KR20130023144A - 연속 시스템에서 액체 레벨 조절 방법 및 장치 - Google Patents

연속 시스템에서 액체 레벨 조절 방법 및 장치 Download PDF

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Publication number
KR20130023144A
KR20130023144A KR1020120092845A KR20120092845A KR20130023144A KR 20130023144 A KR20130023144 A KR 20130023144A KR 1020120092845 A KR1020120092845 A KR 1020120092845A KR 20120092845 A KR20120092845 A KR 20120092845A KR 20130023144 A KR20130023144 A KR 20130023144A
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KR
South Korea
Prior art keywords
adjustment
value
liquid
setting value
level
Prior art date
Application number
KR1020120092845A
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English (en)
Korean (ko)
Inventor
마르쿠스 바이에르
Original Assignee
레나 게엠베하
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Application filed by 레나 게엠베하 filed Critical 레나 게엠베하
Publication of KR20130023144A publication Critical patent/KR20130023144A/ko

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    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D7/00—Control of flow
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D9/00—Level control, e.g. controlling quantity of material stored in vessel
    • G05D9/12—Level control, e.g. controlling quantity of material stored in vessel characterised by the use of electric means

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Automation & Control Theory (AREA)
  • Weting (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
KR1020120092845A 2011-08-25 2012-08-24 연속 시스템에서 액체 레벨 조절 방법 및 장치 KR20130023144A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102011111175.5A DE102011111175B4 (de) 2011-08-25 2011-08-25 Verfahren und Vorrichtung zur Flüssigkeits-Niveauregelung bei Durchlaufanlagen
DE102011111175.5 2011-08-25

Publications (1)

Publication Number Publication Date
KR20130023144A true KR20130023144A (ko) 2013-03-07

Family

ID=47665056

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020120092845A KR20130023144A (ko) 2011-08-25 2012-08-24 연속 시스템에서 액체 레벨 조절 방법 및 장치

Country Status (4)

Country Link
KR (1) KR20130023144A (de)
CN (1) CN102955480A (de)
DE (1) DE102011111175B4 (de)
TW (1) TW201320178A (de)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104091768B (zh) * 2014-07-17 2016-08-24 中利腾晖光伏科技有限公司 一种监控和调节刻蚀槽液位稳定性的方法
EP3875765A1 (de) * 2020-03-02 2021-09-08 Husqvarna Ab Tauchpumpe mit berührungsempfindlichen sensoren

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7943526B2 (en) 2004-03-22 2011-05-17 Rena Sondermaschinen Gmbh Process for the wet-chemical treatment of one side of silicon wafers
CN101472833A (zh) * 2006-02-15 2009-07-01 液化空气电子美国有限公司 用于精确控制液体分配的方法和设备
CN100541730C (zh) * 2007-07-16 2009-09-16 无锡尚德太阳能电力有限公司 半导体基板表面的化学处理方法及其装置
DE102008026199B3 (de) * 2008-05-30 2009-10-08 Rena Gmbh Vorrichtung und Verfahren zur elektrischen Kontaktierung von ebenem Gut in Durchlaufanlagen
US20100055398A1 (en) * 2008-08-29 2010-03-04 Evergreen Solar, Inc. Single-Sided Textured Sheet Wafer

Also Published As

Publication number Publication date
DE102011111175A1 (de) 2013-02-28
TW201320178A (zh) 2013-05-16
DE102011111175B4 (de) 2014-01-09
CN102955480A (zh) 2013-03-06

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