TW201100785A - Non-uniformity measuring equipment for glass substrates - Google Patents

Abstract

Non-uniformity measuring equipment for glass substrates can make it more convenient and easy to measure non-uniformity by forming an interference pattern using ultraviolet radiation and measuring only one surface of the transparent glass substrate without direct contact. The non-uniformity measuring equipment for glass substrates includes a light source emitting ultraviolet radiation, a collimating lens provided on one side of the light source so as to measure one surface of the glass substrate using interference of the ultraviolet radiation, and converting the ultraviolet radiation radiated and diffused from the light source into collimated radiation, a reflecting mirror provided on one side of the collimating lens, and reflecting the ultraviolet radiation passing through the collimating lens, and a patterning plane provided at a position opposite the reflecting mirror, and forming an interference pattern by the interference of the ultraviolet radiation passing through the reflecting mirror and the glass substrate.

Description

201100785 -fi /wopii VI. Description of the Invention: [Technical Field] The present invention relates to a non-uniformity measuring device for a glass substrate, and in particular to a method that is relatively convenient and easy to measure. A uniformity device that forms an interference pattern by using ultraviolet light radiation and measures only one surface of the transparent glass substrate without direct contact. [Prior Art] In recent years, display products have shown a trend of increasing size. This trend seems to continue from now on. This phenomenon will be accelerated when considering the emergence of the global digital TV era, the simple scaling (up_up) and the widespread use of flat panel displays. In order to properly handle this phenomenon, the industry has also promoted the application of glass panels (or substrates) of the tenth or eleventh generation. However, when the size of the glass substrate is increased, the negative effect produced cannot be ignored. For example, a glass substrate may experience edge cracks due to contact with a conveyor belt or robot, a very weak impact, or a surface scratch. In addition, the glass substrate is subjected to one-side grinding. Therefore, the surface roughness of the glass substrate acts as a source of cracks or debris during the transfer of the glass substrate. There are quite a few solutions to this easily visible defect. However, there are currently no satisfactory solutions for invisible defects in the number of surface inhomogeneities to submicron (nmic) levels. In addition, if these defects are not completely removed from the glass substrate, when the glass substrate initially enters the production line, these defects do not have any obstacles from now on and continue to proceed to the final product without any choice. However, in the middle of 201100785, the glass substrate is monitored, and the glass substrate with these defects is discarded once the surface is scratched or cracked. Thus, unnecessary costs can be saved from now on. In contrast, there is no way to monitor for heterogeneity defects midway. Moreover, this inhomogeneity defect cannot be observed by human five senses such as vision. 〇 〇 Therefore, this leads to loss of glass substrate and opportunity cost, so that there are no restrictions on expensive materials and expensive equipment, but many failures are produced. In particular, when a glass substrate having unevenness is used as the material of the display panel, the defects of the glass substrate are not displayed as linearstain until the final display panel of the finished product is subjected to quality inspection. In view of the production characteristics of the substrate, it is necessary to carry out history tracking until a tank for producing a glass substrate. In addition, the use of contemporary glass fiber to produce a complete product, the complete product can not be seriously degraded in value or avoided in the production line. In order to reduce the loss, the current complete product manufacturer and the glass substrate manufacturing one = all implemented uneven (four) inspection, but only the production of the panel j points 'also S sampling test. Therefore, the reliability of the unevenness inspection cannot be achieved to the desired extent. 201100785

Ji/uopu glass solution pouring direction

Meanwhile, the above figure schematically shows the production process of a glass substrate for a liquid crystal display (LCD). Pour the glass solution from the furnace. A line or a line consisting of a bend in the direction in which the glass substrate is produced is a cause of unevenness. Generally, the unevenness is defined by the form of bending occurring on the glass substrate. In this method, a glass substrate is produced by pouring a glass solution from a furnace. The glass solution from the furnace is in contact with the tin solution and air. When a thin film transistor (TFT) LCD panel is produced in the future, the surface of the glass solution in contact with the solution will come into contact with the liquid crystal. After the glass solution is hardened, this contact surface is ground to make the uneven height uniform. At this point, other surfaces of the glass solution that are in contact with air are typically not ground. According to an example of the current method for unevenness inspection, with air 201100785

* IV/UUXX contact glass inspection of its silk cover - _, the radiation of the neonate (such as gas lamp) is radiated; according to other examples, the other surface of the glass solution in contact with air floats on the water and then contacts the tin solution The glass solution # surface of the radiation into the radiation. Because the surface contacted by the solution solution and the other surfaces of the glass solution in contact with air are both feathered (or flat) before the grinding, and (4) the glass solution and tin solution and liquid crystal in the final complete product. The surface of the contact needs to be inspected, so that the unevenness check is performed by radiation on a scattering glass substrate that floats on water or covered with paper. In the case where the glass substrate is obtained from Corning Incorporated, the glass substrate is completely produced by the molten glass in the melting furnace, and the glass substrate causes the molten glass to overflow (〇verfl〇w), and the molten glass flows downward in the vertical direction and both of them The surfaces are in contact with air. Thus, the unevenness of the glass substrate is completely different from the unevenness of the glass substrate produced by the floating technology (Asahi Glass Co. or Schott AG). There is a non-uniformity with a uniform width of (10) ativdy on the yang of the glass substrate. This width is divided into three types: 1 〇 or smaller, 1 ° ° and the range between f and 35 mm or more. This classification method is not fixed and usually has an impact on production based on the amount of inhomogeneity. In today's industry, the unevenness of 10 mm or less is called a line... (10) The unevenness between 1111111 and 35111111 is called stripe (also 条纹), and the unevenness of 35 mm or more is called For the thick band rushing spit band> where the thickness is considered to have little effect on the product's defects. Therefore, according to the production method, depending on the type of non-uniformity, there are more or less inspection methods used in the industry today. The difference between the representative inspection methods used in the industry today is to cut the substrate used for production to a size of 300 mm X 400 mm by 7 201100785 Ji/oopu, and use a touch type inspection device to scan the cut substrate. And get the difference in height. This form of inspection is mainly applied to the fusion type (glass substrate, but can also be applied to the floating glass substrate. When inspecting the floating glass substrate, the sample It must be broken, and it is necessary to check whether the surface of the sample has a height difference by measuring all but not the specified part. Thus, if the examiner is fortunate to choose to have an uneven portion The measurement can be easily carried out. Otherwise, 'pass 〇ver' may actually ignore the sample with a non-uniform part. In addition, the accuracy of the measurement method in the touch form, There is a problem of reliability due to the low degree of data integrity of each user. However, in the case of a molten glass substrate, the problem of unevenness inspection can be solved by the method disclosed by the present invention. The method of inspecting the unevenness of the glass substrate by floating the glass substrate on the water or covering the paper on the glass substrate to avoid breakage has great difficulty in automatic operation and is very complicated in system configuration. In the process of a glass substrate, it is difficult to automate this method to inspect a large number of glass substrates. However, in the case of a molten glass substrate, there is a system for automatically inspecting a method by transmission technology. In one method, as shown in FIG. 1, collimated light radiated from the light source 11 is transmitted to the glass substrate 12. The upper surface 12a and the lower surface 12b' thus form a ghost image. Ghosting is used to simultaneously measure the unevenness of the opposite surface of the glass substrate.

〇 201100785

.7 i / UOUJU However, such a transmission type measuring device has a problem in that when two unevenness data on the upper surface 12a and the lower surface 12b of the glass substrate 12 are combined to form a ghost image, It is impossible to know 砉(四)#. As another known example, as shown in Fig. 2, light that is lightly emitted from the light source 21 is reflected from the transparent glass substrate 22, thereby forming ghosts to measure the uniformity. Such a measuring device is designed to measure unevenness using ghosts formed by light reflected from the upper surface 22a and the lower surface 22b of the glass substrate 22. However, such a reflection type measuring device becomes a center of attention, The two non-uniformity materials regarding the upper surface 22a and the lower surface 22b of the glass substrate 22 may be combined to form a ghost, and the two unevenness materials may be separated from each other. As a result, there are many studies of measuring devices in the form of reflections. So far, no method or apparatus has been proposed which can perfectly separate the information about the two surfaces. Here, to date, methods for effectively separating ghostly binding data on a glass substrate have been studied or known. One of the methods is to use a liquid (for example, water) to bring the lower surface of the glass substrate into contact with the liquid to minimize the reflection image of the lower surface of the glass substrate, and other methods are to use polarization ° in these methods, The method uses water as shown in FIG. 3, which is configured to reflect collimated light radiated from the light source 31 from the upper surface 32a and the lower surface 32b of the glass substrate to form ghosts, and simultaneously measure the glass wall substrate. The opposite of the surface is not uniform. 9 201100785 01 /ΟδρίΓ In this group, when the refractive index of the glass is 1.52′ and the refractive index of air is 1.0, the following reflectance is obtained: R = {(1.52-1.0) /(1.52+1.0)}2 = 〇.〇426 => 4.26%. When the refractive index of the glass is 1.52 and the refractive index of water is 1 33, the following reflectance is obtained: R = {(1.52-1.33) / (1.52+1.33) 丨 2 = 0.00444 0.444% 'It is glass to air The reflectance is approximately ten percent, compared to the light reflected from the upper surface 32a of the glass substrate 32. This method is configured such that the amount of light reflected from the lower surface 32b of the glass substrate 32 is reduced by about one tenth. Furthermore, 'the method of polarization as shown in FIG. 4 is used, which is configured to reflect collimated light radiated from the light source 41 from the glass substrate 42 to form ghosts, and simultaneously measure the opposite surface of the glass substrate. Unevenness. In this configuration, when the incident angle is larger than the reflection angle, the p-polarization mainly has a transmission property, and the 8-polarization mainly has a rejuvenation property. Further, this configuration provides a principle capable of increasing the difference between the S-polarized reflections of the upper surface 42a and the lower surface 42b of the glass substrate 42. However, the above two methods have a problem in that although the light reflected from the lower surface can be reduced, it cannot be removed at all, and thus the light reflected from the lower surface becomes noise. Further, the conventional method used uses ultraviolet radiation to show that the unevenness of the surface above the glass substrate is ghosting, but has a problem that quantitative measurement cannot be performed and the brightness of the ghost is inaccurate. SUMMARY OF THE INVENTION 201100785 x / vrvs / Ai The present invention provides a non-uniformity measuring device for a glass substrate which is capable of inspecting the flatness of all glass substrates with respect to the glass substrate of the tenth generation or later, for large The basic material of the panel, and the inferior products and good products are determined according to the flatness. The present invention also provides a non-uniformity measuring apparatus for a glass substrate, which is capable of using a disturbance to perform a quantitative measurement, and absorption by ultraviolet radiation to fundamentally remove radiation reflected from a lower surface of the glass substrate, which is doubled Accuracy (the accuracy is proportional to the wavelength of the wavelength used, and the wavelength used is shorter than the wavelength of the general interferometer (for example, at 250 nm wavelength, the interval between the interference patterns is 125 nm) The accuracy is used to perform the measurement) and only the non-uniformity of one surface of the glass substrate is measured, thereby improving the measurement performance. The present invention relates to a non-uniformity measuring device for a glass substrate. The non-uniformity measuring device includes a light source that emits ultraviolet light radiation; a collimating lens is provided on one side of the light source to measure a surface of the glass substrate using interference of ultraviolet light radiation, and the collimating lens will radiate from the light source And diffusing ultraviolet radiation is converted into collimated radiation; the mirror is provided on one side of the collimating lens and reflects ultraviolet radiation that passes through the collimating lens; and the pattern plane is provided at a relative position of the mirror, and The interference pattern is formed by interference of ultraviolet light radiation passing through the mirror and the glass substrate. The present invention relates to a non-uniformity measuring device for a glass substrate. The non-uniformity measuring device comprises: a light source emitting ultraviolet radiation; the beam splitter 'provided on one side of the light source and reflecting one part of the ultraviolet light radiation and transmitting another part of the ultraviolet light radiation; the collimating lens is provided in the minute Beamer 11 201100785 J) i / oopn one side, converts the ultraviolet radiation passing through the beam splitter into collimated radiation, and fits the collimated radiation to the reference plane of the reference plate; the glass substrate or a mirror provided on one side of the reference plate and reflecting ultraviolet light radiation passing through a reference plane of the reference plate back to the light source; and a pattern plane provided on one side of the beam splitter and by a glass substrate or mirror The interference of the reflected ultraviolet radiation forms an interference pattern. In an exemplary embodiment, the non-uniformity measuring device may include a tilted unevenness measuring device or a vertical unevenness measuring device. In an exemplary embodiment, the tilted non-uniformity measuring device is configured to have a single path and a dual path, wherein ultraviolet light radiation reflected from the front surface of the mirror travels directly along the single path to the pattern plane, and from the reflection The ultraviolet radiation reflected by the surface after the mirror is reflected from the glass substrate along a single path and then travels directly to the pattern plane; the ultraviolet radiation reflected from the mirror returns to the source along the dual path and travels to the pattern plane. In an exemplary embodiment, the mirror of the tilted non-uniformity measuring device may include a corner cube or a planar mirror to reflect ultraviolet light radiation back to the light source. In an exemplary embodiment, the ultraviolet light radiation may have a wavelength range of 280 nm or less 'such that ultraviolet light radiation is reflected by the upper surface of the glass substrate' and ultraviolet light radiation is absorbed by the lower surface of the glass substrate. In an exemplary embodiment, the vertical non-uniformity measuring device is configured to have a dual path with ultraviolet light radiation reflected back to the light source along the dual path and traveling to the pattern plane. In order to make the above-mentioned features and advantages of the present invention more comprehensible, the following description of the embodiments of the present invention will be described in detail with reference to the accompanying drawings. FIG. A non-uniformity measuring device for a glass substrate. In the illustrations, it should be noted that similar or identical components having the same function will be given the phase symbol or text and will not be described again. Further, it should be noted that the proper noun (which will be described later) is a noun defined in consideration of its function in the present invention, and therefore these terms should be defined based on the definition of the present specification. Figure 5 illustrates a tilted non-uniformity measuring device for a glass substrate having a single path in accordance with the first embodiment of the present invention. Fig. 6 is a diagram showing a tilted unevenness measuring apparatus for a glass substrate according to a second embodiment of the present invention, wherein the ultraviolet light radiation has a double path. Fig. 7 depicts a non-uniform non-uniformity measuring device for a glass substrate according to a third embodiment of the invention wherein the ultraviolet radiation has a dual path. Fig. 8A depicts a non-uniformity measurement for a glass substrate, not according to an exemplary embodiment of the present invention, and a measured interference pattern. As shown in the individual illustrations, the non-uniformity measuring apparatus 100 according to an exemplary embodiment of the present invention generally includes a light source 111, a collimating lens 112, and a mirror 113. Light source 111 is preferably a laser or ultraviolet lamp that emits ultraviolet light.

Ultraviolet radiation is radiation having a wavelength shorter than violet light and subdivided into three bands: UVA or long wave (320 to 400 nm); UVB 13 201100785 J \ I Wpii or medium wave (280 to 300 nm) ; and UVC or short wave (200 to 280 nm). In an exemplary embodiment of the present invention, it is preferable to use a UVC 〇UVC having a short wavelength to have a representative wavelength of 253 7 nm, and is absorbed by the lower surface 115b of the glass substrate U5, so that it does not fall under the glass substrate 115. The surface 115b is reflected to the upper surface U5a. In detail, the upper surface n5a and the lower surface 115b of the glass substrate 115 are detected by a typical interferometer for the wavelength of visible radiation. When a typical interferometer for the wavelength of UV radiation is used, the uv radiation is absorbed and does not transmit through the glass substrate 115, so the interfering radiation is removed from one surface of the glass substrate 115 (for example, the lower surface 115b), so the uv radiation does not Reflected from the upper surface 115a. As a result, the "interference radiation is only reflected from the upper surface 115a of the glass substrate 115" and thus the interference pattern is formed on the pattern plane, so that only one surface of the glass substrate can measure the unevenness. This method can solve the problem of the combination of two non-uniformity data of the transparent measuring glass substrate of the conventional measuring device, and the two non-uniformity materials must be separated from each other, thereby improving the measuring efficiency. The collimating lens 112 converts the UV radiation radiated and diffused from the light source ill into collimated radiation, and fits the direction of the radiation to the reference plane of the reference plate. " In this way, it is necessary to collimate the UV radiation into collimated radiation to measure the unevenness of the glass substrate 115. The mirror 113 is in the form of a wedge mirror or a retroreflector using the principle of retro-reflection. Mirror 113 201100785 utilizes a corner cube mirror (which consists of three mutually perpendicular and intersecting planes that reflect radiation back to the source) or a planar mirror. In the non-uniformity measuring device 1 having the configuration as shown in Fig. 5, the light source 111 utilizes a laser or UV lamp that emits UV radiation. The collimating lens 112 is inclined on one side of the light source 111, and converts the UV radiation radiated or diffused from the light source 111 into collimated radiation, and fits the direction of the radiation to the reference plane. Further, the mirror 113 is inclined on the lower side of the collimating lens 112 and reflects the UV radiation passing through the collimating lens 112. Here, the mirror 113 is in the shape of a wedge mirror. The pattern plane forming the interference pattern is provided at the opposite position of the mirror 113. The glass substrate 115 is horizontally provided between the mirror in and the pattern plane 114 and below the mirror 113 and the pattern plane 114. The non-uniformity measuring apparatus 100 having such a configuration has a tilted structure 'to irradiate the uv radiation radiated or diffused from the light source 111 in collimated toward the mirror 113 in an inparallel manner by the collimating lens 〇 112, so that The UV radiation reflected from the front surface H3a of the mirror 113 directly travels to the pattern plane 114 facing the mirror 113, and causes the UV radiation reflected from the rear surface 113b of the mirror 113 to be horizontally provided from the glass substrate ny below the mirror 113. The reflection 'is then reflected to the pattern plane 114. Therefore, the radiation reflected from the front surface 113a of the mirror 113 and the radiation reflected from the rear surface 113b of the mirror 113 interfere with each other, so that the interference pattern is formed on the pattern plane 114. In this way, the UV radiation 15 201100785 J l /uopil has a single path. At this time, the radiation reflected from the lower surface 115b of the glass substrate 115 is not reflected to the upper surface 115a because the interference radiation is absorbed by the glass substrate 115 having the characteristics of absorbing uv radiation. This non-uniformity measurement has an accuracy of "interference pattern interval is one wavelength". Here, an image sensor (not shown) or a camera and a fluorescent screen may be used to measure the interference pattern of the pattern plane 114 to convert the UV radiation into visible radiation. Hereinafter, the operation of the unevenness measuring apparatus having such a configuration will be described. First, according to an embodiment of the present invention, when the unevenness measuring device 100 is used to measure the unevenness of the glass substrate 115, uv radiation is radiated from the light source 111 and passes through the collimator lens 112. Therefore, the UV radiation is converted to collimated radiation and then continues to travel. The collimated radiation passing through the collimating lens 112 continues to travel to the mirror 113 and the glass substrate 115, and an interference pattern is then formed on the pattern plane 114. Here the 'non-uniformity measuring device 100 can be configured to have a single path or a dual path. The collimated radiation converted by the collimating lens 112 travels along a single path 'the collimated UV radiation reflected from the front surface 113a of the mirror 113 directly travels to the pattern plane 114, while the back surface 113b of the mirror 113 The reflected collimated UV radiation is reflected from the glass substrate 115 and then travels to the pattern plane 114; the collimated uv spokes 16 reflected from the mirror 201100785 The emitter is dually reflected back to the source or direction of incidence and travels to the pattern plane . Furthermore, the non-uniformity measuring device is configured such that the radiation utilizes a UVC (200 to 280 nm) having a short wavelength, and therefore, when reflected, the 'interference radiation is absorbed by the lower surface n5b of the glass substrate 115, so only Interference radiation that is reflected from the upper surface 115a will form an interference pattern on the pattern plane 114. In detail, as illustrated in Fig. 8A, in the case of using υγ radiation, only the interference radiation of the surface of one of the glass substrates 115 clearly shows the interference pattern on the 图案 pattern plane I14. As shown in FIGS. 8B and 8C, 'interference patterns caused by the difference in flatness between the upper surface and the lower surface of the glass substrate can be avoided, and interference caused by mixing of the interference radiation of the upper surface and the lower surface with the reference plane can be avoided. pattern. Therefore, the unevenness can be easily measured with high accuracy only on one surface of the transparent glass substrate. Meanwhile, Fig. 6 shows a tilted unevenness measuring apparatus for a glass substrate according to a second embodiment of the present invention, in which ultraviolet light radiation has a double path. As shown in FIG. 6, the unevenness measuring apparatus 100 includes a beam splitter 116, a reference flat plate 117 on the opposite side of the collimating lens 112, and a reflection on the opposite side of the reference flat panel in. Mirror 113. Thus, the UV radiation radiated from the light source 111 is reflected back to the light source, and thus the UV radiation is reflected by the reciprocating motion on the upper surface 115a and the lower surface 115b of the glass substrate 115 (both measured surfaces). Times. The result '.UV light shot has a dual control' and therefore doubles (j twice again) this non-uniformity to form an interference pattern on the pattern plane 114. Therefore, the amount of unevenness with the inclination of a single path Measuring equipment 1〇〇2011 201100785 ^1/oopu can measure this non-uniformity with quadruple accuracy. In the non-uniformity measuring device with double path inclination, provided The light source 111 is on one side, and the light source 1U is implemented as a laser or UV lamp that emits uv radiation. The beam splitter 116 is inclined on one side of the light source ln, and the beam splitter 116 transmits a part of the uv radiation emitted from the light source 111. And reflecting another portion of the UV radiation emitted from the source 111. The pattern plane 114 is provided on one side of the beam splitter 116 to form an interference pattern. Further, the collimating lens 112 is inclined on the lower side of the beam splitter 116, The straight lens 112 converts the uv radiation passing through the beam splitter 116 and fits the direction of the uv radiation to the reference plane of the reference plate 117. The glass substrate 115 (the object to be measured) is horizontally located lower than the reference plate 1 Side 113. Reflector 113 on reference plate 117 The opposite position is slanted and is implemented as an angular cube or plane mirror that reflects radiation back through the glass substrate to the source. A collimated radiation is used in the non-uniformity measuring device 1 具有 having a double path inclination It is obliquely incident on the glass substrate 115 to measure a wider area. In this case, the radiation reflected from the glass substrate 115 travels in the opposite direction and does not directly return to the reference plane, so it is necessary to use a reflection which is implemented as an angular cube. The mirror 113 returns the radiation reflected from the glass substrate 115 in the traveling direction of 18 Å. The unevenness measurement of the glass substrate has a kind, and the interval of the interference pattern is the accuracy of f wavelengths ''. The measured surface is reflected twice, so that this non-uniformity is amplified twice more. Therefore, compared with the non-uniformity measurement of the non-uniformity measuring device with a single path, it can be 18 201100785 mt X i wpxii This unevenness measurement is performed with four times accuracy. Figure 7 shows a vertical non-uniformity measuring device for a glass substrate, according to a third embodiment of the present invention The ultraviolet radiation has a double path. As shown in Fig. 7, the unevenness measuring device 1 is arranged in a vertical manner, that is, the beam splitter 116 and the collimating lens liz夂 in this manner. The flat plates 117 are disposed directly below the light source ηι in a vertical direction. Thus, the uv radiation radiated from the light source Π1 is incident perpendicularly onto the glass substrate 115, and the UV radiation is on the upper surface 115a and the lower surface 115b of the glass substrate 115. The reciprocation motion in the direction of entry and the direction of the exit is reflected twice, so that the uv radiation has a double path, so the inhomogeneity is amplified twice more. An interference pattern is formed on the pattern plane 114 on the side of the beam, ΐ6. Therefore, this unevenness measurement can be performed with four times accuracy as compared with the shame of the uniformity measuring device having the inclination of the single path. In the vertical unevenness measuring device, the light source (1) is provided on one side and the light source 111 is implemented as a laser or uv lamp that emits uv radiation. The beam splitter 116 is disposed in a row on the side of the beam splitter 116 to form an interference J. The secret image=b 2 lens 112 is arranged in a row below the beam splitter 116. The uv radiation that penetrates the beamer 116 is converted into a collimated uv correction direction and is fitted to the reference plate 117. And positioning the glass substrate 115 (the vertical unevenness measuring device that is to be under the target plate m of the measured object and reflected through the reference plate and having the configuration) is perpendicular to the glass substrate. The measured surface of 115 (the object to be measured). Furthermore, the vertical non-uniformity measuring device uses the reference plane from the reference plate compared to the non-uniformity measuring device with a single path inclination The interference between the reflected radiation and the radiation reflected from the measured surface of the glass substrate 115 is such that the vertical unevenness measuring device has a quasi-breaking degree that is twice the interval of the interference pattern by half a wavelength" In addition, the radiation reflected from the reference plane of the reference plate 117 returns to the light source and collides with the radiation reflected from the measured surface of the glass substrate 115.

The interference, and both are reflected by the beam splitter 116, and an interference pattern is formed on the pattern plane (image plane) 114. At this time, since the 孓uv radiation is reflected from the lower surface 115b of the glass substrate 115 using a short wavelength band of 280 nm or shorter, the uv radiation is completely absorbed by the uv absorbing and refracting glass characteristics, so that Surface related information does not affect the interference pattern.

Therefore, the two kinds of radiation reflected from the reference planes of the glass substrate 115 and the reference flat plate 117 form an interference pattern with each other, so that the path of the UV ration is formed twice. As a result, only the unevenness of one side of the glass substrate 115 can be easily measured with high accuracy. The above is illustrative of exemplary embodiments, but is not intended to limit the above. Miscellaneous bribes - some exemplary real sides, in the field of knowledge, the "inspection" in the teaching of turning off the ground * and in many cases, the modification of many exemplary embodiments is possible. Therefore, the meaning of the invention as defined in the scope of the patent includes all such such measures. Therefore, the ultraviolet radiation will be radiated onto the glass substrate, and only from the glass substrate. A surface is reflected, but the other surface of the glass substrate absorbs the ultraviolet radiation, thereby removing the interfering radiation to increase the measurement performance of the non-uniformity of the glass substrate. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a view showing measurement of unevenness of a glass substrate of a non-uniformity measuring apparatus for a glass substrate using a conventional penetration form. Fig. 2 is a graph showing the measurement of the unevenness of the glass substrate of the non-uniformity measuring device for a glass substrate using a conventional reflection form. Figure 3 illustrates the measurement of the non-uniformity of a glass substrate using a conventional water-based measurement method. Fig. 4, 纟 shows the measurement of the unevenness of the glass substrate using a conventional p〇larization-based measurement method. Figure 5 illustrates a tilted non-uniformity measuring device for a glass substrate, in accordance with a first embodiment of the present invention, wherein the ultraviolet radiation has a single path. Figure 6 shows a tilted non-uniformity measuring device for a glass substrate, according to a second embodiment of the invention, wherein the ultraviolet radiation has a dual path. Figure 7 illustrates a vertical non-uniformity measuring device for a glass substrate, in accordance with a third embodiment of the present invention, wherein the ultraviolet radiation has a dual path. Fig. 8A is a view showing an interference pattern caused by the bullish radiation of a surface of a glass substrate measured by a non-uniformity measuring device for a glass substrate according to an exemplary embodiment of the present invention. Fig. 8B is not caused by the flatness between the upper surface and the lower surface of the glass substrate. 21 201100785 l / UOjJll degree of interference caused by the difference pattern. Figure 8C illustrates the interference pattern caused by the mixing of the interfering radiation on the upper and lower surfaces of the glass substrate with the reference plane. [Description of main component symbols] 11, 21, 31, 41, 111: light sources 12, 22, 32, 42, 115: glass substrates 12a, 22a, 32a, 42a, 115a: upper surfaces 12b, 22b, 32b, 42b, 115b: lower surface 100: unevenness measuring device 112: collimating lens 113: mirror 113a: front surface 113b: rear surface 114: pattern plane 116: beam splitter 117: reference plate

CJ 22

Claims (1)

201100785 VII. Patent application scope: 1. A non-uniformity measuring device for a glass substrate, comprising: a light source emitting ultraviolet radiation; a collimating lens 'provided on one side of the light source to use the ultraviolet light Radiation interference to measure a surface of the glass substrate, and the collimating lens converts the ultraviolet radiation radiated and diffused from the light source into a collimated light shot; a mirror provided at One side of the collimating lens and reflecting the ultraviolet radiation passing through the collimating lens; and a pattern plane provided at a relative position of the mirror and passing through the mirror and the glass The interference of the ultraviolet radiation of the substrate forms an interference pattern. 2. A non-uniformity measuring device for a glass substrate, comprising: a light source that emits ultraviolet light radiation; a beam splitter provided on one side of the light source and reflecting a portion of the ultraviolet light radiation Another portion of the ultraviolet radiation; a collimating lens provided on one side of the beam splitter to convert said ultraviolet radiation passing through said beam splitter into collimated radiation, and said collimating Radiation is fitted to a reference plane of a reference plate; a glass substrate or mirror is provided on one side of the reference plate and reflects the ultraviolet light radiation passing through the reference plane of the reference plate back to the light source And a pattern plane remaining on one side of the beam splitter, and the interference 23 201100785 JA / VOpiA of the ultraviolet radiation reflected from the glass substrate or the mirror to form an interference pattern. 3. The non-uniformity measuring device for a glass substrate according to claim 1 or 2, wherein the unevenness measuring device comprises a tilt unevenness measuring device or a vertical non-uniformity measuring device Uniformity measurement equipment. 4. The non-uniformity measuring apparatus for a glass substrate according to claim 3, wherein the inclined unevenness measuring apparatus is configured to have a single path and a dual path, wherein The ultraviolet light radiation reflected by the surface of the mirror travels directly along the single path to the pattern plane, and the ultraviolet light radiation reflected from the surface behind the mirror follows the single path The glass substrate reflects and then travels directly to the pattern plane; the ultraviolet light radiation reflected from the mirror returns to the light source along the dual path and travels to the pattern plane. 5. The non-uniformity measuring device for a glass substrate according to claim 4, wherein the mirror of the inclined unevenness measuring device comprises: reflecting the ultraviolet light radiation Return to the corner cube or plane mirror of the source. 6. The non-uniformity measuring device for a glass substrate according to claim 1 or 2, wherein the ultraviolet light radiation has a wavelength range of 28 〇 nm or shorter, such that the ultraviolet light The radiation is reflected by the upper surface of the glass substrate and the ultraviolet light is absorbed by the lower surface of the glass substrate. 7. The non-uniformity measuring device for a glass substrate according to claim 3, wherein the vertical unevenness measuring device is configured to have a dual path, the ultraviolet light radiation along The dual path is reflected back to the light source and travels to the pattern plane. twenty four