KR20120086704A - Glass substrate for display and method for manufacturing the glass substrate - Google Patents

Abstract

An object of the present invention is to provide a glass substrate for display having high flatness and a method for producing the same, which can reduce the occurrence of concave shape of the polishing surface and ensure sufficient strength. It is the glass substrate 15 of the display surface side of a flat panel display, and the depth of concave shape is less than 10 nm in the center area | region 12 of 20% or more of the total area of the surface 11a facing inside of the said flat panel display. It is characterized by.

Description

Glass substrate for display and manufacturing method thereof {GLASS SUBSTRATE FOR DISPLAY AND METHOD FOR MANUFACTURING THE GLASS SUBSTRATE}

TECHNICAL FIELD This invention relates to the glass substrate for a display, and its manufacturing method. Specifically, It is related with the display glass substrate used for a flat panel display, and its manufacturing method.

Background Art Conventionally, a polishing method and apparatus for manufacturing a glass substrate for a liquid crystal display, comprising a carrier and a polishing plate for adhering and supporting a substrate to a film frame, the carrier and the polishing plate being relatively close to each other, and the polishing surface of the substrate The technique of grinding | polishing a board | substrate by strongly pressing on a polishing plate is known (for example, refer patent document 1).

In Patent Literature 1, a glass substrate is adhered to a film frame of a carrier, and after completion of polishing, the glass substrate is not removed from the film frame at the polishing stage provided near the polishing platen, and is separated from the polishing stage, which is easier to carry out. In the glass substrate removal stage, the polished glass substrate is removed from the film frame. Thereby, the problem regarding carrying out of the glass substrate peculiar to a large glass substrate is solved.

Japanese Patent Laid-Open No. 2004-122351

In the above-described configuration described in Patent Document 1, although the problem of carrying out a large glass substrate can be solved, polishing of the glass substrate itself is performed by general polishing, and a cerium oxide aqueous solution is used for the polishing slurry. The abrasive grain of cerium oxide contained in the polishing slurry using the cerium oxide aqueous solution generally has a particle size of about 1100 nm, and if polishing is performed using the abrasive grain of this particle size, it is possible to remove all the concave shape generated before the polishing step. There existed a problem that the recessed shape of 15 nm or more might remain in the grinding | polishing surface of a glass substrate.

On the other hand, a certain intensity | strength is calculated | required by the display panel, For example, in the glass substrate for liquid crystal displays, after a liquid crystal display panel is manufactured, a strength test may be performed by pressure etc. On the substrate for color filters of a liquid crystal display panel, after manufacture of a liquid crystal display panel, in addition to a color filter, the black matrix which consists of a chromium film as a light shielding film is formed. Here, when a concave shape exists on the surface of a chromium film, a crack will generate | occur | produce easily from the concave shape of a chromium film, and the intensity | strength of a liquid crystal display panel will deteriorate rather than the case where a concave shape does not exist in the surface of a chromium film, and in a strength test There was a problem that good results were not obtained. And it is confirmed that such a concave shape of a chromium film may arise due to the concave shape which exists in the glass substrate for color filters in the lower layer of a chromium film.

In addition, also in other display panels, such as an organic electroluminescent (EL) panel, a glass substrate is used and the strength test by pressurization etc. may be similarly performed. In such various display panels, although film formation is not necessarily performed on a glass substrate, even if film formation is not performed, the point which predetermined | prescribed board | substrate strength is required for a glass substrate does not change, and the one with less concave shape of a glass substrate is not changed. This substrate strength is high.

Therefore, an object of the present invention is to provide a glass substrate for display having high flatness and a method for producing the same, which can reduce the occurrence of concave shapes on the substrate surface and ensure sufficient strength.

In order to achieve the said objective, the glass substrate for a display which concerns on 1st invention is a glass substrate of the display surface side of a flat panel display, and is in the center area | region of 20% or more of the total area of the surface facing inward of the said flat panel display. The depth of the concave shape is less than 10 nm.

Thereby, the flatness of the inner side surface of the center area which is easy to apply stress can be improved, and the glass substrate strength at the time of being used for a flat panel display can be improved.

2nd invention is the glass substrate for a display which concerns on 1st invention WHEREIN: When the average breaking load at the time of applying the load from the surface which faced the outer side of the said flat panel display made plate | board thickness tmm, 600 * ( t / 0.5) ² N or more.

As a result, even when a stress is applied from the outside of the flat panel display, breakage can be prevented with sufficient strength, thereby increasing the reliability of the flat panel display.

3rd invention is a glass substrate for a display which concerns on 1st or 2nd invention, The said flat panel display is a liquid crystal display, The said display surface side is a color filter side, It is characterized by the above-mentioned.

Thereby, even when a chromium film is formed as a black matrix on the color filter formation surface of a glass substrate, the crack which arises in a chromium film resulting from the concave shape of a glass substrate can be prevented, and the deterioration of intensity | strength of the liquid crystal panel resulting from this can be prevented. Can be.

4th invention is a glass substrate for a display which concerns on 1st or 2nd invention, The said flat panel display is an organic electroluminescent display, The said display surface side is a cap glass side, It is characterized by the above-mentioned.

Thereby, even when a glass substrate is used for the organic electroluminescent display of a top emission system, it can adapt with sufficient intensity | strength with respect to external stress.

5th invention is a glass substrate for a display which concerns on 1st or 2nd invention, The said flat panel display is an organic electroluminescent display, The said display surface side is a TFT glass substrate side, It is characterized by the above-mentioned.

Thereby, even when a glass substrate is used for the organic EL display of a bottom emission system, it can adapt with sufficient intensity | strength with respect to external stress.

The manufacturing method of the glass substrate for a display which concerns on 6th invention is a manufacturing method of the glass substrate for a display used for a flat panel display, The process of forming a glass substrate, and one surface of the said glass substrate as a grinding | polishing surface, And a step of forming the glass substrate in a polishing apparatus for performing polishing using the abrasive, and polishing the polishing surface of the glass substrate using an abrasive grain having an average particle size of 80 nm or less.

Thereby, fine abrasive polishing can be performed using the abrasive grain of a small particle diameter, raise the flatness of the grinding | polishing surface of a glass substrate, and manufacture the glass substrate for display which does not have concave shape whose depth of concave shape is 10 nm or more. can do.

7th invention is a manufacturing method of the glass substrate for a display which concerns on 6th invention WHEREIN: The said abrasive grain contains colloidal silica, It is characterized by the above-mentioned.

Thereby, it is possible to construct an abrasive grain having a particle size much smaller than an abrasive grain using cerium oxide having a particle size of about 1100 nm which is generally used, and fine abrasive grains of 80 nm or less, for example, 50 nm, 40 nm, 20 nm or the like. Using this, a glass substrate for display having high flatness can be manufactured.

8th invention is a manufacturing method of the glass substrate for a display which concerns on 7th invention WHEREIN: The said grain is an average particle diameter of 20 nm or less, It is characterized by the above-mentioned.

9th invention is a manufacturing method of the glass substrate for displays which concerns on any one of 6th-8th invention,

The step of forming the glass substrate is characterized by forming the glass substrate by a float method.

Thereby, a large glass substrate can be formed and a glass substrate for large displays with high flatness can be manufactured.

10th invention is a manufacturing method of the glass substrate for a display which concerns on any one of 6th-9th invention.

The flat panel display is a liquid crystal display,

The film forming surface is a color filter forming surface of a color filter substrate.

Thereby, the glass substrate for liquid crystal displays of intensity | strength which can fully endure the strength test of a liquid crystal display panel can be supplied.

11th invention is a manufacturing method of the glass substrate for a display which concerns on 10th invention WHEREIN: The said color filter formation surface is a surface in which the black matrix comprised from a chromium film is formed before color filter formation.

Thereby, in the strength test of a liquid crystal display panel, sufficient strength can also be ensured also about the part of the chromium film which a crack generate | occur | produces easily.

12th invention is a manufacturing method of the glass substrate for a display which concerns on any one of 6th-9th invention.

The flat panel display is an organic EL display, and the polishing surface is an inner surface of the cap glass.

Thereby, the glass substrate which has sufficient intensity | strength which can withstand the strength test of the top emission type organic electroluminescent display can be manufactured.

13th invention is a manufacturing method of the glass substrate for a display which concerns on any one of 6th-9th invention.

The flat panel display is an organic EL display, and the polishing surface is an inner surface of a TFT glass substrate.

Thereby, the glass substrate which has sufficient intensity | strength which can withstand the strength test of a bottom emission type organic electroluminescent display can be provided.

According to the present invention, the flatness of the glass substrate for display can be increased, and the strength of the display panel of the flat panel display can be increased.

FIG. 1: is a figure which shows an example of the color filter side glass substrate 15 of the liquid crystal panel which concerns on Embodiment 1. FIG. FIG. 1A is a plan view of the film formation surface 11a of the color filter side glass substrate 15 according to the first embodiment. FIG.1 (b) is sectional drawing of the color filter side glass substrate 15 which concerns on Embodiment 1. FIG.
2 is a diagram illustrating an example of the strength test of the liquid crystal panel 50 of the liquid crystal display.
3 is an explanatory diagram of a crack generation mechanism of the color filter side glass substrate 15. FIG.3 (a) is an example of the surface enlarged view of the chromium film formed in the conventional color filter side glass as a comparative example. (B) is an enlarged view in the XX 'cross section of (a) of FIG. 3C is an enlarged view of the concave shape 21 of the chromium film. 3D is an enlarged view of the concave shape 22 of the chromium film.
4 is an example of an enlarged view of the film formation surface 11a of the color filter side glass substrate 15.
FIG. 5: is a figure for demonstrating an example of the glass substrate formation process of the manufacturing method of the glass substrate 10 for displays which concerns on Embodiment 1. FIG.
FIG. 6: is a figure for demonstrating an example of the grinding | polishing process of the manufacturing method of the glass substrate 10 for displays which concerns on Embodiment 1. FIG.
FIG. 7: is a figure which shows an example of the grinding | polishing apparatus 300 different from the grinding | polishing apparatus 100 which concerns on FIG.
FIG. 8: is a figure which shows the film-forming surface 11 of the glass substrate 10 for displays which concerns on Embodiment 1. FIG. FIG. 8A is an enlarged view of the film formation surface 11 of the display glass substrate 10 according to the first embodiment. FIG. 8B is an enlarged cross-sectional view corresponding to FIG. 8A.
It is a figure for demonstrating the method of a strength test.
It is a figure which shows the strength test result of the glass substrate for a display in which the chromium film was formed.
FIG. 11: is a figure which shows an example of the cross-sectional structure of the organic electroluminescent panel 51 of the top emission system using the glass substrate for a display which concerns on Embodiment 2. FIG.
FIG. 12: is a figure which shows an example of the cross-sectional structure of the organic electroluminescent panel 52 of the bottom emission system using the glass substrate for a display which concerns on Embodiment 3. FIG.

EMBODIMENT OF THE INVENTION Hereinafter, with reference to drawings, specific content for implementing this invention is demonstrated.

FIG. 1: is a figure which shows an example of the color filter side glass substrate 15 of the liquid crystal panel which concerns on Embodiment 1 of this invention. Fig.1 (a) is a top view of the film-forming surface 11a of the color filter side glass substrate 15 of the liquid crystal panel which concerns on Embodiment 1, and FIG.1 (b) is the color filter of the liquid crystal panel which concerns on Embodiment 1 It is sectional drawing of the side glass substrate 15. FIG.

In FIG. 1A, although the film formation surface 11a of the color filter side glass substrate 15 is shown, the center area | region 12 of the film formation surface 11a contains the center of gravity of the film formation surface 11a. Is shown. The center area | region 12 is an area | region which is 20% or more of the total area of the film-forming surface 11a. In the center region 12, when the strength test of the liquid crystal panel including the color filter side glass substrate 15 is performed, breakage such as cracking occurs in the film formed on the color filter side glass substrate 15. It is an easy area.

2 is a diagram illustrating an example of the strength test of the liquid crystal panel 50 of the liquid crystal display. In FIG. 2, a cross-sectional view of the liquid crystal panel 50 is shown. The liquid crystal panel 50 includes a color filter side glass substrate 15 cut out to a predetermined size from a glass substrate for color filters and a TFT side glass cut out to a predetermined size from a glass substrate for a TFT (Thin Film Transistor). 16). In addition, there is a spacer or the like between the color filter side glass substrate 15 and the TFT side glass 16, and supports the color filter side glass substrate 15 and the TFT side glass 16, and the color filter side glass substrate. Although a liquid crystal layer is formed between 15 and TFT side glass 16, the liquid crystal layer was abbreviate | omitted in FIG.

On the color filter side glass substrate 15, the black matrix 20 and the color filter 30 are formed in the film-forming surface 11a which is the opposing surface with the TFT side glass 16. As shown in FIG. That is, the film-forming surface 11a of the color filter side glass substrate 15 is a color filter formation surface, and is a surface facing the inner side of the liquid crystal panel 50. The color filter 30 is a filter for displaying the color by passing only light of a specific wavelength. In the liquid crystal panel 50, the color filter 30 is generally comprised as a resin film containing a dye and a pigment, and the three primary color patterns of red, green, and blue are arranged regularly. The black matrix 20 is a light shielding film and is formed between each color of the color filter 30. The black matrix 20 is often formed of a chromium (Cr) film.

In the TFT glass 16, an amorphous silicon film 40 is formed in order to form a thin film transistor on the film formation surface 1lb, which is the surface facing the color filter side glass substrate 15, for example.

As the liquid crystal panel 50, a backlight is disposed on the back surface of the TFT side glass 16, and light is irradiated from the back side (below the TFT side glass 16 in FIG. 2). Then, the liquid crystal is driven by the thin film transistor, and the image of each color is displayed on the front surface of the color filter side glass substrate 15 (in FIG. 2) through the color filter 30. Up).

As the intensity test of such a liquid crystal panel 50, as shown in FIG. 2, in the state which mounted the liquid crystal panel 50 horizontally, the upper side of the liquid crystal panel 50 of the color filter side glass substrate 15 side In the center part of the surface facing outward, the test which pressurizes with the pressurizing jig 60 is generally performed. In the case where such a strength test is performed, if the strength of the liquid crystal panel 50 is insufficient, the liquid crystal panel 50 is destroyed. Here, the breakdown of the liquid crystal panel 50 may have the color filter side glass substrate 15 side instead of the TFT side glass 16 as a starting point. In addition, when the color filter side glass substrate 15 is destroyed, the starting point of a crack will generate | occur | produce on the surface of the black matrix 20 at the time of pressurization, and the crack extended to the color filter side glass substrate 15 will be made. It has been confirmed that radio waves may cause breakage of the liquid crystal panel 50. In addition, in the intensity test of the liquid crystal panel 50, since pressurization is performed from the center area | region of the color filter side glass substrate 15 as shown in FIG. 2, a crack generate | occur | produces more in a center area | region than a peripheral part. .

FIG. 3: is a figure for demonstrating the mechanism which a crack generate | occur | produces in the color filter side glass substrate 15. FIG. 3: (a) is a figure which shows an example of the surface enlarged view of the chromium film in which the black matrix 20 of the conventional color filter side glass is formed as a comparative example. In FIG. 3A, the state in which the concave shapes 21 and 22 extend in a line shape is formed on the surface of the black matrix 20. In Fig. 3A, X-X 'indicates a FIB (focused ion beam) processing position, and the arrow in the center shows the observation direction.

(B) is an enlarged view in the XX 'cross section of (a) of FIG. In addition, in FIG.3 (b), in order to perform FIB processing, the protective layer 70 is formed on the chromium film | membrane of the black matrix 20, after that, FIB processing is performed and it cuts and expands the cross section, It is shown. In FIG. 3B, the locations of the concave shapes 21 and 22 are shown.

FIG. 3C is an additional partial enlarged view of the concave shape 21 of the chromium film shown in FIG. 3B. As shown in FIG.3 (c), the concave shape 13 is formed in the color filter side glass of the lower layer of the location where the concave shape 21 is formed in the surface of a chromium film similarly.

FIG. 3D is an additional partial enlarged view of the concave shape 22 of the chromium film shown in FIG. 3B. As shown in FIG.3 (d), the concave shape 14 is formed in the color filter side glass of the lower layer where the concave shape 22 is further formed in the surface of a chromium film.

When such a chromium film having concave shapes 21 and 22 on the surface is formed on the color filter side glass as the black matrix 20, when the strength test is performed on the liquid crystal panel 50, the concave shapes 21 and 22 of the chrome film are formed. It is confirmed that a crack may be generated, the crack may propagate to the color filter side glass substrate 15 to cause a crack, and finally breakage of the liquid crystal panel 50 may occur.

From this, in the strength test, when the concave shapes 21 and 22 exist on the surface of the black matrix 20 of the chromium film, the pressurized stress at the time of the strength test tends to be concentrated locally, and the strength is significantly reduced. Able to know. On the other hand, since the recessed shapes 13 and 14 of the color filter side glass exist in the location where the recessed shapes 21 and 22 of the chrome film surface exist, the recessed shapes 21 and 22 of the chrome film surface are colored. It turns out that it is originating due to the concave shapes 13 and 14 of the filter-side glass.

As described in FIG. 3, when the concave shape of the film formation surface 11 a, which is the inner surface of the liquid crystal display of the color filter side glass substrate 15, is reduced, cracking of the black matrix 20 made of chromium film can be prevented or reduced. Can be. Therefore, if the concave shape 13 and 14 can be reduced in the center area | region 12 of the color filter side glass substrate 15 shown to Fig.1 (a), (b), it is a color filter side glass substrate. As (15), it turns out that it can have sufficient intensity | strength.

FIG. 4: is a figure which shows an example of the enlarged view of the film-forming surface 11a of the color filter side glass substrate 15 of the liquid crystal panel shown in FIG.1 (b). As shown in FIG. 4, when the film-forming surface 11a of the color filter side glass substrate 15 is enlarged, it turns out that the fine unevenness | corrugation which is not a perfect flat surface exists. In FIG. 4, two recessed shapes 13 and 14 exist in the film-forming surface 11a of the color filter side glass substrate 15. In FIG. Among the irregularities, the concave shapes 13 and 14 are defects that may cause the concave shapes 21 and 22 of the surface of the black matrix 20 to occur. Here, when the depths of the concave shapes 13 and 14 are less than 10 nm, cracks are less likely to occur in the black matrix 20 made of the chromium film even when the strength test is performed, and it is confirmed that good test results are obtained in the strength test. have. Examples based on specific experimental results will be described later. If the concave shapes 13 and 14 have flatness such that they are less than 10 nm, the liquid crystal panel 50 can obtain good test results in the strength test.

In addition, the wider the region where the concave shapes 13 and 14 of the color filter-side glass substrate 15 are less than 10 nm, the more preferable. As described in FIG. 1, at least 20% or more of the total area of the film formation surface 11a. In the center area | region of area, when the depth of concave shapes 13 and 14 is comprised so that it may be less than 10 nm, sufficient intensity improvement of the liquid crystal panel 50 will be obtained. In addition, the center area | region 12 should just be an area centered on the shape center of the outer diameter of the film-forming surface 11 at least. In addition, it is preferable that the center area | region 12 is 20% or more of the whole film-forming surface 11 at least. When the film formed into the color filter side glass substrate 15 is more likely to produce a crack, it is more preferable that it is 30% or more, It is still more preferable that it is 40% or more, It is especially preferable that it is 50% or more.

Next, an example of the manufacturing method of the glass substrate 10 for a display which concerns on embodiment of this invention is demonstrated using FIG. 5 and FIG. In FIGS. 1-4, although the color filter side glass substrate 15 of the liquid crystal panel was demonstrated as an example, the manufacturing method of the glass substrate 10 for a display which concerns on Embodiment 1 is for other displays, such as a plasma display panel. It is applicable to a glass substrate. Therefore, in FIG. 5 and FIG. 6, the manufacturing method of the glass substrate 10 for a display applicable to display panels other than a liquid crystal panel is demonstrated.

FIG. 5: is a figure for demonstrating an example of the glass substrate formation process of the manufacturing method of the glass substrate 10 for displays which concerns on Embodiment 1. FIG. FIG. 5: shows in figure one example of the general schematic structure of the float glass manufacturing apparatus 80 which manufactures the glass substrate by a float method.

The float glass manufacturing apparatus 80 is equipped with the molten kiln 81, the float bath 82, and the slow cooling kiln 87. As shown in FIG. In addition, the float bath 82 includes a gas supply port 83 and a heater 84. The slow cooling kiln 87 includes the heater 88. Further, a draw roll 86 is formed between the float bath 82 and the slow cooling kiln 87.

Next, an example of the manufacturing method of the glass substrate using the float glass manufacturing equipment 80 is demonstrated. The melting kiln 81 has a maximum temperature of 1550-1600 ° C by heavy oil combustion. The glass raw material 5 is supplied to the molten kiln 81, it melts in the molten kiln 81, and becomes the molten glass 6. FIG. In the molten kiln 81, after becoming the homogeneous molten glass 6 without bubbles, the molten glass 6 is supplied to the float bath 82. Float bath 82 is a shallow tin bath filled with molten tin 90. In addition, a reducing gas composed of a mixed gas of hydrogen and nitrogen for preventing oxidation of tin is supplied to the space above the float bath 82. Temperature adjustment is made with the heater 84 as needed so that the temperature of the molten glass 6 supplied to the float bath 82 may be about 1050 degreeC upstream, and about 600 degreeC downstream. The glass solidifies near the outlet downstream of the float bath 82, and the solidified glass is transferred to the slow cooling kiln 87 by the take-out roll 86. In the slow cooling kiln 87, after glass is cooled and distortion is removed, it is inspected and cut | disconnected and a glass substrate is formed.

For example, the glass substrate formation process may be performed using the float method. In addition, a glass substrate formation process may be performed by the manufacturing method of other glass substrates, such as a fusion method, in addition to a float method. In the glass substrate formation process, various glass substrate manufacturing methods can be applied as long as the glass substrate used as a material for manufacture of the glass substrate 10 for a display can be manufactured.

6 is a view for explaining an example of the polishing step according to the first embodiment. 6 shows an example of the overall configuration of the polishing apparatus 100 according to the first embodiment.

The polishing apparatus 100 includes two polishing apparatuses 101 and 102, the first polishing apparatus 101 and the second polishing apparatus 102. Although the 1st grinding | polishing apparatus 101 and the 2nd grinding | polishing apparatus 102 are each equipped with the polishing head 150, since both structure is the same, the same component is attached | subjected and demonstrated with the same code | symbol.

The polishing head 150 has a motor built into the main body casing 151, and the output shaft of the polishing head 150 is connected to a spindle 156 vertically lowered in the vertical direction. The carrier 152 is connected to the spindle 156. In addition, the main body casing 151 is connected to the slider 258 via the lifting mechanism 256. By the lifting mechanism 256, the main body casing 151 is raised and lowered with respect to the slider 258, so that the carrier 152 of the polishing pad 158 of the first polishing stage 118 and the second polishing stage 120 are removed. While moving forward and backward with respect to the polishing pad 160, the glass substrate 7 adhered to the film frame 114 can be pressed against the polishing pads 158 and 160 at a predetermined polishing pressure.

The polishing pad 158 is attached to the upper surface of the polishing plate 162, and a rotating shaft 164 rotated by a motor (not shown) is connected to the lower portion of the polishing plate 162. In addition, the polishing pad 160 is attached to the upper surface of the polishing plate 166, and a rotating shaft 168 rotated by a motor (not shown) is connected to the lower portion of the polishing plate 166. In addition, the polishing pads 158 and 160 may not necessarily rotate, so that a motor is not necessarily required. In addition, you may rock the polishing pads 158 and 160 side.

In addition, the main body casing 151 is connected to an idle drive mechanism (not shown), and may also have a function of revolving with a predetermined idle radius. The idle drive mechanism can be configured by, for example, incorporating a planetary gear mechanism in the main body casing 151 and connecting the output shaft of the planetary gear mechanism to the spindle 156.

Moreover, the grinding | polishing apparatus 100 is equipped with the conveying apparatus 250,252,254. The conveying apparatus 250, 252, 254 is equipped with the guide rail 270, respectively. Moreover, the conveying apparatus 250 is equipped with the stage 116, and the conveying apparatus 254 is equipped with the stage 122. As shown in FIG. By the guide rail 270, the glass substrate 7 moves over the stages 116, 122. Moreover, the conveying apparatus 250, 252, 254 is equipped with the robot arm which is not shown in figure, The 1st grinding | polishing stage 118 from the stage 116, The 2nd grinding | polishing stage 120 from the 1st grinding | polishing stage 118, It is comprised so that the glass substrate 7 may be moved from the 2nd grinding | polishing stage 120 to the stage 122. FIG.

Moreover, the slurry supply hole 130 is formed in the polishing surface plate 162, and the slurry supply hole 131 is formed also in the polishing surface plate 166 similarly. From the slurry supply holes 130 and 131, the slurry of the aqueous solution containing abrasive grains is supplied. As for the polishing of the glass substrate 7, the slurry containing abrasive grains is supplied from the slurry supply holes 130 and 131, while the polishing tables 162 and 166 and the carrier 152 rotate, the carrier 52, It is performed by holding the polishing surface of the glass substrate 7 facing downward, and pressing the polishing surface to the polishing pads 158 and 160 on the polishing plates 162 and 166. In addition, grooves for flowing the slurry may be formed in the polishing pads 158 and 160.

The carrier 152 is provided with a plurality of injection holes (not shown) for blowing compressed air. These injection ports are in communication with the air supply path 202 shown with the broken line in FIG. The air supply path 202 extends outside the polishing head 150 through a rotary joint (not shown) formed in the polishing head 150, and is connected to the air pump 206 through the valve 204. . Therefore, when the valve 204 is opened, the compressed air from the air pump 206 is supplied to the injection port in the carrier 152 through the air supply path 202. Thereby, the pressure of compressed air is transmitted to the glass substrate 7, and the glass substrate 7 is pressed by the polishing pads 158 and 160 by this pressure, and is polished.

For example, the polishing process of the glass substrate 7 may be performed by the polishing apparatus 100 which has such a structure. Specifically, the glass substrate 7 is moved from the stage 116 to the 1st polishing stage 118 by the conveying apparatus 250, and is hold | maintained with the polishing surface facing down on the carrier 152. FIG. . In other words, the glass substrate 7 is formed in the first polishing apparatus 101. The carrier 152 and the polishing plate 162 rotate, and the slurry including the abrasive is supplied from the slurry supply hole 130. The glass substrate 7 is polish-polished by both the mechanical polishing action by the friction with the polishing pad 158 and the abrasive grain on the polishing plate 162, and the chemical polishing action by the chemical reaction with the slurry.

Here, in the conventional polishing process, by using the slurry containing the abrasive grains of cerium oxide (CeO _2), it was subjected to the grinding process. By the way, the abrasive grain of cerium oxide has an average particle diameter of 1.1 micrometer (= 1100 nm). Therefore, when the polishing process is performed using the abrasive grain of cerium oxide, the concave shape generated before the polishing process shown in FIG. 3 cannot be removed, and concave shapes of 15 nm or more remain on the polishing surface of the glass substrate for display. There was a problem that there was. As concave shape which generate | occur | produced before the grinding | polishing process, the scratches and conveyance scratches by handling in the process before a grinding | polishing process are mentioned.

Therefore, in the manufacturing method of the glass substrate 10 for a display which concerns on this embodiment, the abrasive grain of colloidal silica was used. The slurry using colloidal silica as an abrasive grain uses the colloidal silica slurry which disperse | distributed the spherical silica particle whose average particle diameter is 80 nm. Thereby, the slurry containing the abrasive grain with a fine particle diameter of 80 nm or less on average can be obtained. Moreover, it is also possible to make the average particle diameter of the particle diameter in a slurry into 20 nm or less using the slurry using the abrasive grain of 20 nm or less of average particle diameters.

By using such small particle size abrasive grains, in the grinding | polishing process, the recessed shapes 13 and 14 of the film-forming surface 11 of the glass substrate 10 for a display can be made into the depth below 10 nm on average. In addition, the depth of concave shape can be made less than 8 nm on average and less than 5 nm on average by adjustment of rotation speed, polishing pressure, etc.

Thus, in the manufacturing method of the glass substrate 10 for a display which concerns on this embodiment, the film-forming surface 11 of the glass substrate 10 for display is made into the film-forming surface 11 whole area by using a small particle size abrasive grain. In the central region 12 of 20% or more, the depths of the concave shapes 13 and 14 can be processed to be less than 10 nm. Thereby, sufficient intensity | strength can be achieved also in the intensity test of a liquid crystal display panel.

In addition, in the manufacturing method of the glass substrate 10 for a display which concerns on this embodiment, if a particle diameter of 80 nm or less, Preferably it is 50 or 40 nm or less, More preferably, 20 nm or less can be implement | achieved with various materials, The constructed abrasive grains can be applied to the manufacturing method of the glass substrate 10 for a display which concerns on this embodiment.

After the polishing is finished in the first polishing apparatus 101, the glass substrate 7 is moved to the second polishing stage 120 by the conveying apparatus 252. And the glass substrate 7 is formed in the carrier 152, and the grinding | polishing platen 166 and the carrier 152 are rotated and glass, while supplying the abrasive grain which has the particle diameter of 80 nm or less from the slurry supply hole 131 similarly. Polishing of the substrate 7 is performed. Also in this case, since a small particle size abrasive grain is used, for example, polishing can be performed so that the depth of a concave shape may be less than 10 nm in the center area | region of the grinding | polishing surface of the glass substrate 7.

Moreover, when grinding | polishing by the 2nd grinding | polishing apparatus 102 is complete | finished, the conveyance apparatus 254 will move the glass substrate 7 from the 2nd grinding | polishing stage 120 to the stage 122, and will complete | finish a grinding | polishing process. do. After this, washing etc. may be performed as needed.

As mentioned above, as demonstrated using FIG. 5 and FIG. 6, the glass substrate 7 is produced first, the produced glass substrate 7 is formed in the grinding | polishing apparatus 100, and it contains an abrasive grain with a particle diameter of 80 nm or less. By polishing the film-forming surface 11 of the glass substrate 7 using a slurry, the glass substrate 10 for a display which concerns on this embodiment whose depth of concave shapes 13 and 14 is less than 10 nm can be manufactured. .

In addition, in the manufacturing method of the glass substrate 10 for a display which concerns on this embodiment, although demonstrated using the example of two-stage polishing which uses the 1st grinding | polishing apparatus 101 and the 2nd grinding | polishing apparatus 102, these were 1 However, you may finish by grinding | polishing. The number of times, time of polishing, and other various polishing conditions may be set in various ways depending on the application.

Next, the grinding | polishing process by the grinding | polishing apparatus 300 different from the grinding | polishing apparatus 100 which concerns on FIG. 6 is demonstrated using FIG. FIG. 7: is a top view which shows an example of the polishing apparatus 300 different from the polishing apparatus 100 which concerns on FIG.

The polishing apparatus 300 according to FIG. 7 includes a suction sheet 312 and a circular polishing tool 314. The polishing apparatus 300 polishes the glass substrate 7 using the circular grinding | polishing tool 314 arrange | positioned in the zigzag shape. In addition, the glass substrate 7 can be made into the grinding | polishing object the glass substrate 7 for displays which is the magnitude | size of 2200 mm (width) x 2600 mm (length), for example.

In FIG. 7, the glass substrate 7 to be polished is adsorbed and held on the adsorption sheet 312 bonded to a table (not shown), the surface opposite to the polishing target surface thereof, as shown by arrow X in the figure. As shown in the figure, it is continuously conveyed by a conveying device (not shown). And the grinding | polishing object surface is polished to the flatness requested | required by the glass substrate 10 for a display by the several circular grinding | polishing tool 314,314 ... of the grinding | polishing machine formed above the said conveyance path during conveyance.

As shown in FIG. 7, the circular polishing tools 314, 314... Are composed of a diameter D smaller than the width W of the glass substrate 7, and are predetermined by a rotating / revolving mechanism (not shown). The glass substrate 7 is polished while being rotated about the rotational center of and while revolving around a predetermined revolving center. 7, the circle shown by the solid line shows the present state of the circular grinding | polishing tool 314, 314 ..., and the many circle | round | yen shown by the double-dotted line shows that the glass substrate 7 is the grinding | polishing tool 314. , 314... As can be seen from these circles, the polishing tools 314, 314 ... are revolved about a predetermined revolving center.

The circular polishing tools 314, 314... Are arranged in pairs with respect to the moving centerline L of the glass substrate 7, and are arranged in a zigzag shape in which the positions are shifted in the moving direction. 314, 314... Are arranged to exceed the moving center line L to polish the glass substrate 7.

According to the polishing apparatus 300 configured as described above, rather than using one large abrasive tool, a plurality of small circular abrasive tools 314 having a diameter D smaller than the width W of the glass substrate 7 are provided. These circular grinding | polishing tools 314 and 314 are arrange | positioned at the left and right pairs with respect to the moving centerline L of the glass substrate 7, and the circular grinding | polishing tool 314 and 314 ... By polishing the glass substrate G in excess, the entire surface of the glass substrate 7 can be polished. As an example, when the width of the glass substrate 7 is 2200 mm, the size of the circular polishing tool 314 is φ 1290 mm, the revolving radius is 75 mm, and the revolving center is 600 mm left and right in the orthogonal direction from the moving center line L. Can be set at spaced locations.

According to the polishing apparatus 300 of FIG. 7, since the circular grinding | polishing tool 314 is made small and small diameter, the problem of securing the raw material of the circular grinding | polishing tool 314, maintenance of work assembly precision, replacement work, handling, etc. is eliminated. Can be. In addition, since at least two pairs of circular grinding | polishing tools 314 and 314 are arrange | positioned in the zigzag shape along the moving direction of the glass substrate 7, a plate-shaped object can be polished uniformly and with high precision.

As described above, the polishing step may be performed using the polishing apparatus 300 in which the circular polishing tool 314 is zigzag arranged as shown in FIG. 7. When the polishing process is performed using the polishing apparatus 300 according to FIG. 7, the depth of the concave shapes 13 and 14 of the surface is 10 by supplying a slurry having an average particle size of 80 nm or less as the abrasive grains described above. The glass substrate 10 for a display containing the area | region less than nm can be manufactured. In addition, the viscosity which may use the slurry containing the abrasive grain whose average of a particle diameter is 50 nm or less, 40 nm or less, or 20 nm or less is the same as that of description in FIG. Since other details are also the same as those in FIG. 6, the description thereof is omitted.

As demonstrated in FIG. 6 and FIG. 7, in the manufacturing method of the glass substrate 10 for a display which concerns on this embodiment, a grinding | polishing process can be performed by various grinding | polishing methods. At that time, by polishing using a slurry containing abrasive grains having an average particle size of 80 nm or less, the glass substrate 10 for a display including a region having a depth of the concave shapes 13 and 14 of the polishing surface is less than 10 nm. It can manufacture. Then, the polishing surface is used as the film forming surface 11, and the concave shapes 13 and 14 are displayed such that the region having a depth of less than 10 nm covers the central region 12 having an area of 20% or more of the total area of the film forming surface 11. If a panel is comprised, it can be set as a high display panel.

In addition, in the manufacturing method of the glass substrate 10 for a display which concerns on this embodiment, this manufacturing process can be applied to the glass substrate 7 before manufacturing the liquid crystal panel 50. FIG. By using abrasive grains having a particle diameter of 80 nm or less, the glass substrate 10 for a display in which the depth of the concave shapes 13 and 14 is less than 10 nm can be produced in most regions of the glass substrate 7. After that, even when the glass substrate 10 for a display was cut | disconnected as the color filter side glass substrate 15 for the liquid crystal panel 50 of 5 cm x 5 cm which is for strength tests, the original glass substrate for large displays 10 Since most of the portions contain only the concave shapes 13 and 14 having a depth of less than 10 nm, it is easy to form only the concave shapes 13 and 14 having a depth of less than 10 nm in the central region 12. Can be.

In Example 1, the result of having performed the manufacturing method of the glass substrate 10 for a display which concerns on Embodiment 1 is demonstrated.

FIG. 8: is a figure which shows the film-forming surface 11 of the glass substrate 10 for displays manufactured by the manufacturing method of the glass substrate 10 for displays which concerns on Embodiment 1. FIG. In addition, the film-forming surface 11 is also a surface facing inside of the liquid crystal panel 50 of a liquid crystal display.

FIG. 8A is an enlarged view of the film formation surface 11, that is, the polishing surface of the display glass substrate 10 according to the first embodiment. In addition, enlargement magnification is performed similarly to FIG.3 (a). In Fig. 8A, it is understood that the concave shapes 13 and 14, which were shown linearly in Fig. 3A, do not exist in Fig. 8A. Thus, it turns out that the manufacturing method of the glass substrate 10 for a display which concerns on Embodiment 1 can implement the flatness which greatly reduces the concave shapes 13 and 14.

FIG. 8B is an enlarged cross-sectional view corresponding to FIG. 8A. Thus, the film-forming surface 11 of the glass substrate 10 for a display is flat generally, and the recessed shapes 13 and 14 do not exist. Therefore, naturally, the concave shapes 13 and 14 do not exist even in the center region.

Next, using FIG. 9 and FIG. 10, a chromium film is formed on the film-forming surface 11 of the display glass substrate 10 manufactured by the manufacturing method of the display glass substrate 10 which concerns on Embodiment 1, and a strength test is carried out. The result of having performed is demonstrated.

9 is a diagram for explaining a method of the strength test. In FIG. 9, the sample 500 of the liquid crystal panel 50 is formed on the support jig 61. In the intensity test of the liquid crystal panel 50, an intensity test is performed using the sample 500 of the square liquid crystal panel 50 whose one side is 5 cm. Therefore, the magnitude | size may differ from the liquid crystal panel 50 actually used for a liquid crystal display. Moreover, it may test by the single plate cut | disconnected in the rectangle whose one side is 5 cm from the glass substrate 10 for a display which is not a liquid crystal panel state. The center region of the sample 500 is pressurized using the press jig 60 from above the sample 500. In addition, the pressing surface at this time becomes a surface which faces the outer side of the liquid crystal panel 50 of a liquid crystal display. The test method similar to the strength test demonstrated in FIG. 2 is employ | adopted.

It is a figure which shows the strength test result of the glass substrate for a display in which the chromium film was formed. In FIG. 10, it is the figure which compared the intensity | strength by the difference of the depth of the concave shape of the surface of the glass substrate 10 for displays. In FIG. 10, the horizontal axis shows the pressing force [kgf] by the pressing jig 60, and the vertical axis shows the cumulative failure probability [%].

Curve (C) is a result of the case where the polishing process is performed using a conventional cerium oxide as an abrasive grain and the glass substrate 10 for a display is manufactured. In this case, the recessed shapes 13 and 14 of 15 nm or more generate | occur | produced in the grinding | polishing surface used as the film-forming surface 11 of the glass substrate 10 for displays. And the weakest intensity was shown.

Curve B is the strength test result of the glass substrate 10 for a display manufactured by the manufacturing method of the glass substrate 10 for a display which concerns on Embodiment 1. FIG. The slurry used colloidal silica whose average particle diameter of an abrasive grain is 80 nm. In this case, the film formation surface 11 of the glass substrate 10 for a display had the depth of the concave shapes 13 and 14 being less than 10 nm, and the strength was remarkably improved compared with the conventional product. This makes it possible to provide the glass substrate 10 for a display that can satisfy the criteria of the strength test in most cases.

Curve (A) shows the strength test result of the glass substrate for a display which produced the glass substrate for a display so that the concave shape of the film-forming surface might be 5 nm using the other manufacturing method which emphasizes flatness as a comparative example. . Curve A realizes a glass substrate for a display having a concave shape of 5 nm or less by using a manufacturing method that emphasizes flatness, ignoring other elements required for the glass substrate for a display. In actual display glass substrates, there are various conditions to be satisfied in addition to the strength test, and it is important to provide a high-quality display glass substrate as a whole. Therefore, it is not always necessary to focus solely on the flatness of the surface. There are many. However, when the concave shape is 5 nm or less, it can be seen that the strength of the glass substrate for display is further improved. Also in the manufacturing method of the glass substrate 10 for a display which concerns on Embodiment 1, the depth of concave shape is made into 5 nm or less by devising the kind and other conditions of an abrasive grain further, and the glass substrate for display 10 with high intensity | strength is high. I can see that I can do it.

Thus, by making the depth of the concave shape 13 and 14 of the film-forming surface 11 of the glass substrate 10 for a display less than 10 nm, the intensity | strength of the liquid crystal panel 50 can be raised, and the request of a strength test is made You can be satisfied enough. Here, when the thickness of the glass substrate 10 for a display is set to t [mm], when the average breaking load satisfy | fills Formula 1, it is confirmed that the display glass substrate 10 of sufficient board | substrate strength is obtained.

<Formula 1>

In addition, in Embodiment 1, although the example which applied the glass substrate 10 for a display to the color filter side glass 15 of the liquid crystal panel 50 was demonstrated and demonstrated, the TFT side glass 16 and the organic electroluminescent panel of The same applies to the glass substrate, the cap glass, and the display glass substrate 10 for the plasma display panel. In Embodiment 2 demonstrated next, the example which used the glass substrate 10 for a display for the cap glass or glass substrate of an organic EL panel is demonstrated.

FIG. 11: is a figure which shows an example of the cross-sectional structure of the organic electroluminescent panel 51 of the top emission system using the glass substrate for a display which concerns on Embodiment 2 of this invention. In Embodiment 2, the example using the glass substrate for a display of this invention for the organic electroluminescent panel 51 of organic electroluminescent display is demonstrated.

In FIG. 11, the organic EL panel 51 includes a cap glass 17, an organic EL glass substrate 18, an ITO (transparent electrode) 210, an organic light emitting diode 23, and a glass substrate. An anode 25, a TFT substrate 41, and a seal 31 are provided. In FIG. 11, the organic electroluminescent panel 51 of the top emission system is shown, and it is set as the structure which takes out light from the cap glass 17 side.

The organic EL panel 51 has a structure in which the cap glass 17 and the organic EL glass substrate 18 are disposed to face each other, and the TFT substrate 41 on which the thin film transistor is formed on the organic EL glass substrate 18 is formed. On the TFT substrate 41, the anode 25, the organic light emitting diode 23, and the transparent electrode 210 are stacked and formed. A gap is formed between the cap glass 17 and the transparent electrode 210. In addition, although the seal 31 which seals between the cap glass 17 and the organic EL glass substrate 18 is shown by both ends in FIG. 11, the element structure shown in FIG. 11 is 1 pixel, and actually The configuration shown in Fig. 11 is formed in the pixel moisture plane. Then, the seal 31 is formed at the periphery so as to surround the pixel moisture constituting the screen. In FIG. 11, the seal 31 is also shown including the element structure for one pixel on account of the paper.

The strength test is also performed in the organic electroluminescent panel 51 of the top emission system of such a structure. As described in FIGS. 2 and 9 of the first embodiment, the test is applied to the cap glass 17 by the pressure jig 60 from the outer surface of the cap glass 17 which is the display surface. Then, it is tested whether or not the organic EL panel 51 leads to destruction. This test is performed a plurality of times, and the load at which the organic EL panel 51 leads to breakdown is recorded as the breakdown load. And what computed the average of several breaking load is shown as an average breaking load.

In the case of the strength test of the liquid crystal panel 50 described in Example 1, the chromium film was formed on the color filter side glass substrate 15, but the cap glass 17 of the organic EL panel 51 was not formed at all. The point at which film formation is not performed differs from the strength test of the liquid crystal panel 50. That is, like the chromium film, there is no factor that weakens the strength of the cap glass 17, and the strength of the pure cap glass 17 is tested. Here, when the thickness of the cap glass 17 is t [mm], when the average breaking load satisfy | fills Formula 1, it is confirmed that the cap glass 17 of sufficient board | substrate strength is obtained.

Therefore, in the glass substrate for a display which concerns on Embodiment 2, the glass substrate for a display used as the cap glass 17 is comprised so that Formula 1 may be satisfied.

Here, in the strength test, since a stress is applied from the display surface side of the organic EL panel 51, it is pressed from above the cap glass 17 in FIG. Therefore, since the inner surface of the cap glass 17 is most likely to generate cracks, the strength of the cap glass 17 can be increased by reducing the unevenness of the inner surface of the cap glass 17.

Therefore, in the glass substrate for a display which concerns on Embodiment 2, the depth of concave shape is 10 nm in the center area | region which is 20% of the total area with respect to the surface of the cap glass 17 toward the inside of the organic electroluminescent panel 51. It is comprised so that it may become less than, and the board | substrate strength shown in Formula 1 is implement | achieved. In addition, since the specific structure and manufacturing method of the glass substrate for a display which concerns on Embodiment 2 are the same as the content demonstrated in Embodiment 1, the specific description is abbreviate | omitted.

Thus, according to the glass substrate for a display which concerns on Embodiment 2, even when a glass substrate for a display is used for the organic electroluminescent panel of a top emission system, sufficient test result can be obtained in a strength test.

FIG. 12: is a figure which shows an example of the cross-sectional structure of the organic electroluminescent panel 52 of the bottom emission system using the glass substrate for a display which concerns on Embodiment 3 of this invention. Since the organic EL panel 52 which concerns on Embodiment 3 is the organic EL panel 52 of the bottom emission system which takes out light from the organic EL glass substrate 18a side, the organic EL panel 52 which concerns on Embodiment 2 ( 51).

The organic EL panel 52 according to the third embodiment includes a cap glass 17a, an organic EL glass substrate 18a, a TFT substrate 42, a transparent electrode 220, an organic light emitting diode 24, An anode 26 and a seal 32 are provided. In the organic EL 52 according to the third embodiment, the cap glass 17a and the organic EL glass substrate 18a face each other, and the TFT substrate 42, the transparent electrode 220, and the organic light emitting diode 24 are interposed therebetween. The anode 26 is formed, and the side surface is sealed with the seal 32, similar to the organic EL panel 51 according to the second embodiment, but their shapes and arrangements are different. Specifically, the opening is formed in the center part of the TFT substrate 42, and it is set as the structure which takes out light from the lower side of the TFT substrate 42. FIG. In addition, as the direction of the light output direction is reversed to that of the top emission type organic EL panel according to the second embodiment, the stacking order of the transparent electrode 220, the organic light emitting diode 24, and the anode 26 is performed. It is reversed. That is, the transparent electrode 220, the organic light emitting diode 24, and the anode 26 are laminated sequentially from the bottom so as to cover the opening of the TFT substrate 42 on the TFT substrate 42. By such a configuration, light can be taken out from the lower side of the organic EL glass substrate 18a.

Here, in the organic EL panel 52 according to the third embodiment, since the display surface becomes the organic EL glass substrate 18a, the strength test is such that pressure is applied from the outside of the organic EL glass substrate 18a, that is, from the lower surface side. do. In this case, when the organic EL glass substrate 18a satisfies the average breaking strength of the above formula 1, sufficient glass substrate strength can be achieved in the strength test. Therefore, as in the third embodiment, in the case of using a glass substrate for a display in an organic EL panel of a bottom emission method, the organic EL glass substrate 18a on which the TFT substrate 42 on the display surface side is satisfied satisfies Expression (1). The glass substrate for a display is comprised.

At this time, similarly to the second embodiment, since most stress is applied to the inner surface of the organic EL glass substrate 18a facing the inside of the organic EL panel 52, the total area of the inner surface of the organic EL glass substrate 18a is reduced. The glass substrate for a display is comprised so that the depth of a concave shape may be less than 10 nm in the center area | region which has an area of 20% or more. The TFT substrate 42 is formed by forming a film on the inner surface of the organic EL glass substrate 18a. However, since the TFT substrate 42 is not made of a chromium film, the organic EL glass substrate 18a is formed. Equation 1 can be applied as it is without the action of encouraging the decay.

In addition, also in FIG. 12, only one pixel is shown similarly to FIG. 11, and therefore, the point in which the seal 32 exists in the periphery of the organic EL panel 52 of an outer side is the same as that of 2nd Embodiment. In addition, although the example in which the pressure was applied from the lower surface side by the pressurizing jig 60 is shown in FIG. 12, in the actual strength test, the organic EL glass substrate 18a has the cap glass 17a on the upper side. It is arrange | positioned so that it may come in the lower side, and a pressure is applied to the outer side surface of the organic EL glass substrate 18a from the upper side, and a strength test is performed.

In addition, since the more specific structure and manufacturing method of the glass substrate for a display which concerns on Embodiment 3 are the same as that of the glass substrate for a display demonstrated in Embodiment 1, the detailed description is abbreviate | omitted.

In Example 2, as described in Embodiments 2 and 3, it is assumed that the display glass substrate according to the present embodiment is used on the display surface side of the organic EL panel of the organic EL display. The strength test was done. Although the method of the intensity | strength test is the same as that of FIG. 9 of Example 1, the glass substrate for a display is a state only a glass substrate which is not formed into a film.

As a condition of the strength test, a falling rate of 1.0 mm / min was applied to a glass substrate for display having a plate thickness of 0.5 [mm]. Here, the lowering speed indicates the lowering speed of the pressing jig 60.

It grind | polished using the slurry containing the abrasive grain of selenium oxide conventionally performed, and the strength test of the conventional glass substrate for a display was measured. As a result, the conventional glass substrate for a display could not satisfy Formula 1.

On the other hand, it grind | polished using the slurry containing colloidal silica abrasive grains of an average particle diameter of 80 [nm], and measured the strength test of the glass substrate for a display which concerns on this embodiment. As a result, compared with the conventional glass substrate for a display, the average breakage load improved remarkably and satisfy | filled Formula 1 stably.

It grind | polished using the slurry containing colloidal silica abrasive grains of average particle diameter 20 [nm], and measured the strength test of the glass substrate for a display which concerns on this embodiment. As a result, compared with the conventional glass substrate for a display, average breaking load remarkably improved. Moreover, even compared with the glass substrate for a display which concerns on this embodiment polished using the slurry containing colloidal silica abrasive grains of an average particle diameter of 80 [nm], an average breaking load is improving and it is possible to satisfy Formula 1 more stably. It became possible.

Thus, as shown in Example 2, the glass substrate for a display which concerns on this embodiment has a board | substrate intensity | strength which is remarkably high compared with the conventional glass substrate for a display, and does not form film formation etc. at all. Even when the strength test was carried out directly, it can be seen that good test results can be obtained.

In addition, in Embodiment 1, the content corresponding to the intensity test of the liquid crystal panel 50 is demonstrated mainly, In Embodiment 2, 3, the content corresponding to the intensity test of the organic EL panels 51 and 52 is described. Although demonstrated centrally, this invention is not necessarily related to a strength test, It can fully respond to the various requests which raise the flatness of the glass substrate 10 for displays, and can also be used for such a use.

As mentioned above, although preferred embodiment of this invention was described in detail, this invention is not limited to embodiment mentioned above, Various deformation | transformation and substitution can be added to embodiment mentioned above.

Although this application was detailed also demonstrated with reference to the specific embodiment, it is clear for those skilled in the art that various changes and correction can be added without deviating from the mind and range of this invention.

This application is based on the JP Patent application (Japanese Patent Application No. 2009-245939) of an application on October 26, 2009, The content is taken in here as a reference.

Industrial Applicability The present invention can be used for flat panel display panels of flat panel displays such as liquid crystal panels, organic EL panels, and plasma display panels.

5 glass raw material
6 molten glass
7 glass substrate
10 Glass Substrates for Display
11 tabernacle
12 central zones
13, 14 concave shape
15 color filter side glass substrate
16 TFT side glass
17, 17a cap glass
18, 18a organic EL glass substrate
20 black matrix
210, 220 transparent electrode
23, 24 organic light emitting diode
25, 26 anode
30 color filter
40 amorphous silicon film
41, 42 TFT Substrate
50 liquid crystal panel
51, 52 organic EL panel
60 pressurized jig
61 support jig
70 protective layers
80 float glass manufacturing equipment
81 melting kiln
82 float bath
83 gas supply
84, 88 heater
86 withdrawal roll
87 slow cooling kiln
90 molten tin
100, 101, 102, 300 Polishing Equipment
114 membrane frame
116, 122 stage
118, 120 Polishing Stage
130, 131 slurry feed holes
150 polishing heads
152 carrier
156 spindle
158, 160 polishing pad
202 air supply
204 valve
206 air pump
250, 252, 254 Carriers
256 lifting mechanism
258 slider
270 guide rail
312 Suction Sheet
314 circular grinding machine

Claims (13)

It is the glass substrate of the display surface side of the flat panel display,
The concave-shaped depth is less than 10 nm in the center area | region of 20% or more of the total area of the surface facing inward of the said flat panel display, The glass substrate for displays characterized by the above-mentioned. According to claim 1, wherein the average breaking load in the case of applying a load from the side toward the outer side of the flat panel display, when the plate thickness that t㎜, characterized in that more than ^{600 × (t / 0.5) 2} N Glass substrate for display. The flat panel display according to claim 1 or 2, wherein the flat panel display is a liquid crystal display,
The display surface side is a color filter side. The flat panel display according to claim 1 or 2 is an organic EL display,
The display surface side is a cap glass side. The flat panel display according to claim 1 or 2 is an organic EL display,
The display surface side is a TFT glass substrate side. It is a manufacturing method of the glass substrate for displays used for a flat panel display,
Forming a glass substrate,
Forming said glass substrate in a polishing apparatus using polishing with one surface of said glass substrate as a polishing surface, and
A method of manufacturing a glass substrate for display, comprising the step of polishing the polishing surface of the glass substrate using an abrasive grain having an average particle size of 80 nm or less. The method for producing a glass substrate for display according to claim 6, wherein the abrasive grains comprise colloidal silica. The said abrasive grain has an average particle diameter of 20 nm or less, The manufacturing method of the glass substrate for a display of Claim 7 characterized by the above-mentioned. The process of forming the said glass substrate forms the said glass substrate by the float method, The manufacturing method of the glass substrate for displays in any one of Claims 6-8 characterized by the above-mentioned. The flat panel display according to claim 6, wherein the flat panel display is a liquid crystal display,
The said polishing surface is a color filter formation surface of a color filter substrate, The manufacturing method of the glass substrate for a display. The said color filter formation surface is a surface in which the black matrix which consists of a chromium film is formed before a color filter formation, The manufacturing method of the glass substrate for a display of Claim 10 characterized by the above-mentioned. The flat panel display according to any one of claims 6 to 9 is an organic EL display,
The said polishing surface is an inner surface of cap glass, The manufacturing method of the glass substrate for a display. The flat panel display according to any one of claims 6 to 9 is an organic EL display,
The said polishing surface is an inner surface of a TFT glass substrate, The manufacturing method of the glass substrate for a display characterized by the above-mentioned.

Images