KR20100122894A - 평면 안테나 부재, 및 이것을 구비한 플라즈마 처리 장치 - Google Patents

평면 안테나 부재, 및 이것을 구비한 플라즈마 처리 장치 Download PDF

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Publication number
KR20100122894A
KR20100122894A KR1020107007491A KR20107007491A KR20100122894A KR 20100122894 A KR20100122894 A KR 20100122894A KR 1020107007491 A KR1020107007491 A KR 1020107007491A KR 20107007491 A KR20107007491 A KR 20107007491A KR 20100122894 A KR20100122894 A KR 20100122894A
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KR
South Korea
Prior art keywords
center
planar antenna
hole
antenna member
range
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
KR1020107007491A
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English (en)
Korean (ko)
Inventor
아츠시 우에다
히카루 아다치
카이종 티안
요시노리 후쿠다
도시아키 혼고
마사오 요시오카
Original Assignee
도쿄엘렉트론가부시키가이샤
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Publication date
Application filed by 도쿄엘렉트론가부시키가이샤 filed Critical 도쿄엘렉트론가부시키가이샤
Publication of KR20100122894A publication Critical patent/KR20100122894A/ko
Ceased legal-status Critical Current

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    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H01J37/32211—Means for coupling power to the plasma
    • H01J37/3222—Antennas

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electromagnetism (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Plasma Technology (AREA)
  • Drying Of Semiconductors (AREA)
  • Chemical Vapour Deposition (AREA)
KR1020107007491A 2008-03-14 2009-03-13 평면 안테나 부재, 및 이것을 구비한 플라즈마 처리 장치 Ceased KR20100122894A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2008-065635 2008-03-14
JP2008065635A JP2009224455A (ja) 2008-03-14 2008-03-14 平面アンテナ部材およびこれを備えたプラズマ処理装置

Publications (1)

Publication Number Publication Date
KR20100122894A true KR20100122894A (ko) 2010-11-23

Family

ID=41065337

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020107007491A Ceased KR20100122894A (ko) 2008-03-14 2009-03-13 평면 안테나 부재, 및 이것을 구비한 플라즈마 처리 장치

Country Status (5)

Country Link
US (1) US20110114021A1 (enExample)
JP (1) JP2009224455A (enExample)
KR (1) KR20100122894A (enExample)
CN (1) CN101849444B (enExample)
WO (1) WO2009113680A1 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10755899B2 (en) 2014-06-30 2020-08-25 Semes Co., Ltd. Substrate treating apparatus

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8884526B2 (en) 2012-01-20 2014-11-11 Taiwan Semiconductor Manufacturing Co., Ltd. Coherent multiple side electromagnets
CN103647128B (zh) * 2013-12-23 2016-05-11 西南交通大学 一种高功率径向线密封窗
CN106463344B (zh) 2014-05-16 2019-10-11 应用材料公司 喷头设计

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03191073A (ja) * 1989-12-21 1991-08-21 Canon Inc マイクロ波プラズマ処理装置
JP3136054B2 (ja) * 1994-08-16 2001-02-19 東京エレクトロン株式会社 プラズマ処理装置
JPH11251299A (ja) * 1998-03-03 1999-09-17 Hitachi Ltd プラズマ処理方法および装置
JPH11260594A (ja) * 1998-03-12 1999-09-24 Hitachi Ltd プラズマ処理装置
JP3430053B2 (ja) * 1999-02-01 2003-07-28 東京エレクトロン株式会社 プラズマ処理装置
JP4478352B2 (ja) * 2000-03-29 2010-06-09 キヤノン株式会社 プラズマ処理装置及びプラズマ処理方法並びに構造体の製造方法
JP4504511B2 (ja) * 2000-05-26 2010-07-14 忠弘 大見 プラズマ処理装置
JP4598247B2 (ja) * 2000-08-04 2010-12-15 東京エレクトロン株式会社 ラジアルアンテナ及びそれを用いたプラズマ装置
JP4183934B2 (ja) * 2001-10-19 2008-11-19 尚久 後藤 マイクロ波プラズマ処理装置、マイクロ波プラズマ処理方法及びマイクロ波給電装置
JP3914071B2 (ja) * 2002-03-12 2007-05-16 東京エレクトロン株式会社 プラズマ処理装置
JP2004235434A (ja) * 2003-01-30 2004-08-19 Rohm Co Ltd プラズマ処理装置
US6998565B2 (en) * 2003-01-30 2006-02-14 Rohm Co., Ltd. Plasma processing apparatus
JP4149427B2 (ja) * 2004-10-07 2008-09-10 東京エレクトロン株式会社 マイクロ波プラズマ処理装置
US20080190560A1 (en) * 2005-03-04 2008-08-14 Caizhong Tian Microwave Plasma Processing Apparatus
JP2006244891A (ja) * 2005-03-04 2006-09-14 Tokyo Electron Ltd マイクロ波プラズマ処理装置
JP4997826B2 (ja) * 2006-05-22 2012-08-08 東京エレクトロン株式会社 平面アンテナ部材及びこれを用いたプラズマ処理装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10755899B2 (en) 2014-06-30 2020-08-25 Semes Co., Ltd. Substrate treating apparatus

Also Published As

Publication number Publication date
JP2009224455A (ja) 2009-10-01
US20110114021A1 (en) 2011-05-19
WO2009113680A1 (ja) 2009-09-17
CN101849444B (zh) 2012-08-29
CN101849444A (zh) 2010-09-29

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