacrylic acid adduct of bisphenol A diglycidyl ether was used in place of 2-hydroxy-3-phenoxypropyl acrylate as a photopolymerizable (meth) acrylic monomer To prepare a photosensitive composition and a pattern. The composition and the evaluation results of the obtained photosensitive composition were summarized in Table 1.
[Example 4]
Except that methyl methacrylate (MMA) / isobutyl methacrylate (IBMA) / methacrylic acid (MAA) copolymer was used in place of BZMA / MAA / GMA copolymer as the alkali-soluble resin By carrying out the operation, a photosensitive composition and a pattern were prepared. The MMA / IBMA / MAA copolymers were prepared by copolymerizing MMA, IBMA and MAA in a weight ratio of 50: 25: 25. The MMA / IBMA / MAA copolymer had a weight average molecular weight (Mw) of 14,900 and an acid value of 171 mgKOH / g. The composition and the evaluation results of the obtained photosensitive composition were summarized in Table 1.
[Example 5]
Except that a mixture of 2-hydroxy-3-phenoxypropyl acrylate and methacrylic acid adduct of bisphenol A diglycidyl ether as a photopolymerizable (meth) acrylic monomer in a weight ratio of 1: 1 was used. , A photosensitive composition and a pattern were prepared. The composition and the evaluation results of the obtained photosensitive composition were summarized in Table 1.
[Example 6]
TiO 2 filler, 2-hydroxy-3-phenoxypropyl acrylate, BZMA / MAA / GMA copolymer, 2-methyl-1- [4- (methylthio) phenyl] -2-morpholino propan-1 Except that the weight ratio of diethylene glycol monobutyl ether / diethylene glycol monobutyl ether / propylene glycol monomethyl ether acetate mixed solvent was changed to 35: 40: 25: 3: 100 in this order. To prepare a photosensitive composition and a pattern. The composition and the evaluation results of the obtained photosensitive composition were summarized in Table 1.
[Comparative Example 1]
Except that an acrylic filler (SSX-102, manufactured by Sekisui Plastics Co., Ltd., average particle diameter: 2 占 퐉) was used in place of the TiO 2 filler, the comparative photosensitivity composition and comparison Pattern. The film thickness of the coating film was 20 占 퐉, and the light intensity at the time of exposure was 6,000 mJ / cm2. The film thickness of the comparative pattern was 20 mu m.
The width (space width) of the obtained pattern was confirmed to be 40.9 占 퐉, and the pattern reproducibility was good. However, the alignment characteristic of the blue light measured in the same manner as in Example 1 did not coincide with the calculated lambertian (light intensity distribution) at all as shown in Fig. The angle of view was narrowed to ± 30 degrees. The evaluation results of the obtained comparative photosensitive composition and the comparison pattern are summarized in Table 1.
Since the comparative pattern of Comparative Example 1 did not use TiO 2 filler, it could be formed by photolithography, but did not have sufficient light scattering function. In other words, although the transmittance in the 0 degree direction was high, the ratio of the transmittance in the direction of -80 to -5 degrees and the direction of 0 degree in the direction of 5 to 80 degrees was low, and thus did not have sufficient light scattering function.
[Comparative Example 2]
TiO 2 filler, 2-hydroxy-3-phenoxypropyl acrylate, BZMA / MAA / GMA copolymer, 2-methyl-1- [4- (methylthio) phenyl] -2-morpholino propan-1 And the mixture of diethylene glycol monobutyl ether and propylene glycol monomethyl ether acetate in a weight ratio of 40: 30: 30: 3: 100 in this order was carried out in the same manner as in Example 1 Thereby preparing a comparative photosensitive composition and a comparative pattern. The evaluation results of the obtained comparative photosensitive composition and the comparison pattern are summarized in Table 1.
In the comparative pattern of Comparative Example 2, since the ratio of the TiO 2 filler exceeded 35 mass%, the light at the time of exposure did not reach the inside of the coating film, so that the surface portion was cured but the inside was not cured. Therefore, at the time of development, the coating film of the pattern forming portion is removed, and a pattern can not be formed.
The present invention is not limited to the above-described embodiments, but various modifications may be made within the scope of the claims, and embodiments obtained by properly combining the technical means disclosed in the embodiments are also included in the technical scope of the present invention .
Industrial availability
The display device having the photosensitive composition, the pattern, and the pattern according to the present invention can be suitably used for the production of various telephone products provided with the display device.
1 backlight
2 optical shutter
3-color conversion substrate
11 light source
12 Light guide plate
21 Light source side polarizer
22 Light source side substrate
23 liquid crystal layer
24 o'clock side substrate
25-side polarizer
31 transparent substrate
32 red phosphor
33 Green phosphor
34 scattered layer
35 reflective layer
36 low refractive index layer
37 Color filters
Claims (7)
TiO 2 filler, a photopolymerizable (meth) acrylic monomer, an alkali-soluble resin, a photopolymerization initiator, and an organic solvent,
Wherein the proportion of the TiO 2 filler in the total amount of the TiO 2 filler, the photopolymerizable (meth) acrylic monomer and the alkali-soluble resin is in the range of 10 to 35 mass%.
Wherein the TiO 2 filler has an average particle size within a range of 100 to 1,000 nm.
Wherein the photopolymerizable (meth) acrylic monomer is at least one (meth) acrylic monomer selected from monofunctional (meth) acrylic monomers and polyfunctional (meth) acrylic monomers.
Wherein the acid value of said alkali-soluble resin is in the range of 50 to 250 mgKOH / g.
Wherein the film thickness is within a range of 3 to 20 占 퐉.
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JPJP-P-2012-014658 | 2012-01-26 | ||
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PCT/JP2013/050883 WO2013111674A1 (en) | 2012-01-26 | 2013-01-18 | Photosensitive composition, pattern, and display device having pattern |
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JP (1) | JP5699096B2 (en) |
KR (1) | KR20140121860A (en) |
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KR20200114974A (en) * | 2019-03-27 | 2020-10-07 | 동우 화인켐 주식회사 | A colored photosensitive resin composition, a color filter and an image display device produced using the same |
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JP2015152676A (en) * | 2014-02-12 | 2015-08-24 | 日立化成株式会社 | Material and method for forming viewing angle expansion pattern, and photosensitive element used therefor |
KR102201361B1 (en) * | 2014-09-26 | 2021-01-11 | 동우 화인켐 주식회사 | Self emission type photosensitive resin composition, and display device comprising color conversion layer prepared thereby |
KR101879016B1 (en) * | 2014-11-21 | 2018-07-16 | 동우 화인켐 주식회사 | Self emission type photosensitive resin composition, color filter manufactured using thereof and image display device having the same |
KR20170039560A (en) * | 2015-10-01 | 2017-04-11 | 롬엔드하스전자재료코리아유한회사 | Photosensitive resin composition and organic insulating film using same |
JP6692682B2 (en) * | 2016-04-21 | 2020-05-13 | スタンレー電気株式会社 | Surface emitting laser device and manufacturing method thereof |
KR102028970B1 (en) * | 2016-10-26 | 2019-10-07 | 동우 화인켐 주식회사 | Metal oxide photosensitive resin composition, color filter and image display device produced using the same |
KR102432808B1 (en) * | 2018-08-31 | 2022-08-16 | 동우 화인켐 주식회사 | A white resin composition, a back light unit prepared using the same, and a display devide comprising the same |
JP2020166255A (en) | 2019-03-29 | 2020-10-08 | 日鉄ケミカル&マテリアル株式会社 | Method for manufacturing substrate with cured film, substrate with cured film, photosensitive resin composition, cured film formed by curing photosensitive resin composition, and display device having cured film or substrate with cured film |
CN113557457A (en) * | 2019-04-10 | 2021-10-26 | 昭和电工材料株式会社 | Wavelength conversion member, backlight unit and image display device |
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JPH11133591A (en) * | 1997-10-31 | 1999-05-21 | Fujirekkusu Kk | Photosensitive film for light diffusive image formation, production of decorative glass and decorative glass |
JP3416056B2 (en) * | 1998-07-27 | 2003-06-16 | シャープ株式会社 | Liquid crystal display |
JP2001316408A (en) * | 2000-05-09 | 2001-11-13 | Jsr Corp | Radiation-sensitive composition for forming light- scattering film and light-scattering film |
JP2003021708A (en) * | 2001-07-05 | 2003-01-24 | Fujitsu Ltd | Reflection substrate, method for forming the same and reflective display element using the same |
JP3969103B2 (en) * | 2002-01-30 | 2007-09-05 | 凸版印刷株式会社 | Method for producing color filter substrate provided with photosensitive light scattering film |
JP2003255118A (en) * | 2002-02-27 | 2003-09-10 | Toppan Printing Co Ltd | Color filter with photosensitive light scattering film |
KR100735148B1 (en) * | 2004-11-22 | 2007-07-03 | (주)케이디티 | Backlight unit by phosphorescent diffusion sheet |
KR101221450B1 (en) * | 2005-07-19 | 2013-01-11 | 주식회사 동진쎄미켐 | Photosensitive resin composition comprising organic and inorganic compound |
JP4792286B2 (en) * | 2005-12-26 | 2011-10-12 | 凸版印刷株式会社 | Photopolymerizable compound for photosensitive resin composition, photosensitive resin composition, and light scattering film |
CN101395533A (en) * | 2006-03-01 | 2009-03-25 | 考格尼斯知识产权管理有限责任公司 | Curable compositions for providing a cured composition with enhanced water resistance |
JP2008216875A (en) * | 2007-03-07 | 2008-09-18 | Hitachi Chem Co Ltd | Photosensitive resin composition, photosensitive resin composition film, photosensitive resin composition film stacked substrate, photosensitive resin composition cured film and photosensitive resin composition cured film stacked substrate |
JP2009086341A (en) * | 2007-09-28 | 2009-04-23 | Fujifilm Corp | Light-scattering film, polarizing plate, and liquid crystal display |
JP2009244383A (en) * | 2008-03-28 | 2009-10-22 | Fujifilm Corp | Liquid crystal display device |
EP2293354B1 (en) * | 2008-05-30 | 2020-05-06 | Sharp Kabushiki Kaisha | Light emitting device, planar light source, liquid crystal display device |
JP5112230B2 (en) * | 2008-09-10 | 2013-01-09 | 株式会社ジャパンディスプレイイースト | Liquid crystal display |
JP5505726B2 (en) * | 2009-10-28 | 2014-05-28 | ナガセケムテックス株式会社 | Composite resin composition |
JP5701576B2 (en) * | 2009-11-20 | 2015-04-15 | 富士フイルム株式会社 | Dispersion composition, photosensitive resin composition, and solid-state imaging device |
JP5835216B2 (en) * | 2010-05-26 | 2015-12-24 | コニカミノルタ株式会社 | Light extraction sheet, organic electroluminescence element and lighting device |
-
2012
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JP2013156304A (en) | 2013-08-15 |
WO2013111674A1 (en) | 2013-08-01 |
CN107479327A (en) | 2017-12-15 |
JP5699096B2 (en) | 2015-04-08 |
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