KR20140040618A - Coating apparatus and liquid receiving cleaning apparatus - Google Patents

Abstract

Provided is a coating apparatus capable of preventing the attachment of mist formed by a cleaning treatment to a nozzle while the cleaning treatment jetting a coating solution is conducted. In the coating apparatus, an inner space (L2) attached to the lower side of a contact solution unit (42) is in negative pressure and air current (6) toward the inner space (L2) is formed near the upper side of the contact solution unit (42). Therefore, in case of the collision of coating solution discharged from spraying nozzles (52a-52c) between cleaning nozzles (45a-45c), the degree of mist generation is within the range of a descending air current region(D), in which a descending air current is generated in the air current (6) and the mist is inhaled into the inner space (L2) together with surrounding gas through the descending air current. The mist is also inhaled by the inhaling treatment of the cleaning nozzles (45a-45c). As a result, the attachment of the mist to the surroundings of the spray nozzles is prevented.

Description

Coating device and drip tray cleaning device {COATING APPARATUS AND LIQUID RECEIVING CLEANING APPARATUS}

TECHNICAL FIELD This invention relates to a coating device. More specifically, It is related with the coating device which discharges and apply | coats the coating liquid of the liquid column state from a nozzle to the board | substrate mounted on the stage, and the liquid receiving cleaning device for this.

Conventionally, the coating apparatus which scans a board | substrate and apply | coats a coating liquid to a board | substrate, discharging a coating liquid from a nozzle has been developed. For example, in the apparatus which manufactures an organic electroluminescent display, organic electroluminescent material is apply | coated using a nozzle to the main surface of board | substrates, such as a glass substrate mounted on a stage, in predetermined pattern shape.

In such a coating apparatus, a liquid receiving section for receiving a coating liquid in addition to the substrate is provided to recover a coating liquid or an unnecessary coating liquid applied outside the substrate when the coating liquid is applied to the substrate when the nozzle moves outside the substrate. This is related to the fact that once the discharge of the coating liquid from the nozzle is stopped, the coating liquid solidifies near the discharge port of the nozzle and adversely affects subsequent coating. That is, in order to prevent such a situation, discharge of the coating liquid from a nozzle is continued even when a nozzle is outside the board | substrate, since it is necessary to collect | recover or discard the discharged coating liquid at this time. For example, the structure of patent document 1 which draws the coating liquid discharged | emitted on the upper surface of the liquid receiver part by forming a space in the inside and making negative pressure inside the space is shown.

In addition, Patent Literature 2 discloses a configuration in which a nozzle cleaning device 3 for supplying a cleaning liquid to a discharge port from below the nozzle is provided adjacent to the liquid receiving portion in order to clean the discharge port of the nozzle for discharging the coating liquid.

Japanese Patent Publication No. 2011-167655 Japanese Patent Publication No. 2009-45541

However, in the nozzle cleaning apparatus as shown in Patent Literature 2, in performing the nozzle cleaning in a state where the coating liquid is discharged from the coating nozzle, the discharged coating liquid collides with the cleaning nozzle of the nozzle cleaning apparatus, thereby applying the coating liquid. There is a fear of scattering in this mist state. In addition, even if the coating liquid discharged from the coating nozzle maintains the liquid column state immediately after the discharge, the coating liquid may be dropletized as the distance becomes longer after being discharged, and further misted and scattered.

In addition, when the liquid receiving part having the suction function as shown in Patent Document 1 is disposed adjacent to the nozzle cleaning device, the mist is wound up by the airflow generated by the suction function of the liquid receiving part, thereby applying the application nozzle and its surroundings (for example, For example, the possibility of adhering to the lower surface of the member holding the coating nozzle is likely to occur.

Since the coating nozzle scans the upper side of the substrate to be treated, when mist adheres around the nozzle in this manner, particles (which the mist solidifies) may fall on the substrate, leading to a decrease in yield.

On the other hand, when discharge of the coating liquid from a nozzle is stopped at the time of nozzle cleaning, it is possible to wash | clean a nozzle, suppressing generation | occurrence | production of mist. In this case, however, it takes a long time for the coating liquid to stably discharge the coating liquid in the columnar state at the time of re-discharging the coating liquid, so that a waiting time occurs and the throughput is lowered.

This invention is made | formed in view of the above subject, Even if the nozzle cleaning process is performed, discharging a coating liquid, the coating apparatus which can prevent the mist generate | occur | produced by this washing process adhering to a coating nozzle or its periphery is provided. It is.

In order to solve the said subject, invention of Claim 1 is a coating apparatus which apply | coats a coating liquid on a board | substrate, It is possible to move the space above the holding area of the said board | substrate, and discharges the discharge port which discharges the said coating liquid below. Has a nozzle, an internal space connected to a suction path, and a liquid receiving part for receiving the coating liquid discharged from the nozzle in the internal space from above from the nozzle when the nozzle is outside the existing region of the substrate; The nozzle cleaning apparatus is provided in the vicinity of a part and has an opening which can discharge a predetermined | prescribed washing | cleaning liquid upward, and performs the washing process of the said discharge port of the said nozzle with the said washing | cleaning liquid, The said liquid by suction through the said suction path | route When the internal space of the receiving part becomes a negative pressure state, the airflow generated in the space near the liquid receiving part is In the falling airflow area | region which is a space area | region which the falling airflow which has a component generate | occur | produces, the said opening of the said nozzle cleaning apparatus is arrange | positioned relatively fixed with respect to the said liquid receiver, It is characterized by the above-mentioned.

Invention of Claim 2 is a coating device of Claim 1, Comprising: The said opening of the said nozzle cleaning apparatus is fixedly arrange | positioned above the upper surface of the said inner space of the said liquid receiving part, It is characterized by the above-mentioned.

Invention of Claim 3 is a coating device of Claim 2, The said upper surface of the said inner space of the said liquid receiving part is prescribed | regulated by the upper surface of the porous planar body which covers the upper opening of the said inner space, It is characterized by the above-mentioned. do.

Invention of Claim 4 is a coating device of Claim 1, Comprising: The said liquid receiving part and the said nozzle cleaning apparatus are integrated, and it is set as the liquid receiving cleaning apparatus. It is characterized by the above-mentioned.

As for the coating apparatus of Claim 4, the invention of Claim 5 is characterized in that the upper surface of the said liquid receiving part integrated with the said nozzle cleaning apparatus is formed from the said porous planar body.

Invention of Claim 6 is a coating device of Claim 4 or Claim 5, Comprising: The said nozzle cleaning apparatus is arrange | positioned in the said liquid receiving part, and is integrated with the said liquid receiving part. It is characterized by the above-mentioned.

Invention of Claim 7 is a coating device of Claim 4 or Claim 5 WHEREIN: The said nozzle cleaning apparatus is arrange | positioned adjacent to the side part of the said water receiving part, and the positional relationship with the said water receiving part is fixed.

Invention of Claim 8 is an application device as described in any one of Claims 1-5, Comprising: The integrated movement mechanism which moves both the said liquid receiving part and the said nozzle cleaning apparatus integrally is characterized by the above-mentioned. do.

The invention according to claim 9 is a liquid receiving cleaning device which receives a coating liquid discharged downward from a nozzle of a coating device of a substrate and cleans the nozzle, wherein the nozzle has an internal space connected to a suction path. It has a liquid receiving part which receives the said coating liquid discharged from the nozzle in the said inner space from upper direction when it exists out of the presence area of the said board | substrate, and the opening which is integrated with the liquid receiving part, and can discharge | release predetermined | prescribed cleaning liquid upwards, And a nozzle cleaning device for cleaning the discharge port of the nozzle by the cleaning liquid, and the air flow generated in the space near the liquid receiving part by causing the internal space of the liquid receiving part to become a negative pressure state by suction through the suction path. In the falling airflow area | region which is a space area | region which the downward airflow which has a downward component generate | occur | produces, And the supply port of the base nozzle cleaning device is fixed relative to the liquid receiving portion.

According to the invention of Claims 1 to 9, by arranging the opening for supplying the cleaning liquid of the nozzle cleaning device in the down stream flow region which is the space region where the down stream is generated in the air flow generated in the space near the liquid receiving portion, It is possible to prevent the generated mist from being rolled upward by the air flow, and to prevent such mist from adhering to the coating nozzle and its periphery.

In particular, in the invention of claim 3, since the upper surface of the liquid receiver is made of a porous planar body, gas easily passes through the upper surface of the liquid receiver. Therefore, when making an internal space into negative pressure, airflow tends to generate | occur | produce on the upper surface of the liquid receiving part.

In particular, in the invention of claim 8, since the coating device includes an integrated moving mechanism for integrally moving the liquid receiver and the nozzle cleaning device, it is possible to realize space saving and simplified control.

1 is a top view of a coating device 1. Fig.
2 is a front view of the coating device 1.
3 is a perspective view illustrating an outline of the drip receiver 3.
4 is a schematic cross-sectional view showing a cross section of the drip receiver 3.
Fig. 5 is a perspective view showing the outline of the liquid receiver cleaning device 4. Fig.
6 is a schematic cross-sectional view showing a cross section of the drip cleaning device 4.
7 is a schematic cross-sectional view showing a cross section of the drip cleaning device 4.
8 is a block diagram showing the electrical configuration of the controller 10.
9 is a flowchart showing the operation of the coating device 1.
10 is a flowchart showing the washing operation of the drip cleaning apparatus 4.
FIG. 11: is a figure which shows the relative positional relationship of the application | coating unit 50 and the liquid receiving cleaning device 4 in the washing | cleaning operation of the liquid receiving cleaning device 4.
FIG. 12: is a figure which shows the airflow 6 around the drip cleaning apparatus 4. FIG.
FIG. 13: is a figure which shows the airflow 6 around the drip cleaning apparatus 4 in other embodiment.
FIG. 14: is a figure which shows the airflow 6 around the drip receiver 3 in another embodiment.
FIG. 15: is a figure which shows the airflow 6 around the drip receiver 3 in a comparative example.

`` Embodiment form ''

<1.1 Outline structure of the entire coating device 1>

EMBODIMENT OF THE INVENTION Hereinafter, the coating device 1 which concerns on embodiment of this invention is demonstrated, referring drawings. In order to make description concretely, the following description is given using the example applied to the coating apparatus which manufactures the organic electroluminescence display which uses the organic electroluminescent material, a hole transport material, etc. as a coating liquid. The coating device 1 applies an organic EL material, a hole transporting material, or the like on a glass substrate placed on a stage in a predetermined pattern to manufacture a panel of the organic EL display device. In the drawings attached to this specification, the X direction and the Y direction are two-dimensional coordinate axes that define a horizontal plane, and the Z direction defines a vertical direction perpendicular to the XY plane.

1: is a top view which shows schematic structure of the principal part of the coating device 1. As shown in FIG. 2 is a front view of the coating device 1. The coating apparatus 1 uses a plurality of coating liquids, such as an organic EL material and a hole transporting material, as described above, and the organic EL material is used as the representative liquid for the explanation.

In FIG. 1, FIG. 2, the coating device 1 is roughly the board | substrate mounting apparatus 2, the liquid receiving part 3, the liquid receiving cleaning device 4, the organic EL application | coating mechanism 5, and The control unit 10 is provided.

<Configuration of Each Device in the Coating Device 1>

<1.2.1 Structure of Substrate Placement Device 2>

As shown in FIG. 2, the substrate placing apparatus 2 includes a stage 21, a swinging portion 22, a parallel moving table 23, a guide base 24, and a guide member 25.

The stage 21 is a horizontal thick plate-like rigid material in which a substrate P such as a glass substrate to be a coated object is placed on the stage upper surface. The lower part of the stage 21 is supported by the revolving part 22, and is comprised so that the stage 21 can rotate in a horizontal plane in the (theta) direction shown by the rotation operation of the revolving part 22. As shown in FIG.

Moreover, inside the stage 21, the adsorption mechanism which adsorb | sucks and hold | maintains the heating mechanism and board | substrate P for preheat-processing the board | substrate P to which the organic EL material was apply | coated on the stage 21 surface, and A water pin mechanism or the like (none of which is shown in the drawing), which is used when exchanging the substrate P with the transfer mechanism, is provided.

The guide member 25 is extended in the Y-axis direction shown and fixed to the bottom surface so that the organic EL application | coating mechanism 5 may pass below. The guide support part 24 which abuts on the guide member 25 and slides on the guide member 25 is fixed to the lower surface of the parallel movement table 23.

Moreover, the turning part 22 is fixedly installed on the upper surface of the parallel movement table 23. Thereby, the parallel movement table 23 is movable in the Y-axis direction shown along the guide member 25 by receiving the driving force from a linear motor (not shown), for example, and is supported by the turning part 22. The horizontal straight movement of the stage 21 is also possible. In addition, in the following description, about the mechanism which consists of a parallel movement table 23, the guide base part 24, the guide member 25, and a linear motor (not shown), for example, a "stage movement mechanism (26) "may be called.

<1.2.2 Structure of the liquid receiving part 3>

The liquid receiving part 3 has these application nozzles 52a-52c when the some application | coating nozzles 52a-52c are in the position deviating from the upper space of the presence area of the board | substrate (the area slightly wider than the expansion of the stage 21). ) Is an apparatus that receives and sucks the organic EL material (coating liquid) discharged from the wafer), and is disposed in the side space adjacent to the + X direction from the substrate P as shown in FIGS. 1 and 2.

3 is a perspective view illustrating the outline of the drip receiver 3. 4 is a cross-sectional view taken along the line A3-A3 in Fig. 3 when viewed in the -X direction.

3 and 4, the liquid receiving portion 3 includes a box portion 31, a liquid contact member 32, and a discharge portion 33. As shown in Fig.

The box portion 31 is of a box shape having a transversely elongated shape extending in the X-axis direction and having an inclined bottom at a part of the bottom surface thereof, and is fixedly provided so that the positional relationship with the nozzle moving mechanism 51 is always fixed. The inclined bottom is an inclined surface defined by the lower end edge 31a and the upper end edge 31b. As described later, the coating liquid dropped into the box portion 31 is formed on one side along the inclined bottom. It flows to the lower end edge 31a side and is temporarily stored (refer FIG. 1-FIG. 4).

The liquid contact member 32 of the planar body which consists of porous materials is arrange | positioned on the upper surface of the box part 31 in the state opened upward. As used herein, the term "porous material" refers to a general material in which a large number of small holes through which a coating liquid can pass is distributed, and resins, ceramics, and the like contain a large number of small holes in the manufacturing process. The "porous material" may be used, or "porous formation" in which small holes formed by processing are distributed, such as a plate-like material in which a plurality of small holes are formed in a planar material and a mesh shape in which many small holes are distributed by a mesh. Absence ”may be sufficient. The width (length in the Y direction) of the liquid contact member 32 is a width capable of arriving at all of the organic EL materials discharged from the plurality of application nozzles 52a to 52c in the liquid column state, that is, It is set to the size equivalent to or more than the arrangement width | variety of several application | coating nozzles 52a-52c.

Moreover, the inside of the liquid receiving part 3 is equipped with the hollow internal space L1 surrounded by the box part 31 and the liquid contact member 32. As shown in FIG. A discharge pipe constituting a discharge portion 33 for discharging and draining is communicated with the side surface and the lower surface of the internal space L1. Therefore, the upper opening of the inner space L1 is covered with the liquid contact member 32 of the planar body made of a porous material, and the discharge part 33 is provided on the surface other than the upper opening of the inner space L1.

The details of the coating process will be described later. When the organic EL material is applied to the substrate P, the application nozzles 52a to 52c move along the X direction while discharging the organic EL material to move upward of the substrate P. Reciprocating injection. In addition, the substrates P placed on the application nozzles 52a to 52c and the stage 21 are relatively moved in the Y direction, whereby the upper surface of the substrate P by the coating liquid from the application nozzles 52a to 52c is moved. Two-dimensional scanning (combination of the main scan in the X direction and the sub scan in the Y direction) is achieved. When the nozzles 52a to 52c are moved upward of the liquid receiver 3 in accordance with the scanning (scanning) in the + X direction, the liquid receiver 3 so that the application nozzles 52a to 52c and the liquid contact member 32 face each other. ) Is arranged. For this reason, the coating liquid discharged from the coating nozzles 52a to 52c to the outside of the substrate P is in contact with the upper surface of the liquid contact member 32.

The lower surface of the liquid contact member 32 faces the internal space L1 of the box portion 31, and is maintained at a negative pressure by the discharge portion 33 communicating with the internal space L1. For this reason, the coating liquid adhered to the upper surface of the liquid contact member 32 which is a porous material passes through the small hole group distributed in the liquid contact member 32, and is attracted toward the internal space L1 and dripped in the box portion 31. do. As described above, part of the bottom surface of the box portion 31 is inclined so as to be lowered in the + X direction side, so that the coating liquid dropped on the inclined surface in the box portion 31 flows along the inclination.

Moreover, since the discharge part 33 communicates with the side surface of the box part 31, and the lower surface (lowest position of a bottom face) of the + X direction side, the coating liquid discharged | emitted to the liquid receiving part 3 is this discharge part 33 Ejected from In addition, since the discharge part 33 is connected to the gas-liquid separator which is not shown in figure, the gas liquid discharged | emitted from the box part 31 by the discharge part 33 is divided into exhaust and waste liquid, and is processed.

The liquid contact member 32 used in this embodiment is formed by sintering and molding resin such as polyethylene. Although the resin material can be selected suitably according to the liquid apply | coated, an example is sanpine (a registered trademark of Asahi Kasei Chemicals Co., Ltd.). In general, the porous material is formed by sintering a powder such as a resin, and irregular voids are three-dimensionally formed therein. For this reason, it becomes possible to let fluids, such as gas and a liquid, pass. In addition, as such a structure, you may employ | adopt the porous material formed with the metal.

In addition, the control part 10 can set suitably about the timing which the air in the internal space L1 is discharged | emitted by the discharge part 33, and the inside space L1 is maintained at negative pressure. In the present embodiment, the discharge part 33 is in an on state (discharged state) when the coating liquid is being discharged from the coating nozzles 52a to 52c, and the coating liquid is not discharged from the coating nozzles 52a to 52c. If not, it is controlled by the controller 10 so as to be in an off state (non-emission state).

In addition, in this embodiment, although the discharge part 33 is formed in the side of the box part 31 in the + Y direction, and is formed in two pieces and one in the lower surface, according to the length of the box part 31 in the X direction, and the negative pressure required. It is possible to select the attachment position and the number appropriately. In addition, the discharge part 33 (and the discharge part 43 mentioned later) correspond to the "suction path" in this invention, and the said discharge state is corresponded to the "suction through the suction path" in this invention. .

Since it is comprised as mentioned above, the internal space L1 which contact | connects the lower surface of the liquid contact member 32 becomes a negative pressure, and airflow generate | occur | produces toward the upper opening of the internal space L1 above. Along with this air flow, the coating liquid brought into contact with the surrounding gas is rapidly sucked to the lower surface. For this reason, the floating mist of the coating liquid does not exist in the upper part and the vicinity of the liquid contact member 32, and is dry. The detailed description of this airflow is mentioned later.

<1.2.3 Configuration of the liquid receiving device 4>

Fig. 5 (a) is a perspective view showing the outline of the liquid receiver cleaning device 4, and Fig. 5 (b) is a partially enlarged view thereof. 6 is sectional drawing of the drip-washing | cleaning apparatus 4 in the case of seeing -X direction from the A5-A5 cross section shown to FIG. 5 (a), and FIG. 7 shows + X direction from the A5-A5 cross section shown in FIG. It is sectional drawing of the liquid receiving washing | cleaning apparatus 4 in this case. As shown in FIG. 1, FIG. 2, FIG. 5-FIG. 7, the liquid receiving washing | cleaning apparatus 4 is the box part 41, the contact liquid 42, the discharge part 43, and the washing | cleaning nozzles 45a-45c. , Common pipes 46a to 46c, supply pipes 461a to 461c, suction pipes 462a to 462c, Y direction moving mechanism 48, and elevating mechanism 49.

The water receiving cleaning device 4 cleans the function as a water receiving unit for collecting and sucking the organic EL material (coating liquid) discharged from the application nozzles 52a to 52c and the discharge ports at the tips of the application nozzles 52a to 52c. It is an apparatus which has a function as a washing | cleaning part to make, and is arrange | positioned with respect to a board | substrate in-X direction with respect to a board | substrate. The "drip receiver 3" and "drip receiver cleaning device 4" in this embodiment correspond to the "drip receiver" in this invention.

The box portion 41, the liquid contacting member 42, and the discharge portion 43 in the liquid receiving cleaning device 4 are the box portion 31 and the liquid contacting member 32 in the liquid receiving portion 3. And the discharge part 33, there are some differences as a shape by being integrated with each element described later for nozzle cleaning. Specifically, the box portion 41 which is in contact with the lower surface of the substantially T-shaped liquid contact member 42 in plan view made of a porous material and is similarly formed in an approximately T shape in plan view is provided, and the box portion 41 is formed. The inner space L2 is provided with a discharge portion 43 (discharge piping) that sucks air in the inner space L2 and a liquid (for example, an organic EL material) dropped in the inner space L2. . Moreover, the box part 41 has the inclined bottom in a part of a bottom face, and the inclined bottom becomes the inclined surface defined by the lower edge 41a and the upper edge 41b.

In the liquid receiver cleaning device 4, like the liquid receiver 3, the inner space L2, which is in contact with the lower surface of the liquid contact member 42, becomes a negative pressure, and the inner space L2 ). &Lt; / RTI &gt; In accordance with this air flow, the coating liquid that has been contacted is rapidly drawn to the lower surface together with the surrounding gas. For this reason, the floating mist of the coating liquid does not exist in the upper part and the vicinity of the liquid contact member 42, and it is in a dry state. The detailed description of this airflow is mentioned later.

In addition, as shown in FIG. 7, common piping 46a-46c has the structure which penetrates the side surface of the box part 41 in a horizontal direction, and penetrates the liquid contact member 42 in a perpendicular direction. Cleaning nozzles 45a to 45c are provided at the upper end of the common pipes 46a to 46c, and supply pipes 461a to 461c and the suction pipes are provided at the lower end of the common pipes 46a to 46c. 462a to 462c) are provided. "Common" attached to the names of the common pipes 46a to 46c means that the common pipes 46a to 46c provide a common path portion for supplying and sucking the cleaning liquid.

7A and 7, the tip ends of the three cleaning nozzles 45a to 45c have the same height (position in the Z-axis direction), and in the horizontal XY plane, In the direction of the slope incline, and are arranged almost linearly at equal intervals in one line. Since this arrangement relationship is the same also about coating nozzles 52a-52c mentioned later, it demonstrates with the coating nozzles 52a-52c in a later stage.

The other end of the supply pipes 461a to 461c is provided with a cleaning liquid supply mechanism (e.g., a supply pump), and the other end of the suction pipes 462a to 462c is provided with a suction mechanism (e.g., a suction pump). It is. The supply pipes 461a to 461c and the suction pipes 462a to 462c are provided with a valve for setting the opening degree of the pipe (any of which is not shown).

In addition, the dripping cleaning device 4 is provided with a Y-direction moving mechanism 48 and a lifting mechanism 49, and the dripping cleaning device 4 can move freely in the Y direction and the Z direction. These mechanisms are sufficient as long as the liquid receiving cleaning device 4 can be moved, and for example, a cylinder moving mechanism can be adopted. And by these moving mechanisms, the application | coating nozzles 52a-52c and the cleaning nozzles 45a-45c are moved so that at the time of washing | cleaning. In the present embodiment, the Y-direction moving mechanism 48 and the lifting mechanism 49 move both the "drip receiver" and the "nozzle cleaning device" that constitute the drip cleaning device 4 integrally. It functions as an integrated movement mechanism.

Since the drip-washing apparatus 4 is comprised as mentioned above, the washing | cleaning liquid supply process and the suction process which are demonstrated next can be performed.

By supplying the cleaning liquid by the cleaning liquid supply mechanism while the suction pipes 462a to 462c are closed by the valve, the cleaning liquid passes through the supply piping 461a to 461c and the common pipes 46a to 46c, thereby cleaning the cleaning nozzle ( 45a to 45c). For this reason, the washing nozzles 45a to 45c and the application nozzles 52a to 52c face each other, and are applied by the washing liquid eluted from the opening 45m (see FIG. 5B) of the cleaning nozzles 45a to 45c. Washing liquid can be supplied to each front-end | tip of nozzle 52a-52c (washing liquid supply process).

In addition, when the coating liquid is a solution containing an organic solvent, for example, a liquid containing the organic solvent (the net solvent of the organic solvent may be appropriate) is preferable. Specifically, toluene may be used as the cleaning liquid as long as the solvent of the coating liquid is toluene.

In addition, by performing the suction operation by the suction mechanism in a state where the supply pipes 461a to 461c are closed by the valve, the cleaning nozzles 45a to 45c through the suction pipes 462a to 462c and the common pipes 46a to 46c. ) And a cleaning liquid in the vicinity can be sucked. For this reason, the washing nozzles 45a to 45c and the application nozzles 52a to 52c face each other, so that the gas, liquid (coating solution or cleaning liquid), and particles around the application nozzles 52a to 52c are sucked up and the pipes 462a to 462c. ) And can be sent to a gas-liquid classification device (not shown) (suction treatment). Moreover, application | coating nozzles 52a-52c can be dried by such a suction process.

In addition, the detail of the operation | movement (movement | movement, washing | cleaning liquid supply process, suction process, etc.) regarding the drip cleaning apparatus 4 is mentioned later. In addition, these various operations in the coating device 1 are controlled by the control unit 10.

In addition, the opening 45m formed in the front-end | tip of washing nozzle 45a-45c is corresponded to "an opening which can discharge a washing | cleaning liquid upward" in this invention. In addition, in this embodiment, "an opening in a nozzle cleaning apparatus is relatively fixedly arranged with respect to a liquid receiving part" in the present invention means "cleaning nozzles 45a to 45c (more specifically, an opening ( 45m)) is relatively fixed to the configuration related to the liquid receiver of the liquid receiver cleaning device 4 &quot;.

Here, the structure of the liquid receiving washing | cleaning apparatus 4 is put together. As shown to FIG. 1 and FIG. 5 (a), the liquid receiving washing | cleaning apparatus 4 is a box shape which is substantially T-shaped from planar view. In the following description, the portion (part in the + Y direction in the B5-B5 cross section in FIG. 5A) of the T-shaped stroke (−) of the drip cleaning device 4 is particularly referred to as “drip cleaning device ( 4), and the portion (part in the -Y direction in the cross section B5-B5 in Fig. 5) corresponding to the vertical stroke (│) of the T-shaped is particularly referred to as the "drip tray cleaning device 4". Cleaning block 4b ”.

In addition, although the drip block 4a and the washing block 4b conceptually distinguish two parts of the drip tray cleaning apparatus 4, in fact, the drip tray cleaning is carried out without the member etc. which separate them. The apparatus 4 is comprised.

The main function of the liquid receiver block 4a is the liquid receiver function in the same manner as the configuration of the liquid receiver 3. Therefore, after the application nozzles 52a to 52c scan the upper portion of the substrate P along the -X direction while discharging the organic EL material, the application nozzles 52a to 52c continue the movement of the application nozzles 52a to 52c for the application. The nozzles 52a-52c are moved above the dripping block 4a. At this time, since the liquid receiving block 4a is disposed so that the discharge port at the lower end of the coating nozzles 52a to 52c and the liquid contact member 42 face each other, the coating liquid discharged from the coating nozzles 52a to 52c is a liquid receiving block. A liquid contact is made on the upper surface of the liquid contact member 42 of (4a).

Since the cleaning block 4b has a cleaning function mainly for the application nozzles 52a to 52c, the cleaning block 4b is provided with the cleaning liquid discharge function and the cleaning liquid discharge function of the cleaning block 4b only when the cleaning nozzles 52a to 52c are cleaned. The suction function is activated.

In this case, each discharge port of the application nozzles 52a to 52c above the liquid receiving block 4a is flushed with the cleaning nozzles 45a to 45c by the Y-direction moving mechanism 48 and the lifting mechanism 49. The liquid receiving cleaning device 4 is moved so as to be almost immediately above each of the openings 45m of (4b), and the above-described cleaning solution supply processing and suction processing are performed.

In the liquid-phase-under-scrubbing apparatus 4 of the present embodiment, even in the period in which the organic EL material is discharged from the dispensing nozzles 52a to 52c, or in the dispensation period, the dispensing nozzles 52a to 52c It is possible to perform the cleaning liquid supply processing and the suction processing.

&Lt; 1.2.4 Configuration of Organic EL Coating Mechanism (5) >

The organic EL coating mechanism 5 will be mainly described with reference to FIGS. 1 and 2. The organic EL application mechanism 5 has a nozzle unit 50 and a nozzle movement mechanism 51.

The nozzle unit 50 uses a plurality of coating nozzles 52 (three coating nozzles 52a, 52b, and 52c in FIG. 1) that discharge organic EL materials of any one of red, green, and blue colors. Keep them installed side by side.

Each of the coating nozzles 52a to 52c is supplied with an organic EL material of any one color of red, green, and blue from a supply unit not shown, respectively. Thus, although the organic EL material of the same color is discharged from the some application | coating nozzle 52, the example in which red organic EL material is discharged from three application | coating nozzles 52a-52c is used for the specific description.

The coating nozzles 52a to 52c have the same height (positions in the Z-axis direction) and are arranged in almost one row along the X-axis direction, but are arranged slightly shifted with respect to the Y-axis direction. In addition, although a nozzle pitch (interval in the Y direction between each nozzle) can be set suitably, in this embodiment, it is set so that it may correspond with the space | interval of 3 rows of stripe grooves formed in the board | substrate P. As shown in FIG. This arrangement relationship is the same as the cleaning nozzles 45a to 45c described above.

The nozzle moving mechanism 51 is constituted by a shaft guide 511 and a ball screw 512 extended in the illustrated X-axis direction, and a motor (not shown). The ball screw 512 is screwed to the nozzle unit 50, and the shaft guide 511 penetrates. For this reason, when a ball screw rotates by the motor which is not shown in figure, the nozzle unit 50 screwed with this moves freely along a guide shaft to a X direction.

Therefore, the control unit 10 controls the nozzle moving mechanism 51 to move the nozzle unit 50 along the X-axis direction while applying the organic EL material from the coating nozzles 52a to 52c, thereby providing a stage 21. ), The organic EL material having a predetermined flow rate is discharged from the coating nozzles 52a to 52c in the groove of the substrate P held on the substrate P. FIG. At this time, in the coating device 1 of the present embodiment, since the pitch of the coating nozzles 52a to 52c coincides with three rows of grooves of the substrate P, the coating is applied to three rows of grooves spaced two rows apart from each other. Is done.

In addition, in the X-axis-discharge position of the coating nozzles 52a to 52c, the organic EL material discharged from the substrate P is discharged into spaces on both sides deviating from the substrate P mounted on the stage 21. The receiving liquid receiving part 3 (+ X side) and the receiving liquid washing | cleaning apparatus 4 (-X side) are provided, respectively. The nozzle movement mechanism 51 traverses the substrate P from the upper space of the liquid receiver 3 (or the liquid receiver cleaning device 4) provided outside one side of the substrate P. The nozzle unit 50 is moved to the upper space of the drip cleaning device 4 (or the drip tray 3) provided outside the other side of the P, so that the organic matter is transferred to the substrate P. Apply EL material. In addition, said "space of both sides deviating from the board | substrate P" is corresponded to "outside the presence area of a board | substrate" in this invention.

In addition, when the nozzle unit 50 is arrange | positioned in the upper space of the liquid receiving part 3, the parallel movement table 23 is predetermined in the predetermined direction (Y-axis direction shown) perpendicular | vertical to a nozzle reciprocation movement direction. The stage 21 is moved by a pitch (for example, three times the nozzle pitch). By performing the operation | movement of such a nozzle movement mechanism 51 and the parallel movement table 23, and the discharge operation which discharges organic electroluminescent material from a coating nozzle 52a-52c in a liquid column state, a red organic electroluminescent material becomes a board | substrate ( A so-called stripe arrangement, arranged for each stripe groove formed in P), is formed on the substrate P. FIG.

In addition, the coating apparatus 1 of this embodiment may be equipped with the mechanism which adjusts the pitch of the coating nozzle 45a-45c of the Y-axis direction individually corresponding to the pattern to apply on a board | substrate. As such a pitch adjustment mechanism, various pitch adjustment mechanisms such as a pitch adjustment mechanism (Japanese Patent Laid-Open No. 2008-155138) can be adopted.

<1.2.5 Configuration of Control Unit 10>

8 is a block diagram for explaining the electrical configuration of the coating device 1.

As shown in FIG. 8, the control unit 10 includes, for example, a CPU 11, a ROM 12, a RAM 13, a storage device 14, and the like, interconnected via a bus line 15. It is configured by a normal computer. The ROM 12 stores a basic program and the like, and the RAM 13 is provided as a work area when the CPU 11 performs a predetermined process. The memory device 14 is constituted by a nonvolatile memory device such as a flash memory or a hard disk device.

In the control unit 10, the input unit 16 and the output unit 17 are also connected to the bus line 15. The input part 16 is comprised by various switches, a touch panel, etc., and receives various input setting instructions, such as a process recipe, from an operator (an operator who operates the application apparatus 1). The output part 17 is comprised by the liquid crystal display device, a lamp, etc., and displays various information under the control by CPU11.

Moreover, the board | substrate mounting apparatus 2, the liquid receiving part 3, the liquid receiving cleaning apparatus 4, and the organic electroluminescent application | coating mechanism 5 are connected to the control part 10 as a control object. Since it is comprised as mentioned above, by the control part 10, each apparatus (substrate mounting apparatus 2, the liquid receiving part 3, the liquid receiving cleaning device 4, and organic electroluminescent application | coating mechanism) in the coating device 1 is carried out. The operation of (5) is controlled.

<2.1 overall operation of the coating device 1>

Next, operation | movement of the coating device 1 comprised as mentioned above is demonstrated. 9 is a block diagram showing a step when a coating treatment of an organic EL material is performed on one substrate P in the coating apparatus 1. Hereinafter, the outline | summary of the application | coating process of the coating device 1 is demonstrated, referring FIG.

The board | substrate P used as the object of the application | coating process in the coating device 1 is carried in to the coating device 1 with the conveyance robot etc. which are not shown in figure, and are mounted on the stage 21. At this time, the substrate P is placed so that a plurality of grooves formed to define the rows of the organic EL light emitting cells are parallel to the X-axis direction (step ST1). The anode P and the hole transport layer for organic electroluminescent cell are already formed in the board | substrate P carried in to the coating device 1.

When the board | substrate P carried in the coating device 1 is fixed to the stage 21, the control part 10 initializes the liquid receiving cleaning apparatus 4, the stage 21, and the coating nozzle unit 50. To the position (step ST2). Specifically, the control unit 10 uses the Y-direction moving mechanism 48 and the lifting mechanism 49 in the Y-direction in which the water receiving block 4a of the water receiving cleaning device 4 is the same as the water receiving unit 3. The entire liquid receiving cleaning device 4 is moved to be in the position and the Z direction position.

Further, the stage 21 is moved for each substrate P at a predetermined initial position, and the coating nozzle unit 50 is provided at one end of the nozzle moving mechanism 51 (shaft guide 511 and ball screw 512). Move it. At this time, the nozzle unit 50 is located above the liquid receiver 3 (one end on the + X side) or above the liquid receiver block 4a of the liquid receiver cleaning device 4 (one end on the -X side). Is moved to one side. In the following description, the case where the initial position of the nozzle unit 50 is above the liquid receiving part 3 is demonstrated.

Moreover, the initial position of the stage 21 is the application | coating nozzle 52c (each application nozzle 52a-each in the board | substrate P just above the groove located in the most Y-axis forward direction side among the some groove | channel formed in the Y-axis direction). 52c) is the position where the coating nozzle in the Y-axis forward direction side is located most. As described above, when the liquid receiving cleaning device 4, the stage 21, and the application nozzle unit 50 are disposed at the initial position, the control unit 10 discharges the organic EL material from the application nozzles 52a to 52c. It starts (step ST3).

While the red organic EL material is discharged from each of the coating nozzles 52a to 52c of the coating nozzle unit 50, the coating nozzle unit 50 performs the nozzle movement mechanism 51 (shaft guide 511 and the ball screw 512). )) And the other end (above the dripping block 4a) from one end (above the dripping tray 3) (step ST4). The process of this step ST4 is called "one application | coating operation (main scanning)" below.

In addition, as mentioned above, the pitch of the application | coating nozzles 52a-52c in the Y-axis direction is equal to the space | interval of 3 rows of groove | channels provided in the board | substrate P. As shown in FIG. For this reason, in one application | coating operation | movement, linear application | coating of an organic EL material is performed with respect to the groove | channel of 3 rows at intervals every 2 rows with respect to the board | substrate P. FIG.

When one application | coating operation | movement is complete | finished, the nozzle unit 50 waits, performing discharge of organic electroluminescent material above the dripping block 4a of the drip receiving apparatus 4. At this time, the organic EL material is in contact with the upper surface of the liquid contact member 43. Since the suction by the discharge portion 43 is performed as described above, the organic EL material discharged to the upper surface of the liquid contact member 43 is a box portion. Passed through 41 is discharged from the discharge portion (43).

In addition, while the nozzle unit 50 is waiting in this manner, the stage moving mechanism 26 moves the stage 21 in the + Y direction by a predetermined pitch (for example, three times the nozzle pitch). As a result, the substrate P placed on the stage 21 is also moved in the + Y direction (step ST5). The process of this step ST5 is called "one substrate transfer operation (sub scanning)" below. Since the nozzle pitch is a groove spacing for three rows of the substrate P, the substrate P is moved in the + Y direction by nine rows of grooves in one substrate transfer operation.

And in this way, it is possible to perform the washing | cleaning process of application | coating nozzles 52a-52c at the timing which the nozzle unit 50 waits above the dripping block 4a. Since the process (step ST6, step ST7) of these washing | cleaning processes is mentioned later, the case where it progressed to NO in the branch of step ST6 (when the washing process is not performed) is continued.

As shown in step ST8, when the coating process is finished, the discharge of the organic EL material is stopped, and when the coating process is not finished, the process proceeds to step ST4. As a result, application | coating to the board | substrate P is performed by three rows by repeating the said one application | coating operation | movement and the said one conveyance operation | movement. Thereby, the organic EL material is applied to the substrate P in three rows of stripes.

One application | coating operation | movement and one conveyance operation | movement are performed until an organic electroluminescent material is apply | coated to the effective area | region (region in which the groove | channel is formed) of the board | substrate P. FIG. At this point in time, the organic EL material is also applied to portions other than the effective region of the substrate P with respect to the X-axis direction. The organic EL material applied to the regions other than the effective region is subjected to the removal process described later. Removed. The discharge of the organic EL material by the coating nozzles 52a to 52c is completed by the above (step ST9).

In addition, the board | substrate P with which the coating process in the coating device 1 was completed is carried out from the coating device 1 by the carrier robot which is not shown in figure (step ST10). With respect to the board | substrate P carried out, the organic EL material adhering to the area | regions other than the effective area of the board | substrate P is removed. The removal treatment may be any method as long as it is a method of removing the organic EL material on the substrate P. For example, the removal process may be a method of removing the organic EL material by laser ablation, and attaching a masking tape to the removal region in advance. It may be a method. And drying process (baking process) is performed with respect to the board | substrate P with which the removal process was completed.

By the above, application | coating and drying process are completed with respect to the red organic EL material. Then, about the board | substrate P, application | coating and drying process are performed with respect to green and blue organic EL material similarly to the case of red. That is, a process of applying a green organic EL material, a process of drying a coated green organic EL material, a process of applying a blue organic EL material, and a process of drying a coated blue organic EL material are performed in this order Is done. Thus, the application | coating and drying process are performed with respect to red, green, and blue organic electroluminescent material, and the light emitting layer of an organic electroluminescence display is formed. In addition, the cathode electrode is formed on the light emitting layer by, for example, a vacuum deposition method, on the substrate on which the light emitting layer is formed, thereby producing an organic EL display device.

2.2 Operation of Cleaning Process

Next, the operation (washing operation) of the coating device 1 at the time of washing | cleaning is demonstrated. 10 is a flowchart showing the flow of the cleaning operation of the coating device 1. In addition, the washing | cleaning operation shown in FIG. 10 may be performed before the start of a daily operation | work by an application | coating device, or after completion | finish, may be performed every time the application | coating process with respect to a predetermined number of board | substrates is complete, and is performed at predetermined time intervals You may also In addition, as shown in step ST6 and step ST7 of FIG. 9, you may perform in the middle of the coating process of one board | substrate P. FIG. In addition, you may perform when discharge is restarted from each application | coating nozzles 52a-52c, such as after maintenance of the application | coating apparatus 1, and so on.

In addition, the washing | cleaning operation may be started by what was manually instruct | indicated by the operator to the control part 10, and may be automatically started by the control part 10 according to predetermined conditions.

In the washing operation, first, the nozzle unit 50 washes the liquid by the nozzle moving mechanism 51 so that the X-direction positions of the respective application nozzles 52a to 52c and the cleaning nozzles 45a to 45c correspond. It moves upward of the apparatus 4 (FIG. 10: step ST11).

At this time, since the drip cleaning device 4 is in the initial position described above, the nozzle moving mechanism 51 is positioned above the dripping block 4a of the dripping cleaning device 4. In the following description, the initial position of this drip cleaning apparatus 4 is called position P1. The relative positional relationship between the nozzle unit 50 and the liquid receiving cleaning device 4 at the position P1 is shown in Fig. 11A. In addition, since FIG.11 (a)-(e) is a figure explaining the relative positional relationship with the drip cleaning apparatus 4, the discharge part 43 etc. are abbreviate | omitted suitably.

Next, the liquid receiving apparatus 4 descends by the elevating mechanism 49 until the uppermost surface of the cleaning nozzles 45a to 45c is lowered from the lowermost surfaces of the application nozzles 52a to 52c (step ST12). This is to prevent the coating nozzles 52a to 52c from colliding with the cleaning nozzles 45a to 45c in the next step ST13. In the following description, the position of the liquid receiving cleaning device 4 immediately after step ST12 is referred to as position P2. 11B, the relative positional relationship between the nozzle unit 50 and the liquid receiving cleaning device 4 at the position P2 is shown.

Subsequently, the liquid receiving cleaning device 4 moves in the + Y direction until the cleaning nozzles 45a to 45c are positioned directly under the respective application nozzles 52a to 52c by the Y-direction moving mechanism 48. (Step ST13). As a result, as shown to FIG. 11 (c), each application | coating nozzle 52a-52c and each washing | cleaning nozzle 45a-45c in the washing | cleaning block 4b of the liquid receiving washing | cleaning apparatus 4 oppose and approach. It is in a state. In the following description, the position of the liquid receiving cleaning device 4 immediately after step ST13 is referred to as position P3. 11C shows the relative positional relationship between the nozzle unit 50 and the liquid receiving cleaning device 4 at the position P3.

When the drip cleaning apparatus 4 moves to the position P3, the above-mentioned suction process is performed first (step ST14). That is, by performing the suction operation by the suction mechanism in a state where the supply pipes 461a to 461c are closed by the valve, the cleaning nozzles 45a to 45c through the common pipes 46a to 46c and the suction pipes 462a to 462c. ) Suction is performed.

At this time, as shown in FIG.11 (c), since each washing nozzle 45a-45c opposes each coating nozzle 52a-52c, the gas, coating liquid, and the surroundings of the coating nozzle 52a-52c, and Particles can be attracted (suction treatment). Below, the suction process (suction process performed before washing liquid supply process) in this step ST14 is called 1st suction process. As for the timing of the end of the first suction processing, the processing may be terminated as manually instructed by the operator to the control unit 10, or the processing may be terminated by the passage of a predetermined suction processing time.

When the first suction process (step ST14) is completed, the above-described cleaning liquid supply process is performed (step ST15). That is, by supplying the cleaning liquid by the cleaning liquid supply mechanism in a state where the suction pipes 462a to 462c are closed by the valve, the cleaning liquid passes through the supply piping 461a to 461c and the common piping 46a to 46c to clean it. It supplies to the nozzles 45a-45c.

At this time, as shown in FIG.11 (c), since each washing nozzle 45a-45c opposes each application | coating nozzle 52a-52c, washing nozzle 45a-45c (more specifically, opening 45m) Cleaning liquid can be supplied to application | coating nozzles 52a-52c by the cleaning liquid eluted from (Cleaning liquid supply process). The timing of ending the cleaning liquid supply process may be determined by an operator or may be determined in advance, similarly to the timing of ending the first suction process.

When the cleaning liquid supply process is completed, the above-described suction process is performed (step ST16). That is, the suction nozzle 45a through the common pipes 46a to 46c and the suction pipes 462a to 462c by performing the suction processing by the suction mechanism in a state where the supply pipes 461a to 461c are closed by the valves. Aspiration is performed on the surrounding gas, liquid (cleaning liquid, coating liquid, etc.) and particles.

At this time, as shown in FIG.11 (c), since each cleaning nozzle 45a-45c opposes each application | coating nozzle 52a-52c, the gas, coating liquid, and particle | grains around application | coating nozzles 52a-52c are Etc. can be sucked (suction treatment). Moreover, application | coating nozzles 52a-52c can also be dried by this suction process. Hereinafter, the suction process (suction process performed after the cleaning liquid supply process) in this step ST16 is referred to as a second suction process. The timing of the end of the second suction process may be determined by an operator or may be determined in advance, similarly to the end timing of the first suction process and the washing process.

When the 1st suction process, the washing | cleaning liquid supply process, and the 2nd suction process in step ST14-step ST16 are complete | finished, the washing process with respect to the application | coating nozzles 52a-52c in this embodiment is complete | finished. Thus, each device is moved to the initial position for starting the application operation.

Specifically, first, the liquid receiving cleaning device 4 moves in the -Y direction from the position P3 to the position P2 by the Y-direction moving mechanism 48 (step ST17). The relative positional relationship between the nozzle unit 50 after the movement and the liquid receiving cleaning device 4 is shown in Fig. 11D (position P2).

When the water receiving cleaning device 4 moves to the position P2 in the -Y direction, the descent washing machine 4 then rises to the position P1 by the elevating mechanism 49 (step ST18). The relative positional relationship between the nozzle unit 50 after the movement and the liquid receiving cleaning device 4 is shown in Fig. 11E (position P1). Since the position P1 is also an initial position for starting an application | coating operation, the nozzle unit 50 can resume the application | coating operation shown in FIG.

In the above-described steps ST11 to ST18, a series of cleaning operations are completed.

<Effect of the Coating Apparatus 1>

As described above, when the coating device 1 applies the coating liquid to the entire surface of the substrate, the coating part 52 or the liquid receiving cleaning device 4 is applied by the coating nozzles 52a to 52c that are moved in scanning. The coating liquid is discharged several times. At this time, if the coating liquid remains on the upper surfaces of the liquid contact members 32 and 42, the next-applied coating liquid and the remaining coating liquid collide with each other, whereby mist droplets (hereinafter simply referred to as &quot; mist &quot; The probability of occurrence is increased.

If this generated mist adheres to the nozzle unit 50 (for example, the application nozzles 52a to 52c), the mist or particles (mist solidifies) when the nozzle unit 50 moves above the substrate P. May fall on the substrate P. The fall of mist and particle to the board | substrate P raises the possibility of the board | substrate P becoming a defective product, and leads to the fall of a yield, and therefore it is desired to prevent it.

According to the coating device 1 which concerns on this embodiment, the upper surface of the liquid contact members 32 and 42 which the coating liquid discharged from the application | coating nozzles 52a-52c liquid-contacts by suction of the discharge part 33,43. Since it is always in a dry state, the possibility of generating the said mist can be reduced.

In addition, as described above, the internal spaces L1 and L2 in contact with the lower surfaces of the liquid contact members 32 and 42 become negative pressure by the suction of the discharge portions 33 and 43, and the upper surface of the liquid contact members 32 and 42 In the vicinity, airflow toward the inner spaces L1 and L2 occurs. As a matter of course, the closer the airflow is to the liquid contact members 32 and 42, the stronger the air flow. Further, a downward flow (airflow having a downward component) is generated toward the inner spaces L1 and L2 on the side of the liquid contact members 32 and 42. [ Here, "close to a contact liquid member" means the range which is closer to a contact liquid member, and a downward airflow generate | occur | produces also in the "near vicinity of a contact liquid member" which airflow generate | occur | produces.

Thus, since the downdraft generate | occur | produces in the immediate vicinity of the liquid contact members 32 and 42, even if a coating liquid collides with the liquid contact members 32 and 42 and mist generate | occur | produces, the said mist flows around the said down stream airflow. It is aspirated into the internal space (L1 / L2) with the gas of. As a result, the generated mist rises and can be prevented from adhering to the application nozzles 52a to 52c and their surroundings (for example, the nozzle unit 50 and the like).

FIG. 12: is the figure which added the said air stream 6 to FIG. 11 (c) which is a figure which shows the positional relationship of the nozzle unit 50 of this embodiment and the liquid receiving cleaning device 4 (position P3).

As described above, when the liquid receiving cleaning device 4 is at the position P3, the cleaning nozzles 45a to 45c are positioned immediately below the application nozzles 52a to 52c in order to perform suction processing and cleaning processing. . Therefore, as shown in FIG.11 (c) and FIG.12, the organic electroluminescent material which is a coating liquid is discharged toward the cleaning nozzles 45a-45c instead of the liquid contact member 42. FIG. At this time, the discharged coating liquid and the cleaning nozzles 45a to 45c (the cleaning liquid during the cleaning process) collide with each other, so that mist may be generated.

However, also in the case where mist generate | occur | produces in this way, the washing nozzle 45a-45c (more specifically, opening 45m) is the component of the downward direction (-Z direction) among the said airflows 6 like this embodiment. Within the range of the downdraft region D, which is a region in which the downdraft is generated, the drip receiver (the drip receiver 3 may be used, but in this example, the drip cleaner 4 is relatively relative to the drip receiver). If it is fixed, the mist is drawn into the inner space L2 along with the surrounding gas along the downdraft. Therefore, it is possible to prevent the generated mist from sticking to the application nozzles 52a to 52c and their surroundings (for example, the nozzle unit 50 and the like).

In summary, in the invention of the present embodiment, the probability of occurrence of mist can be reduced. Moreover, even if mist generate | occur | produces, if the generation point of the said mist exists in the range of the downdraft area | region D, mist may apply to application | coating nozzles 52a-52c and its periphery (for example, the nozzle unit 50 etc.). The attachment can be prevented.

In particular, when the cleaning nozzles 45a to 45c (more specifically, the openings 45m) are fixedly disposed above the upper surfaces of the inner spaces L1 and L2 of the liquid receiving portion, as in the present embodiment, the mist Since the occurrence point of is within the range of the downdraft region D, it is possible to reliably prevent the mist from adhering to the application nozzles 52a to 52c and its surroundings (for example, the nozzle unit 50 and the like).

{Variation example}

As mentioned above, although embodiment of this invention was described, this invention can be variously changed except having mentioned above, unless the meaning is deviated.

In addition, in description of a modification, the same code | symbol is attached | subjected about the element same as each element of embodiment of this invention, and it demonstrates. In addition, duplicate description is abbreviate | omitted about the structure or operation | movement similar to embodiment of this invention.

4.1 Modified Example of Substrate Cleaning Device 4

The drip-washing apparatus 4 which concerns on the said embodiment is a mechanism as a nozzle washing apparatus (washing nozzle 45a-45c, common piping 46a-46c, supply piping 461a-461c, suction piping 462a-462c A part of)) is provided inside the mechanism (box part 41, liquid contact member 42, discharge part 43) as a liquid receiving part. "Nozzle cleaning apparatus arrange | positioned inside the drip tray part" in this invention includes the case where "a part of nozzle cleaning apparatus is arrange | positioned inside a drip tray part" like the said embodiment.

Moreover, in the liquid receiving cleaning device 4 which concerns on the said embodiment, as shown to FIG. 5 and FIG. 7, the upper end (opening 45m) of the cleaning nozzle 45a-45c is larger than the upper surface of the liquid contact member 42. As shown in FIG. It is placed high.

However, the constitution of the present invention is not limited to the constitution of the above-described embodiment, and variations can be made to the drip cleaning device 4 as shown in the following examples, provided that they do not depart from the gist of the present invention. have.

<4.1.1 Modification Example 1 of Substrate Cleaning Device 4>

FIG. 13 is a conceptual cross-sectional view showing a configuration corresponding to the liquid receiving cleaning device 4 of the present invention in the first modification. As shown in FIG. 12, the liquid receiving cleaning device 4 may be configured such that the upper ends of the cleaning nozzles 45a to 45c are flush with the upper surface of the liquid contact member 42.

Also in this case, when performing a suction process and a washing | cleaning liquid supply process, washing nozzles 45a-45c are located just under application | coating nozzles 52a-52c similarly to this embodiment (position P3). Therefore, the organic EL material is discharged toward the cleaning nozzles 45a to 45c, and the discharged coating liquid and the cleaning nozzles 45a to 45c (the cleaning liquid in the cleaning process) may collide, causing mist.

However, in the present modification, since the upper ends of the cleaning nozzles 45a to 45c have the same height as the upper surface of the liquid contact member 42, the generation point of the mist (the opening 45 of the cleaning nozzles 45a to 45c) is lowered. It is in the range of the airflow area D.

Therefore, in the first modified example, even when a mist is generated, the mist is sucked into the inner space L2 together with the surrounding gas along the downward flow. As a result, the generated mist rises and can be prevented from adhering to the application nozzles 52a to 52c and their surroundings (for example, the nozzle unit 50).

Moreover, although it is different from 1st modification, even if the upper end of the cleaning nozzle 45a-45c is lower than the upper surface of the liquid contact member 42, it is contained in the scope of the present invention. In this case, however, it is necessary to consider the mechanical constraint that the application nozzles 52a to 52c and the cleaning nozzles 45a to 45c face each other in the cleaning liquid supply processing.

<4.1.2 Modification 2 of the drip tray cleaning device 4>

14 is a conceptual cross-sectional view showing a configuration corresponding to the drip cleaning device 4 of the present invention in the second modification. As shown in FIG. 14, unlike the embodiment of the present invention, the liquid receiving part 3 having the liquid receiving function and the cleaning device 9 having the cleaning function of the nozzle may be provided as separate bodies.

The cleaning apparatus 9 includes the liquid recovery part 91, the discharge part 93, the cleaning nozzles 95a to 95c, the common pipes 96a to 96c, the supply pipes 961a to 961c, and the suction pipe 962a. 962c).

In addition, among the reference symbols attached to the elements of FIG. 14, the liquid recovery part 91 is in the box parts 31 and 41, the discharge part 93 is in the discharge parts 33 and 43, and the cleaning nozzles 95a to 95c. The suction pipes 962a to the cleaning nozzles 45a to 45c, the common pipes 96a to 96c to the common pipes 46a to 46c, and the supply pipes 961a to 961c to the supply pipes 461a to 461c. 962c corresponds to suction pipe 462a-462c, respectively.

The liquid recovery part 91 is a box-shaped device with an upper surface open, and the width (length in the Y direction) is a width that causes the entire organic EL material to be discharged from the coating nozzles 52a to 52c to be discharged in the liquid column state. Have

The details of the coating process will be described later. When the organic EL material is applied to the substrate P, the application nozzles 52a to 52c are scanned above the substrate P along the X direction while discharging the organic EL material. . When the nozzles 52a to 52c are scanned along the X direction and moved above the cleaning device 9, the cleaning device 9 is disposed so that the application nozzles 52a to 52c and the cleaning nozzles 95a to 95c face each other. It is. For this reason, the washing | cleaning process (washing liquid supply process and aspiration process) in this modification can be performed with respect to the coating nozzles 52a-52c by the washing | cleaning nozzle 95a-95c.

As mentioned above, this invention is applied also in the structure of the 2nd modified example which provided the liquid receiving part 3 which has a liquid receiving function, and the cleaning apparatus 9 which has a cleaning function as a separate body.

That is, as shown in FIG. 14, the falling airflow of the mist generation point (the cleaning nozzles 95a-95c, more specifically, the opening) of the mist is generated by the negative pressure of the box part 31. If it exists in the range of the falling airflow area | region D which is the area | region which generate | occur | produces, mist will be attracted to the internal space L1 with the surrounding gas along the said falling airflow. Therefore, the generated mist rises and can be prevented from adhering to the application nozzles 52a to 52c and their surroundings (for example, the nozzle unit 50).

In the case where the cleaning device 9 is disposed adjacent to the side of the liquid receiver 3 and the positional relationship between them is fixed as in the present modified example, it is easy to employ the above-described integral moving mechanism.

FIG. 15 is a schematic cross-sectional view showing the configuration of the liquid receiving part 3 and the cleaning device 9 of the coating device 1 to which the present invention cannot be applied as a comparative example of the present invention.

As shown in FIG. 15, the rising airflow area | region E where the generation | occurrence | production point of a mist (cleaning nozzles 95a-95c) is an area | region which raises an airflow among the airflows 6 generate | occur | produced by the negative pressure of the box part 31. When it exists in the range of), the mist is wound up along the said raised airflow. As a result, the possibility that the mist adheres to the application nozzles 52a to 52c and its surroundings (for example, the nozzle unit 50, etc.) becomes high.

<4.2 Various modifications of the coating device 1>

As mentioned above, although the modification regarding the drip cleaning apparatus 4 was demonstrated especially, as long as this invention does not deviate from the meaning, it is possible to make various changes other than the above-mentioned.

In the above-described embodiment, a porous material is used as the liquid contact member to which the coating liquid discharged from the coating nozzles 52a to 52c in the liquid receiving part 3 and the liquid receiving cleaning device 4 comes into contact with the liquid. It doesn't happen. That is, a porous material is sufficient. If the material is provided with a gap inside such that a gas can pass together with a liquid, such as a nonwoven fabric, a planar body, a woven fabric, or a mesh-like thin plate, it can be used as a liquid contact member. It is possible.

As the liquid contact member to which the coating liquid comes into contact with the liquid, a large number of slit-like members may be used instead of the porous material. The slit-like member is configured to allow a liquid to easily flow down from the gap by passing gas through the gap inclined in the oblique direction. As the slit member, a metal plate such as stainless steel or a resin material such as PTFE (polytetrafluoroethylene) can be used.

In addition, although the structure which forms a space | gap was described as spaces L1 and L2 which contact | connect the lower surface of a liquid contact member, it is not limited to this. For example, a low-density planar member, a plurality of columnar members, and the like, which do not substantially generate pressure loss in the same way as the spaces L1 and L2, are formed in the spaces L1 and L2. It may be arranged.

In addition, in the above-mentioned embodiment, although red, green, and blue, red organic electroluminescent material was apply | coated to the board | substrate P with three application | coating nozzles 52a-52c, it was organic EL of a different color. A material may be sufficient and it can also be used for application | coating of a positive hole transport layer material.

In addition, red, green, and blue organic EL materials may be discharged from the application nozzles 52a to 52c, respectively. In this case, a so-called stripe arrangement arranged in the order of red, green, and blue is formed by one coating process.

Moreover, in embodiment mentioned above, although organic electroluminescent material is poured into each groove | channel of the board | substrate P with three one group of application nozzles 52a-52c, this number is not limited to three, but one Or may be applied by more nozzles. By increasing the number of nozzles, the number that can be applied in one scan movement increases, so that the processing time can be shortened.

In addition, in the above-mentioned embodiment, although the manufacturing apparatus of the organic electroluminescence display which used the organic electroluminescent material and the hole-transport material as a coating liquid was demonstrated as an example, this invention is applicable also to other coating apparatuses. For example, the present invention can also be applied to an apparatus for applying a fluorescent material used for producing a resist liquid, a spin on glass (SOG) liquid, or a plasma display panel (PDP). Moreover, it is applicable also to the apparatus which apply | coats the color material used for manufacturing the color filter comprised in a liquid crystal cell for color display of a liquid crystal color display. Moreover, when manufacturing the solar panel used for photovoltaic power generation, it is applicable also to the apparatus which performs a coating process.

In addition, although the liquid receiving part 3 and the liquid receiving washing | cleaning apparatus 4 in the said embodiment are the structures which cannot move to an X direction, the liquid receiving part 3 and the liquid receiving washing | cleaning apparatus 4 have X direction. Therefore, you may provide the moving mechanism to move. In this case, the relative positions of the liquid receiver 3 and the liquid receiver cleaning device 4 can be adjusted in accordance with the size of the substrate to be coated P.

1: coating device 2: substrate placing apparatus
3: drip tray 4: drip tray cleaning device
5: organic EL applicator 6: air flow
9: cleaning device 21: stage
31, 41: box portion 32, 42:
33, 43, 93: outlet 45, 95: cleaning nozzle
46, 96: common piping 50: nozzle unit
51: nozzle moving mechanism 52: application nozzle
91: liquid recovery part L1, L2: internal space

Claims (9)

An application device for applying a coating liquid onto a substrate,
A nozzle capable of moving a space above the holding region of the substrate, the nozzle having a discharge port for discharging the coating liquid downward;
A liquid receiving portion having an internal space connected to a suction path and receiving the coating liquid discharged from the nozzle when the nozzle is outside the presence region of the substrate, from the upper portion to the internal space;
And a nozzle cleaning device which is disposed in the vicinity of the liquid receiving part and has an opening capable of discharging a predetermined cleaning liquid upward, and performs cleaning of the discharge port of the nozzle by the cleaning liquid.
In the falling airflow area | region which is a space area | region which the downward airflow which has a downward component generate | occur | produces among the airflows which generate | occur | produce in the space near the said water receiving part by the said internal space of the said water receiving part by a suction through the said suction path, The said opening of the said nozzle cleaning apparatus is arrange | positioned relatively with respect to the said liquid receiving part, The coating apparatus characterized by the above-mentioned. The method according to claim 1,
Wherein the opening of the nozzle cleaning device is fixedly disposed above the upper surface of the inner space of the liquid receiving portion. The method of claim 2,
The upper surface of the inner space of the liquid receiving part is defined by the upper surface of the porous planar body covering the upper opening of the inner space. The method according to claim 1,
Wherein the liquid receiving portion and the nozzle cleaning device are integrated to form a liquid receiving and cleaning device. The method of claim 4,
An upper surface of the integrated liquid receiving part and the nozzle cleaning device is formed of the porous planar body. The method according to claim 4 or 5,
And the nozzle cleaning device is disposed inside the dripping portion and is integrated with the dripping portion. The method according to claim 4 or 5,
And the nozzle cleaning device is arranged adjacent to the side of the liquid receiver, and the positional relationship with the liquid receiver is fixed. The method according to any one of claims 1 to 5,
And an integral moving mechanism for integrally moving both the liquid receiving part and the nozzle cleaning device. A liquid receiving cleaning device which receives a coating liquid discharged downward from a nozzle of a coating device of a substrate and cleans the nozzle,
A liquid receiving portion having an internal space connected to a suction path and receiving the coating liquid discharged from the nozzle when the nozzle is outside the presence region of the substrate, from the upper portion to the internal space;
And a nozzle cleaning device which is integrated with the liquid receiving part and has an opening capable of discharging a predetermined cleaning liquid upward, and performs a cleaning process of the discharge port of the nozzle by the cleaning liquid,
In the falling airflow area | region which is a space area | region which the downward airflow which has a downward component among the airflows which generate | occur | produce in the space near the said water receiving part by making the said internal space of the said water receiving part become a negative pressure state by the suction through the said suction path, And the supply port of the nozzle cleaning device is fixedly disposed relative to the liquid receiving part.

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