KR20110067295A - Apparatus to supply iso-propyl alcohol - Google Patents

Abstract

PURPOSE: An iso-propyl alcohol supply unit is provided to prevent the decrease of the temperature of an isopropyl alcohol which is transferred along a transfer pipe by heating a part of the transfer pipe through at least one heating unit. CONSTITUTION: A transfer pipe(140) interlinks between a supply unit(130) and a wafer dry unit(120). The transfer pipe transfers iso-propyl alcohol which is supplied to a supply unit to the wafer dry unit. A heating unit(150) heats at least the at least part of the transfer pipe. The temperature of the gas isopropyl alcohol is transferred along the transfer pipe and is maintained. The heating unit comprises a unit and a heating unit(155) heating a transfer pipe which is wound around the unit body .

Description

Apparatus to Supply Iso-propyl Alcohol}

The present invention relates to an isopropyl alcohol supply device, and more particularly, by heating at least a portion of the transfer pipe, it is possible to prevent the temperature of the isopropyl alcohol in the gaseous state transferred along the transfer pipe from suddenly falling. Isopropyl alcohol supply apparatus.

In general, in order to manufacture a semiconductor device, various processes such as lithography, deposition, and etching are repeatedly performed. During these processes, particles, metal impurities, organics, and the like remain on the substrate (eg, silicon wafer). Since such contaminants adversely affect product yield and reliability, a cleaning process for removing contaminants remaining on a substrate is performed in a semiconductor manufacturing process, and a drying process for a wafer is performed after the cleaning process.

Conventionally known drying methods include spin drying, drying using Marangoni effect by isopropyl alcohol (IPA, Iso-propyl Alcohol). Among them, the drying method using isopropyl alcohol pulls the wafer vertically in deionized water (DIW) and simultaneously blows isopropyl alcohol and nitrogen gas (N2) near the gas-liquid interface on the wafer surface. The method of drying the wafer by generating the effect.

In general, isopropyl alcohol used in the drying process is provided in a gaseous state from an isopropyl alcohol supply. Here, the isopropyl alcohol supply device is configured such that the liquid isopropyl alcohol can be vaporized by a direct / indirect heating method using a heater or bubbling by supplying a gas.

1 is a view schematically showing the configuration of an isopropyl alcohol supply apparatus according to a conventional embodiment.

As shown therein, the isopropyl alcohol supply device 1 according to the conventional embodiment reacts the nitrogen gas (N2) with the isopropyl alcohol (5a) in a liquid state to give a gaseous isopropyl alcohol (5b). Supply unit 30 for generating a wafer, a wafer drying unit 20 for drying the wafer W by the gaseous isopropyl alcohol 5b generated by the supply unit 30, the supply unit 30 and the wafer drying It comprises a transfer pipe 40 of the pipe form for transferring the isopropyl alcohol (5b) in the gas state by connecting the portion 20.

By this structure, the isopropyl alcohol 5b gasified by the predetermined process in the supply part 30 is injected into the drying space 20S of the wafer drying part 20 through the transfer pipe 40, and, thereby, a drying space. The wafer W disposed at 20S can be dried by the above-described Marangoni effect.

However, in the isopropyl alcohol supply device 1 according to the conventional embodiment, when the isopropyl alcohol 5b in the gas state is transferred along the transfer pipe 40, Although the gaseous state can be maintained, the farther away from the inlet portion of the transfer pipe 40, the temperature of the gaseous isopropyl alcohol 5b is lowered, so that the gaseous isopropyl alcohol 5b can be changed into a liquid state. As a result, not only isopropyl alcohol 5b of high purity gas supplied to the drying space 20S of the wafer drying unit 20, but also condensation of the isopropyl alcohol 5b liquefied in the transfer pipe 40. There is a problem that can occur.

Thus, when gaseous isopropyl alcohol is transferred along the delivery pipe, it is necessary to develop a new structure of isopropyl alcohol supply device capable of minimizing the temperature drop of the gaseous isopropyl alcohol.

An object of the present invention, by heating at least a portion of the transfer pipe can prevent the temperature of the gaseous isopropyl alcohol to be transferred along the transfer pipe to suddenly lower the temperature, thereby isopropyl in the gaseous state in the wafer drying unit It is to provide an isopropyl alcohol supply device that allows the drying of the wafer to proceed reliably by providing alcohol.

In addition, an object of the present invention, isopropyl alcohol which can prevent the phenomenon of the condensation of gaseous isopropyl alcohol in the delivery pipe by preventing the temperature of the gaseous isopropyl alcohol to be transported along the delivery pipe suddenly lowered It is to provide a supply device.

An isopropyl alcohol supply apparatus according to an embodiment of the present invention, the supply unit for converting and supplying the liquid isopropyl alcohol (IPA, Iso-Propyl Alcohol) to gaseous isopropyl alcohol, and drying the wafer (wafer) A transfer tube connecting the wafer drying unit on which the operation is performed to transfer the gaseous isopropyl alcohol supplied by the supply unit to the wafer drying unit; And at least one heating unit coupled to at least a portion of the transfer pipe and maintaining the temperature of the gaseous isopropyl alcohol transferred along the transfer pipe by heating the at least some section. By heating at least a portion of the transfer pipe by the gas temperature isopropyl alcohol to be transported along the transfer pipe can be prevented from rapidly falling temperature, thereby providing a gaseous isopropyl alcohol in the wafer drying unit Allows the drying of the wafer to proceed reliably.

Here, the heating unit, the unit body is wound at least a portion of the transfer pipe along the circumference of the outer surface; And a heating unit coupled to the unit body to surround the transfer tube wound on the unit body, and heating the transfer tube wound on the unit body. Since the area can be increased, the heating effect by the hiti unit can be improved.

The unit body may be provided in a cylindrical shape and may be made of aluminum having excellent thermal conductivity.

The unit body is provided in the hollow hollow shape, and thus can reduce the overall weight as well as the cost required for manufacturing.

Any one of an outer surface of the unit body and an inner surface of the heating unit is provided with a recess formed in a spiral direction and provided in a spiral direction, and the transfer pipe is wound around the unit body to be inserted into the recess, thereby increasing heating efficiency. In addition, the unit body and the heating unit can be easily coupled and separated.

The heating unit may be provided in the form of a coil (coil) to be heated when the current is applied to heat the transfer pipe, thus providing high heat to the transfer pipe.

The heating unit, the temperature sensing sensor for sensing the temperature of the isopropyl alcohol of the gas state to be transferred along the transfer pipe; And a control unit for adjusting the amount of current applied to the heating unit according to the sensing information of the temperature sensor, thereby improving the efficiency of the heating operation by the heating unit.

The heating unit may further include a heat insulating part coupled to surround an outer surface of the heating part to block heat generated from the heating part from being discharged to the outside.

According to an embodiment of the present invention, by heating at least a portion of the transfer pipe by the at least one heating unit, it is possible to prevent the temperature of the gas isopropyl alcohol that is transferred along the transfer pipe to be suddenly lowered, Accordingly, by providing gaseous isopropyl alcohol in the wafer drying unit, drying of the wafer can be reliably performed.

In addition, according to an embodiment of the present invention, it is possible to prevent the gas isopropyl alcohol condensed in the conveying tube to prevent the condensation of the gaseous isopropyl alcohol in the conveying tube to prevent the phenomenon of condensation. .

Hereinafter, configurations and applications according to embodiments of the present invention will be described in detail with reference to the accompanying drawings. The following description is one of several aspects of the invention that can be claimed, and the following description forms part of the detailed description of the invention.

In the following description, well-known functions or constructions are not described in detail for the sake of clarity and conciseness.

Figure 2 is a view showing the configuration of the isopropyl alcohol supply apparatus according to an embodiment of the present invention, Figure 3 is an exploded perspective view schematically showing the configuration of the heating unit shown in Figure 2, Figure 4 is Figure 2 It is sectional drawing of the heating unit shown in FIG.

2, the isopropyl alcohol supply apparatus 100 according to an embodiment of the present invention that can be applied as a cleaning device, the cleaning tank 110 for performing a cleaning operation for the wafer (W, wafer), The wafer drying unit 120 that performs the drying operation on the wafer W and the liquid isopropyl alcohol 105a (IPA, Iso-propyl alcohol) are converted into gaseous isopropyl alcohol 105b and then supplied. It is coupled to the supply unit 130, the transfer tube 140 for transferring the isopropyl alcohol 105b in the gas state from the supply unit 130 to the wafer drying unit 120, and is coupled to a partial section of the transfer tube 140 It includes a plurality of heating units 150 for heating the tube 140, thereby raising / maintaining the temperature of the isopropyl alcohol 105b of the gas state to be transferred along the transfer tube 140.

First, the cleaning tank 110 is a container in which the cleaning liquid 111 for cleaning the wafer W is formed, and is formed in a size suitable for accommodating the wafer W, and the shape and structure of the cleaning tank 110 are required. And can be variously changed according to design specifications. In addition, the cleaning tank 110 is provided with a material that does not react with the cleaning liquid 111, the material of the cleaning tank 110 may be appropriately changed according to the required conditions. For example, the cleaning tank 110 of the present embodiment may be made of quartz, and of course, other materials may be applied.

On the other hand, the wafer drying unit 120 is disposed to be selectively separated on the cleaning tank 110, the drying space 120S for drying the wafer (W), the cleaning process is completed in the wafer drying unit 120 ) Is formed. The inside of the wafer drying unit 120 is equipped with a nozzle 149 connected to the end of the transfer pipe 140 to be described later, the gas isopropyl alcohol 105b transferred along the transfer pipe 140 to dry the wafer It may be uniformly sprayed into the drying space 120S of the part 120.

In addition, in order to dry process the wafer W cleaned in the cleaning tank 110, the wafer W must be elevated to the drying space 120S of the wafer drying unit 120. In this embodiment, this role is illustrated in FIG. 2. It is performed by the lift member 115 shown in.

When the wafer W of FIG. 2 is viewed in a direction transverse thereto (arrow 'A' direction), dozens of wafers W are arranged side by side, and these wafers W are loaded onto the lift member 115. Keeps). The lift member 115 is elevated when the cleaning of the wafers W is completed, so that the entire cleaned wafer W may be transferred to the drying space 120S of the wafer drying unit 120.

Meanwhile, as illustrated in FIG. 2, the supply unit 130 includes a storage tank 131 in which isopropyl alcohol 105a in a liquid state is stored, and supplies nitrogen gas N2 to the storage tank 131. The nitrogen gas supply pipe 133 and the end part of the transfer pipe 140 mentioned later are arrange | positioned.

In the storage tank 131, isopropyl alcohol 105a, which is used as a drying agent for drying the wafer W in this embodiment, is accommodated in a liquid state. When nitrogen gas N2 is supplied to the liquid isopropyl alcohol 105a through the nitrogen gas supply pipe 133, a bubbling action between the liquid isopropyl alcohol 105a and the nitrogen gas N2 is provided. Is actively generated, gaseous isopropyl alcohol 105b is generated, and the generated gaseous isopropyl alcohol 105b is separated from the liquid isopropyl alcohol 105a and drawn into the delivery pipe 140. do.

However, in order to actively perform such a bubbling action, it is preferable that the liquid isopropyl alcohol 105a maintain a high temperature at a predetermined level. For this purpose, although not illustrated, the storage tank 131 is predetermined in distilled water of the bath. It may be provided to be partially submerged, a heating device (not shown) for heating the distilled water of the bath may be provided in the vicinity of the bath.

Meanwhile, as shown in FIG. 2, the transfer pipe 140 connects the supply unit 130 and the wafer drying unit 120 so that the gas isopropyl alcohol 105b generated in the supply unit 130 is a wafer. It may be supplied to the drying unit 120.

As shown in FIG. 2, the transfer tube 140 includes an integrated tube 141 having one end disposed at a supply unit, and two branches formed from an inner tube 141 branched from the integrated tube 141. Two branch pipes 145 are respectively connected with the nozzle 149.

Due to the structure of the transfer pipe 140, the gaseous isopropyl alcohol 105b introduced into the inlet portion of the integrated pipe 141 is branched to the branch pipe 145, and then the two branch pipes 145 Through the nozzle 149 coupled to the end, it may be uniformly sprayed into the drying space 120S of the wafer drying unit 120.

However, when the isopropyl alcohol 105b in the gaseous state is moved along the transfer pipe 140, the temperature of the isopropyl alcohol 105b in the gaseous state may be drastically lowered due to ambient conditions. A condensation phenomenon may occur in which the gas isopropyl alcohol 105b changes to a liquid state within the 140. Such condensation may inhibit the smooth transfer of the gaseous isopropyl alcohol 105b in the delivery pipe 140, and in particular, may inhibit the uniform distribution of the gaseous isopropyl alcohol 105b in the branched region. Thereby, the wafer W drying operation in the wafer drying unit 120 may be prevented from proceeding reliably.

Thus, in the present embodiment, the temperature of the isopropyl alcohol 105b in the gaseous state that is coupled to the transfer pipe 140 and is heated in the transfer pipe 140 by heating the transfer pipe 140, that is, It further includes a plurality of heating unit 150 to prevent a sudden temperature drop.

Heating unit 150 of the present embodiment, as schematically shown in Figure 2, may be coupled to a total of three parts of the transfer pipe (140). That is, the integrated pipe 141 and the two branch pipes 145 may be respectively coupled to locally heat the transfer pipe 140. However, the arrangement structure is not limited thereto, and a greater number of heating units 150 may be coupled to the transfer pipe 140, or a smaller number of heating units 150 may be integral pipes 141 or minutes. Of course, the engine 145 may be selectively coupled to the engine 145.

Referring to the configuration of the heating unit 150, the heating unit 150 of the present embodiment, as shown in Figures 3 and 4, a unit body in which a portion of the transfer pipe 140 is wound in the circumferential direction ( 151 and a heating unit 155 coupled to an outer surface of the unit body 151 to surround the transfer tube 140 wound around the unit body 151 to substantially heat the winding portion of the transfer tube 140. do.

Here, the reason for winding the transfer pipe 140 in the spiral direction along the outer surface of the unit body 151 is that the length of the transfer pipe 140 in contact with the unit body 151 is longer than that of the transfer pipe 140. This is to improve the heating effect.

The unit body 151 may have a cylindrical shape as shown in FIG. 3, but may be provided in a hollow shape. Therefore, the work of winding the transfer pipe 140 to the unit body 151 may be easily performed by the shape, and the internal structure may be reduced, thereby reducing the amount of material required for manufacturing and thus the cost. Savings can occur.

The unit body 151 may be made of aluminum having excellent thermal conductivity. Therefore, the unit body 151 may maintain a high temperature by the heat transmitted by the heating unit 155, thereby maintaining the temperature of the transfer pipe 140 in which the unit body 151 is partially in contact with the unit body 151. That is, since the unit body 151 is made of aluminum, it is possible to improve the heating efficiency of the heating unit 155 to be described later.

However, the material of the unit body 151 is not limited to aluminum, and it is natural that the unit body 151 may be formed of another material if it has excellent thermal conductivity.

On the other hand, although not shown, the inner wall of the unit body 151 may be combined with a heat insulating layer (not shown) to prevent the release of heat. Alternatively, a liquid such as hot water may be filled in the hollow portion of the unit body 151 to exert a heat insulating and insulating effect.

In addition, the outer surface of the unit body 151 in which the transport pipe 140 is wound, the depression 153 may be recessed so that the transport pipe 140 can be inserted. The depression 153 serves to guide the winding path of the transport pipe 140 so that it can be regularly wound when the transport pipe 140 is wound on the unit body 151, and also as shown in FIG. Likewise, the transfer pipe 140 is introduced into the depression 153 so that the coupling of the heating unit 155 and the unit body 151 to be described later can be easily performed.

However, in the present embodiment, the depression 153 is described above as being formed from the outer surface of the unit body 151, but is not limited thereto, and may be formed on the inner surface of the heating unit 155.

On the other hand, the heating unit 155, as a portion for substantially heating the transfer pipe 140, although shown schematically in the drawing, may be provided in the form of a coil (coil) for generating heat when the current is applied. The heating unit 155 also heats the transfer pipe 140, but as described above, the unit body 151, which has excellent thermal conductivity, is also heated so that the unit body 151 assists in maintaining the temperature of the transfer pipe 140. It is possible to prevent the temperature of the isopropyl alcohol 105b of the gas state to be transported along the inside of the transfer pipe 140 to be lowered.

The heating unit 155 in the form of a coil has an advantage of appropriately adjusting the amount of heat transferred from the heating unit 155 to the transfer pipe 140 according to the amount of current applied. The temperature at which the isopropyl alcohol 105b in the gas state is liquefied is approximately 82 ° C., and thus, when the temperature is lower than that, the condensation phenomenon occurs. Since it is provided as a has the advantage that can improve the heating efficiency compared to other types of heating unit 155.

On the other hand, the heating unit 150 of the present embodiment, in addition to the above-described configuration, the temperature sensing for detecting the temperature of the isopropyl alcohol 105b of the gas state that is mounted on the transfer pipe 140 is transferred along the transfer pipe 140 The controller may further include a controller (not shown) for adjusting the amount of current applied to the heating unit 155 according to the sensor (not shown) and the sensing information of the temperature sensor.

For example, depending on the surrounding conditions, the temperature of the gas isopropyl alcohol 105b introduced into the transfer pipe 140 from the supply unit 130 may be different, and accordingly, the amount of heat generated by the heating unit 150 may also be different. have. Therefore, the temperature sensor first detects the temperature of the isopropyl alcohol 105b in the gas state transported along the transport pipe 140, and then transmits sensing information to the controller, and the controller heats 155 based on the sensing information. The amount of current applied to can be adjusted appropriately. As a result, power consumption can be minimized and cost savings can be generated.

On the other hand, although not shown, the heating unit 150 of the present embodiment is coupled to surround the outer surface of the heating unit 155 is a heat insulating unit (not shown) to block the heat generated from the heating unit 155 to the outside It may further include.

The heat insulation part can prevent the worker from being in contact with the high temperature heating part 155 by preventing the high temperature heating part 155 from being exposed to the outside while improving the heating efficiency of the heating unit 150. Safety accidents can be prevented from occurring.

Hereinafter, an operation process of the isopropyl alcohol supply device 100 having such a configuration will be described.

First, nitrogen gas (N2) is injected into the reservoir 131 of the supply unit 130 in which the isopropyl alcohol 105a in the liquid state is stored and bubbling the isopropyl alcohol 105a and the nitrogen gas N2 in the liquid state ( bubbling). Then, the isopropyl alcohol 105a in the liquid state is converted into the isopropyl alcohol 105b in the gas state, and the converted isopropyl alcohol 105b is introduced into the transfer pipe 140.

Subsequently, the gaseous isopropyl alcohol 105b is supplied to the wafer drying unit 120 after passing through the transfer tube 140, wherein the isopropyl alcohol 105b of the gas state passes through the transfer tube 140. Heated by the heating unit 150 coupled to the 141 and the two branch pipes 145, respectively, isopropyl alcohol 105b, which is a gaseous state and a high temperature, may be injected into the wafer drying unit 120.

In more detail, some sections of the transfer pipe 140 maintain the wound state on the unit body 151 of the heating unit 150, and the heating unit 155 of the heating unit 150 is wound around the transfer pipe ( Some sections of the 140 are heated, wherein the isopropyl alcohol 105b of the gaseous state passing through the inside of the gaseous state is heated by the transporting tube 140 heated and heated, and isotropic in gaseous state. Propyl alcohol 105b may be supplied to the wafer drying unit 120. Therefore, the drying operation on the wafer W can be reliably performed.

As described above, according to the present exemplary embodiment, the heating tube 140 is heated by the plurality of heating units 150 mounted on the conveying tube 140, so that the isopropyl alcohol 105b of the gas state passing through the inside thereof is heated. The temperature can be heated and maintained, and therefore, there is an effect that the condensation phenomenon can be prevented from occurring in the delivery pipe 140 by preventing the temperature decrease of the isopropyl alcohol 105b in the gas state.

In addition, by allowing the isopropyl alcohol 105b in the gas state to be maintained at a high temperature by the heating unit 150, the reliability of the wafer W drying operation in the wafer drying unit 120 may be more improved. have.

In the above-described embodiment, the heating tube is locally heated by the heating unit to which the current is applied. However, the present invention is not limited thereto, and other heating methods may be applied. For example, a method of heating the conveying tube by allowing at least a portion of the conveying tube to pass through the receiving portion containing the hot liquid may be applied. That is, the present invention may be applied to another heating method as long as it can prevent the rapid temperature drop of the isopropyl alcohol transferred along the inside by heating the transfer pipe.

On the other hand, the present invention is not limited to the described embodiments, it is apparent to those skilled in the art that various modifications and variations can be made without departing from the spirit and scope of the present invention. Therefore, such modifications or variations will have to be belong to the claims of the present invention.

1 is a view schematically showing the configuration of an isopropyl alcohol supply apparatus according to a conventional embodiment.

2 is a view showing the configuration of an isopropyl alcohol supply apparatus according to an embodiment of the present invention.

3 is an exploded perspective view schematically illustrating a configuration of the heating unit illustrated in FIG. 2.

4 is a cross-sectional view of the heating unit shown in FIG. 2.

* Explanation of symbols for the main parts of the drawings

100: isopropyl alcohol supply device

110: cleaning tank 120: wafer drying unit

130: supply unit 140: transfer pipe

150: heating unit 151: unit body

155 heating portion W: wafer

Claims (8)

The supply unit connects a supply unit for converting liquid isopropyl alcohol (IPA) into gaseous isopropyl alcohol and a wafer drying unit for performing a drying operation on a wafer. A transfer tube for transferring the gaseous isopropyl alcohol to the wafer drying unit; And At least one heating unit coupled to at least a portion of the transfer pipe and maintaining the temperature of the gaseous isopropyl alcohol transferred along the transfer pipe by heating the at least some section; Isopropyl alcohol supply device comprising a. The method of claim 1, A unit body in which at least a portion of the transfer pipe is wound along a circumference of an outer surface thereof; And Isopropyl alcohol supply device is coupled to the unit body so as to surround the transport pipe wound on the unit body, and a heating unit for heating the transport pipe wound on the unit body. The method of claim 2, The unit body is provided in a cylindrical shape, isopropyl alcohol supply device is provided of aluminum (Aluminium) material having excellent thermal conductivity. The method of claim 3, wherein The unit body is isopropyl alcohol supply device is provided in a hollow hollow shape. The method of claim 3, wherein Any one of the outer surface of the unit body and the inner surface of the heating unit is provided with a depression formed in the spiral direction is formed long in the spiral direction, the transfer pipe is isopropyl alcohol supply device is wound around the unit body to be inserted into the depression. The method of claim 2, The heating unit is isopropyl alcohol supply device is provided in the form of a coil (coil) for heating when the current is applied to the transfer pipe. The method of claim 6, The heating unit, A temperature sensor for sensing a temperature of the isopropyl alcohol in the gas state transferred along the transfer pipe; And And a control unit for adjusting the amount of current applied to the heating unit according to the sensing information of the temperature sensor. The method of claim 2, The heating unit, It is coupled to surround the outer surface of the heating unit, isopropyl alcohol supply device further comprises a heat shield to block the heat generated from the heating to the outside.

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