KR101410712B1 - The separation and recycling system for a perfluoro compounds - Google Patents

Abstract

The present invention relates to a system for separating and recycling perfluorinated compounds, and has been developed in order to effectively separate and recycle perfluorinated compounds containing sulfur hexafluoride generated in a semiconductor production process.
A system for separating and recycling a perfluorinated compound for treating a gas containing dust generated in an exhaust gas generating facility using a perfluorinated compound such as a dry etching process and a CVD cleaning chamber;
A first dry pump for sucking an exhaust gas generated in at least one flue gas generating facility;
A first chamber, a water filling the lower portion of the first chamber, an exhaust gas inlet through which the exhaust gas sucked by the first dry pump flows directly above the water surface of the water, and an exhaust gas flowing into the exhaust gas inlet, A plurality of water spray nozzles for spraying water onto the upper portion of the alkaline adsorbent layer and a water adsorption filter formed on the water spray nozzles and a water adsorption filter A pretreatment filter having an exhaust gas discharge portion formed as an upper portion of the pretreatment filter;
A plurality of separation holes having a diameter of 3 to 4 angstroms are formed in at least one of the first chamber, the second chamber, and the second chamber, and the exhaust gas flowing through the pre-processing filter is introduced, A membrane separation filter which passes through the nitrogen discharge unit and does not allow the sulfur hexafluoride to pass through the discharge port and discharges it to the hexafluoride discharge unit;
A second dry pump for sucking nitrogen discharged to the nitrogen discharge portion, a nitrogen discharge pipe for discharging nitrogen into the atmosphere, a nitrogen tank filled with nitrogen, and a re-supply portion for supplying nitrogen from the second dry pump to the tank And a nitrogen supply pipe for supplying nitrogen from the nitrogen tank to the first dry pump. The present invention also relates to a system for separating and recycling perfluorinated compounds.

Description

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a separation and recycling system for perfluorinated compounds,

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a separation and recycling system for perfluorinated compounds, and more particularly, to a process for separating and recycling a perfluorinated compound containing sulfur hexafluoride And to a system for separating and recycling perfluorinated compounds.

Recently, as climate and ecosystem changes due to global warming have become more prominent, there has been a growing interest in this issue, and interest in regulation of greenhouse gas emission, which is the main cause, is increasing worldwide.

)만을 떠올리게 되고 있지만 메탄(

), 아산화질소(

) 및 과불화화합물(perfluoro compounds)인 수소불화탄소(

)와, 과불화탄소(

) 및 육불화황(

) 등도 지구 온난화의 주요원인이 되고 있다.However, most people believe that greenhouse gases are carbon dioxide

), But methane (

), Nitrous oxide (

) And perfluoro compounds (hydrogen fluoride (

), And perfluorocarbon (

) And sulfur hexafluoride (

) Are also a major cause of global warming.

This means that the proportion of carbon dioxide used is 12.2% compared to that of carbon dioxide, which means that there is a considerable amount of emission, and it means that the main industry of Korea including semiconductor, display, LED, The percentage of the perfluorinated compounds emitted by the related industries is 4.4%, which is also very high.

)과 육불화실리콘(

) 등을 배출하게 된다.Particularly, in order to form a uniform pattern on the substrate, the etching process in which sulfur hexafluoride is used to generate F- ions by using a plasma facility and to react with the insulator to etch the substrate,

) And silicon hexafluoride (

And so on.

)로 코팅된 코팅층을 제거하기 위한 것으로 주로

가스를 사용하는데 이때 분진,

,

,

등을 배출하게 된다.In addition, the CVD chamber cleaning process uses an insulator (

To remove the coating layer

Gas is used, in which dust,

,

,

And the like.

Various gases including these dusts are mixed with a large amount of nitrogen for the protection of the pump and the equipment, then sucked into the dry pump, and sent to a post-treatment facility where mostly gas scrubber is installed.

However, current gas scrubber technology has a method of removing at high temperature by electricity and fuel, a chemical treatment method, and a plasma treatment method, but there are problems such as high operation cost, large capacity treatment and low treatment efficiency .

) 계열의 온실가스에 대한 규제가 증가하면서 국가에서 특정 가스를 배출하는 시설에 대한 규제가 점차 강화되는 상황에서 보다 효율적으로 이를 제거하고 또 재활용할 수 있는 기술의 개발이 필요한 상황이다.
However, non-carbon dioxide

), There is a need to develop technologies that can remove and recycle more efficiently in a situation where the regulations on facilities that emit specific gases are gradually strengthened.

(Patent Document 1) Korean Patent Registration No. 10-0271694-0000 (Aug. 18, 2000) (Patent Document 2) Korean Patent Laid-Open No. 10-2009-0113360 (October 30, 2009) (Patent Document 3) Korean Patent Registration No. 10-0509304-0000 (Aug. 11, 2005) (Patent Document 4) Korean Patent Registration No. 10-0319783-0000 (December 21, 2001) (Patent Document 5) Korean Patent Registration No. 10-0806011-0000 (February 14, 2008) (Patent Document 6) Korean Patent Registration No. 10-0634173-0000 (October 09, 2006)

SUMMARY OF THE INVENTION The present invention has been developed in order to solve the above problems, and its object is to provide a system for separating and recycling a perfluorinated compound capable of easily separating and removing various gases and dusts including perfluorinated compounds produced in the electronics industry To develop.

It also aims to develop a system for separating and recycling perfluorocompounds, which allows separation and re-treatment of sulfur hexafluoride and nitrogen in flue-gas.

In order to accomplish the above object, the present invention provides a separation and recycling system for a perfluorinated compound for treating a gas containing dust generated in an exhaust gas generating facility using a perfluorinated compound such as a dry etching process and a CVD cleaning chamber ;

A first dry pump for sucking an exhaust gas generated in at least one flue gas generating facility;

A first chamber, a water filling the lower portion of the first chamber, an exhaust gas inlet through which the exhaust gas sucked by the first dry pump flows directly above the water surface of the water, and an exhaust gas flowing into the exhaust gas inlet, A plurality of water spray nozzles for spraying water onto the upper portion of the alkaline adsorbent layer and a water adsorption filter formed on the water spray nozzles and a water adsorption filter A pretreatment filter having an exhaust gas discharge portion formed as an upper portion of the pretreatment filter;

A plurality of separation holes having a diameter of 3 to 4 angstroms are formed in at least one of the first chamber, the second chamber, and the second chamber, and the exhaust gas flowing through the pre-processing filter is introduced, A membrane separation filter which passes through the nitrogen discharge unit and does not allow the sulfur hexafluoride to pass through the discharge port and discharges it to the hexafluoride discharge unit;

A second dry pump for sucking nitrogen discharged to the nitrogen discharge portion, a nitrogen discharge pipe for discharging nitrogen into the atmosphere, a nitrogen tank filled with nitrogen, and a re-supply portion for supplying nitrogen from the second dry pump to the tank And a nitrogen supply pipe connected to the nitrogen supply pipe for supplying nitrogen from the nitrogen tank to the first dry pump.

A sulfur hexafluoride sulfur tank filled with sulfur hexafluoride discharged to the sulfur hexafluoride discharge portion and a sulfur hexafluoride sulfur supply pipe constituted by a sulfur hexafluoride supply pipe supplying sulfur hexafluoride to at least one flue gas generating facility are additionally formed .

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As described above, according to the present invention, various dusts and other gases as well as greenhouse gases, which are the main cause of greenhouse gases, can be removed step by step by means of a pretreatment filter and a membrane separation filter, thereby dramatically reducing air pollution and greenhouse gas emission There is an effect that can be.

In addition, sulfur hexafluoride can be separated by nitrogen and a membrane separation filter, and then recycled and used in an exhaust gas generating facility, thereby reducing operating costs and reusing raw materials.

FIG. 1 is a conceptual diagram according to an embodiment of the present invention.
2 is a conceptual diagram illustrating a structure of a preprocessing filter according to an embodiment of the present invention.
3 is a conceptual diagram illustrating the structure of a membrane separation filter according to an embodiment of the present invention.
4 is a conceptual diagram according to another embodiment of the present invention.

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, exemplary embodiments of the present invention will be described in detail with reference to the accompanying drawings.

FIG. 1 is a conceptual diagram according to an embodiment of the present invention. FIG. 2 is a conceptual view illustrating the structure of a wet filter according to an embodiment of the present invention. FIG. 3 is a cross- A system for separating and recycling a perfluorinated compound for treating a gas containing dust generated in an exhaust gas generating facility 1 using or using a perfluorinated compound such as a dry etching process and a CVD cleaning chamber;

The present invention comprises a first dry pump (2) for sucking offgas generated in at least one flue gas generating facility (1).

), 프로메튬(PM)과, 사불화실리콘(

)과, 산소(

)과,

및 각종 분진 등이 배출된다.At this time, the flue gas refers to the gas to be discharged. In the dry etching process, sulfur hexafluoride

), Promethium (PM), silicon tetrafluoride (

), Oxygen (

)and,

And various dusts are discharged.

Since various gases and dusts including the perfluorinated compound have a property of rapidly corroding each component of the first dry pump 2, nitrogen is mixed by the nitrogen recycle supplying unit 5 described later to prevent the apparatus from being damaged Composition is essential.

The nitrogen-mixed flue gas flows through the first chamber 31, the water 32 filled in the lower portion of the first chamber 31, and the water 32 immediately above the surface of the water 32 from the first dry pump 2 An alkaline adsorbent layer 34 for allowing the flue gas introduced into the flue gas inlet portion 33 to rise and pass therethrough and a part of the water filled in the lower portion of the flue gas inlet portion 33, A plurality of water injection nozzles 35 for spraying the water 32 onto the upper portion of the adsorbent layer 34 and a water adsorption filter 36 and a water adsorption filter 36 And an exhaust gas discharging portion 37 formed at the upper portion of the exhaust gas purifying filter 3.

)와 육불화황(

)을 제외한 프로메튬(PM)과, 사불화실리콘(

)과, 산소(

)과,

및 각종 분진을 흡착시키는 것으로 최초 배가스가 산성을 띄고 있으므로 이를 정화하고 마지막 수분 흡착필터(36)에서 최종적으로 수분와 함께 미세 분진이 흡착을 하게 되면 최종적으로 질소(

)와 육불화황(

)만 남게 된다.
The pretreatment filter (3) is a wet filter composed of nitrogen

) And sulfur hexafluoride

(PM) except for silicon tetrafluoride (PM) and silicon tetrafluoride

), Oxygen (

)and,

And the first exhaust gas is acidic by adsorbing various kinds of dust. Therefore, when the fine dust is adsorbed together with moisture in the final water adsorption filter 36,

) And sulfur hexafluoride

).

)와 육불화황(

)은 제2 챔버(41)와, 상기 제2 챔버(41) 내부에 적어도 하나 이상 형성되어 3~4 옴스트롬(Å)의 직경을 가진 다수의 분리홀(42)이 형성되고 상기 전처리 필터(3)를 거친 배가스가 유입되어 질소는 상기 분리홀(42)을 통과하여 질소 배출부(43)로 배출되고 육불화황은 통과하지 못하여 육불화황 배출부(44)로 배출하여 연소시키도록하는 막분리 필터(4)를 거치게 된다.These nitrogen (

) And sulfur hexafluoride

A plurality of separation holes 42 having a diameter of 3 to 4 angstroms are formed in the second chamber 41 and at least one or more separation holes 42 are formed in the second chamber 41, 3 is introduced into the nitrogen hexafluoride discharge unit 44 so that nitrogen flows into the nitrogen discharge unit 43 through the separation hole 42 and does not pass through the hexafluoride discharge unit 44, And then passes through the separation filter 4.

The membrane separation filter 4 is a filter using the particle size, and has a particle size of 3 Å (Å) in the case of nitrogen and 5 Ω (Å) in the case of sulfur hexafluoride. Only nitrogen passes through the separation hole .

In this case, ohmsstrom (A) refers to a length of 0.1 nanometers.

In the case of sulfur hexafluoride, when it is burned by a burn-WET scrubber or burn scrubber with high efficiency using burning properties, the removal efficiency is remarkably improved as the sulfur hexafluoride concentration is high.

A second dry pump 51 for sucking nitrogen discharged to the nitrogen discharge portion 43 in the case of separated nitrogen, a nitrogen discharge pipe 52 for discharging nitrogen into the atmosphere, and a nitrogen tank A supply pipe 54 for supplying nitrogen from the second dry pump 51 to the tank 53 and a supply pipe 54 for supplying nitrogen from the nitrogen tank 53 to the first dry pump 2, The nitrogen recycle supply unit 5 is constituted by a nitrogen supply pipe 55 for circulating the nitrogen gas. The nitrogen gas can be discharged or recycled selectively because the gas is completely irrespective of the discharge into the atmosphere.

FIG. 4 is a conceptual diagram according to another embodiment of the present invention. FIG. 4 is a conceptual view showing another embodiment of the present invention, in which a hexafluoride sulfur tank 61 filled with sulfur hexafluoride discharged into the sulfur hexafluoride discharge section 44, A sulfur hexafluoride sulfur feed pipe 62 for supplying sulfur hexafluoride feed pipe 6 is additionally formed.

The above embodiments provide a method for storing and recycling high purity sulfur hexafluoride gas by connecting the sulfur hexafluoride gas used in the nicking process with a system for separating the perfluorinated compound.

In this figure, the sulfur hexafluoride gas is directly supplied from the sulfur hexafluoride tank 61 to the sulfur hexafluoride supply pipe 62. However, this can be supplied by direct piping, This is an example of a flow.

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1: Flue gas generating facility
2: First dry pump
3: Pretreatment filter
3 ': PM filter 31: first chamber
32: Water 33: Flue gas inlet
34: Alkali adsorbent layer 35: Water spray nozzle
36: Moisture absorption filter 37: Flue gas exhaust part
4: membrane separation filter
41: second chamber 42: separation hole
43: Nitrogen discharge part 44: Sulfur hexafluoride discharge part
5: Nitrogen recycle supply part
51: second dry pump 52: nitrogen discharge pipe
53: Nitrogen tank 54: Re-supply piping
55: Nitrogen supply piping
6: Sulfur hexafluoride recycling supplier
61: sulfur hexafluoride tank 62: sulfur hexafluoride supply pipe

Claims (3)

delete 1. A system for separating and recycling a perfluorinated compound for treating a gas containing dust generated in an exhaust gas generating facility (1) using a perfluorinated compound such as a dry etching process and a CVD cleaning chamber;
A first dry pump (2) for sucking an exhaust gas generated in at least one flue gas generating facility (1);
A first chamber 31 and a second chamber 31. The first chamber 31 is filled with water 32 which is filled in the lower part of the first chamber 31 and the exhaust gas drawn into the first dry pump 2, An alkaline adsorbent layer 34 for allowing the exhaust gas flowing into the exhaust gas inlet 33 to rise and pass therethrough and a portion of the water filled in the lower portion of the alkaline adsorbent layer 34 A water adsorption filter 36 formed above the water injection nozzle 35 and an exhaust gas formed on the upper part of the moisture adsorption filter 36 A pretreatment filter 3 composed of a discharge portion 37;
A plurality of separation holes 42 having a diameter of 3 to 4 ohms are formed in the second chamber 41 and the preprocessing filter 3 is formed in the second chamber 41, And the nitrogen is discharged through the separation hole 42 to the nitrogen discharge portion 43 and the sulfur hexafluoride can not pass through the separation hole 42 to be discharged to the hexafluorosilane discharge portion 44, (4);
A second dry pump 51 for sucking nitrogen discharged to the nitrogen discharge portion 43, a nitrogen discharge pipe 52 for discharging nitrogen into the atmosphere, a nitrogen tank 53 for filling nitrogen, A nitrogen supply pipe 55 for supplying nitrogen to the first dry pump 2 from the nitrogen tank 53; a second supply pipe 54 for supplying nitrogen from the second dry pump 51 to the tank 53; A nitrogen recycle feeder 5 composed of a nitrogen feeder 5;
A sulfur hexafluoride tank 61 filled with sulfur hexafluoride discharged into the sulfur hexafluoride discharge section 44 and a sulfur hexafluoride supply pipe 62 supplying sulfur hexafluoride to the at least one flue gas generating facility 1 And a recycled sulfur hexafluoride feeder (6). delete

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