KR20110070876A - 홈을 갖는 실리콘 기판 상의 본딩 - Google Patents
홈을 갖는 실리콘 기판 상의 본딩 Download PDFInfo
- Publication number
- KR20110070876A KR20110070876A KR1020117008761A KR20117008761A KR20110070876A KR 20110070876 A KR20110070876 A KR 20110070876A KR 1020117008761 A KR1020117008761 A KR 1020117008761A KR 20117008761 A KR20117008761 A KR 20117008761A KR 20110070876 A KR20110070876 A KR 20110070876A
- Authority
- KR
- South Korea
- Prior art keywords
- adhesive
- transducer
- membrane
- grooves
- microns
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
Images
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N30/00—Piezoelectric or electrostrictive devices
- H10N30/20—Piezoelectric or electrostrictive devices with electrical input and mechanical output, e.g. functioning as actuators or vibrators
- H10N30/204—Piezoelectric or electrostrictive devices with electrical input and mechanical output, e.g. functioning as actuators or vibrators using bending displacement, e.g. unimorph, bimorph or multimorph cantilever or membrane benders
- H10N30/2047—Membrane type
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N30/00—Piezoelectric or electrostrictive devices
- H10N30/80—Constructional details
- H10N30/88—Mounts; Supports; Enclosures; Casings
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the groups H01L21/18 - H01L21/326 or H10D48/04 - H10D48/07 e.g. sealing of a cap to a base of a container
- H01L21/52—Mounting semiconductor bodies in containers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N30/00—Piezoelectric or electrostrictive devices
- H10N30/01—Manufacture or treatment
- H10N30/07—Forming of piezoelectric or electrostrictive parts or bodies on an electrical element or another base
- H10N30/072—Forming of piezoelectric or electrostrictive parts or bodies on an electrical element or another base by laminating or bonding of piezoelectric or electrostrictive bodies
- H10N30/073—Forming of piezoelectric or electrostrictive parts or bodies on an electrical element or another base by laminating or bonding of piezoelectric or electrostrictive bodies by fusion of metals or by adhesives
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
- Y10T156/10—Methods of surface bonding and/or assembly therefor
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/42—Piezoelectric device making
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Particle Formation And Scattering Control In Inkjet Printers (AREA)
- Pressure Sensors (AREA)
- Micromachines (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US9818708P | 2008-09-18 | 2008-09-18 | |
| US61/098,187 | 2008-09-18 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| KR20110070876A true KR20110070876A (ko) | 2011-06-24 |
Family
ID=42006580
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020117008761A Ceased KR20110070876A (ko) | 2008-09-18 | 2009-09-18 | 홈을 갖는 실리콘 기판 상의 본딩 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US8853915B2 (enExample) |
| EP (1) | EP2332169B1 (enExample) |
| JP (1) | JP2012502824A (enExample) |
| KR (1) | KR20110070876A (enExample) |
| CN (1) | CN102165574A (enExample) |
| WO (1) | WO2010033774A2 (enExample) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8853915B2 (en) | 2008-09-18 | 2014-10-07 | Fujifilm Dimatix, Inc. | Bonding on silicon substrate having a groove |
| CN110902648B (zh) * | 2019-12-06 | 2023-01-17 | 太原科技大学 | 聚合物电解质与金属的超声辅助阳极键合装置及其方法 |
| WO2021118605A1 (en) * | 2019-12-13 | 2021-06-17 | Hewlett-Packard Development Company, L.P. | Fluidic device die |
| WO2025153968A1 (en) * | 2024-01-16 | 2025-07-24 | Luxottica S.R.L. | Hinge for eyeglass frame, frame and eyeglass comprising such a hinge, and method for assembling such a hinge |
Family Cites Families (27)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS55109668A (en) * | 1980-01-07 | 1980-08-23 | Ricoh Co Ltd | Vibrator of ink jet device |
| JP2712602B2 (ja) * | 1989-08-10 | 1998-02-16 | 株式会社村田製作所 | 圧電共振子の製造方法 |
| DE69032666T2 (de) * | 1990-02-09 | 1999-03-11 | Toyo Communication Equipment Co., Ltd., Kanagawa | Eingekapselter piezoelektrischer Resonator |
| JP3052336B2 (ja) * | 1990-05-29 | 2000-06-12 | セイコーエプソン株式会社 | インクジェットヘッド |
| JP3175301B2 (ja) * | 1992-06-03 | 2001-06-11 | セイコーエプソン株式会社 | インクジェット記録ヘッド及びインクジェット記録ヘッドの製造方法 |
| US6688718B1 (en) * | 1999-07-02 | 2004-02-10 | Hewlett-Packard Development Company, L.P. | Heat transfer device for an inkjet printer |
| JP4361658B2 (ja) * | 2000-02-14 | 2009-11-11 | 富士通マイクロエレクトロニクス株式会社 | 実装基板及び実装方法 |
| JP2002210965A (ja) | 2001-01-17 | 2002-07-31 | Seiko Epson Corp | ノズルプレート及びインクジェット式記録ヘッド並びにインクジェット式記録装置 |
| US6856075B1 (en) * | 2001-06-22 | 2005-02-15 | Hutchinson Technology Incorporated | Enhancements for adhesive attachment of piezoelectric motor elements to a disk drive suspension |
| JP2003157565A (ja) * | 2001-11-21 | 2003-05-30 | Ricoh Co Ltd | 波面収差補正ミラー及び該ミラーを用いた光ディスク装置 |
| US6794958B2 (en) * | 2002-07-25 | 2004-09-21 | Agilent Technologies, Inc. | Method of fabricating a semiconductor device and an apparatus embodying the method |
| US7266868B2 (en) * | 2003-06-30 | 2007-09-11 | Brother Kogyo Kabushiki Kaisha | Method of manufacturing liquid delivery apparatus |
| JP2005104038A (ja) * | 2003-09-30 | 2005-04-21 | Fuji Photo Film Co Ltd | 吐出ヘッド及び液吐出装置 |
| WO2005037558A2 (en) * | 2003-10-10 | 2005-04-28 | Dimatix, Inc. | Print head with thin membrane |
| US7048361B2 (en) * | 2003-11-05 | 2006-05-23 | Xerox Corporation | Ink jet apparatus |
| US20050247990A1 (en) * | 2004-05-05 | 2005-11-10 | Ming-Te Cheng | Image sensor packages and method of assembling the same |
| JP2006076128A (ja) * | 2004-09-09 | 2006-03-23 | Fuji Xerox Co Ltd | インクジェット記録ヘッド |
| US7448732B2 (en) * | 2004-09-30 | 2008-11-11 | Fujifilm Corporation | Liquid ejection head and manufacturing method thereof |
| ATE502893T1 (de) * | 2004-10-21 | 2011-04-15 | Fujifilm Dimatix Inc | Ätzverfahren mit verwendung eines opfersubstrats |
| JP4520317B2 (ja) * | 2005-01-25 | 2010-08-04 | パナソニック株式会社 | 超音波探触子、超音波診断装置及び超音波探傷装置 |
| JP4929598B2 (ja) * | 2005-02-07 | 2012-05-09 | 富士ゼロックス株式会社 | 液滴吐出ヘッド、及び、液滴吐出装置 |
| WO2007008986A1 (en) * | 2005-07-13 | 2007-01-18 | Fujifilm Dimatix, Inc. | Method and apparatus for scalable droplet ejection manufacturing |
| US7683524B2 (en) * | 2005-08-31 | 2010-03-23 | Xinetics, Inc. | Multichannel, surface parallel, zonal transducer system |
| US20070120896A1 (en) * | 2005-11-30 | 2007-05-31 | Xerox Corporation | Drop generator |
| US20070263038A1 (en) * | 2006-05-12 | 2007-11-15 | Andreas Bibl | Buried heater in printhead module |
| US20110250403A1 (en) * | 2008-09-18 | 2011-10-13 | Fujifilm Corporation | Bonding on silicon substrate |
| US8853915B2 (en) | 2008-09-18 | 2014-10-07 | Fujifilm Dimatix, Inc. | Bonding on silicon substrate having a groove |
-
2009
- 2009-09-18 US US12/562,618 patent/US8853915B2/en active Active
- 2009-09-18 EP EP09815247.3A patent/EP2332169B1/en active Active
- 2009-09-18 JP JP2011527984A patent/JP2012502824A/ja active Pending
- 2009-09-18 WO PCT/US2009/057433 patent/WO2010033774A2/en not_active Ceased
- 2009-09-18 CN CN200980137309.2A patent/CN102165574A/zh active Pending
- 2009-09-18 KR KR1020117008761A patent/KR20110070876A/ko not_active Ceased
Also Published As
| Publication number | Publication date |
|---|---|
| WO2010033774A2 (en) | 2010-03-25 |
| EP2332169A4 (en) | 2013-05-29 |
| EP2332169B1 (en) | 2016-02-24 |
| CN102165574A (zh) | 2011-08-24 |
| WO2010033774A3 (en) | 2010-06-03 |
| US20100066206A1 (en) | 2010-03-18 |
| JP2012502824A (ja) | 2012-02-02 |
| EP2332169A2 (en) | 2011-06-15 |
| HK1157936A1 (zh) | 2012-07-06 |
| US8853915B2 (en) | 2014-10-07 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PA0105 | International application |
St.27 status event code: A-0-1-A10-A15-nap-PA0105 |
|
| PG1501 | Laying open of application |
St.27 status event code: A-1-1-Q10-Q12-nap-PG1501 |
|
| R17-X000 | Change to representative recorded |
St.27 status event code: A-3-3-R10-R17-oth-X000 |
|
| E13-X000 | Pre-grant limitation requested |
St.27 status event code: A-2-3-E10-E13-lim-X000 |
|
| P11-X000 | Amendment of application requested |
St.27 status event code: A-2-2-P10-P11-nap-X000 |
|
| P13-X000 | Application amended |
St.27 status event code: A-2-2-P10-P13-nap-X000 |
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| PA0201 | Request for examination |
St.27 status event code: A-1-2-D10-D11-exm-PA0201 |
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| E902 | Notification of reason for refusal | ||
| PE0902 | Notice of grounds for rejection |
St.27 status event code: A-1-2-D10-D21-exm-PE0902 |
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| E601 | Decision to refuse application | ||
| PE0601 | Decision on rejection of patent |
St.27 status event code: N-2-6-B10-B15-exm-PE0601 |
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| P22-X000 | Classification modified |
St.27 status event code: A-2-2-P10-P22-nap-X000 |
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| P22-X000 | Classification modified |
St.27 status event code: A-2-2-P10-P22-nap-X000 |
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| P22-X000 | Classification modified |
St.27 status event code: A-2-2-P10-P22-nap-X000 |