KR20120033392A - Method for sealing wide frit using laser - Google Patents

Abstract

PURPOSE: A wide frit sealing method which uses a laser is provided to improve sealing quality of frit by supplying uniform energy to the entire width of the frit by projecting a laser beam on the frit. CONSTITUTION: A laser beam(L) is projected using a round-trip beam transfer mode and a linear beam transfer mode in a crossing direction. The laser beam is transferred inside of frit(30) in a zigzag mode. The center(LC) of the laser beam is located within the width(W) of the frit. A galvanometer scanner transfers the laser beam along a direction(B) crossing to a frit coated direction. A linear transfer unit linearly transfers the galvanometer scanner.

Description

Wide frit sealing method using a laser {Method for sealing wide frit using laser}

The present invention relates to a wide frit sealing method using a laser, and more particularly, to a wide frit sealing method using a laser to seal an organic light emitting device using a frit suitable for protecting an organic light emitting device sensitive to the surrounding environment.

Recently, display devices have been replaced by portable thin flat display devices. Among the flat panel display devices, the organic light emitting display device is a self-luminous display device, and has attracted attention as a next generation display device because of its advantages of having a wide viewing angle, excellent contrast, and fast response speed.

The organic light emitting display device has a problem of shortening the life of the organic light emitting device due to oxidation and peeling of the electrode material when the moisture or oxygen flows into the organic light emitting device from the surrounding environment, deteriorating the luminous efficiency, and deteriorating the color of the emitted light. Happens.

Therefore, in the manufacture of the organic light emitting display device, a sealing treatment is usually performed to isolate the organic light emitting element from the outside and prevent moisture from penetrating. As such a sealing treatment method, a method of improving the adhesion and sealing property between substrates disposed on the upper and lower sides of the organic light emitting element by using a frit as a sealing material has been devised.

As shown in FIG. 1, in the sealing method of the frit, the frit 30 is applied to the outside of a region of the substrate 10 on which the organic light emitting element 20 is disposed, and then the laser beam L is applied to the frit 30. ), The frit 30 is melted and cured to seal the inside of the region. At this time, the mask 40 having the through hole at the position corresponding to the portion where the frit 30 is formed is disposed between the substrate 10 and the laser source, and the organic light emitting element 20 is damaged by the laser beam L. FIG. Prevent it.

However, due to the demand for televisions and the like, the organic light emitting display device has a large area, and thus the width of the frit is widened and the thickness is thick. A problem arises in that the sealing method cannot process wide and thick frits.

In general, since a single laser beam having a Gaussian energy distribution in the cross section cannot supply uniform energy over the wider width of the frit, there is a problem in that a good sealing quality cannot be obtained over the entire width of the frit.

Accordingly, an object of the present invention is to solve such a conventional problem, and in order to supply uniform energy over the entire width of the frit in response to the widened width of the frit, the laser beam transfer method, the laser irradiated to the frit The present invention provides a wide frit sealing method using a laser capable of improving the sealing quality of a wide frit by adjusting the quantity and arrangement of beams or the energy distribution of a laser beam cross section.

In order to achieve the above object, in the wide frit sealing method using the laser of the present invention, the laser beam is reciprocated within the width of the frit along the direction intersecting the direction in which the frit is applied and at the same time. The beam is irradiated to the frit while being transported along the direction in which the frit is applied, and while the laser beam is irradiated to the frit, the center of the laser beam is located within the width of the frit.

In the wide frit sealing method using a laser according to the present invention, preferably, the laser beam is reciprocated by a galvanometer scanner in a direction intersecting with the direction in which the frit is applied, and the galvanometer scanner or frit The laser beam is transferred along the direction in which the frit is applied by a linear transfer unit for linearly transferring the coated substrate.

In addition, the wide frit sealing method using the laser of the present invention in order to achieve the above object, by arranging the center of the at least two laser beams spaced apart from each other in a direction crossing the direction in which the frit is applied The center of the laser beams is located within the width of the frit while irradiating the frit while transporting along the direction in which the frit is applied and irradiating the laser beams to the frit.

In the wide frit sealing method using the laser according to the present invention, preferably, four optical fibers each having a center disposed at four vertices of the rhombus are used, and the distance between the vertices of the rhombus is within the width of the frit. According to a section in which the frit is applied in a straight line or in a curve, the laser beam is transmitted through at least two of the four optical fibers to irradiate the frit.

In addition, the wide frit sealing method using the laser of the present invention in order to achieve the above object, the laser has a uniform cross-sectional energy distribution along the direction crossing the frit coated by the DOE (Diffractive Optical Element) lens The beam is irradiated to the frit while being transported along the direction in which the frit is applied.

In the wide frit sealing method using the laser according to the present invention, preferably, the laser beam has a rectangular cross-sectional shape.

In the wide frit sealing method using the laser according to the present invention, preferably, the laser beam has a linear cross-sectional shape.

In the wide frit sealing method using the laser according to the present invention, the width of the frit is preferably 2 mm or more.

According to the wide frit sealing method using the laser of the present invention, the laser beam is irradiated to the frit while supplying uniform energy over the entire width of the frit while transferring the laser beam in a zigzag manner so as to correspond to the width of the widened frit. The sealing quality of this wide frit can be improved.

In addition, according to the wide frit sealing method using the laser of the present invention, in order to correspond to the width of the widened frit, a plurality of laser beams are arranged to be spaced apart in the width direction of the frit, and the laser beam is irradiated to the frit over the entire width of the frit. By supplying uniform energy, the sealing quality of a wide frit can be improved.

In addition, according to the wide frit sealing method using the laser of the present invention, in order to correspond to the width of the widened frit, the frit is irradiated with a laser beam having a uniform cross-sectional energy distribution over the width of the frit, and thus uniform across the entire width of the frit. By supplying energy, the sealing quality of a wide frit can be improved.

1 is a view showing an example of a frit sealing method using a conventional laser.
2 is a view conceptually illustrating a wide frit sealing method using a laser according to a first embodiment of the present invention;
FIG. 3 conceptually illustrates a configuration for implementing the wide frit sealing method using the laser of FIG.
4 conceptually illustrates a wide frit sealing method using a laser according to a second embodiment of the present invention.
FIG. 5 conceptually illustrates a configuration for implementing the wide frit sealing method using the laser of FIG. 4; FIG.
6 is a conceptual view illustrating a wide frit sealing method using a laser according to a third embodiment of the present invention.
7 is a diagram conceptually illustrating a configuration for implementing the wide frit sealing method using the laser of FIG.

Hereinafter, embodiments of the frit sealing method using a laser according to the present invention will be described in detail with reference to the accompanying drawings.

In the present invention, a case in which the width of the frit 30 applied to the substrate 10 is about 2 mm or more will be described as an example. In the case of an organic light emitting display device used for a screen such as a mobile phone, the area is not so large, the width of the frit 30 for sealing the organic light emitting device 20 is only about 0.6 to 0.8mm. However, in the case of an organic light emitting display device used for a screen such as a television, the function of sealing the organic light emitting device 20 is more faithfully performed when the width of the frit 30 is about 2 mm or more due to the large area.

2 is a view conceptually illustrating a wide frit sealing method using a laser according to a first embodiment of the present invention, and FIG. 3 conceptually illustrates a configuration for implementing the wide frit sealing method using the laser of FIG. Drawing.

2 and 3, the wide frit sealing method using the laser according to the first embodiment of the present invention is characterized in that irradiating the frit while transferring the laser beam in a zigzag method.

In this embodiment, while irradiating the laser beam L to the frit 30, the laser beam L is reciprocated within the width W of the frit along the direction B intersecting with the direction in which the frit is applied. Simultaneously, the frit 30 is processed while transferring the laser beam L along the direction A in which the frit is applied. Preferably, the direction in which the laser beam L is reciprocated within the width W of the frit is a direction orthogonal to the direction A in which the frit is applied. Processing the frit 30 here means sealing the interior area partitioned by the frit 30 by irradiating the frit 30 with the laser beam L to melt and harden it.

As described above, when the reciprocating transfer and the linear transfer of the laser beam L are performed in the direction crossing each other, as shown in FIG. 2, the laser beam L is transferred in a zigzag manner in the frit 30.

It is preferable that the center LC of the laser beam is located within the width W of the frit while the laser beam L travels along the direction A in which the frit is applied while being transferred in a zigzag manner. Since the energy intensity of the center LC of the laser beam is stronger than the edge, it is advantageous in terms of the efficiency of melting the frit 30 that the center LC of the laser beam is located within the width W of the frit.

Reciprocating the laser beam L along a direction B intersecting with the direction in which the frit is applied may be implemented by the galvanometer scanner 60. The galvanometer scanner 60 is configured such that the reflection mirror is coupled to the rotation axis of the rotating motor, so that light incident on the reflection mirror can be irradiated to a desired position by the rotation of the motor. In general, using a pair of galvanometer scanner 60, the laser beam (L) can be irradiated to a desired position in the plane.

In this embodiment, the galvanometer scanner with low mechanical inertia is required because the laser beam L needs to be reciprocated repeatedly and quickly within the width W of the frit along the direction B intersecting with the direction in which the frit is applied. A reciprocating movement of the laser beam L is implemented using 60. In particular, since both directions are required to change direction with little acceleration / deceleration during the reciprocating movement, it is more helpful to use the galvanometer scanner 60 with less mechanical inertia.

On the other hand, the laser beam is transferred along the direction A in which the frit is applied, the linear transfer unit for linearly transferring the galvanometer scanner 60 itself or the straight line for linearly transferring the substrate 10 to which the frit 30 is applied. It can be implemented by a transfer unit. In order to linearly transfer the galvanometer scanner 60 mounted on the gantry structure or the substrate support 50 on which the substrate is mounted, a configuration well known to those skilled in the art such as a combination of a linear motor, a rotating motor and a ball screw Since the present invention can be employed, further detailed description is omitted.

In the wide frit sealing method using the laser according to the present embodiment configured as described above, the laser beam is irradiated to the frit while transferring the laser beam in a zigzag manner so as to correspond to the width of the widened frit, and thus uniform across the width of the frit. By supplying energy, the effect of improving the sealing quality of a wide frit can be obtained.

In addition, the wide frit sealing method using the laser according to the present embodiment configured as described above, by using the galvanometer scanner to reciprocate the laser beam in the direction crossing the direction in which the frit is applied within the width of the frit It is possible to reduce the processing time of the frit by changing the direction with little acceleration / deceleration section without being affected by mechanical inertia.

4 is a conceptual diagram illustrating a wide frit sealing method using a laser according to a second embodiment of the present invention, and FIG. 5 conceptually illustrates a configuration for implementing the wide frit sealing method using the laser of FIG. 4. Figure is shown.

4 and 5, the wide frit sealing method using the laser according to the second embodiment of the present invention is characterized in that at least two laser beams are irradiated to the frit by overlapping edge portions. In FIGS. 4 and 5, the members referred to by the same reference numerals as the members shown in FIGS. 2 and 3 have the same configuration and function, and detailed descriptions thereof will be omitted.

In the present embodiment, while irradiating the laser beam L to the frit 30, the center LC of at least two laser beams is spaced apart from each other along the direction B intersecting with the direction in which the frit is applied. The frit 30 is processed while transferring the laser beams L along the direction A in which the frits are applied. It is also possible to arrange three or more laser beams L to be spaced apart and irradiate the frit 30. In this embodiment, a pair of laser beams L are spaced apart to irradiate the frit as an example. .

While the pair of laser beams L runs along the direction A in which the frits are applied, the center LC of the laser beams is preferably located within the width W of the frit. As in the embodiment shown in Fig. 2, since the energy intensity of the center LC of the laser beam is stronger than the edge, it is the melting point of the frit 30 that the center LC of the laser beam is located within the width W of the frit. It is advantageous in terms of efficiency.

Transferring along the direction A in which the frit is applied while positioning the center LC of the pair of laser beams within the width W of the frit is generally arranged in a direction B intersecting with the direction in which the frit is applied. It can be implemented by a pair of optical fibers 70 to be. At this time, the center of the pair of optical fibers 70 is located within the width (W) of the frit. The pair of optical fibers 70 mounted on the gantry structure may be transferred using the linear transfer unit, or the substrate support 50 on which the substrate is mounted may be transferred using the linear transfer unit. Since the linear transfer unit can adopt a configuration well known to those skilled in the art such as a combination of a linear motor, a rotating motor and a ball screw, a further detailed description thereof will be omitted.

In addition, while transferring the center LC of the pair of laser beams within the width W of the frit along the direction A in which the frit is applied, as shown in FIG. It can be implemented by four optical fibers 70 disposed at each vertex. At this time, the distance between the vertices of the rhombus is preferably shorter than the width (W) of the frit.

When the four optical fibers 70 arranged as described above are used, the optical fibers 70 to which the laser beam L is transmitted may be selected and used according to a section in which the frit 30 is applied in a straight line or in a curve applied in a curve. have.

For example, as shown in (a) of FIG. 5, in the section in which the frit 30 is applied in the longitudinal direction of the straight line, the laser beam L is disposed through the optical fiber 70 having the center disposed at the R2 and R3 positions. Is transmitted to the frit 30, and does not transmit the laser beam through the optical fiber 70, the center of which is located at the positions R1 and R4. In addition, as shown in (b) of FIG. 5, in the section in which the frit 30 is applied in a curved line, the frit is transmitted by transmitting the laser beam L through the optical fiber 70 which is centered at the R1 and R2 positions. 30), the laser beam is not transmitted through the optical fiber 70, which is centered at the R3 and R4 positions. In addition, as shown in (c) of FIG. 5, in the section in which the frit 30 is applied in the horizontal direction among the straight lines, the laser beam L is transmitted through the optical fiber 70 having the center disposed at the R1 and R4 positions. Irradiates to the frit 30, and does not transmit the laser beam through the optical fiber 70 having a center disposed at R2 and R3 positions. In addition, the optical fiber 70 to which the laser beam L is transmitted may be used in various combinations according to the shape (straight or curved) or the direction (vertical or horizontal) to which the frit 30 is applied.

In view of the sealing quality of the frit 30, the frit 30 is melted and cured while supplying uniform energy (energy having a flattop distribution) along the direction B perpendicular to the direction in which the frit is applied. Most preferably. Therefore, when the frit 30 is processed using a pair of optical fibers 70, the frit 30 is applied depending on whether the frit 30 is applied in a vertical direction in a straight line, in a horizontal direction in a straight line or in a curve. There arises a case where the pair of optical fibers 70 must be rotated such that the imaginary line connecting the centers of the pair of optical fibers 70 is orthogonal to the direction A in which the frits are applied. However, as described with reference to FIG. 5, when four optical fibers 70 whose centers are disposed at four vertices of the rhombus are used, the laser beam L is transmitted according to the shape or direction in which the frit 30 is applied. Since the optical fiber 70 can be selected and used, there is no need to rotate the optical fiber 70.

In the wide frit sealing method using the laser according to the present embodiment configured as described above, in order to correspond to the width of the widened frit, a plurality of laser beams are arranged to be spaced apart in the width direction of the frit, and the frit is irradiated with the laser beam. By supplying uniform energy over the entire width, the effect of improving the sealing quality of the wide frit can be obtained.

In addition, in the wide frit sealing method using the laser according to the present embodiment configured as described above, the optical fiber is rotated by selecting and using the optical fiber to which the laser beam is transmitted according to the shape or direction in which the frit is applied among the four optical fibers. Since there is no need to install the components of the structure, the effect of simplifying the overall structure of the apparatus can be obtained.

6 is a conceptual diagram illustrating a wide frit sealing method using a laser according to a third embodiment of the present invention, and FIG. 7 conceptually illustrates a configuration for implementing the wide frit sealing method using the laser of FIG. 6. Figure is shown.

6 and 7, the wide frit sealing method using the laser according to the third embodiment of the present invention is characterized in that the frit is irradiated with a laser beam having a uniform cross-sectional energy distribution. 6 and 7, members referred to by the same reference numerals as the members shown in Figures 2 to 5 have the same configuration and function, detailed description of each of them will be omitted.

In the present embodiment, the frit uses a laser beam L in which the cross-sectional energy distribution is homogenized along the direction B intersecting with the direction in which the frit is applied by the DOE (Diffractive Optical Element) lens 80. The frit 30 is irradiated and processed while being transported along the coated direction A. FIG.

Here, the DOE (Diffractive Optical Element) lens 80 converts a laser beam whose cross-sectional energy distribution is a Gaussian distribution into a laser beam having a homogeneous energy distribution or a quasi-homogeneous energy distribution. Optical components. The mechanism for converting a Gaussian beam into a beam with a homogeneous or quasi-uniform energy distribution is called a homogenizer, and the DOE lens 80 is one of the homogenizers.

As shown in (a) of FIG. 7, the laser beam L may have a rectangular cross-sectional shape by the DOE lens 80, and as shown in (b) of FIG. As a result, the laser beam L may have a linear cross-sectional shape.

In the wide frit sealing method using the laser according to the present embodiment configured as described above, the frit is irradiated with a laser beam having a uniform cross-sectional energy distribution over the width of the frit to correspond to the width of the frit. By supplying uniform energy over, the effect of improving the sealing quality of a wide frit can be obtained.

The scope of the present invention is not limited to the above-described embodiments and modifications, but may be embodied in various forms of embodiments within the scope of the appended claims. Without departing from the gist of the invention claimed in the claims, it is intended that any person skilled in the art to which the present invention pertains falls within the scope of the claims described in the present invention to various extents which can be modified.

10: substrate
20: organic light emitting device
30: frit
40: mask
50: substrate support
60: galvanometer scanner
70: optical fiber
L: laser beam

Claims (8)

Irradiating the laser beam to the frit while reciprocating within the width of the frit along the direction crossing the direction in which the frit is applied, and simultaneously transporting the laser beam along the direction in which the frit is applied,
While the laser beam is irradiated to the frit, the center of the laser beam is located within the width of the frit wide frit sealing method using a laser. The method of claim 1,
The laser beam is reciprocated by a galvanometer scanner along a direction intersecting the direction in which the frit is applied,
And the laser beam is transferred along the direction in which the frit is applied by a linear transfer unit for linearly transferring the galvanometer scanner or the substrate on which the frit is applied. The centers of the at least two laser beams are spaced apart from each other along a direction crossing the direction in which the frit is applied, and the laser beams are irradiated to the frit while being transported in the direction in which the frit is applied,
The center of the laser beams is located within the width of the frit while the laser beams are irradiated to the frit. The method of claim 3,
4 optical fibers centered at 4 vertices of the rhombus,
The distance between the vertices of the rhombus is within the width of the frit,
According to a section in which the frit is applied in a straight line or in a curve applied, a wide frit sealing method using a laser, characterized in that to irradiate the frit by transmitting a laser beam through at least two optical fibers of the four optical fibers. The laser is characterized by irradiating a laser beam having a uniform cross-sectional energy distribution along the direction in which the frit is applied by a DOE (Diffractive Optical Element) lens to the frit while transferring it in the direction in which the frit is applied. Wide frit sealing method. The method of claim 5,
The laser beam is a wide frit sealing method using a laser, characterized in that having a rectangular cross-sectional shape. The method of claim 5,
The laser beam is a wide frit sealing method using a laser, characterized in that having a linear cross-sectional shape. The method of claim 1, wherein
Wide frit sealing method using a laser, characterized in that the width of the frit is 2mm or more.

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