KR20110001894A - 비아 가우징 구성요소를 갖는 인터커넥트 구조 및 그 제조방법 - Google Patents

비아 가우징 구성요소를 갖는 인터커넥트 구조 및 그 제조방법 Download PDF

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KR20110001894A
KR20110001894A KR1020100057973A KR20100057973A KR20110001894A KR 20110001894 A KR20110001894 A KR 20110001894A KR 1020100057973 A KR1020100057973 A KR 1020100057973A KR 20100057973 A KR20100057973 A KR 20100057973A KR 20110001894 A KR20110001894 A KR 20110001894A
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dielectric material
dielectric
forming
conductive
component
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Korean (ko)
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치-챠오 양
테오도루스 에듀아르두스 스탄다트
다니엘 씨. 에델스타인
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인터내셔널 비지네스 머신즈 코포레이션
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
    • H01L21/76801—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing
    • H01L21/76802—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing by forming openings in dielectrics
    • H01L21/76807—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing by forming openings in dielectrics for dual damascene structures
    • H01L21/76808—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing by forming openings in dielectrics for dual damascene structures involving intermediate temporary filling with material
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
    • H01L21/76801—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing
    • H01L21/76802—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing by forming openings in dielectrics
    • H01L21/76805—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing by forming openings in dielectrics the opening being a via or contact hole penetrating the underlying conductor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
    • H01L21/76838—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the conductors
    • H01L21/76841—Barrier, adhesion or liner layers
    • H01L21/76843—Barrier, adhesion or liner layers formed in openings in a dielectric
    • H01L21/76844—Bottomless liners
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
    • H01L21/76838—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the conductors
    • H01L21/76841—Barrier, adhesion or liner layers
    • H01L21/76843—Barrier, adhesion or liner layers formed in openings in a dielectric
    • H01L21/76846—Layer combinations
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00—Details of semiconductor or other solid state devices
    • H01L23/52—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
    • H01L23/522—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
    • H01L23/5226—Via connections in a multilevel interconnection structure
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00—Details of semiconductor or other solid state devices
    • H01L23/52—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
    • H01L23/522—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
    • H01L23/532—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body characterised by the materials
    • H01L23/53204—Conductive materials
    • H01L23/53209—Conductive materials based on metals, e.g. alloys, metal silicides
    • H01L23/53228—Conductive materials based on metals, e.g. alloys, metal silicides the principal metal being copper
    • H01L23/53238—Additional layers associated with copper layers, e.g. adhesion, barrier, cladding layers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00—Details of semiconductor or other solid state devices
    • H01L23/52—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
    • H01L23/522—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
    • H01L23/532—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body characterised by the materials
    • H01L23/53204—Conductive materials
    • H01L23/53209—Conductive materials based on metals, e.g. alloys, metal silicides
    • H01L23/53214—Conductive materials based on metals, e.g. alloys, metal silicides the principal metal being aluminium
    • H01L23/53223—Additional layers associated with aluminium layers, e.g. adhesion, barrier, cladding layers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00—Details of semiconductor or other solid state devices
    • H01L23/52—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
    • H01L23/522—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
    • H01L23/532—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body characterised by the materials
    • H01L23/53204—Conductive materials
    • H01L23/53209—Conductive materials based on metals, e.g. alloys, metal silicides
    • H01L23/53257—Conductive materials based on metals, e.g. alloys, metal silicides the principal metal being a refractory metal
    • H01L23/53266—Additional layers associated with refractory-metal layers, e.g. adhesion, barrier, cladding layers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001—Technical content checked by a classifier
    • H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
KR1020100057973A 2009-06-30 2010-06-18 비아 가우징 구성요소를 갖는 인터커넥트 구조 및 그 제조방법 Withdrawn KR20110001894A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US12/494,564 US7964966B2 (en) 2009-06-30 2009-06-30 Via gouged interconnect structure and method of fabricating same
US12/494,564 2009-06-30

Publications (1)

Publication Number Publication Date
KR20110001894A true KR20110001894A (ko) 2011-01-06

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Country Status (3)

Country Link
US (1) US7964966B2 (enExample)
JP (1) JP2011014904A (enExample)
KR (1) KR20110001894A (enExample)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9991200B2 (en) 2014-09-25 2018-06-05 Taiwan Semiconductor Manufacturing Company, Ltd. Air gap structure and method
WO2018190817A1 (en) * 2017-04-12 2018-10-18 Intel Corporation Integrated circuit interconnects
KR20190092401A (ko) * 2016-12-29 2019-08-07 인텔 코포레이션 자체-정렬형 비아

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KR20110003191A (ko) * 2009-07-03 2011-01-11 삼성전자주식회사 소자 분리막 및 반도체 소자의 형성 방법
US9177917B2 (en) * 2010-08-20 2015-11-03 Micron Technology, Inc. Semiconductor constructions
US9054110B2 (en) * 2011-08-05 2015-06-09 Taiwan Semiconductor Manufacturing Company, Ltd. Low-K dielectric layer and porogen
US8835305B2 (en) 2012-07-31 2014-09-16 International Business Machines Corporation Method of fabricating a profile control in interconnect structures
US8749060B2 (en) * 2012-09-21 2014-06-10 Taiwan Semiconductor Manufacturing Company, Ltd. Method of semiconductor integrated circuit fabrication
US9030013B2 (en) * 2012-09-21 2015-05-12 Taiwan Semiconductor Manufacturing Company, Ltd. Interconnect structures comprising flexible buffer layers
US10043706B2 (en) 2013-01-18 2018-08-07 Taiwan Semiconductor Manufacturing Company Limited Mitigating pattern collapse
US10032712B2 (en) 2013-03-15 2018-07-24 Taiwan Semiconductor Manufacturing Company Limited Semiconductor structure
CN104078445A (zh) * 2013-03-29 2014-10-01 联华电子股份有限公司 插塞结构及其制作工艺
US9349691B2 (en) 2014-07-24 2016-05-24 International Business Machines Corporation Semiconductor device with reduced via resistance
US9685370B2 (en) 2014-12-18 2017-06-20 Globalfoundries Inc. Titanium tungsten liner used with copper interconnects
US10211148B2 (en) * 2015-12-14 2019-02-19 International Business Machines Corporation Structural enhancement of Cu nanowires
US9935051B2 (en) 2016-08-18 2018-04-03 International Business Machines Corporation Multi-level metallization interconnect structure
JP2018107227A (ja) * 2016-12-26 2018-07-05 ソニーセミコンダクタソリューションズ株式会社 半導体装置、半導体装置の製造方法、及び、固体撮像素子
KR102438179B1 (ko) * 2017-11-02 2022-08-30 삼성전자주식회사 반도체 장치 및 이를 포함하는 반도체 패키지, 및 상기 반도체 장치의 제조 방법
US20200111741A1 (en) * 2018-10-09 2020-04-09 International Business Machines Corporation Vertical electrical fuse
US11177169B2 (en) * 2019-06-21 2021-11-16 International Business Machines Corporation Interconnects with gouged vias
CN119364753A (zh) * 2023-07-12 2025-01-24 长鑫科技集团股份有限公司 半导体结构及其制备方法

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Publication number Priority date Publication date Assignee Title
DE102005024912A1 (de) * 2005-05-31 2006-12-07 Advanced Micro Devices, Inc., Sunnyvale Technik zur Herstellung von kupferenthaltenden Leitungen, die in einem Dielektrikum mit kleinem ε eingebettet sind, durch Vorsehen einer Versteifungsschicht
US7528066B2 (en) 2006-03-01 2009-05-05 International Business Machines Corporation Structure and method for metal integration
JP5162869B2 (ja) * 2006-09-20 2013-03-13 富士通セミコンダクター株式会社 半導体装置およびその製造方法
US20080128907A1 (en) * 2006-12-01 2008-06-05 International Business Machines Corporation Semiconductor structure with liner
JP2009027048A (ja) * 2007-07-23 2009-02-05 Panasonic Corp 半導体装置の製造方法
US7846834B2 (en) * 2008-02-04 2010-12-07 International Business Machines Corporation Interconnect structure and method for Cu/ultra low k integration
US7834457B2 (en) * 2008-02-28 2010-11-16 International Business Machines Corporation Bilayer metal capping layer for interconnect applications

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9991200B2 (en) 2014-09-25 2018-06-05 Taiwan Semiconductor Manufacturing Company, Ltd. Air gap structure and method
US10354949B2 (en) 2014-09-25 2019-07-16 Taiwan Semiconductor Manufacturing Company, Ltd. Air gap structure and method
KR20190092401A (ko) * 2016-12-29 2019-08-07 인텔 코포레이션 자체-정렬형 비아
WO2018190817A1 (en) * 2017-04-12 2018-10-18 Intel Corporation Integrated circuit interconnects
US11018054B2 (en) 2017-04-12 2021-05-25 Intel Corporation Integrated circuit interconnects

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Publication number Publication date
US7964966B2 (en) 2011-06-21
US20100327446A1 (en) 2010-12-30
JP2011014904A (ja) 2011-01-20

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