KR20100065127A - 진공 처리 시스템 및 기판 반송 방법 - Google Patents
진공 처리 시스템 및 기판 반송 방법 Download PDFInfo
- Publication number
- KR20100065127A KR20100065127A KR1020097027030A KR20097027030A KR20100065127A KR 20100065127 A KR20100065127 A KR 20100065127A KR 1020097027030 A KR1020097027030 A KR 1020097027030A KR 20097027030 A KR20097027030 A KR 20097027030A KR 20100065127 A KR20100065127 A KR 20100065127A
- Authority
- KR
- South Korea
- Prior art keywords
- chamber
- processing
- pressure
- substrate
- processed
- Prior art date
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
- C23C14/566—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases using a load-lock chamber
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/54—Apparatus specially adapted for continuous coating
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
- H01L21/67184—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the presence of more than one transfer chamber
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
- H01L21/67196—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the construction of the transfer chamber
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
- H01L21/67201—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the construction of the load-lock chamber
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
- H01L21/67207—Apparatus for manufacturing or treating in a plurality of work-stations comprising a chamber adapted to a particular process
- H01L21/6723—Apparatus for manufacturing or treating in a plurality of work-stations comprising a chamber adapted to a particular process comprising at least one plating chamber
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JPJP-P-2007-233724 | 2007-09-10 | ||
JP2007233724A JP2009062604A (ja) | 2007-09-10 | 2007-09-10 | 真空処理システムおよび基板搬送方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
KR20100065127A true KR20100065127A (ko) | 2010-06-15 |
Family
ID=40451878
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020097027030A KR20100065127A (ko) | 2007-09-10 | 2008-09-01 | 진공 처리 시스템 및 기판 반송 방법 |
Country Status (5)
Country | Link |
---|---|
JP (1) | JP2009062604A (zh) |
KR (1) | KR20100065127A (zh) |
CN (1) | CN101688296A (zh) |
TW (1) | TW200931577A (zh) |
WO (1) | WO2009034869A1 (zh) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101254721B1 (ko) * | 2011-03-30 | 2013-04-15 | 삼성전자주식회사 | 이에프이엠 버퍼 모듈 |
KR101318929B1 (ko) * | 2012-06-18 | 2013-10-17 | 주식회사 씨엘디 | 가압 장치 |
KR101375646B1 (ko) * | 2012-06-18 | 2014-03-18 | 주식회사 씨엘디 | 가압 장치 및 방법 |
KR101421795B1 (ko) * | 2011-07-20 | 2014-07-22 | 가부시키가이샤 뉴플레어 테크놀로지 | 기상 성장 방법 및 기상 성장 장치 |
KR20150086833A (ko) * | 2014-01-20 | 2015-07-29 | 주식회사 풍산 | 반도체 기판 처리장치 |
KR20210117943A (ko) * | 2020-03-19 | 2021-09-29 | 도쿄엘렉트론가부시키가이샤 | 기판 반송 방법 및 기판 처리 장치 |
Families Citing this family (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2011040538A1 (ja) * | 2009-10-02 | 2011-04-07 | 東京エレクトロン株式会社 | 基板処理システム |
TWI532114B (zh) * | 2009-11-12 | 2016-05-01 | Hitachi High Tech Corp | Vacuum processing device and operation method of vacuum processing device |
CN101958231A (zh) * | 2010-05-06 | 2011-01-26 | 东莞宏威数码机械有限公司 | 气体环境缓冲装置 |
KR20120015987A (ko) * | 2010-08-12 | 2012-02-22 | 삼성전자주식회사 | 기판 처리 시스템 |
JP5785712B2 (ja) * | 2010-12-28 | 2015-09-30 | 株式会社日立ハイテクノロジーズ | 真空処理装置 |
JP5923288B2 (ja) * | 2011-12-01 | 2016-05-24 | 株式会社日立ハイテクノロジーズ | 真空処理装置及び真空処理装置の運転方法 |
CN103184427A (zh) * | 2011-12-28 | 2013-07-03 | 绿种子科技(潍坊)有限公司 | 薄膜沉积装置及其使用方法 |
JP6120621B2 (ja) * | 2013-03-14 | 2017-04-26 | 株式会社日立ハイテクノロジーズ | 真空処理装置及びその運転方法 |
CN104421437B (zh) * | 2013-08-20 | 2017-10-17 | 中微半导体设备(上海)有限公司 | 活动阀门、活动屏蔽门及真空处理系统 |
JP2017028209A (ja) * | 2015-07-27 | 2017-02-02 | 東京エレクトロン株式会社 | 基板収納方法及び基板処理装置 |
JP6141479B1 (ja) * | 2016-03-18 | 2017-06-07 | エスペック株式会社 | 乾燥装置 |
CN106229287B (zh) * | 2016-09-30 | 2019-04-05 | 厦门市三安光电科技有限公司 | 用于转移微元件的转置头及微元件的转移方法 |
CN110835739A (zh) * | 2018-08-17 | 2020-02-25 | 中智(泰兴)电力科技有限公司 | 7腔体立式pecvd-pvd一体化硅片镀膜工艺 |
CN110835735A (zh) * | 2018-08-17 | 2020-02-25 | 中智(泰兴)电力科技有限公司 | 一种8腔体卧式hwcvd-pvd一体化硅片镀膜工艺 |
KR102618825B1 (ko) * | 2020-01-06 | 2023-12-27 | 삼성전자주식회사 | 베이 내 가스 누출 방지를 위한 에어락 장치 및 제어 시스템 |
JP7420350B2 (ja) * | 2020-04-24 | 2024-01-23 | 島根島津株式会社 | 自動保管モジュールおよび自動保管システム |
JP7344236B2 (ja) * | 2021-02-08 | 2023-09-13 | キヤノントッキ株式会社 | 搬送装置、成膜装置及び制御方法 |
CN113122812B (zh) * | 2021-04-20 | 2023-06-09 | 郑州航空工业管理学院 | 一种物理气相沉积材料加工设备 |
KR102452714B1 (ko) * | 2021-12-23 | 2022-10-07 | 주식회사 에이치피에스피 | 고압 및 진공공정 병행 챔버장치 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0793348B2 (ja) * | 1989-05-19 | 1995-10-09 | アプライド マテリアルズ インコーポレーテッド | 多重チャンバ真空式処理装置及び多重チャンバ真空式半導体ウェーハ処理装置 |
JPH04254349A (ja) * | 1991-02-06 | 1992-09-09 | Sony Corp | マルチチャンバプロセス装置 |
JP3486821B2 (ja) * | 1994-01-21 | 2004-01-13 | 東京エレクトロン株式会社 | 処理装置及び処理装置内の被処理体の搬送方法 |
JP2003060008A (ja) * | 2001-05-21 | 2003-02-28 | Tokyo Electron Ltd | 処理装置、移載装置、移載方法 |
-
2007
- 2007-09-10 JP JP2007233724A patent/JP2009062604A/ja not_active Ceased
-
2008
- 2008-09-01 WO PCT/JP2008/065672 patent/WO2009034869A1/ja active Application Filing
- 2008-09-01 KR KR1020097027030A patent/KR20100065127A/ko active Search and Examination
- 2008-09-01 CN CN200880023081A patent/CN101688296A/zh active Pending
- 2008-09-09 TW TW97134559A patent/TW200931577A/zh unknown
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101254721B1 (ko) * | 2011-03-30 | 2013-04-15 | 삼성전자주식회사 | 이에프이엠 버퍼 모듈 |
KR101421795B1 (ko) * | 2011-07-20 | 2014-07-22 | 가부시키가이샤 뉴플레어 테크놀로지 | 기상 성장 방법 및 기상 성장 장치 |
KR101318929B1 (ko) * | 2012-06-18 | 2013-10-17 | 주식회사 씨엘디 | 가압 장치 |
KR101375646B1 (ko) * | 2012-06-18 | 2014-03-18 | 주식회사 씨엘디 | 가압 장치 및 방법 |
KR20150086833A (ko) * | 2014-01-20 | 2015-07-29 | 주식회사 풍산 | 반도체 기판 처리장치 |
KR20210117943A (ko) * | 2020-03-19 | 2021-09-29 | 도쿄엘렉트론가부시키가이샤 | 기판 반송 방법 및 기판 처리 장치 |
Also Published As
Publication number | Publication date |
---|---|
TW200931577A (en) | 2009-07-16 |
WO2009034869A1 (ja) | 2009-03-19 |
CN101688296A (zh) | 2010-03-31 |
JP2009062604A (ja) | 2009-03-26 |
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