KR20140092708A - Wet process chamber and wet process apparatus having the same - Google Patents

Wet process chamber and wet process apparatus having the same Download PDF

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Publication number
KR20140092708A
KR20140092708A KR1020130005107A KR20130005107A KR20140092708A KR 20140092708 A KR20140092708 A KR 20140092708A KR 1020130005107 A KR1020130005107 A KR 1020130005107A KR 20130005107 A KR20130005107 A KR 20130005107A KR 20140092708 A KR20140092708 A KR 20140092708A
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KR
South Korea
Prior art keywords
housing
wet process
opening
friction
side member
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KR1020130005107A
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Korean (ko)
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KR101654293B1 (en
Inventor
정광춘
온웅구
한영구
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주식회사 잉크테크
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Priority to KR1020130005107A priority Critical patent/KR101654293B1/en
Priority to PCT/KR2014/000495 priority patent/WO2014112818A1/en
Priority to CN201480015848.XA priority patent/CN105163873B/en
Publication of KR20140092708A publication Critical patent/KR20140092708A/en
Application granted granted Critical
Publication of KR101654293B1 publication Critical patent/KR101654293B1/en

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67126—Apparatus for sealing, encapsulating, glassing, decapsulating or the like
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/004—Sealing devices
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
    • H01L21/6719—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the construction of the processing chambers, e.g. modular processing chambers

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  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • General Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Computer Hardware Design (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Organic Chemistry (AREA)
  • Electrochemistry (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Weting (AREA)
  • Braking Arrangements (AREA)
  • Ink Jet (AREA)

Abstract

The present invention relates to a wet processing chamber for a wet proceeding of a target material. The wet processing chamber comprises: a housing having one or more opening units formed in order for the target material to be passed; and a blocking unit arranged to face the opening unit having a slit formed for the material to be passed. The blocking unit is larger than the opening unit. The slit of the blocking unit has a width smaller than the opening unit.

Description

TECHNICAL FIELD The present invention relates to a wet process chamber and a wet process apparatus including the wet process chamber.

The present invention relates to a wet process chamber and a wet process apparatus including the same. More particularly, the present invention relates to a wet process chamber for preventing wetting of the interior of a wet process chamber during a wet process, And a wet process apparatus including the same.

The wet process is used in the manufacture of various products, for example, the wet process includes a cleaning process, a plating process or an etching process, and may be various processes using a solution.

In particular, wet processing is used to precisely process various electrical and electronic products and other mechanical parts.

FIG. 1 is a schematic view showing a process including a conventional wet process, and FIG. 2 is a perspective view schematically showing a single wet process chamber of FIG.

Referring to Figs. 1 and 2, the object 1 is treated while passing through a plurality of chambers 11, 12, 13 while moving the material 1 in one direction, that is, in the X1 direction .

The material to be treated 1 may be in various forms such as a film, a substrate, a wafer, and the like to be subjected to a wet process.

The chamber 11 is a chamber through which a wet process is performed, and has at least one opening 11a for entering and exiting the material to be treated 1. Further, although not shown, the material to be treated 1 may undergo another wet process before passing through the chamber 11.

The solution to be used for the wet process performed in the chamber 11 when the material to be treated 1 passes through the opening 11a of the chamber 11 and enters the inside of the chamber 11 as shown in Fig. A solution, that is, an impurity solution can be introduced into the chamber 11 together with the material to be treated 1 through the opening 11a.

That is, as described above, the material to be treated 1 may undergo at least one wet process before passing through the chamber 11, and the solution used in the wet process remains in the material 1 to be treated. In addition, other impurity solutions may remain in the material 1 to be treated.

The remaining solution flows into the chamber 11 through the opening 11a.

Particularly, it is not easy to manufacture the opening 11a to have a small size corresponding to the thickness of the material to be treated 1 due to the difficulty in manufacturing the chamber 11.

Therefore, when the material to be treated 1 flows into the opening 11a, the impurity solution flows into the chamber 11 through the opening 11a, and the inside of the chamber 11 is contaminated by the impurity solution. As a result, the wet process characteristics are degraded and the characteristic conditions of the wet process change, which limits the wet process to precisely control as desired.

The present invention can provide a wet process chamber that prevents the interior of a wet process chamber from being contaminated and improves wet process characteristics and a wet process apparatus including the same.

The present invention relates to a wet process chamber for carrying out a wet process on a material to be treated, the process chamber comprising a housing having at least one opening portion through which the material to be processed passes, and a housing disposed so as to correspond to the opening, Wherein the blocking portion has a larger size than the opening portion and the slit of the blocking portion has a smaller width than the opening portion.

In the present invention, the blocking portion may include an outer portion disposed on the outer side of the housing, an inner portion corresponding to the outer portion, an inner portion disposed on the inner side of the housing, and a coupling portion coupling the outer portion and the inner portion.

In the present invention, the blocking portion may be formed to be attachable to and detachable from the housing through the coupling portion.

In the present invention, the outer side portion and the inner side portion may each include a first side member and a second side member arranged to face each other.

In the present invention, the outer side and the inner side may have slits formed between the first side member and the second side member.

In the present invention, the slit of the blocking portion may overlap the slit of each of the outer side portion and the inner side portion.

In the present invention, the first side member and the second side member may have grooves formed on respective side surfaces facing each other, and the grooves may form the slits of the outer side and the inner side.

In the present invention, the first side member of the outer side part is coupled with the first side member of the inner side part through the engagement part, and the second side member of the outer side part is coupled with the second side member of the inner side part through the engagement part have.

In the present invention, the outer side portion may include a groove corresponding to the engaging portion, and the inner side portion may include a through hole corresponding to the engaging portion.

In the present invention, the coupling portion may be arranged to correspond to the opening while coupling the outer side and the inner side.

In the present invention, the outer side portion may be formed thicker than the inner side portion.

In the present invention, the length of the slit of the blocking portion may be equal to or smaller than the length of the opening.

In the present invention, it may further comprise a friction portion corresponding to the opening portion and disposed adjacent to the blocking portion, the friction portion being formed to be in contact with the surface of the material to be treated.

In the present invention, the friction portion may include a first friction member and a second friction member arranged to face each other.

In the present invention, the friction portion may be arranged to correspond to the inside of the slit of the blocking portion.

In the present invention, the friction portions may be disposed on the inner side of the housing.

In the present invention, the friction portion may have a roll shape.

In the present invention, the object to be processed is subjected to the wet process so that the material to be treated passes through the slit of the opening and the blocking portion while being oriented in a direction parallel to the paper surface or in a direction perpendicular to the paper surface, .

The apparatus may further include an inner housing disposed in the housing and configured to provide a space in which the wet process is performed, the inner housing having at least one opening for allowing and receiving the material to be processed.

In the present invention, the inner housing may have a box shape.

In the present invention, the inner housing may have a box shape without a bottom surface and be in contact with a bottom surface of the housing.

The apparatus may further include a friction portion corresponding to the opening portion of the inner housing and disposed inside or outside the inner housing and configured to contact the surface of the material to be treated.

In the present invention, the friction portion may include a first friction member and a second friction member arranged to face each other.

In the present invention, the friction portion may have a roll shape.

In the present invention, the wet process may include a cleaning, plating or etching process.

In the present invention, the material to be treated may comprise a film material, a wafer or a substrate.

According to another aspect of the present invention, there is provided a wet process apparatus comprising the wet process chamber.

In the present invention, the wet process apparatus may include a plurality of process chambers, and at least one of the process chambers may be the wet process chamber.

The wet process chamber and the wet process apparatus including the same according to the present invention easily prevent the contamination of the wet process chamber, which is generated when an undesired solution flows into the wet process together with the material to be treated.

This makes it possible to maintain the cleanliness inside the wet process chamber easily and precisely control the wet process.

As a result, the improvement of wet process characteristics can be maximized.

FIG. 1 is a view schematically showing a process including a conventional wet process.
2 is a perspective view schematically illustrating one wet process chamber of FIG.
3 is a perspective view schematically illustrating a wet process chamber according to an embodiment of the present invention.
Fig. 4 is a side view seen in the direction of K in Fig. 3;
5 is an enlarged view of A in Fig.
Fig. 6 is a view showing only an opening portion in Fig. 5. Fig.
Fig. 7 is a view seen from the direction M in Fig.
FIG. 8 is a cross-sectional view taken along the line VIII-VIII in FIGS. 5 and 7. FIG.
9 is a cross-sectional view schematically illustrating a wet process chamber according to another embodiment of the present invention.
10 is an enlarged view of FIG. 9A.
11 is a perspective view schematically showing a wet process chamber according to another embodiment of the present invention.
12 is a plan view viewed from the direction M in Fig.
13 is a perspective view schematically illustrating a wet process chamber according to another embodiment of the present invention.
14 is a plan view schematically illustrating a wet process chamber according to another embodiment of the present invention.
15 is a plan view schematically illustrating a wet process chamber according to another embodiment of the present invention.
16 is a view schematically showing an example of a wet processing apparatus to which the wet process chamber of the present invention is applied.

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, the present invention will be described in detail with reference to the accompanying drawings.

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, the present invention will be described in detail with reference to the accompanying drawings. The following examples are intended to illustrate the present invention and should not be construed as limiting the scope of the present invention.

Here, i) the shape, size, ratio, angle, number, operation, etc. shown in the accompanying drawings are schematic and may be modified somewhat. ii) Since the figure is shown by the observer's line of sight, the direction and position of the figure can be variously changed depending on the position of the observer. iii) The same reference numerals can be used for the same parts even if the drawing numbers are different. iv) If 'include', 'have', 'done', etc. are used, other parts may be added unless '~ only' is used. v) can be interpreted in a plurality of cases as described in the singular. vi) Comparison of numerical values, shapes, sizes, and positional relations are interpreted to include normal error ranges even if they are not described as 'weak', 'substantial', or 'relative'. vii) The term 'after', 'before', 'after', 'and', 'here', 'following', etc. are used, but are not used to limit the temporal position. viii) If the positional relationship between two parts is described by 'on', 'on', etc., one or more other parts may be interposed between the two parts, unless 'right' is used. ix) When parts are connected by '~' or ',' and / or 'parts are interpreted to include not only singles but also combinations,

FIG. 3 is a perspective view schematically showing a wet process chamber according to an embodiment of the present invention, FIG. 4 is a side view in the direction of K in FIG. 3, FIG. 5 is an enlarged view of A in FIG. FIG. 7 is a view taken along line M of FIG. 4, and FIG. 8 is a cross-sectional view taken along line VIII-VIII of FIG.

Referring to FIGS. 3-8, the wet process chamber 100 includes a housing 101 and a blocking portion 110.

The wet process chamber 100 can perform various wet processes on the material 1 to be treated. That is, the wet process chamber 100 is formed to be capable of conducting cleaning, etching, plating or various other wet processes.

The material 1 to be treated may be in the form of a substrate, a wafer or other film.

The housing 101 may have a box shape similar to a rectangular parallelepiped so as to carry out a wet process therein, and has at least one opening portion 101a. The housing 101 is provided with two openings 101a through which the article to be treated 1 flows into the housing 101 through one opening 101a and then through the other opening 101a The material to be treated 1 can flow out of the housing 101. [ However, the present invention is not limited to this, and it is of course possible that the housing 101 is provided with one opening portion 101a, and the material to be processed 1 enters and exits through one opening portion 101a.

A cavity 190 for carrying out a wet process is disposed in the housing 101. The cavity 190 has a body member 191 and a nozzle member 192 as shown in Fig. The body member 191 is disposed on the inner wall of the housing 101 to be stably fixed, and transfers the solution for the wet process to the nozzle member 192. The nozzle member 192 injects this solution onto the material 1 to be processed and proceeds with the wet process.

4 may be provided in various forms. For example, the nozzle unit may be provided without a body member, and the number of the nozzle members may be limited none. In addition, the nozzle member can be arranged at various positions in the housing 101. Fig. In addition, the wet process can be performed by receiving the solution in the housing 101 without a separate nozzle member.

The blocking portion 110 is disposed so as to correspond to the opening portion 101a of the housing 101, that is, to overlap at least the opening portion 101a. Further, the blocking portion 110 has an area larger than that of the opening portion 101a.

The blocking portion 110 includes an outer portion 120, an inner portion 130, and a coupling portion 140. The outer portion 120 is disposed outside the housing 101 and overlaps with the opening 101a. The inner side portion 130 is disposed inside the housing 101 and overlaps with the opening portion 101a. The inner side 130 is disposed to correspond to the outer side 120. The engaging portion 140 engages the outer portion 120 and the inner portion 130.

5, the outer side 120 includes a first side member 121, a second side member 122, and a slit 123. The first side member 121, the second side member 122,

The first side member 121 constitutes the left side of the outer side 120 and the second side member 122 constitutes the right side of the outer side 120. The slit 123 is formed between the first side member 121 and the second side member 122.

Specifically, the first side member 121 has a shape elongated to have a length greater than the length of the opening 101a. The other side of the first side member 121 is positioned at the center of the opening 101a so that the other side of the first side member 121 is positioned above the opening 101a, The side member 121 has a width equal to or larger than a predetermined size.

Like the first side member 121, the second side member 122 has a shape elongated to have a length greater than the length of the opening 101a. The other side of the second side member 122 is positioned at the center of the opening 101a so that the other side of the second side member 122 is positioned above the opening 101a and in the housing 101, The side member 122 has a width equal to or larger than a predetermined size.

As shown in FIG. 5, it is preferable that the first side member 121 and the second side member 122 are symmetrical to each other.

The slit 123 has a predetermined length and width. That is, the slit 123 has a very small width as compared with the opening 101a, and preferably has a width slightly larger than the thickness of the material 1 to be treated. Thereby preventing the solution remaining in the material to be treated 1 from flowing into the housing 101 of the wet process chamber 100. It is also preferable that the slit 123 is smaller than the opening 101a or at least has a length corresponding to the opening 101a.

The slit 123 is formed through the arrangement of the first side member 121 and the second side member 122. In order to form the slit 123, the first side member 121 and the second side member 122 are formed with grooves having a predetermined width on one side. The grooves of the first side member 121 and the second side member 122 are connected to each other to form a slit 123.

That is, the width and length of the slit 123 are determined according to the width and length of the grooves of the first side member 121 and the second side member 122. In addition, the width of the slit 123 may vary depending on the distance between the first side member 121 and the second side member 122. As shown in FIG. 5, it is preferable that the first side member 121 and the second side member 122 are disposed as close as possible to each other, that is, they are arranged so as to be in contact with each other at one side.

The first side member 121 and the second side member 122 each have a plurality of grooves 121a and 122a. 5 shows a state in which four grooves 121a and 122a are disposed on the first side member 121 and the second side member 122, respectively, in the grooves 121a and 122a, However, the number of the grooves 121a and 122a may be variously changed according to the shapes of the opening 101a, the first side member 121, and the second side member 122.

The grooves 121a and 122a have a predetermined depth and are variously determined according to the length of the coupling portion 140. [

6, the opening 101a is formed on the side surface of the housing 101 so as to have a predetermined width and length. As described above, the size of the blocking portion 110 is larger than that of the opening 101a.

The inner side 130 of the blocking portion 110 will be described with reference to FIG.

The inner side portion 130 includes a first side member 131, a second side member 132, and a slit 133.

The first side member 131 constitutes the right side of the inner side 130 and the second side member 132 constitutes the left side of the inner side 130. The slit 133 is formed between the first side member 131 and the second side member 132.

The inner side 130 corresponds to the outer side 120 and is coupled to the outer side 120. Specifically, the first side member 131 of the inner side 130 corresponds to the first side member 121 of the outer side 120, And the second side member 132 of the medial side 130 corresponds to and engages with the second side member 122 of the lateral side 120. [

Specifically, the first side member 131 of the inner side portion 130 has a shape elongated to have a length greater than the length of the opening 101a. The other side of the first side member 131 is positioned at the center of the opening 101a so that the other side of the first side member 131 is positioned above the opening 101a, The side member 131 has a width equal to or larger than a predetermined size.

Like the first side member 131, the second side member 132 has a length longer than the length of the opening 101a. The other side of the second side member 132 is positioned at the center of the opening 101a so that the other side of the second side member 132 is positioned above the opening 101a and on the housing 101, The side member 132 has a width equal to or larger than a predetermined size.

As shown in FIG. 7, the first side member 131 and the second side member 132 are preferably symmetrical to each other.

The slit 133 has a predetermined length and width. That is, the slit 133 has a very small width as compared with the opening 101a, and it is preferable that the slit 133 has a width slightly larger than the thickness of the material 1 to be treated. Thereby preventing the solution remaining in the material to be treated 1 from flowing into the housing 101 of the wet process chamber 100. It is also preferable that the slit 133 is smaller than the opening 101a or at least has a length corresponding to the opening 101a.

The slit 133 of the inner side portion 130 corresponds to the slit 123 of the outer side portion 120. [ More preferably, the slits 133 of the inner side portion 130 have the same shape and size as the slits 123 of the outer side portion 120 and overlap each other.

The slit 133 of the inner side part 130 and the slit 123 of the outer side part 120 are overlapped to form the slit 113 of the blocking part 110.

The slit 133 of the inner side 130 is formed through the arrangement of the first side member 131 and the second side member 132. In order to form the slit 133, the first side member 131 and the second side member 132 are formed with grooves having a predetermined width on one side. The grooves of the first side member 131 and the second side member 132 are connected to each other to form a slit 133.

That is, the width and length of the slit 133 are determined according to the width and length of the grooves of the first side member 131 and the second side member 132. In addition, the width of the slit 133 may vary depending on the distance between the first side member 131 and the second side member 132. As shown in FIG. 7, the first side member 131 and the second side member 132 are preferably arranged so as to be as close as possible to each other, that is, they are arranged so as to be in contact with each other at one side.

The first side member 131 and the second side member 132 have a plurality of through holes 131a and 132a, respectively. The through holes 131a and 132a are provided with an engaging portion 140. In FIG. 7, four through holes 131a and 132a are disposed in the first side member 131 and the second side member 132, respectively The number of the through holes 131a and 132a may be variously changed according to the shape of the opening 101a, the first side member 131 and the second side member 132.

The through holes 131a and 132a are formed to correspond to the grooves 121a and 122a with a predetermined width so as to penetrate the coupling portion 140.

Referring to FIG. 8, the blocking unit 110 will be described in more detail.

8, the outer portion 120 and the inner portion 130 of the blocking portion 110 are coupled by the coupling portion 140. As shown in FIG. The engaging portion 140 can be a variety of fastening means, for example, screws, pins, and various other shapes. The inner circumferential surfaces of the grooves 121a and 122a of the outer side 120 corresponding to the coupling portion 140 and the through holes 131a and 132a of the inner side 130 are formed with a threaded surface corresponding to the coupling portion 140 .

Also, the engaging portion 140 corresponds to the opening 101a and is not overlapped with the housing 101.

The first side member 121 of the outer side 120 and the first side member 131 of the inner side 130 are disposed to correspond to the opening 101a while being in contact with one side of the housing 101. [ The first side member 121 of the outer side 120 and the first side member 131 of the inner side 130 are spaced apart from each other by a predetermined distance in the opening 101a, A portion 140 is disposed.

The second side member 122 of the outer side 120 and the second side member 132 of the inner side 130 are arranged to correspond to the opening 101a while being in contact with one side of the housing 101. The second side members 122 of the outer side 120 and the second side members 132 of the inner side 130 are separated from each other by a predetermined distance in the opening 101a, A portion 140 is disposed.

Since the engaging portion 140 is disposed to correspond to the opening portion 101a, it is not necessary to provide a separate member or the like in the housing 101 when the blocking portion 110 is disposed. That is, since the coupling portion 140 only connects the outer portion 120 and the inner portion 130, there is no need to change the design of the housing 101. It is not necessary to form an additional through hole for the coupling portion 140 in the housing 101 so that it is easy to manufacture the housing 101 and the leakage through the through hole that may be generated in forming the additional through hole in the housing 101 Prevent it from origin. In addition, the engaging portion 140 can be easily disassembled and the blocking portion 110 can be detached from the housing 101. The blocking portion 110 can be used in various forms of the housing 101 without design change.

The depths of the grooves 121a and 122a of the outer side portion 120 are determined in consideration of the length of the engaging portion 140. It is preferable that the engaging portion 140 does not penetrate the outer portion 120 when engaged with the outer portion 120 so as to prevent the leakage of the solution in the region where the engaging portion 140 is disposed. To this end, the outer portion 120 has a predetermined thickness, and is preferably formed thicker than the inner portion 130 as shown in FIG.

In the wet process chamber 100 of this embodiment, the blocking portion 110 is disposed so as to correspond to the opening portion 101a. The blocking portion 110 has slits 113 formed by the slits 123 of the outer side 120 and the slits 133 of the inner side 130. The material to be treated 1 is introduced into the housing 101 through the slit 113 and the wet process proceeds in the housing 101. The blocking member 110 having the slit 113 having a width slightly larger than the thickness of the material to be treated 1 is disposed so as to correspond to the opening 101a which is difficult to be formed with a size smaller than a predetermined size, The flow of the solution remaining together with the material to be treated 1 is effectively prevented from flowing into the housing 101 after passing through the through hole 113.

Thereby preventing the wet process chamber 100 from being contaminated with undesired solutions and consequently facilitating the uniformity of the wet process performed in the wet process chamber 100 and enabling precise control of the wet process.

In particular, the blocking portion 110 can be easily attached and detached without affecting the shape of the housing 101 to increase the efficiency of the wet process chamber 100.

FIG. 9 is a cross-sectional view schematically showing a wet process chamber according to another embodiment of the present invention, and FIG. 10 is an enlarged view of FIG. 9A. For the sake of convenience of description, different points from the above-described embodiment will be mainly described, and the same reference numerals denote the same members.

The wet process chamber includes a housing 101, a blocking portion 110 'and a friction portion 150. The friction portion 150 has a first friction member 151 and a second friction member 152. The friction portion 150 corresponds to the slit 113 'of the blocking portion 110' and is disposed inside the slit 113 'without leaving the slit 113'.

Specifically, the friction portion 150 is disposed between the outer portion 120 'and the inner portion 130' of the blocking portion 110 '. The first friction member 151 is disposed between the first side member 121 'of the outer side portion 120' and the first side member 131 'of the inner side portion 130 and the second friction member 152 is disposed between the first side member 121' Is disposed between the second side member 122 'of the outer side 120' and the second side member 132 'of the inner side 130.

The first friction member 151 and the second friction member 152 are configured such that the material to be treated 1 rubs against the surface of the material 1 to be treated when flowing into the housing 101 through the blocking portion 110 ' The impurity solution which is not removed by the blocking portion 110 but remains in the material to be treated 1 is removed. When the material to be treated 1 is highly ductile and the material to be treated 1 is of a flexible film type, for example, the friction portion 150 supports the material to be treated 1, 1 is stably introduced into the housing 101. Further, the material to be treated 1 is stably discharged from the housing 101 after the wet process proceeds.

For this purpose, the friction portion 150 may be formed of various materials having excellent frictional force and not causing damage to the material 1 to be treated. For example, the friction portion 150 may be formed to contain a fiber material such as synthetic resin or melt. Further, the friction portion 150 may be in the form of a roll.

The other components are the same as those of the above-described embodiment, and a detailed description thereof will be omitted.

FIG. 11 is a perspective view schematically showing a wet process chamber according to another embodiment of the present invention, and FIG. 12 is a plan view seen from the direction M of FIG.

Referring to FIGS. 11 and 12, the wet process chamber 200 includes a housing 201, a blocking portion 210, and a friction portion 250. For convenience of explanation, the description will be focused on the differences from the above-described embodiment.

The housing 201 and the cut-off portion 210 are the same as those in the above-described embodiment, and a detailed description thereof will be omitted.

The frictional portion 250 is disposed inside the housing 201 so as to correspond to an opening portion (not shown) and adjacent to the inner side portion 230 of the blocking portion 210. Specifically, the frictional portion 250 includes a first friction member 251, Member 252 as shown in FIG.

The first friction member 251 and the second friction member 252 are configured such that when the material to be treated 1 flows into the housing 201 through the blocking portion 210 and rubs against the surface of the material to be treated 1 The impurity solution remaining in the material 1 to be treated without being removed by the portion 210 is removed. In the case where the material to be treated 1 is highly ductile and the material to be treated 1 is a flexible film type, for example, the friction portion 250 supports the material to be treated 1, 1 is stably introduced into the housing 201. Further, after the wet process proceeds, the material to be treated 1 is stably discharged from the housing 201.

For this purpose, the friction portion 250 may be formed of various materials having excellent frictional force and not damaging the material 1 to be treated. For example, the friction portion 250 may be formed to contain a fiber material such as synthetic resin or melt. In addition, the friction portion 250 may be in the form of a roll.

The wet process chamber 200 of the present embodiment is further provided with a friction portion 250 so as to block unwanted solution from entering the housing 201 and to hold the material to be treated 1 Can be introduced into the housing 201 and out of the housing 201. [

13 is a perspective view schematically illustrating a wet process chamber according to another embodiment of the present invention.

Referring to FIG. 13, the wet processing chamber 300 includes a housing 301 and a blocking portion 310. For convenience of explanation, the description will be focused on the differences from the above-described embodiment.

In the above-described embodiment, the material to be treated 1 flows into the housings 101 and 201 in the vertical direction, that is, the surface to be processed to be subjected to the wet process of the material to be treated 1 is arranged in the direction perpendicular to the paper. However, the present invention is not limited thereto.

That is, as shown in Fig. 13, the material to be treated 1 can be arranged in the horizontal direction, that is, the surface to be treated of the material to be treated 1 is in parallel with the ground. The opening (not shown) of the housing 301 and the blocking portion 310 are formed so as to correspond to the material 1 to be treated. That is, the opening (not shown) and the blocking portion 310 are rotated by 90 degrees as compared with the above-described embodiment.

The detailed contents of the housing 301 and the blocking portion 310 are the same as those of the above-described embodiment, and thus a detailed description thereof will be omitted.

14 is a plan view schematically illustrating a wet process chamber according to another embodiment of the present invention.

Referring to FIG. 14, the wet process chamber 400 includes a housing 401, a blocking portion 410, and an inner housing 402. For convenience of explanation, the description will be focused on the differences from the above-described embodiment.

In the above-described embodiment, after the material to be treated 1 has flowed into the housings 101, 201 and 301, the wet process proceeds in the housings 101, 201 and 301.

However, in this embodiment, as shown in FIG. 12, the wet process for the material to be treated (not shown) proceeds in the inner housing 402 disposed in the housing 401. That is, the material to be treated (not shown) flowing into the housing 401 flows through the opening 402a of the inner housing 402, and the wet process proceeds in the inner housing 402. The inner housing 402 essentially prevents unwanted foreign objects, particularly undesired impurities, from entering the wet process space defined by the inner housing together with the material to be treated (not shown), to affect the wet process.

To this end, the inner housing 402 may have a box-like configuration similar to the housing 401, i.e., a rectangular parallelepiped. However, the present invention is not limited to this, and the inner housing 402 may have a bottomless box shape and may be in close contact with the bottom surface of the housing 401. The inner housing 402 may also have a shape similar to the bulkhead to form a predetermined wet process space.

The detailed contents of the housing 401 and the blocking portion 410 are the same as those of the above-described embodiment, and thus a detailed description thereof will be omitted.

15 is a plan view schematically illustrating a wet process chamber according to another embodiment of the present invention.

15, the wet process chamber 500 includes a housing 501, a blocking portion 510, an inner housing 502, a first friction portion 550, and a second friction portion 560. For convenience of explanation, the description will be focused on the differences from the above-described embodiment.

In this embodiment, the wet process for the material to be treated (not shown) proceeds in the inner housing 502 disposed in the housing 501. That is, the material to be treated (not shown) flowing into the housing 401 flows through the opening 502a of the inner housing 502, and the wet process proceeds in the inner housing 502. The inner housing 502 prevents the undesired foreign object, particularly undesired impurities, from entering the wet processing space defined by the inner housing 502 together with the material to be treated (not shown) do.

To this end, the inner housing 502 may have a shape similar to that of the housing 501, that is, a box shape similar to a rectangular parallelepiped. However, the present invention is not limited to this, and the inner housing 502 may have a bottomless box shape and may be in close contact with the bottom surface of the housing 501. The inner housing 502 may also be in a simpler form, i.e., in the form of a partition.

The first friction part 550 corresponds to the opening part (not shown) on the inside of the housing 501 and is disposed to correspond to the inner side part 530 of the blocking part 510. Specifically, the first friction part 550, And a second friction member (552).

The first friction member 551 and the second friction member 552 are configured such that when the material to be treated 1 passes through the blocking portion 510 and is rubbed against the surface of the material to be treated 1, The solution remaining in the material to be treated 1 is removed. Further, when the material 1 to be treated has high ductility, that is, in the case of a film type, the material to be treated 1 is supported so that the material to be treated 1 is stably introduced into the housing 501. Further, the material to be treated 1 is stably discharged from the housing 501 after the wet process proceeds.

For this, the first friction part 550 may be formed of various materials having excellent frictional force and not damaging the material to be treated 1. [ Further, the first friction portion 550 may be in the form of a roll.

The second friction portion 560 is disposed so as to correspond to the opening portion 502a inside the inner housing 502 and specifically includes a first friction member 561 and a second friction member 562. [

The first friction member 561 and the second friction member 562 remove the solution that may remain in the material 1 to be treated. Further, when the material 1 to be treated has high ductility, that is, in the case of a film type, the material to be treated 1 is supported so that the material to be treated 1 stably flows into the inner housing 502. Further, after the wet process is performed, the material to be treated 1 is stably discharged from the inner housing 502.

For this purpose, the second friction portion 560 may have a similar material and similar shape as the first friction portion 550, and may be in the form of a roll.

Also, although not shown, the second friction portion 560 may be disposed on the inner side of the inner housing 502 as well as on the outer side according to the conditions of the wet process.

The wet process chamber 500 of the present embodiment is further provided with first and second friction portions 550 and 560 to block unwanted solution from flowing into the housing 501 and the inner housing 502, The material to be treated 1 can be introduced into the housing 501 and the inner housing 502 and flow out from the housing 501 and the inner housing 502 while stably supporting the substrates 1 and 1. In addition, an inner housing 502 is additionally provided in the housing 501 to improve the cleanliness of the wet process space and improve wet process characteristics by precisely controlling the wet process.

The details of the housing 501 and the blocking portion 510 are the same as those of the above-described embodiment, and thus a detailed description thereof will be omitted.

16 is a view schematically showing an example of a wet processing apparatus to which the wet process chamber of the present invention is applied.

Specifically, FIG. 16 illustrates a wet process system 1000 having a plurality of chambers including any of the wet process chambers 100, 200, 300, 400 and 500 of the previous embodiments.

The material to be treated 1 sequentially passes through a plurality of chambers 100-1, 100-2, and 100-3 while moving in the X1 direction, and continuously performs a plurality of wet processes. At least one of the plurality of chambers 100-1, 100-2, and 100-3, for example, the chamber 100-2, may include the wet processing chambers 100, 200, 300, 400, 500 And the structure of Fig. 9) can be applied.

When the material to be treated 1 passes through the chamber 100-1 and then flows into the chamber 100-2, the solution remaining in the material 1 to be treated 1, specifically the liquid in the chamber 100-1, Thereby effectively preventing the solution used in the process from flowing into the chamber 100-2.

16 is one example of applying the present invention. Although not shown, the present invention is also applicable to a wet process chamber having only one wet process chamber. That is, the present invention is also applicable to a single-chamber structure wet process apparatus having only one of the wet process chambers 100, 200, 300, 400, and 500 of the present embodiment.

While the present invention has been described with reference to exemplary embodiments, it is to be understood that the invention is not limited to the disclosed exemplary embodiments, but, on the contrary, is intended to cover various modifications and equivalent arrangements included within the spirit and scope of the invention. Accordingly, the true scope of the present invention should be determined by the technical idea of the appended claims.

1:
100, 200, 300, 400, 500: wet process chamber
101, 201, 301, 401, 501: housing
110, 210, 310, 410, 510:
250: Friction part
402, 502: inner housing
550: first friction portion

Claims (28)

The present invention relates to a wet process chamber for conducting a wet process on a material to be processed,
A housing having at least one opening formed such that the material to be treated passes therethrough; And
And a shielding portion disposed so as to correspond to the opening portion and having a slit through which the material to be treated passes,
Wherein the blocking portion has a larger size than the opening portion and the slit of the blocking portion has a smaller width than the opening portion. The method according to claim 1,
Wherein the blocking portion includes an outer portion disposed on an outer side of the housing, an inner portion corresponding to the outer portion and disposed on an inner side of the housing, and a coupling portion coupling the outer portion and the inner portion. 3. The method of claim 2,
Wherein the blocking portion is attachable to and detachable from the housing through the coupling portion. 3. The method of claim 2,
Wherein the outer side and the inner side each have a first side member and a second side member arranged to face each other. 5. The method of claim 4,
The outer side and the inner side having a slit formed between the first side member and the second side member. 6. The method of claim 5,
Wherein the slit of the blocking portion overlaps the slit of each of the outer side and the inner side. 6. The method of claim 5,
Wherein the first side member and the second side member are formed with grooves on opposite sides thereof and the grooves form slits in the outer side and the inner side. 5. The method of claim 4,
The first side member of the outer side engages with the first side member of the inner side through the engaging portion,
Wherein the second side member of the outer side engages the second side member of the inner side through the engaging portion. 3. The method of claim 2,
The outer side portion has a groove corresponding to the engaging portion,
And the medial portion includes a through hole corresponding to the engagement portion. 3. The method of claim 2,
Wherein the coupling portion is disposed to correspond to the opening while coupling the outer side and the inner side. 3. The method of claim 2,
Wherein the outer side is thicker than the inner side. The method according to claim 1,
Wherein the length of the slit of the blocking portion is equal to or less than the length of the opening. The method according to claim 1,
And a friction portion corresponding to the opening portion and disposed adjacent to the blocking portion, the friction portion being formed to be in contact with the surface of the material to be treated. 14. The method of claim 13,
Wherein the friction portion comprises a first friction member and a second friction member disposed opposite to each other. 14. The method of claim 13,
Wherein the friction portion is disposed corresponding to the slit of the blocking portion. 14. The method of claim 13,
Wherein the friction portions are disposed on the inside of the housing with respect to each other. 14. The method of claim 13,
Said friction portion having a roll configuration. The method according to claim 1,
A wet process in which the opening to be processed and the blocking portion are formed so that the to-be-treated material to be processed through the wet process passes through the slit of the opening and the blocking portion while being oriented in a direction parallel to the paper surface or in a direction perpendicular to the paper surface chamber. The method according to claim 1,
Further comprising an inner housing disposed within the housing and configured to provide a space in which a wet process is performed, the inner housing having at least one opening to allow the material to be processed to enter and exit. 20. The method of claim 19,
Said inner housing having a box shape. 20. The method of claim 19,
Wherein the inner housing has a box-like shape without a bottom surface and contacts the bottom surface of the housing. 20. The method of claim 19,
Further comprising a friction portion corresponding to the opening of the inner housing and disposed inside or outside the inner housing, the friction portion being configured to contact the surface of the material to be treated. 23. The method of claim 22,
Wherein the friction portion comprises a first friction member and a second friction member disposed opposite to each other. 23. The method of claim 22,
Said friction portion having a roll configuration. The method according to claim 1,
Wherein the wet process comprises a cleaning, plating or etching process. The method according to claim 1,
Wherein the material to be treated comprises a film material, a wafer or a substrate. 26. A wet process apparatus comprising the wet process chamber of any one of claims 1 to 26. 28. The method of claim 27,
The wet processing apparatus includes a plurality of process chambers,
Wherein at least one of the process chambers is the wet process chamber of any one of claims 1 to 26.
KR1020130005107A 2013-01-16 2013-01-16 Wet process chamber and wet process apparatus having the same KR101654293B1 (en)

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CN201480015848.XA CN105163873B (en) 2013-01-16 2014-01-16 Wet process chamber and the wet process device for including it

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Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20070034887A (en) * 2005-09-26 2007-03-29 세메스 주식회사 Substrate Drying Equipment
JP2007273974A (en) * 2006-03-31 2007-10-18 Semes Co Ltd Substrate processing apparatus and substrate processing method
JP2010087079A (en) * 2008-09-30 2010-04-15 Sekisui Chem Co Ltd Surface processing apparatus

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5746903A (en) * 1980-09-05 1982-03-17 Mitsubishi Chem Ind Ltd Agricultural and gardening fungicide
KR100268448B1 (en) * 1998-08-17 2000-10-16 윤종용 Etching end point detector
KR100607414B1 (en) * 2000-05-17 2006-08-01 삼성전자주식회사 Etching apparatus
JP3778071B2 (en) * 2001-11-30 2006-05-24 日立ハイテク電子エンジニアリング株式会社 Substrate dipping type continuous liquid processing equipment
JP4022115B2 (en) * 2002-09-06 2007-12-12 豊 佐藤 Dam type continuous immersion treatment equipment
JP4704181B2 (en) * 2005-10-20 2011-06-15 上村工業株式会社 Immersion processing equipment
JP5398223B2 (en) * 2008-10-23 2014-01-29 上村工業株式会社 Gate device for treatment tank
JP5133428B2 (en) * 2009-02-02 2013-01-30 シャープ株式会社 Substrate processing equipment

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20070034887A (en) * 2005-09-26 2007-03-29 세메스 주식회사 Substrate Drying Equipment
JP2007273974A (en) * 2006-03-31 2007-10-18 Semes Co Ltd Substrate processing apparatus and substrate processing method
JP2010087079A (en) * 2008-09-30 2010-04-15 Sekisui Chem Co Ltd Surface processing apparatus

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CN105163873A (en) 2015-12-16
KR101654293B1 (en) 2016-09-06
CN105163873B (en) 2018-03-06

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