KR20100015605A - 기화된 유기 물질의 정밀 제어 - Google Patents

기화된 유기 물질의 정밀 제어 Download PDF

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Publication number
KR20100015605A
KR20100015605A KR1020097021532A KR20097021532A KR20100015605A KR 20100015605 A KR20100015605 A KR 20100015605A KR 1020097021532 A KR1020097021532 A KR 1020097021532A KR 20097021532 A KR20097021532 A KR 20097021532A KR 20100015605 A KR20100015605 A KR 20100015605A
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KR
South Korea
Prior art keywords
mixture
manifold
organic
organic components
host
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
KR1020097021532A
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English (en)
Korean (ko)
Inventor
마이클 루이스 보로슨
Original Assignee
이스트맨 코닥 캄파니
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 이스트맨 코닥 캄파니 filed Critical 이스트맨 코닥 캄파니
Publication of KR20100015605A publication Critical patent/KR20100015605A/ko
Ceased legal-status Critical Current

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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • C23C14/246Replenishment of source material
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/12Organic material
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10Deposition of organic active material
    • H10K71/16Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Electroluminescent Light Sources (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
KR1020097021532A 2007-04-16 2008-04-02 기화된 유기 물질의 정밀 제어 Ceased KR20100015605A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11/735,544 2007-04-16
US11/735,544 US20080254217A1 (en) 2007-04-16 2007-04-16 Fine control of vaporized organic material

Publications (1)

Publication Number Publication Date
KR20100015605A true KR20100015605A (ko) 2010-02-12

Family

ID=39431623

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020097021532A Ceased KR20100015605A (ko) 2007-04-16 2008-04-02 기화된 유기 물질의 정밀 제어

Country Status (6)

Country Link
US (1) US20080254217A1 (https=)
EP (1) EP2137335B1 (https=)
JP (1) JP2010525163A (https=)
KR (1) KR20100015605A (https=)
CN (1) CN101657561B (https=)
WO (1) WO2008127554A1 (https=)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4974036B2 (ja) * 2009-11-19 2012-07-11 株式会社ジャパンディスプレイセントラル 有機el装置の製造方法
WO2013052460A1 (en) * 2011-10-05 2013-04-11 First Solar, Inc. Vapor transport deposition method and system for material co-deposition
US10450527B2 (en) 2015-01-29 2019-10-22 Jtekt Corporation Low-friction coating production method and sliding method
WO2016121936A1 (ja) * 2015-01-29 2016-08-04 株式会社ジェイテクト 非晶質炭化水素系膜、ならびにそれを備えた摺動部材および摺動システム
JP6796297B2 (ja) * 2015-01-29 2020-12-09 株式会社ジェイテクト 摺動システム
US12307933B1 (en) 2024-04-26 2025-05-20 Dell Products L.P. Organic light emitting diode display film pixel shifting with temporal segmented image tracking
US12456420B1 (en) 2024-04-26 2025-10-28 Dell Products L.P. Organic light emitting diode display film comfort state personalization by machine learning

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4885211A (en) * 1987-02-11 1989-12-05 Eastman Kodak Company Electroluminescent device with improved cathode
US4769292A (en) * 1987-03-02 1988-09-06 Eastman Kodak Company Electroluminescent device with modified thin film luminescent zone
US5273583A (en) * 1990-07-02 1993-12-28 Xerox Corporation Fabrication of electrophotographic imaging members
US5149612A (en) * 1990-07-02 1992-09-22 Xerox Corporation Fabrication of electrophotographic imaging members
JP3586551B2 (ja) * 1998-01-27 2004-11-10 松下電器産業株式会社 光記録媒体の製造方法及び製造装置
KR20040019293A (ko) * 2001-05-24 2004-03-05 셀레리티 그룹 아이엔씨 소정 비율의 프로세스 유체를 제공하는 방법 및 장치
JP2003086375A (ja) * 2001-09-14 2003-03-20 Nippon Seiki Co Ltd 有機電界発光素子
US6749906B2 (en) * 2002-04-25 2004-06-15 Eastman Kodak Company Thermal physical vapor deposition apparatus with detachable vapor source(s) and method
KR100560783B1 (ko) * 2003-09-03 2006-03-13 삼성에스디아이 주식회사 도핑된 발광층을 갖는 유기전계발광소자
US7232588B2 (en) * 2004-02-23 2007-06-19 Eastman Kodak Company Device and method for vaporizing temperature sensitive materials
US7238389B2 (en) * 2004-03-22 2007-07-03 Eastman Kodak Company Vaporizing fluidized organic materials
US7501151B2 (en) * 2004-09-21 2009-03-10 Eastman Kodak Company Delivering particulate material to a vaporization zone
US7501152B2 (en) * 2004-09-21 2009-03-10 Eastman Kodak Company Delivering particulate material to a vaporization zone
US7288285B2 (en) * 2004-09-21 2007-10-30 Eastman Kodak Company Delivering organic powder to a vaporization zone
US7288286B2 (en) * 2004-09-21 2007-10-30 Eastman Kodak Company Delivering organic powder to a vaporization zone

Also Published As

Publication number Publication date
CN101657561B (zh) 2011-09-28
US20080254217A1 (en) 2008-10-16
CN101657561A (zh) 2010-02-24
EP2137335B1 (en) 2014-02-12
WO2008127554A1 (en) 2008-10-23
JP2010525163A (ja) 2010-07-22
EP2137335A1 (en) 2009-12-30

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