KR20090126622A - Uneri measurement device and measurement method - Google Patents

Abstract

PURPOSE: A uneri measurement device distinguishing where the uneri is generated and a measuring method thereof are provided to improve production yield according to the decrease of failure rate. CONSTITUTION: A uneri measurement device comprises a chamber(205), a light source(220), a detector(250) and a measurement glass substrate(240). The chamber blocks the external light. The light source is in one inner side of the chamber and generates the laser(L). The detector is separated from the light source. The measurement glass substrate is located between the light source and the detector. The measurement glass substrate is settled in a stage in which the substrate rotates 360°. The detector detects where the uneri is generated.

Description

Uneri Measurement Device and Measurement Method

The present invention relates to a uneori measuring equipment, and more particularly, to a uneori measuring equipment and measuring method that can determine in advance the kind of uneori that appears as a fine egg bent on the surface of the glass substrate.

In general, the driving principle of the liquid crystal display device uses the optical anisotropy and polarization property of the liquid crystal. The liquid crystal has a long and thin structure, and thus has a directivity in the arrangement of molecules. Can be controlled.

Accordingly, when the molecular arrangement direction of the liquid crystal is arbitrarily adjusted, the molecular arrangement of the liquid crystal is changed, and light is refracted in the molecular arrangement direction of the liquid crystal due to optical anisotropy to express image information.

Currently, active matrix LCDs (AM-LCDs) in which thin film transistors and pixel electrodes connected to the thin film transistors are arranged in a matrix manner have attracted the most attention because of their excellent resolution and video performance.

Hereinafter, a liquid crystal display according to the related art will be described with reference to the accompanying drawings.

1 is a schematic cross-sectional view of a liquid crystal display according to the related art.

As shown in the drawing, the liquid crystal display 95 according to the related art has a first cell 5 and a second substrate 10 which have a predetermined cell gap d and are opposed to each other, and the first substrate 5 and the first substrate. The liquid crystal layer 15 is disposed in the spaced apart space of the second substrate 10, and the backlight unit 90 is disposed on the back surface spaced apart from the second substrate 10. In this case, the first and second substrates 5 and 10 and the liquid crystal layer 15 may be referred to as a liquid crystal panel 30.

The first substrate 5 may include a first glass substrate 1 divided into an active region AA that implements an image, an inactive region NAA, and a lower surface of the first glass substrate 1. Red (R), green (G), and blue (B) sub color filters 16a and 16b sequentially patterned on the black matrix 12 corresponding to the inactive region NAA and the black matrix 12 is bounded. And a color filter layer 16 including a common electrode 80 formed on the entire lower surface of the color filter layer 16.

Although not shown in the drawings, an overcoat layer (not shown) may be further configured in the space between the color filter layer 16 and the common electrode 80 for the purpose of mixing and planarizing color pigments.

Meanwhile, the second substrate 10 may include an active region AA including a pixel region P and a switching region S, and a second glass substrate 2 divided into an inactive region NAA. A gate wiring (not shown) configured in one direction of the upper surface of the second glass substrate 2, a gate electrode 25 extending from the gate wiring, and an upper front surface of the gate wiring and the gate electrode 25. A gate insulating layer 45 covering the semiconductor layer 45, a semiconductor layer 40 overlapping the gate electrode 25 on the gate insulating layer 45, and a pixel region disposed on the semiconductor layer 40 and vertically intersecting with the gate wiring. A data line (not shown) defining P), a source electrode 32 extending from the data line and in contact with the semiconductor layer 40, a drain electrode 34 spaced apart from the source electrode 32, One of the drain electrodes 34 covering the data line and the source and drain electrodes 32 and 34. To include a pixel electrode 70 connected to the drain electrode 34 via the protective film 55 and the drain contact hole (CH1) containing the drain contact hole (CH1) of exposure.

In order to manufacture the liquid crystal display device 95 having the above-described configuration, two glass substrates, that is, first and second glass substrates 1 and 2, are necessarily required. In this case, the first and second glass substrates 1 and 2 have been mainly used with a thickness of 1.1 mm, but in recent years, the thickness of 0.7 mm has become popular due to thinning and weight reduction. The first and second glass substrates 1 and 2 are generally manufactured by a floating method or a fusion method.

However, due to problems in the manufacturing process of the first and second glass substrates (1, 2), unevenness appears in the form of bands on the surface of the first and second glass substrates (1, 2) Saliva, etc.) often occurs.

FIG. 2A is a plan view illustrating a glass substrate on which a unary is generated, and FIG. 2B is a cross-sectional view taken along line II-II ′ of FIG. 2A, and will be described in detail with reference to the drawing.

As shown in FIG. 2A and FIG. 2B, the large glass substrate 100 used as the base of the 1st or 2nd glass substrate (1 or 2 of FIG. 1) of a liquid crystal display device (95 of FIG. 1) is shown. . The portion F indicated by the dotted line on the glass substrate 100 is a photolithography process including a deposition, exposure, development, and etching process on the glass substrate 100 to produce an array element or a color filter element, and then scribe and cut The area to be cut by the process and separated into individual first or second glass substrates.

In this case, a fine curvature unery (uneri) 110 is generated on the surface of the glass substrate 100 due to a defect in the manufacturing process. The unery 110 is one of the defects generated in the manufacturing process of the glass substrate 100, the stripe of the stripe pattern (stripe pattern) is generated at a constant height (H) from the surface of the glass substrate 100 Say.

That is, as shown in FIG. 2B, the uriri 110 refers to a pattern in which a regular or irregularly protruding pattern repeatedly appears along the exposed surface of the glass substrate 100. The unery 110 may be classified into streaks generated on one exposed surface of the glass substrate 100 and code defects generated on both surfaces of the glass substrate 100.

At this time, the uriri 110 is generated in various forms such as a triangular shape, a semi-circular shape from the surface of the glass substrate 100 in the cross section.

The unery 110 is formed on the entire surface of the glass substrate 100 along the horizontal or vertical direction of the glass substrate 100 in the form of a band due to the manufacturing process characteristics of the glass substrate 100. Although the unery 110 is extremely finely generated on the surface of the glass substrate 100, when the fabrication of the liquid crystal display device is completed and the inspection process is performed, the unery 110 is expressed as a linear unevenness, causing a problem of deterioration in image quality due to uneven brightness. I'm making it.

In particular, in consideration of the fact that the unery 110 is generated at the glass substrate 100 which occupies a large portion of the manufacturing cost as well as at the beginning of the manufacturing process of the liquid crystal display device, the unery 110 is generated in advance. It is urgent to provide a system that can detect the presence or absence. However, since the unery 110 is generated at an extremely fine scale, it is not easy to solve the problem, thus causing a great impact on the production yield.

There is a contact method and a non-contact method for measuring the presence or absence of such defects of the uneri (110). The contact method has a height method and a wavyness method. The contact method has excellent measurement reliability while damaging the surface of the glass substrate 100 by damaging the surface of the glass substrate 100. It has the disadvantage of being coated.

In contrast, there is an optical system as a non-contact system. Such an optical method is generally used to use a xenon lamp (Xe-Lamp), the optical method using such a xenon lamp has an advantage that can easily measure the presence or absence of the Uneri 110 in a non-destructive manner.

Hereinafter, an optical method using a xenon lamp according to the related art will be described with reference to the accompanying drawings.

3 is a view schematically showing a uniori measuring equipment using a xenon lamp according to the prior art.

As shown in the drawing, the conventional unary measuring apparatus 150 may include a xenon lamp 155, a screen 170 spaced apart from the xenon lamp 155, and the xenon lamp 155 and the screen 170. And a stage 165 positioned in an interspace and capable of rotating 360 degrees, and a measurement glass substrate 160 fixed to an upper surface of the stage 165.

In this case, the measurement glass substrate 160 may be irradiated in a direction perpendicular to the screen 170, that is, the irradiation direction of the xenon lamp 155 is parallel to the thickness plane T of the measurement glass substrate 160. The xenon lamp 155, the measuring glass substrate 160, and the screen 170 are aligned.

The unery measuring device 150 having such a configuration operates the xenon lamp 155 to irradiate light onto the measuring glass substrate 160, and the light passing through the measuring glass substrate 160 forms a difference on the screen 170. The principle is to use it.

That is, in the conventional uneri measuring equipment 150, in the state where the thickness plane T of the xenon lamp 155 and the measurement glass substrate 160 are arranged in a line, the light irradiated from the xenon lamp 155 is When light is not transmitted by the thickness T of the measuring glass substrate 160 to prevent image formation on the screen 170, the stage 165 is gradually turned clockwise or counterclockwise to change the angle of the xenon lamp. Light irradiated from 155 passes through the flat surface of the measuring glass substrate 160 to form an image on the screen 170.

At this time, it is possible to detect whether the unori is generated through the correlation between the angle change of the measurement glass substrate 160 by the stage 165 and the image formed on the screen 170. That is, it may be referred to as a method using a difference in transmittance of light irradiated onto the measurement glass substrate 160 according to the angle change of the stage 165.

However, since the conventional Uneri measuring equipment 150 is measured by the naked eye, it can only detect the position of the Uneri generated in the measuring glass substrate 160 because it is dependent on the measurer. In addition, there is a problem in that it is impossible to determine which side of the unery is generated on the measurement glass substrate 160.

That is, a streak in which a uni-ri occurs on one surface of the measurement glass substrate 160 and a cord generated on both surfaces of the measurement glass substrate 160 are different in structure and scale. Due to such a difference, the tendency to cause problems in mass production of the liquid crystal display device is different.

For example, assuming that streaks are generated in the measurement glass substrate 160, when the side where streaks are generated during the manufacturing process of the liquid crystal display device is disposed outside the liquid crystal layer, the image quality is not affected. In the case of being disposed inside, a problem of poor image quality is caused due to the refractive index inside the liquid crystal layer.

SUMMARY OF THE INVENTION The present invention has been made to solve the above-described problem, and an object thereof is to improve production yield by providing a uneori measuring device capable of determining whether or not unieri is generated on a glass substrate. .

According to an embodiment of the present invention for achieving the above object, the uneori measuring equipment includes a chamber for blocking external light; A light source for generating a laser inside the chamber; A measurement glass substrate mounted on a stage spaced in parallel with the light source and capable of rotating 360 degrees; And a photo detector spaced in parallel with the measurement glass substrate and detecting which surface of the measurement glass substrate has unevenness generated by using a laser irradiated from the light source.

The laser is characterized in that it has a wavelength range of 300nm ~ several mm.

According to an embodiment of the present invention for achieving the above object is a method for measuring the uniori generated by the uniori measuring equipment using a xenon lamp; Irradiating a laser beam from the light source onto the measurement glass substrate while rotating the measurement glass substrate on which the unery is generated at a predetermined angle using a stage; Detecting the laser beam penetrating the measurement glass substrate with a photo detector.

In this case, the photo detector detects whether a first refractive pattern is generated by a uni-corresponding to an upper surface of the measuring glass substrate, and whether a second refractive pattern is generated by a uni-ri corresponding to a lower surface of the measuring glass substrate. By doing so, it is possible to discriminate not only the kind of the anneal but also any one of both surfaces of the measurement glass substrate.

According to another aspect of the present invention, there is provided a uneori measuring apparatus comprising: a chamber for blocking external light; A light source for generating a laser inside the chamber; A measurement glass substrate spaced parallel to the light source and seated on a fixed stage; And a photo detector spaced parallel to the measurement glass substrate and detecting which surface of the measurement glass substrate has unevenness generated on the surface of the measurement glass substrate while moving along a laser in which a direction irradiated from the light source is changed.

According to still another aspect of the present invention, there is provided a method for measuring a uniori, comprising: arranging a measurement glass substrate on which a uniri is generated; Bringing a light source generating a laser into close contact with the unary generation point of the measurement glass substrate; Irradiating a laser to the unery generation point of the measurement glass substrate, and measuring the amount of light scattered by the reflection by the unery and the amount of light passing through the measurement glass substrate with a light detector.

In the present invention, first, it is possible to easily determine the type of unori generated on the glass substrate, thereby improving the production yield due to the reduction of defects during mass production of the liquid crystal display device.

Second, the non-destructive and optical method can easily determine the type of unery without fear of damage to the measurement glass substrate.

--- First Embodiment ---

The first embodiment of the present invention is characterized by providing a uneori measuring equipment that can easily distinguish the type of uneori using a laser and a light detector.

Hereinafter, with reference to the accompanying drawings it will be described with respect to the unery measuring equipment according to a first embodiment of the present invention.

4 is a view schematically illustrating the unori measuring apparatus according to the first embodiment of the present invention, and more particularly, relates to the uneri measuring apparatus capable of determining the type of uneri, and FIGS. 5A and 5B A diagram for explaining the trick and code.

As shown in FIGS. 4, 5A, and 5B, the unary measuring apparatus 200 according to the first embodiment of the present invention includes a chamber 205 for blocking external light and an inside of the chamber 205. In the space between the light source 220 for generating a laser (L) on one side, the light detector 250 spaced apart from the light source 220, and the light source 220 and the light detector 250 spaced in parallel The measuring glass substrate 240 is located.

The chamber 205 blocks external light to prevent generation of noise due to an interference effect by external light.

The light source 220 uses a single wavelength laser, which includes a gas laser, a solid laser, a liquid laser, and a semiconductor laser. That is, the unary measuring apparatus 200 according to the first embodiment of the present invention is an optical and non-tactile method using the laser (L).

The laser (L) uses a principle of amplifying light by induced emission, and has a monochromatic light of a very clean color, the waves proceed in parallel and show a straightness that does not branch in the other direction, while being in the same direction. Those having the same type of wave have the characteristic of exhibiting interference with each other.

At this time, since the laser L having an ultra short wavelength of 300 nm or less can be absorbed by the measurement glass substrate 240, it is preferable to use the laser L having a wavelength band of 300 nm to several mm as the light source 220.

As such, when the laser L configured as a single wavelength is used as the light source 220, the laser L is generated by minute bending of the measurement glass substrate 240 when passing through the measurement glass substrate 240. By using the sensitivity of the light path by the light source 210, the streaks are generated on either side of the measurement glass substrate 240 and the uniaries on both sides of the measurement glass substrate 240. Codes 210 generated can be easily distinguished, and information on which side of the measurement glass substrate 240 is generated can be discriminated.

That is, the unery measuring device 200 according to the first exemplary embodiment of the present invention may have the unery 210 at any position of the measurement glass substrate 240 through the unery measuring device 150 of FIG. 3. After determining whether there is a, it is used for the purpose of determining the streaks and codes as well as the determination of which side 210 is generated on which side of the measurement glass substrate 240.

The unery 210 has a height H of 20 nm or less on the surface of the measurement glass substrate 240 having a thickness t of 0.7 mm and is generated in the form of a band. In this case, FIG. 5A illustrates a streak in which the unery 210 having a regular or irregular shape is protruded from one exposed surface of the measurement glass substrate 240, and FIG. 5B is a measurement glass substrate 240. ) Shows a cord in which the unery 210 of a regular or irregularly protruding shape is generated on both exposed surfaces of the < RTI ID = 0.0 >

Such streaks are generated with a height H of 10 to 20 nm and a width W of 10 to 20 nm, and a cord is generated with a height H of 10 nm or less and a width W of 5 nm or less.

6 and 7 are diagrams for describing examples of detecting a streak and a code, which will be described in more detail with reference to the drawings.

First, as shown in FIG. 6, the thickness t of the measuring glass substrate 240 is 0.7 mm, the refractive index n _{1 in the} chamber 205 of FIG. 4 is 1, and the refractive index n in the measuring glass substrate 240 is shown. ₂ ) is assumed to be 1.5, and after confirming the location of the unery 210 through the unery measuring equipment using the xenon lamp, the light source (220 of FIG. 4), the measuring glass substrate 240 and the light detector ( In the state where 250 of FIG. 4 is arranged in parallel and fixed to each other, the laser L from the light source is irradiated onto the measuring glass substrate 240.

In this case, the refractive effect due to the refractive index inside the measurement glass substrate 240 will be ignored, and it is assumed that the uneori 210 is present on the upper surface of the measurement glass substrate 240. The laser L irradiated corresponding to the unery 210 is inside the measurement glass substrate 240 and the measurement glass substrate 240 by the unery 210 positioned on the upper surface of the measurement glass substrate 240. The laser will be refracted by the first refraction pattern R ₁ while passing through the lower surface of the laser beam. The laser L will pass through the measurement glass substrate 240 without changing the refraction.

In addition, when the unery 240 is present on the lower surface of the measurement glass substrate 240, the laser L passes through the inside of the measurement glass substrate 240 as it is, and the lower portion of the measurement glass substrate 240 is present. The first refraction pattern R ₁ and the second refraction pattern R ₂ will be refracted by the second refraction pattern R ₂ by the unery 210 positioned on the surface. By detecting the 250 of 4, it is possible to determine which side of the measuring glass substrate 240 has the unery 210 generated.

That is, the streaks generated on one surface of the measurement glass substrate 240 and the codes generated on both surfaces of the measurement glass substrate 240 are the first and second refractive patterns R ₁ ,. R ₂ ) shows a distinct optical path difference, and the optical path difference can be detected by a light detector to determine the type of the unori 210. Furthermore, the unil 210 is formed on either side of the measurement glass substrate 240. ) Can be determined.

However, considering that the height of the unery 210 is generated at a fine scale of approximately 10 to 20 nm, the wavelength range of the laser L is longer than that of the unery 210, so that the measurement glass substrate 240 is closed. Due to the problem that the intensity change of the laser L passing through is not large, there is a limit in detecting the minute intensity change with the light detector.

Therefore, the first embodiment of the present invention is characterized by being able to easily detect the type of unery by introducing a scanning method, which will be described in more detail with reference to FIG. 7.

As shown in FIG. 7, the thickness t of the measuring glass substrate 240 is 0.7 mm, the refractive index n _{1 in the} chamber 205 is 1, and the refractive index n _{2 in the} measuring glass substrate 240 is 1.5. Assume that, after confirming the position where the uneri 210 is present through the uneri measuring equipment using a xenon lamp, by rotating the stage (230 of FIG. 4) at a predetermined angle to scan the measurement glass substrate 240 It is characterized by detecting. At this time, the arrow located in the upper left of the figure indicates the scanning direction.

When the detection is performed by the scanning method as described above, in the code in which the uneries 210 are generated on both surfaces of the measurement glass substrate 240, the first and second surfaces of the measurement glass substrate 240 are formed by the uneries 210 corresponding to the upper surface of the measurement glass substrate 240. The first refraction pattern R ₁ and the second refraction pattern R ₂ by the unery 210 corresponding to the lower surface of the measurement glass substrate 240 will be respectively detected, whereas the measurement glass substrate 240 is different. In the streaks in which the unery 210 is generated on one surface of the surface, the intensity change of the laser L is generated once by a refractive pattern caused by the unery located on one of the upper and lower surfaces of the measurement glass substrate 240. Invar, the optical path difference due to the refraction pattern of the laser L can be determined through the photo detector 250 (see FIG. 4).

In this case, the code may be detected between the first refraction pattern R ₁ and the second refraction pattern R ₂ with a predetermined distance D (about 0.374 mm), and thus the distance D is determined. In consideration of the detection by the light detector.

In detail, the first, second, and third lasers L1, L2, and L3 from the light source 220 of FIG. 4, assuming that the unerie 210 is not present in the measurement glass substrate 240, may be described. Is incident on the upper surface of the measuring glass substrate 240, the first, second and third lasers L1, L2, L3 and the upper surface of the measuring glass substrate 240 are all the same first angle θ _1. And the first, second, and third lasers L1, L2, and L3 pass through the inside of the measurement glass substrate 240 having different refractive indices, and are perpendicular to the measurement glass substrate 240. The first angles θ ₂ are the same as those of the normal lines VL1 and VL2, and the first, second, and third lasers L1, L2, and L3 pass through the lower surface of the measurement glass substrate 240. Is a third angle θ ₃ with the lower surface of the measurement glass substrate 240. In this case, since the first, second, and third lasers L1, L2, and L3 pass through a medium having different refractive indices, that is, the measurement glass substrate 240, the first angle θ ₁ and the second angle θ ₂ . , The third angle θ ₃ has different values.

At this time, if there is the unery 210 represented by minute bending on the upper surface of the measurement glass substrate 240, the first and second lasers L1 and L2 incident at the first angle θ ₁ may be measured glass. While passing through the upper surface of the substrate 240 will be refracted at the second angle θ ₂ , but the third laser L3 is bent by the bending of the anneal 210 located on the upper surface of the measurement glass substrate 240. second angle will be refracted at the 2a angle (θ _2a) instead of (θ _2), this first 2a angle (θ _2a) is naohmyeonseo through the measuring glass substrate 240, the third angle (θ ₃₎ is the 3a, not As the angle θ _3a is refracted, the intensity change of the third laser L3 according to the angle change is detected by the light detector. That is, the first refraction pattern R ₁ of the third laser L3 is detected by the photodetector by the unary 210 positioned on the upper surface of the measurement glass substrate 240.

In addition, if the anneal 210 is present on the lower surface of the measurement glass substrate 240, the first, second, and third lasers L1, L2, and L3 incident at the first angle θ ₁ may be measured. while passing through the inside of the glass substrate 240 will be refracted by the second angle (θ _2), the second, the third laser (L2, L3), the angle 3 while passing through the lower surface of the measuring glass substrate 240 The first laser L1 may be refracted by (θ ₃ ), but the first laser L1 may be refracted by the anneal 210 positioned on the lower surface of the measurement glass substrate 240 corresponding to the second normal VL2. Will be refracted at a _third angle θ _3b rather than ₃ ). That is, the second refraction pattern R ₂ of the first laser L1 is detected by the photodetector by the anneal 210 positioned on the lower surface of the measurement glass substrate 240.

Therefore, according to the above-described scanning method, when the unery 210 is present only on the upper surface of the measurement glass substrate 240, when it exists only on the lower surface, there is a change in intensity of each laser when it exists on both the upper surface and the lower surface. As it will be different from each other, by detecting the intensity change with a light detector, not only the determination of which side of the unery 210 is generated on the measurement glass substrate 240 but also the type of the unery 210 is determined. It becomes possible.

In the unary measuring apparatus according to the first embodiment of the present invention, which can distinguish a streak and a code by the above-described scan type, any one of two methods may be used.

FIG. 8 is a diagram illustrating a first method and a second method of the unori measurement equipment performed by a scan method.

As shown in the left side of the figure, the first method is to measure the light source 220 and the light detector 250 inside the chamber 205 fixed state, and is located on the stage 230 that can be rotated 360 degrees While moving the glass substrate 240 in a scanning manner, the laser L from the light source 220 is irradiated onto the measuring glass substrate 240 to detect the type of the unery 210.

In addition, as shown in the right side of the drawing, the second method maintains the stage 230 in which the measurement glass substrate 240 is seated in the chamber 205 in a fixed state, and the light source 220 and the photo detector 250. The laser light from the light source 220 is irradiated to the measurement glass substrate 240 in a scanning manner to move the respective light waves 220 to detect the type of the unori 240.

Therefore, in the first embodiment of the present invention, it is possible to easily determine the type of unori by the introduction of simple equipment, and thus it is possible to determine whether the mass production is applied in advance, thereby improving the production yield.

--- Second Embodiment ---

The second embodiment of the present invention is characterized in that it is possible to easily grasp the kind of unori generated on the measuring glass substrate by using the fellow reflection method.

FIG. 9 is a view for explaining a method of measuring uneori using the fellow reflection method according to the second embodiment of the present invention, and FIGS. 10A and 10B are respective views for explaining an example of the method of measuring uneori. This will be described in detail with reference to this.

First, as shown in FIG. 9, in the Fellow Reflection Method according to the second embodiment of the present invention, after confirming the position of the unery 310 by using the unery measuring apparatus 150 of FIG. 3 using a xenon lamp, The light source 320 is in close contact with the measurement glass substrate 340 on which the unery 310 is located, and the laser L from the light source 320 is directly irradiated on the measurement glass substrate 340.

In this case, since the unery 310 may exist on one or both surfaces of the measurement glass substrate 340, the amount of light scattered by the reflection effect by the unery 310 and the amount of light passing through the measurement glass substrate 340. By detecting the difference using a light detector (not shown), it is possible to distinguish the type of unery 310.

As shown in FIGS. 10A and 10B, when the unery 310 exists only on the upper surface of the measurement glass substrate 340, and when the unery 340 exists only on the lower surface of the measurement glass substrate 340, Although not shown in the drawings, when both the unery 310 is present on the upper and lower surfaces of the measurement glass substrate 340, the scattered light SL and the transmitted light TL of the laser L irradiated from the light source 320 are present. Since the amount of light may be different from each other, the unery 310 is generated on either side of the measurement glass substrate 340 by detecting the light amount of the scattered light SL and the transmitted light TL using a light detector. It is possible to easily determine whether the determination and the type of unery 310.

Therefore, in the second embodiment of the present invention, there is an advantage in that the type of unori can be easily detected by using the fellow reflection method.

However, the present invention is not limited to the first and second embodiments, and it will be apparent that various modifications and changes can be made without departing from the spirit and the spirit of the present invention.

1 is a schematic cross-sectional view of a liquid crystal display according to the related art.

FIG. 2A is a plan view illustrating a glass substrate on which unery is generated. FIG.

FIG. 2B is a cross-sectional view taken along the line II-II 'of FIG. 2A;

Figure 3 is a schematic view showing the uneori measuring equipment using a xenon lamp according to the prior art.

4 is a schematic view of the unori measuring equipment according to the first embodiment of the present invention.

5A and 5B are diagrams for explaining streaks and codes.

6 and 7 are diagrams for explaining examples of detecting a streak and a code.

FIG. 8 is a diagram illustrating a first method and a second method of the unori measuring equipment performed by a scan method. FIG.

9 is a view for explaining a method of measuring unori using the fellow reflection method according to the second embodiment of the present invention.

10A and 10B are diagrams for explaining an example of the method for measuring unori;

* Explanation of symbols for the main parts of the drawings *

200: Woori measurement equipment 205: chamber

210: Uneri 220: light source

230: stage 240: measuring glass substrate

250: light detector L: laser

Claims (6)

A chamber for blocking external light; A light source for generating a laser inside the chamber; A measurement glass substrate mounted on a stage spaced in parallel with the light source and capable of rotating 360 degrees; A photodetector spaced parallel to the measurement glass substrate and detecting which surface of the measurement glass substrate has unevenness generated on the surface of the measurement glass substrate using a laser irradiated from the light source Uneri measuring equipment comprising a. The method of claim 1, The laser measuring equipment has a wavelength range of 300nm ~ several mm. In the Uneri measuring equipment comprising a light source, a measuring glass substrate and a photo detector, Confirming the position of the unery generated on the measuring glass substrate through the unery measuring apparatus using a xenon lamp; Irradiating a laser beam from the light source onto the measurement glass substrate while rotating the measurement glass substrate on which the unery is generated at a predetermined angle using a stage; Detecting the laser penetrating the measuring glass substrate with a photo detector Unori measuring method comprising a. The method of claim 3, wherein The photo detector detects whether a first refractive pattern is generated by a uni-corresponding to an upper surface of the measuring glass substrate, and detects whether a second refractive pattern is generated by a uni-corridor corresponding to a lower surface of the measuring glass substrate. Through this, it is possible to discriminate not only the type of the unary but also any one of both surfaces of the measurement glass substrate. A chamber for blocking external light; A light source for generating a laser inside the chamber; A measurement glass substrate spaced parallel to the light source and seated on a fixed stage; A photodetector spaced parallel to the measurement glass substrate and detecting along which surface of the measurement glass substrate a fine curve occurs while moving along a laser in which the direction irradiated from the light source changes; Uneri measuring equipment comprising a. Aligning the measurement glass substrate on which the uneri is generated; Bringing a light source generating a laser into close contact with the unary generation point of the measurement glass substrate; Irradiating a laser spot to the unery generation point of the measurement glass substrate, and measuring the amount of light scattered by the reflection by the unery and the amount of light passing through the measurement glass substrate with a light detector. Unori measuring method comprising a.

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