KR101115194B1 - Application apparatus and method - Google Patents

Abstract

The coating device includes a nozzle, a stage, a nozzle moving mechanism, a liquid receiving unit, and a gas supply mechanism. The nozzle discharges the coating liquid from its tip. The stage puts a board | substrate on the upper surface. The nozzle moving mechanism reciprocates the nozzle in a direction crossing the stage surface in the space on the stage. The liquid receiving part receives the coating liquid discharged out of the stage from the nozzle when the nozzle moving mechanism moves the nozzle while discharging the coating liquid from the nozzle to a position deviated from the stage along the crossing direction. The gas supply mechanism is a nozzle moving mechanism that moves the nozzle while discharging the coating liquid from the nozzle onto the stage from a position on the liquid receiving portion along at least the crossing direction, so that the nozzle moves with respect to the direction in which the nozzle moves. Predetermined gas is supplied to the space which becomes the back of the.

Description

Application device and application method {APPLICATION APPARATUS AND METHOD}

The present invention relates to a coating apparatus and a coating method, and more particularly, to a coating apparatus and a coating method for discharging and applying a coating liquid in a liquid column state from a nozzle to a substrate placed on a stage.

DESCRIPTION OF RELATED ART The coating apparatus which apply | coats a coating liquid to a board | substrate like a single stroke is continuously developed while discharging a coating liquid from a nozzle conventionally. For example, in the apparatus which manufactures the organic electroluminescence display disclosed by Unexamined-Japanese-Patent No. 2006-0074821 (it describes as patent document 1 hereafter), the main surface of board | substrates, such as a glass substrate mounted on a stage, A coating liquid containing an organic EL material in a predetermined pattern shape is applied to the nozzle. In such a coating apparatus, when applying a coating liquid to a board | substrate, the liquid receiving part which receives a coating liquid out of a board | substrate is provided in order to collect | recover the coating liquid apply | coated out of a board | substrate and unnecessary coating liquid when a nozzle moves out of a board | substrate.

As shown in FIG. 12, in the said coating apparatus, when apply | coating the coating liquid containing red, green, and blue organic electroluminescent material, in order to improve manufacturing efficiency, any one of organic EL of red, green, and blue is applied. It is common to apply | coat and apply | coat the coating liquid containing material from a some nozzle simultaneously. In the coating apparatus, for example, a coating liquid containing an organic EL material is discharged and applied simultaneously from 10 to 20 nozzles. In FIG. 12, a coating liquid containing an organic EL material is applied from three nozzles 102 to 104. The example which discharges simultaneously is described. In addition to the nozzles 102 to 104, the coating device includes a stage 101 on which a glass substrate P coated with a coating liquid containing an organic EL material is applied, and an organic EL material discharged outside the substrate P. The liquid receiving part 105 to collect | recover is provided. And as an organic EL material, when the groove | channel is formed in stripe shape on the board | substrate P, the organic EL material which has the viscosity of the grade which flows so that it may spread in the said groove | channel is used, for example. Then, the organic EL material is discharged from the nozzles 102 to 104 at a predetermined pressure and flow rate in a straight rod shape (hereinafter, referred to as a liquid column state) and coated on the substrate P. Moreover, the liquid receiving part 105 is provided with the upper surface open to the both side outer side (only one is shown in FIG. 12) of the board | substrate P. As shown in FIG.

The nozzles 102-104 are supported by the holding member (not shown) in the state installed diagonally with respect to the nozzle reciprocating direction mentioned later, and the said holding member and the stage 101 are each of the coating apparatus. It is operated by a drive mechanism. The drive mechanism is a direction that traverses the substrate P in a predetermined direction (the direction of forming a stripe-coated heat in the substrate P, and the nozzle 102 in the arrow F direction (hereinafter referred to as nozzle reciprocating direction)). At this time, the drive mechanism traverses the board | substrate P from the upper space of the liquid receiving part 105 provided in the outer side of one side of the board | substrate P. The holding member reciprocates to an upper space of the liquid receiving part 105 provided outside the other side of the substrate P. In the drive mechanism, the holding member is an upper space of the liquid receiving part 105. When it is arranged at, the stage 101 is moved by a predetermined pitch in a predetermined direction (the plane vertical direction) perpendicular to the nozzle reciprocating movement direction Nozzles 102 to 103 simultaneously with the operation of such a drive mechanism. Organic EL material from liquid state By discharging, the coating liquid containing the organic EL material is discharged onto the substrate P, and the application heat of the coating liquid containing the organic EL material is formed.

However, when discharging the coating liquid in the liquid column state to the liquid receiver 105 provided outside the substrate P, there are the following problems. As the distance (h1 + h2 shown in FIG. 12) between the nozzles 102-104 and the liquid receiving part 105 becomes long, the coating liquid which was in the liquid pouring state is dropleted by surface tension. For example, the distance h1 from the distal end of the nozzles 102 to 104 to the upper surface of the substrate P can be set to a distance capable of guaranteeing the liquid injection state at about 0.25 to 0.50 mm, but the distance h1 + h2 becomes 20 mm or more. Only by adjusting the discharge pressure or the flow rate, it becomes difficult to prevent the droplets from being formed into droplets or the splitting of the droplets into finer mist shapes. In addition, when the nozzles 102 to 104 move at high speed in the illustrated F direction, the space behind the nozzles 102 to 104 moving at high speed becomes a negative pressure, and the coating liquid that has become a mist shape is formed in the nozzles 102 to 104. Fly up to the neighborhood. As a result, the mist-like coating liquid generated outside the substrate P falls on the substrate P and adheres to the upper surface, which causes a coating failure.

On the other hand, as shown in FIG. 13, in the coating device of the said patent document 1, the liquid receiving part 106 in which the slit S was formed is provided. The slit S is formed in the upper surface of the liquid receiving part 106 in parallel with the nozzle reciprocating direction. Moreover, the slit S is a position which deviates from the stage 101 in the said nozzle reciprocation movement direction, and is formed in the position which becomes a perpendicular downward direction from the front-end | tip part of nozzles 102-104. And the upper surface of the liquid receiving part 106 in which the slit S is formed is provided in substantially the same height as the upper surface of the stage 101 (that is, distance h2 becomes a small value of the thickness of the board | substrate P). The liquid-coating state of the liquid pouring state discharged from the nozzle through the opening of the slit S is recovered by the liquid receiving unit 106 to prevent the mist-like coating liquid from leaking out of the liquid receiving unit 106. Doing.

However, as mentioned above, it is common to use a some nozzle from a viewpoint of manufacturing efficiency etc. as mentioned above. In addition, as described above, the plurality of nozzles are supported in a state inclined side by side with respect to the nozzle reciprocating direction, and reciprocate in the nozzle reciprocating direction, so that the slit for passing the coating liquid from all the nozzles. It is necessary to form the opening width of (S) wide. Therefore, in the coating apparatus disclosed in the said patent document 1, it is necessary for the opening area of the slit S to be formed large, As a result, the mist-like coating liquid from the opening part of the slit S is carried out of the liquid receiving part 106 as a result. You can think about leaking to the outside.

In addition, when the nozzles 102-104 move at high speed in the direction of the figure F, the coating liquid droplet-formed according to the speed | rate, and the coating liquid of the more fragmented fine mist shape float in the liquid receiving part 106 inside. And since the space behind the nozzles 102-104 which move at high speed becomes a negative pressure state, the droplet-formed coating liquid and mist-shaped coating liquid floating inside the liquid receiving part 106 are the opening part of the slit S. Is sucked up into the space behind the nozzles 102 to 104. As a result, the droplet of the coating liquid and the mist-shaped coating liquid in the inside of the liquid receiving part 106 may fall on the board | substrate P, and may adhere to an upper surface, and may cause coating failure. .

Therefore, it is an object of the present invention to provide a coating apparatus and a coating method in which the coating liquid discharged outside the substrate does not affect the substrate when the coating liquid is applied to the substrate.

In order to achieve the said objective, this invention has the characteristics as described below.

The 1st situation of this invention is a coating apparatus which apply | coats a coating liquid on a board | substrate. The coating device includes a nozzle, a stage, a nozzle moving mechanism, a liquid receiving unit, and a gas supply mechanism. The nozzle discharges the coating liquid from its tip. The stage puts a board | substrate on the upper surface. The nozzle moving mechanism reciprocates the nozzle in a direction crossing the stage surface in the space on the stage. The liquid receiving part receives the coating liquid discharged out of the stage from the nozzle when the nozzle moving mechanism moves the nozzle while discharging the coating liquid from the nozzle to a position deviated from the stage along the crossing direction. The gas supply mechanism is a nozzle moving mechanism that moves the nozzle while discharging the coating liquid from the nozzle onto the stage from a position on the liquid receiving portion along at least the crossing direction, so that the nozzle moves with respect to the direction in which the nozzle moves. Predetermined gas is supplied to the space which becomes the back of the.

According to the above, when the nozzle moves from the position on the liquid receiving part toward the direction of the substrate, the space behind the moving nozzle is in a negative pressure state, but since the gas is supplied to the space behind the nozzle, the negative pressure state is reduced. As a result, droplets of the coating liquid and mist-coating liquids floating out of the liquid receiving part are prevented from entering the stage side. Therefore, it is possible to prevent coating failure due to the droplets of the coating liquid and the mist-like coating liquid floating inside the liquid receiving part falling onto the substrate on the stage and adhering to the upper surface.

In addition, the gas supply mechanism may locally supply gas from the upper portion of the liquid receiving portion toward the upper surface of the liquid receiving portion.

According to the above, by generating a local downflow from the upper part of the receiver part to the upper part of the receiver part, the negative pressure state in the space behind the nozzle which became the negative pressure state is reduced, and the droplet which floats inside the receiver part is reduced. It is possible to prevent the coating liquid and the mist-like coating liquid from being sucked up into the space in the negative pressure state.

Moreover, the slit-shaped opening parallel to the said crossing direction is formed in the upper surface at the position which becomes a perpendicular downward direction from the front-end | tip part of the nozzle arrange | positioned in the position which moved away from the stage along the direction which traverses, and the said opening is formed, You may collect the coating liquid which passed and discharged from the nozzle. In this case, the gas supply mechanism may locally supply gas to the opening of the liquid receiving portion from above the liquid receiving portion.

According to the above, since a local downflow is generated with respect to the slit opened on the upper surface of the liquid receiving part, the dropletized coating liquid or mist-like coating liquid floating inside the liquid receiving part is moved to the space of the negative pressure state. You can further prevent it from being sucked up.

Moreover, the gas supply mechanism may supply gas toward the space which becomes a back from the nozzle vicinity.

According to the above, since gas is supplied from the vicinity of the said nozzle to the back of the moving nozzle, the negative pressure state in the space behind the nozzle which became the negative pressure state is reduced, and the droplet application | coating which floated inside the liquid receiving part is carried out. It is possible to prevent the liquid or the mist-like coating liquid from being sucked up into the space in the negative pressure state.

In addition, the gas supply mechanism may include a first gas supply pipe and a second gas supply pipe. The first gas supply pipe is provided near the nozzle and supplies gas in one direction along the crossing direction. The second gas supply pipe is provided near the nozzle and supplies gas in the other direction along the crossing direction. Moreover, the liquid receiving part may include a first liquid receiving part and a second liquid receiving part. The first liquid receiving part is provided outside the stage in one direction along the crossing direction. The second liquid receiving part is provided outside the stage in the other direction along the crossing direction. In this case, the gas supply mechanism supplies gas from the first gas supply pipe when the nozzle moves from at least the position on the first liquid receiver to the stage, and at least the nozzle is moved from the position on the second liquid receiver to the stage. When moving, you may supply gas from a 2nd gas supply line.

According to the above, when the liquid receivers are provided at both ends in the nozzle reciprocating movement, the dropletized coating liquid and the mist suspended in the respective liquid receivers by supplying gas from the different gas supply pipe to the rear of the nozzle. The coating liquid of the shape can be prevented from being sucked up into the space in the negative pressure state.

In addition, the first gas supply pipe and the second gas supply pipe may reciprocate in a direction crossing with the nozzle by the nozzle moving mechanism.

According to the above, by moving a gas supply line with a nozzle, it becomes possible to always supply gas to the back of the said nozzle from the said nozzle vicinity. In the space behind the moving nozzle, the vicinity of the nozzle is often the highest negative pressure state, but since gas can be supplied to the vicinity of the nozzle, the effect of reducing the negative pressure state is increased.

Further, the first gas supply pipe and the second gas supply pipe are fixedly installed such that a discharge port for discharging the gas is disposed at a position immediately above the reciprocating movement shaft of the moving nozzle along the crossing direction, respectively, by the nozzle moving mechanism. You may reciprocate in the direction crossing with the said nozzle.

According to the above, by disposing a discharge port for discharging gas at a position immediately above the reciprocating axis of the nozzle, it is possible to effectively reduce the negative pressure state at the rear of the nozzle.

Moreover, you may further provide a control part. The control unit controls at least a gas supply operation by the gas supply mechanism. The control unit may supply gas through the first gas supply pipe and cancel the supply of the gas from the second gas supply pipe when the nozzle is located on one side on the basis of the intermediate point in the reciprocating movement. If a nozzle is located in the other direction side with respect to an intermediate point, a control part may supply gas through a 2nd gas supply pipe, and may abort supply of the gas from a 1st gas supply pipe.

According to the above, according to the nozzle position, the gas supply which becomes unnecessary about reducing the negative pressure state in the back of a nozzle can be eliminated.

Moreover, the exhaust part may be further provided. An exhaust part is provided in the position which opposes the discharge port which a gas supply mechanism discharges gas, and supplies it through the upper space of a liquid receiving part, and sucks the gas of the said upper space.

According to the above, a gas flow is formed through which the gas discharged from the gas supply mechanism is led to the exhaust portion through the space above the liquid receiver. Therefore, even if the droplet-formed coating liquid or the mist-shaped coating liquid floating inside the drip tray part is floated to the outside, since the said coating liquid is attracted from the exhaust part, the coating liquid floating from the drip tray part inside is formed on the substrate. It is possible to prevent coating failure due to falling on the upper surface and being attached to the upper surface.

In addition, the gas supply mechanism may locally supply gas from the upper side along the interface between the upper space of the liquid receiver and the upper space of the stage.

According to the above, even if the droplet-formed coating liquid and the mist-shaped coating liquid floating inside the drip tray part float to the outside, the coating liquid floated from the upper space of the drip tray part to the upper space of the board | substrate does not enter. Therefore, the coating failure by the said coating liquid falling on a board | substrate and adhering to an upper surface can be prevented.

Moreover, the 2nd phase of this invention is a form of the application | coating method which apply | coats the coating liquid discharged from the nozzle which reciprocates in the direction which traverses the said stage surface to the board | substrate put on the said stage upper surface in the space on a stage. May be implemented.

These and other objects, features, aspects, and effects of the present invention will become more apparent from the following detailed description, in contrast to the accompanying drawings.

BRIEF DESCRIPTION OF THE DRAWINGS It is a top view and a front view which showed an example of the principal part schematic structure of the coating device 1 which concerns on one Embodiment of this invention,
FIG. 2 is a block diagram showing an example of a control function and a supply unit of the coating device 1 of FIG. 1,
3 is a perspective view showing an example of the structure of the liquid receiving part 53 of FIG.
4 is a perspective view showing an example of the positional relationship between the organic EL material discharged from the nozzles 52a to 52c and the liquid receiving part 53,
5 is a perspective view illustrating an example of the downflow generating unit 530.
6 is a perspective view illustrating an example of the downflow generating unit 531,
7 is a front view and a side view showing an example of a schematic configuration of the nozzle unit 50,
8 is a top view illustrating an example of a schematic configuration of the nozzle unit 50,
9 is a top view illustrating an example of a schematic configuration in which an exhaust unit 537 is provided.
10 is a top view illustrating an example in which gas supply pipes 538L and 538R are fixed to and installed at a portion of the coating device 1 other than the nozzle unit 50.
11 is a side cross-sectional view showing a structural example of the liquid receiving part 53 provided with the porous member 534 inside the box part 532.
12 is a side schematic view showing the positional relationship between the nozzles 102 to 104 and the liquid receiving part 105 of the conventional coating apparatus.
13 is a perspective view showing the structure of a conventional liquid receiver (106).

<1st embodiment>

EMBODIMENT OF THE INVENTION Hereinafter, the coating device 1 which concerns on 1st Embodiment of this invention is demonstrated with reference to drawings. In order to make description concretely, the following description is given using the example applied to the coating apparatus which apply | coats the coating liquid containing organic electroluminescent material and manufactures an organic EL device. In addition, the organic EL material in this specification is a material which forms an organic layer (layer containing organic substance in a light emitting layer, a charge transport layer, a charge injection layer, etc.), for example, is soluble in a solvent among the materials which form an organic layer. One ingredient. The coating apparatus 1 forms an organic layer by apply | coating the coating liquid containing organic electroluminescent material in a predetermined pattern shape on the to-be-coated body (for example, glass substrate) on which the stage was mounted, and organic electroluminescent device To prepare. 1: (a) is a top view which shows an example of the principal part schematic structure of the coating device 1. As shown in FIG. FIG.1 (b) is a front view which shows an example of the principal part schematic structure of the coating device 1. As shown in FIG. In addition, although the coating apparatus 1 uses many types of coating liquid containing an organic EL material as mentioned above, the example which uses the coating liquid containing the organic EL material which forms a light emitting layer as such a representative is demonstrated.

In FIG. 1, the coating device 1 is provided with the board | substrate mounting apparatus 2 and the organic electroluminescent application mechanism 5 substantially. The organic EL coating mechanism 5 has a nozzle movement mechanism part 51, a nozzle unit 50, and liquid receiving parts 53L and 53R. The nozzle movement mechanism part 51 is provided with the guide member 511 extended in the X-axis direction horizontally, and moves the nozzle unit 50 along the guide member 511 in the X-axis direction (scanning direction). . The nozzle unit 50 maintains in a state where a plurality of nozzles 52 for discharging a coating liquid containing an organic EL material of any one of red, green, and blue are provided side by side. In addition, it is possible to provide n nozzles 52 (for example, 10 to 20) side by side in the coating device 1, and in this case, organic EL of any one color of red, green, and blue. The coating liquid containing the material is discharged from the n nozzles 52. Hereinafter, as shown in FIG. 1 etc., three nozzles 52a, 52b, and 52c are demonstrated using the example provided in the coating apparatus 1 side by side. Each nozzle 52a-52c is supplied with the coating liquid containing the organic EL material of any one color of red, green, and blue from a supply part (refer FIG. 2), respectively. Thus, although the coating liquid containing the organic electroluminescent material of the same color is discharged from the some nozzle 52, the example in which the red organic electroluminescent material is discharged from three nozzles 52a-52c is illustrated for the specific description. I use it.

The substrate placing apparatus 2 has the stage 21, the turning part 22, the parallel moving table 23, the guide receiving part 24, and the guide member 25. The stage 21 places the board | substrate P, such as a glass substrate used as a to-be-coated object, on the stage upper surface. The lower part of the stage 21 is supported by the turning part 22, and the stage 21 is comprised so that rotation is possible in the shown (theta) direction by the rotation operation of the turning part 22. As shown in FIG. Moreover, inside the stage 21, a heating mechanism for preheating the substrate P coated with the organic EL material on the stage surface, an adsorption mechanism of the substrate P, a tap fin mechanism, and the like are provided. (Neither shown).

The guide member 25 extends and is fixed in the Y-axis direction shown in the horizontal direction perpendicular to the X-axis direction so as to pass below the organic EL coating mechanism 5. The guide receiving part 24 which abuts on the guide member 25 and slides on the guide member 25 is fixed to the lower surface of the parallel movement table 23. Moreover, the turning part 22 is fixedly installed on the upper surface of the parallel movement table 23. Thereby, the parallel movement table 23 can be moved to the Y-axis direction (sub-scan direction) shown along the guide member 25, for example by receiving the driving force from a linear motor (not shown), and moving parallelly. The stage 21 supported by the turning part 22 horizontally moves by the movement of the table 23.

When the board | substrate P is mounted on the stage 21 via the water supply pin mechanism, the said board | substrate P is fixed by adsorption, and the parallel movement table 23 moved to the lower side of the organic electroluminescent application mechanism 5, The said board | substrate P becomes a position which receives application | coating of the coating liquid containing a red organic EL material from nozzles 52a-52c. And the control part (refer FIG. 2) controls the nozzle movement mechanism part 51 so that the nozzle unit 50 may reciprocate in the X-axis direction, and every time the stage 21 is linearly moved to the Y-axis direction by a predetermined pitch. The parallel movement table 23 is controlled to move, and the coating liquid containing the organic electroluminescent material of predetermined flow volume is discharged from the nozzles 52a-52c. Moreover, in the X-axis discharge position of the nozzles 52a-52c, the both side spaces which deviate from the board | substrate P mounted on the stage 21 contain the organic EL material discharged | emitted from the board | substrate P. The liquid receiving parts 53L and 53R, which receive the coating liquid, are fixed to each other. The nozzle movement mechanism part 51 traverses the board | substrate P from the upper space of the liquid receiving part 53 (for example, the liquid receiving part 53L) provided in the one side outer side of the board | substrate P, and has a board | substrate ( The nozzle unit 50 is reciprocally moved to the upper space of the liquid receiving part 53 (for example, the liquid receiving part 53R) provided outside the other side of P). Moreover, when the nozzle unit 50 is arrange | positioned in the upper space of the liquid receiving part 53, the parallel movement table 23 has a predetermined pitch in the predetermined direction (Y-axis direction shown) perpendicular to the nozzle reciprocating movement direction. The stage 21 is moved by. At the same time as the operation of the nozzle moving mechanism 51 and the parallel moving table 23, the coating liquid containing the organic EL material is discharged from the nozzles 52a to 52c in a liquid state, thereby coating liquid containing a red organic EL material. It is formed on the substrate P as a stripe-coated heat.

Next, with reference to FIG. 2, the schematic structure of the control function and the supply part in the coating device 1 is demonstrated. 2 is a block diagram which shows an example of the control function of a coating device 1, and a supply part.

In FIG. 2, the coating device 1 includes a control unit 3 and a supply unit 54 in addition to the above-described components. The supply part 54 branches and supplies the coating liquid containing a red organic EL material to nozzles 52a-52c, respectively.

The supply part 54 includes the supply source 541 of the coating liquid containing an organic EL material, the press part 542 for sending out the coating liquid containing an organic EL material from the supply source 541, and nozzles 52a-52c. Flowmeters 543a to 543c for detecting the flow rate of the coating liquid containing the respective organic EL materials branched and supplied. And the control part 3 controls each operation of the supply part 54, the turning part 22, the parallel movement table 23, and the nozzle movement mechanism part 51. As shown in FIG. In addition, the pipe member which consists of PE (polyethylene), PP (polypropylene), a fluororesin, etc. is used for each piping from the supply source 541 to the nozzles 52a-52c. The supply source 541 stores a coating liquid containing an organic EL material to be applied by the coating device 1, and stores, for example, a coating liquid containing the organic EL material in a flexible pack. The pressurizing part 542 pressurizes the supply source 541, and takes out the coating liquid containing the organic EL material stored by the supply source 541, and makes it flow to the nozzles 52a-52c.

The nozzle 52a has a filter part 529a for removing the foreign matter in the coating liquid containing the organic EL material supplied from the supply part 54. The nozzle 52b has a filter part 529b for removing the foreign matter in the coating liquid containing the organic EL material supplied from the supply part 54. The nozzle 52c has a filter part 529c for removing foreign matter in the coating liquid containing the organic EL material supplied from the supply part 54. In addition, since nozzles 52a-52c have the same structure, respectively, when demonstrating generically, it demonstrates attaching | subjecting the code | symbol "52".

Here, as an example, a stripe-shaped groove corresponding to a predetermined pattern shape to which the coating liquid containing the organic EL material is to be applied is formed on the surface of the substrate P to which the coating liquid containing the red organic EL material is applied. It may be formed so that a plurality may be installed side by side. In this case, as the coating liquid containing the organic EL material, for example, a coating liquid containing an organic EL material having a viscosity that flows so as to spread in the groove on the substrate P is used. A coating liquid containing an organic EL material of polymer type for each color is used.

The nozzle unit 50 can adjust the application | coating pitch interval of each nozzle 52a-52c. In the nozzle unit 50, each nozzle 52a-52c is arrange | positioned apart substantially linearly with respect to the X-axis direction in FIG. 1, and is arrange | positioned slightly offset in the Y-axis direction in FIG. The distance with respect to the Y-axis direction between two adjacent nozzles 52 is adjusted so that it may correspond to the space | interval of desired application | coating heat | fever. For example, it becomes the same by several times (for example, 3 times etc.) of the pitch between stripe grooves previously formed in the surface of the board | substrate P. FIG. Moreover, even when there is no such groove, the pitch of the Y-axis direction of the nozzle 52 is adjusted similarly to correspond to the space | interval of the application | coating row of desired stripe shape.

The structure which adjusts the pitch of the Y-axis direction of the nozzle 52 mentioned above can be considered variously. For example, since the nozzles 52a to 52c are configured to be movable in the Y-axis direction (sub-scan direction), respectively, it becomes possible to adjust the pitch in the Y-axis direction of each nozzle 52. As another example, the application pitch interval is adjusted by rotatably supporting the nozzle unit 50 around a predetermined vertical direction support shaft, and rotating the nozzle unit 50 around the support shaft by the control of the control unit 3. Can be.

The control part 3 is based on the position and the direction of the board | substrate P put on the stage 21, and the said groove | channel is formed in the direction (for example, the board | substrate P) in which the application | coating heat | fever is formed in the board | substrate P. If formed, the angle of the turning portion 22 is adjusted so that the direction of the groove is in the X-axis direction, and at the start point of coating, that is, at one end side to form the coating heat on the substrate P. The coating start position for starting the coating is calculated. That is, the said application start position becomes the upper space of one liquid receiving part 53. And the control part 3 drives the parallel movement table 23 and the nozzle movement mechanism part 51 as mentioned above.

At the application start position, the control unit 3 instructs the pressure unit 542 to start discharging the coating liquid containing the organic EL material from the nozzles 52a to 52c. At this time, the control part 3 controls the nozzles 52a to 52c so that the coating amount of the coating liquid containing the organic EL material at each point of the stripe coating heat becomes uniform and the organic EL material is discharged in the liquid column state. The application amount is controlled in accordance with the moving speed, and the flow rate information from the flow meters 543a to 543c is fed back and controlled. And the control part 3 discharges the coating liquid containing organic electroluminescent material onto the board | substrate P, in order to form the application heat of the coating liquid containing organic electroluminescent material on the board | substrate P (the nozzle unit ( 50 is controlled to move along the guide member 511. By this operation | coating, the application | coating heat | fever which the coating liquid containing the red organic EL material discharged | emitted from each nozzle 52a-52c in the liquid column state was apply | coated on the board | substrate P simultaneously is formed.

If the control part 3 is located on the other liquid receiving part 53 which the nozzle unit 50 traverses on the board | substrate P, and is fixed to the outer side of the other end of the board | substrate P, it will be a nozzle. The movement of the nozzle unit 50 by the nozzle movement mechanism part 51 is stopped, continuing discharge of the coating liquid containing organic electroluminescent material from 52a-52c. By this one movement, application | coating of the coating liquid containing organic electroluminescent material is performed simultaneously with respect to the application | coating heat of the number of nozzles 52. FIG. Specifically, in the case of discharging a coating liquid containing the organic EL material of the same color from each nozzle 52a to 52c, the organic EL material is applied to a total of three rows of coating heat for which one row of coating heat is applied for every three rows. The coating liquid containing is apply | coated.

Next, the control part 3 pitch-moves the parallel movement table 23 by a predetermined distance to the Y-axis positive direction, and can apply | coat the coating liquid containing the organic electroluminescent material to the application | coating heat | fever which becomes a coating object next. Make sure And the control part 3 crosses the nozzle unit 50 on the board | substrate P in the reverse direction from the upper space of the other liquid receiving part 53, and is located on one liquid receiving part 53, The movement of the nozzle unit 50 by the nozzle movement mechanism part 51 is stopped, continuing to discharge the coating liquid containing the organic EL material from the nozzles 52a-52c. By this second movement, the application of the coating liquid containing the organic EL material to the next three rows of coating heat is completed. By repeating such an operation, a coating heat coated with a coating liquid containing a red organic EL material is formed.

Next, with reference to FIGS. 3-6, the liquid receiving part 53 is demonstrated. 3 is a perspective view which shows an example of the structure of the liquid receiving part 53. As shown in FIG. FIG. 4 is a side schematic view of the liquid receiving part 53 seen from the D direction in FIG. 3. 4 is a perspective view showing an example of the positional relationship between the organic EL material discharged from the nozzles 52a to 52c and the liquid receiving part 53. FIG. 6: is a perspective view which shows an example of the positional relationship with the liquid receiving part 53 when the nozzles 52a-52c move. Moreover, both the liquid receiving parts 53L and 53R (refer FIG. 1) in the both sides with respect to the stage 21 have the same structure which made the stage 21 symmetrical, and FIGS. It is shown as the liquid receiving part 53.

In FIG. 3, the liquid receiver 53 is provided with a box portion 532, an upper plate member 533, and an in-box suction portion 536.

The box part 532 is connected to the nozzle moving mechanism part 51 (or fixedly installed member), for example, and is fixed so that the positional relationship with the nozzle moving mechanism part 51 is always fixed. The box portion 532 has a box shape in which an upper surface is open, and an upper plate member 533 is provided and closed to cover the upper surface. As for the upper plate member 533, the slit opening part 533a which makes the X-axis direction the longitudinal opening direction are formed. The upper plate member 533 is attached like a lid of the box portion 532 and is detachably fitted from the box portion 532. When the upper plate member 533 is attached to the box portion 532, the slit opening 533a functions as an open hole in the inner space and the outer space of the box portion 532.

The upper surface of the upper plate member 533 is fixed so as to have approximately the same height as the upper surface of the stage 21. Side surfaces of the box portion 532 and the upper plate member 533 on the stage 21 side are fixed to each other by forming a predetermined gap in the vicinity of the stage 21. And about the board | substrate P (shown with the broken line in FIG. 3) mounted on the upper surface of the upper plate member 533 so that a part may protrude from the side surface of the stage 21 to the X-axis positive direction. Some overlap and are arranged.

Further, the box portion 532 is provided with a suction port at the side center position thereof and the like, and the box suction part 536 sucks the gas, the coating liquid, and the like inside the box part 532 from the suction port. Then, the gas or coating liquid sucked from the inside of the box portion 532 (coated liquid droplets generated inside the box portion 532, the mist-like coating liquid, and the coating liquid discharged into the box portion 532 in the liquid form) are applied. The liquid) is sucked from the suction port by the in-box suction part 536 and recovered to a drainage tank (not shown).

Next, with reference to FIG. 4, the positional relationship of the nozzles 52a-52c and the liquid receiving part 53 is demonstrated. 4, the nozzles 52a-52c, the liquid receiving part 53, and the board | substrate P are mainly shown, and abbreviate | omitted another site | part. In addition, only the box part 532 and the upper plate member 533 are shown about the liquid receiving part 53. As described above, when the coating liquid containing the organic EL material is applied to the substrate P, the nozzles 52a to 52c receive the liquid at the start and end of the coating or at the time of returning in the X-axis direction. It is arranged in the upper space of 53. At this time, the nozzles 52a to 52c discharge the organic EL material in the liquid column state from the upper side of the liquid receiver 53 toward the slit opening 533a.

When the nozzles 52a to 52c move in the upper space of the liquid receiving part 53, the coating liquid containing the organic EL material discharged from the nozzles 52a to 52c passes through the slit opening 533a to give a box part. The liquid receiving part 53 is provided so that it may receive in the inside of 532. That is, when the nozzles 52a to 52c come out of the substrate P in the X-axis direction, the slit openings 533a are formed to include all positions immediately below the front end portions (discharge ports) of the nozzles 52a to 52c. have. However, the moving direction (X-axis direction) of the nozzles 52a-52c and the length formation direction (X-axis direction) of the slit opening part 533a are parallel, and the Z-axis negative direction to the front-end | tip part of nozzle 52a-52c is parallel. The slit opening part 533a is formed in the (vertical direction). Here, the nozzles 52a to 52c are arranged to be slightly shifted from each other in the Y-axis direction in order to simultaneously apply the coating liquid containing the organic EL material in three rows of coating heat in the X-axis direction. The slit opening 533a has a width through which all of the coating liquid containing the organic EL material discharged from the nozzles 52a to 52c is discharged in the liquid column state.

Moreover, as shown in FIG. 4, when nozzles 52a-52c are arrange | positioned in the upper space of the liquid receiving part 53, nozzles 52a-52c move at high speed in the C direction which is a negative direction of an X-axis. Even when the nozzles 52a to 52c move from the upper space of the liquid receiving part 53 to the illustrated C direction, the coating liquid containing the organic EL material discharged from the nozzles 52a to 52c is placed on the substrate P. All are passed through the slit opening part 533a in a liquid column state until it is discharged, and it is collect | recovered to the box part 532.

Next, with reference to FIG. 5, an example of the downflow generation part 530 is demonstrated. 5 is a perspective view showing an example of the downflow generating unit 530.

In FIG. 5, the downflow generating unit 530 is provided in the upper space of the liquid receiving unit 53. The downflow generation part 530 is fixedly installed in the position which does not inhibit the movement of the nozzle unit 50. FIG. The dow flow generating part 530 uses the gas (for example, air) supplied and pressurized from the exterior of the coating device 1 toward the slit opening part 533a in the liquid receiving part 53, Form a local downflow of the desired flow rate. Moreover, the downflow generation part 530 is provided in the upper space of the liquid receiving part 53L, and the upper space of the liquid receiving part 53R, respectively.

Here, when the nozzle unit 50 (nozzles 52a to 52c) moves at a high speed in the direction C shown in the direction of the substrate P from the position immediately above the liquid receiving part 53, the coating is dropletized according to the speed. The liquid and the more fragmented fine mist-like coating liquid float in the liquid receiving part 53. And since the space of the back of the nozzle unit 50 which moves at high speed (in FIG. 5, the positive direction of the X-axis direction of the nozzle unit 50) will be in a negative pressure state, the liquid droplet floating in the liquid receiving part 53 inside It is conceivable that one coating liquid or mist-like coating liquid is sucked up from the slit opening 533a to the negative pressure space. However, since a local downflow of a predetermined flow rate is formed from the downflow generating unit 530 toward the slit opening 533a, the negative pressure state near the slit opening 533a in the negative pressure space is reduced. For example, when the downflow generating unit 530 flows down the gas at a line speed that can cancel the negative pressure state of the space in the vicinity of the slit opening 533a, the slit opening 533a provides a high speed. It is possible to prevent the droplet-formed coating liquid and the mist-like coating liquid floating inside the liquid receiver 53 behind the moving nozzle unit 50 from being sucked up. The state in which the negative pressure state of the space in the vicinity of the slit opening 533a is canceled is, for example, a state in which the pressure in the space in the vicinity of the slit opening 533a is higher than the pressure in the liquid receiver 53. The state of the space in the vicinity of the slit opening 533a is shown to be above atmospheric pressure. Thereby, the coating defect by which the coating liquid floating from the inside of the liquid receiving part 53 falls on the board | substrate P, and adheres to an upper surface can be prevented.

In consideration of the reciprocating movement of the nozzle unit 50 in the X-axis direction (main scanning direction) at a high speed, the downflow generating unit 530 is respectively irrespective of the position of the nozzle unit 50 in the reciprocating movement. Always continue with the downflow generated. Further, if at least the nozzle unit 50 is moved in the direction of the substrate P from the position immediately above the dripping portion 53, if down flow is formed with respect to the dripping portion 53, the nozzle unit 50 Depending on the position in the reciprocating movement of the downflow generating unit 530, the downflow generating unit 530 may turn on / off the generation of the downflow, respectively.

In addition, although the downflow generation part 530 used the example which forms the local downflow toward the slit opening part 533a in the liquid receiving part 53, the nozzle unit 50 is a liquid receiving part. As long as the local downflow is formed from the position immediately above 53 to the back of the substrate P, the downflow may be formed at another position. As a 1st example, the downflow generation part may form local downflow toward at least one part of the said opening part which does not overlap with the board | substrate P among the slit opening parts 533a, and the whole of the liquid receiving part 53 ( For example, you may form local downflow with respect to the whole upper plate member 533 or a part of the liquid receiving part 53. As shown in FIG.

As a 2nd example, you may form a local downflow (for example, air curtain) along the interface of the upper space of the liquid receiving part 53, and the upper space of the board | substrate P. As shown in FIG. For example, as shown in FIG. 6, the downflow generation part 531 which forms a local downflow (air curtain) along the interface of the upper space of the liquid receiving part 53, and the upper space of the board | substrate P is shown. ) Is being installed. For example, the downflow generation unit 531 is fixed at a position which does not inhibit the movement of the nozzle unit 50 which is above the boundary surface between the upper space of the liquid receiver 53 and the upper space of the substrate P. Is installed. The downflow generating unit 531 uses a gas (for example, air) that is pressurized and supplied from the outside of the coating apparatus 1 toward the end of the substrate P disposed on the liquid receiving unit 53. Thus, local downflow (air curtain) of a predetermined flow rate is formed. Moreover, the downflow generation part 531 is provided in the upper space of the liquid receiving part 53L, and the upper space of the liquid receiving part 53R, respectively. In the second example, the down-flow generating unit 531 forms the down, even if the droplet-forming coating liquid and the mist-like coating liquid floating inside the liquid receiving part 53 float outward from the slit opening 533a. Since the coating liquid that is blocked by the flow (air curtain) and floats from the upper space of the liquid receiving part 53 to the upper space of the substrate P does not enter, the coating liquid falls on the substrate P. Poor coating can be prevented by being attached to the upper surface.

In addition, in the 1st example and 2nd example mentioned above, the liquid receiving part 53 when the nozzle unit 50 moves in the direction of the board | substrate P at least from the position directly above the liquid receiving part 53. If downflow is formed with respect to, depending on the position of the nozzle unit 50 in the reciprocating movement, the downflow generation unit may switch on / off the generation of downflow, respectively. Moreover, considering that the nozzle unit 50 reciprocates in the X-axis direction (main scanning direction) at high speed, the downflow generating unit is always down regardless of the position of the nozzle unit 50 in the reciprocating movement. You can continue the state in which you created the flow.

<2nd embodiment>

EMBODIMENT OF THE INVENTION Hereinafter, the coating apparatus which concerns on 2nd Embodiment of this invention is demonstrated with reference to drawings. As for the coating device which concerns on 2nd Embodiment, the mechanism which supplies gas to the back of the nozzle unit 50 which moves at high speed with respect to the coating device which concerns on 1st embodiment mentioned above differs only. However, about the following description, the gas supply mechanism in 2nd Embodiment is mainly demonstrated, and about the same structure as the coating device which concerns on 1st Embodiment, the same code | symbol is attached | subjected and detailed description is abbreviate | omitted.

Next, with reference to FIG. 7 and FIG. 8, the structure of the nozzle unit 50 is demonstrated. 7 (a) is a front view which shows an example of schematic structure of the nozzle unit 50. As shown in FIG. FIG.7 (b) is a side view which shows an example of schematic structure of the nozzle unit 50. As shown in FIG. 8 is a top view illustrating an example of a schematic configuration of the nozzle unit 50.

In FIG. 7 and FIG. 8, the nozzle unit 50 includes a nozzle holder 520 which reciprocates in the X-axis direction (see FIG. 1) along the guide member 511 by the nozzle moving mechanism part 51. Doing. The nozzle holder 520 is formed of, for example, an L-shaped plate-like member, and is disposed such that a bottom surface extending in the horizontal direction is parallel to the upper surface of the stage 21. And the nozzle holder 520 supports three nozzles 52a-52c from the said bottom surface.

Moreover, the gas supply mechanism support member 524 is fixed to the nozzle holder 520. The gas supply mechanism supporting member 524 is formed of, for example, an L-shaped plate-shaped member, and the bottom surface extending in the horizontal direction has a bottom surface of the nozzle holder 520 in the upper space of the nozzles 52a to 52c. It is fixed to be parallel.

Gas supply pipe 521L and 521R and the solenoid valve 523 are fixed to the gas supply mechanism support member 524. The gas supply pipe 521L discharges the gas (for example, air) pressurized and supplied from the outside of the coating device 1 through the solenoid valve 523 at a predetermined flow rate to the X-axis negative direction side of the nozzle unit 50. . Specifically, as shown in Fig. 7 (b), the discharge port through which the gas supply pipe 521L discharges the gas is provided above the nozzles 52a to 52c, and typically the nozzle (in the nozzle reciprocating direction). 52a-52c are provided in the position immediately above the reciprocating movement shaft. In addition, the gas supply pipe 521R discharges the gas at a predetermined flow rate toward the X-axis forward direction of the nozzle unit 50 via the solenoid valve 523. Specifically, similarly to the gas supply pipe 521L, the gas supply pipe 521R has a discharge port through which the gas supply pipe 521R discharges the gas above the nozzles 52a to 52c, and typically the nozzles 52a to the nozzle reciprocating direction. 52c) is provided at the position immediately above the reciprocating movement shaft.

The solenoid valve 523 opens and closes the flow path of the gas of the gas supply pipe 521L and the flow path of the gas of the gas supply pipe 521R, respectively, to switch the discharge of the gas by the gas supply pipe 521L and the discharge of the gas by the gas supply pipe 521R. do. In addition, the opening / closing operation of the solenoid valve 523 is controlled by the control of the control unit 3 to switch the discharge of the gas from the nozzle unit 50.

For example, as shown in FIG. 8, when the nozzle unit 50 moves from the position immediately above the liquid receiving part 53R to the direction C shown in the direction of the board | substrate P, the control part 3 is a gas supply line. The opening and closing of the solenoid valve 523 is switched so that the said gas may be discharged | emitted to the X-axis positive direction side from 521R. Moreover, when the nozzle unit 50 moves toward the board | substrate P direction from the position just upper of 53 L (refer FIG. 1), the control part 3 will have the said X-axis part from the gas supply line 521L. The opening and closing of the solenoid valve 523 is switched so that it may discharge to the direction side. By the gas supply control of the control part 3, when the nozzle unit 50 (nozzles 52a-52c) moves to the board | substrate P side from the position just above the liquid receiving part 53, The gas is discharged to the rear of the moving direction in the reverse direction to the moving direction.

Here, when the nozzle unit 50 (nozzles 52a to 52c) move at a high speed in the C direction shown in the drawing, the coating liquid which has been dropletized according to the speed, or the coating liquid having a more fine fine mist shape is formed inside the liquid receiving part 53R. Wealthy Since the space behind the high speed moving nozzle unit 50 (specifically, the X-axis positive direction side of the nozzle unit 50) becomes a negative pressure state, the dropletized coating liquid floating in the liquid receiving part 53R It is also conceivable that the mist-like coating liquid is sucked up from the slit opening 533a into the negative pressure space. However, when the nozzle unit 50 moves in the illustrated C direction (direction of the substrate P) from the position immediately above the liquid receiver 53R, the gas flows from the gas supply pipe 521R into the negative pressure space in the opposite direction to the movement direction. Discharged. Accordingly, the gas discharged from the gas supply pipe 521R reduces the negative pressure state in the negative pressure space and floats inside the liquid receiving part 53R toward the rear of the nozzle unit 50 which moves from the slit opening 533a at high speed. It is possible to prevent sucking up of the applied coating liquid or the mist-like coating liquid. Moreover, when the nozzle unit 50 moves in the direction of the board | substrate P from the position immediately above the liquid receiving part 53L, it is the back of the nozzle unit 50 which moves at high speed, and a gas supply line 521L in the opposite direction to the said moving direction. The gas is discharged from. Accordingly, the gas discharged from the gas supply pipe 521L reduces the negative pressure state at the rear of the nozzle unit 50, thereby allowing the inside of the liquid receiving part 53R to the rear of the nozzle unit 50 moving at a high speed from the slit opening 533a. It can be prevented that the droplet-formed coating liquid and the mist-like coating liquid floating in the air are sucked up. Thereby, the coating failure by which the coating liquid floating from the inside of the liquid receiving parts 53L and 53R respectively fall on the board | substrate P, and adheres to an upper surface can be prevented.

In addition, considering that the nozzle unit 50 reciprocates in the X-axis direction (main scanning direction) at high speed, the nozzle unit 50 is largely divided into two types according to the position in the reciprocating movement of the nozzle unit 50, and the solenoid valve 523 You may change the flow path of the said gas by (). For example, switching of the flow path of the gas by the solenoid valve 523 on the basis of the intermediate point at which the nozzle unit 50 reciprocates (that is, the intermediate value of the liquid receiving part 53L and the liquid receiving part 53R). Is done. Specifically, when the nozzle unit 50 is located on the liquid receiving part 53L side with respect to the intermediate point, the control unit 3 controls the solenoid valve 523 to discharge gas only from the gas supply pipe 521L. On the other hand, when the nozzle unit 50 is located on the liquid receiving part 53R side with respect to the intermediate point, the control unit 3 controls the solenoid valve 523 to discharge the gas only from the gas supply pipe 521R. Besides, the timing of switching the gas flow path by the solenoid valve 523 can be considered, but at least when the nozzle unit 50 moves in the direction of the substrate P from the position immediately above the liquid receiver 53L, When gas is discharged from the supply pipe 521L and the nozzle unit 50 moves from the position immediately above the liquid receiving part 53R in the direction of the substrate P, the gas is discharged from the gas supply pipe 521R when the gas is discharged at a different timing. You may switch channels.

Moreover, you may provide the exhaust part 537 which sucks the gas in the negative pressure space mentioned above to the coating device 1 further. For example, as shown in FIG. 9, the exhaust part 537R which suctions the gas of the upper space of the liquid receiving part 53R is provided in the X-axis forward direction side of the liquid receiving part 53R. As a result, the gas above the liquid receiving part 53R is attracted to the exhaust part 537R, so that the gas discharged from the gas supply pipe 521R is led to the exhaust part 537R through the upper space of the liquid receiving part 53R. do. Therefore, even if the droplet-formed coating liquid and mist-shaped coating liquid floating inside the liquid receiving part 53R float outward from the slit opening 533a, since the said coating liquid is attracted by the exhaust part 537R, the liquid receiving part 53R inside It is possible to prevent coating failure due to the floating coating liquid falling on the substrate P and adhering to the upper surface. Similarly to the exhaust part 537R, an exhaust part 537L that sucks gas in the upper space of the liquid receiver part 53L is provided on the X-axis negative direction side of the liquid receiver part 53L. As a result, the gas above the liquid receiver 53L is aspirated by the exhaust portion 537L, so that the gas discharged from the gas supply pipe 521L is led to the exhaust portion 537L through the space above the liquid receiver 53L. . Therefore, even if the droplet-formed coating liquid and mist-like coating liquid floating inside the liquid receiving part 53L float outward from the slit opening 533a, since the said coating liquid is attracted by the exhaust part 537L, the liquid receiving part 53L inside It is possible to prevent coating failure due to the floating coating liquid falling on the substrate P and adhering to the upper surface.

In addition, in the above-mentioned description, although all the outlet ports of gas supply pipe 521L and 521R were provided in the upper part of the nozzle 52a-52c which is just above the moving shaft which nozzles 52a-52c reciprocate in a nozzle reciprocating direction, The outlets of the gas supply pipes 521L and 521R may be provided at different positions. The gas is placed in the upper spaces of the liquid receiving portions 53L and 53R, respectively, which become the back of the high speed moving nozzle unit 50 (specifically, the X-axis positive direction or the X-axis negative direction side of the nozzle unit 50). If it is a position which can supply, you may provide the discharge ports of gas supply pipe 521L and 521R in another position.

As a 1st example, the discharge ports of gas supply pipe 521L and 521R are respectively provided in the vicinity of the nozzles 52a-52c including positions other than the position just above the said moving shaft. In this manner, when the nozzles are in the vicinity of the nozzles 52a to 52c, the gas can be supplied to the upper spaces of the liquid receiving portions 53L and 53R, which become the rear of the nozzle unit 50 moving at a high speed and become in a negative pressure, similarly to the position immediately above. Needless to say.

As a 2nd example, the gas supply pipe 538L and 538R are fixed to the site | parts of the coating apparatus 1 other than the nozzle unit 50, and the exhaust port which supplies gas to the said upper space is provided, respectively. For example, as shown in FIG. 10, the gas supply line 538R which supplies gas to the upper space of the liquid receiving part 53R is fixedly installed in the position which does not inhibit the movement of the nozzle unit 50. As shown in FIG. Specifically, it is the X-axis negative direction side with respect to the liquid receiving part 53R, and is the Y-axis forward direction side with respect to the reciprocating movement space of the nozzle unit 50, and is equivalent to the nozzle unit 50 with respect to the Z-axis direction. The gas supply line 538R is fixedly installed in the position which becomes a height of deterioration (shape shown in FIG. 10). In this case, the gas supply pipe 538R discharges gas to the upper space from a position that becomes the X-axis negative direction and the Y-axis forward direction side with respect to the upper space of the liquid receiver 53R. Thereby, the gas supply pipe 538R can supply gas to the space above the liquid receiving part 53R which becomes the back of the nozzle unit 50 which moves at high speed, and becomes in a negative pressure state. Moreover, similarly to the gas supply pipe 538R, the gas supply pipe 538L is provided in the upper space of the liquid receiver 53L so as to have a symmetrical installation relationship. Thereby, 538L of gas supply pipes can supply gas to the space above 53 L of liquid receiving parts which become the back of the high speed moving nozzle unit 50, and are in a negative pressure state.

As another example, the nozzle unit 50R is located on the negative X-axis side of the liquid receiver 53R, on the negative axis of the Y-axis relative to the reciprocating space of the nozzle unit 50, and on the Z-axis direction. The gas supply pipe may be fixed to a position at which the height becomes equal to). In this case, the gas supply pipe discharges the gas into the upper space from a position where the upper portion of the liquid receiving part 53R becomes the X-axis negative direction and the Y-axis negative direction. Thereby, the said gas supply pipe can supply gas to the space above the liquid receiving part 53R which becomes the back of the nozzle unit 50 which moves at high speed, and becomes in a negative pressure state. In addition, another gas supply pipe is provided in the upper space of the liquid receiving part 53L so as to have a symmetrical installation relationship as in the gas supply pipe. Thereby, another gas supply pipe can supply gas to the space above 53 L of liquid receiving parts which become the back of the nozzle unit 50 moving at high speed, and are in a negative pressure state.

Moreover, you may provide the exhaust part 539 in the position which opposes the discharge port of the gas supply line in the said 2nd example through the upper space of the liquid receiving part 53. As shown in FIG. For example, as shown in FIG. 10, about the gas supply line 538R which discharges gas to the said upper space from the position which becomes the X-axis negative direction and the Y-axis positive direction side with respect to the upper space of the liquid receiving part 53R, the liquid receiving part The exhaust part 539R which sucks the gas of the said upper space is fixedly installed in the position which becomes a Y-axis negative direction side with respect to the upper space of 53R. As a result, a gas flow is formed through which the gas discharged from the gas supply pipe 538R is led to the exhaust portion 539R through the space above the liquid receiving portion 53R. Therefore, even if the droplet-formed coating liquid and mist-like coating liquid floating inside the liquid receiving part 53R float outward from the slit opening 533a, since the said coating liquid is attracted by the exhaust part 539R, the inside of the liquid receiving part 53R It is possible to prevent coating failure due to the floating coating liquid falling on the substrate P and adhering to the upper surface.

Moreover, in the above-mentioned 1st Embodiment and 2nd Embodiment, although the example which supplies the air pressurized and supplied from the exterior of the coating apparatus 1 to the back of the nozzle unit 50 which moves at high speed was used, You may supply another gas. For example, as long as it is a gas which does not affect the application | coating environment apply | coated to the board | substrate P, such as nitrogen, you may supply another gas. Moreover, in the coating device 1, in order to enable the high speed movement of the nozzles 52a-52c on the board | substrate P, a static pressure bearing (for example, between the guide member 511 and the nozzle unit 50), for example. Air static pressure bearings) may be provided. In this case, a part of the gas (for example, air or nitrogen) for the static pressure bearing supplied to the nozzle unit 50 may be discharged from the gas supply pipes 521L and 521R.

In addition, in the above-mentioned embodiment, although the slit opening part 533a was formed in the upper surface of the liquid receiving part 53, the opening part of another shape may be formed in the upper surface of the liquid receiving part 53. . For example, the form where the whole upper surface of the liquid receiving part 53 opened (that is, the shape without the upper plate member 533) may be sufficient. In this case, the downflow generation part 530 in 1st Embodiment forms local downflow with respect to the whole upper surface of the liquid receiving part 53. As shown in FIG.

Moreover, in above-mentioned embodiment, this invention is applicable also to the coating device 1 in which the liquid receiving part 53 which provided the porous member 534 in the box part 532 is provided. 11 is a side sectional view which shows the structural example of the liquid receiving part 53 in which the porous member 534 was provided in the box part 532. As shown in FIG.

As shown in FIG. 11, the plate-shaped porous member 534 is provided inside the box portion 532. The porous member 534 is made of a hard plate-shaped pole material having pores at a predetermined ratio. The porous member 534 is provided above the inside of the box portion 532 so as to cover all of the top surface openings of the box portion 532 without the top plate member 533. That is, a space inside the box portion 532 is formed below the porous member 534, and gas, coating liquid, and the like in the space are sucked from the suction port of the intake portion 536 in the box. Therefore, when the coating liquid containing an organic EL material is discharged on the upper surface of the porous member 534, the coating liquid is introduced into the space inside the box portion 532 through the pores formed in the porous member 534. It flows. The coating liquid flowing into the space is sucked from the suction port of the box suction part 536 and discharged to the outside of the coating device 1. Even if the porous member 534 is the coating apparatus 1 using the liquid receiving part 53 provided in the inside of the box part 532, the mist-like coating liquid blows up from the upper surface of the porous member 534, and board | substrate It goes without saying that the present invention is applicable in order to prevent adhesion to (P). In addition, when the porous member 534 uses the downflow generation part 530 in 1st Embodiment with respect to the liquid receiving part 53 provided in the box part 532 inside, as shown in FIG. A local down flow is formed with respect to the whole upper surface of the liquid receiving part 53 (that is, the whole upper surface of the porous member 534).

Moreover, in embodiment mentioned above, whenever the nozzle unit 50 linearly moves to an X-axis direction, the stage 21 is moved by a predetermined pitch in the Y-axis direction, and the nozzle unit 50 and the stage 21 of Although the relative positional relationship with respect to the said Y-axis direction is changing, this invention is not limited to this. For example, whenever the nozzle unit 50 moves linearly in the X-axis direction, the nozzle unit 50 moves in the Y-axis direction by a predetermined pitch (that is, the organic EL coating mechanism 5 moves in the Y-axis direction). The relative positional relationship of the nozzle unit 50 and the stage 21 with respect to the said Y-axis direction may be changed. In this case, the liquid receiver 53 moves with the organic EL coating mechanism 5 by a predetermined pitch in the Y-axis direction.

Moreover, in the above-mentioned embodiment, although the coating device 1 applied the coating liquid containing the organic electroluminescent material which forms a light emitting layer to the board | substrate P, the polymer organic electroluminescent material of red light emission, green light emission was used. Needless to say, the coating liquid containing the high molecular organic EL material and the high molecular organic EL material of blue light emission can be applied. In addition, when the coating apparatus 1 of this invention apply | coats the coating liquid containing other organic electroluminescent material, such as a hole transport layer material, a hole injection layer material, an electron carrying layer material, and an electron injection layer material, in addition to an organic light emitting layer material. Can also be used.

Specifically, when the coating device 1 in the above-described embodiment applies a coating liquid containing a high molecular organic EL material of red luminescence among red, green, and blue luminescence, the coating step is It is a process during manufacture of an organic EL device. When manufacturing an organic EL device, application of a hole injection layer material, application of a hole transport material (for example, PEDOT), application of an organic EL material of red light emission, application of an organic EL material of green light emission, application of an organic EL material of blue light emission Although there exist application | coating processes, such as an electron carrying material application | coating and an electron injection layer material application | coating, the coating apparatus of this invention can be used in any application | coating process.

In addition, red, green, and blue organic EL materials may be simultaneously discharged from the plurality of nozzles 52. In this case, a so-called stripe arrangement in which three colors of red, green, and blue are arranged is formed in one coating step.

In addition, the shape, number, installation position, etc. of each component of the coating device 1 mentioned above are only a simple example, It is needless to say that even if it is another shape, number, and installation position, this invention can be implement | achieved. none.

Moreover, in embodiment mentioned above, although the glass substrate was used as an example of a to-be-coated body, another member can also be made into a to-be-coated body. For example, the flexible board | substrate which consists of polyethylene terephthalate (PET), a polycarbonate (PC), etc. may be used as the to-be-coated body of the coating device 1. As shown in FIG.

Moreover, in the above-mentioned embodiment, although the manufacturing apparatus of the organic electroluminescence display which apply | coats the coating liquid etc. which contain an organic EL material as a coating liquid was demonstrated as an example, this invention is applicable also to another coating apparatus. For example, it is applicable also to the apparatus which apply | coats the fluorescent material used for manufacturing resist liquid, spin on glass (SOG) liquid, or PDP (plasma display panel). Moreover, it is applicable also to the apparatus which apply | coats the color material used for manufacturing the color filter comprised in a liquid crystal cell in order to color display a liquid crystal color display.

The coating apparatus and the coating method which concern on this invention can prevent that the coating liquid discharged out of a board | substrate affects the said board | substrate when apply | coating a coating liquid to a board | substrate, and apply | coats the coating liquid of a liquid column state to a board | substrate. It is useful as an apparatus or the like.

As mentioned above, although this invention was demonstrated in detail, the above-mentioned description is only the illustration of this invention in all the points, Comprising: It does not intend to limit the range. It goes without saying that various improvements and modifications can be made without departing from the scope of the present invention. It is understood that the scope of the present invention should be interpreted only by the claims. Moreover, it is understood that those skilled in the art can implement equivalent ranges based on description of this invention and technical common sense from description of specific embodiment of this invention. In addition, throughout this specification, a singular expression should be understood also including the concept of a plural form unless there is particular notice. Thus, the singular forms or adjectives are to be understood to include the concept of the plural unless specifically stated otherwise. In addition, it is to be understood that the terminology used in the present specification is used in the meaning commonly used in the art unless otherwise specified. However, unless otherwise defined, all jargon and technical terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this invention belongs. In case of conflict, the present specification (including definitions) will control.

Claims (16)

An application device for applying a coating liquid onto a substrate,
A nozzle for discharging the coating liquid from its tip;
A stage for placing the substrate on an upper surface thereof;
A nozzle moving mechanism for reciprocating the nozzle in a direction crossing the stage surface in a space on the stage;
A liquid receiving part receiving the coating liquid discharged out of the stage from the nozzle when the nozzle moving mechanism moves the nozzle while discharging the coating liquid from the nozzle to a position deviated from the stage along the crossing direction. Wow,
In a state in which the nozzle moving mechanism moves the nozzle while discharging the coating liquid from the nozzle onto the stage from a position on the liquid receiving part along at least the crossing direction, the nozzle moves in relation to the direction in which the nozzle moves. An application device comprising a gas supply mechanism for supplying a gas to a space to be behind the nozzle. The method according to claim 1,
The gas supply mechanism is configured to supply the gas locally from an upper side of the drip tray to the upper surface of the drip tray. The method according to claim 2,
The dripping portion has a slit-shaped opening parallel to the crossing direction at a position vertically downward from a distal end of the nozzle disposed at a position deviating from the stage along the crossing direction, and formed on the upper surface thereof. The coating liquid discharged from the nozzle through the opening is recovered,
The said gas supply mechanism supplies the said gas locally from the upper part of the said liquid receiving part to the said opening part of the said liquid receiving part. The method according to claim 1,
The said gas supply mechanism supplies the said gas toward the space which becomes the said back side, and a direction parallel to the upper surface of the said liquid receiving part. The method of claim 4,
The gas supply mechanism,
A first gas supply pipe for supplying the gas in one direction along the crossing direction;
A second gas supply pipe for supplying the gas in the other direction along the crossing direction,
The drip tray,
A first liquid receiving part provided outside the stage in the one direction along the crossing direction;
A second liquid receiving part provided outside the stage in the other direction along the crossing direction,
The gas supply mechanism supplies the gas from the first gas supply pipe when at least the nozzle is moved from the position on the first liquid receiver to the stage, and at least from the position on the second liquid receiver. An application device for supplying the gas from the second gas supply pipe when the nozzle moves on a stage. The method according to claim 5,
The said 1st gas supply pipe | tube and the said 2nd gas supply pipe | tube are reciprocatingly moved to the said transverse direction with the said nozzle by the said nozzle moving mechanism. The method of claim 6,
The first gas supply pipe and the second gas supply pipe are fixedly installed such that a discharge port for discharging the gas is disposed at a position immediately above the reciprocating movement shaft of the nozzle moving along the crossing direction, respectively, An application device for reciprocating in the transverse direction with the nozzle by a nozzle moving mechanism. The method of claim 6,
Further comprising a control unit for controlling the supply operation of the gas by at least the gas supply mechanism,
The control unit supplies the gas through the first gas supply pipe, based on the intermediate point in the reciprocating movement, and supplies the gas from the second gas supply pipe. To abolish the supply of gas,
The control unit supplies the gas through the second gas supply pipe, and supplies the gas from the first gas supply pipe when the nozzle is located on the other direction side with respect to the intermediate point. Application device to abolish. The method according to any one of claims 4 to 8,
And an exhaust portion provided at a position opposed to the discharge port through which the gas supply mechanism discharges the gas and supplies the gas through the upper space of the liquid receiving portion, further comprising an exhaust portion for sucking the gas in the upper space. The method according to claim 1,
The gas supply mechanism is configured to supply the gas locally from above along an interface between an upper space of the liquid receiving part and an upper space of the stage. A coating method for applying a coating liquid discharged from a nozzle reciprocating in a direction transverse to the stage surface to a substrate placed on the stage upper surface in a space on a stage,
In a state in which the nozzle is moved while discharging the coating liquid from the nozzle onto the stage at least in the transverse direction from a position on the liquid receiving portion receiving the coating liquid discharged out of the stage from the nozzle. A coating method comprising the step of supplying a gas to a space that is behind the nozzle with respect to the direction in which the nozzle moves. The method of claim 11,
The said gas supply process is a coating method which locally supplies said gas from the upper side of the said liquid receiving part toward the upper surface of the said liquid receiving part. The method of claim 11,
The said gas supply process is a coating method which supplies the said gas toward the space which becomes the said back side, and a direction parallel to the upper surface of the said liquid receiving part. The method according to claim 13,
The step of supplying the gas,
When the nozzle is moved on the stage along the transverse direction from the position on the drip tray on one side, the gas is supplied in a first direction toward a space that becomes the rear of the nozzle,
Supplying the gas in a second direction toward a space that becomes the rear side where the nozzle moves when the nozzle is moved on the stage along the transverse direction from the position on the drip tray on the other side,
The said 1st direction and the said 2nd direction are mutually opposite directions. The method according to claim 13,
And a step of sucking the gas in the upper space from a position where the step of supplying the gas opposes through the upper space of the liquid receiving part with respect to the position of supplying the gas. The method of claim 11,
The said gas supply process is a coating method which supplies the said gas locally from the upper side along the interface of the upper space of the said liquid receiving part and the upper space of the said stage.

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