KR20110039239A - 플라즈마 처리 챔버에서의 스트라이크 단계를 검출하기 위한 용량 결합형 정전 (ｃｃｅ) 프로브 장치 및 그 방법 - Google Patents

플라즈마 처리 챔버에서의 스트라이크 단계를 검출하기 위한 용량 결합형 정전 (ｃｃｅ) 프로브 장치 및 그 방법 Download PDF

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Publication number
KR20110039239A
KR20110039239A KR1020117000347A KR20117000347A KR20110039239A KR 20110039239 A KR20110039239 A KR 20110039239A KR 1020117000347 A KR1020117000347 A KR 1020117000347A KR 20117000347 A KR20117000347 A KR 20117000347A KR 20110039239 A KR20110039239 A KR 20110039239A
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South Korea
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plasma
processing chamber
characteristic parameter
parameter measurements
measurements
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Korean (ko)
Inventor
쟝-뽈 부스
더글라스 엘 케일
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램 리써치 코포레이션
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Abandoned legal-status Critical Current

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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P74/00—Testing or measuring during manufacture or treatment of wafers, substrates or devices
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/0006—Investigating plasma, e.g. measuring the degree of ionisation or the electron temperature
    • H05H1/0081—Investigating plasma, e.g. measuring the degree of ionisation or the electron temperature by electric means
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/0006—Investigating plasma, e.g. measuring the degree of ionisation or the electron temperature
    • H05H1/0012—Investigating plasma, e.g. measuring the degree of ionisation or the electron temperature using electromagnetic or particle radiation, e.g. interferometry

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Electromagnetism (AREA)
  • General Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Plasma Technology (AREA)
  • Drying Of Semiconductors (AREA)
  • Chemical Vapour Deposition (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
KR1020117000347A 2008-07-07 2009-07-07 플라즈마 처리 챔버에서의 스트라이크 단계를 검출하기 위한 용량 결합형 정전 (ｃｃｅ) 프로브 장치 및 그 방법 Abandoned KR20110039239A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US7873908P 2008-07-07 2008-07-07
US61/078,739 2008-07-07

Publications (1)

Publication Number Publication Date
KR20110039239A true KR20110039239A (ko) 2011-04-15

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KR1020117000347A Abandoned KR20110039239A (ko) 2008-07-07 2009-07-07 플라즈마 처리 챔버에서의 스트라이크 단계를 검출하기 위한 용량 결합형 정전 (ｃｃｅ) 프로브 장치 및 그 방법

Country Status (6)

Country Link
US (1) US8164349B2 (https=)
JP (1) JP5427888B2 (https=)
KR (1) KR20110039239A (https=)
CN (2) CN102084473B (https=)
TW (1) TWI467623B (https=)
WO (1) WO2010005930A2 (https=)

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US8179152B2 (en) * 2008-07-07 2012-05-15 Lam Research Corporation Passive capacitively-coupled electrostatic (CCE) probe arrangement for detecting plasma instabilities in a plasma processing chamber
KR101606734B1 (ko) 2008-07-07 2016-03-28 램 리써치 코포레이션 플라즈마 프로세싱 챔버에서 인시츄 아킹 이벤트들을 검출하기 위한 패시브 용량성-커플링된 정전식 (ｃｃｅ) 프로브 장치
KR20110046437A (ko) * 2008-07-07 2011-05-04 램 리써치 코포레이션 플라즈마 처리 챔버 내의 막을 특성화하기 위한 ｒｆ 바이어스된 용량-결합형 정전 프로브 장치
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Also Published As

Publication number Publication date
TWI467623B (zh) 2015-01-01
WO2010005930A3 (en) 2010-04-22
US20100006417A1 (en) 2010-01-14
WO2010005930A2 (en) 2010-01-14
CN104320899A (zh) 2015-01-28
US8164349B2 (en) 2012-04-24
CN102084473B (zh) 2014-10-22
JP5427888B2 (ja) 2014-02-26
JP2011527521A (ja) 2011-10-27
CN102084473A (zh) 2011-06-01
TW201003717A (en) 2010-01-16

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