KR20130096877A - The separation and recycling system for a perfluoro compounds - Google Patents

Abstract

PURPOSE: A separation and recycling system for a perfluorinated compound is provided to easily and gradually remove not only greenhouse gas but also all kinds of dusts and other gas with a pre-filter and a membrane separation filter and maximize process efficiency by being re-passed through a filter when a separation rate is low. CONSTITUTION: A separation and recycling system of a perfluorinated compound comprises: a first dry pump (2); a pre-filter (3); a membrane separation filter (4); a nitrogen recycle feed port (5); a perfluorinated compound recycle feed port (6); and a control unit (7). The control unit comprises: a first flow sensor (71) sensing the flow of perfluorinated compound gas which is supplied to an exhaust gas generation facility (1); a second flow sensor (72) which senses the flow of exhaust gas before reaching the first dry pump; a third flow sensor (73) sensing the flow of a nitrogen supply pipe (55); a fourth flow sensor (74) sensing a flow ejected to a flue gas exhaust part (37); a fifth flow sensor (75) sensing the flow of a nitrogen discharge part (43); a first branch pipeline (77) which is connected to an exhaust gas influx unit (33) of the pre-filter by a first branch valve (77a) after the first branch furnace passes the fourth flow sensor; a second branch pipeline (78) which is branched with a second branch valve (78a) after the second branch pipeline passes the fifth flow sensor and is re-flowed in the membrane separation filter; and a third branch pipeline which is branched by a third divergence valve (79a) after the third branch pipeline passes the sixth flow sensor and is re-flowed in a membrane separation filter (79).

Description

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a separation and recycling system for perfluorinated compounds,

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a separation and recycling system for perfluorinated compounds, and more particularly, to a process for separating and recycling a perfluorinated compound containing sulfur hexafluoride And to a system for separating and recycling perfluorinated compounds.

Recently, as climate and ecosystem changes due to global warming have become more prominent, there has been a growing interest in this issue, and interest in regulation of greenhouse gas emission, which is the main cause, is increasing worldwide.

)만을 떠올리게 되고 있지만 메탄(

), 아산화질소(

) 및 과불화화합물(perfluoro compounds)인 수소불화탄소(

)와, 과불화탄소(

) 및 육불화황(

) 등도 지구 온난화의 주요원인이 되고 있다.However, most people believe that greenhouse gases are carbon dioxide

), But methane (

), Nitrous oxide (

) And perfluoro compounds (hydrogen fluoride (

), And perfluorocarbon (

) And sulfur hexafluoride (

) Are also a major cause of global warming.

This means that the proportion of carbon dioxide used is 12.2% compared to that of carbon dioxide, which means that there is a considerable amount of emission, and it means that the main industry of Korea including semiconductor, display, LED, The percentage of the perfluorinated compounds emitted by the related industries is 4.4%, which is also very high.

)과 육불화실리콘(

) 등을 배출하게 된다.Particularly, in order to form a uniform pattern on the substrate, the etching process in which sulfur hexafluoride is used to generate F- ions by using a plasma facility and to react with the insulator to etch the substrate,

) And silicon hexafluoride (

And so on.

)로 코팅된 코팅층을 제거하기 위한 것으로 주로

가스를 사용하는데 이때 분진,

,

,

등을 배출하게 된다.In addition, the CVD chamber cleaning process uses an insulator (

To remove the coating layer

Gas is used, in which dust,

,

,

And the like.

Various gases including these dusts are mixed with a large amount of nitrogen for the protection of the pump and the equipment, then sucked into the dry pump, and sent to a post-treatment facility where mostly gas scrubber is installed.

However, current gas scrubber technology has a method of removing at high temperature by electricity and fuel, a chemical treatment method, and a plasma treatment method, but there are problems such as high operation cost, large capacity treatment and low treatment efficiency .

) 계열의 온실가스에 대한 규제가 증가하면서 국가에서 특정 가스를 배출하는 시설에 대한 규제가 점차 강화되는 상황에서 보다 효율적으로 이를 제거하고 또 재활용할 수 있는 기술의 개발이 필요한 상황이다.
However, non-carbon dioxide

), There is a need to develop technologies that can remove and recycle more efficiently in a situation where the regulations on facilities that emit specific gases are gradually strengthened.

(Patent Document 1) Korean Patent Registration No. 10-0271694-0000 (Aug. 18, 2000) (Patent Document 2) Korean Patent Laid-Open No. 10-2009-0113360 (October 30, 2009) (Patent Document 3) Korean Patent Registration No. 10-0509304-0000 (Aug. 11, 2005) (Patent Document 4) Korean Patent Registration No. 10-0319783-0000 (December 21, 2001) (Patent Document 5) Korean Patent Registration No. 10-0806011-0000 (February 14, 2008) (Patent Document 6) Korean Patent Registration No. 10-0634173-0000 (October 09, 2006)

SUMMARY OF THE INVENTION The present invention has been developed in order to solve the above problems, and its object is to provide a system for separating and recycling a perfluorinated compound capable of easily separating and removing various gases and dusts including perfluorinated compounds produced in the electronics industry To develop.

It also aims to develop a system for separating and recycling perfluorocompounds, which allows separation and re-treatment of sulfur hexafluoride and nitrogen in flue-gas.

Another object of the present invention is to develop a separation and recycling system for perfluorinated compounds capable of enhancing the separation efficiency of flue gas.

In order to accomplish the above object, the present invention provides a separation and recycling system for a perfluorinated compound for treating a gas containing dust generated in an exhaust gas generating facility using a perfluorinated compound such as a dry etching process and a CVD cleaning chamber ;

A first dry pump for sucking an exhaust gas generated in at least one flue gas generating facility;

A first chamber, a water filling the lower portion of the first chamber, an exhaust gas inlet through which the exhaust gas sucked by the first dry pump flows directly above the water surface of the water, and an exhaust gas flowing into the exhaust gas inlet, A plurality of water spray nozzles for spraying water onto the upper portion of the alkaline adsorbent layer and a water adsorption filter formed on the water spray nozzles and a water adsorption filter A pretreatment filter having an exhaust gas discharge portion formed as an upper portion of the pretreatment filter;

A plurality of separation holes having a diameter of 3 to 4 angstroms are formed in at least one of the first chamber, the second chamber, and the second chamber, and the exhaust gas flowing through the pre-processing filter is introduced, A membrane separation filter which passes through the nitrogen discharge unit and does not allow the sulfur hexafluoride to pass through the discharge port and discharges it to the hexafluoride discharge unit;

A second dry pump for sucking nitrogen discharged to the nitrogen discharge portion, a nitrogen discharge pipe for discharging nitrogen into the atmosphere, a nitrogen tank filled with nitrogen, and a re-supply portion for supplying nitrogen from the second dry pump to the tank A nitrogen recycle supply unit comprising a pipe and a nitrogen supply pipe for supplying nitrogen from the nitrogen tank to the first dry pump,

A sulfur hexafluoride tank filled with sulfur hexafluoride discharged to the sulfur hexafluoride discharge unit and a sulfur hexafluoride sulfur supply pipe configured to supply sulfur hexafluoride to at least one flue gas generating unit;

A second flow rate sensor for sensing a flow rate of the exhaust gas before reaching the first dry pump, a second flow rate sensor for detecting a flow rate of the exhaust gas before reaching the first dry pump, A fifth flow sensor for sensing a flow rate of the nitrogen discharge portion, a sixth flow rate sensor for sensing a flow rate of the sulfur hexafluoride discharge portion, and a third flow rate sensor for sensing a flow rate of the sulfur hexafluoride discharge portion. A first branch pipe branched to the exhaust gas inlet of the pretreatment filter by a first branch valve after passing through the fourth flow sensor, and a second branch valve branched by a second branch valve after passing through the fifth flow sensor, And a third branch pipe branching by the third branch valve after the sixth flow sensor and being re-introduced into the membrane separation filter. It characterized by consisting of a control unit for.

In addition, the control unit may be configured such that the flow rate of the fourth flow rate sensor is the second flow rate sensor, the flow rate of the fifth flow rate sensor is the third flow rate sensor, and the flow rate of the sixth flow rate sensor is 90% And the first to third branch valves are configured to open the first to third branch pipes, respectively.

As described above, according to the present invention, various dusts and other gases as well as greenhouse gases, which are the main cause of greenhouse gases, can be removed step by step by means of a pretreatment filter and a membrane separation filter, thereby dramatically reducing air pollution and greenhouse gas emission There is an effect that can be.

In addition, sulfur hexafluoride can be separated by nitrogen and a membrane separation filter, and then recycled and used in an exhaust gas generating facility, thereby reducing operating costs and reusing raw materials.

In addition, when the separation rate is low by the control unit, it is filtered again, thereby maximizing the processing efficiency.

FIG. 1 is a conceptual diagram according to an embodiment of the present invention.
2 is a conceptual diagram illustrating a configuration of a control unit according to an embodiment of the present invention.
3 is a conceptual view showing a membrane separation filter according to an embodiment of the present invention.
4 is a conceptual diagram illustrating the opening of a first branch valve according to an embodiment of the present invention;
5 is a conceptual diagram illustrating the opening of a second branch valve according to an embodiment of the present invention.
6 is a conceptual diagram illustrating the opening of a third branch valve according to an embodiment of the present invention.

Accordingly, the configuration of the present invention will be described in detail with reference to the accompanying drawings so that those skilled in the art can easily understand and reproduce.

FIG. 1 is a conceptual diagram according to an embodiment of the present invention. FIG. 2 is a conceptual diagram illustrating a configuration of a control unit according to an embodiment of the present invention. FIG. 3 is a conceptual view illustrating a membrane separation filter according to an embodiment of the present invention. A system for separating and recycling a perfluorinated compound for treating a gas containing dust generated in an exhaust gas generating facility (1) using a perfluorinated compound such as a dry etching process and a CVD cleaning chamber;

The present application includes a first dry pump 2 for sucking flue gas generated in one or more flue gas generating facilities 1.

), 프로메튬(PM)과, 사불화실리콘(

)과, 산소(

)과,

및 각종 분진 등이 배출된다.At this time, the flue gas refers to the gas to be discharged. In the dry etching process, sulfur hexafluoride

), Promethium (PM), silicon tetrafluoride (

), Oxygen (

)and,

And various dusts are discharged.

Since various gases and dusts including the perfluorinated compound have a property of rapidly corroding each component of the first dry pump 2, nitrogen is mixed by the nitrogen recycle supplying unit 5 described later to prevent the apparatus from being damaged Composition is essential.

The nitrogen-mixed exhaust gas is filled in the first chamber 31, the water 32 filled in the lower portion of the first chamber 31, and the first dry pump 2 directly above the water surface of the water 32. The exhaust gas inlet 33 through which the sucked exhaust gas is introduced, the alkaline adsorbent layer 34 allowing the exhaust gas introduced into the exhaust gas inlet 33 to rise, and a portion of the water filled in the lower portion are introduced into the alkaline property. A plurality of water spray nozzles 35 for spraying water 32 onto the adsorbent layer 34, a water adsorption filter 36 and the water adsorption filter 36 formed on the water spray nozzles 35. Pass through the pre-treatment filter (3) consisting of the exhaust gas discharge portion 37 formed in the upper portion of the).

)와 육불화황(

)을 제외한 프로메튬(PM)과, 사불화실리콘(

)과, 산소(

)과,

및 각종 분진을 흡착시키는 것으로 최초 배가스가 산성을 띄고 있으므로 이를 정화하고 마지막 수분 흡착필터(36)에서 최종적으로 수분와 함께 미세 분진이 흡착을 하게 되면 최종적으로 질소(

)와 육불화황(

)만 남게 된다.
The pretreatment filter 3 is a wet filter as nitrogen (

) And sulfur hexafluoride (

(PM) except for silicon tetrafluoride (PM) and silicon tetrafluoride

), Oxygen (

)and,

And the first flue gas is acidic by adsorbing various dusts, and after purifying them, the final moisture adsorption filter 36 finally adsorbs the fine dust together with the moisture, and finally nitrogen (

) And sulfur hexafluoride (

).

)와 육불화황(

)은 제2 챔버(41)와, 상기 제2 챔버(41) 내부에 적어도 하나 이상 형성되어 3~4 옴스트롬(Å)의 직경을 가진 다수의 분리홀(42)이 형성되고 상기 전처리 필터(3)를 거친 배가스가 유입되어 질소는 상기 분리홀(42)을 통과하여 질소 배출부(43)로 배출되고 육불화황은 통과하지 못하여 육불화황 배출부(44)로 배출하여 연소시키도록하는 막분리 필터(4)를 거치게 된다.Such nitrogen (

) And sulfur hexafluoride (

A plurality of separation holes 42 having a diameter of 3 to 4 angstroms are formed in the second chamber 41 and at least one or more separation holes 42 are formed in the second chamber 41, 3 is introduced into the nitrogen hexafluoride discharge unit 44 so that nitrogen flows into the nitrogen discharge unit 43 through the separation hole 42 and does not pass through the hexafluoride discharge unit 44, And then passes through the separation filter 4.

The membrane separation filter (4) is a filter using the size of the particles in the case of nitrogen particle size 3 ohms (Å) and in the case of sulfur hexafluoride (5 ohms) to exit the separation hole 42 only nitrogen It is a structure to make it possible.

Omstrom (Å) refers to the length of 0.1 nanometers.

In the case of sulfur hexafluoride, when it is burned by a burn-WET scrubber or burn scrubber with high efficiency using burning properties, the removal efficiency is remarkably improved as the sulfur hexafluoride concentration is high.

A second dry pump 51 for sucking nitrogen discharged to the nitrogen discharge portion 43 in the case of separated nitrogen, a nitrogen discharge pipe 52 for discharging nitrogen into the atmosphere, and a nitrogen tank A supply pipe 54 for supplying nitrogen from the second dry pump 51 to the tank 53 and a supply pipe 54 for supplying nitrogen from the nitrogen tank 53 to the first dry pump 2, The nitrogen recycle supply unit 5 is constituted by a nitrogen supply pipe 55 for circulating the nitrogen gas. The nitrogen gas can be discharged or recycled selectively because the gas is completely irrespective of the discharge into the atmosphere.

In addition, the sulfur hexafluoride supply pipe (62) for supplying sulfur hexafluoride to the sulfur hexafluoride tank 61 is filled with the sulfur hexafluoride discharged to the sulfur hexafluoride discharge unit 44, the one or more flue gas generating facilities (62) The structure of the sulfur hexafluoride recycling supply unit (6) consisting of) is connected to a system for separating perfluoro compounds from sulfur hexafluoride gas mainly used in the nicking process to store and recycle high-purity sulfur hexafluoride gas. The solution is presented.

At this time, the sulfur hexafluoride tank (61) is shown in the form of being directly connected to the sulfur hexafluoride supply pipe (62), but this may be supplied by direct piping and supplied to each industrial site in a separate storage facility using a vehicle or the like. It is presented a flow.

Here, the present invention provides a method for controlling the flow rate of exhaust gas, comprising the steps of: detecting a flow rate of sulfur hexafluoride gas to be supplied to the flue gas generating facility; detecting a flow rate of the flue gas before reaching the first dry pump; A third flow rate sensor 73 for sensing the flow rate of the nitrogen supply pipe 55 and a fourth flow rate sensor 74 for sensing the flow rate discharged to the exhaust gas discharge port 37 A fifth flow sensor 75 for sensing the flow rate of the nitrogen discharge portion 43 and a sixth flow rate sensor 76 for sensing the flow rate of the hexafluoride discharge portion 44, A first branch passage 77 connected to the exhaust gas inlet 33 of the pretreatment filter 3 by the first branch valve 77a after passing through the flow sensor 74, 75), then branched by the second branch valve (78a) and re-introduced into the membrane separation filter (4), and a third branch passage (78) after passing through the sixth flow sensor minute The control section 7 including the third branch tractor 79 that branches off by the valve 79a and re-enters the membrane separation filter 4 is configured to control the components separated in each step to maximize efficiency Respectively.

The detailed operation of the control unit 7 will be described in detail with reference to the drawings.

4 is a conceptual diagram illustrating the opening of the first branch valve according to an embodiment of the present invention. The control unit 7 determines whether the flow rate of the fourth flow rate sensor 74 is lower than that of the second flow rate sensor 72 And the first branch valve 77a is opened to the first branch passage 77 when 90% or more of the electrons are present.

)과, 산소(

)과,

및 각종 분진이 10% 이하로 제거되었다는 의미와 동시에 막분리 필터(4)로 유입되는 배가스가 질소(

)와 육불화황(

) 만이 아니라 다른 물질도 많이 포함되었음을 의미하는 것이라고 할 수 있다.The meaning of 90% in the above embodiment is that in the pretreatment filter 3,

), Oxygen (

)and,

And that various dusts are removed by 10% or less, and that the exhaust gas flowing into the membrane separation filter 4 is nitrogen

) And sulfur hexafluoride (

) But also that it contains a lot of other substances.

)와 육불화황(

)만으로 이루어진 배가스가 상기 막분리 필터(4)로 유입되어 처리 효율을 높일 수 있도록 하기 위한 실시 예이며, 상기 제1 분기밸브(77a)는 3상밸브이다.
Therefore, high purity nitrogen (

) And sulfur hexafluoride (

) Is introduced into the membrane separation filter 4 to increase the treatment efficiency. The first branch valve 77a is a three-phase valve.

5 is a conceptual diagram illustrating the opening of the first branch valve according to the embodiment of the present invention. In the control unit 7, the fifth flow sensor 75 is connected to the third flow sensor 73, And the second branch valve 77a opens the second branch passage 77 when it is 90% or more.

When it is detected by the fifth flow rate sensor 75 that 90% or more of the amount of nitrogen supplied from the third flow sensor 73 is detected, it is judged that sulfur hexafluoride is contained and then passes through the membrane separation filter 4 again In the embodiment, the second branch valve 78a is a four-phase valve if a three-phase valve or a duct for discharging into the atmosphere is formed.

6 is a conceptual diagram illustrating the opening of the first branch valve according to the embodiment of the present invention. The control unit 7 determines whether or not the sixth flow sensor 76 is in contact with the first flow sensor 71, And the third branch valve 79 is opened from the third branch valve 79a when it is 90% or more.

Considering 90% or more of the amount of sulfur hexafluoride supplied from the fourth flow rate sensor 74, the sixth flow rate sensor 76 determines that nitrogen is contained and then passes through the membrane separation filter 4 again In the embodiment, the third branch valve 79a is a four-phase valve when a three-phase valve or a duct for burning sulfur hexafluoride is formed in the incinerator.

1: flue gas generator
2: first dry pump
3: pretreatment filter
31: first chamber 32: water
33: exhaust gas inlet 34: alkaline adsorbent layer
35 water spray nozzle 36 water adsorption filter
37: exhaust gas discharge unit
4: membrane separation filter
41: second chamber 42: separation hole
43: nitrogen outlet 44: sulfur hexafluoride outlet
5: nitrogen recycling supply unit
51: second dry pump 52: nitrogen discharge pipe
53: nitrogen tank 54: resupply piping
55: nitrogen supply piping
6: sulfur hexafluoride recycling supply unit
61: sulfur hexafluoride tank 62: sulfur hexafluoride supply piping
7:
71: first flow valve 72: second flow valve
73: third flow valve 74: fourth flow valve
75: fifth flow valve 76: sixth flow valve
77a: first branch valve 77: first branch pipe
78a: second branch valve 78: second branch pipe
79a: third branch valve 79: third branch pipe

Claims (2)

1. A system for separating and recycling a perfluorinated compound for treating a gas containing dust generated in an exhaust gas generating facility (1) using a perfluorinated compound such as a dry etching process and a CVD cleaning chamber;
A first dry pump (2) for sucking an exhaust gas generated in at least one flue gas generating facility (1);
A first chamber 31 and a second chamber 31. The first chamber 31 is filled with water 32 which is filled in the lower part of the first chamber 31 and the exhaust gas drawn into the first dry pump 2, An alkaline adsorbent layer 34 for allowing the exhaust gas flowing into the exhaust gas inlet 33 to rise and pass therethrough and a portion of the water filled in the lower portion of the alkaline adsorbent layer 34 A water adsorption filter 36 formed above the water injection nozzle 35 and an exhaust gas formed on the upper part of the moisture adsorption filter 36 A pretreatment filter 3 composed of a discharge portion 37;
A plurality of separation holes 42 having a diameter of 3 to 4 ohms are formed in the second chamber 41 and the preprocessing filter 3 is formed in the second chamber 41, And the nitrogen is discharged through the separation hole 42 to the nitrogen discharge portion 43 and the sulfur hexafluoride can not pass through the separation hole 42 to be discharged to the hexafluorosilane discharge portion 44, (4);
A second dry pump 51 for sucking nitrogen discharged to the nitrogen discharge portion 43, a nitrogen discharge pipe 52 for discharging nitrogen into the atmosphere, a nitrogen tank 53 for filling nitrogen, A nitrogen supply pipe 55 for supplying nitrogen to the first dry pump 2 from the nitrogen tank 53; a second supply pipe 54 for supplying nitrogen from the second dry pump 51 to the tank 53; A nitrogen recycle feeder 5 composed of a nitrogen feeder 5;
A sulfur hexafluoride tank 61 filled with sulfur hexafluoride discharged into the sulfur hexafluoride discharge section 44 and a sulfur hexafluoride supply pipe 62 supplying sulfur hexafluoride to the at least one flue gas generating facility 1 A sulfur hexafluoride recycling feeder 6 constituted by the sulfur hexafluoride recycle feeder 6;
A first flow rate sensor 71 for detecting a flow rate of sulfur hexafluoride gas supplied to the flue gas generating facility 1 and a second flow rate sensor 71 for detecting a flow rate of the flue gas before reaching the first dry pump 2, A third flow rate sensor 73 for sensing the flow rate of the nitrogen supply pipe 55, a fourth flow rate sensor 74 for sensing a flow rate of the exhaust gas discharged to the exhaust gas discharge unit 37, A sixth flow rate sensor 76 for sensing the flow rate of the hexafluorosilane discharge section 44 and a fourth flow rate sensor 76 for detecting the flow rate of the nitrogen discharge port 43, A first branch passage 77 connected to the exhaust gas inlet 33 of the pretreatment filter 3 by a first branch valve 77a after passing through the fifth flow sensor 75, A second branch passage 78 for branching by the second branch valve 78a to be reintroduced into the membrane separation filter 4 and a second branch passage 78 for passing the third branch valve 79a ) To And a control unit (7) including a third branch tractor (79) branching off the first branch tract and re-entering the membrane separation filter (4).
The control unit (7) according to claim 1, wherein the control unit (7) is configured such that the flow rate of the fourth flow rate sensor (74) is the second flow rate sensor (72), the fifth flow rate sensor (75) The flow sensor 76 has first to third branch valves 77a, 78a and 79a respectively connected to the first to third branch pipes 77a and 77b when the latter is 90% or more of the former as compared with the first flow rate sensor 71, , 78, 79). ≪ / RTI >

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