KR20110002540A - Apparatus for removing impurities having layer structure capable of simultaneous cleaning on the top side and bottom side of the film - Google Patents

Abstract

PURPOSE: A foreign material removing apparatus of layer structure is provided to improve the efficiency of cleaning a film by applying ultrasonic vibration to the top and bottom surfaces of the film so as to prevent influence of foreign materials on the cleaned surface. CONSTITUTION: A foreign material removing apparatus of layer structure comprises a cleaning unit(100), a drying and neutralizing unit(200), and an inverting unit(300). The cleaning unit applies ultrasonic vibration to the top and bottom surfaces of a film at the same time using cleaning solution being circulated, thereby removing foreign materials. The drying and neutralizing unit is located on the top of the cleaning unit in order to dry cleaning solution remaining in the film and neutralize static electricity. The inverting unit transfers a film from the cleaning unit of the lower side to the drying and neutralizing part of the upper side.

Description

FIELD OF REMOVING IMPURITIES HAVING LAYER STRUCTURE CAPABLE OF SIMULTANEOUS CLEANING ON THE TOP SIDE AND BOTTOM SIDE OF THE FILM}

The present invention relates to an apparatus for removing foreign substances from a film. More particularly, the present invention relates to cleaning a film by irradiating ultrasonic waves from the upper and lower portions of a film to be cleaned by using a circulating washing liquid as a medium, and after the cleaning by the ultrasonic wave is completed, Forming a layered structure connected by the inverting inverting part to switch the upper and lower surfaces of the film so that the cleaning unit located in the lower layer and the dry neutralization unit located in the upper layer switch the upper and lower parts and then dry and remove fine dust at the same time. The present invention relates to a debris removing device having a layer structure capable of simultaneously cleaning the upper and lower surfaces of a film.

In recent years, with the boom of the display device industry, various types of flat panel display devices such as liquid crystal display devices and plasma display devices have been in the spotlight, and the main core materials such as polarizing plates, diffusion plates, and prism sheets (hereinafter referred to as "film") Is used a lot.

However, these films cannot be used directly in the manufacture of display devices and, like other electronic devices, the removal of fine dust can increase the accuracy of the equipment and lower the defect rate.

Accordingly, in the related art, a method of passing a film between adhesive rollers in order to remove dust of such a film and adsorbing and removing dust adhered to the upper and lower surfaces of the film by adhesive force has been used.

However, the foreign material removal device using the adhesive roller has a disadvantage that it is not possible to guarantee the efficiency of removing the foreign substances such as the efficiency decreases as the foreign matter is adsorbed on the adhesive roller adhesive surface, the overall process is increased by the management of the adhesive roller. There was also.

In addition, the foreign material removal apparatus using a conventional adhesive roller is generally manufactured and fixed at a certain distance between the two rollers, so that the distance between the rollers or the foreign matter operation according to the cross-sectional shape or thickness of the film to remove the foreign matter In some cases, the film itself was impossible, and there was a fear of damaging the film due to the contact of the adhesive roller.

In addition, the foreign matter removal apparatus using a conventional adhesive roller has a problem that the foreign matter is not removed from the side of the film that does not come into direct contact with the adhesive surface of the roller when passing through the adhesive roller, the complete foreign matter removal is not made.

In order to solve the problem of the debris removal device using the adhesive roller, a debris removal device using ultrasonic waves has recently been proposed. As an example of an apparatus for removing foreign substances using ultrasonic waves, Japanese Laid-Open Patent Publication No. 2003-24888 includes a cleaning tank through which a cleaning solution is circulated and a tape moving unit for guiding and moving the tape in a U shape so that the cleaning part of the tape is immersed in the cleaning solution; A tape cleaning apparatus including an ultrasonic vibrating body for imparting ultrasonic vibration to a cleaning portion of the tape using the cleaning liquid as a medium, and a nozzle for blowing off the cleaning liquid remaining on the tape from the cleaning liquid has been proposed.

In this way, if the ultrasonic wave is applied to a specific part of the tape to be cleaned by using the cleaning liquid as a medium, the damage of the tape may be reduced, but a drying process for drying the remaining cleaning liquid on the tape from the cleaning tank is performed before proceeding to the subsequent process. Essentially required, it was common for the drying time for this drying process to take much longer.

That is, when exposed to the outside with the water remaining on the tape, new foreign matters such as fine dusts are stuck on the tape by water, so that a drying process for removing the residual washing liquid has been perfect for a long time.

Accordingly, when washing the tape using the cleaning solution, it was common that a drying unit capable of performing the drying process while staying more time than the tape stays in the washing tank is disposed adjacent to the washing tank. It is disclosed that the tape cleaning device sequentially arranges the first drying unit and the second drying unit in a direction horizontal to the washing tank, similarly to the general washing apparatus using the washing liquid.

However, there is a problem that the area occupied by the cleaning device is inevitably increased when the plurality of drying units or the large drying units are disposed in the washing tank in the horizontal direction.

Therefore, the washing apparatus for cleaning before the main process in the actual production site occupies a larger area than the process chamber for the main process has a problem of significantly reducing the space utilization of the site.

In addition, since the washing tank and the drying unit are disposed long on the same plane, there is a problem that the productivity is lowered due to a large restriction on the copper line of the worker.

In addition, since the tape cleaning apparatus performs the cleaning after the semiconductor mounting is made on one side of the tape, foreign substances on the other side of the tape did not have a great influence on the surface on which the semiconductor mounting was made. When cleaning the film before the semiconductor mounting, such as a foreign material removal device using a conventional adhesive roller, if the cleaning is weakly made or foreign matter on the side is moved to the upper surface well cleaned, etc. There was a problem that the washing efficiency is reduced.

The technical problem to be solved by the present invention is to irradiate the upper and lower surfaces of the film together with ultrasonic vibration to remove the foreign matter on the other side of the film affecting the cleaning surface, the foreign matter of the film through the cleaning liquid as a medium Installation area by forming a vertically arranged layer structure connected by a cleaning unit for removing the oil and a neutralizing unit for neutralizing static electricity while completely drying the cleaning liquid remaining on the film, and a reversing inversion unit for moving the cleaned film in the vertical direction. It is to provide a debris removal device having a layer structure capable of simultaneously cleaning the upper and lower surfaces of the film to minimize the.

The foreign material removal apparatus having a layer structure capable of simultaneously cleaning the upper and lower surfaces of the film for achieving the above object includes a cleaning chamber including a plurality of cleaning chamber guide rollers for guiding the cleaning liquid to be stored and the film for cleaning to be immersed in the cleaning liquid, and generating ultrasonic waves. A cleaning unit having an ultrasonic vibration horn for transmitting vibration to the foreign matter attached to the surface of the film by using the cleaning liquid as a medium, and a circulation pump for supplying and discharging the cleaning liquid through the nozzle and circulating the cleaning liquid; A drying chamber provided at the upper part of the washing unit to dry the cleaning liquid remaining in the film by receiving the cleaned film; a drying lamp for promoting drying by irradiating light to upper and lower surfaces of the film passing through the drying chamber; and inside the drying chamber. A dry neutralization unit provided at each of the upper and lower portions of the electrostatic neutralization device to neutralize static electricity, and an air suction unit installed at the upper and lower portions of the film to suck air in the drying chamber together with fine dust; And a reverse conversion unit for connecting one side of the washing unit and one side of the drying neutralizing unit in a vertical direction to transfer the film, which has been cleaned in the washing unit located below, to the dry neutralizing unit located above. It features.

In addition, the inversion conversion unit according to the present invention supports one side of the film discharged in the vertical direction of the upper portion in the cleaning unit on one side and transfer the film to the dry neutralization unit, by inverting the upper and lower surfaces of the film to the dry neutralization unit It is characterized in that the reverse support roller for supplying.

The present invention has the advantage that by irradiating the ultrasonic vibration to the upper and lower surfaces of the film together to remove the foreign matter on the other surface of the film affects the cleaning surface is significantly improved cleaning efficiency.

In addition, the present invention is provided by a cleaning unit for removing the foreign matter of the film by using the cleaning medium, and a reverse conversion unit for moving the film in the vertical direction, the dry neutralizing unit for neutralizing the static electricity while completely drying the cleaning liquid remaining on the film By connecting and forming a vertically arranged layer structure there is an advantage that can minimize the installation area.

Hereinafter, specific embodiments of the present invention will be described in detail with reference to the accompanying drawings.

1 is a block diagram of a foreign material removal apparatus of the layer structure capable of simultaneously cleaning the upper and lower surfaces of the film according to the present invention.

Referring to Figure 1, the upper and lower surfaces of the film according to the present invention, the foreign material removal apparatus of the layer structure capable of simultaneously cleaning the cleaning medium 100 by applying ultrasonic vibration to the upper and lower surfaces of the film at the same time with the circulating cleaning liquid and the cleaning unit 100 and A dry neutralization unit 200 for drying the cleaning solution remaining on the film and neutralizing the static electricity, and inverting the switching unit 300 connecting the dry neutralization unit located at the upper portion of the cleaning unit located at the bottom of the washing unit; It is configured to include.

The cleaning unit 100 is an overall process apparatus for removing foreign matters adhered to the film through the cleaning solution circulated with ultrasonic waves as a medium, and is located below the foreign matter removing apparatus having a layer structure according to the present invention. Part 200 is a post-processing device for drying the film and at the same time to remove the fine dust sensitive to static electricity is configured to be located on the foreign material removal device of the layer structure.

In this case, the cleaning unit 100 and the dry neutralizing unit 200 may be configured by partitioning the upper and lower portions in one device, and the washing unit 100 and the dry neutralizing unit 200 are independent of each other. The dry neutralization unit may be configured to be formed at a position higher than the cleaning unit while being interconnected by the inverting and converting unit 300 to form a vertical layer structure as a whole.

The cleaning unit 100 includes a cleaning chamber 110, a cleaning chamber guide roller 102, an ultrasonic vibration horn 120, a circulation pump 116, and a filter 118.

The cleaning chamber 110 may form a closed space together with the drying chamber 210 to be described later, so that external dust may be prevented from entering the foreign matter removing apparatus.

At this time, the cleaning liquid supplied from the bottom or one side of the cleaning chamber is stored in the cleaning chamber 110 to clean the film, and the film for cleaning is filled enough to be sufficiently locked. Various chemical cleaning liquids may be used as the cleaning liquid, and it is preferable to use deionized water which is generally used for washing semiconductor equipment. As such, the ultrapure water made of pure water molecules is not electrically conductive, thereby preventing charge of the film 90 for cleaning, thereby preventing new dust from being newly adsorbed onto the surface of the film.

The cleaning chamber guide roller 102 guides the film so that the film 90 supplied to the cleaning chamber for the cleaning may be sufficiently immersed in the cleaning liquid in the cleaning chamber 110, and the film is guided in the longitudinal direction of the cleaning chamber. It is provided with a plurality of inside the cleaning chamber to be moved while guiding.

The ultrasonic vibration horn 120 is composed of a conventional vibration ultrasonic generator provided on the upper and lower with respect to the moving path of the film in the cleaning chamber, respectively, cleaning liquid around the oscillation unit by generating and oscillating a constant frequency ultrasonic wave Is configured to vibrate.

As described above, the ultrasonic vibration horn 120 is provided on the upper and lower sides of the film to be cleaned, so that ultrasonic energy can be simultaneously transferred toward the upper and lower surfaces of the film 90 during cleaning.

As a result, the upper and lower surfaces of the film can be simultaneously cleaned, and ultrasonic waves are simultaneously applied to the upper and lower surfaces of the film to vibrate the cleaning solution. I can make it.

In addition, the ultrasonic wave oscillated in the ultrasonic vibration horn provided on the upper side not only vibrates the outer surface of the foreign matter attached to the upper surface of the film, but also vibrates the contact surface of the foreign matter attached to the lower surface of the film, The oscillated ultrasound not only vibrates the outer surface of the foreign matter attached to the lower surface of the film, but also vibrates the contact surface of the foreign matter attached to the upper surface of the film, thereby improving the removal efficiency of the foreign matter on the upper and lower surfaces of the film.

As such, energy is transferred to the foreign matter attached to both sides of the film by the ultrasonic wave oscillated from the ultrasonic vibration horns provided at the upper and lower portions of the film, thereby forming a state in which the foreign matter can be more efficiently removed by the cleaning liquid. Done.

At this time, it is preferable that the frequency of the ultrasonic wave oscillated by the ultrasonic vibration horn 120 has a frequency of 20 Hz to 40 Hz. If the frequency of the ultrasonic wave is 20 kHz or less, the vibration transmitted to the film is not easy to peel off foreign matters, and if the frequency is 40 kHz or more, unnecessary heat is generated in the ultrasonic vibration horn, which may damage the film. This can lead to foreign body floatation, which can bounce off to the outside. Therefore, the frequency of the ultrasonic wave oscillated in the ultrasonic vibration horn 120 is preferably adjusted to 20-40 kHz according to the film thickness.

In addition, the gap between the film and the ultrasonic vibration horn may be slightly different depending on the thickness of the film, but is preferably configured to achieve about 12 mm. As a result of the applicant's experiments, it was confirmed that when the work in the frequency range of 20-40 kHz, the gap between the film and the ultrasonic vibration horn to maintain a distance of about 12 mm exhibits the most effective vibration efficiency and peeling effect of foreign matter.

On the other hand, when the gap between the film and the ultrasonic vibrating horn is formed at a distance shorter than 12 mm, the thickness variation of the film is often not constant, so that the film and the ultrasonic vibrating horn are in contact with each other. There is a fear that scratches are generated in the film that is guided and moved. In addition, when the gap between the film and the ultrasonic vibration horn is 12 mm or more, the structure of the equipment itself is changed and the installation cost is further generated.

On the other hand, adjusting the gap between the film and the ultrasonic vibration horn according to the film thickness does not have a significant meaning, because the distance the frequency is transmitted to the film surface does not change significantly. However, depending on the film thickness, the preferred frequency that can increase the vibration efficiency and the separation efficiency of the foreign matter may be slightly different.

The thickness of a film commonly used in a flat panel display device can be divided into three types of approximately 25 μm or less, 25-50 μm, and 50-100 μm, and the effects according to the thickness are shown in Table 1 below.

20㎑ 30㎑ 40㎑ 25㎛ or less moderation Trembling 25-50㎛ Less trembling moderation Trembling 50-100㎛ Less trembling Less trembling moderation

That is, when the frequency of 20 kHz is applied at a thickness of 25 μm or less, the exfoliation efficiency of the foreign matter is improved. When the frequency of 30 kHz is applied at the thickness of 25-50 μm, the exfoliation efficiency of the foreign matter is improved. In the thickness of, the separation efficiency of the foreign matter is improved when a frequency of 40 kHz is applied.

The circulation pump 116 is provided at one side of the cleaning chamber to supply the cleaning liquid to the cleaning chamber 110 through the supply nozzle 112, and to return the cleaning liquid in the cleaning chamber 110 through the discharge nozzle 114. In this way, the cleaning liquid in the cleaning chamber 110 is circulated.

At this time, the position of the supply nozzle 112 and the discharge nozzle 114 is installed as opposed to that shown in Figure 1, it is of course possible to supply and circulate the cleaning liquid in reverse with respect to the moving direction of the film. As such, when the circulating direction of the cleaning liquid is configured to be opposite to the moving direction of the film, the moving speed of the film 90 is added to the circulating speed of the cleaning liquid, so that the foreign matter removal efficiency by the cleaning liquid can be further improved.

In addition, one side of the discharge nozzle 114 is preferably provided with a filter 118 that can remove the foreign matter contained in the cleaning liquid returned from the cleaning chamber. By filtering the cleaning liquid discharged from the cleaning chamber by the filter as described above, the circulation pump 116 can supply the clean cleaning liquid from which foreign substances have been removed to the cleaning chamber 110 again.

The dry neutralization unit 200 includes a drying chamber 210, a drying lamp 220, a hepa filter 230, an electrostatic neutralizing device 240, and an air suction 250.

The drying chamber 210 is installed above the cleaning chamber 100, and the upper and lower surfaces of the film are inverted through the inversion switching unit 300 in which the cleaning process by the cleaning liquid is completed in the cleaning chamber 110 installed below. It is configured to move continuously while being supplied.

At this time, the drying chamber 210 is preferably formed as a closed space in order to effectively prevent new entry of foreign matter. However, the drying chamber 210 does not necessarily need to be a closed space, which will be described in detail later in the description of the components of the electrostatic neutralizer 240 and the air suction 250.

The drying lamp 220 is provided in the upper and lower portions of the drying chamber along the moving path of the film so that the drying lamp 220 to dry by irradiating light to the upper and lower surfaces of the film 90 moving in the drying chamber 210. It is composed. At this time, the drying lamp 220 is preferably composed of a UV lamp for irradiating UV light. As such, when the UV lamp is used for drying, the drying time may be shortened and the deformation of the film 90 may be minimized as compared with the method of drying by spraying hot air.

When the drying chamber 210 is hermetically sealed, the HEPA filter 230 may be separated from the upper or lower surface of the film with the increase of moisture remaining in the film to filter foreign matter floating in the interior space of the drying chamber. It is formed inside the upper side.

Accordingly, the HEPA filter 230 may filter up to fine dust having a diameter of 0.3 μm or less sensitive to static electricity separated from the upper and lower surfaces of the film with moisture to enhance cleanliness in the drying chamber 210.

The static neutralization device 240 is configured to neutralize or weaken the static electricity in the interior of the drying chamber 210 and the surface of the film 90 to prevent the fine dust from adhering to the surface of the film by static electricity.

The electrostatic neutralizer is not limited to a specific device, and a high voltage is applied to a needle or thin wire electrode made of tungsten, silicon, or the like, and ionized air by corona discharge to generate ions required for charging, and then generated ions. By using the corona discharge method to neutralize the static electricity on the charge object, that is, the film 90 by using. In addition, various means for neutralizing or weakening static electricity may be used.

The air suction 250 is provided in the drying chamber and is configured to suck the air of the drying chamber together with the fine dust. In this case, the air suction 250 is installed on the upper and lower portions based on the film so as to suck the fine dust that evaporates with the moisture on both the upper and lower surfaces of the film moving in the drying chamber.

In addition, the dry neutralization unit 200 is separated from the electrostatic neutralization device 240 for weakening the adsorption force of the static electricity by the fine dust adhering to the surface of the film 90, by spraying air to physically remove the fine dust from the film It may also be configured to further include an air supply nozzle (not shown) that can be peeled off.

In addition, when the drying chamber 210 is not sealed for economic reasons, the static electricity neutralization device 240 is installed close to the film 90, and at the same time, the air suction 250 is installed close to the static electricity is neutralized Of course, it may be configured to suck the fine dust weakened adhesive force.

The reversing conversion unit 300 is configured to connect one side of the washing unit located in the lower side and one side of the dry neutralization unit located in the upper direction. Accordingly, the cleaning unit 100 and the drying neutralizing unit 200 may be formed in a layer structure, thereby minimizing a space occupied by the foreign matter removing apparatus.

At this time, the reversing conversion unit 300 is supported by one side of the film discharged in the vertical direction of the upper portion (in the upper surface of the film to be cleaned in Figure 1) while supporting the reverse support roller to transfer to the dry neutralization unit 302 is provided.

As the upper surface is supported by the reversal support roller 302 as described above, the film is transferred to the dry neutralization unit. In the process of transferring the film, the upper and lower surfaces of the film are inverted so that the upper surface of the film faces the lower portion of the dry neutralization unit. The lower surface of the film faces the upper portion of the dry neutralization part.

That is, according to the present invention, since the cleaning is performed by applying ultrasonic waves to both the upper and lower surfaces of the film in the cleaning unit without distinguishing between the upper and lower surfaces of the film, the upper and lower surfaces are reversed during drying and neutralization of the electric field in the drying neutralization unit. This can be configured to be possible. Accordingly, the cleaning part and the neutralizing part may be formed in a layer structure to minimize the installation space of the removal device.

In addition, it is preferable that both sides of the film to which the film 90 is moved in the inversion switch unit is provided with a drying lamp for irradiating light for drying. Accordingly, the cleaning part is located at the lower part, and the dry neutralization part is located at the upper part thereof, and the cleaning liquid remaining in the film naturally flows down or flows in the process of moving the cleaned film to the upper dry neutralization part through the inversion converter. The cleaning liquid is dried by UV light irradiated from the drying lamp, so that the cleaning liquid can be supplied to the drying chamber in a state in which the cleaning liquid is substantially removed.

Next will be described the operation of the foreign material removal device of the layer structure capable of simultaneously cleaning the upper and lower surfaces of the film according to the present invention.

When the cleaning operation is started, the cleaning chamber guide roller 102 and the reversing support roller 302 provided in the reversing conversion unit are operated to operate the film 90 to the cleaning unit 110 and the neutralizing unit 210. Will be moved sequentially.

First, the foreign matter adhered to the surface of the film 90 by the ultrasonic vibration horn 120 in the cleaning part 110 is in an excited state that is easily dropped. At this time, foreign matter is separated from the film 90 by the cleaning force of the cleaning liquid proportional to the moving speed of the cleaning liquid circulated by the circulation pump 116, and the foreign matter mixed with the cleaning liquid is discharged to the discharge nozzle 114 along the circulating cleaning liquid. And filtered by filter 118.

After that, when the film 90 enters the drying chamber 210 by the inverting support roller 302, the drying work by the drying lamp 220 and the electrostatic removal work by the electrostatic neutralizing device 240 and the air suction ( 250) the fine dust removal operation is made at the same time.

On the other hand, when the dry neutralization unit 210 is not sealed, by removing the static electricity on the surface of the film 90 by the electrostatic neutralizer 240 installed adjacent to the film 90, by removing the static electricity, the film 90 The fine dust, which is separated from or easily separated from the surface of the sheet), is sucked and removed by the air suction 250.

In the above description, the technical idea of the present invention has been described with the accompanying drawings. It will be apparent to those skilled in the art that various modifications and variations can be made in the present invention without departing from the scope of the present invention.

1 is a block diagram of a foreign material removal device of the layer structure capable of simultaneously cleaning the upper and lower surfaces of the film according to the present invention.

<Explanation of symbols for the main parts of the drawings>

100-Cleaning section 102-Cleaning room guide roller

110-Cleaning Room 112-Supply Nozzle

114-Exhaust Nozzle 116-Circulation Pump

118-Filter 120-Ultrasonic Vibration Horn

200-Dry Neutralization 210-Drying Room

220-Drying Lamp 230-Hepa Filter

240-Static Neutralizer 250-Air Suction

300-reversing switch 302-reversing support roller

Claims (10)

The cleaning chamber is provided with a plurality of cleaning chamber guide rollers for storing the cleaning liquid and guiding the film for cleaning soaking in the cleaning liquid. A cleaning unit having a horn and a circulation pump for supplying and discharging the cleaning liquid through the nozzle and circulating the cleaning liquid; A drying chamber provided at the upper part of the washing unit to dry the cleaning liquid remaining in the film by receiving the cleaned film; a drying lamp for promoting drying by irradiating light to upper and lower surfaces of the film passing through the drying chamber; and inside the drying chamber. A dry neutralization unit provided at each of upper and lower portions of the electrostatic neutralization device to neutralize static electricity, and an air suction unit installed at the upper and lower portions of the film to suck air in the drying chamber together with fine dust; And One side of the cleaning unit and one side of the dry neutralization unit by connecting in a vertical direction, characterized in that it comprises a reversing conversion unit for transferring the film is completed cleaning in the cleaning unit located in the lower to the dry neutralization unit located in the upper portion The foreign material removal apparatus of the layer structure which can simultaneously wash the upper and lower surfaces of the film made into. The method of claim 1, The reverse conversion unit supports one surface of the film discharged in the vertical direction of the upper portion from the cleaning unit on one side and transfers the film to the dry neutralization unit, and reverses the upper and lower surfaces of the film and supplies it to the dry neutralization unit. Debris removal device having a layer structure capable of simultaneously cleaning the upper and lower surfaces of the film, characterized in that the provided. The method of claim 2, Ultrasonic wave oscillating in the ultrasonic vibration horn has a frequency of 20 kHz to 40 kHz, the foreign material removal apparatus of the layer structure capable of simultaneous cleaning of the upper and lower surfaces of the film, characterized in that it is adjusted according to the thickness of the film. The method of claim 3, When the thickness of the film is thinner than 25㎛ the foreign material removal device of the layer structure capable of simultaneously cleaning the upper and lower surfaces of the film, characterized in that configured to clean the film by oscillating a frequency of 20 kHz in the ultrasonic vibration horn. The method of claim 3, When the thickness of the film is 25㎛ to 50㎛ The foreign material removal apparatus of the layer structure capable of simultaneously cleaning the upper and lower surfaces of the film, characterized in that configured to clean the film by oscillating a frequency of 30 Hz in the ultrasonic vibration horn. The method of claim 3, When the thickness of the film is 50㎛ to 100㎛ The foreign material removal apparatus of the layer structure capable of simultaneously cleaning the upper and lower surfaces of the film, characterized in that configured to clean the film by oscillating a frequency of 40 Hz in the ultrasonic vibration horn. The method according to any one of claims 3 to 6, The ultrasonic vibration horn maintains a gap spaced from the film by a predetermined distance, and the foreign material removal apparatus of the layer structure capable of simultaneously cleaning the upper and lower surfaces of the film, characterized in that installed on the upper and lower with respect to the movement path of the film. The method of claim 7, wherein The gap between the ultrasonic vibration horn and the film is 12mm, foreign matter removal apparatus having a layer structure capable of simultaneously cleaning the upper and lower surfaces of the film. The method of claim 7, wherein The electrostatic neutralizer is a foreign material removal device having a layer structure capable of simultaneously cleaning the upper and lower surfaces of the film, characterized in that the high voltage is applied to the ionized air by the corona discharge. 10. The method of claim 9, Wherein the drying neutralizing unit is a foreign matter removal apparatus having a layer structure capable of simultaneously cleaning the upper and lower surfaces of the film, characterized in that the HEPA filter for removing the foreign matter suspended in the interior space of the drying chamber is provided in the closed chamber.

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