JP2000053443A - Lead-free glass composition and composition for forming plasma display panel partition - Google Patents

Lead-free glass composition and composition for forming plasma display panel partition

Info

Publication number
JP2000053443A
JP2000053443A JP22321098A JP22321098A JP2000053443A JP 2000053443 A JP2000053443 A JP 2000053443A JP 22321098 A JP22321098 A JP 22321098A JP 22321098 A JP22321098 A JP 22321098A JP 2000053443 A JP2000053443 A JP 2000053443A
Authority
JP
Japan
Prior art keywords
composition
lead
glass
free glass
mol
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP22321098A
Other languages
Japanese (ja)
Other versions
JP4100591B2 (en
Inventor
Atsuo Hiroi
淳雄 弘井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AGC Techno Glass Co Ltd
Original Assignee
Asahi Techno Glass Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Techno Glass Corp filed Critical Asahi Techno Glass Corp
Priority to JP22321098A priority Critical patent/JP4100591B2/en
Publication of JP2000053443A publication Critical patent/JP2000053443A/en
Application granted granted Critical
Publication of JP4100591B2 publication Critical patent/JP4100591B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Abstract

PROBLEM TO BE SOLVED: To obtain a stable composition having the same properties as a lead glass and specified in the softening point by mixing substantially ZnO, Al2O3, P2O5 and the like in a specific ratio. SOLUTION: 25-55% ZnO, 1-15% Al2O3, 30-55% P2O5, 0-15% SiO2 and 0-20% BaO+CaO+MgO+SrO by mol. are mixed. The softening point of the resultant composition is 460-590 deg.C. The average linear expansion coefficient at 3-300 deg.C is preferably 50×10-7 to 95×10-7/ deg.C. A paste prepared by mixing preferably this composition with an inorganic filler and/or an inorganic pigment and further mixing a binder and a solvent therewith is applied on a rear glass substrate by printing or the like, fired and pattered to obtain a plasma display panel partition. The total quantity of the inorganic filler and/or the inorganic pigment is preferably 5-200 pts.wt. per 100 pts.wt. lead-free glass composition.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、特にプラズマディ
スプレイパネル(以下PDPという。)の背面ガラス基
板上の隔壁形成に好適な無鉛ガラス組成物およびPDP
隔壁形成用組成物に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a lead-free glass composition and a PDP particularly suitable for forming barrier ribs on a back glass substrate of a plasma display panel (hereinafter referred to as "PDP").
The present invention relates to a composition for forming a partition.

【0002】[0002]

【従来の技術】従来からの陰極線管に代わるディスプレ
イとして、大型で薄型のPDPが開発されてきている。
図1はPDPの概略構成図である。PDPは2枚のガラ
ス基板、すなわち前面ガラス基板1および背面ガラス基
板2の内表面に、互いに直交するストライプ状の電極が
配置される。前面ガラス基板1には表示電極3およびバ
ス電極4が、背面ガラス基板2にはアドレス電極8が、
それぞれ配置される。
2. Description of the Related Art A large and thin PDP has been developed as a display replacing a conventional cathode ray tube.
FIG. 1 is a schematic configuration diagram of a PDP. In the PDP, stripe-shaped electrodes orthogonal to each other are arranged on the inner surfaces of two glass substrates, that is, a front glass substrate 1 and a rear glass substrate 2. The front glass substrate 1 has display electrodes 3 and bus electrodes 4, the rear glass substrate 2 has address electrodes 8,
Each is arranged.

【0003】各電極は誘電体膜5で被覆される。前面ガ
ラス基板1の誘電体膜5は保護膜6で被覆される。背面
ガラス基板2には高さ約100μmの隔壁7がアドレス
電極8と同方向(縦方向)に配置され、隔壁7の間に蛍
光体9の層が形成される。前面ガラス基板1および背面
ガラス基板2の周辺を封止材(図示せず。)で気密封止
した後Ne−Xe混合ガス等のガスが封入される。
Each electrode is covered with a dielectric film 5. The dielectric film 5 of the front glass substrate 1 is covered with a protective film 6. Partitions 7 having a height of about 100 μm are arranged on the rear glass substrate 2 in the same direction (vertical direction) as the address electrodes 8, and a layer of a phosphor 9 is formed between the partitions 7. After the periphery of the front glass substrate 1 and the rear glass substrate 2 is hermetically sealed with a sealing material (not shown), a gas such as a Ne—Xe mixed gas is filled.

【0004】隔壁7の形成方法として種々のものが提案
されているが、近年の主流はサンドブラスト法と呼ばれ
る方法である。サンドブラスト法とは、ガラス基板表面
に所定厚さの隔壁形成用組成物であるガラスペーストを
塗布し、乾燥後、その上に耐ブラスト性を有する感光性
ドライフィルムを重ね合わせ、次いで所定の隔壁形状に
露光・現像を行ってパターニングした後、研磨粉を吹き
つけて感光性ドライフィルムのない部分を削りとり、そ
の後焼成を行って隔壁を形成する方法である。この方法
を用いると高精細パターンの隔壁を形成できる。
[0004] Various methods have been proposed for forming the partition walls 7, but the mainstream in recent years is a method called a sand blast method. The sand blasting method is a method in which a glass paste, which is a composition for forming a partition having a predetermined thickness, is applied to the surface of a glass substrate, and after drying, a photosensitive dry film having blast resistance is laminated thereon, and then a predetermined partition shape is formed. After patterning by exposure and development, a portion without a photosensitive dry film is removed by spraying abrasive powder, followed by baking to form partition walls. By using this method, a partition having a high definition pattern can be formed.

【0005】サンドブラスト法で使用されるガラスペー
ストは、ガラスを主成分とし、無機顔料、無機充填材、
等を含有する。前記ガラスは、PDPを構成するガラス
基板上に前記方法で焼成されるため、ガラス基板として
従来使用されているソーダライムシリカ系ガラス等の基
板ガラスの耐熱性を考慮すると600℃以下で焼成する
必要がある。このため比較的低融点のガラスが用いられ
ている。現在主流となっているガラスペーストのガラス
は、PbOを50重量%以上含有するPbO−SiO2
系のガラスである。
[0005] The glass paste used in the sandblasting method is mainly composed of glass, and contains inorganic pigments, inorganic fillers,
Etc. Since the glass is fired on the glass substrate constituting the PDP by the above method, it is necessary to fire the glass at 600 ° C. or less in consideration of the heat resistance of the substrate glass such as soda lime silica glass conventionally used as the glass substrate. There is. For this reason, a glass having a relatively low melting point is used. The glass of the glass paste which is currently the mainstream is PbO—SiO 2 containing 50% by weight or more of PbO.
It is a system glass.

【0006】以上述べたように、鉛含有低融点ガラスを
主成分とするガラスペーストを用いてサンドブラスト法
により隔壁を形成する方法が主流となっているが、サン
ドブラスト法では不必要な部分が削りとられるため、大
量の鉛含有廃棄物が発生し、環境面で問題が発生するお
それがある。このためPDP隔壁形成用ガラスペースト
として無鉛のものが求められている。
As described above, the method of forming partition walls by a sand blast method using a glass paste containing a lead-containing low-melting glass as a main component is mainly used. However, in the sand blast method, unnecessary portions are cut off. As a result, a large amount of lead-containing waste is generated, which may cause environmental problems. Therefore, a lead-free glass paste for forming a PDP partition wall is required.

【0007】[0007]

【発明が解決しようとする課題】本発明は、環境面で問
題を発生させるおそれがある鉛を含有しない無鉛ガラス
組成物およびPDP隔壁形成用組成物の提供を目的とす
る。
SUMMARY OF THE INVENTION An object of the present invention is to provide a lead-free glass composition containing no lead and a composition for forming a PDP partition wall, which may cause environmental problems.

【0008】[0008]

【課題を解決するための手段】本発明は、酸化物基準の
モル%表示で実質的に、ZnO:25〜55%、Al2
3 :1〜15%、P25 :30〜55%、SiO
2 :0〜15%、BaO+CaO+MgO+SrO:0
〜20%、からなり、軟化点が460〜590℃である
無鉛ガラス組成物、および、前記無鉛ガラス組成物を含
有するPDP隔壁形成用組成物、を提供する。
According to the present invention, there is substantially provided, in terms of mole% on an oxide basis, ZnO: 25 to 55%, Al 2
O 3 : 1 to 15%, P 2 O 5 : 30 to 55%, SiO
2 : 0 to 15%, BaO + CaO + MgO + SrO: 0
A lead-free glass composition having a softening point of 460 to 590 ° C, and a PDP partition wall-forming composition containing the lead-free glass composition.

【0009】本発明者は、環境面で問題を発生させるお
それのないZnO、Al23 、P 25 、等の酸化物
に着目して鋭意研究を行った結果、鉛含有ガラスと同等
の特性を有する安定な無鉛ガラス組成を見出し本発明に
至った。
[0009] The present inventor has suggested that environmental problems arise.
ZnO, Al without itTwo OThree , P Two OFive Oxides such as
As a result of intensive research focusing on
Found a stable lead-free glass composition with the characteristics of
Reached.

【0010】[0010]

【発明の実施の形態】本発明の無鉛ガラス組成物は、実
質的に鉛を含有しないガラス組成物である。ZnOは必
須成分であり、55モル%を超えると結晶化しやすくな
り安定したガラスを得にくくなる。好ましくは48モル
%以下である。25モル%未満では軟化点が高くなりす
ぎ所定温度での焼成が困難となる。好ましくは30モル
%以上である。
BEST MODE FOR CARRYING OUT THE INVENTION The lead-free glass composition of the present invention is a glass composition containing substantially no lead. ZnO is an essential component, and if it exceeds 55 mol%, it tends to crystallize, making it difficult to obtain stable glass. It is preferably at most 48 mol%. If it is less than 25 mol%, the softening point becomes too high, and it becomes difficult to fire at a predetermined temperature. It is preferably at least 30 mol%.

【0011】Al23 は必須成分であり、耐水性を向
上させる効果がある。15モル%を超えると軟化点が高
くなりすぎ所定温度での焼成が困難となる。好ましくは
9モル%以下である。1モル%未満では耐水性を向上さ
せる効果がなくなる。好ましくは2モル%以上である。
Al 2 O 3 is an essential component and has an effect of improving water resistance. If it exceeds 15 mol%, the softening point will be too high and it will be difficult to fire at a predetermined temperature. Preferably it is 9 mol% or less. If it is less than 1 mol%, the effect of improving the water resistance is lost. It is preferably at least 2 mol%.

【0012】P25 は必須成分であり、ガラスを形成
する最も重要な成分である。55モル%を超えると結晶
化しやすくなり安定したガラスを得にくくなる。好まし
くは50モル%以下である。30モル%未満では軟化点
が高くなりすぎ所定温度での焼成が困難となる。好まし
くは38モル%以上である。
P 2 O 5 is an essential component and the most important component for forming glass. If it exceeds 55 mol%, it tends to be crystallized, making it difficult to obtain stable glass. Preferably it is 50 mol% or less. If it is less than 30 mol%, the softening point becomes too high, and it becomes difficult to fire at a predetermined temperature. It is preferably at least 38 mol%.

【0013】SiO2 は必須成分ではないがガラスの安
定化に効果があり、15モル%まで含有してもよい。1
5モル%を超えると軟化点が高くなりすぎ所定温度での
焼成が困難となる。好ましくは10モル%以下である。
Although SiO 2 is not an essential component, it is effective for stabilizing the glass, and may be contained up to 15 mol%. 1
If it exceeds 5 mol%, the softening point becomes too high, and it becomes difficult to fire at a predetermined temperature. Preferably it is 10 mol% or less.

【0014】アルカリ土類金属酸化物であるBaO、C
aO、MaO、SrOは、必須成分ではないが主として
軟化点および熱膨張係数を調整するために有効な成分で
ある。一般的なガラスと同様に、ZnO−Al23
25 の3成分ガラス系でも軟化点と熱膨張係数との
間には相関があり、軟化点の上昇とともに熱膨張係数は
減少する。このため、軟化点が同じであり熱膨張係数が
違うガラスが必要な場合、または熱膨張係数が同じであ
り軟化点が違うガラスが必要な場合、ZnO−Al2
3 −P25 の3成分ガラス系ではその実現はきわめて
困難である。しかし、これらアルカリ土類金属酸化物の
含有量を調整することにより、軟化点が同じであり熱膨
張係数が違うガラス、または熱膨張係数が同じであり軟
化点が違うガラスを作製できる。
BaO, C which is an alkaline earth metal oxide
Although aO, MaO, and SrO are not essential components, they are mainly effective for adjusting the softening point and the coefficient of thermal expansion. Like general glass, ZnO-Al 2 O 3-
There is a correlation between the softening point and the coefficient of thermal expansion even in the three-component glass system of P 2 O 5 , and the coefficient of thermal expansion decreases as the softening point increases. Therefore, when glasses having the same softening point and different thermal expansion coefficients are required, or when glasses having the same thermal expansion coefficient and different softening points are required, ZnO—Al 2 O
This is extremely difficult to achieve with a 3- P 2 O 5 ternary glass system. However, by adjusting the content of these alkaline earth metal oxides, it is possible to produce glasses having the same softening point and different thermal expansion coefficients, or glasses having the same thermal expansion coefficient and different softening points.

【0015】熱膨張係数を増加させる効果は、BaO>
SrO>CaO>MgOの順に小さくなる。また、軟化
点を上昇させる効果は、MgO>CaO>SrO>Ba
Oの順に小さくなる。BaO、CaO、MaO、SrO
は、それらの合量が20モル%まで含有してもよい。2
0モル%を超えると結晶化しやすくなり安定したガラス
を得にくくなる。好ましくは12モル%以下である。
The effect of increasing the coefficient of thermal expansion is as follows: BaO>
It becomes smaller in the order of SrO>CaO> MgO. The effect of increasing the softening point is as follows: MgO>CaO>SrO> Ba
It becomes smaller in the order of O. BaO, CaO, MaO, SrO
May contain up to 20 mol% of their total amount. 2
If it exceeds 0 mol%, it tends to crystallize, making it difficult to obtain stable glass. It is preferably at most 12 mol%.

【0016】上記成分以外に、Fe23 のような着色
成分を0.5モル%まで添加してもよい。また、その他
の成分を本発明の目的を損なわない範囲で添加してもよ
いがその合量は5モル%以下である。
In addition to the above components, a coloring component such as Fe 2 O 3 may be added up to 0.5 mol%. Further, other components may be added as long as the object of the present invention is not impaired, but the total amount is 5 mol% or less.

【0017】本発明の無鉛ガラス組成物の軟化点は46
0〜590℃である。590℃を超えると、PDP隔壁
形成工程においてガラス基板上に、本発明の無鉛ガラス
組成物を含有するPDP隔壁形成用組成物を600℃以
下で焼成する場合、前記PDP隔壁形成用組成物の流動
性が低下し高精細パターンの隔壁形成が困難となり、ま
たガラス基板との接着性も低下する。
The softening point of the lead-free glass composition of the present invention is 46
0-590 ° C. When the temperature exceeds 590 ° C., the flow of the PDP partition wall forming composition is reduced when the PDP partition wall forming composition containing the lead-free glass composition of the present invention is fired at 600 ° C. or lower on a glass substrate in the PDP partition wall forming step. This makes it difficult to form a partition having a high-definition pattern, and also reduces the adhesion to a glass substrate.

【0018】軟化点が460℃未満では、PDP製造工
程の最後に行われる前面ガラス基板と背面ガラス基板の
周辺の気密封止に際して問題が発生する。すなわち、前
記気密封止においては450℃程度の熱処理が行われる
が、軟化点が460℃未満では隔壁形状が変形して、隔
壁下部が広がり隔壁間の幅が狭くなる、隔壁の高さも低
くなり所定の幅・高さ比が得られなくなる、等の問題が
発生する。
If the softening point is lower than 460 ° C., a problem occurs in the hermetic sealing around the front glass substrate and the rear glass substrate performed at the end of the PDP manufacturing process. That is, in the hermetic sealing, heat treatment at about 450 ° C. is performed. However, when the softening point is lower than 460 ° C., the partition shape is deformed, the lower portion of the partition expands, the width between the partitions becomes narrower, and the height of the partition becomes lower. Problems such as the inability to obtain a predetermined width / height ratio occur.

【0019】本発明の無鉛ガラス組成物の「30〜30
0℃における平均線膨張係数」(以下、熱膨張係数とい
う。)は50×10-7〜95×10-7/℃であることが
好ましい。理由を以下に述べる。
In the lead-free glass composition of the present invention, "30 to 30"
The “average coefficient of linear expansion at 0 ° C.” (hereinafter referred to as the coefficient of thermal expansion) is preferably from 50 × 10 −7 to 95 × 10 −7 / ° C. The reason is described below.

【0020】背面ガラス基板としては熱膨張係数が70
×10-7〜85×10-7/℃であるソーダライムシリカ
系ガラス等が一般的に用いられるが、背面ガラス基板上
に形成される隔壁はPDP製造工程において熱処理を数
回受けるためその熱膨張係数と背面ガラス基板の熱膨張
係数との差は小さいことが望ましい。その差は好ましく
は10×10-7/℃以下であり、隔壁の熱膨張係数は6
0×10-7〜85×10-7/℃であることが好ましい。
The rear glass substrate has a coefficient of thermal expansion of 70
Soda-lime silica-based glass having a temperature of 10-7 to 85 10-7 / ° C is generally used. However, since the partition walls formed on the rear glass substrate are subjected to heat treatment several times in the PDP manufacturing process, the heat is It is desirable that the difference between the expansion coefficient and the thermal expansion coefficient of the rear glass substrate is small. The difference is preferably 10 × 10 −7 / ° C. or less, and the coefficient of thermal expansion of
It is preferably from 0 × 10 −7 to 85 × 10 −7 / ° C.

【0021】本発明のPDP隔壁形成用組成物は本発明
の無鉛ガラス組成物の他に、隔壁の熱膨張係数調整のた
めに無機充填材または無機顔料を含有することが好まし
い。本発明の無鉛ガラス組成物の熱膨張係数が50×1
-7〜95×10-7/℃であれば、前記熱膨張係数調整
により隔壁の熱膨張係数を前記好ましい範囲である60
×10-7〜85×10-7/℃とすることができる。
The composition for forming a PDP partition wall of the present invention preferably contains an inorganic filler or an inorganic pigment for adjusting the thermal expansion coefficient of the partition wall in addition to the lead-free glass composition of the present invention. The lead-free glass composition of the present invention has a coefficient of thermal expansion of 50 × 1
If it is 0 -7 to 95 × 10 -7 / ° C., the coefficient of thermal expansion of the partition wall is within the above-mentioned preferable range by adjusting the coefficient of thermal expansion.
X 10 -7 to 85 x 10 -7 / ° C.

【0022】本発明の無鉛ガラス組成物の熱膨張係数が
95×10-7/℃を超えると隔壁の膨張係数が85×1
-7/℃を超え、隔壁にクラックが入ったり、はがれた
りするおそれがある。50×10-7/℃未満では隔壁の
膨張係数が60×10-7/℃未満となり、背面ガラス基
板にクラックが入ったり、背面ガラス基板が変形したり
するおそれがある。
When the coefficient of thermal expansion of the lead-free glass composition of the present invention exceeds 95 × 10 −7 / ° C., the expansion coefficient of the partition walls becomes 85 × 1.
If the temperature exceeds 0 -7 / ° C, the partition walls may be cracked or peeled off. If it is less than 50 × 10 −7 / ° C., the expansion coefficient of the partition wall becomes less than 60 × 10 −7 / ° C., and there is a possibility that the rear glass substrate may be cracked or the rear glass substrate may be deformed.

【0023】本発明のPDP隔壁形成用組成物は、本発
明の無鉛ガラス組成物を含有する。本発明のPDP隔壁
形成用組成物は、上記無鉛ガラス組成物に加え、無機充
填剤および/または無機顔料を含有することが好まし
い。
The composition for forming a PDP partition wall of the present invention contains the lead-free glass composition of the present invention. The composition for forming a PDP partition wall of the present invention preferably contains an inorganic filler and / or an inorganic pigment in addition to the lead-free glass composition.

【0024】無機充填材は隔壁の熱膨張係数調整の他
に、隔壁の強度向上、焼成時の収縮率調整または隔壁の
緻密性調整のために使用される。隔壁の強度向上のため
には、アルミナ、ジルコニア、等が使用される。隔壁の
熱膨張係数調整のためには、ジルコン、コージエライ
ト、ムライト、非晶質シリカ、アルミナ、フォルステラ
イト、α−石英、蛍石、等が使用される。
The inorganic filler is used not only for adjusting the coefficient of thermal expansion of the partition, but also for improving the strength of the partition, adjusting the shrinkage during firing, or adjusting the denseness of the partition. Alumina, zirconia, or the like is used to improve the strength of the partition. For adjusting the thermal expansion coefficient of the partition, zircon, cordierite, mullite, amorphous silica, alumina, forsterite, α-quartz, fluorite, or the like is used.

【0025】無機顔料は隔壁の熱膨張係数調整の他に、
隔壁の着色、焼成時の収縮率調整または隔壁の緻密性調
整のために使用される。隔壁の色調を白色にするために
は、酸化チタン、アルミナ、等が使用される。隔壁の色
調を黒色にするためには、Cu−Cr系、Cu−Cr−
Mn系、等が使用される。
The inorganic pigment is used for adjusting the thermal expansion coefficient of the partition walls.
It is used for coloring the partition walls, adjusting the shrinkage during firing, or adjusting the denseness of the partition walls. In order to make the color tone of the partition walls white, titanium oxide, alumina, or the like is used. Cu-Cr, Cu-Cr-
Mn-based or the like is used.

【0026】熱膨張係数調整、等のために無機充填材ま
たは無機顔料を過剰に添加すると、所定温度での焼成に
際し、PDP隔壁形成用組成物の流動性が低下して高精
細パターンの隔壁形成が困難となり、またガラス基板と
の接着性も低下するおそれがある。
When an inorganic filler or an inorganic pigment is excessively added for the purpose of adjusting the thermal expansion coefficient or the like, the flowability of the composition for forming a PDP partition wall is reduced upon firing at a predetermined temperature, so that a partition wall having a high definition pattern is formed. And the adhesion to the glass substrate may be reduced.

【0027】無機充填材および無機顔料の合量は無鉛ガ
ラス組成物100重量部に対して5〜200重量部が好
ましい。5重量部未満の場合、焼成時の収縮率は大きく
なりすぎるおそれがある。より好ましくは10重量部以
上、特に好ましくは15重量部以上である。200重量
部超の場合、隔壁の緻密性が低下するおそれがある。よ
り好ましくは100重量部以下、特に好ましくは45重
量部以下である。
The total amount of the inorganic filler and the inorganic pigment is preferably 5 to 200 parts by weight based on 100 parts by weight of the lead-free glass composition. If the amount is less than 5 parts by weight, the shrinkage during firing may be too large. It is more preferably at least 10 parts by weight, particularly preferably at least 15 parts by weight. If the amount is more than 200 parts by weight, the denseness of the partition may be reduced. It is more preferably at most 100 parts by weight, particularly preferably at most 45 parts by weight.

【0028】本発明のPDP隔壁形成用組成物は、バイ
ンダおよび有機溶媒を含有することが好ましい。無鉛ガ
ラス、無機充填材、無機顔料、等の粉末はバインダおよ
び有機溶媒と混合してガラスペーストとされ、印刷等に
より背面ガラス基板に塗布後、焼成、パターニングされ
PDPの隔壁となる。
The composition for forming a PDP partition wall of the present invention preferably contains a binder and an organic solvent. Powders such as lead-free glass, inorganic fillers, inorganic pigments, and the like are mixed with a binder and an organic solvent to form a glass paste, applied to a rear glass substrate by printing or the like, and then fired and patterned to form PDP partition walls.

【0029】バインダおよび有機溶媒は、特に限定され
ることなく、従来使用されているものを使用できる。バ
インダとしては、たとえば、メチルセルロース、エチル
セルロース、ヒドロキシエチルセルロース、ヒドロキシ
エチル・エチルセルロースのようなセルロース系材料、
ポリビニルブチラール、ポリビニルアセテート、ポリビ
ニルアルコール、等が用いられる。有機溶媒としては、
たとえば、α−テルピネオール、ブチルカルビトールア
セテート、2,2,4−トリメチル−1,3−ペンタン
ジオールモノイソブチレート、等が用いられる。
The binder and the organic solvent are not particularly limited, and those conventionally used can be used. As the binder, for example, cellulosic materials such as methyl cellulose, ethyl cellulose, hydroxyethyl cellulose, hydroxyethyl ethyl cellulose,
Polyvinyl butyral, polyvinyl acetate, polyvinyl alcohol, and the like are used. As an organic solvent,
For example, α-terpineol, butyl carbitol acetate, 2,2,4-trimethyl-1,3-pentanediol monoisobutyrate, and the like are used.

【0030】無鉛ガラス、無機充填材、無機顔料、等の
粉末の最大粒子径は2〜20μmであることが好まし
い。20μm超では、焼成後の隔壁を緻密化し、高精細
パターンの隔壁を得ることが困難になるおそれがある。
好ましくは15μm以下である。2μm未満ではガラス
ペーストの粘度が高くなりすぎ作業性が損なわれるおそ
れがある。
The maximum particle diameter of the powder of lead-free glass, inorganic filler, inorganic pigment, etc. is preferably 2 to 20 μm. If it exceeds 20 μm, it may be difficult to densify the partition after firing and obtain a partition with a high definition pattern.
Preferably it is 15 μm or less. If it is less than 2 μm, the viscosity of the glass paste becomes too high and the workability may be impaired.

【0031】本発明のPDP隔壁形成用組成物は、従来
のガラスペーストと同様な方法で製造される。すなわ
ち、所定の組成となるように原料を調合、混合し、加熱
溶融した後、金型に流し込み無鉛ガラスのブロックを得
る。次いでボールミル等の粉砕機で粉砕し、無鉛ガラス
粉末を作製する。所望する特性が得られるように無鉛ガ
ラス粉末に無機充填材、無機顔料を配合・混合後、バイ
ンダおよび有機溶媒を加え3本ロールミル等で混練しガ
ラスペーストとする。
The composition for forming a PDP partition wall of the present invention is produced by a method similar to that of a conventional glass paste. That is, the raw materials are prepared, mixed and heated and melted so as to have a predetermined composition, and then poured into a mold to obtain a lead-free glass block. Next, it is pulverized by a pulverizer such as a ball mill to produce a lead-free glass powder. After blending and mixing an inorganic filler and an inorganic pigment with the lead-free glass powder so as to obtain desired properties, a binder and an organic solvent are added, and the mixture is kneaded with a three-roll mill or the like to obtain a glass paste.

【0032】[0032]

【実施例】次に実施例を示して本発明を具体的に説明す
るが、本発明は下記実施例に限定されない。表1に示す
組成(単位:モル%)となるように、各原料を調合し、
白金ルツボに入れ、1200〜1400℃の電気炉中
で、2時間加熱して溶融させた後、急冷して板状に成形
し、板状のガラスブロックを得た。次いで、このガラス
ブロックをボールミルを用いて粉砕して最大粒子径2〜
20μmのガラス粉末を得た。これらのガラスについて
ガラス転移点、軟化点および熱膨張係数を測定し、また
得られたガラス粉末の最大粒子径を測定した。測定法を
以下に記すとともに、測定結果を表1に示す。
EXAMPLES Next, the present invention will be described specifically with reference to examples, but the present invention is not limited to the following examples. Each raw material is prepared so as to have a composition (unit: mol%) shown in Table 1,
It was put in a platinum crucible, heated and melted in an electric furnace at 1200 to 1400 ° C. for 2 hours, then rapidly cooled and formed into a plate to obtain a plate-shaped glass block. Next, the glass block is pulverized using a ball mill to have a maximum particle size of 2 to 2.
A glass powder of 20 μm was obtained. The glass transition point, softening point and thermal expansion coefficient of these glasses were measured, and the maximum particle size of the obtained glass powder was measured. The measurement method is described below, and the measurement results are shown in Table 1.

【0033】ガラス転移点(℃)および軟化点(℃):
ガラスを粉末とし、示差熱分析装置を用いて測定した。
昇温速度は10℃/minとした。 熱膨張係数(×10-7/℃):示差膨張計により30〜
300℃における平均線膨張係数を測定した。昇温速度
は10℃/minとした。 最大粒子径(μm):レーザ回折式粒度分布測定機によ
り測定した。
Glass transition point (° C.) and softening point (° C.):
Glass was used as a powder and measured using a differential thermal analyzer.
The heating rate was 10 ° C./min. Thermal expansion coefficient (× 10 -7 / ° C): 30 to
The average linear expansion coefficient at 300 ° C. was measured. The heating rate was 10 ° C./min. Maximum particle size (μm): Measured with a laser diffraction type particle size distribution analyzer.

【0034】表1において、例1〜7は実施例、例8〜
9は比較例である。例1〜7は安定したガラスが得られ
た。これに対して例8はガラスとならず、また例9はガ
ラス化したが軟化点が高く、熱膨張係数も大きいものと
なった。
In Table 1, Examples 1 to 7 are Examples and Examples 8 to
9 is a comparative example. In Examples 1 to 7, stable glasses were obtained. In contrast, Example 8 did not become glass, and Example 9 was vitrified, but had a high softening point and a large thermal expansion coefficient.

【0035】例1〜7および例9のガラス粉末に、表2
に示す無機充填材および無機顔料を、表2の含有量(単
位:重量%)の欄に示す割合で混合した。さらにバイン
ダとしてエチルセルロース、溶剤としてα−テルピネオ
ールを添加し、よく撹拌した後、セラミック製3本ロー
ルミルを用いて混練し、粘度が15×104 センチポア
ズのガラスペーストを作製した。
The glass powders of Examples 1 to 7 and Example 9 were added to Table 2
The inorganic filler and the inorganic pigment shown in Table 2 were mixed at the ratio shown in the column of content (unit:% by weight) in Table 2. Further, ethyl cellulose was added as a binder, and α-terpineol was added as a solvent. After stirring well, the mixture was kneaded using a ceramic three-roll mill to produce a glass paste having a viscosity of 15 × 10 4 centipoise.

【0036】次いで、熱膨張係数が83×10-7/℃で
あるソーダライムシリカガラスの基板にスクリーン印刷
でガラスペーストを印刷し、125℃で10分間乾燥し
た後、560℃で30分間焼成し、高さ100μmの焼
成体を形成した。このガラス基板上に形成された焼成体
を光学顕微鏡で観察し、クラック、はがれの有無を調べ
た。結果を表2の評価の欄に示した。
Next, a glass paste is printed by screen printing on a soda lime silica glass substrate having a coefficient of thermal expansion of 83 × 10 −7 / ° C., dried at 125 ° C. for 10 minutes, and baked at 560 ° C. for 30 minutes. A fired body having a height of 100 μm was formed. The fired body formed on the glass substrate was observed with an optical microscope to check for cracks and peelings. The results are shown in the column of evaluation in Table 2.

【0037】例1〜7のガラス、各種無機充填材および
各種無機顔料とを組み合わせて得られた焼成体にはクラ
ック、はがれが認められず、PDP隔壁として適したも
のである。これに対して、例9のガラスを使用した焼成
体にはクラック、はがれが認められ、PDP隔壁として
は適さないものであった。
The fired bodies obtained by combining the glasses of Examples 1 to 7, various inorganic fillers and various inorganic pigments have no cracks or peeling off, and are suitable as PDP partition walls. On the other hand, cracks and peeling were observed in the fired body using the glass of Example 9, which was not suitable as a PDP partition wall.

【0038】[0038]

【表1】 [Table 1]

【0039】[0039]

【表2】 [Table 2]

【0040】[0040]

【発明の効果】本発明の無鉛ガラス組成物およびPDP
隔壁形成用組成物は鉛成分を含有せず、環境面での問題
を発生させるおそれがない。また、背面ガラス基板また
は隔壁におけるクラック、背面ガラス基板からの隔壁の
はがれ、が起りにくいPDP隔壁を形成できる。
The lead-free glass composition and PDP of the present invention
The partition wall forming composition does not contain a lead component, and there is no possibility of causing environmental problems. Moreover, cracks in the rear glass substrate or the partition walls, separation of the partition walls from the rear glass substrate, and PDP partition walls that are less likely to occur can be formed.

【図面の簡単な説明】[Brief description of the drawings]

【図1】PDPの概略構成図。FIG. 1 is a schematic configuration diagram of a PDP.

【符号の説明】 1:前面ガラス基板 2:背面ガラス基板 3:表示電極 4:パス電極 5:誘電体膜 6:保護膜 7:隔壁 8:アドレス電極 9:蛍光体[Description of Signs] 1: Front glass substrate 2: Rear glass substrate 3: Display electrode 4: Pass electrode 5: Dielectric film 6: Protective film 7: Partition wall 8: Address electrode 9: Phosphor

───────────────────────────────────────────────────── フロントページの続き Fターム(参考) 4G062 AA08 AA09 AA15 BB09 CC10 DA01 DA02 DA03 DA04 DB03 DB04 DC01 DD05 DD06 DE04 DE05 DE06 DF01 EA01 EA10 EB01 EC01 ED01 ED02 ED03 ED04 EE01 EE02 EE03 EE04 EF01 EF02 EF03 EF04 EG01 EG02 EG03 EG04 FA01 FA10 FB01 FC01 FD01 FE01 FF01 FG01 FH01 FJ01 FK01 FL01 GA01 GA10 GB01 GC01 GD01 GE01 HH01 HH03 HH05 HH07 HH09 HH11 HH13 HH15 HH17 HH20 JJ01 JJ03 JJ05 JJ07 JJ10 KK01 KK03 KK05 KK07 KK10 MM05 MM12 PP01 PP02 PP03 PP04 PP05 PP06 PP11 PP12 PP13 PP14 PP16 5C027 AA09 5C040 GF18 KA09 KA10 KA17 KB03 KB19 KB28 KB29 MA23 5C094 AA33 AA36 AA60 BA31 BA32 CA19 EB02 EC04 FA01 FA02 FB02 GB10 JA01 JA20  ──────────────────────────────────────────────────続 き Continued on the front page F term (reference) 4G062 AA08 AA09 AA15 BB09 CC10 DA01 DA02 DA03 DA04 DB03 DB04 DC01 DD05 DD06 DE04 DE05 DE06 DF01 EA01 EA10 EB01 EC01 ED01 ED02 ED03 ED04 EE01 EE02 EE03 EE04 EF03 EF04 EF03 EG04 FA01 FA10 FB01 FC01 FD01 FE01 FF01 FG01 FH01 FJ01 FK01 FL01 GA01 GA10 GB01 GC01 GD01 GE01 HH01 HH03 HH05 HH07 HH09 HH11 HH13 HH15 HH17 HH20 JJ01 JJ03 JJ05 JJ07 PP03 KK10 KK03 KK10 KK10 KK10 KK PP14 PP16 5C027 AA09 5C040 GF18 KA09 KA10 KA17 KB03 KB19 KB28 KB29 MA23 5C094 AA33 AA36 AA60 BA31 BA32 CA19 EB02 EC04 FA01 FA02 FB02 GB10 JA01 JA20

Claims (6)

【特許請求の範囲】[Claims] 【請求項1】酸化物基準のモル%表示で実質的に、 ZnO 25〜55%、 Al23 1〜15%、 P25 30〜55%、 SiO2 0〜15%、 BaO+CaO+MgO+SrO 0〜20%、 からなり、軟化点が460〜590℃である無鉛ガラス
組成物。
1. A substantially represented by mol% based on oxides, ZnO 25~55%, Al 2 O 3 1~15%, P 2 O 5 30~55%, SiO 2 0~15%, BaO + CaO + MgO + SrO 0 A lead-free glass composition having a softening point of 460 to 590 ° C.
【請求項2】酸化物基準のモル%表示で実質的に、 ZnO 30〜48%、 Al23 2〜 9%、 P25 38〜50%、 SiO2 0〜10%、 BaO+CaO+MgO+SrO 0〜12%、 からなる請求項1記載の無鉛ガラス組成物。2. In terms of mol% on an oxide basis, ZnO 30 to 48%, Al 2 O 3 2 to 9%, P 2 O 5 38 to 50%, SiO 2 0 to 10%, BaO + CaO + MgO + SrO 0 The lead-free glass composition according to claim 1, comprising: 【請求項3】30〜300℃における平均線膨張係数が
50×10-7〜95×10-7/℃である請求項1または
2記載の無鉛ガラス組成物。
3. The lead-free glass composition according to claim 1, wherein the average linear expansion coefficient at 30 to 300 ° C. is 50 × 10 −7 to 95 × 10 −7 / ° C.
【請求項4】請求項1、2または3記載の無鉛ガラス組
成物を含有するプラズマディスプレイパネル隔壁形成用
組成物。
4. A composition for forming a partition wall of a plasma display panel, comprising the lead-free glass composition according to claim 1, 2 or 3.
【請求項5】無機充填剤および/または無機顔料を含有
する請求項4記載のプラズマディスプレイパネル隔壁形
成用組成物。
5. The composition for forming a partition wall of a plasma display panel according to claim 4, comprising an inorganic filler and / or an inorganic pigment.
【請求項6】バインダおよび有機溶媒を含有する請求項
4または5記載のプラズマディスプレイパネル隔壁形成
用組成物。
6. The composition for forming a partition wall of a plasma display panel according to claim 4, which comprises a binder and an organic solvent.
JP22321098A 1998-08-06 1998-08-06 Lead-free glass powder and plasma display panel barrier rib composition Expired - Fee Related JP4100591B2 (en)

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Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001158640A (en) * 1999-09-22 2001-06-12 Nihon Yamamura Glass Co Ltd Magnesium phosphate-based glass composition
WO2004110956A1 (en) * 2003-06-11 2004-12-23 Mitsubishi Materials Corporation Lead-free glass composition and pdp barrier rib using the same
JP2005022961A (en) * 2003-06-11 2005-01-27 Mitsubishi Materials Corp Glass composition, mixture, paste, green sheet and plasma display panel
JP2005022962A (en) * 2003-06-11 2005-01-27 Mitsubishi Materials Corp Glass composition, mixture, paste, green sheet and plasma display panel
JP2005063835A (en) * 2003-08-13 2005-03-10 Fujitsu Hitachi Plasma Display Ltd Glass composition for plasma display panel formation and plasma display panel using it
JP2006108621A (en) * 2004-09-09 2006-04-20 Toyoda Gosei Co Ltd Solid-state element device
JP2006137665A (en) * 2004-10-14 2006-06-01 Mitsubishi Materials Corp Coating composition, mixture, paste and electronic component
JP2006137666A (en) * 2004-10-14 2006-06-01 Mitsubishi Materials Corp Glass composition, mixture, paste and electronic component
JP2010067611A (en) * 2008-09-11 2010-03-25 Samsung Sdi Co Ltd Barrier rib material, barrier rib formed using this, and pdp comprising the barrier rib
US7817110B2 (en) 2006-06-13 2010-10-19 Lg Electronics Inc. Plasma display apparatus having enhanced discharge stability and driving thereof

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001158640A (en) * 1999-09-22 2001-06-12 Nihon Yamamura Glass Co Ltd Magnesium phosphate-based glass composition
JP4597336B2 (en) * 1999-09-22 2010-12-15 日本山村硝子株式会社 Magnesium phosphate glass composition
WO2004110956A1 (en) * 2003-06-11 2004-12-23 Mitsubishi Materials Corporation Lead-free glass composition and pdp barrier rib using the same
JP2005022961A (en) * 2003-06-11 2005-01-27 Mitsubishi Materials Corp Glass composition, mixture, paste, green sheet and plasma display panel
JP2005022962A (en) * 2003-06-11 2005-01-27 Mitsubishi Materials Corp Glass composition, mixture, paste, green sheet and plasma display panel
JP2005063835A (en) * 2003-08-13 2005-03-10 Fujitsu Hitachi Plasma Display Ltd Glass composition for plasma display panel formation and plasma display panel using it
JP2006108621A (en) * 2004-09-09 2006-04-20 Toyoda Gosei Co Ltd Solid-state element device
JP2006137665A (en) * 2004-10-14 2006-06-01 Mitsubishi Materials Corp Coating composition, mixture, paste and electronic component
JP2006137666A (en) * 2004-10-14 2006-06-01 Mitsubishi Materials Corp Glass composition, mixture, paste and electronic component
US7817110B2 (en) 2006-06-13 2010-10-19 Lg Electronics Inc. Plasma display apparatus having enhanced discharge stability and driving thereof
JP2010067611A (en) * 2008-09-11 2010-03-25 Samsung Sdi Co Ltd Barrier rib material, barrier rib formed using this, and pdp comprising the barrier rib

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