KR20120107100A - 고온 적용례 및 램프용 옥사이드 다층 - Google Patents
고온 적용례 및 램프용 옥사이드 다층 Download PDFInfo
- Publication number
- KR20120107100A KR20120107100A KR1020127016574A KR20127016574A KR20120107100A KR 20120107100 A KR20120107100 A KR 20120107100A KR 1020127016574 A KR1020127016574 A KR 1020127016574A KR 20127016574 A KR20127016574 A KR 20127016574A KR 20120107100 A KR20120107100 A KR 20120107100A
- Authority
- KR
- South Korea
- Prior art keywords
- coating
- layer
- lamp
- envelope
- light
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 238000000576 coating method Methods 0.000 claims abstract description 81
- 239000011248 coating agent Substances 0.000 claims abstract description 63
- 230000003287 optical effect Effects 0.000 claims abstract description 43
- 238000000034 method Methods 0.000 claims description 35
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 24
- 238000001228 spectrum Methods 0.000 claims description 14
- 239000002184 metal Substances 0.000 claims description 12
- 229910052751 metal Inorganic materials 0.000 claims description 11
- 238000002834 transmittance Methods 0.000 claims description 9
- 239000010453 quartz Substances 0.000 claims description 8
- 230000005540 biological transmission Effects 0.000 claims description 6
- 239000011521 glass Substances 0.000 claims description 6
- 229910052736 halogen Inorganic materials 0.000 claims description 6
- 150000002367 halogens Chemical class 0.000 claims description 6
- 239000000919 ceramic Substances 0.000 claims description 4
- 230000015556 catabolic process Effects 0.000 claims description 3
- 238000006731 degradation reaction Methods 0.000 claims description 3
- 238000010891 electric arc Methods 0.000 claims description 3
- 239000005350 fused silica glass Substances 0.000 claims description 3
- 238000000137 annealing Methods 0.000 claims description 2
- 239000004020 conductor Substances 0.000 claims description 2
- 230000001747 exhibiting effect Effects 0.000 claims 1
- 239000000463 material Substances 0.000 abstract description 44
- 230000000704 physical effect Effects 0.000 abstract description 3
- 230000001427 coherent effect Effects 0.000 abstract description 2
- 238000012423 maintenance Methods 0.000 abstract 1
- 238000005229 chemical vapour deposition Methods 0.000 description 24
- 239000010955 niobium Substances 0.000 description 23
- 239000000758 substrate Substances 0.000 description 17
- 230000008569 process Effects 0.000 description 16
- 238000001755 magnetron sputter deposition Methods 0.000 description 11
- 230000000052 comparative effect Effects 0.000 description 9
- 239000007789 gas Substances 0.000 description 8
- 238000005240 physical vapour deposition Methods 0.000 description 8
- 235000012239 silicon dioxide Nutrition 0.000 description 8
- 239000000203 mixture Substances 0.000 description 7
- 238000004544 sputter deposition Methods 0.000 description 7
- 150000002739 metals Chemical class 0.000 description 6
- 239000002243 precursor Substances 0.000 description 6
- 150000001875 compounds Chemical class 0.000 description 5
- 238000004518 low pressure chemical vapour deposition Methods 0.000 description 5
- 239000000377 silicon dioxide Substances 0.000 description 5
- 238000000151 deposition Methods 0.000 description 4
- 238000001704 evaporation Methods 0.000 description 4
- 230000008020 evaporation Effects 0.000 description 4
- 239000010408 film Substances 0.000 description 4
- 229910044991 metal oxide Inorganic materials 0.000 description 4
- 150000004706 metal oxides Chemical class 0.000 description 4
- 229910052752 metalloid Inorganic materials 0.000 description 4
- 230000035699 permeability Effects 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- 230000032683 aging Effects 0.000 description 3
- 238000000277 atomic layer chemical vapour deposition Methods 0.000 description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 150000002738 metalloids Chemical class 0.000 description 3
- 238000000259 microwave plasma-assisted chemical vapour deposition Methods 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 238000000663 remote plasma-enhanced chemical vapour deposition Methods 0.000 description 3
- 229910052721 tungsten Inorganic materials 0.000 description 3
- 238000000927 vapour-phase epitaxy Methods 0.000 description 3
- 238000002441 X-ray diffraction Methods 0.000 description 2
- 238000000995 aerosol-assisted chemical vapour deposition Methods 0.000 description 2
- JNDMLEXHDPKVFC-UHFFFAOYSA-N aluminum;oxygen(2-);yttrium(3+) Chemical compound [O-2].[O-2].[O-2].[Al+3].[Y+3] JNDMLEXHDPKVFC-UHFFFAOYSA-N 0.000 description 2
- GZUXJHMPEANEGY-UHFFFAOYSA-N bromomethane Chemical compound BrC GZUXJHMPEANEGY-UHFFFAOYSA-N 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 238000005234 chemical deposition Methods 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000005336 cracking Methods 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000005566 electron beam evaporation Methods 0.000 description 2
- 239000011888 foil Substances 0.000 description 2
- 238000000608 laser ablation Methods 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- -1 metalloid fluoride Chemical class 0.000 description 2
- 238000001000 micrograph Methods 0.000 description 2
- 229910003455 mixed metal oxide Inorganic materials 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 2
- 238000001552 radio frequency sputter deposition Methods 0.000 description 2
- 238000001289 rapid thermal chemical vapour deposition Methods 0.000 description 2
- 238000005546 reactive sputtering Methods 0.000 description 2
- 239000006104 solid solution Substances 0.000 description 2
- 230000003595 spectral effect Effects 0.000 description 2
- 238000002207 thermal evaporation Methods 0.000 description 2
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 2
- 239000010937 tungsten Substances 0.000 description 2
- 238000000038 ultrahigh vacuum chemical vapour deposition Methods 0.000 description 2
- 229910019901 yttrium aluminum garnet Inorganic materials 0.000 description 2
- 235000014653 Carica parviflora Nutrition 0.000 description 1
- 241000243321 Cnidaria Species 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 239000000443 aerosol Substances 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 239000012300 argon atmosphere Substances 0.000 description 1
- 238000000149 argon plasma sintering Methods 0.000 description 1
- 230000033228 biological regulation Effects 0.000 description 1
- 238000000339 bright-field microscopy Methods 0.000 description 1
- 229910010293 ceramic material Inorganic materials 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 229910002026 crystalline silica Inorganic materials 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 239000008246 gaseous mixture Substances 0.000 description 1
- 230000014509 gene expression Effects 0.000 description 1
- 229910052735 hafnium Inorganic materials 0.000 description 1
- 150000002366 halogen compounds Chemical class 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000002365 hybrid physical--chemical vapour deposition Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 238000010849 ion bombardment Methods 0.000 description 1
- 229910052743 krypton Inorganic materials 0.000 description 1
- DNNSSWSSYDEUBZ-UHFFFAOYSA-N krypton atom Chemical compound [Kr] DNNSSWSSYDEUBZ-UHFFFAOYSA-N 0.000 description 1
- 239000012705 liquid precursor Substances 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 229910001092 metal group alloy Inorganic materials 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- 229940102396 methyl bromide Drugs 0.000 description 1
- 239000003607 modifier Substances 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 229910000484 niobium oxide Inorganic materials 0.000 description 1
- URLJKFSTXLNXLG-UHFFFAOYSA-N niobium(5+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Nb+5].[Nb+5] URLJKFSTXLNXLG-UHFFFAOYSA-N 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 239000013307 optical fiber Substances 0.000 description 1
- 239000012788 optical film Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 description 1
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 description 1
- 238000005381 potential energy Methods 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
- 239000011819 refractory material Substances 0.000 description 1
- 239000003870 refractory metal Substances 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- 229910001936 tantalum oxide Inorganic materials 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 238000002230 thermal chemical vapour deposition Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
Images
Classifications
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/28—Interference filters
- G02B5/281—Interference filters designed for the infrared light
- G02B5/282—Interference filters designed for the infrared light reflecting for infrared and transparent for visible light, e.g. heat reflectors, laser protection
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/28—Interference filters
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3417—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials all coatings being oxide coatings
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
- C04B35/495—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on vanadium, niobium, tantalum, molybdenum or tungsten oxides or solid solutions thereof with other oxides, e.g. vanadates, niobates, tantalates, molybdates or tungstates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/083—Oxides of refractory metals or yttrium
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/405—Oxides of refractory metals or yttrium
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/70—Properties of coatings
- C03C2217/73—Anti-reflective coatings with specific characteristics
- C03C2217/734—Anti-reflective coatings with specific characteristics comprising an alternation of high and low refractive indexes
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/02—Composition of constituents of the starting material or of secondary phases of the final product
- C04B2235/30—Constituents and secondary phases not being of a fibrous nature
- C04B2235/32—Metal oxides, mixed metal oxides, or oxide-forming salts thereof, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
- C04B2235/3231—Refractory metal oxides, their mixed metal oxides, or oxide-forming salts thereof
- C04B2235/3244—Zirconium oxides, zirconates, hafnium oxides, hafnates, or oxide-forming salts thereof
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/02—Composition of constituents of the starting material or of secondary phases of the final product
- C04B2235/30—Constituents and secondary phases not being of a fibrous nature
- C04B2235/32—Metal oxides, mixed metal oxides, or oxide-forming salts thereof, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
- C04B2235/3231—Refractory metal oxides, their mixed metal oxides, or oxide-forming salts thereof
- C04B2235/3251—Niobium oxides, niobates, tantalum oxides, tantalates, or oxide-forming salts thereof
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02T—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO TRANSPORTATION
- Y02T50/00—Aeronautics or air transport
- Y02T50/60—Efficient propulsion technologies, e.g. for aircraft
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physics & Mathematics (AREA)
- Ceramic Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Structural Engineering (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Manufacturing & Machinery (AREA)
- Inorganic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Optical Filters (AREA)
- Vessels And Coating Films For Discharge Lamps (AREA)
- Surface Treatment Of Glass (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US12/627,318 US8179030B2 (en) | 2009-11-30 | 2009-11-30 | Oxide multilayers for high temperature applications and lamps |
| US12/627,318 | 2009-11-30 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| KR20120107100A true KR20120107100A (ko) | 2012-09-28 |
Family
ID=43640618
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020127016574A Withdrawn KR20120107100A (ko) | 2009-11-30 | 2010-10-21 | 고온 적용례 및 램프용 옥사이드 다층 |
Country Status (10)
| Country | Link |
|---|---|
| US (1) | US8179030B2 (enExample) |
| EP (1) | EP2507657A1 (enExample) |
| JP (1) | JP2013512462A (enExample) |
| KR (1) | KR20120107100A (enExample) |
| CN (1) | CN102713696A (enExample) |
| BR (1) | BR112012012981A2 (enExample) |
| CA (1) | CA2782538A1 (enExample) |
| MX (1) | MX2012006236A (enExample) |
| TW (1) | TW201142374A (enExample) |
| WO (1) | WO2011066047A1 (enExample) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI557422B (zh) * | 2012-05-02 | 2016-11-11 | 鴻海精密工業股份有限公司 | 紫外線透射元件及光源裝置 |
| JP6279350B2 (ja) * | 2014-03-04 | 2018-02-14 | スタンレー電気株式会社 | 可視光源 |
| WO2017218433A1 (en) * | 2016-06-13 | 2017-12-21 | Viavi Solutions Inc. | Protected item including a protective coating |
| US11298918B2 (en) | 2016-09-30 | 2022-04-12 | 3M Innovative Properties Company | Visibly transparent broadband infrared mirror films having fluoropolymers and 7:1:1:7:1:1 layer thickness ratio |
| DE102022117697A1 (de) | 2022-07-15 | 2024-01-18 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung eingetragener Verein | Verglasungsscheibe sowie Verfahren zur Herstellung einer solchen Verglasungsscheibe |
Family Cites Families (37)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4949005A (en) | 1988-11-14 | 1990-08-14 | General Electric Company | Tantala-silica interference filters and lamps using same |
| US5143445A (en) | 1989-10-10 | 1992-09-01 | General Electric Company | Glass reflectors lpcvd coated with optical interference film |
| US5422534A (en) | 1992-11-18 | 1995-06-06 | General Electric Company | Tantala-silica interference filters and lamps using same |
| US5412274A (en) | 1992-12-17 | 1995-05-02 | General Electric Company | Diffusely reflecting optical interference filters and articles including lamps reflectors and lenses |
| US5627426A (en) * | 1993-03-22 | 1997-05-06 | General Electric Company | Lamp with IR reflecting film and light-scattering coating |
| DE4407067C2 (de) | 1994-03-03 | 2003-06-18 | Unaxis Balzers Ag | Dielektrisches Interferenz-Filtersystem, LCD-Anzeige und CCD-Anordnung sowie Verfahren zur Herstellung eines dielektrischen Interferenz-Filtersystems |
| JPH08273415A (ja) * | 1996-05-07 | 1996-10-18 | Toshiba Lighting & Technol Corp | 反射鏡付光源 |
| DE19645043A1 (de) * | 1996-10-31 | 1998-05-07 | Inst Neue Mat Gemein Gmbh | Verfahren zur Herstellung von Substraten mit Hochtemperatur- und UV-stabilen, transparenten, farbigen Beschichtungen |
| FR2759360B1 (fr) * | 1997-02-10 | 1999-03-05 | Commissariat Energie Atomique | Materiau polymerique inorganique a base d'oxyde de tantale notamment a indice de refraction eleve, mecaniquement resistant a l'abrasion, son procede de fabrication et materiau optique comprenant ce materiau |
| US6049169A (en) * | 1998-04-08 | 2000-04-11 | Philips Electronics North America Corp. | Electric lamp having optical interference filter of alternating layers of SiO2 and Nb2 O5 --Ta2 O5 |
| US6356020B1 (en) * | 1998-07-06 | 2002-03-12 | U.S. Philips Corporation | Electric lamp with optical interference coating |
| JP4185195B2 (ja) | 1998-09-21 | 2008-11-26 | スタンレー電気株式会社 | 赤外線反射被膜付き光学物品及び電球 |
| US6441541B1 (en) | 1999-08-25 | 2002-08-27 | General Electric Company | Optical interference coatings and lamps using same |
| JP4109451B2 (ja) * | 1999-10-14 | 2008-07-02 | エージーシー フラット グラス ユーロップ エスエー | 窓ガラス |
| US7513815B2 (en) * | 1999-12-23 | 2009-04-07 | General Electric Company | Optimal silicon dioxide protection layer thickness for silver lamp reflector |
| JP2003522382A (ja) * | 2000-02-03 | 2003-07-22 | コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ | 電球および干渉薄膜 |
| CN1278378C (zh) * | 2000-06-16 | 2006-10-04 | 皇家菲利浦电子有限公司 | 包括光吸收介质的电灯 |
| US6494997B1 (en) | 2000-08-18 | 2002-12-17 | General Electric Company | Radio frequency magnetron sputtering for lighting applications |
| US6710520B1 (en) | 2000-08-24 | 2004-03-23 | General Electric Company | Stress relief mechanism for optical interference coatings |
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-
2009
- 2009-11-30 US US12/627,318 patent/US8179030B2/en not_active Expired - Fee Related
-
2010
- 2010-10-21 WO PCT/US2010/053547 patent/WO2011066047A1/en not_active Ceased
- 2010-10-21 CN CN2010800627342A patent/CN102713696A/zh active Pending
- 2010-10-21 KR KR1020127016574A patent/KR20120107100A/ko not_active Withdrawn
- 2010-10-21 BR BR112012012981A patent/BR112012012981A2/pt not_active IP Right Cessation
- 2010-10-21 CA CA2782538A patent/CA2782538A1/en not_active Abandoned
- 2010-10-21 MX MX2012006236A patent/MX2012006236A/es not_active Application Discontinuation
- 2010-10-21 JP JP2012541082A patent/JP2013512462A/ja active Pending
- 2010-10-21 EP EP10770693A patent/EP2507657A1/en not_active Withdrawn
- 2010-11-30 TW TW099141590A patent/TW201142374A/zh unknown
Also Published As
| Publication number | Publication date |
|---|---|
| CN102713696A (zh) | 2012-10-03 |
| JP2013512462A (ja) | 2013-04-11 |
| EP2507657A1 (en) | 2012-10-10 |
| MX2012006236A (es) | 2012-12-05 |
| TW201142374A (en) | 2011-12-01 |
| CA2782538A1 (en) | 2011-06-03 |
| US8179030B2 (en) | 2012-05-15 |
| WO2011066047A1 (en) | 2011-06-03 |
| BR112012012981A2 (pt) | 2017-03-28 |
| US20110127899A1 (en) | 2011-06-02 |
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