JP2002160940A - Glass for forming partition - Google Patents

Glass for forming partition

Info

Publication number
JP2002160940A
JP2002160940A JP2000353339A JP2000353339A JP2002160940A JP 2002160940 A JP2002160940 A JP 2002160940A JP 2000353339 A JP2000353339 A JP 2000353339A JP 2000353339 A JP2000353339 A JP 2000353339A JP 2002160940 A JP2002160940 A JP 2002160940A
Authority
JP
Japan
Prior art keywords
glass
mass
forming
partition
partition wall
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2000353339A
Other languages
Japanese (ja)
Inventor
Kazuhiko Yamanaka
一彦 山中
Satoru Fujimine
哲 藤峰
Tsuneo Manabe
恒夫 真鍋
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AGC Inc
Original Assignee
Asahi Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Glass Co Ltd filed Critical Asahi Glass Co Ltd
Priority to JP2000353339A priority Critical patent/JP2002160940A/en
Publication of JP2002160940A publication Critical patent/JP2002160940A/en
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C8/00Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
    • C03C8/02Frit compositions, i.e. in a powdered or comminuted form
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00Glass compositions
    • C03C3/04Glass compositions containing silica
    • C03C3/062Glass compositions containing silica with less than 40% silica by weight
    • C03C3/064Glass compositions containing silica with less than 40% silica by weight containing boron
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00Glass compositions
    • C03C3/12Silica-free oxide glass compositions
    • C03C3/14Silica-free oxide glass compositions containing boron
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C8/00Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
    • C03C8/24Fusion seal compositions being frit compositions having non-frit additions, i.e. for use as seals between dissimilar materials, e.g. glass and metal; Glass solders

Abstract

PROBLEM TO BE SOLVED: To provide a glass which is used for forming a partition of a plasma display panel or the like and is free from lead and which is low in dielectric constant. SOLUTION: The glass for forming a partition comprises Bi2O3 of 20-60 mass%, B2O3 of 20-55%, SiO2 of 0-15 mass%, Al2O3 of 0-15 mass%, SrO of 0-30 mass%, BaO of 0-30 mass%, Li2O of 0-6 mass%, Na2O of 0-8 mass%, K2O of 0-10 mass%, CuO of 0-3 mass% and CeO2 of 0-3 mass%.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、プラズマディスプ
レイパネル(PDP)、蛍光表示管(VFD)等の隔壁
形成に用いられるガラスに関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to glass used for forming partition walls of a plasma display panel (PDP), a fluorescent display tube (VFD), and the like.

【0002】[0002]

【従来の技術】近年、薄型の平板型カラー表示装置であ
るPDP、VFD等が注目されている。PDP、VFD
等のパネル構造の特徴のひとつとして、画素を区切る隔
壁が挙げられる。前記隔壁は画面全域に等間隔で形成さ
れ、その幅、高さはPDPではたとえば、それぞれ80
μm、150μmである。隔壁形成材料としては、隔壁
形状保持のための低膨張セラミックスフィラー、色調調
整のための耐熱顔料、および固着材としてのガラス粉
末、等からなるガラスセラミックス組成物が用いられて
いる。
2. Description of the Related Art In recent years, attention has been paid to PDPs, VFDs, and the like, which are thin flat panel color display devices. PDP, VFD
One of the features of such a panel structure is a partition partitioning a pixel. The partition walls are formed at equal intervals over the entire screen, and the width and height thereof are, for example, 80, respectively, in PDP.
μm and 150 μm. As the partition wall forming material, a glass ceramic composition including a low expansion ceramic filler for maintaining the partition wall shape, a heat-resistant pigment for adjusting the color tone, a glass powder as a fixing material, and the like is used.

【0003】[0003]

【発明が解決しようとする課題】前記ガラス粉末には軟
化点が低いことが求められ、従来、鉛含有ガラスが広く
用いられていた。しかし、近年、前記ガラス粉末として
鉛を含有しないガラス(無鉛ガラス)が強く求められて
いる。一方、従来知られている無鉛ガラスは誘電率が高
く、そのためにPDP、VFD等の消費電力が大きくな
る問題があった。本発明は、以上の課題を解決する隔壁
形成用ガラスの提供を目的とする。
The glass powder is required to have a low softening point, and lead-containing glasses have hitherto been widely used. However, recently, lead-free glass (lead-free glass) has been strongly demanded as the glass powder. On the other hand, conventionally known lead-free glass has a high dielectric constant, and therefore has a problem in that the power consumption of PDPs, VFDs and the like increases. An object of the present invention is to provide a partition wall forming glass that solves the above problems.

【0004】[0004]

【課題を解決するための手段】本発明は、下記酸化物基
準の質量百分率表示で、 Bi23 20〜60%、 B23 20〜55%、 SiO2 0〜15%、 Al23 0〜15%、 SrO 0〜30%、 BaO 0〜30%、 Li2O 0〜6%、 Na2O 0〜8%、 K2O 0〜10%、 CuO 0〜3%、 CeO2 0〜3%、 から本質的になる隔壁形成用ガラス(以下質量百分率表
示の本発明のガラスという。)を提供する。
Means for Solving the Problems The present invention, in mass percentage based on the following oxides, Bi 2 O 3 20~60%, B 2 O 3 20~55%, SiO 2 0~15%, Al 2 O 3 0~15%, SrO 0~30% , BaO 0~30%, Li 2 O 0~6%, Na 2 O 0~8%, K 2 O 0~10%, 0~3% CuO, CeO The present invention provides a glass for forming a partition wall (hereinafter, referred to as a glass of the present invention expressed by mass percentage) consisting essentially of 20 to 3%.

【0005】また、本発明は、下記酸化物基準のモル%
表示で、 Bi23 6〜22%、 B23 35〜80%、 SiO2 0〜30%、 Al23 0〜20%、 SrO 0〜40%、 BaO 0〜30%、 Li2O 0〜9%、 Na2O 0〜9%、 K2O 0〜9%、 CuO 0〜5%、 CeO2 0〜5%、 から本質的になる隔壁形成用ガラス(以下モル%表示の
本発明のガラスという。)を提供する。
Further, the present invention relates to the following oxide-based mol%
In view, Bi 2 O 3 6~22%, B 2 O 3 35~80%, SiO 2 0~30%, Al 2 O 3 0~20%, SrO 0~40%, BaO 0~30%, Li 2 O 0~9%, Na 2 O 0~9%, K 2 O 0~9%, 0~5% CuO, CeO 2 0~5%, essentially consisting barrier-forming glass (hereinafter mol% from Of the present invention.).

【0006】[0006]

【発明の実施の形態】質量百分率表示の本発明のガラス
およびモル%表示の本発明のガラスを、あわせて単に本
発明のガラスをいう。本発明のガラスは通常は粉末状に
して使用される。本発明のガラスの粉末は、たとえば、
低膨張セラミックスフィラー、耐熱顔料等と混合され、
次にペースト化される。このガラスペーストは下地のガ
ラス所定部位に塗布され、焼成される。前記下地のガラ
スはガラス基板等であるが、ガラス基板の上に透明導電
膜、不透明導電膜等が被覆されているものも含む。ま
た、前記ビヒクルは通常は樹脂を溶剤に溶解したもので
ある。本発明のガラスをPDP、VFD等の隔壁に使用
する場合、本発明のガラスの粉末は、低膨張セラミック
スフィラーおよび耐熱顔料の少なくともいずれか一方と
混合して使用することが好ましい。
BEST MODE FOR CARRYING OUT THE INVENTION The glass of the present invention in terms of mass percentage and the glass of the present invention in terms of mol% are simply referred to as the glass of the present invention. The glass of the present invention is usually used in powder form. The glass powder of the present invention is, for example,
Mixed with low expansion ceramic filler, heat resistant pigment, etc.
Next, it is made into a paste. This glass paste is applied to a predetermined portion of the underlying glass and fired. The base glass is a glass substrate or the like, but also includes a glass substrate coated with a transparent conductive film, an opaque conductive film, or the like. Further, the vehicle is usually one in which a resin is dissolved in a solvent. When the glass of the present invention is used for partition walls such as PDP and VFD, the glass powder of the present invention is preferably used as a mixture with at least one of a low-expansion ceramic filler and a heat-resistant pigment.

【0007】前記低膨張セラミックスフィラーは所望の
隔壁形状を得るための成分であって、隔壁の強度を高め
る効果も有し、その50〜350℃における平均線膨張
係数αは典型的には70×10- 7/℃以下である。アル
ミナ、ムライト、ジルコン、コージェライト、チタン酸
アルミニウム、β−スポジュメン、α−石英、溶融石
英、β−石英固溶体およびβ−ユークリプタイトから選
ばれる1種以上の粉末であることが、取り扱いやすさま
たは入手しやすさの点から好ましい。
The low-expansion ceramic filler is a component for obtaining a desired partition shape and also has an effect of increasing the strength of the partition, and its average linear expansion coefficient α at 50 to 350 ° C. is typically 70 ×. 10 - 7 / ° C. or less. One or more powders selected from alumina, mullite, zircon, cordierite, aluminum titanate, β-spodumene, α-quartz, fused silica, β-quartz solid solution, and β-eucryptite are easy to handle. Or it is preferable from the point of availability.

【0008】前記耐熱顔料は色調調整成分であり、たと
えばチタニア等の白色顔料、Fe−Mn複酸化物系、F
e−Co−Cr複酸化物系、Fe−Mn−Al複酸化物
系等の黒色顔料が挙げられる。前記ビヒクルとしては、
エチルセルロース、ニトロセルロース、等の樹脂を、α
-テルピネオール、ブチルカルビトールアセテート、酢
酸イソペンチル、等の溶剤に溶解したものが通常用いら
れる。
The heat-resistant pigment is a color tone adjusting component, for example, a white pigment such as titania, a Fe—Mn double oxide,
Black pigments such as e-Co-Cr double oxides and Fe-Mn-Al double oxides are exemplified. As the vehicle,
Resin such as ethyl cellulose, nitrocellulose, etc.
-A solution dissolved in a solvent such as terpineol, butyl carbitol acetate, isopentyl acetate or the like is usually used.

【0009】前記焼成が行われる焼成温度TBは500
〜620℃であることが好ましい。500℃未満では、
隔壁に樹脂成分が一部残留し、PDP、VFD等におい
てパネルを封着した後に該樹脂成分が隔壁から放出され
るおそれがある。620℃超ではガラス基板が変形する
おそれがある。
[0009] baking temperature T B of said firing is performed 500
It is preferable that it is -620 degreeC. Below 500 ° C,
A resin component may partially remain on the partition walls, and the resin component may be released from the partition walls after the panel is sealed with PDP, VFD, or the like. If it exceeds 620 ° C., the glass substrate may be deformed.

【0010】本発明のガラスの軟化点TSは450〜6
50℃であることが好ましい。450℃未満では、焼成
時にガラスが流動しすぎ、所望の隔壁形状が得られなく
なるおそれがある。より好ましくは500℃以上であ
る。650℃超では、焼成時のガラスの流動性が低下
し、緻密な隔壁が得られなくなるおそれがある。より好
ましくは620℃以下、特に好ましくは600℃未満で
ある。
The softening point T S of the glass of the present invention is 450 to 6
Preferably it is 50 ° C. If the temperature is lower than 450 ° C., the glass may flow too much during firing, and a desired partition shape may not be obtained. It is more preferably at least 500 ° C. If it exceeds 650 ° C., the fluidity of the glass at the time of firing may be reduced, and a dense partition wall may not be obtained. It is more preferably at most 620 ° C, particularly preferably less than 600 ° C.

【0011】本発明のガラスの、1MHzにおける比誘
電率εは10.5以下であることが好ましい。10.5
超ではPDP、VFD等の消費電力が大きくなるおそれ
がある。より好ましくは10以下である。
The relative permittivity ε at 1 MHz of the glass of the present invention is preferably 10.5 or less. 10.5
Above this, the power consumption of PDP, VFD, etc. may increase. More preferably, it is 10 or less.

【0012】本発明のガラスのαは65×10-7〜85
×10-7/℃であることが好ましい。この範囲外では、
下地のガラス(αは典型的には65×10-7〜85×1
-7/℃)との膨張マッチングが困難となる。より好ま
しくは70×10-7〜80×10-7/℃である。
The α of the glass of the present invention is 65 × 10 −7 to 85.
It is preferably × 10 −7 / ° C. Outside this range,
Base glass (α is typically 65 × 10 −7 to 85 × 1
0 −7 / ° C.). More preferably, it is 70 × 10 −7 to 80 × 10 −7 / ° C.

【0013】次に、質量百分率表示の本発明のガラスに
ついて質量百分率表示で、モル%表示の本発明のガラス
についてモル%表示で、あわせて説明する。モル%表示
の本発明のガラスの説明にかかるモル%表示の含有量
は、大括弧[・・%]で示す。Bi23はTSを低下さ
せ、またはαを大きくする効果を有し、必須である。6
0%[22%]超ではαが大きくなる、またはεが大き
くなる。好ましくは55%[20%]以下、より好まし
くは53%[18%]以下である。20%[6%]未満
ではTSが高くなる。好ましくは30%[10%]以
上、より好ましくは35%[11%]以上である。
Next, the glass of the present invention in terms of mass percentage will be described in terms of mass percentage, and the glass of the present invention in terms of mol% will be described in terms of mol%. The content of mol% in the description of the glass of the present invention in mol% is indicated by brackets [··%]. Bi 2 O 3 has the effect of lowering T S or increasing α, and is essential. 6
If it exceeds 0% [22%], α increases or ε increases. Preferably it is 55% [20%] or less, more preferably 53% [18%] or less. If it is less than 20% [6%], T S becomes high. It is preferably at least 30% [10%], more preferably at least 35% [11%].

【0014】B23はガラスを安定化させる効果を有
し、必須である。55%[80%]超ではTSが高くな
る、または分相する。好ましくは45%[70%]以
下、より好ましくは40%[65%]以下である。20
%[35%]未満では、Bi23が多くなりすぎ黄色着
色が顕著になる。好ましくは24%[40%]以上であ
る。
B 2 O 3 has an effect of stabilizing glass and is essential. If it exceeds 55% [80%], T S becomes high or phase separation occurs. It is preferably at most 45% [70%], more preferably at most 40% [65%]. 20
% [35%], the amount of Bi 2 O 3 becomes too large, and yellow coloring becomes remarkable. It is preferably at least 24% [40%].

【0015】SiO2は必須ではないが、ガラスを安定
化させるために15%[30%]まで含有してもよい。
15%[30%]超ではTSが高くなるおそれがある。
好ましくは10%[20%]以下である。SiO2を含
有する場合、その含有量は2%[4%]以上であること
が好ましい。より好ましくは4%[8%]以上である。
[0015] SiO 2 is not essential, but may be contained up to 15% [30%] to stabilize the glass.
If it exceeds 15% [30%], T S may increase.
Preferably it is 10% [20%] or less. When SiO 2 is contained, its content is preferably at least 2% [4%]. More preferably, it is at least 4% [8%].

【0016】Al23は必須ではないが、ガラスを安定
化させるために15%[20%]まで含有してもよい。
15%[20%]超では失透するおそれがある。好まし
くは10%[15%]以下である。Al23を含有する
場合、その含有量は0.5%[1%]以上であることが
好ましい。より好ましくは2%[3%]以上である。
Al 2 O 3 is not essential, but may be contained up to 15% [20%] to stabilize the glass.
If it exceeds 15% [20%], devitrification may occur. Preferably it is 10% [15%] or less. When Al 2 O 3 is contained, the content is preferably 0.5% [1%] or more. More preferably, it is 2% [3%] or more.

【0017】SrOは必須ではないが、耐水性向上また
は分相抑制のために30%[40%]まで含有してもよ
い。30%[40%]超では失透するおそれがある。好
ましくは25%[30%]以下、特に好ましくは15%
[20%]以下である。
SrO is not essential, but may be contained up to 30% [40%] for improving water resistance or suppressing phase separation. If it exceeds 30% [40%], devitrification may occur. Preferably 25% [30%] or less, particularly preferably 15%
[20%] or less.

【0018】BaOは必須ではないが、耐水性を向上さ
せるために、または分相を抑制するために30%[30
%]まで含有してもよい。30%[30%]超では失透
するおそれがある。好ましくは25%[20%]以下、
より好ましくは20%[15%]以下である。BaOを
含有する場合、その含有量は5%[3%]以上であるこ
とが好ましい。より好ましくは9%[6%]以上であ
る。
Although BaO is not essential, it is 30% [30%] in order to improve water resistance or suppress phase separation.
%]. If it exceeds 30% [30%], devitrification may occur. Preferably 25% [20%] or less,
More preferably, it is 20% [15%] or less. When BaO is contained, its content is preferably 5% [3%] or more. More preferably, it is 9% [6%] or more.

【0019】SrOおよびBaOのいずれか1種以上を
含有する場合、SrOおよびBaOの含有量の合計は5
%[5%]〜20%[15%]であることが好ましい。
When one or more of SrO and BaO is contained, the total content of SrO and BaO is 5
% [5%] to 20% [15%].

【0020】Li2O、Na2OおよびK2Oはいずれも
必須ではないが、TSを低下させるために、それぞれ6
%[9%]、8%[9%]、10%[9%]まで含有し
てもよい。それを超えて含有すると電気絶縁性が低下す
るおそれがある。好ましくはそれぞれ2%[5%]以
下、3%[5%]以下、3%[5%]以下である。電気
絶縁性を向上させたい場合、Li2O、Na2OおよびK
2Oの含有量の合計は0%[0%]〜2%[5%]とす
ることが好ましい。より好ましくは0%[0%]〜1%
[2%]であり、Li2O、Na2OおよびK2Oのいず
れも含有しないことが特に好ましい。
Although Li 2 O, Na 2 O and K 2 O are not essential, they are each 6 to reduce T S.
% [9%], 8% [9%], and 10% [9%]. If the content exceeds this, the electrical insulation may be reduced. Preferably, they are respectively 2% [5%] or less, 3% [5%] or less, and 3% [5%] or less. When it is desired to improve the electrical insulation, Li 2 O, Na 2 O and K
The total content of 2 O is preferably 0% [0%] to 2% [5%]. More preferably, 0% [0%] to 1%
[2%], and it is particularly preferable that none of Li 2 O, Na 2 O and K 2 O be contained.

【0021】CuOおよびCeO2はいずれも必須では
ないが、Bi23含有に伴う着色を低減させるためにそ
れぞれ3%[5%]まで含有してもよい。3%[5%]
超ではCuOまたはCeO2に起因する着色が顕著にな
る。好ましくはそれぞれ2%[3%]以下、より好まし
くはそれぞれ0.5%[1%]以下である。CuOまた
はCeO2を含有する場合、CuO含有量またはCeO2
含有量はそれぞれ0.1%[0.1%]以上であること
が好ましい。
[0021] While CuO and CeO 2 is not essential, but may be contained up respectively 3% [5%] in order to reduce coloring due to Bi 2 O 3 content. 3% [5%]
In the case of exceeding, coloring caused by CuO or CeO 2 becomes remarkable. It is preferably 2% [3%] or less, more preferably 0.5% [1%] or less. When containing CuO or CeO 2 , the CuO content or CeO 2
It is preferable that each content is 0.1% [0.1%] or more.

【0022】Bi23を35%[11%]〜55%[2
0%]、B23を24%[40%]〜40%[65
%]、SiO2を2%[4%]〜10%[20%]、A
23を2%[3%]〜10%[15%]、SrOおよ
びBaOのいずれか1種以上を合計で5%[5%]〜2
0%[15%]、CeO2を0.1%[0.1%]〜
0.5%[0.5%]含有することが好ましい。
Bi 2 O 3 is reduced from 35% [11%] to 55% [2
0%], B 2 O 3 24% [40%] 40% [65
%], 2% [4%] to 10% [20%] of SiO 2 , A
l 2 O 3 is 2% [3%] to 10% [15%], and at least one of SrO and BaO is 5% [5%] to 2 in total.
0% [15%], 0.1% [0.1%] of CeO 2
It is preferable to contain 0.5% [0.5%].

【0023】本発明のガラスは本質的に上記成分からな
るが、他の成分を本発明の目的を損なわない範囲で含有
してもよい。該他の成分の含有量の合計は、好ましくは
10%[10%]以下、より好ましくは5%[5%]以下で
ある。前記他の成分として以下のようなものが例示され
る。すなわち、TSの調整、αの調整、ガラスの安定性
向上、化学的耐久性の向上等のために、ZnO、TiO
2、ZrO2、La23等を含有してもよい。また、TS
を低下させるために、電気絶縁性を阻害しない範囲でF
等のハロゲンを含有してもよい。
The glass of the present invention consists essentially of the above components, but may contain other components as long as the object of the present invention is not impaired. The total content of the other components is preferably 10% [10%] or less, more preferably 5% [5%] or less. Examples of the other components include the following. That is, ZnO, TiO, and the like are used to adjust T S , adjust α, improve glass stability, and improve chemical durability.
2 , ZrO 2 , La 2 O 3 and the like. Also, T S
In order to reduce the electric resistance, F
And the like.

【0024】[0024]

【実施例】表1のBi23からCeO2までの欄に質量
百分率で示す組成となるように、原料を調合して混合
し、1200〜1350℃の電気炉中で白金ルツボを用
いて1時間溶融した。次に、溶融ガラスを薄板状ガラス
に成形し、該薄板状ガラスをボールミルで粉砕して平均
粒径が2.0μmのガラス粉末とした。例1〜3は実施
例、例4、5は比較例である。なお、例1〜5のモル%
表示組成を表2に示す。
EXAMPLES Raw materials were prepared and mixed so as to have a composition shown by mass percentage in the column from Bi 2 O 3 to CeO 2 in Table 1 and then mixed with a platinum crucible in an electric furnace at 1200 to 1350 ° C. Melted for 1 hour. Next, the molten glass was formed into a sheet glass, and the sheet glass was pulverized with a ball mill to obtain glass powder having an average particle size of 2.0 μm. Examples 1 to 3 are Examples and Examples 4 and 5 are Comparative Examples. In addition, mol% of Examples 1-5.
The indicated composition is shown in Table 2.

【0025】例1〜5のTS(単位:℃)、α(単位:
10-7/℃)およびεを下記方法で測定した。結果を表
1に示す。 TS:示差熱分析計を用いて測定した。 α:ガラス粉末を加圧成形後、表1に示す焼成温度TB
(単位:℃)で10分間焼成して得た焼成体を直径5m
m、長さ2cmの円柱状に加工してサンプルとし、50
〜350℃における平均線膨張係数αを測定した。 ε:前記焼成体を50mm×50mm×厚さ5mmに加
工し、その表面に電極を蒸着して周波数1MHzで比誘
電率εを測定した。
[0025] Examples 1 to 5 of the T S (Unit: ℃), α (unit:
10 −7 / ° C.) and ε were measured by the following methods. Table 1 shows the results. T S : Measured using a differential thermal analyzer. α: firing temperature T B shown in Table 1 after pressure molding of glass powder
A fired body obtained by firing at (unit: ° C) for 10 minutes has a diameter of 5 m.
m, processed into a column with a length of 2 cm to make a sample, 50
The average coefficient of linear expansion α at 350 ° C. was measured. ε: The fired body was processed into 50 mm × 50 mm × 5 mm thick, an electrode was deposited on the surface thereof, and the relative dielectric constant ε was measured at a frequency of 1 MHz.

【0026】次に、例1〜5のそれぞれのガラス粉末を
77質量部、平均粒径が3.0μmのアルミナ粉末を1
7質量部、平均粒径が0.1μmのチタニア粉末を6質
量部の割合で混合したガラスセラミックス組成物100
gを、23〜27gのα−テルピネオールと1〜5gの
エチルセルロースからなるビヒクルと混練してガラスペ
ーストとした。
Next, 77 parts by mass of each of the glass powders of Examples 1 to 5 and 1 part of alumina powder having an average particle size of 3.0 μm were added.
Glass ceramic composition 100 in which 7 parts by mass and 6 parts by mass of titania powder having an average particle size of 0.1 μm are mixed.
g was kneaded with a vehicle consisting of 23 to 27 g of α-terpineol and 1 to 5 g of ethyl cellulose to obtain a glass paste.

【0027】このガラスペーストを、100mm×10
0mm×厚さ2.8mmのソーダライムシリカガラス基
板にブレードコートし、120℃で30分間乾燥し、膜
厚200μmの未焼成隔壁層を得た。
This glass paste is applied to 100 mm × 10
A soda lime silica glass substrate having a thickness of 0 mm and a thickness of 2.8 mm was coated with a blade and dried at 120 ° C for 30 minutes to obtain an unfired partition wall layer having a thickness of 200 µm.

【0028】この未焼成隔壁層の上にドライフィルムレ
ジストをラミネートした後、隔壁パターンの露光マスク
をセットして露光した。その後、濃度3g/Lの炭酸ナ
トリウム水溶液で現像して、ライン幅100μm、スペ
ース幅150μmの隔壁パターンを前記未焼成隔壁層の
上に形成した。
After laminating a dry film resist on the unfired partition layer, exposure was performed by setting an exposure mask for the partition pattern. Thereafter, development was performed with a 3 g / L aqueous solution of sodium carbonate to form a partition pattern having a line width of 100 μm and a space width of 150 μm on the unfired partition layer.

【0029】次に、サンドブラストを行って不要部を切
削して未焼成隔壁を得た。該未焼成隔壁の上に残ってい
たドライフィルムを、濃度10g/Lの水酸化ナトリウ
ム水溶液によって除去後、TBで焼成して隔壁を得た。
Next, unnecessary portions were cut by sand blasting to obtain unfired partition walls. The dry film remaining on the yet-fired barrier ribs, after removal by aqueous sodium hydroxide solution having a concentration of 10 g / L, to obtain a partition wall and fired at T B.

【0030】隔壁パターンのラインと直交する向きに前
記隔壁を切断し、得られた隔壁断面について3μm以上
の大きさの空隙の有無を電子顕微鏡により調べた。結果
を表1に示す。空隙の有無は隔壁の緻密性の指標であ
り、空隙のないことが好ましい。また、前記隔壁断面に
ついて、隔壁の1/2の高さにおける幅Wと隔壁の高さ
Hを測定した。結果を表1に示す。W/Hは0.7未満
であることが好ましい。0.7以上では隔壁形状が保持
されないおそれがある。
The partition was cut in a direction perpendicular to the line of the partition pattern, and the cross section of the obtained partition was examined by an electron microscope for the presence of a void having a size of 3 μm or more. Table 1 shows the results. The presence or absence of the void is an index of the denseness of the partition wall, and it is preferable that there is no void. Further, with respect to the partition wall cross section, the width W and the partition height H at half the height of the partition wall were measured. Table 1 shows the results. Preferably, W / H is less than 0.7. If it is 0.7 or more, the partition shape may not be maintained.

【0031】[0031]

【表1】 [Table 1]

【0032】[0032]

【表2】 [Table 2]

【0033】[0033]

【発明の効果】本発明のガラスを用いることにより、P
DP、VFD等における隔壁を無鉛化でき、また、緻密
にできる。また、隔壁のεを低くでき、PDP、VFD
等の消費電力を削減できる。
By using the glass of the present invention, P
Partition walls in DP, VFD and the like can be made lead-free and dense. In addition, the ε of the partition can be lowered, and PDP, VFD
And other power consumption can be reduced.

フロントページの続き Fターム(参考) 4G062 AA08 AA09 AA15 BB01 BB05 BB08 DA01 DA02 DA03 DA04 DB01 DB02 DB03 DB04 DC04 DC05 DC06 DC07 DD01 DE01 DF01 EA01 EA02 EA03 EA10 EB01 EB02 EB03 EC01 EC02 EC03 ED01 EE01 EF01 EF02 EF03 EF04 EF05 EG01 EG02 EG03 EG04 FA01 FA10 FB01 FC01 FD01 FE01 FF01 FG01 FH01 FJ01 FK01 FL01 FL02 FL03 GA03 GA04 GA05 GA06 GB01 GC01 GD01 GE01 HH01 HH03 HH04 HH05 HH07 HH09 HH11 HH13 HH15 HH17 HH20 JJ01 JJ03 JJ05 JJ07 JJ10 KK01 KK03 KK05 KK07 KK10 MM07 NN26 NN29 PP13 PP16 5C040 GF18 KA10 KB03 KB19 KB28 MA12 MA30 Continued on the front page F-term (reference) 4G062 AA08 AA09 AA15 BB01 BB05 BB08 DA01 DA02 DA03 DA04 DB01 DB02 DB03 DB04 DC04 DC05 DC06 DC07 DD01 DE01 DF01 EA01 EA02 EA03 EA10 EB01 EB02 EB03 EC01 EC02 EC03 EF01 EF01 EF01 EF01 EF01 EF01 EF01 EF01 EF01 EF01 EF01 EF01 EF01 EF01 EF01 EF01 EF01 EF01 EF01 EF01 EF01 EF01 EF01 EG03 EG04 FA01 FA10 FB01 FC01 FD01 FE01 FF01 FG01 FH01 FJ01 FK01 FL01 FL02 FL03 GA03 GA04 GA05 GA06 GB01 GC01 GD01 GE01 HH01 HH03 HH04 HH05 HH07 HH09 HH11 HH13 HH15 HH17 KK JJ JJ KK JJ01 KK 5C040 GF18 KA10 KB03 KB19 KB28 MA12 MA30

Claims (8)

【特許請求の範囲】[Claims] 【請求項1】下記酸化物基準の質量百分率表示で、 Bi23 20〜60%、 B23 20〜55%、 SiO2 0〜15%、 Al23 0〜15%、 SrO 0〜30%、 BaO 0〜30%、 Li2O 0〜6%、 Na2O 0〜8%、 K2O 0〜10%、 CuO 0〜3%、 CeO2 0〜3%、 から本質的になる隔壁形成用ガラス。In 1. A following oxides in mass percentage, Bi 2 O 3 20~60%, B 2 O 3 20~55%, SiO 2 0~15%, Al 2 O 3 0~15%, SrO 0~30%, BaO 0~30%, Li 2 O 0~6%, Na 2 O 0~8%, K 2 O 0~10%, 0~3% CuO, CeO 2 0~3%, essentially from Glass for forming barrier ribs. 【請求項2】Bi23を質量百分率表示で30〜60%
含有する請求項1に記載の隔壁形成用ガラス。
2. A Bi 2 O 3 30 to 60% by the mass percentage
The glass for forming a partition wall according to claim 1, which contains the glass.
【請求項3】Li2O、Na2OおよびK2Oの含有量の
合計が、質量百分率表示で0〜2%である請求項1また
は2に記載の隔壁形成用ガラス。
3. The glass for forming a partition wall according to claim 1, wherein the total content of Li 2 O, Na 2 O and K 2 O is 0 to 2% by mass percentage.
【請求項4】質量百分率表示で、Bi23を35〜55
%、B23を24〜40%、SiO 2を2〜10%、A
23を2〜10%、SrOおよびBaOのいずれか1
種以上を合計で5〜20%、CeO2を0.1〜0.5
%含有する請求項1、2または3に記載の隔壁形成用ガ
ラス。
4. The method according to claim 1, wherein the mass percentage is BiTwoOThree35 to 55
%, BTwoOThreeFrom 24 to 40%, SiO TwoFrom 2 to 10%, A
lTwoOThreeFrom 2 to 10%, one of SrO and BaO
5% to 20% in total, CeO or moreTwo0.1 to 0.5
4. The barrier rib forming gas according to claim 1, wherein
Russ.
【請求項5】下記酸化物基準のモル%表示で、 Bi23 6〜22%、 B23 35〜80%、 SiO2 0〜30%、 Al23 0〜20%、 SrO 0〜40%、 BaO 0〜30%、 Li2O 0〜9%、 Na2O 0〜9%、 K2O 0〜9%、 CuO 0〜5%、 CeO2 0〜5%、 から本質的になる隔壁形成用ガラス。In 5. A following oxides in mol%, Bi 2 O 3 6~22%, B 2 O 3 35~80%, SiO 2 0~30%, Al 2 O 3 0~20%, SrO 0-40%, BaO 0-30%, Li 2 O 0-9%, Na 2 O 0-9%, K 2 O 0-9%, CuO 0-5%, CeO 2 0-5% Glass for forming barrier ribs. 【請求項6】Bi23をモル%表示で10〜22%以上
含有する請求項5に記載の隔壁形成用ガラス。
6. The glass for forming a partition wall according to claim 5, which contains 10 to 22% or more of Bi 2 O 3 by mol%.
【請求項7】Li2O、Na2OおよびK2Oの含有量の
合計が、モル%表示で0〜5%である請求項5または6
に記載の隔壁形成用ガラス。
7. The total content of Li 2 O, Na 2 O and K 2 O is 0 to 5% by mol%.
The glass for forming a partition wall according to the above.
【請求項8】モル%表示で、Bi23を11〜20%、
23を40〜65%、SiO2を4〜20%、Al2
3を3〜15%、SrOおよびBaOのいずれか1種以
上を合計で5〜15%、CeO2を0.1〜0.5%含
有する請求項5、6または7に記載の隔壁形成用ガラ
ス。
In 8. mol%, the Bi 2 O 3 11 to 20%,
B 2 O 3 of 40-65%, the SiO 2 4~20%, Al 2 O
8. The partition wall-forming member according to claim 6, wherein 3 to 3 % of SrO and BaO are contained in a total of 5 to 15%, and CeO 2 is 0.1 to 0.5%. Glass.
JP2000353339A 2000-11-20 2000-11-20 Glass for forming partition Pending JP2002160940A (en)

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Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006298735A (en) * 2005-04-25 2006-11-02 Central Glass Co Ltd Lead-free glass having low melting point
JP2007112686A (en) * 2005-10-24 2007-05-10 Asahi Glass Co Ltd Glass for covering electrode and plasma display panel
JP2008088046A (en) * 2006-09-05 2008-04-17 Nippon Electric Glass Co Ltd Glass composition for forming supporting frame, and supporting frame forming material
KR100853169B1 (en) * 2006-12-08 2008-08-20 엘지전자 주식회사 Plasma display apparatus
KR100858660B1 (en) * 2007-04-03 2008-09-16 엘지전자 주식회사 Plasma display panel dielectric substance composition and plasma display panel comprising the same
JP2010006625A (en) * 2008-06-25 2010-01-14 Nippon Electric Glass Co Ltd Glass composition for forming supporting frame, and supporting frame forming material
CN102219384A (en) * 2011-03-28 2011-10-19 彩虹集团公司 Inorganic adhesive for silicon-based solar battery back aluminum slurry and preparation method thereof

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006298735A (en) * 2005-04-25 2006-11-02 Central Glass Co Ltd Lead-free glass having low melting point
JP2007112686A (en) * 2005-10-24 2007-05-10 Asahi Glass Co Ltd Glass for covering electrode and plasma display panel
JP2008088046A (en) * 2006-09-05 2008-04-17 Nippon Electric Glass Co Ltd Glass composition for forming supporting frame, and supporting frame forming material
KR100853169B1 (en) * 2006-12-08 2008-08-20 엘지전자 주식회사 Plasma display apparatus
KR100858660B1 (en) * 2007-04-03 2008-09-16 엘지전자 주식회사 Plasma display panel dielectric substance composition and plasma display panel comprising the same
WO2008120851A1 (en) * 2007-04-03 2008-10-09 Lg Electronics Inc. Dielectric composition and plasma display panel including the same
US8164260B2 (en) 2007-04-03 2012-04-24 Lg Electronics Inc. Dielectric composition and plasma display panel including the same
JP2010006625A (en) * 2008-06-25 2010-01-14 Nippon Electric Glass Co Ltd Glass composition for forming supporting frame, and supporting frame forming material
CN102219384A (en) * 2011-03-28 2011-10-19 彩虹集团公司 Inorganic adhesive for silicon-based solar battery back aluminum slurry and preparation method thereof

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