KR20120093943A - 고전압 차폐 장치 - Google Patents

고전압 차폐 장치 Download PDF

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Publication number
KR20120093943A
KR20120093943A KR1020127011941A KR20127011941A KR20120093943A KR 20120093943 A KR20120093943 A KR 20120093943A KR 1020127011941 A KR1020127011941 A KR 1020127011941A KR 20127011941 A KR20127011941 A KR 20127011941A KR 20120093943 A KR20120093943 A KR 20120093943A
Authority
KR
South Korea
Prior art keywords
high voltage
metal
metal portion
shielding device
charged particle
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
KR1020127011941A
Other languages
English (en)
Korean (ko)
Inventor
요한 요오스트 코닝
스티옌 윌렘 헤르만 스테인브링크
노르만 헨드리쿠스 루돌프 바르스
바르트 쉬퍼
Original Assignee
마퍼 리쏘그라피 아이피 비.브이.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 마퍼 리쏘그라피 아이피 비.브이. filed Critical 마퍼 리쏘그라피 아이피 비.브이.
Publication of KR20120093943A publication Critical patent/KR20120093943A/ko
Withdrawn legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K9/00—Screening of apparatus or components against electric or magnetic fields
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/02—Details
    • H01J2237/0203—Protection arrangements
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/03—Mounting, supporting, spacing or insulating electrodes
    • H01J2237/038—Insulating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Electron Beam Exposure (AREA)
  • Shielding Devices Or Components To Electric Or Magnetic Fields (AREA)
KR1020127011941A 2009-10-09 2010-10-05 고전압 차폐 장치 Withdrawn KR20120093943A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US25033809P 2009-10-09 2009-10-09
US61/250,338 2009-10-09

Publications (1)

Publication Number Publication Date
KR20120093943A true KR20120093943A (ko) 2012-08-23

Family

ID=43618185

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020127011941A Withdrawn KR20120093943A (ko) 2009-10-09 2010-10-05 고전압 차폐 장치

Country Status (7)

Country Link
US (1) US8624478B2 (cg-RX-API-DMAC10.html)
EP (1) EP2486580A2 (cg-RX-API-DMAC10.html)
JP (1) JP5599889B2 (cg-RX-API-DMAC10.html)
KR (1) KR20120093943A (cg-RX-API-DMAC10.html)
CN (1) CN102687231A (cg-RX-API-DMAC10.html)
TW (1) TW201135792A (cg-RX-API-DMAC10.html)
WO (1) WO2011043657A2 (cg-RX-API-DMAC10.html)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL2006868C2 (en) 2011-05-30 2012-12-03 Mapper Lithography Ip Bv Charged particle multi-beamlet apparatus.
US11348756B2 (en) 2012-05-14 2022-05-31 Asml Netherlands B.V. Aberration correction in charged particle system
NL2010797C2 (en) 2012-05-14 2014-08-21 Mapper Lithography Ip Bv Charged particle lithography system and beam generator.
US10586625B2 (en) 2012-05-14 2020-03-10 Asml Netherlands B.V. Vacuum chamber arrangement for charged particle beam generator
CN107484322B (zh) * 2017-07-10 2023-11-10 中国原子能科学研究院 一种高压屏蔽仓

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3416207A (en) * 1965-10-22 1968-12-17 Maida Dev Company Method of manufacturing a capacitor
DE2238594A1 (de) * 1972-08-05 1974-02-21 Stettner & Co Keramischer mehrfach-durchfuehrungskondensator
JPS54788A (en) 1977-06-05 1979-01-06 Kouenerugii Butsurigaku Kenkiy Heatable vacuum terminal pin device
JPS5485389A (en) 1977-12-21 1979-07-06 Kouenerugii Butsurigaku Kenkiy Insulated coaxial vacuum terminal
US4459430A (en) * 1982-07-13 1984-07-10 The United States Of America As Represented By The United States Department Of Energy High voltage variable diameter insulator
CN86105432A (zh) * 1985-09-27 1987-05-27 美国电话电报公司 带电粒子束曝光
KR910004957B1 (ko) * 1987-10-29 1991-07-18 가부시끼가이샤 도시바 고주파 회로장치
JPH0636346B2 (ja) * 1988-03-09 1994-05-11 セイコー電子工業株式会社 荷電粒子線装置及びこれによる試料観察方法
US4929839A (en) * 1988-10-11 1990-05-29 Microbeam Inc. Focused ion beam column
JP2886277B2 (ja) * 1990-06-20 1999-04-26 富士通株式会社 電子ビーム露光装置
FR2717981B1 (fr) * 1994-03-24 1996-06-28 Egide Sa Procédé de fixation hermétique et électriquement isolante d'un conducteur électrique traversant une paroi métallique .
JPH10149948A (ja) * 1996-11-19 1998-06-02 Tdk Corp 高電圧貫通形コンデンサ
WO1999001874A1 (en) * 1997-07-02 1999-01-14 The Regents Of The University Of California A method for improving performance of highly stressed electrical insulating structures
KR100796830B1 (ko) * 2000-04-12 2008-01-22 아익스트론 아게 기판코팅방법 수행용 반응실
JP2003045789A (ja) * 2001-08-02 2003-02-14 Canon Inc 描画装置及び描画方法
US7045794B1 (en) 2004-06-18 2006-05-16 Novelx, Inc. Stacked lens structure and method of use thereof for preventing electrical breakdown
EP1779403A4 (en) 2004-07-05 2009-05-06 Cebt Co Ltd METHOD FOR CONTROLLING AN ELECTRON BEAM IN A MULTIPLE-MICROSULE AND MULTIPLE MICROSULE THEREWITH
US8890095B2 (en) 2005-07-25 2014-11-18 Mapper Lithography Ip B.V. Reliability in a maskless lithography system
JP2007242359A (ja) * 2006-03-07 2007-09-20 Sony Corp 電極リング、電子顕微鏡、電極リングの製造方法及び電子顕微鏡の製造方法
JP2007266525A (ja) 2006-03-30 2007-10-11 Canon Inc 荷電粒子線レンズアレイ、該荷電粒子線レンズアレイを用いた荷電粒子線露光装置
NL2003619C2 (en) 2009-10-09 2011-04-12 Mapper Lithography Ip Bv Projection lens assembly.

Also Published As

Publication number Publication date
US20110084592A1 (en) 2011-04-14
WO2011043657A3 (en) 2011-06-03
WO2011043657A2 (en) 2011-04-14
JP5599889B2 (ja) 2014-10-01
JP2013507733A (ja) 2013-03-04
CN102687231A (zh) 2012-09-19
US8624478B2 (en) 2014-01-07
WO2011043657A4 (en) 2011-07-28
EP2486580A2 (en) 2012-08-15
TW201135792A (en) 2011-10-16

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Legal Events

Date Code Title Description
PA0105 International application

Patent event date: 20120508

Patent event code: PA01051R01D

Comment text: International Patent Application

PG1501 Laying open of application
PC1203 Withdrawal of no request for examination
WITN Application deemed withdrawn, e.g. because no request for examination was filed or no examination fee was paid