KR20080084755A - 적층체, 및 이를 사용한 그래프트 막형성 방법 및 그래프트패턴 형성 방법 - Google Patents

적층체, 및 이를 사용한 그래프트 막형성 방법 및 그래프트패턴 형성 방법 Download PDF

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Publication number
KR20080084755A
KR20080084755A KR1020080024096A KR20080024096A KR20080084755A KR 20080084755 A KR20080084755 A KR 20080084755A KR 1020080024096 A KR1020080024096 A KR 1020080024096A KR 20080024096 A KR20080024096 A KR 20080024096A KR 20080084755 A KR20080084755 A KR 20080084755A
Authority
KR
South Korea
Prior art keywords
group
metal
compound
graft polymer
graft
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
KR1020080024096A
Other languages
English (en)
Korean (ko)
Inventor
야스아키 마츠시타
Original Assignee
후지필름 가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 후지필름 가부시키가이샤 filed Critical 후지필름 가부시키가이샤
Publication of KR20080084755A publication Critical patent/KR20080084755A/ko
Withdrawn legal-status Critical Current

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Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B17/00Layered products essentially comprising sheet glass, or glass, slag, or like fibres
    • B32B17/06Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material
    • B32B17/10Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material of synthetic resin
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2255/00Coating on the layer surface
    • B32B2255/26Polymeric coating

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Laminated Bodies (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
KR1020080024096A 2007-03-16 2008-03-14 적층체, 및 이를 사용한 그래프트 막형성 방법 및 그래프트패턴 형성 방법 Withdrawn KR20080084755A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007068417 2007-03-16
JPJP-P-2007-00068417 2007-03-16

Publications (1)

Publication Number Publication Date
KR20080084755A true KR20080084755A (ko) 2008-09-19

Family

ID=39983120

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020080024096A Withdrawn KR20080084755A (ko) 2007-03-16 2008-03-14 적층체, 및 이를 사용한 그래프트 막형성 방법 및 그래프트패턴 형성 방법

Country Status (3)

Country Link
JP (1) JP2008260272A (https=)
KR (1) KR20080084755A (https=)
CN (1) CN101266408A (https=)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6652758B2 (ja) * 2015-09-30 2020-02-26 国立大学法人東北大学 複合材料、複合材料の製造方法
CN107371338B (zh) * 2016-05-13 2019-08-20 苏州卫鹏机电科技有限公司 一种超薄金属层的印刷线路板的制备方法
CN109326730B (zh) * 2017-08-01 2024-02-13 拓旷(上海)光电科技有限公司 用于有机发光二极管显示器的制造设备
CN110277529B (zh) * 2019-06-28 2021-11-05 新乡市中科科技有限公司 一种高倍率锂离子电池用功能复合膜及其制备方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4348253B2 (ja) * 2003-08-20 2009-10-21 富士フイルム株式会社 導電性パターン材料及び導電性パターンの形成方法
JP4708859B2 (ja) * 2004-09-07 2011-06-22 富士フイルム株式会社 薄層トランジスタ、それを用いたアクティブマトリックス型表示装置、及び、液晶表示装置
JP2006350307A (ja) * 2005-05-20 2006-12-28 Fujifilm Holdings Corp グラフトパターン形成方法及び導電性パターン形成方法

Also Published As

Publication number Publication date
JP2008260272A (ja) 2008-10-30
CN101266408A (zh) 2008-09-17

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Patent event code: PA01091R01D

Comment text: Patent Application

Patent event date: 20080314

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PC1203 Withdrawal of no request for examination
WITN Application deemed withdrawn, e.g. because no request for examination was filed or no examination fee was paid