JP2008150272A - Partition wall-forming material for plasma display panel and glass composition for partition wall-forming material - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a partition wall-forming material for plasma display panels which can be fired at a temperature equivalent to that of conventional partition wall-forming materials in spite of its being free from PbO, is little lowered in alkali resistance in spite of its containing alkali metal oxides and permits the formation of partition walls by sandblasting and to provide a glass composition. <P>SOLUTION: The partition wall-forming material for plasma display panels comprises glass powder and ceramic powder. The glass powder is substantially free from PbO and has a composition which consists by mole of 20-55% ZnO; 10-30% B<SB>2</SB>O<SB>3</SB>; 15-30% SiO<SB>2</SB>; 0-13% Al<SB>2</SB>O<SB>3</SB>; 0-20% MgO, 0-20% CaO, 0-20% SrO, 0-20% BaO with the sum of MgO+CaO+SrO+BaO of 3 to 20%; and 0-14% Li<SB>2</SB>O, 0-14% Na<SB>2</SB>O, 0-5% K<SB>2</SB>O with the sum of Li<SB>2</SB>O+Na<SB>2</SB>O+K<SB>2</SB>O of 4-20% and satisfies the relationship: (SiO<SB>2</SB>+Al<SB>2</SB>O<SB>3</SB>)/B<SB>2</SB>O<SB>3</SB>=0.8 to 1.65. <P>COPYRIGHT: (C)2008,JPO&INPIT

Description

  The present invention relates to a partition wall forming material for a plasma display panel and a glass composition for the partition wall forming material.

  The plasma display panel is a self-luminous flat display, has excellent characteristics such as thinness and high viewing angle, and can have a large screen, making it one of the most promising display devices. It is attracting attention as.

In general, a plasma display panel is provided with a front glass substrate and a rear glass substrate facing each other, and a large number of partition walls (also referred to as barrier ribs) for separating gas discharge portions are formed in a space between the substrates. ing. As a method for forming the partition wall, the sand blast method is generally used. After the partition layer is formed on the glass substrate, a dry film resist film is formed thereon, exposed to light, developed, and then the sand blast method is used. Unnecessary portions are removed, and then the remaining dry film resist film is peeled off and baked to form partition walls. As a material for forming the partition wall, a material in which glass powder and ceramic powder are mixed is widely used. This partition wall forming material needs to be able to be fired at 600 ° C. or lower in order to prevent deformation of the glass substrate. Therefore, the glass powder includes PbO—B ₂ O having a low softening point as shown in Patent Document 1. ₃ -SiO ₂ based glass is used. In recent years, ZnO—B ₂ O ₃ —SiO ₂ based lead-free glass powder added with alkali metal oxide as shown in Patent Document 2 has been used due to the trend of increasing environmental protection and reducing the use of environmentally hazardous substances. A partition wall forming material has been proposed.
Japanese Patent Laid-Open No. 11-60273 JP 2002-326839 A

  However, since the glass disclosed in Patent Document 2 contains an alkali metal oxide for the purpose of lowering the softening point of the glass, the alkali resistance of the glass is low, and the development process and the peeling process of the dry film resist film The glass is easily eroded by the alkali solution used in the above, and when it is baked to form partition walls, it is discolored or foamed, which makes it difficult to form partition walls by the sandblast method.

  The object of the present invention is that it can be fired at the same temperature as a conventional partition wall forming material without containing PbO, and even if it contains an alkali metal oxide, it suppresses a decrease in alkali resistance and is formed by a sandblasting method. An object is to provide a partition wall forming material and a glass composition for a plasma display panel.

As a result of various experiments, the inventors of the present invention have found that ZnO—B ₂ O ₃ —SiO ₂ -based lead-free glass can contain SiO ₂ , Al ₂ even if an alkali metal oxide is contained in order to lower the softening point. It is found and proposed that by adjusting the ratio of O ₃ and B ₂ O ₃ , it is possible to obtain a partition wall forming material that can be fired at a temperature of 600 ° C. or less and that can be formed by a sandblast method while suppressing a decrease in alkali resistance. Is.

That is, the barrier rib forming material for a plasma display panel of the present invention is a barrier rib forming material for a plasma display panel containing glass powder and ceramic powder. The glass powder does not substantially contain PbO, and is in a molar percentage of ZnO 20. _{~55%, B 2 O 3 10~30} %, SiO 2 15~30%, Al 2 O 3 0~13%, 0~20% MgO, CaO 0~20%, SrO 0~20%, BaO 0~ 20%, MgO + CaO + SrO + BaO 3-20%, Li ₂ O 0-14%, Na ₂ O 0-14%, K ₂ O 0-5%, Li ₂ O + Na ₂ O + K ₂ O 4-20%, (SiO ₂ + Al ₂ O ₃₎ / B ₂ O _3, characterized in that it consists of glass containing composition of from 0.8 to 1.65.

Moreover, the glass composition for a partition wall forming material of the present invention does not substantially contain PbO, and is a molar percentage of ZnO 20 to 55%, B ₂ O ₃ 10 to 30%, SiO ₂ 15 to 30%, Al ₂ O ₃ 0-13%, MgO 0-20%, CaO 0-20%, SrO 0-20%, BaO 0-20%, MgO + CaO + SrO + BaO 3-20%, Li ₂ O 0-14%, Na ₂ O 0 -14%, K ₂ O 0-5%, Li ₂ O + Na ₂ O + K ₂ O 4-20%, (SiO ₂ + Al ₂ O ₃ ) / B ₂ O ₃ 0.8-1.65 It is characterized by.

  The partition wall forming material for a plasma display panel of the present invention has a low softening point and can be fired at a temperature of 600 ° C. or lower. In addition, the alkali resistance is good, and the partition walls can be formed by sandblasting. Therefore, it is suitable as a partition wall forming material for a plasma display panel.

The partition wall forming material for plasma display of the present invention contains ZnO—B ₂ O ₃ —SiO ₂ glass powder having a low melting point as a main component. ZnO, since only three components of B ₂ O ₃ and SiO ₂ comprising a high softening point of the glass than PbO-based glass, Li ₂ O in the glass of the ZnO-B ₂ O ₃ -SiO ₂ system, Na ₂ O, K _The total amount of ₂ O alkali metal oxide is added in an amount of 4 mol% or more to lower the softening point of the glass so that it can be fired at the same temperature as the partition material using PbO-based glass. In addition, when alkali metal oxide is added, the alkali resistance of the glass is lowered, and the glass is easily eroded by the alkaline solution used in the development process and peeling process of the dry film resist film. However, it tends to discolor or foam, making it difficult to form partition walls by the sandblasting method. However, the content of alkali metal oxide is suppressed to 20% or less, and (SiO ₂ + Al ₂ O ₃ ) / B _By adjusting the ratio of ₂ O ₃ so as to be in the range of 0.8 to 1.65 in terms of molar ratio, the decrease in alkali resistance of the glass is suppressed, thereby enabling the formation of partition walls by the sandblast method. Yes.

  The reason why the glass powder composition is limited as described above will be described below.

  ZnO is a component that lowers the softening point and lowers the thermal expansion coefficient, and its content is 20 to 55%. When the content of ZnO decreases, the thermal expansion coefficient tends to increase, and it becomes difficult to match the thermal expansion coefficient of the glass substrate. On the other hand, when the content increases, crystals precipitate in the glass and it becomes difficult to obtain a dense sintered body. The preferable range of ZnO is 20 to 50%, and the more preferable range is 25 to 45%.

B ₂ O ₃ is a component constituting the skeleton of the glass, and its content is 10 to 30%. If the content of B ₂ O ₃ decreases, vitrification becomes difficult. On the other hand, when the content increases, the softening point tends to be too high, and it becomes difficult to fire at a temperature of 600 ° C. or lower. In addition, the alkali resistance of the glass tends to decrease, and it becomes difficult to form partition walls by the sandblast method. In other words, when the alkali resistance is lowered, the glass is eroded by the alkaline solution used in the development process or the peeling process of the dry film resist film, and when it is baked into a partition wall, it is discolored or foamed. . A preferable range of B ₂ O ₃ is 15 to 30%, and a more preferable range is 15 to 25%.

SiO ₂ is a component that forms a glass skeleton and a component that increases the alkali resistance of the glass. Its content is 15-30%. When the content of SiO ₂ decreases, the glass tends to become unstable. In addition, the alkali resistance of the glass tends to decrease, and it becomes difficult to form partition walls by the sandblast method. On the other hand, when the content increases, the softening point tends to be too high, and it becomes difficult to fire at a temperature of 600 ° C. or lower. The preferred range of SiO ₂ is 15 to 28%, and a more preferred range is 17 to 25%.

Al ₂ O ₃ is a component that increases the alkali resistance of the glass, and its content is 0 to 13%. When the content of Al ₂ O ₃ increases, the softening point tends to be too high and it becomes difficult to fire at a temperature of 600 ° C. or lower. A preferable range of Al ₂ O ₃ is 0 to 11%, and a more preferable range is 0 to 8%.

  MgO, CaO, SrO, and BaO are all components that increase the chemical durability of the glass and are components that are added to adjust the thermal expansion coefficient. The content of these components is 0 to 20%, respectively. When the content of these components increases, the thermal expansion coefficient tends to increase, and it becomes difficult to match the thermal expansion coefficient of the glass substrate. A preferable range of these components is 0 to 18%, and a more preferable range is 0 to 15%.

  Note that the total amount of MgO, CaO, SrO and BaO needs to be 3 to 20%. When the total amount of these components decreases, the thermal expansion coefficient tends to be low, and it becomes difficult to match the thermal expansion coefficient of the glass substrate. Moreover, it exists in the tendency for the chemical durability of glass to fall. On the other hand, when the total amount of these components increases, the thermal expansion coefficient tends to increase, and it becomes difficult to match the thermal expansion coefficient of the glass substrate. A preferable range of the total amount of these components is 3 to 18%, and a more preferable range is 5 to 15%.

Li ₂ O is a component that lowers the softening point of glass or increases the thermal expansion coefficient, and its content is 0 to 14%. When the content of Li ₂ O increases, the alkali resistance of the glass tends to decrease, and it becomes difficult to form partition walls by the sandblast method. Further, the thermal expansion coefficient tends to be high, and it becomes difficult to match the thermal expansion coefficient of the glass substrate. A preferable range of Li ₂ O is 0 to 13%, and a more preferable range is 0 to 12%.

Na ₂ O is a component that lowers the softening point of the glass or increases the thermal expansion coefficient, and its content is 0 to 14%. When the content of Na ₂ O increases, the alkali resistance of the glass tends to decrease, and it becomes difficult to form partition walls by the sandblast method. Further, the thermal expansion coefficient tends to be high, and it becomes difficult to match the thermal expansion coefficient of the glass substrate. A preferable range of Na ₂ O is 0 to 13%, and a more preferable range is 0 to 12%.

K ₂ O is a component that lowers the softening point of the glass or increases the thermal expansion coefficient, and its content is 0 to 10%. When the content of K ₂ O increases, the alkali resistance of the glass tends to decrease, and it becomes difficult to form partition walls by the sandblast method. In addition, the thermal expansion coefficient tends to be extremely high, and it becomes difficult to match the thermal expansion coefficient of the glass substrate. A preferable range of K ₂ O is 0 to 8%, and a more preferable range is 0 to 5%.

In addition, it is necessary to make the total amount of alkali metal oxides of Li ₂ O, Na ₂ O, and K ₂ O 4 to 20%. When the total amount of the alkali metal oxide is reduced, the softening point of the glass is not sufficiently lowered, and it becomes difficult to fire at a temperature of 600 ° C. or lower. Further, the thermal expansion coefficient tends to be low, and it becomes difficult to match the thermal expansion coefficient of the glass substrate. On the other hand, when the total amount of alkali metal oxides increases, the alkali resistance of the glass tends to decrease, and it becomes difficult to form partition walls by the sandblast method. Further, the thermal expansion coefficient tends to be high, and it becomes difficult to match the thermal expansion coefficient of the glass substrate. A preferable range of the total amount of the alkali metal oxide is 4 to 15%, and a more preferable range is 5 to 14%.

In addition, in order to suppress the decrease in alkali resistance of the glass due to the addition of an alkali metal oxide and enable partition formation by the sandblast method, the ratio of (SiO ₂ + Al ₂ O ₃ ) / B ₂ O ₃ is set to a molar ratio. In the range of 0.8 to 1.65. When this ratio is small, the alkali resistance of the glass tends to decrease, and it becomes difficult to form partition walls by the sandblast method. On the other hand, when this ratio increases, the softening point of the glass tends to increase, and it becomes difficult to fire at a temperature of 600 ° C. or lower. Further, the thermal expansion coefficient tends to be low, and it becomes difficult to match the thermal expansion coefficient of the glass substrate. A preferable range of (SiO ₂ + Al ₂ O ₃ ) / B ₂ O ₃ is 1.0 to 1.6, and a more preferable range is 1.0 to 1.5.

  In order to more effectively suppress the decrease in alkali resistance of the glass due to the addition of the alkali metal oxide, CuO may be added in addition to the above components. In that case, the content of CuO is 0.01 to 5%. When the content of CuO decreases, the above effect is difficult to obtain. On the other hand, when the content increases, it becomes difficult to vitrify, or even when vitrified, crystals precipitate in the glass and it becomes difficult to obtain a dense sintered body. A preferable range of CuO is 0.01 to 3%, and a more preferable range is 0.01 to 2%.

In addition to the above components, other components can be added as long as the effects of the present invention are not impaired. For example, Bi ₂ O ₃ , which is a component that lowers the softening point of the glass without reducing the alkali resistance of the glass, is up to 10%, and Y ₂ O ₃ , La, which is a component that improves the chemical durability of the glass. ₂ O ₃ , Ta ₂ O ₅ , SnO ₂ , ZrO ₂ , TiO ₂ , Nb ₂ O ₅ may be added up to 8%, respectively, or P ₂ O ₅ which is a component for stabilizing glass may be added up to 8%. Good. In addition, it is better to avoid introducing Bi ₂ O ₃ into a substantial glass in consideration of environmental aspects and raw material costs.

  PbO is a component that lowers the melting point of glass, but it is also an environmentally hazardous substance, and therefore should not be substantially introduced into glass. In the present invention, “substantial introduction into glass” refers to a level that is not actively used as a raw material but mixed as an impurity, and specifically, the content is 0.1% or less. Means that.

  In the material for forming a partition for a plasma display panel of the present invention, it is preferable to use glass having a softening point of 600 ° C. or lower in order to be able to fire at 600 ° C. or lower. When the softening point is increased, it becomes difficult to obtain a dense fired film at a temperature of 600 ° C. or lower. However, if the softening point is too low, the partition wall layer is likely to be softened and deformed in a heat process when the front glass substrate and the rear glass substrate are sealed with frit glass. Therefore, the softening point of the glass is preferably 540 ° C. or higher. A more preferable range of the softening point is 540 to 590 ° C.

Further, the particle size of the glass powder in PDP barrier ribs forming material of the present invention has an average particle diameter D ₅₀ of 1.5-4.5, we are preferable that the maximum particle diameter D _max to use those 10~35μm . When the average particle size D ₅₀ and the maximum particle size D _max are reduced, the amount of the alkali metal oxide component eluted from the glass powder is increased, the photosensitivity of the dry film resist film is inhibited, and the peelability of the dry film resist film is reduced. It tends to decrease. On the other hand, when the average particle diameter D ₅₀ and the maximum particle diameter D _max increases, dense fired film sinterability is lowered it becomes difficult to obtain.

  The glass powder is suitable for a partition wall forming material, but can also be used for other uses such as a dielectric material.

  The partition wall forming material for a plasma display panel of the present invention contains a ceramic powder in addition to the glass powder for the purpose of maintaining the shape. In this case, the mixing ratio is desirably 50 to 95% by weight of glass powder, 5 to 50% by weight of ceramic powder, particularly 60 to 90% by weight of glass powder, and 10 to 40% by weight of ceramic powder. If the ceramic powder is more than 50%, the sinterability is insufficient and it becomes difficult to form a dense partition, and if it is less than 5%, the shape maintaining effect is reduced. As the ceramic powder, for example, alumina, zirconia, zircon, titania, cordierite, mullite, silica, willemite, tin oxide, zinc oxide and the like can be used alone or in combination. In order to prevent a decrease in the sinterability of the material and make it easy to obtain a dense fired film, it is desirable to use a ceramic powder having an average particle size of 5.0 μm or less and a maximum particle size of 20 μm or less. .

  Next, a method of using the partition wall forming material for a plasma display panel according to the present invention will be described. The material of the present invention can be used in the form of, for example, a paste or a green sheet.

  When used in the form of a paste, a thermoplastic resin, a plasticizer, a solvent and the like are used together with the glass powder described above and, if necessary, a ceramic powder. As content in the paste of glass powder and ceramic powder, about 30-90 mass% is common.

  The thermoplastic resin is a component that increases the film strength after drying and imparts flexibility, and the content is generally about 0.1 to 20% by mass. As the thermoplastic resin, polybutyl methacrylate, polyvinyl butyral, polymethyl methacrylate, polyethyl methacrylate, ethyl cellulose and the like can be used, and these are used alone or in combination.

  The plasticizer is a component that controls the drying speed and imparts flexibility to the dry film, and the content thereof is generally about 0 to 10% by mass. As the plasticizer, butylbenzyl phthalate, dioctyl phthalate, diisooctyl phthalate, dicapryl phthalate, dibutyl phthalate and the like can be used, and these are used alone or in combination.

  The solvent is a material for pasting the material, and its content is generally about 10 to 30% by mass. As the solvent, for example, terpineol, diethylene glycol monobutyl ether acetate, 2,2,4-trimethyl-1,3-pentadiol monoisobutyrate or the like can be used alone or in combination.

  The paste can be prepared by preparing glass powder, ceramic powder, thermoplastic resin, plasticizer, solvent and the like and kneading them at a predetermined ratio.

  In order to form partition walls using such a paste, first, these pastes are applied using a screen printing method, a batch coating method, or the like to form a coating layer having a predetermined film thickness, and then dried. Next, a dry film resist film is formed, exposed and developed to form a dry film resist photosensitive film having a predetermined size. Then, after removing an unnecessary part using the sandblast method, the remaining dry film resist is peeled off and baked to obtain a partition having a predetermined shape.

  When the material of the present invention is used in the form of a green sheet, a thermoplastic resin, a plasticizer or the like is used together with the glass powder and the ceramic powder.

  The content of glass powder and ceramic filler in the green sheet is generally about 60 to 80% by mass.

  As the thermoplastic resin and plasticizer, the same thermoplastic resins and plasticizers used in the preparation of the paste can be used. The mixing ratio of the thermoplastic resin is generally about 5 to 30% by mass, and the mixing ratio of the plasticizer is generally about 0 to 10% by mass.

  As a general method for producing a green sheet, the above glass powder, ceramic powder, thermoplastic resin, plasticizer and the like are prepared, and a main solvent such as toluene and an auxiliary solvent such as isopropyl alcohol are added thereto. A slurry is formed, and this slurry is formed into a sheet on a film of polyethylene terephthalate (PET) or the like by a doctor blade method. After forming the sheet, the solvent and the solvent can be removed by drying to obtain a green sheet.

  A glass layer can be formed by thermocompression-bonding the green sheet obtained as described above to a portion where a glass layer is to be formed, and then firing it. In the case of forming the partition, after forming the coating layer by thermocompression, it is processed into a predetermined partition shape in the same manner as in the case of the paste described above.

  In the above description, a sandblasting method using a paste or a green sheet is described as an example of the partition forming method. However, the partition wall forming material for the plasma display panel of the present invention is limited to these methods. is not. For example, other forming methods such as a printing lamination method, a lift-off method, a photosensitive paste method, a photosensitive green sheet method, and a press molding method can be applied.

  Hereinafter, the partition wall forming material of the plasma display of the present invention will be described in detail based on examples.

  Tables 1-6 show the Example (sample No. 1-24) and comparative example (sample No. 25-27) of this invention. Sample No. Reference numeral 27 denotes a conventional product made of lead-based glass.

  Each sample in the table was prepared as follows.

First, the raw materials were prepared so as to have the glass composition shown in the table in mol%, and mixed uniformly. Subsequently, after putting in a platinum crucible and melting at 1250 ° C. for 2 hours, the molten glass was formed into a thin plate shape. Subsequently, this was pulverized with an alumina ball mill and classified to obtain glass powder having an average particle diameter D ₅₀ of 1.5 to 4.5 μm and a maximum particle diameter D _{max of 10} to 35 μm. The glass powder thus obtained was measured for softening point and coefficient of thermal expansion.

  Next, the obtained glass powder sample and various ceramic powders were mixed at a ratio shown in the table to obtain a partition wall forming material. The obtained sample was evaluated for sinterability and alkali resistance.

As can be seen from the table, the sample No. Nos. 1 to 24 had a glass softening point of 550 to 587 ° C. and could be sufficiently fired at a temperature of 600 ° C. or less. Moreover, the thermal expansion coefficient was 72.8-88.4 * 10 < ^-7 > / (degreeC), and was consistent with a glass substrate. Further, no foaming was observed in the glass film immersed and fired in the alkaline solution, no discoloration was observed, or the color was slightly discolored, and the alkali resistance was good. In the evaluation of sinterability, sample No. About 1-23, (DELTA) L value was as small as 25 or less, and it was excellent also in sinterability. Sample No. About 24, since there is much content of CuO as 5.1%, (DELTA) L value is as large as 26, and the sinterability was inferior compared with the other samples (No. 1-23).

  On the other hand, sample No. which is a comparative example. Regarding No. 25, the glass film immersed in an alkali solution and fired was foamed, and was remarkably discolored, so that the alkali resistance was low. No. Regarding No. 26, the softening point of the glass was as high as 627 ° C., and ΔL value was as large as 72 even in the evaluation of sinterability, and it was impossible to fire at a temperature of 600 ° C. or less.

  In addition, about the softening point of glass, it measured using the macro-type differential thermal analyzer, and made the softening point the value of the 4th inflection point.

  Moreover, about the thermal expansion coefficient of glass, after each powder was press-molded and baked, it was polished into a cylindrical shape having a diameter of 4 mm and a length of 40 mm, measured according to JIS R3102, and then measured at 30 to 300 ° C. Values in the temperature range were determined.

Sinterability was evaluated as follows. First, each sample was mixed with a terpineol solution containing 5% of ethyl cellulose and kneaded with a three-roll mill to form a paste. Next, this paste was applied onto a 10 cm square window glass plate (thermal expansion coefficient 85 × 10 ⁻⁷ / ° C.) by screen printing to form a coating dry film having a thickness of 200 μm. Then, it baked at 570 degreeC for 10 minute (s) with the electric furnace, and obtained the glass film. Furthermore, after applying oil-based ink on the obtained glass film, wipe it off with alcohol, and measure and compare the L value (brightness) of the glass film before applying the ink and after wiping off the ink with a color difference meter. The sinterability was evaluated. A smaller ΔL value (L value before applying ink-L value after wiping ink) means that the sintered film has a higher sinterability and becomes a dense fired film. If the ΔL value was 25 or less, it was judged to have excellent sinterability.

  The alkali resistance was evaluated as follows for the degree of foaming and discoloration.

Regarding the degree of foaming, similarly to the evaluation of sinterability, first, a coated and dried film having a film thickness of 200 μm was prepared on a 10 cm square window glass plate. Next, after laminating the dry film resist film, it was exposed to form a photosensitive line having a width of 80 μm and a line / space = 1/2. Subsequently, development was performed by immersing in a 0.5 mass% Na ₂ CO ₃ aqueous solution (25 ° C.) for 1 minute to remove the unexposed portion and drying, and then a partition wall was prepared by sandblasting. Further, each sample was immersed in a 5% NaOH aqueous solution (40 ° C.) for 7 minutes to peel off the dry film resist film, and then baked at 570 ° C. for 10 minutes in an electric furnace to obtain a glass film. When the cross section of the obtained glass film is observed with a microscope, “◎” indicates that no foaming is observed, “◯” indicates that foaming is slightly observed, and foaming is extremely porous. Is shown in the table as "x".

  Regarding the degree of discoloration, similarly to the evaluation of sinterability, first, a coating / drying film having a film thickness of 200 μm was prepared on a 10 cm square window glass plate. Next, each sample was immersed in a 6% monoethanolamine solution (25 ° C.) for 10 minutes and then baked in an electric furnace at 570 ° C. for 10 minutes to obtain a glass film. In the table, the appearance of the obtained glass film was visually observed, “◎” indicates no discoloration, “○” indicates slight discoloration, and “×” indicates significant discoloration. It was shown to.

Claims (6)

In the partition material for forming a plasma display panel including glass powder and ceramic powder, the glass powder contains substantially no PbO and has a molar percentage of ZnO 20 to 55%, B ₂ O ₃ 10 to 30%, SiO 2 ₂ 15-30%, Al ₂ O ₃ 0-13%, MgO 0-20%, CaO 0-20%, SrO 0-20%, BaO 0-20%, MgO + CaO + SrO + BaO 3-20%, Li ₂ O 0 14%, Na ₂ O 0-14%, K ₂ O 0-5%, Li ₂ O + Na ₂ O + K ₂ O 4-20%, (SiO ₂ + Al ₂ O ₃ ) / B ₂ O ₃ 0.8-1. A partition wall forming material for a plasma display panel, comprising glass containing a composition of 65.   2. The partition wall forming material for a plasma display panel according to claim 1, wherein the glass powder contains 0.01 to 5% of CuO in a mole percentage.   3. The partition forming material for a plasma display panel according to claim 1, wherein the softening point of the glass powder is 540 to 600 ° C. 3.   The partition wall forming material for a plasma display panel according to any one of claims 1 to 3, comprising 50 to 95% by weight of glass powder and 5 to 50% by weight of ceramic powder. Substantially free of PbO and in mole percentages, ZnO 20-55%, B ₂ O ₃ 10-30%, SiO ₂ 15-30%, Al ₂ O ₃ 0-13%, MgO 0-20%, CaO 0~20%, SrO 0~20%, BaO 0~20%, MgO + CaO + SrO + BaO 3~20%, Li 2 O 0~14%, Na 2 O 0~14%, K 2 O 0~5%, Li 2 A glass composition for a partition wall forming material, comprising a composition of O + Na ₂ O + K ₂ O 4 to 20% and (SiO ₂ + Al ₂ O ₃ ) / B ₂ O ₃ 0.8 to 1.65.   The glass composition for a partition wall forming material according to claim 5, containing 0.01 to 5% of CuO in a mole percentage.