KR20110037508A - Apparatus and method for processing substrate - Google Patents

Apparatus and method for processing substrate Download PDF

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Publication number
KR20110037508A
KR20110037508A KR1020090094986A KR20090094986A KR20110037508A KR 20110037508 A KR20110037508 A KR 20110037508A KR 1020090094986 A KR1020090094986 A KR 1020090094986A KR 20090094986 A KR20090094986 A KR 20090094986A KR 20110037508 A KR20110037508 A KR 20110037508A
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KR
South Korea
Prior art keywords
substrate
loading
transfer means
horizontal
horizontal transfer
Prior art date
Application number
KR1020090094986A
Other languages
Korean (ko)
Inventor
윤근식
Original Assignee
주식회사 케이씨텍
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 주식회사 케이씨텍 filed Critical 주식회사 케이씨텍
Priority to KR1020090094986A priority Critical patent/KR20110037508A/en
Publication of KR20110037508A publication Critical patent/KR20110037508A/en

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G49/00—Conveying systems characterised by their application for specified purposes not otherwise provided for
    • B65G49/05—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles
    • B65G49/06—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles for fragile sheets, e.g. glass
    • B65G49/061—Lifting, gripping, or carrying means, for one or more sheets forming independent means of transport, e.g. suction cups, transport frames
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G49/00—Conveying systems characterised by their application for specified purposes not otherwise provided for
    • B65G49/05—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles
    • B65G49/06—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles for fragile sheets, e.g. glass
    • B65G49/067—Sheet handling, means, e.g. manipulators, devices for turning or tilting sheet glass
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
    • H01L21/67706—Mechanical details, e.g. roller, belt
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
    • H01L21/67715—Changing the direction of the conveying path
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
    • H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support

Abstract

The present invention is to provide a substrate processing apparatus that can reduce the tack time by having a horizontal transfer means for loading and unloading.

The present invention for implementing this, the horizontal transfer means for loading 200 taking over the substrate from the outside and the unloading horizontal transfer means 200 'for taking over the processed substrate to the outside; Shanghai transport means (300) for receiving the substrate from the horizontal transport means for loading (200) or take over the substrate to the unloading horizontal transport means (200 '); And a lower transfer means 400 which receives the substrate from the shanghai transfer means 300 and transfers the substrate to the substrate processing unit 500.

Description

Substrate processing apparatus and substrate processing method {APPARATUS AND METHOD FOR PROCESSING SUBSTRATE}

The present invention relates to a substrate processing apparatus and a substrate processing method, and more particularly, to a substrate processing apparatus and a substrate processing method that can reduce the tack time according to the processing of the substrate.

In general, a flat panel display manufacturing process, such as the deposition of a thin film, the formation of a mask, the etching, etc. are selectively repeated on a large glass substrate to manufacture the devices required. In the process of such a process, a cleaning process is performed to remove foreign substances from the substrate before, after, or before and after the process.

In order to shorten the overall manufacturing process time, it is necessary to minimize the moving distance of the substrate. For this purpose, a device is used to withdraw a substrate from a cassette including a plurality of substrates using a single transfer robot, and then perform a specific process again. There is a need to load and unload substrates in sequence over and over.

That is, the substrate taken out from the cassette is supplied to the first processing apparatus using a single transfer robot, the substrate which has been processed by the first processing apparatus is again supplied to the second processing apparatus, and then the process is performed at the second processing apparatus. A method of storing the finished substrate back in the cassette has been proposed.

As an example of such a device, Korean Patent No. 500170, "Horizontal and vertical conveying apparatus of substrate," has been proposed.

The Republic of Korea Patent No. 500170 is a horizontal transfer means for transporting the loaded substrate in the horizontal direction after the substrate withdrawal from the cassette is loaded, disposed on the frame so that it can be lifted / lowered and the substrate processing by taking the substrate from the horizontal transfer means Disclosed is a vertical conveying means for supplying a unit, and a conveying unit disposed between the vertical conveying means and the substrate processing unit to receive and convey a substrate from the vertical conveying means.

The horizontal conveying means is provided with a sliding plate and a rail for horizontally transporting the substrate, and an upper base and a lower base are provided on an upper portion of the sliding plate.

According to this structure, since the substrate is loaded from the outside by one horizontal conveying means or the substrate is unloaded to the outside, when the horizontal conveying means loads the substrate, the unloading operation of the substrate which has been processed cannot be performed. There was a problem of increasing time.

In addition, since the height of the rail is located higher than the substrate transfer line of the substrate processing unit, particles are generated when the upper base and the lower base slide on the sliding plate, and these particles are attached to the surface of the substrate. .

The present invention has been made to solve the above-mentioned problems, and to provide a substrate processing apparatus that can reduce the tack time by having a horizontal transfer means for loading and unloading.

Another object of the present invention is to provide a substrate processing apparatus capable of preventing particles from adhering to a substrate by placing a driving portion for transferring the substrate on the substrate transport line side of the substrate processing unit or under the substrate. There is this.

Substrate processing apparatus of the present invention for achieving the above object, the horizontal transfer means 200 for receiving the substrate from the outside and the unloading horizontal transfer means 200 'for taking over the processed substrate to the outside. ; Shanghai transport means (300) for receiving the substrate from the horizontal transport means for loading (200) or take over the substrate to the unloading horizontal transport means (200 '); And a lower transfer means 400 which receives the substrate from the shanghai transfer means 300 and transfers the substrate to the substrate processing unit 500.

The substrate processing method of the present invention comprises the steps of: a) loading the substrate from the outside at the same time as the substrate is loaded in the horizontal transfer means 200 for loading the unloading from the horizontal transfer means (200 ') for unloading; b) transferring the substrate by the loading horizontal transfer means 200 in a direction opposite to the substrate transport direction of the substrate processing unit 500; c) transferring the substrate from the horizontal transfer means for loading to the shanghai conveying means (300) and transferring the substrate downward by the shanghai conveying means (300); d) After the substrate is transferred from the shanghai conveying means 300 to the lower conveying means 400, the substrate is transferred to the substrate processing unit 500 by the lower conveying means 400, and then the substrate is cleaned and dried. Including the steps that take place.

According to the present invention, it is possible to simultaneously process loading and unloading of the substrate, thereby reducing the substrate processing time, and preventing particles from the components of the driving unit from being attached to the substrate.

Hereinafter, the configuration and operation of the preferred embodiment of the present invention will be described in detail with reference to the accompanying drawings.

1 is a perspective view showing a substrate processing apparatus of the present invention, Figure 2 is a front view showing a substrate processing apparatus of the present invention, Figure 3 is a right side view showing a substrate processing apparatus of the present invention.

Substrate processing apparatus of the present invention, the frame 100, the horizontal conveying means 200 which is installed in the frame 100 and receives the substrate from the outside and transports horizontally, the substrate is transferred from the horizontal feed stage (200) The upper and lower conveying means 300 for receiving and conveying the lower side, the lower conveying means 400 for receiving the substrate from the upper and lower conveying means 300 and transferring the substrate to the substrate processing unit 500, and conveying by the lower conveying means 400. And a substrate processing unit 500 for cleaning and drying the substrate.

The horizontal transfer means 200 transfers the substrate loading portion 210 on which the substrate is loaded on the upper portion, the support member 220 for supporting the substrate loading portion 210, and the substrate loading portion 210 in the horizontal direction. It consists of a drive for making.

The substrate loading portion 210 may be composed of a plurality of arms and pins protruding from the upper portion of the arms.

In addition, the substrate loading part 210 may be installed at a position eccentrically to one side with respect to the center line in the direction in which the substrate is conveyed from the substrate processing unit 500. Due to this structure, the robot shortens the time for loading the substrate into the substrate loading portion 210 or the time for unloading the substrate after the substrate processing from the substrate loading portion 210 '. It can be shortened.

The driving unit may provide a driving force for horizontally moving the slide rail 230 formed below the support member 220 and the substrate loading part 210 and the support member 220 on the slide rail 230. Drive means (not shown).

The slide rail 230 generates particles by friction during operation. Therefore, the slide rail 230 is installed on the side of the substrate transfer line center line of the substrate processing unit 500, preferably the slide rail 230 is installed at the same height as the substrate transfer line or the substrate It should be installed below the conveying line. This structure prevents the particles from adhering to the upper surface of the substrate even if particles are generated in the slide rail 230.

The driving unit may be installed at both sides of the substrate processing unit 500, and the substrate loading unit 210 may be configured as a support structure at both ends.

However, in order to reduce the installation area and simplify the structure, the driving unit may be installed on only one side of the substrate processing unit 500, and the substrate loading unit 210 may have a cantilever support structure.

That is, the support member 220 is perpendicular to the end of the substrate loading portion 210 on which the substrate is loaded, so that the substrate loading portion 210 has a cantilever support structure, and in this case, the substrate loading portion 210 sags. It is desirable to form a reinforcing support structure for prevention.

When the substrate is horizontally transferred by the horizontal transfer means 200, the transferred substrate is taken over by the vertical transfer means 300.

The vertical conveying means 300 is an arm 310 is loaded with a substrate received from the horizontal conveying means 200, a horizontal driving unit 320 for moving the arm 310 loaded with the substrate in a horizontal direction, the substrate is It consists of a vertical drive unit 330 for moving the loaded arm 310 in the vertical direction.

Here, the 'horizontal direction' means a direction perpendicular to the moving direction of the horizontal transfer means 200.

The horizontal driving unit 320 includes horizontal driving means for moving the arm 310 in the horizontal direction and a slide rail for sliding movement by the horizontal driving means.

The vertical driving part 330 includes a vertical rail moving means for moving the arm 310 and the horizontal driving part 320 in the vertical direction and a slide rail for vertically sliding the vertical motion by the vertical driving means.

The horizontal and vertical driving means may be a cylinder or a motor.

The slide rails of the horizontal drive part 320 and the slide rails of the vertical drive part 330 are installed at the same height as the substrate transport line of the substrate processing unit 500 or the substrate transport line to prevent particles from adhering to the substrate. It is preferable to install below.

Meanwhile, in the present invention, the center line of the substrate loaded on the substrate loading part 210 of the horizontal transfer means 200 is eccentrically positioned with respect to the center line parallel to the substrate transfer direction of the substrate processing unit 500.

Therefore, in order to receive the substrate from the horizontal conveying means 200 and move it downward by the vertical conveying means 300, the horizontal driving part 320 is driven to move the substrate horizontally, and then the vertical driving part 330 is driven. There is a method of lowering the substrate in a vertical downward direction, and a method of directly lowering the substrate in a diagonal downward direction by simultaneously controlling the horizontal driver 320 and the vertical driver 330. In this embodiment, the case of controlling by the latter method in order to reduce the transfer time of the substrate will be described.

When the substrate is transferred downward by the vertical transfer means 300, the transferred substrate is taken over by the lower transfer means 400.

The lower conveying means 400 is composed of a plurality of large diameter rollers and driving means for driving the rollers.

In order to avoid interference with the arm 310 of the upper and lower conveying means 300 after the substrate is turned over to the lower conveying means 400, the roller uses a relatively large diameter.

On the opposite side of the horizontal conveying means 200, the vertical conveying means 300, and the lower conveying means 400 with the substrate processing unit 500 interposed therebetween, the substrate cleaning and drying treatment is performed outside the substrate treating apparatus of the present invention. Lower conveying means 400 ', up and down conveying means 300, the horizontal conveying means 200' is provided to carry out.

Since the lower conveying means 400 'and the vertical conveying means 300' have the same configuration as the lower conveying means 400 and the upper and lower conveying means 300, detailed description thereof will be omitted.

The horizontal transfer means 200 may be configured to include only one horizontal transfer means 200 to load the substrate from the outside or to unload the substrate having been processed. However, in this case, the loading and unloading of the substrate cannot be performed at the same time. Therefore, when the loading of the substrate is performed, the substrate to be unloaded should wait. Loss occurs.

Therefore, in the present embodiment, the loading horizontal transfer means 200 and the unloading horizontal transfer means 200 ′ are provided so that the loading and unloading of the substrate can be simultaneously performed.

The unloading horizontal transfer means 200 ′ includes a substrate loading part 210 ′ on which a substrate is loaded, a supporting member 220 ′ supporting the substrate loading part 210 ′, and the substrate loading part 210 ′. It consists of a drive unit for transporting in the horizontal direction

The substrate loading portion 210 'of the unloading horizontal transfer means 200' has a 'c' shape, and the substrate of the loading horizontal transfer means 200 in a space between the 'c' shape. The height of the substrate loading portion 210 of the loading horizontal transfer means 200 and the height of the substrate loading portion 210 'of the unloading horizontal transfer means 200' are different from each other so that the loading portion 210 can be positioned. It consists of different things.

With this structure, the substrate loading portion 210 of the loading horizontal transfer means 200 and the substrate loading portion 200 'of the unloading horizontal transfer means 200 may be located directly above or below each other.

In addition, the substrate loading portion 210 ′ is installed at a position eccentrically to one side with respect to the center line in the direction in which the substrate is conveyed from the substrate processing unit 500.

The driving unit may horizontally move the slide rail 230 ′ formed under the support member 220 ′ and the substrate loading part 210 ′ and the support member 220 ′ on the slide rail 230 ′. It consists of a driving means (not shown in the figure) for providing a driving force.

In order to prevent particles generated during operation of the slide rail 230 ′ from adhering to the substrate, the slide rail 230 ′ is formed on the side of the substrate transfer line center line of the substrate processing unit 500. Preferably, the slide rail 230 'is installed at the same height as the substrate conveyance line or below the substrate conveyance line.

In this embodiment, the loading horizontal transfer means 200 and the unloading horizontal transfer means 200 'are configured to move independently, but the loading horizontal transfer means 200 and the unloading horizontal transfer means ( 200 ') may be configured in a structure that is integrally connected to each other to move at the same time.

Hereinafter, an operation of the substrate processing apparatus of the present invention will be described with reference to FIGS. 4 to 11.

4 is a front view showing a state in which the substrate is horizontally transferred by the horizontal transfer means for loading, FIG. 5 is a side view of the substrate processing apparatus shown in FIG. 4 from the right, and FIG. 6 is a state in which the upper and lower transfer means take over the substrate. 7 is a front view showing a state where the substrate is lowered by the up and down conveying means, FIG. 8 is a side view of the substrate processing apparatus shown in FIG. 7 from the right, and FIG. 9 is after passing through the substrate processing unit. 10 is a front view showing a state in which the substrate is transferred by the lower transfer means, Figure 10 is a front view showing the process of taking over the substrate from the lower transfer means to the horizontal transfer means for unloading, Figure 11 is a horizontal transfer means for the unloading substrate This is a front view showing the state moved to the unloading position by acquiring.

First, when the substrate is taken over by the robot from the outside into the substrate processing apparatus of the present invention, the substrate is loaded in the horizontal transfer means 200 for loading as shown in FIG.

In this state, when the substrate is transferred in the horizontal direction along the slide rail 230 by the driving means of the horizontal conveying means 200, it is in the position as shown in FIGS. 4 and 5.

Subsequently, the substrate is handed over from the horizontal conveying means 200 to the vertical conveying means 300 as shown in FIG. 6, and after the substrate is turned over to the vertical conveying means 300, the upper and lower parts as shown in FIG. 7. The transfer means 300 descends the substrate and takes over the lower transfer means 400.

As described above, the substrate is lowered by the vertical transfer means 300 in a diagonal direction as shown in FIG. 8. That is, since the center line of the substrate transferred by the upper transfer means 200 is eccentric to one side with respect to the center line in the direction in which the substrate is conveyed from the substrate processing unit 500, the vertical transfer means 300 moves the substrate diagonally. Must descend.

In this case, by controlling the horizontal driving unit 320 and the vertical driving unit 330 of the up and down conveying means 300 to lower the substrate in the diagonal downward direction, it is possible to reduce the tact time.

The substrate transferred onto the roller of the lower conveying means 400 is conveyed by the rotation of the roller and passes through the substrate processing unit 500 to perform the cleaning and drying treatment, and then the lower conveying means on the opposite side as shown in FIG. 400 ').

Thereafter, as shown in FIGS. 10 and 11, the substrate is transferred diagonally upward by the vertical conveying means 300 ′, and is taken over by the unloading horizontal conveying means 200 ′, and then the substrate is taken out to the external robot. .

On the other hand, the horizontal transfer means 200 for loading and the horizontal transfer means 200 'for unloading have different heights of the substrate loading parts 210 and 210', so that the substrate is loaded from the outside or the substrate is completed. The furnace unloading can be done simultaneously. Therefore, the tack time according to the substrate processing can be reduced.

1 is a perspective view showing a substrate processing apparatus of the present invention;

2 is a front view showing a substrate processing apparatus of the present invention;

3 is a right side view showing the substrate treating apparatus of the present invention;

4 is a front view showing a state in which the substrate is horizontally transported by the horizontal transport means for loading;

FIG. 5 is a side view of the substrate treating apparatus shown in FIG. 4 viewed from the right side; FIG.

6 is a front view showing a state in which the up and down transfer means take over the substrate;

7 is a front view showing a state where the substrate is lowered by the vertical transfer means,

8 is a side view of the substrate processing apparatus shown in FIG. 7 seen from the right side;

9 is a front view showing a state in which the substrate is transferred by the lower transfer means after passing through the substrate processing unit,

10 is a front view showing a process of taking over the substrate from the lower transfer means to the horizontal transfer means for unloading,

Figure 11 is a front view showing a state in which the unloading horizontal transfer means has taken over the substrate and moved to the unloading position.

Explanation of symbols on the main parts of the drawings

100: frame 200, 200 ': horizontal conveying means

210, 210 ': substrate loading part 220, 220': support member

230, 230 ': Slide rail 300: vertical conveying means

310: arm 320: horizontal drive unit

330: up and down drive unit 400: lower transfer means

500: substrate processing unit

Claims (9)

A horizontal transfer means 200 for receiving the substrate from the outside and an unloading horizontal transfer means 200 'for taking over the processed substrate to the outside; Shanghai transport means (300) for receiving the substrate from the horizontal transport means for loading (200) or take over the substrate to the unloading horizontal transport means (200 '); And a lower transfer means (400) for receiving the substrate from the shanghai transfer means (300) and transferring the substrate to the substrate processing unit (500). The method of claim 1, And a substrate loading part 210 'of the loading horizontal transfer means 200 and a height of the substrate loading part 210' of the unloading horizontal transfer means 200 'are different from each other. The method of claim 2, The substrate loading portion 210 of the loading horizontal transfer means 200 may be located directly above or below the substrate loading portion 210 'of the unloading horizontal transfer means 200'. Substrate processing apparatus. The method of claim 3, The substrate loading portion 210 'of the unloading horizontal transfer means 200' has a 'c' shape, and the substrate of the loading horizontal transfer means 200 in a space between the 'c' shape. Substrate processing apparatus, characterized in that the mounting portion 210 can be located. The method of claim 1, The loading horizontal transfer means 200 and the unloading horizontal transfer means (200 ') is a substrate processing apparatus, characterized in that connected to move at the same time. The method according to any one of claims 1 to 5, The slide rails 230 and 230 'constituting the driving unit of the loading horizontal conveying means 200 and the unloading horizontal conveying means 200' have a height equal to or lower than a substrate conveying line from which the substrate is conveyed from the substrate processing unit 500. Substrate processing apparatus, characterized in that installed in. The method according to any one of claims 1 to 4, Substrate loading parts 210 and 210 'constituting the driving unit of the loading horizontal conveying means 200 and the unloading horizontal conveying means 200' may have a center line in a direction in which the substrate is conveyed from the substrate processing unit 500. Substrate processing apparatus characterized in that the cantilever is supported by being installed at a position eccentrically to one side. The method of claim 6, The shanghai conveying means 300, the arm 310 is loaded with a substrate, a horizontal drive unit 320 for moving the arm 310 in the horizontal direction and the vertical drive unit 330 for moving in the vertical direction and; Substrate processing apparatus, characterized in that for moving the arm 310 in the diagonal direction by controlling the horizontal drive unit 320 and the vertical drive unit 330 at the same time. a) taking out the substrate from the outside of the horizontal transfer means 200 ′ while the substrate is loaded on the horizontal transfer means 200 for loading from the outside; b) transferring the substrate by the loading horizontal transfer means 200 in a direction opposite to the substrate transport direction of the substrate processing unit 500; c) transferring the substrate from the horizontal transfer means for loading to the shanghai conveying means (300) and transferring the substrate downward by the shanghai conveying means (300); d) After the substrate is transferred from the shanghai conveying means 300 to the lower conveying means 400, the substrate is transferred to the substrate processing unit 500 by the lower conveying means 400, and then the substrate is cleaned and dried. Substrate processing method comprising the step.
KR1020090094986A 2009-10-07 2009-10-07 Apparatus and method for processing substrate KR20110037508A (en)

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KR1020090094986A KR20110037508A (en) 2009-10-07 2009-10-07 Apparatus and method for processing substrate

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101347200B1 (en) * 2011-12-07 2014-01-10 주식회사 케이씨텍 Substrate processing device capable of self-testing
CN111483810A (en) * 2020-04-16 2020-08-04 林杰 Intelligent detection equipment for glass

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101347200B1 (en) * 2011-12-07 2014-01-10 주식회사 케이씨텍 Substrate processing device capable of self-testing
CN111483810A (en) * 2020-04-16 2020-08-04 林杰 Intelligent detection equipment for glass
CN111483810B (en) * 2020-04-16 2021-02-19 林杰 Intelligent detection equipment for glass

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