KR20090083328A - Partition wall forming material for plasma display panels and glass composition for partition wall forming material - Google Patents

Abstract

The invention provides a partition wall forming material for plasma display panels which can be fired at a temperature equivalent to that of conventional partition wall forming materials in spite of its being free from PbO and is little lowered in alkali resistance in spite of its containing alkali metal oxides and which permits the formation of partition walls by sandblasting and a glass composition. A partition wall forming material for plasma display panels which comprises glass powder and ceramic powder, characterized in that the glass powder is substantially free from PbO and has a composition which consists by mole of 20-55% ZnO; 10-30% B2O3; 15-30% SiO2; 0-13% Al2O3; 0-20% MgO, 0-20% CaO, 0-20% SrO, and 0-20% BaO with the sum of MgO+CaO+SrO+BaO of 3 to 20%; and 0-14% Li2O, 0-14% Na2O, 0-10% K2O with the sum of Li2O+Na2O+K2O of 4 to 20% and satisfies the relationship: (SiO2+Al2O3)/B2O3 = 0.8 to 1.65. ® KIPO & WIPO 2009

Description

PARTITION WALL FORMING MATERIAL FOR PLASMA DISPLAY PANELS AND GLASS COMPOSITION FOR PARTITION WALL FORMING MATERIAL}

TECHNICAL FIELD This invention relates to the partition formation material for plasma display panels, and the glass composition for partition formation materials.

Plasma display panels are self-luminous flat displays that have excellent characteristics such as thin, high viewing angles, and can be made large screens, and thus are attracting attention as one of the most promising display devices.

In the plasma display panel, a front glass substrate and a back glass substrate are generally formed to face each other, and a large number of partitions (also called barrier ribs) for partitioning the gas discharge portion are formed in the space between these substrates. As a method of forming a partition, the sand blasting method generally forms a partition layer on a glass substrate, then forms a dry film resist film thereon, performs exposure and development, and then removes unnecessary portions by the sand blasting method. Then, a partition can be formed by peeling and baking the remaining dry film resist film. As a material which forms a partition, the material which mixed glass powder and ceramic powder is used widely. A partition wall forming material, in order to prevent deformation of the glass substrate may have to be fired at less than 600 ℃, Accordingly, the glass powder, the patent document 1, the softening point is low PbO-B ₂ O ₃ -SiO ₂ based glass shown in Fig. Is being used. In recent years, due to the trend of increasing environmental protection and reducing the use of environmentally loaded materials, ZnO-B ₂ O ₃ -SiO ₂ based non-lead glass powders to which alkali metal oxides are disclosed are disclosed. A partition forming material has been proposed.

Patent Document 1: Japanese Patent Application Laid-Open No. 11-60273

Patent Document 2: Japanese Unexamined Patent Publication No. 2002-326839

Disclosure of Invention

However, since the glass disclosed by patent document 2 contains alkali metal oxide for the purpose of reducing the softening point of glass, alkali resistance of glass is low and the alkali solution used at the image development process and peeling process of a dry film resist film is carried out. The glass tends to be eroded and discolored or foamed when the glass is sintered to form a partition wall, so that a partition wall formed by the sand blasting method is difficult.

The object of the present invention can be fired at a temperature equivalent to that of a conventional barrier rib forming material even if it does not contain PbO. Further, even if it contains an alkali metal oxide, the alkali resistance can be suppressed and formed by sandblasting. It is to provide a partition forming material and a glass composition for a plasma display panel.

The inventors conducted various experiments and found that ZnO-B ₂ O ₃ -SiO ₂ -based lead-free glass contains SiO ₂ , Al ₂ O _3, and B ₂ O ₃ even if it contains an alkali metal oxide in order to lower the softening point. By adjusting a ratio, it is finding out and suggesting that the partition formation material which can be baked at the temperature of 600 degrees C or less, and also suppresses the fall of alkali resistance and can be formed by the sandblasting method is obtained.

That is, the partition formation material for plasma display panels of this invention is a partition formation material for plasma display panels containing glass powder and a ceramic powder, Comprising: The glass powder does not contain substantially PbO and is ZnO20 in molar percentage. 55%, B ₂ O ₃ 10-30%, SiO ₂ 15-30%, Al ₂ O ₃ 0-13%, MgO 0-20%, CaO 0-20%, SrO 0-20%, BaO 0- 20%, MgO + CaO + SrO + BaO 3-20%, Li ₂ O 0-14%, Na ₂ O 0-14%, K ₂ O 0-10%, Li ₂ O + Na ₂ O + K ₂ O It is characterized by consisting of a glass containing a composition of 4 to 20%, (SiO ₂ + Al ₂ O ₃ ) / B ₂ O ₃ 0.8 to 1.65.

Further, the glass composition for the barrier rib forming material of the present invention, without substantially containing PbO, ZnO 20 ~ 55% by mole _{percent, B 2 O 3 10 ~ 30} %, SiO 2 15 ~ 30%, Al 2 O 3 0-13%, MgO 0-20%, CaO 0-20%, SrO 0-20%, BaO 0-20%, MgO + CaO + SrO + BaO 3-20%, Li ₂ O 0-14%, Na ₂ 0 0-14%, K ₂ O 0-10%, Li ₂ O + Na ₂ O + K ₂ O 4-20%, (SiO ₂ + Al ₂ O ₃ ) / B ₂ O ₃ 0.8-1.65 It is characterized by containing.

Effects of the Invention

The partition formation material for plasma display panels of this invention is low in softening point, and can be baked at the temperature of 600 degrees C or less. Moreover, since alkali resistance is favorable, a partition can be formed by a sand blast method. Therefore, it is suitable as a partition formation material for plasma display panels.

Best Mode for Carrying Out the Invention

The partition-forming material for a plasma display of the present invention includes a low melting point of ZnO-B ₂ O ₃ -SiO ₂ based glass powder, a main constituent component. Since only the three components of ZnO, B ₂ O ₃ and SiO ₂ make the glass softening point higher than that of PbO glass, the alkali metal of Li ₂ O, Na ₂ O, K ₂ O is added to ZnO-B ₂ O ₃ -SiO ₂ glass. 4 mol% or more of oxides are added in a total amount, and the softening point of glass is reduced and it can be baked at the temperature equivalent to the partition material which used PbO system glass. Moreover, when alkali metal oxide is added, alkali resistance of glass falls, glass becomes easy to be eroded by the alkaline solution used at the developing process of a dry film resist film, or peeling process, and it is easy to discolor or foam when baking and forming a partition. Although formation of the partition by the sand blasting method tends to be difficult, the content of the alkali metal oxide is suppressed to 20% or less, and the ratio of (SiO ₂ + Al ₂ O ₃ ) / B ₂ O ₃ is 0.8 in a molar ratio. By adjusting so that it may be in the range of-1.65, the fall of the alkali resistance of glass can be suppressed, and the partition formation by a sand blasting method is attained by this.

Below, the reason which limited the glass powder composition as mentioned above is described. ZnO is a component which lowers a softening point and reduces a thermal expansion coefficient, and its content is 20 to 55%. When content of ZnO decreases, there exists a tendency for a thermal expansion coefficient to become high, and it does not match well with the thermal expansion coefficient of a glass substrate. On the other hand, when content increases, crystal | crystallization precipitates in glass, and it becomes difficult to obtain a compact sintered compact. The preferable range of ZnO is 20 to 50%, the more preferable range is 21 to 45%, and still more preferable range is 25 to 45%.

B ₂ O ₃ is a component constituting the skeleton of the glass, the content thereof is from 10 to 30%. When the content of B ₂ O ₃ decreases, vitrification becomes difficult. On the other hand, when content increases, the softening point will become high too much, and it becomes difficult to bake at the temperature of 600 degrees C or less. Moreover, there exists a tendency for the alkali resistance of glass to fall, and it becomes difficult to form a partition by the sand blasting method. That is, when alkali resistance falls, glass is eroded by the alkaline solution used at the developing process of a dry film resist film, or peeling process, and it discolors or foams when it bakes and makes it a partition. A preferable range of B ₂ O ₃ is 15-30%, more preferable range is 15 to 25%, more preferable range is 18 ~ 24%.

SiO _2, together with being components forming a skeleton of glass, is a component improving the alkali resistance of the glass. The content is 15 to 30%. Write the content of SiO ₂ glass floor tends to be unstable. Moreover, there exists a tendency for the alkali resistance of glass to fall, and it becomes difficult to form a partition by the sand blasting method. On the other hand, when content increases, the softening point will become high too much, and it becomes difficult to bake at the temperature of 600 degrees C or less. A preferred range of SiO ₂ is 15-28%, more preferable range is 17 ~ 25%, and more preferable range is 18 to 25%.

Al ₂ O ₃ is a component improving the alkali resistance of the glass, the content thereof is 0 to 13%. When the content of Al ₂ O ₃ increases, the softening point tends to be too high, and it is difficult to fire at a temperature of 600 ° C. or lower. A preferable range of the Al ₂ O ₃ is 0 to 11%, more preferable range is from 0 to 8%.

MgO, CaO, SrO, and BaO are all the components which improve the chemical durability of glass, and are components added in order to adjust a thermal expansion coefficient. Content of these components is 0 to 20%, respectively. When content of these components increases, it exists in the tendency for a thermal expansion coefficient to become high, and it does not match with the thermal expansion coefficient of a glass substrate well. The preferable ranges of these components are 0 to 18%, respectively, and a more preferable range is 0 to 15%, respectively. The more preferable range of CaO is 0 to 10%, and the more preferable range of BaO is 0 to 13%.

In addition, MgO, CaO, SrO, and BaO need to be 3 to 20% in total amount. When the total amount of these components decreases, the thermal expansion coefficient tends to be low, and the thermal expansion coefficient of the glass substrate does not match well. Moreover, there exists a tendency for the chemical durability of glass to fall. On the other hand, when the total amount of these components increases, there exists a tendency for a thermal expansion coefficient to become high, and it does not match well with the thermal expansion coefficient of a glass substrate. The preferable ranges of the total amount of these components are 3 to 18%, a more preferable range is 5 to 15%, and still more preferable range is 6 to 13%.

Li ₂ O is a component for lowering the softening point of the glass, or increase the thermal expansion coefficient, the content is 0 to 14%. When the content of Li ₂ O increases, there is a tendency that the alkali resistance of the glass decreases, it is difficult to form partition walls by the sand blast method. Moreover, there exists a tendency for a thermal expansion coefficient to become high, and it does not match well with the thermal expansion coefficient of a glass substrate. A preferable range of the Li ₂ O is 0 to 13%, a more preferred range is from 0 to 12%, and it is particularly preferable to contain Li ₂ O over 2%.

Na ₂ O is a component for lowering the softening point of the glass, or increase the thermal expansion coefficient, the content is 0 to 14%. When the content of Na ₂ O tends to be increased when lowering the alkali resistance of the glass, it is difficult to form partition walls by the sand blast method. Moreover, there exists a tendency for a thermal expansion coefficient to become high, and it does not match well with the thermal expansion coefficient of a glass substrate. A preferred range of Na ₂ O is 0 to 13%, a more preferred range is from 0 to 12%, a more preferred range is 0 to 11%.

K ₂ O is a component for lowering the softening point of the glass, or increase the thermal expansion coefficient, the content is 0 to 10%. When the content of K ₂ O increases, it tends to decrease the alkali resistance of the glass, it is difficult to form partition walls by the sand blast method. Moreover, a thermal expansion coefficient tends to become remarkably high, and it does not match with the thermal expansion coefficient of a glass substrate well. The preferable range of K ₂ O is 0 to 8%, more preferable range is 0 to 5%, and still more preferable range is 0 to 1%.

In addition, the alkali metal oxides _{Li 2 O, Na 2 O,} K 2 O in the total amount is required to be 4 to 20%. When the total amount of alkali metal oxide decreases, since the softening point of glass does not fully fall, it becomes difficult to bake at the temperature of 600 degrees C or less. Moreover, there exists a tendency for a thermal expansion coefficient to become low, and it does not match with the thermal expansion coefficient of a glass substrate well. On the other hand, when the total amount of alkali metal oxide increases, there exists a tendency for the alkali resistance of glass to fall, and formation of the partition by the sand blasting method becomes difficult. Moreover, there exists a tendency for a thermal expansion coefficient to become high, and it does not match well with the thermal expansion coefficient of a glass substrate. The preferable range of the total amount of alkali metal oxide is 4 to 15%, a more preferable range is 5 to 14%, and still more preferable range is 6.4 to 14%.

Further, by suppressing the alkali degradation of the glass with the addition of an alkali metal oxide, in order to enable the partition wall formed by the sand blast method, (SiO ₂ + Al ₂ O ₃₎ / B molar ratio of the ratio of the ₂ O ₃ It is necessary to make it into the range of 0.8-1.65. When this ratio becomes small, there exists a tendency for the alkali resistance of glass to fall, and the partition formation by a sand blasting method becomes difficult. On the other hand, when this ratio becomes large, the softening point of glass will increase, and it will become difficult to bake at the temperature of 600 degrees C or less. Moreover, there exists a tendency for a thermal expansion coefficient to become low, and it does not match with the thermal expansion coefficient of a glass substrate well. _{(SiO 2 + Al 2 O 3} ) / B 2 O ₃ is a preferred range of 1.0 to 1.6, more preferable range is 1.0 to 1.5. The total amount of SiO ₂ and Al ₂ O ₃ is preferably 15 to 43%, more preferably 15 to 39%, still more preferably 17 to 33%, and particularly preferably 20 to 32%. Do.

What is necessary is just to add CuO to the said component, in order to suppress the fall of the alkali resistance of glass by addition of alkali metal oxide more effectively. In that case, content of CuO is 0.01 to 5%. When content of CuO decreases, the said effect becomes difficult to obtain. On the other hand, when content becomes large, it will become difficult to vitrify, or even if vitrified, crystal will precipitate in glass and it will become difficult to obtain a compact sintered compact. The range with preferable CuO is 0.01 to 3%, and a more preferable range is 0.01 to 2%.

In addition to the above components, other components can be added within a range that does not impair the effects of the present invention. For example, Bi ₂ O ₃ , which is a component that lowers the softening point of glass without lowering the alkali resistance of glass, is up to 10%, and Y ₂ O ₃ , La ₂ O ₃ , which is a component that improves the chemical durability of the glass, to Ta _{2 O 5, SnO 2, ZrO} 2, TiO 2, 8% for Nb ₂ O _5, respectively, also may be added to the P ₂ O ₅ component to stabilize the glass up to 8%. On the other hand, when Bi ₂ O ₃ is considered in consideration of environmental aspects and raw material costs, it is better to avoid introduction into the actual glass.

In addition, although PbO is a component which lowers the melting point of glass, since it is also an environmental load substance, substantial introduction into glass is to be avoided. In addition, the term "avoid introduction into real glass" as used in the present invention refers to a level which is incorporated as an impurity without being actively used as a raw material, and specifically, means that the content is 0.1% or less.

Moreover, in the partition formation material for plasma display panels of this invention, in order to be able to bake at 600 degrees C or less, it is preferable to use the glass which has a softening point of 600 degrees C or less. When a softening point becomes high, it will become difficult to obtain a compact baking film at the temperature of 600 degrees C or less. However, when a softening point is too low, a partition layer will soften and deform easily in the heat process at the time of sealing a front glass substrate and a back glass substrate using flit glass. Therefore, it is preferable that the softening point of glass is 540 degreeC or more. The more preferable range of a softening point is 540-590 degreeC.

In addition, the particle size of the glass powder of the barrier rib forming material for a plasma display panel according to the present invention, it is preferred to use in that, the average particle diameter D ₅₀ is 1.5 ~ 4.5 ㎛, the maximum grain size D _max is 10 ~ 35 ㎛. When the average particle diameter D ₅₀ and the maximum particle diameter D _max decrease, the elution amount of the alkali metal oxide component from the glass powder increases, the photosensitivity of the dry film resist film is inhibited, and the peelability of the dry film resist film tends to decrease. On the other hand, when the average particle diameter D ₅₀ and the maximum particle diameter D _max become large, sinterability will fall and it will become difficult to obtain a compact baking film.

Although the said glass powder is preferable for a partition formation material, it can be used also for other uses, such as a dielectric material.

The partition formation material for plasma display panels of this invention contains a ceramic powder in addition to the said glass powder for the purpose of shape maintenance. In this case, it is preferable that the mixing ratio is 50-95 mass% of glass powder, 5-50 mass% of ceramic powder, especially 60-90 mass% of glass powder, and 10-40 mass% of ceramic powder. When the ceramic powder is more than 50%, the sinterability is insufficient, and it is difficult to form a dense partition. When the ceramic powder is less than 5%, the shape retention effect is small. As the ceramic powder, for example, alumina, zirconia, zircon, titania, cordierite, mullite, silica, willemite, tin oxide, zinc oxide, or the like can be used. Moreover, in order to prevent the fall of the sintering property of a material, and to obtain a compact baking film, it is preferable to use the thing of an average particle diameter of 5.0 micrometers or less, and a maximum particle diameter of 20 micrometers or less.

Next, the use method of the partition formation material for plasma display panels of this invention is demonstrated. The material of the present invention can be used, for example, in the form of a paste or a green sheet.

When using it in the form of a paste, a thermoplastic resin, a plasticizer, a solvent, etc. are used with the glass powder mentioned above and a ceramic powder as needed. As content in the paste of a glass powder and a ceramic powder, about 30-90 mass% is common.

A thermoplastic resin is a component which raises the film strength after drying and gives flexibility, and the content is about 0.1-20 mass% in general. Polybutyl methacrylate, polyvinyl butyral, polymethyl methacrylate, polyethyl methacrylate, ethyl cellulose, etc. can be used as a thermoplastic resin, These are used individually or in mixture.

A plasticizer is a component which gives a softness to a dry film while controlling a drying rate, The content is about 0-10 mass% in general. As a plasticizer, butyl benzyl phthalate, dioctyl phthalate, diisooctyl phthalate, dicapryl phthalate, dibutyl phthalate, etc. can be used, These are used individually or in mixture.

A solvent is a material for pasting a material, The content is about 10-30 mass% in general. As the solvent, for example, terpineol, diethylene glycol monobutyl ether acetate, 2,2,4-trimethyl-1,3-pentadiol monoisobutylate, or the like can be used alone or in combination.

The paste can be prepared by preparing a glass powder, a ceramic powder, a thermoplastic resin, a plasticizer, a solvent, and the like, and kneading this at a predetermined ratio.

In order to form a partition using such a paste, this paste is first apply | coated using a screen printing method, a batch coating method, etc., and after forming an application layer of predetermined film thickness, it dries. Next, a dry film resist film is formed, exposure and development are performed, and a dry film resist photosensitive film of a predetermined dimension is formed. Subsequently, after removing an unnecessary part using the sand blasting method, the partition of a predetermined shape can be obtained by peeling and baking the remaining dry film resist.

When using the material of this invention in the form of a green sheet, a thermoplastic resin, a plasticizer, etc. are used with the said glass powder and ceramic powder.

As for content in the green sheet of a glass powder and a ceramic filler, about 60-80 mass% is common.

As the thermoplastic resin and the plasticizer, the same thermoplastic resin and plasticizer used in the preparation of the paste can be used. As a mixing ratio of a thermoplastic resin, about 5-30 mass% is common, and as a mixing ratio of a plasticizer, about 0-10 mass% is common.

As a general method for producing the green sheet, the glass powder, ceramic powder, thermoplastic resin, plasticizer, and the like are prepared, and main solvents such as toluene and auxiliary solvents such as isopropyl alcohol are added thereto to form a slurry. The slurry is sheet molded on a film such as polyethylene terephthalate (PET) by the doctor blade method. After sheet molding, the solvent and the solvent are removed by drying to obtain a green sheet.

The glass layer can be formed by thermocompression-bonding the green sheet obtained by making it above to the point which will form a glass layer, and baking it after that. In the case of forming the partition wall, after forming the coating layer by thermocompression bonding, it processes in the shape of a predetermined partition in the same manner as in the case of the paste mentioned above.

In the above description, the sand blasting method using a paste or a green sheet is described as an example of the partition formation method. However, the partition formation material for a plasma display panel of the present invention is not limited to these methods. For example, other formation methods, such as the printing lamination method, the lift-off method, the photosensitive paste method, the photosensitive green sheet method, the press molding method, can also be applied.

EMBODIMENT OF THE INVENTION Hereinafter, the partition formation material of the plasma display of this invention is demonstrated in detail based on an Example.

Tables 1-6 show the Example (sample No. 1-24) and the comparative example (sample No. 25-27) of this invention. In addition, sample No. 27 shows the conventional product which consists of lead type glass.

Each sample in the table was prepared as follows.

First, raw materials were combined and mixed uniformly so that it might become the glass composition shown to a table by mol%. Subsequently, after putting into a platinum crucible and melting at 1250 degreeC for 2 hours, the molten glass was shape | molded in thin plate shape. Subsequently, this was ground with an alumina ball mill and classified to obtain a glass powder having an average particle diameter D ₅₀ of 1.5 to 4.5 µm and a maximum particle diameter D _max of 10 to 35 µm. The softening point and the thermal expansion coefficient of the glass powder thus obtained were measured.

Next, the obtained glass powder sample and various ceramic powders were mixed by the ratio shown in a table | surface, and it was set as the partition formation material. About the obtained sample, sinterability and alkali resistance were evaluated.

As is clear from the table, Sample Nos. 1 to 24 which are Examples were softening points of glass of 550 to 587 ° C, and were sufficiently calcined at a temperature of 600 ° C or lower. In addition, the thermal expansion coefficient was 72.8-88.4x10 <^-7> / degreeC, and it matched with the glass substrate. In addition, foaming was not observed in the glass film immersed in the alkaline solution and calcined, and no discoloration was observed or slightly discolored, and the alkali resistance was also good. Moreover, also in evaluation of sinterability, about sample No.1-23, (DELTA) L value was 25 or less and was excellent also in sinterability. On the other hand, about sample No. 24, since content of CuO was many as 5.1%, (DELTA) L value was 26 with big and sinterability was inferior compared with other samples (No.1-23).

On the other hand, about sample No. 25 which is a comparative example, the glass film immersed in the alkaline solution and baked was foamed, remarkably discolored, and was low in alkali resistance. Moreover, about No.26, the softening point of glass was high at 627 degreeC, and also in evaluation of sinterability, the (DELTA) L value was large at 72 and it was not able to bake at the temperature of 600 degrees C or less.

In addition, about the softening point of glass, it measured using the macro type differential thermal analyzer and made the value of the 4th inflection point the softening point.

In addition, about the thermal expansion coefficient of glass, after powder-press-molding each sample and baking it, after grinding | polishing-processing to the cylindrical shape of diameter 4mm and length 40mm, and measuring based on JISR3102, 30-300 degreeC of The value in the temperature range was calculated | required.

Sinterability was evaluated as follows. First, each sample was mixed with a terpineol solution containing 5% ethyl cellulose, kneaded with three roll mills, and pasted. Subsequently, this paste was apply | coated on the window glass plate (column expansion coefficient 85x10 <^-7> / degreeC) of 10 cm in width by the screen printing method, and the coating dry film of 200 micrometers of film thicknesses was formed. Then, it baked at the electric furnace at 570 degreeC for 10 minutes, and obtained the glass film. Moreover, after apply | coating oily ink on the obtained glass film, it wiped off with alcohol, and measured the L value (brightness) of the glass film before apply | coating ink and after wiping ink with a color difference meter, and evaluated sinterability. In addition, the smaller the ΔL value (L value before applying ink to L value after wiping ink), the higher the sintering property, which means that it is a dense baked film. It was judged that the ΔL value was 25 or less, having excellent sinterability.

The alkali resistance evaluated the degree of foaming and discoloration as follows. About the degree of foaming, similarly to sinterability evaluation, the coating dry film of 200 micrometers of film thicknesses was produced on the window glass plate of 10 cm in width and width first. Next, after laminating the dry film resist film, it exposed and the photosensitive line of 80 micrometer width and a line / space = 1/2 was formed. Continuously for 1 minute by immersion developing in the aqueous solution of Na ₂ CO ₃ (25 ℃) of 0.5% by weight and removing the aesthetic portion, after dried to prepare a partition wall into sand blast method. In addition, each sample was immersed in (40 degreeC) in 5% NaOH aqueous solution for 7 minutes, and the dry film resist film was peeled off, and it baked at 570 degreeC for 10 minutes in an electric furnace, and obtained the glass film. The cross section of the obtained glass film was observed under a microscope, and the foam was not observed at all, and the foam was observed slightly, and the foam was slightly observed. It was.

In addition, about the grade of discoloration, the coating dry film | membrane of 200 micrometers of film thicknesses was produced on the window glass plate of 10 cm in width | variety similarly to sinterability evaluation. Next, after immersing each sample in (25 degreeC) for 10 minutes in 6% monoethanolamine solution, it baked in the electric furnace at 570 degreeC for 10 minutes, and obtained the glass film. The external appearance of the obtained glass film was visually observed, and it was shown in the table | surface as "(circle)" that the color change was not observed at all, "(circle)" and what was markedly discolored as "x".

Claims (6)

In the plasma partition wall-forming material for a display panel comprising a glass powder and a ceramic powder, the glass powder is substantially not contain PbO, ZnO 20 ~ 55% by mole _{percent, B 2 O 3 10 ~ 30} %, SiO ₂ 15-30%, Al ₂ O ₃ 0-13%, MgO 0-20%, CaO 0-20%, SrO 0-20%, BaO 0-20%, MgO + CaO + SrO + BaO 3-20% , Li ₂ O 0-14%, Na ₂ O 0-14%, K ₂ O 0-10%, Li ₂ O + Na ₂ O + K ₂ O 4-20%, (SiO ₂ + Al ₂ O ₃ ) / B ₂ O ₃ A barrier rib forming material for a plasma display panel, comprising a glass containing a composition of 0.8 to 1.65. 2. The partition wall forming material for plasma display panel according to claim 1, wherein the glass powder contains 0.01 to 5% of CuO in a molar percentage. The partitioning material for plasma display panels of Claim 1 or 2 whose softening point of glass powder is 540-600 degreeC. The bulkhead forming material for plasma display panel according to any one of claims 1 to 3, which is composed of 50 to 95 mass% of glass powder and 5 to 50 mass% of ceramic powder. Substantially free of PbO, ZnO 20 to 55%, B ₂ O ₃ 10 to 30%, SiO ₂ 15 to 30%, Al ₂ O ₃ 0 to 13%, MgO 0 to 20%, CaO 0 in molar percentage -20%, SrO 0-20%, BaO 0-20%, MgO + CaO + SrO + BaO 3-20%, Li ₂ O 0-14%, Na ₂ O 0-14%, K ₂ O 0-10 _{%, Li 2 O + Na 2} O + K 2 O 4 ~ 20%, (SiO 2 + Al 2 O 3) / B 2 O 3 0.8 ~ 1.65 a composition containing barrier rib material for forming the glass composition characterized in that a. The glass composition for a partition forming material according to claim 5, wherein CuO is contained in a molar percentage of 0.01 to 5%.