KR20140099518A - 동박 복합체, 그리고 성형체 및 그 제조 방법 - Google Patents
동박 복합체, 그리고 성형체 및 그 제조 방법 Download PDFInfo
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- KR20140099518A KR20140099518A KR1020147017828A KR20147017828A KR20140099518A KR 20140099518 A KR20140099518 A KR 20140099518A KR 1020147017828 A KR1020147017828 A KR 1020147017828A KR 20147017828 A KR20147017828 A KR 20147017828A KR 20140099518 A KR20140099518 A KR 20140099518A
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- copper foil
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- copper
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- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 title claims abstract description 208
- 239000011889 copper foil Substances 0.000 title claims abstract description 200
- 239000002131 composite material Substances 0.000 title claims abstract description 73
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 6
- 239000011347 resin Substances 0.000 claims abstract description 121
- 229920005989 resin Polymers 0.000 claims abstract description 121
- 229910000990 Ni alloy Inorganic materials 0.000 claims abstract description 22
- 238000000034 method Methods 0.000 claims description 9
- 230000009477 glass transition Effects 0.000 claims description 5
- 238000012545 processing Methods 0.000 claims description 5
- HPDFFVBPXCTEDN-UHFFFAOYSA-N copper manganese Chemical compound [Mn].[Cu] HPDFFVBPXCTEDN-UHFFFAOYSA-N 0.000 claims 1
- 238000005452 bending Methods 0.000 abstract description 14
- 238000005336 cracking Methods 0.000 abstract description 6
- 239000010410 layer Substances 0.000 description 174
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 44
- 239000000853 adhesive Substances 0.000 description 24
- 230000001070 adhesive effect Effects 0.000 description 24
- 238000012360 testing method Methods 0.000 description 17
- 239000010408 film Substances 0.000 description 16
- 238000007747 plating Methods 0.000 description 16
- 239000011651 chromium Substances 0.000 description 13
- 238000011282 treatment Methods 0.000 description 13
- 239000010949 copper Substances 0.000 description 11
- ZCDOYSPFYFSLEW-UHFFFAOYSA-N chromate(2-) Chemical compound [O-][Cr]([O-])(=O)=O ZCDOYSPFYFSLEW-UHFFFAOYSA-N 0.000 description 10
- 150000002500 ions Chemical class 0.000 description 10
- 229910018100 Ni-Sn Inorganic materials 0.000 description 8
- 229910018532 Ni—Sn Inorganic materials 0.000 description 8
- 230000000052 comparative effect Effects 0.000 description 8
- 229910052802 copper Inorganic materials 0.000 description 8
- 238000009864 tensile test Methods 0.000 description 8
- 238000005260 corrosion Methods 0.000 description 7
- 230000007797 corrosion Effects 0.000 description 7
- 229910045601 alloy Inorganic materials 0.000 description 6
- 239000000956 alloy Substances 0.000 description 6
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 description 6
- 229910018104 Ni-P Inorganic materials 0.000 description 5
- 229910018536 Ni—P Inorganic materials 0.000 description 5
- 229910018605 Ni—Zn Inorganic materials 0.000 description 5
- 239000012790 adhesive layer Substances 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- 229920000139 polyethylene terephthalate Polymers 0.000 description 5
- 239000005020 polyethylene terephthalate Substances 0.000 description 5
- 238000002845 discoloration Methods 0.000 description 4
- 238000011156 evaluation Methods 0.000 description 4
- 238000003475 lamination Methods 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- -1 polyethylene terephthalate Polymers 0.000 description 4
- 238000003825 pressing Methods 0.000 description 4
- 238000004381 surface treatment Methods 0.000 description 4
- 229910000881 Cu alloy Inorganic materials 0.000 description 3
- 238000004833 X-ray photoelectron spectroscopy Methods 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 3
- 238000010030 laminating Methods 0.000 description 3
- 238000000465 moulding Methods 0.000 description 3
- 239000000523 sample Substances 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 229920000106 Liquid crystal polymer Polymers 0.000 description 2
- 239000004977 Liquid-crystal polymers (LCPs) Substances 0.000 description 2
- 239000004743 Polypropylene Substances 0.000 description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- 238000000137 annealing Methods 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 238000005097 cold rolling Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000011888 foil Substances 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 239000004033 plastic Substances 0.000 description 2
- 229920003023 plastic Polymers 0.000 description 2
- 229920003207 poly(ethylene-2,6-naphthalate) Polymers 0.000 description 2
- 239000011112 polyethylene naphthalate Substances 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- 230000037303 wrinkles Effects 0.000 description 2
- WHOZNOZYMBRCBL-OUKQBFOZSA-N (2E)-2-Tetradecenal Chemical compound CCCCCCCCCCC\C=C\C=O WHOZNOZYMBRCBL-OUKQBFOZSA-N 0.000 description 1
- 229920002799 BoPET Polymers 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 229910000570 Cupronickel Inorganic materials 0.000 description 1
- 229910017709 Ni Co Inorganic materials 0.000 description 1
- 229910003267 Ni-Co Inorganic materials 0.000 description 1
- 229910003262 Ni‐Co Inorganic materials 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- QRUDEWIWKLJBPS-UHFFFAOYSA-N benzotriazole Chemical compound C1=CC=C2N[N][N]C2=C1 QRUDEWIWKLJBPS-UHFFFAOYSA-N 0.000 description 1
- 239000012964 benzotriazole Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- YOCUPQPZWBBYIX-UHFFFAOYSA-N copper nickel Chemical compound [Ni].[Cu] YOCUPQPZWBBYIX-UHFFFAOYSA-N 0.000 description 1
- 230000002596 correlated effect Effects 0.000 description 1
- 239000012787 coverlay film Substances 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- ALKZAGKDWUSJED-UHFFFAOYSA-N dinuclear copper ion Chemical compound [Cu].[Cu] ALKZAGKDWUSJED-UHFFFAOYSA-N 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000005489 elastic deformation Effects 0.000 description 1
- 238000005868 electrolysis reaction Methods 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000001125 extrusion Methods 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 230000017525 heat dissipation Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 230000002401 inhibitory effect Effects 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000001465 metallisation Methods 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 229940044654 phenolsulfonic acid Drugs 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 238000005554 pickling Methods 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 238000001953 recrystallisation Methods 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B15/00—Layered products comprising a layer of metal
- B32B15/04—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
- B32B15/08—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B15/00—Layered products comprising a layer of metal
- B32B15/20—Layered products comprising a layer of metal comprising aluminium or copper
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
- H05K3/022—Processes for manufacturing precursors of printed circuits, i.e. copper-clad substrates
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/0393—Flexible materials
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/09—Use of materials for the conductive, e.g. metallic pattern
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/01—Dielectrics
- H05K2201/0137—Materials
- H05K2201/0141—Liquid crystal polymer [LCP]
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/01—Dielectrics
- H05K2201/0137—Materials
- H05K2201/0145—Polyester, e.g. polyethylene terephthalate [PET], polyethylene naphthalate [PEN]
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/01—Dielectrics
- H05K2201/0137—Materials
- H05K2201/0158—Polyalkene or polyolefin, e.g. polyethylene [PE], polypropylene [PP]
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/07—Treatments involving liquids, e.g. plating, rinsing
- H05K2203/0703—Plating
- H05K2203/0723—Electroplating, e.g. finish plating
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Laminated Bodies (AREA)
- Parts Printed On Printed Circuit Boards (AREA)
- Structure Of Printed Boards (AREA)
Abstract
프레스 가공 등과 같은 1 축 굽힘과 상이한 과혹 (복잡) 한 변형을 실시해도 동박이 균열되는 것을 방지하여, 가공성이 우수한 동박 복합체, 그리고 성형체 및 그 제조 방법을 제공한다.
해결 수단
동박과 수지층이 적층된 동박 복합체로서, 동박의 두께를 t2 (㎜), 인장 변형 4 % 에 있어서의 동박의 응력을 f2 (㎫), 수지층의 두께를 t3 (㎜), 인장 변형 4 % 에 있어서의 수지층의 응력을 f3 (㎫) 으로 했을 때, 식 1 : (f3 × t3)/(f2 × t2) ≥ 1 을 만족시키고, 또한, 동박과 수지층의 180°박리 접착 강도를 f1 (N/㎜), 동박 복합체의 인장 변형 30 % 에 있어서의 강도를 F (㎫), 동박 복합체의 두께를 T (㎜) 로 했을 때, 식 2 : 1 ≤ 33f1/(F × T) 를 만족시키며, 동박 중 수지층이 적층되어 있지 않은 면에, 합계 두께 0.001 ∼ 5.0 ㎛ 의 Ni 층 및/또는 Ni 합금층이 형성되어 있다.
Description
도 2 는 가공성의 평가를 실시하는 컵 시험 장치의 구성을 나타내는 도면이다.
Claims (6)
- 동박과 수지층이 적층된 동박 복합체로서,
상기 동박의 두께를 t2 (㎜), 인장 변형 4 % 에 있어서의 상기 동박의 응력을 f2 (㎫), 상기 수지층의 두께를 t3 (㎜), 인장 변형 4 % 에 있어서의 상기 수지층의 응력을 f3 (㎫) 으로 했을 때, 식 1 : (f3 × t3)/(f2 × t2) ≥ 1 을 만족시키고,
또한, 상기 동박과 상기 수지층의 180°박리 접착 강도를 f1 (N/㎜), 상기 동박 복합체의 인장 변형 30 % 에 있어서의 강도를 F (㎫), 상기 동박 복합체의 두께를 T (㎜) 로 했을 때, 식 2 : 1 ≤ 33f1/(F × T) 를 만족시키며,
상기 동박 중 수지층이 적층되어 있지 않은 면에, 합계 두께 0.001 ∼ 5.0 ㎛ 의 Ni 층 및/또는 Ni 합금층이 형성되어 있는 것을 특징으로 하는 동박 복합체. - 제 1 항에 있어서,
상기 Ni 층 및/또는 Ni 합금층의 합계 두께가 0.001 ∼ 0.50 ㎛ 인 것을 특징으로 하는 동박 복합체. - 제 1 항 또는 제 2 항에 있어서,
상기 수지층의 유리 전이 온도 미만의 온도에 있어서, 상기 식 1 및 식 2 가 성립되는 것을 특징으로 하는 동박 복합체. - 제 1 항 내지 제 3 항 중 어느 한 항에 있어서,
상기 동박 복합체의 인장 파단 변형 l 과, 상기 수지층 단체의 인장 파단 변형 L 의 비 l/L 이 0.7 ∼ 1 인 것을 특징으로 하는 동박 복합체. - 제 1 항 내지 제 4 항 중 어느 한 항에 기재된 동박 복합체를 가공하여 이루어지는 성형체.
- 제 1 항 내지 제 4 항 중 어느 한 항에 기재된 동박 복합체를 가공하는 성형체의 제조 방법.
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JPJP-P-2012-005116 | 2012-01-13 | ||
JP2012005116 | 2012-01-13 | ||
PCT/JP2013/050001 WO2013105520A1 (ja) | 2012-01-13 | 2013-01-03 | 銅箔複合体、並びに成形体及びその製造方法 |
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Country Status (5)
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JP (1) | JP5475196B2 (ko) |
KR (1) | KR101626691B1 (ko) |
CN (1) | CN104010810B (ko) |
TW (1) | TWI468286B (ko) |
WO (1) | WO2013105520A1 (ko) |
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JP2017189894A (ja) * | 2016-04-12 | 2017-10-19 | 宇部エクシモ株式会社 | 金属積層体及び金属成形体 |
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JP5497949B1 (ja) * | 2013-07-03 | 2014-05-21 | Jx日鉱日石金属株式会社 | 電磁波シールド用金属箔、電磁波シールド材及びシールドケーブル |
JP5887305B2 (ja) | 2013-07-04 | 2016-03-16 | Jx金属株式会社 | 電磁波シールド用金属箔、電磁波シールド材、及びシールドケーブル |
CN106460219B (zh) | 2014-05-30 | 2019-11-19 | Jx金属株式会社 | 电磁波屏蔽用金属箔、电磁波屏蔽材料及屏蔽电缆 |
WO2015181969A1 (ja) * | 2014-05-30 | 2015-12-03 | Jx日鉱日石金属株式会社 | 電磁波シールド用金属箔、電磁波シールド材及びシールドケーブル |
CN114188543A (zh) * | 2021-11-15 | 2022-03-15 | 深圳市宝明科技股份有限公司 | 一种复合导电铜箔及其制备方法 |
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- 2013-01-03 CN CN201380004621.0A patent/CN104010810B/zh active Active
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JP2010100887A (ja) | 2008-10-23 | 2010-05-06 | Nippon Mining & Metals Co Ltd | 屈曲性に優れた銅箔及びフレキシブル銅貼積層板 |
WO2011004664A1 (ja) * | 2009-07-07 | 2011-01-13 | 日鉱金属株式会社 | 銅箔複合体 |
JP2011210994A (ja) * | 2010-03-30 | 2011-10-20 | Jx Nippon Mining & Metals Corp | プリント配線板用銅箔及びそれを用いた積層体 |
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JP2017189894A (ja) * | 2016-04-12 | 2017-10-19 | 宇部エクシモ株式会社 | 金属積層体及び金属成形体 |
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TW201334957A (zh) | 2013-09-01 |
KR101626691B1 (ko) | 2016-06-01 |
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JPWO2013105520A1 (ja) | 2015-05-11 |
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JP5475196B2 (ja) | 2014-04-16 |
CN104010810B (zh) | 2016-03-23 |
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