KR20120076188A - Mold for forming optical pattern and method for manufacturing the same - Google Patents

Abstract

PURPOSE: A soft mold and a manufacturing method thereof are provided to increase the heterplasia between photo-curable resin and a soft mold and the adhesive property between the photo-curable resin and a base film by increasing efficiency for light utilization of the photo-curable resin as a light reflective layer is adapted. CONSTITUTION: A soft mold comprises a first base film(104), an uneven part(102), a reflective layer(108), and a semi-transmissive layer(118). The uneven part includes irregular patterns formed in one side of the first base film. The reflective layer is arranged in the other side of the first base film. The semi-transmissive layer is arranged on the top of the uneven part. The reflective layer and the semi-transmissive layer are formed by a same material.

Description

Soft mold and its manufacturing method {MOLD FOR FORMING OPTICAL PATTERN AND METHOD FOR MANUFACTURING THE SAME}

The present invention relates to a soft mold and a method of manufacturing the same, and more particularly, to a soft mold having a reflective layer and a method of manufacturing the same.

Currently, flat panel displays such as Liquid Crystal Display (LCD), Plasma Display Pane (PDP), and Organic Light Emitting Diode (OLED) are used in TVs, notebook PCs, mobile phones, monitors and navigation systems. It is widely used in electronic products such as tablets, tablet PCs and refrigerators.

Various optical films such as a diffusion film for diffusing light emitted from a light source, a prism film system for condensing the diffused light, a soft mold, and a viewing angle compensation film are used for such display devices. As a method of manufacturing the optical film, there is a method of directly using a mechanically processed pattern master as a mold. The pattern forming method using the pattern master has an advantage of excellent durability of the pattern master, but has a disadvantage in that the pattern processing cost of the mold is high and its size is inconvenient to handle.

Recently, a photoresist is applied on a substrate, the photoresist is selectively exposed, and then developed to produce a pattern master, and then a material that is easily molded to fill the uneven portion of the pattern master is injected and cured. It is a tendency to use the soft mold provided with the uneven | corrugated part of the shape opposite to the uneven | corrugated part.

When the optical film is manufactured by using such a soft mold, a low pressure lamp is used during primary ultraviolet (UV) irradiation in consideration of releasability between the mold and the film on which the optical pattern is formed. However, there is a problem that the amount of ultraviolet light decreases due to the use of a low pressure lamp, resulting in a decrease in the degree of curing of the resin for forming a pattern or a releasability with a mold, and affecting the adhesion between the ultraviolet curing resin and the base film even after the second and third curing. Is giving. In addition, the hardness of the concave-convex portion constituting the soft mold is easily deformed and has a weak durability.

One object of the present invention is to provide a soft mold capable of increasing the light utilization efficiency of the photocurable resin and the mold release property of the photocurable resin and the mold, and to increase the adhesion between the photocurable resin and the base film and a method of manufacturing the same. .

Another object of the present invention is to provide a soft mold capable of minimizing pattern deformation of the uneven part by repeated use by improving the durability of the uneven part and a manufacturing method thereof.

One aspect of the invention relates to a soft mold. The soft mold may include a first base film, an uneven portion including an irregular pattern formed on one surface of the first base film, and a reflective layer on the other surface of the first base film opposite to the one surface.

In embodiments, the semi-permeable layer on the upper surface of the irregularities may further include.

In embodiments, the reflective layer and the transflective layer may be made of the same material.

In embodiments, the reflective layer or semi-transmissive layer is gold (Au), silver (Ag), copper (Cu), aluminum (Al), nickel (Ni), tungsten (W), titanium (Ti), platinum (Pt) , Monolayer film containing any one or more of palladium (Pd), tin (Sn), lead (Pb), zinc (Zn), indium (In), cadmium (Cd), chromium (Cr) or molybdenum (Mo) or It may be a multilayer film.

In embodiments, the transflective layer may have a thickness of about 0.01 nm to about 300 nm.

In an embodiment, the uneven portion may include any one of a prism pattern, a lenticular pattern, a microlens pattern, and an embossed pattern.

In embodiments, the uneven portion may include a bead, the diameter of the bead is 1㎛ to 200㎛, the degree of impregnation of the beads may be 40% to 65%.

In an embodiment, the uneven part may be made of a material including a thermoplastic resin, a thermosetting resin or a photocurable resin.

In an embodiment, the adhesive layer between the reflective layer and the first base film; And a second base film laminated on one surface of the reflective layer.

Another aspect of the invention relates to a soft mold manufacturing method. The soft mold manufacturing method may include forming an uneven portion having an irregular pattern on one surface of the first base film and forming a reflective layer on the other surface of the first base film opposite to the one surface.

In an embodiment, the method may further include forming a transflective layer on an upper surface of the uneven portion before, after or simultaneously with forming the reflective layer.

In an embodiment, the reflective layer and the transflective layer may be formed simultaneously by electroless plating.

In embodiments, the reflective layer or semi-transmissive layer may be formed by vacuum deposition, sputtering, chemical vapor deposition, electroless plating, electroplating, spray coating or spin coating.

In an embodiment, the forming of the reflective layer may include forming a reflective layer on a second base film and forming a second base film on which the reflective layer is formed so that the reflective layer faces the first base film through an adhesive layer. And adhering to the other side of the film.

In an embodiment, in the forming of the uneven portion having an irregular pattern on one surface of the first base film, the uneven portion may be formed by directly molding the first base film.

In an embodiment, the step of forming an uneven portion having an irregular pattern on one surface of the first base film may include forming a pre-resin layer on the pattern master, curing the pre-resin layer, and curing the cured pre-resin layer. It may comprise the step of separating.

In an embodiment, in the forming of the pre-resin layer on the pattern master, the pre-resin layer may include a thermoplastic resin, a thermosetting resin or a photocurable resin.

The soft mold of the present invention and the method of manufacturing the same may increase the light utilization efficiency of the photocurable resin by introducing the light reflection layer, thereby increasing the releasability of the photocurable resin and the soft mold, and the adhesion between the photocurable resin and the base film.

In addition, by improving the durability of the uneven portion in which the pattern to be transferred from the soft mold exists, it is possible to prevent the pattern deformation of the uneven portion by repeated use and to extend the life thereof, thereby reducing costs.

1 is a cross-sectional view of a soft mold according to one embodiment of the invention.
2 is a cross-sectional view of a soft mold according to another embodiment of the present invention.
3 is a cross-sectional view of a soft mold according to another embodiment of the present invention.
4A to 4C are cross-sectional views illustrating a method of manufacturing a soft mold according to one embodiment of the present invention.
5A to 5B are cross-sectional views illustrating a method of forming an optical film using a soft mold.

One aspect of the invention relates to a soft mold. 1 is a cross-sectional view of a soft mold according to one embodiment of the invention. The soft mold 100 according to an embodiment of the present invention includes the uneven portion 102, the first base film 104, the adhesive layer 106, the reflective layer 108, and the second base film 110.

The upper surface of the uneven portion 102 is made of an irregular pattern. For example, it may be an irregular pattern formed of a prism pattern, a lenticular pattern, a microlens pattern, or an emboss pattern, but other irregular patterns are possible.

The uneven portion 102 may be made of a material containing a thermosetting resin, a thermoplastic resin, or a photocurable (ultraviolet curing) resin. For example, epoxy, polyurethane, acryl, polyethylene terephthalate, triacetyl cellulose, polyethylene, polyethylene naphthalate, poly It may include one or more of carbonate, polyether sulfone, polyarylate, cycloolefin copolymer, polydimethylsiloxane, or polyimide. The uneven portion 102 may further include an inorganic filler such as silica for improving releasability.

The first base film 104 may be a soft (flexible) material, and the material is not limited. For example, epoxy, polyurethane, acryl, polyethylene terephthalate, triacetyl cellulose, polyethylene, polyethylene naphthalate, poly It may include one or more of carbonate, polyether sulfone, polyarylate, cycloolefin copolymer, polydimethylsiloxane, or polyimide.

The adhesive layer 106 may be a conventional pressure sensitive adhesive (PSA). In the present invention, the term 'adhesion' is used as a term including adhesion. That is, the adhesive layer 106 may be an adhesive layer.

The reflective layer 108 may be a single layer or a multilayer film that reflects ultraviolet rays. For example, gold (Au), silver (Ag), copper (Cu), aluminum (Al), nickel (Ni), tungsten (W), titanium (Ti), platinum (Pt), palladium (Pd), tin (Sn), lead (Pb), zinc (Zn), indium (In), cadmium (Cd), chromium (Cr) or molybdenum (Mo) may be a single layer film or a multilayer film containing any one or more of the present invention It is not limited to this. The reflective layer 108 may have a thickness of several tens of nm to several tens of micrometers. It is possible to prevent the transmission phenomenon by the thin film in the above range, it is possible to reduce the thickness uniformity and material cost of the coated thin film.

The second base film 110 may be a film including plastic, metal or ceramic. For example, epoxy, polyurethane, acryl, polyethylene terephthalate, triacetyl cellulose, polyethylene, polyethylene naphthalate, poly Plastic, metal thin film including any one or more of carbonate, polyether sulfone, polyarylate, cycloolefin copolymer, polydimethylsiloxane, or polyimide And the like, but the present invention is not limited thereto.

2 is a cross-sectional view of a soft mold according to another embodiment of the present invention. Soft mold 100 according to another embodiment of the present invention may include an uneven portion 102, the first base film 104, the adhesive layer 106, the reflective layer 108 and the second base film 110 It may further include a bead (B, bead). Since the first base film 104, the adhesive layer 106, the reflective layer 108 and the second base film 110 are the same as described above, a detailed description thereof will be omitted.

The bead (B) is for making an irregular pattern of the uneven portion 102 is not limited to the material. For example, it may include any one or more of plastic beads, ceramic beads, or metal beads. In addition, the bead (B) may be a bead having a diameter of 1 ㎛ to 200 ㎛, preferably 35 ㎛ to 100 ㎛, it may be a bead whose diameter (size) is not constant. For example, two different sizes of beads and three sizes of beads may be mixed. In addition, although the shape of the beads (B) is preferably spherical, there is no limitation on the shape of the beads, it is also possible to use amorphous beads.

The rate at which the bead B is impregnated into the substrate forming the uneven portion 102 is called an impregnation degree (h / H × 100), but the impregnation degree is preferably 40% to 65%. In the above impregnation range, there is an advantage in that the light efficiency is increased and the releasability is improved.

3 is a cross-sectional view of a soft mold according to another embodiment of the present invention. The soft mold 100 according to another embodiment of the present invention may include the uneven portion 102, the first base film 104, the reflective layer 108, and the transflective layer 118. That is, it may include a transflective layer 118 coated on the upper surface of the uneven portion 102 present on one surface of the first base film 104 and a reflective layer 108 coated on the other surface facing the one surface. .

The transflective layer 118 may be a single layer film or a multilayer film that transmits a part of light (ultraviolet rays) and reflects a part of it. For example, gold (Au), silver (Ag), copper (Cu), aluminum (Al), nickel (Ni), tungsten (W), titanium (Ti), platinum (Pt), palladium (Pd), tin (Sn), lead (Pb), zinc (Zn), indium (In), cadmium (Cd), chromium (Cr) or molybdenum (Mo) may be a single layer film or a multilayer film containing any one or more of the present invention The present invention is not limited thereto, and may be a thin film including metal nitride, metal oxide, organic material, and the like. In addition, the materials constituting the reflective layer 108 and the transflective layer 118 may be the same or different.

The reflective layer 108 or the transflective layer 118 may have the same thickness. In the present invention, the same meaning includes substantially the same case.

When the semi-transmissive layer 118 is thin, it is easy to transfer some of the incident light (ultraviolet rays) to the reflective layer 108, and is evenly applied on the irregular pattern of the uneven portion, and it is easy to reduce the material cost and process time. There is one advantage. When the transflective layer 118 is formed of a metal, its thickness may be 0.01 nm to 300 nm, preferably 0.1 nm to 100 nm. It is possible to use the transmission phenomenon by the thin film in the above range, it is possible to reduce the thickness uniformity and material cost of the coated thin film.

The transflective layer 118 has the additional advantage of improving the durability of the soft mold as well as the utilization efficiency of light. That is, it is possible to prevent deformation of the irregular pattern forming the uneven portion by repeated use, which can extend the life of the soft mold and improve the reliability.

The soft mold according to another embodiment of the present invention may further include a semi-transmissive layer (not shown) coated on the upper surface (irregular pattern) of the uneven portion 102 of the soft mold shown in FIG. 1 or 2. Can be.

4A to 4C are cross-sectional views illustrating a method of manufacturing a soft mold according to one embodiment of the present invention. Hereinafter, a soft mold manufacturing method according to an embodiment of the present invention will be described with reference to FIGS. 4A to 4C.

First, as shown in Figure 4a, to prepare a pattern master 200. The pattern master 200 has a predetermined pattern consisting of a recess and a convex portion on the support and the support. The predetermined pattern may be a reverse phase pattern of a soft mold pattern to be produced later. The support may be a glass substrate, a ceramic substrate, a plastic substrate, or a metal substrate, and a metal layer may be stacked on the glass substrate, the ceramic substrate, or the plastic substrate. The material constituting the predetermined pattern may include an inorganic material such as a metal, a metal oxide, silicon oxide, silicon nitride, or an organic material such as a photoresist. For example, the predetermined pattern may be formed by a conventional exposure process, and in particular, the material constituting the predetermined pattern may be formed of a Novolac resin.

Next, as shown in FIG. 4B, the pre-resin layer 102a is formed on the pattern master 200 to form the uneven portion of the soft mold. The resin layer 104a or the first base film itself 104a may be further laminated on the pre-resin layer 102a to further form a first base film. In another embodiment, the pre-resin layer 102a which will form the uneven portion may use the uneven portion and the first base film later. That is, in this case, the pre-resin layer 102a simultaneously forms the first base film and the uneven portion, and may be considered to be the case in which the first base film does not exist, or by forming the uneven portions by directly molding the first base film. You can see.

The pre-resin layer 102a may be made of a thermoplastic resin, a thermosetting resin, a photocurable resin, or the like. For example, epoxy, polyurethane, acryl, polyethylene terephthalate, triacetyl cellulose, polyethylene, polyethylene naphthalate, poly It may include one or more of carbonate, polyether sulfone, polyarylate, cycloolefin copolymer, polydimethylsiloxane, or polyimide.

The pre-resin layer 102a may further include an inorganic filler such as silica, which lowers surface energy to improve releasability with the pattern master 200. In addition, the pre-resin layer 102a may include the aforementioned beads and the like, which will be omitted.

Next, as shown in FIG. 4C, when the pre-resin layer 102a is cured and separated from the pattern master 200, the first base film 104 having the uneven portion 102 including an irregular pattern on one surface thereof is formed. Is obtained. When the pre-resin layer 102a is made of a thermoplastic resin, it can be cured by cooling, and when it is made of a thermosetting resin, it can be cured by heat treatment, and when it is made of a photocurable resin, it can be cured by light irradiation such as ultraviolet irradiation. have.

Thereafter, as illustrated in FIGS. 1 to 3, a soft mold including a reflective layer or a semi-transmissive layer is completed. Hereinafter, a method of forming the reflective layer or the transflective layer shown in FIGS. 1 to 3 will be described. Unless otherwise mentioned, the following thin film forming method can be used for the purpose of forming the transflective layer as well as the reflective layer.

When the transflective layer 118 is present, the reflective layer 108 and the transflective layer 118 may be formed at the same time or the reflective layer 108 may be formed first, and then the transflective layer 118 may be formed, The transflective layer 118 may be formed first. In addition, the same thin film forming method may be used or different thin film forming methods may be used.

There is no limitation on the method of forming the reflective layer 108 or the transflective layer 118. For example, vacuum evaporation, sputtering, chemical vapor deposition (CVD), electroless plating, screen printing, spin coating, spray coating (spray coating) or dip coating (dip coating) and the like can be used, it is also possible to electroplating (electro plating) after forming the seed metal layer.

Vacuum evaporation methods include evaporation using thermal energy, and e-beam evaporation, which evaporates metal using electron beams.It is possible to increase deposition rate without damaging substrates by coating low-energy metal particles. There is an advantage. Sputtering has the advantage that it is easy to adjust the thickness of the thin film and excellent step coverage (step coverage) to uniformly coat the recessed portion and the convex portion of the uneven portion.

The metal layer can be formed by electroless plating. Electroless plating allows the simultaneous formation of reflective and semi-transmissive layers and eliminates the need for expensive vacuum equipment. For example, a copper reflective layer can be formed by electroless plating. The plating solution used for electroless copper plating includes a copper moving source, a pH adjusting agent, a reducing agent, and may also include an ethylenediamine tetraacetic acid (EDTA) or a surfactant as a complexing agent. Copper ion sources include _{CuSO 4? 5H 2 O, CuSO} 4 , etc., and the like a pH control agent KOH, NaOH, etc., formaldehyde (HCHO) to the reducing agent, but the present invention is not limited to this. Electroless copper plating may be achieved by reducing copper with a reducing agent (for example, formaldehyde) by the following reaction.

^{Cu 2 + + 2HCHO + 4OH -} → Cu + 2H 2 O + 2HCO 2 -

Moreover, catalysts, such as a palladium (Pd) and a palladium / tin (Pd / Sn) compound, can be used. When the pH is raised by the pH adjuster (approximately pH 11 or more), strong reduction of formaldehyde occurs and electrons are generated. The electrons flow to the copper ions, and the copper ions are deposited on the palladium catalyst to apply the copper layer.

By electroless nickel plating, a nickel reflection layer or a nickel semitransmissive layer can be formed. Plating baths for electroless nickel plating may include nickel salts, reducing agents, pH adjusting agents, complexing agents, wetting agents or stabilizers. Nickel acetate, nickel chloride, or nickel sulfate may be used as the nickel salt layer source of nickel ions. As the reducing agent, hypophosphite ions may be used. During electroless nickel plating, hypophosphite ions are oxidized to orthophosphate ions and the nickel cations in the plating bath can be reduced to deposit nickel-phosphorus alloys. The pH of the plating bath for the electroless nickel plating may be 6 to 8, the temperature of the plating bath is 30 ℃ to 60 ℃.

 After forming the seed layer by the above-described vacuum deposition, sputtering, electroless plating, etc., electroplating (electroplating) may be performed. In addition, spray coating, spin coating, sol-gel coating, dip coating, or the like may be used.

Alternatively, the reflective layer 108 is formed on the second base film 110. If the second base film 110 is a heat-resistant film such as metal or ceramic, the metal layer is coated, dried and baked by screen printing or the like to form a reflective layer ( 108) is also possible.

The reflective layer may be directly formed on the other surface of the first base film, but the second base film having the reflective layer formed by forming a reflective layer on the second base film and directing the reflective layer to the other surface of the first base film through an adhesive layer. It may be formed by adhering to the first base film. In addition, the second base film on which the reflective layer is formed may be adhered after the formation of the transflective layer, or may be attached before the formation of the transflective layer.

5A to 5B are cross-sectional views illustrating a method of forming an optical film using a soft mold. In order to form the pattern of the optical film using the soft mold of the present invention described above, the ultraviolet curable resin 300a is coated on the soft mold and irradiated with ultraviolet rays to cure the ultraviolet curable resin 300a, and then separate and irregularly. An optical film 300 having a pattern may be obtained. The optical film may be a prism film, a diffusion film, or a light guide tube of a liquid crystal display, or may be a film in which the prism film and the diffusion film are integrated.

In addition, the soft mold of the present invention may be used for forming electrodes (bus electrodes, address electrodes) or partition walls of the plasma display panel, and may be used for forming various other patterns.

< Example  And Comparative example >

Example 1

Irregularities are irregular microlens patterns (lens 70 ~ 80㎛, impregnation degree 50%), the first base film is PET, the adhesive layer is PSA, the reflective layer is an aluminum metal layer, the second base film is 25㎛ thickness A soft mold such as that shown in FIG. 1, which is a PE film, was prepared.

[Example 2]

The uneven parts were irregular patterns, the first base film was PET, the adhesive layer was a PSA, the reflective layer was an aluminum metal layer, and the second base film was a soft mold as shown in FIG. 2.

The irregular pattern of Example 2 was copper plated on the bare roll and then formed an irregular pattern using a sanding machine, and then coated with nickel plating to produce an irregular pattern roll, and the irregular pattern roll was replicated in the soft mold.

Comparative Example 1

In the soft mold of Example 1, it is a soft mold in which an adhesive layer, a reflective layer, and a second base film do not exist.

Comparative Example 2

In the soft mold of Example 2, it is a soft mold in which an adhesive layer, a reflective layer, and a second base film do not exist.

 [ Example  1, 2 and Comparative example  1, 2 soft Mold  Manufacturing method]

Pattern Film Manufacturing

Passing a pattern master (manufactured by Samsung Fine Chemicals) and a 125 μm thick PET film (H32P, Kolon) between a pair of rollers, a UV curable resin composition (the terminal contains an acrylate and a photoinitiator) between the pattern master and the PET film IG-184), JMR-10, manufactured by Minutatec) was injected, and at the same time, the resin was cured by irradiating high pressure UV to the resin to prepare a first base film having irregularities.

Reflective Film Manufacturing

A reflective film was prepared by depositing aluminum on a PE film (second base film) having a thickness of 25 μm by sputtering.

Of pattern film and reflective film Lamination

The pattern film and the reflective film were bonded by PSA (Pressure Sensitive Adhesive), but the aluminum reflective layer of the reflective film was bonded to the lower surface (opposite side of the uneven part) of the pattern film.

[Characteristic evaluation]

Minutatech's JMR-10 ultraviolet curable resin (UV curable composition containing terminal group acrylate containing no PMMA or Silica and cured it) in the uneven portions of the soft molds of Examples 1 and 2 and Comparative Examples 1 and 2 Coated photoinitiator (IG-184)) and gradually increased the energy of BL lamp (Philips, TLD15W / 08, 10W) and observed the pattern formation, and after primary curing with BL lamp (50mJ / ㎠), high pressure After the second curing with a lamp (350mJ / ㎠) was tested for adhesion.

Pattern formation evaluation

After UV irradiation, the appearance of the pattern was determined by visual inspection using a 3D microscope (KEYENCE, VK-9700).

Adhesion  evaluation

In accordance with ASTM D3359 standard, the product was scratched with a grid using a cross hatch cutter, the adhesive tape was adhered to and then peeled off, and the number of remaining coatings attached to the product grid was entered. The adhesive tape test was performed five times and the result of average value was recorded. Adhesion at room temperature and reliability after 48 hours under conditions of 60 ° C. and 90% humidity (relative humidity) reliability chamber conditions were evaluated.

The characteristics evaluation results are shown in Table 1 and Table 2 below. In Table 2 below, when the adhesion is 90/100, it means that 10 out of 100 UV cured parts are separated by the adhesion test result.

Pattern formation by quantity after UV curing Primary BL Lamp Secondary high pressure 10mJ / ㎠ 20mJ / ㎠ 30J / ㎠ 40mJ / ㎠ 50mJ / ㎠ 350mJ / ㎠ Example 1 X O O O O O Example 2 X O O O O O Comparative Example 1 X X X O O O Comparative Example 2 X X X X O O

Adhesion Primary BL Lamp Secondary high pressure lamp Room temperature 60 ℃ X 90% Adhesion Example 1 50mJ / ㎠ 350mJ / ㎠ 100/100 100/100 Example 2 50mJ / ㎠ 350mJ / ㎠ 100/100 100/100 Comparative Example 1 50mJ / ㎠ 350mJ / ㎠ 100/100 90/100 Comparative Example 2 50mJ / ㎠ 350mJ / ㎠ 100/100 85/100

As shown in Table 1, it can be seen that in Example 1 and Example 2 in which the reflective layer (reflective layer) is present, a pattern (uneven portion) is formed at a low energy of 20 mJ / cm ² . On the other hand, Comparative Example 1, it can be seen that 40mJ / cm ^2, Comparative Example 2, the pattern is formed from 50mJ / cm ^2, the light use efficiency is significantly low. That is, in the soft mold having the reflective layer of the present invention, the light use efficiency is greatly increased by using the ultraviolet rays by the reflective layer and a low energy ultraviolet lamp can be used, thereby reducing the cost of forming an optical film.

Table 2 shows the adhesion test results after curing the primary energy to 50mJ / cm ² of the lamp BL, and a secondary curing into energy 350mJ / cm ² in the high-pressure lamp. As shown in Table 2, all the results showed good results in the adhesion test at room temperature, but the adhesion of Comparative Example 1 and Comparative Example 2 was low after 48 hours at a reliability chamber condition of 60 ° C. and humidity of 90% (relative humidity). You can see what appeared. That is, the soft mold having the reflective layer of the present invention has the advantage of improving the light utilization efficiency and improving the adhesion of the pattern formed by the soft mold to improve the reliability.

100: soft mold 102: irregularities
104: first base film 106: adhesive layer
108: reflective layer 110: second base film
118: semi-transmissive layer

Claims (18)

A first base film;
An uneven portion including an irregular pattern formed on one surface of the first base film; And
Reflective layer present on the other surface of the first base film opposite to the one surface
Soft mold comprising a.
The soft mold of claim 1, further comprising a semi-transmissive layer existing on an upper surface of the uneven portion.
The soft mold of claim 2, wherein the reflective layer and the transflective layer are made of the same material.
The method of claim 1 or 2, wherein the reflective or semi-transmissive layer is gold (Au), silver (Ag), copper (Cu), aluminum (Al), nickel (Ni), tungsten (W), titanium (Ti) ), Platinum (Pt), palladium (Pd), tin (Sn), lead (Pb), zinc (Zn), indium (In), cadmium (Cd), chromium (Cr) or molybdenum (Mo) A soft mold, characterized in that the single-layer film or multilayer film comprising a.
The soft mold of claim 2, wherein the transflective layer has a thickness of 0.01 nm to 300 nm.
The soft mold of claim 1, wherein the uneven portion comprises any one of a prism pattern, a lenticular pattern, a microlens pattern, and an embossed pattern.
The soft mold according to claim 1 or 2, wherein the uneven portion comprises a bead.
The soft mold according to claim 7, wherein the beads have a diameter of 1 µm to 200 µm and the degree of impregnation of the beads is 40% to 65%.
The soft mold according to claim 1 or 2, wherein the uneven portion is made of a material including a thermoplastic resin, a thermosetting resin or a photocurable resin.
The adhesive layer of claim 1 or 2, further comprising: an adhesive layer between the reflective layer and the first base film; And a second base film laminated on one surface of the reflective layer.
Forming an uneven portion having an irregular pattern on one surface of the first base film; And
Forming a reflective layer on the other surface of the first base film opposite to the one surface
Soft mold manufacturing method comprising a.
12. The method of claim 11, further comprising forming a transflective layer on an upper surface of the uneven portion before, after or simultaneously with forming the reflective layer.
The method of claim 12, wherein the reflective layer and the semi-transmissive layer are formed by electroless plating at the same time.
The method of claim 11, wherein the reflective layer or the semi-transmissive layer is formed by vacuum deposition, sputtering, chemical vapor deposition, electroless plating, electroplating, spray coating, or spin coating. .
13. The method of claim 11 or 12, wherein forming the reflective layer
Forming a reflective layer on the second base film; And
Bonding the second base film having the reflective layer to the other surface of the first base film such that the reflective layer faces the first base film through an adhesive layer;
Soft mold manufacturing method comprising a.
The method of claim 11 or 12, wherein in the step of forming an uneven portion having an irregular pattern on one surface of the first base film, the uneven portion is a soft mold manufacturing, characterized in that formed by direct molding the first base film Way.
The method of claim 11 or 12, wherein the step of forming an uneven portion having an irregular pattern on one surface of the first base film
Forming a pre-resin layer on the pattern master;
Hardening the pre-resin layer; And
Separating the cured pre-resin layer
Soft mold manufacturing method comprising a.
The method of claim 17, wherein in the forming of the pre-resin layer on the pattern master, the pre-resin layer comprises a thermoplastic resin, a thermosetting resin, or a photocurable resin.

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