KR20100081927A - 노광 장치 및 노광 장치를 사용하여 디바이스를 제조하는 방법 - Google Patents

노광 장치 및 노광 장치를 사용하여 디바이스를 제조하는 방법 Download PDF

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Publication number
KR20100081927A
KR20100081927A KR1020090131424A KR20090131424A KR20100081927A KR 20100081927 A KR20100081927 A KR 20100081927A KR 1020090131424 A KR1020090131424 A KR 1020090131424A KR 20090131424 A KR20090131424 A KR 20090131424A KR 20100081927 A KR20100081927 A KR 20100081927A
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KR
South Korea
Prior art keywords
optical system
projection optical
exposure
light
shutter
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
KR1020090131424A
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English (en)
Korean (ko)
Inventor
오사무 야스노베
유우끼 우찌다
Original Assignee
캐논 가부시끼가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 캐논 가부시끼가이샤 filed Critical 캐논 가부시끼가이샤
Publication of KR20100081927A publication Critical patent/KR20100081927A/ko
Abandoned legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
    • G03F7/70891—Temperature
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70308—Optical correction elements, filters or phase plates for manipulating imaging light, e.g. intensity, wavelength, polarisation, phase or image shift
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70833—Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground

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  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
KR1020090131424A 2009-01-06 2009-12-28 노광 장치 및 노광 장치를 사용하여 디바이스를 제조하는 방법 Abandoned KR20100081927A (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2009001015 2009-01-06
JPJP-P-2009-001015 2009-01-06
JPJP-P-2009-229734 2009-10-01
JP2009229734A JP2010181861A (ja) 2009-01-06 2009-10-01 露光装置、及びそれを用いたデバイスの製造方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
KR1020130029056A Division KR20130032893A (ko) 2009-01-06 2013-03-19 노광 장치 및 노광 장치를 사용하여 디바이스를 제조하는 방법

Publications (1)

Publication Number Publication Date
KR20100081927A true KR20100081927A (ko) 2010-07-15

Family

ID=42311918

Family Applications (2)

Application Number Title Priority Date Filing Date
KR1020090131424A Abandoned KR20100081927A (ko) 2009-01-06 2009-12-28 노광 장치 및 노광 장치를 사용하여 디바이스를 제조하는 방법
KR1020130029056A Ceased KR20130032893A (ko) 2009-01-06 2013-03-19 노광 장치 및 노광 장치를 사용하여 디바이스를 제조하는 방법

Family Applications After (1)

Application Number Title Priority Date Filing Date
KR1020130029056A Ceased KR20130032893A (ko) 2009-01-06 2013-03-19 노광 장치 및 노광 장치를 사용하여 디바이스를 제조하는 방법

Country Status (3)

Country Link
US (1) US8363207B2 (https=)
JP (1) JP2010181861A (https=)
KR (2) KR20100081927A (https=)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9235134B2 (en) * 2010-08-16 2016-01-12 Micron Technology, Inc. Lens heating compensation in photolithography
JP2012234110A (ja) * 2011-05-09 2012-11-29 Canon Inc 露光装置、およびそれを用いたデバイスの製造方法
CN102411264B (zh) * 2011-11-22 2014-07-16 上海华力微电子有限公司 光刻机投影物镜温度均衡装置及均衡方法
CN204406005U (zh) * 2015-02-28 2015-06-17 成都京东方光电科技有限公司 光取向设备

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63266821A (ja) * 1987-04-24 1988-11-02 Nippon Telegr & Teleph Corp <Ntt> 紫外線露光装置
JP2682067B2 (ja) * 1988-10-17 1997-11-26 株式会社ニコン 露光装置及び露光方法
JPH03222405A (ja) 1990-01-29 1991-10-01 Hitachi Ltd 露光装置およびそれに用いられる空露光方法
US6078380A (en) * 1991-10-08 2000-06-20 Nikon Corporation Projection exposure apparatus and method involving variation and correction of light intensity distributions, detection and control of imaging characteristics, and control of exposure
US5677757A (en) * 1994-03-29 1997-10-14 Nikon Corporation Projection exposure apparatus
US5995263A (en) * 1993-11-12 1999-11-30 Nikon Corporation Projection exposure apparatus
JP3552221B2 (ja) * 1995-09-11 2004-08-11 株式会社ニコン 投影露光装置
JPH09199384A (ja) * 1996-01-23 1997-07-31 Nec Kyushu Ltd 露光装置及び露光方法
JP2001351850A (ja) 2000-06-08 2001-12-21 Canon Inc 半導体製造装置および半導体デバイス製造方法
JP3341767B2 (ja) * 2001-10-10 2002-11-05 株式会社ニコン 投影露光装置及び方法、並びに回路素子形成方法

Also Published As

Publication number Publication date
JP2010181861A (ja) 2010-08-19
US8363207B2 (en) 2013-01-29
KR20130032893A (ko) 2013-04-02
US20100173236A1 (en) 2010-07-08

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