KR20080033123A - Ion implanter - Google Patents

Abstract

An ion implanter is provided to decrease a protrusion distance of a coupling portion of a coil from a yoke to reception and emission directions of a beam by increasing a Y directional length of the coupling portion of the coil according to a Y directional length of a main body. An ion implanter includes an ion source(100), an analysis electromagnet(200), and a substrate driver(500). The ion source generates a ribbon-type ion beam. The analysis electromagnet bends the ion beam from the ion source to an X direction and analyzes a momentum of the ion beam. The analysis electromagnet forms a focal point of the ion beam at a downstream of the ion beam. The substrate driver moves a substrate(600) in a direction crossing a main direction of the ion beam, at an implantation position of the substrate. The ion beam is incident on the implantation position.

Description

Ion implanter {ION IMPLANTER}

BACKGROUND OF THE INVENTION 1. Field of the Invention [0001] The present invention relates to an ion implanter that performs ion implantation into a substrate by passing the ribbon ion beam through an analytical electromagnet to perform momentum analysis (e.g., mass spectrometry) of the ion beam and then entering the substrate.

For example, in order to perform ion implantation on a large substrate, an ion beam having a ribbon shape (also referred to as a sheet shape or a band shape and equally applicable to the following description) is mainly used.

An ion implanter that conducts ion implantation into a substrate by passing the ribbon-shaped ion beam through an analytical electromagnet to perform momentum analysis of the ion beam (e.g., mass spectrometry; the same applies to the description below) and then entering the substrate. An example of such is disclosed in Patent Document 1, for example.

Examples of analytical electromagnets related to the momentum analysis of the ribbon ion beam are disclosed, for example, in Patent Document 2.

With reference to FIG. 56, the conventional analytical electromagnet disclosed by patent document 2 is demonstrated. In the figure, the yoke 36 is indicated by a dashed line so that the shapes of the coils 12 and 18 can be easily understood. The advancing direction of the ion beam 2 is set as the Z direction, and two directions substantially orthogonal to each other in a plane substantially orthogonal to the Z direction are set as the X and Y directions, respectively. In the analysis electromagnet 40, the ribbon ion beam 2 extending in the Y direction is vertically long incident at the inlet 24 and radiates from the outlet.

The analysis electromagnet 40 is composed of two coils 12 and 18 as shown in FIG. 1 of Patent Document 2, or a yoke 36 whose upper and lower coils correspond to the yoke shown in FIG. 21 of the document. It has a structure.

The coil 12 is a saddle-shaped coil (referred to as a banana-shaped coil in Patent Document 2), and is a set of main body portions 14 (patent document) facing each other across the path (beam path) of the ion beam 2. 2, referred to as the coil main portion, and a set of connecting portions 16 (patent document 2, in the patent document 2, as an end rising portion) which are inclined to avoid the beam path and connect the ends of the body portion 14 to each other in the Z direction. Referred to). The connecting portion 16 rises obliquely at the inlet 24 and the outlet 26, preventing the ion beam 2 from colliding with the portion and securing a beam passing area.

The coil 18 is also a saddle-shaped coil having a structure similar to the coil 12 (but having a surface symmetrical shape with respect to the coil 12), and includes a set of main body portion 20 and a set of connecting portions ( 22).

Each of the coils 12 and 18 is wound around a plurality of conductors (coated conductors) covered by an insulator, and bends a coil having a fan shape in a plan view near both ends to connect the connecting portions 16 and 22. It is a multiple winding coil manufactured by the forming method. As the conductor, generally, a hollow conductor through which a cooling medium (for example, cooling water) can flow is used. In the specification, "insulation" means electrical insulation.

The yoke 36 collectively surrounds the outside of the body portions 14, 20 of the coils 12, 18.

[Patent Document 1] JP-A-2005-327713 (paragraph 0010, Figs. 1 to 4)

[Patent Document 2] JP-A-2004-152557 (paragraphs 0006 and 0022, FIGS. 1 and 21)

The analysis electromagnet 40 has the following problem.

(1) At the inlet 24 and the outlet 26, the protruding distance L ₁ of the connecting portions 16, 22 projecting from the yoke 36 in the direction of incidence and radiation of the beam is large. This is mainly caused by the following reasons.

(a) In order to be able to deflect the ribbon-shaped ion beam 2 elongated in the Y direction as uniformly as possible, the main body portions 14 and 20 of the coils 12 and 18 are vertical by increasing the dimension a in the Y direction. To be longer (vertically longer than the example shown in FIG. 56). As described above, in the coils 12 and 18, a bending process is applied to the fan coils to form the connecting portions 16 and 22. The dimension a is thus reflected substantially directly in the projection distance L ₁ . Therefore, as dimension a further increases, the protrusion distance L ₁ also increases.

(b) In the coils 12 and 18, the connecting portions 16 and 22 are formed by applying a bending process to the fan coil as described above. Due to limitations on the bending process, relatively large bending portions 30, 32 are inevitably formed near the boundary between the main body portions 14, 20 and the connecting portions 16, 22. Due to the presence of the bending portions 30, 32, the distance L ₂ between the end of the yoke 36 and the ends of the connecting portions 16, 22 is increased. Since the distance L ₂ are included in the projecting distance (L _1), and increasing the projecting distance (L _1). Because of the limitation on the bending process, as dimension a further increases, the radius of curvature of the bends 30, 32 must increase further, and the length L ₂ and the protruding distance L ₁ become longer.

The protruding distance L ₁ can be expressed by the following equation.

[Equation 1]

L ₁ = a + L ₂

(c) The connecting portions 16 and 22 rise inclined. As a result, the protruding distance L ₁ increases.

As described above, when the protruding distance L ₁ of the connecting portions 16 and 22 from the yoke 36 is large, the analysis electromagnet 40 becomes correspondingly large, and the area required for installing the analysis electromagnet 40 is increased. Increases. Thus, the ion implanter is also large, and the area required for installing the ion implanter is also increased. In addition, the weight of the analysis electromagnet 40 also increases. In addition, the magnetic field (also referred to as the fringe field) generated by the connections 16, 22 on the outside of the yoke 36 shakes the shape of the ion beam 2 (shape and posture, the same applies also below). It is more likely to make it.

(2) The power consumption of the coils 12 and 18 becomes large. This is mainly caused by the following reason.

(a) The connecting portions 16 and 22 do not generate a magnetic field which deflects the ion beam 2. As described above, the protruding distance L ₁ of the connecting portions 16 and 22 is large. Thus, the lengths of the connections 16, 22 are correspondingly long, and the power consumption at the connections 16, 22 is unnecessarily large. This increases the power consumption of the coils 12, 18.

(b) As described above, the coils 12 and 18 are multi-turn coils of the sheath conductor. Therefore, it is difficult to increase the ratio of the conductor region (ie, the space factor of the conductor) in the cross sections of the coils 12, 18. Accordingly, power loss is correspondingly large, and power consumption is increased. In the case where the sheathed conductor is a hollow conductor, the drop rate of the conductor is further decelerated, so that the power loss is further increased. Therefore, power consumption is further increased.

As described above, when the power consumption of the coils 12 and 18 is large, the power consumption of the analysis electromagnet 40 is increased, thereby increasing the power consumption of the ion implanter.

An exemplary embodiment of the present invention can reduce the protrusion distance of the connection portion of the coil, thereby reducing the size and power consumption of the analysis electromagnet, thereby reducing the size and power consumption of the ion implanter.

One ion implanter according to one aspect of the invention

(a) The traveling direction of the ion beam is set as the Z direction, and two directions substantially perpendicular to each other in the plane substantially orthogonal to the Z direction are set as the X and Y directions, respectively, and the dimension in the Y direction is the dimension in the X direction. As an ion implanter in which a larger ribbon ion beam is delivered to irradiate a substrate to perform ion implantation,

An ion source for generating a ribbon ion beam having a dimension in a Y direction greater than a dimension in a Y direction of the substrate;

An analysis electromagnet which analyzes the momentum by bending the ion beam from the ion source in the X direction, and forms a focal point of the ion beam of a predetermined momentum downstream;

An analysis slit disposed near the focal point of the ion beam from the analysis electromagnet and analyzing the momentum of the ion beam in cooperation with the analysis electromagnet;

An acceleration / deceleration device for bending the ion beam passing through the analysis slit in the X direction by an electrostatic field and accelerating or decelerating the ion beam by the electrostatic field;

A substrate driving device for moving the substrate in a direction intersecting with a main surface of the ion beam at an injection position where the ion beam passing through the acceleration / deceleration device is incident on the substrate,

(b) the analysis electromagnet,

A set of body parts opposed to each other in the X direction across the beam path through which the ion beam passes, and at least one set of connecting portions connecting the ends of the body parts to each other in the Z direction while avoiding the beam path, the ion A coil that generates a magnetic field that bends the beam in the X direction,

A yoke collectively surrounding the outside of the body portion of the coil,

(c) The coil of the analysis electromagnet has a structure in which a notch portion is arranged in a fan-shaped stacked coil while leaving the main body portion and the connecting portion, and the stack coil is formed of a laminated insulator. Winding the lamination with a plurality of turns while stacking the lamination of the conductor sheet and the insulating sheet whose main surface extends along the Y direction on the outer circumferential surface; It is comprised by forming the insulator laminated | stacked on the outer peripheral surface of a stack.

In the analytical electromagnet constituting the ion implanter, the coil is configured such that the notch portion is arranged in the fan-shaped cylindrical stack coil as described above with the main body portion and the connecting portion left, so that the connecting portion is substantially from the end of the main body portion. It exists in the state extended in the Y direction in parallel. Therefore, the case where the dimension of the main body part increases in the Y direction is dealt with by correspondingly increasing the dimension of the Y direction of a connection part. As a result, the protruding distance of the connection portion in the incident and radial directions of the beam does not increase. According to this structure, the length of the connecting portion of the coil protrudes from the yoke in the incident and radial directions of the beam can be reduced.

Accordingly, the protruding distance of the connecting portion of the coil can be reduced, and the length of the connecting portion can be shortened, thereby reducing unnecessary power consumption at the connecting portion. In addition, the coil has a structure in which the conductor sheet is stacked with an insulating sheet interposed therebetween. Therefore, compared to the multi-wound coil in which the sheathed conductor is wound many times, the spot ratio of the conductor is high and the power loss is correspondingly low. As a result, power consumption can be reduced.

As a result, it is possible to reduce the size and power consumption of the analysis electromagnet, thereby reducing the size and power consumption of the ion implanter.

According to the second aspect of the present invention, the analysis electromagnet,

A set of body portions opposed to each other in the X direction across the beam path through which the ion beam passes and covering approximately half or more of one side of the ion beam in the Y direction, and the body in the Z direction while avoiding the beam path A saddle-shaped coil having a set of connecting portions connecting the ends of the portions to each other, the first coil generating a magnetic field in cooperation with the second coil to bend the ion beam in the X direction;

A set of body portions that oppose each other in the X direction across the beam path and cover approximately half or more of the other side of the ion beam in the Y direction, and connect the ends of the body portions in the Z direction while avoiding the beam path A saddle-shaped coil having a set of connecting portions, the second coil being disposed to overlap the first coil in a Y direction, and generating a magnetic field to cooperate with the first coil to bend the ion beam in the X direction. Can be configured to include a coil,

The yoke collectively surrounds the outside of the body portion of the first coil and the second coil,

Each of the first and second coils of the analysis electromagnet has a structure in which a notch portion is disposed in a fan-shaped cylindrical stack coil while leaving the main body portion and the connecting portion, and the stack coil has an outer circumferential surface of a laminated insulator. Winding the laminations with a plurality of windings, stacking the laminations of the conductor sheet and the insulating sheet, the main surface of which extends along the Y direction; It is comprised by forming the insulator laminated | stacked on the outer peripheral surface of a stack.

According to the third aspect of the present invention, the analysis electromagnet,

A set of body parts opposed to each other in the X direction across the beam path through which the ion beam passes, and a connecting portion connecting the ends of the body parts to each other in the Z direction while avoiding the beam path, wherein the ion beam is X An internal coil that generates a main magnetic field that bends in a direction;

A set of body parts outside the inner coil and opposite each other in the X direction across the beam path, and a set of connections connecting the ends of the body parts to each other in the Z direction while avoiding the beam path; One or more first external coils that are saddle shaped coils and generate a sub magnetic field that supports or corrects the main magnetic field;

A set of body parts that are outside of the inner coil and opposite each other in the X direction across the beam path, and a set of connections that connect the ends of the body parts to each other in the Z direction while avoiding the beam path; A saddle shaped coil, disposed to overlap with the first external coil in a Y direction, and configured to include one or more second external coils that generate a sub magnetic field that supports or corrects the main magnetic field,

The yoke collectively surrounds the outer side of the body portion of the inner coil, the first and second outer coils,

Each of the inner coil and the first and second outer coils of the analysis electromagnet has a structure in which a notch portion is disposed in a fan-shaped cylindrical stack coil while leaving the main body portion and the connecting portion, and the stack coil includes: Winding the lamination with a plurality of windings, stacking the lamination of the conductor sheet and the insulating sheet, the main surface of which extends along the Y direction, on the outer circumferential surface of the laminated insulator; Forming laminated insulators on the outer circumferential surface of the stack; Winding the lamination with a plurality of windings, stacking the lamination of the conductor sheet and the insulating sheet, the main surface of which extends along the Y direction, on the outer circumferential surface of the stack; It is comprised by forming the insulator laminated | stacked on the outer peripheral surface of a stack.

According to the fourth aspect of the present invention, the analysis electromagnet,

A set of body portions opposed to each other in the X direction across the beam path through which the ion beam passes and covering approximately half or more of one side of the ion beam in the Y direction, and the body in the Z direction while avoiding the beam path A saddle-shaped coil having a set of connecting portions connecting the ends of the portions to each other, the first inner coil cooperating with the second inner coil to generate a main magnetic field to bend the ion beam in the X direction;

A set of body portions that oppose each other in the X direction across the beam path and cover approximately half or more of the other side of the ion beam in the Y direction, and connect the ends of the body portions in the Z direction while avoiding the beam path The second internal coil having a set of connecting portions, the second internal coil being disposed to overlap the first internal coil in the Y direction, and generating a main magnetic field to cooperate with the first internal coil to bend the ion beam in the X direction. and,

A set of body parts that are outside of the first inner coil and that face each other in the X direction across the beam path, and a set of connections that connect the ends of the body part to each other in the Z direction while avoiding the beam path At least one first external coil having a saddle-shaped coil, wherein said at least one first external coil generates a sub-magnetic field that supports or corrects said main magnetic field;

A set of body parts that are outside of the second inner coil and that face each other in the X direction across the beam path, and a set of connections that connect the ends of the body part to each other in the Z direction while avoiding the beam path; A saddle-shaped coil provided with one or more second outer coils disposed to overlap with the first outer coil in a Y direction and generating a sub magnetic field that supports or corrects the main magnetic field.

The yoke collectively surrounds the outer side of the body portion of the first and second inner coils and the first and second outer coils,

Each of the first internal coil and the first external coil of the analysis electromagnet has a structure in which a notch part is disposed in a fan-shaped cylindrical stack coil while leaving the main body part and the connecting part, and the stack coil includes: Winding the lamination with a plurality of windings, stacking the lamination of the conductive sheet and the insulating sheet whose main surface extends along the Y direction on the outer circumferential surface of the laminated insulator; Forming laminated insulators on the outer circumferential surface of the stack; Winding the lamination with a plurality of windings, stacking the lamination of the conductor sheet and the insulating sheet, the main surface of which extends along the Y direction, on the outer circumferential surface of the stack; Is formed by forming an insulator laminated on the outer circumferential surface of the stack,

Each of the second internal coil and the second external coil of the analysis electromagnet has a structure in which a notch part is disposed in a fan-shaped cylindrical stack coil while leaving the main body part and the connecting part, and the stack coil is laminated. Winding the lamination with a plurality of windings, stacking the lamination of the conductive sheet and the insulating sheet, the main surface of which extends along the Y-direction, on the outer peripheral surface of the insulator; Forming laminated insulators on the outer circumferential surface of the stack; Winding the lamination with a plurality of windings, stacking the lamination of the conductor sheet and the insulating sheet, the main surface of which extends along the Y direction, on the outer circumferential surface of the stack; It is comprised by forming the insulator laminated | stacked on the outer peripheral surface of a stack.

According to a fifth aspect of the invention, the analysis electromagnet may be configured to further comprise a set of magnetic poles projecting inwardly from the yoke to face each other in the Y direction across the beam path.

According to a sixth aspect of the present invention, an ion implanter further comprises a focus correcting lens disposed between at least one of the ion source and the analyzing electromagnet, and between the analyzing electromagnet and the analyzing slit, wherein the focus correcting lens comprises: The electrostatic field can be configured to correct the position of the focal point of the ion beam to match the position of the analysis slit.

According to the seventh aspect of the present invention, the focus correcting lens includes an inlet electrode, an intermediate electrode, and an outlet electrode arranged in an ion beam traveling direction while forming a gap therebetween, wherein the inlet electrode of the focus correcting lens includes: Each of the intermediate electrode and the outlet electrode has a pair of electrodes facing each other and electrically conducting with each other in the X direction across the gap through which the ion beam passes, wherein the inlet and outlet electrodes of the focus correcting lens are at the same potential. The intermediate electrode may be configured to be maintained at a potential that is different from the potential of the inlet and outlet electrodes and that matches the focus of the ion beam with the position of the analysis slit.

According to the eighth aspect of the present invention, the acceleration / deceleration device includes the first to third electrodes arranged in the order of the first electrode, the second electrode, and the third electrode in the ion beam traveling direction starting from the upstream side. And accelerate or decelerate the ion beam at two stages between the first and second electrodes and between the second and third electrodes, the second electrode crossing the path of the ion beam. It is constituted by two electrode members which face each other in the X direction and are applied with different potentials to deflect the ion beam in the X direction, wherein the third electrode is disposed along the trajectory of the ion beam having a specific energy after deflection.

According to the ninth aspect of the present invention, the ion implanter is disposed between the analysis electromagnet and the acceleration / deceleration apparatus, and bends the ion beam in the Y direction by an electrostatic field, while forming a gap therebetween. And an orbital control lens having an inlet electrode, an intermediate electrode, and an outlet electrode arranged in an ion beam traveling direction, wherein each of the inlet electrode, the intermediate electrode, and the outlet electrode of the orbital control lens is an ion beam. A pair of electrodes opposed to each other and electrically conductive to each other in the X direction across the gaps passing therethrough, wherein the intermediate electrode of the orbital control lens is in the Y direction on each of the upstream side and the downstream side in the ion beam propagation direction; And a convex surface curved at each of the inlet and outlet electrodes of the track control lens. On the facing surface, there is a concave surface extending along the convex surface, wherein the inlet electrode and the outlet electrode of the orbital control lens are maintained at the same potential, and the intermediate electrode is different from the potential of the inlet electrode and the outlet electrode, and The orbital state in the Y direction of the ion beam guided from the orbital control lens is maintained at a potential for bringing it to a predetermined state.

According to the tenth aspect of the present invention, an ion implanter is disposed between the analysis electromagnet and the acceleration / deceleration device, and bends the ion beam in the Y direction by an electrostatic field, and forms an gap therebetween, forming an gap therebetween. And an orbital control lens having an inlet electrode, an intermediate electrode, and an outlet electrode arranged in a travel direction, wherein each of the inlet, middle and outlet electrodes of the orbital control lens passes through an ion beam. And a pair of electrodes facing each other in the X direction and electrically conducting with each other across the gap, wherein the intermediate electrode of the orbital control lens is curved in the Y direction on each of the upstream side and the downstream side in the ion beam traveling direction. A concave surface, and each of the inlet and outlet electrodes of the track control lens faces the concave surface of the intermediate electrode. Has a convex surface extending along the concave surface, the inlet electrode and the outlet electrode of the track control lens are maintained at the same potential, and the intermediate electrode is different from the potential of the inlet electrode and the outlet electrode and the track The orbital state in the Y direction of the ion beam guided from the control lens is maintained at a potential for bringing it into a predetermined state.

According to an eleventh aspect of the present invention, an ion implanter is arranged between the analysis electromagnet and the acceleration / deceleration device, and includes a plurality of pairs of opposing and electrically conducting with each other in the X direction across the gap through which the ion beam passes. Equipped with an electrode in the Y direction, by the electrostatic field to bend the trajectory in the plurality of planes in the Y direction of the ion beam, further homogenizing lens for homogenizing the beam current density distribution in the Y direction of the ion beam at the injection position It can be configured to include.

According to a twelfth aspect of the invention, the ion implanter is arranged to further include a deflection electromagnet disposed between the analytical electromagnet and the implantation position, the deflector electromagnet generating a magnetic field extending along the X direction in a beam path through which the ion beam passes. The deflecting electromagnet may comprise a first pair of poles having a pair of poles opposite each other in the X direction across the beam path and covering approximately half or more of one side of the ion beam in the Y direction, A second pair of poles having a pair of poles opposite each other in the X direction across and covering approximately half or more of the other side of the ion beam in the Y direction, a gap of the first pole pair and a gap of the second pole pair And a coil for generating a magnetic field opposite to the length of the magnetic poles constituting the first and second magnetic pole pairs in an ion beam traveling direction, the outer side of the beam path in the Y direction. The further away, the larger.

According to a thirteenth aspect of the present invention, the ion implanter is configured to further include a deflection electromagnet disposed between the analytical electromagnet and the implantation position and generating a magnetic field extending along the X direction in a beam path through which the ion beam passes. Wherein the deflecting electromagnet comprises a first pair of poles having a pair of poles opposite each other in the X direction across the beam path and covering approximately half or more of one side of the ion beam in the Y direction, A second pair of poles having a pair of poles opposite each other in the X direction across and covering approximately half or more of the other side of the ion beam in the Y direction, a gap of the first pole pair and a gap of the second pole pair And a coil for generating a magnetic field opposite to the gap length of the first and second magnetic pole pairs, the smaller the distance from the center of the beam path to the outer side in the Y direction.

According to the first to fourth aspects of the present invention, each coil of the analysis electromagnet is configured such that the notch portion is arranged in the fan-shaped cylindrical stack coil as described above with the body portion and the connecting portion left, so that the connecting portion is It extends in a Y direction substantially parallel to the edge part of a main body part. In the case where the dimension in the Y direction of the main body portion increases, it is coped by correspondingly increasing the dimension in the Y direction of the connecting portion. As a result, the protruding distance of the connection in the direction of incidence and radiation of the beam does not increase. According to this structure, it is possible to reduce the distance that the connecting portion of the coil protrudes from the yoke in the incident and radial directions of the beam.

Since the size of the analysis electromagnet can be reduced, the area required for installing the analysis electromagnet can be reduced. In addition, the weight of the analytical electromagnet can be reduced. In addition, the possibility of the magnetic field generated by the connection of the coils shaking the shape of the ion beam is reduced.

Accordingly, the protruding distance of the connecting portion of each coil can be reduced, and the length of the connecting portion can be shortened, thereby reducing unnecessary power consumption at the connecting portion. In addition, each coil has a structure in which a conductor sheet is stacked with an insulating sheet interposed therebetween. Thus, when compared with a multi-wound coil in which the sheathed conductor is wound multiple times, the area ratio of the conductor is high and the power consumption is correspondingly low. As a result, power consumption can be reduced.

As a result, as the analytical electromagnet becomes smaller, the size of the ion implanter can be reduced, thereby reducing the area required to install the ion implanter. In addition, the weight of the ion implanter can be reduced. In addition, as the power consumption of the analysis electromagnet is reduced, the power consumption of the ion implanter can be reduced.

In addition, the present invention according to the first to fourth aspects can obtain the following effects.

The ion implanter includes an ion source that generates a ribbon ion beam having a dimension in the Y direction greater than the dimension in the Y direction of the substrate. Therefore, compared with the case where the ion beam is expanded or dispersed in the Y direction, ion implantation can be performed at a high processing speed (production rate) even for a large substrate. This effect is more pronounced when processing the substrate, so the ion beam has a larger Y direction dimension.

The acceleration / deceleration device not only performs acceleration / deceleration of the ion beam, but may also perform X direction deflection of the ion beam. Therefore, the ion beam of desired energy can be selectively induced and energy pollution can be suppressed. In addition, these functions can be implemented in a single acceleration / deceleration device. Therefore, compared with the case where the energy analyzer is installed separately, the transmission path of the ion beam can be shortened. Therefore, the transmission efficiency of the ion beam can be improved.

The present invention according to the second aspect can obtain the following additional effects. That is, since the analysis electromagnet includes the first and second coils, it is possible to easily cope with an ion beam having a large Y direction dimension.

The present invention according to the third aspect can obtain the following additional effects. That is, since the analysis electromagnet includes the first and second coils in addition to the internal coils, it is possible to generate a magnetic field with high homogeneity of magnetic flux density distribution in the Y direction in the beam path of the ion beam. As a result, fluctuations in the form of ion beams can be suppressed to a low level during radiation. This effect is more pronounced when the dimension in the Y direction of the ion beam is large.

The present invention according to the fourth aspect can obtain the following additional effects. That is, since the analysis electromagnet includes the first and second external coils in addition to the first and second internal coils, it is possible to easily cope with the ion beam having a large dimension in the Y direction, and to the beam path of the ion beam, It is also possible to generate a magnetic field with high homogeneity of magnetic flux density distribution in the direction. As a result, fluctuations in the form of ion beams can be suppressed to a low level during radiation. This effect is more pronounced when the dimension of the ion beam in the Y direction is large.

The present invention according to the fifth aspect can obtain the following additional effects. That is, since the analytical electromagnet further includes a stimulus, the magnetic field can be easily concentrated in the gap between the stimuli, thereby easily generating a high magnetic flux density magnetic field in the beam path.

The present invention according to the sixth aspect can obtain the following additional effects. That is, since the ion implanter has a focus correcting lens for performing a correction for matching the position of the focus of the ion beam from the analysis electromagnet with the position of the analysis slit by the electrostatic field, the focus of the ion beam is affected by the influence of the space charge. Deviation from the position of the analysis slit can be prevented. As a result, the transfer efficiency and resolution of the ion beam can be improved while canceling the influence of the space charge.

The present invention according to the seventh aspect can obtain the following additional effects. That is, since the focus correcting lens functions as a unipotential lens (in other words, an Einzel lens, the same applies also to the following), the position of the focus of the ion beam can be corrected without changing the energy of the ion beam.

The present invention according to the eighth aspect can obtain the following additional effects. That is, in the acceleration / deceleration device, the ion beam can be deflected by the part of the second electrode which is configured to be separated into two electrode members, whereby the effect of energy distribution can be obtained. Due to the presence of the third electrode, an ion beam having a specific energy can be induced efficiently, and ions and neutral particles other than the ion beam can be efficiently blocked by the third electrode. Therefore, energy pollution can be suppressed efficiently. In particular, it is empirically known that in the deceleration mode, neutral particles easily occur by charge conversion during deceleration of the ion beam between the first electrode and the second electrode. Although many neutral particles occur, these particles travel in a straight line and impinge on the electrode and are blocked. Thus, neutral particles can be effectively removed from the acceleration / deceleration device.

In addition, the ion beam may be accelerated in two stages and may be deflected before acceleration in a dual subsequent stage. Therefore, deflection becomes easy. In addition, electrons generated by the collision of unwanted ions are bent by the second electrode to prevent electrons from reaching the first electrode. Therefore, the energy of X-rays generated by the collision of electrons may be lowered.

The present invention according to the ninth and tenth aspects can obtain the following additional effects. That is, since the orbital control lens functions as a unipotential lens, the orbital state in the Y direction of the ion beam can be set to a desired state without changing the energy of the ion beam.

In addition, as described above, the intermediate electrode constituting the track control lens has a concave surface curved in the Y direction, and the inlet and outlet electrodes each have a surface extending along the concave surface. The homogenization of the Y direction of the electric field distribution in the gap between the electrodes is thus significantly improved. As a result, even if the dimension in the Y direction is large, the orbital state in the Y direction of the ion beam can be set to a desired state with high homogeneity.

The present invention according to the eleventh aspect can obtain the following additional effects. That is, since a homogenizing lens is provided, it is possible to homogenize the beam current density distribution in the Y direction of the ion beam at the implantation position, and to improve the homogenization of ion implantation to the substrate. This effect is more pronounced when the substrate is processed, so the Y-direction dimension of the ion beam is large.

The present invention according to the twelfth and thirteenth aspects can obtain the following additional effects. That is, in the gap between the first and second pole pairs, the ion beam bends more strongly as the ions move further outward in the Y direction from the center of the beam path. According to this structure, the orbital state of the ion beam can be controlled.

Other features and advantages of the invention will be apparent from the following detailed description, the accompanying drawings and the claims.

(1) About all ion implanters

1 is a schematic plan view showing an embodiment of the ion implanter of the present invention. In the specification and the drawings, the advancing direction of the ion beam 50 is always set in the Z direction, and two directions substantially orthogonal to each other in a plane substantially perpendicular to the Z direction are set as the X direction and the Y direction, respectively. For example, the X and Z directions are horizontal and the Y direction is vertical. The Y direction is a constant direction, but the X direction is not an absolute direction and changes depending on the position of the ion beam 50 on the path (see, for example, FIGS. 1 and 4, etc.). In this specification, the case where the ion which comprises the ion beam 50 is positive ion is demonstrated as an example.

The ion implanter is an ion implanter for irradiating the substrate 60 with the ribbon ion beam 50 to perform ion implantation, the ion source 100 generating the ribbon ion beam 50; The ion beam 50 from the ion source 100 is bent in the X direction to analyze the momentum, and the focal point 56 of the ion beam 50 of the predetermined momentum (the focal point in the X direction, and the same applies to the following) Analysis electromagnet 200 to form a downstream; At the implantation position where the ion beam passing through the analysis electromagnet 200 is incident on the substrate 60, the direction in which the substrate 60 intersects with the main surface 52 of the ion beam 50 (see FIGS. 2 and 3). The board | substrate drive apparatus 500 which moves to this is provided.

The path of the ion beam 50 from the ion source 100 to the substrate 60 is in a vacuum vessel (not shown) maintained in a vacuum atmosphere.

In the specification, "main surface" means an end face of a ribbon-like or sheet-like member (e.g., ion beam 50, insulating sheets 266, 267 and conductor sheets 268, 269, described later). Rather, it means the broad side of the member. "Downstream" or "upstream side" means the downstream side or the upstream side in the advancing direction Z of the ion beam 50. The ion beam 50 generated from the ion source 100 and the ion beam 50 derived from the analysis electromagnet 200 are different in concept. In other words, the former is the ion beam before the momentum analysis and the latter is the ion beam after the momentum analysis. The difference between the ion beams is evident. Therefore, in the specification, the ion beams are not distinguished from each other, and both are represented as the ion beams 50.

The ion beam 50 generated from the ion source 100 and delivered to the substrate 60 is, for example, as shown in FIG. 2, for example, the dimension Wy in the Y direction is larger than the dimension Wx in the X direction, that is, It has a ribbon shape where Wy> Wx. Although the ion beam 50 has a ribbon shape, this does not mean that the dimension Wx in the X direction is as thin as paper or cloth. For example, although depending on the dimensions of the substrate 60, the dimension Wx in the X direction of the ion beam 50 is about 30 to 80 mm, and the dimension Wy in the Y direction is about 300 to 500 mm. The plane along which the ion beam 50 is larger, the plane along the YZ plane, is the major plane 52.

The ion source 100 generates a ribbon ion beam 50 in which the dimension Wy in the Y direction is larger than the thickness Ty in the Y direction of the substrate 60, as in the example shown in FIG. 3. For example, when the thickness Ty is 300 to 400 mm, the dimension Wy in the Y direction is about 400 to 500 mm.

For example, the substrate 60 is a semiconductor substrate, a glass substrate, or another substrate. The planar shape of the substrate is circular or rectangular in shape.

Near the focal point 56 of the ion beam 50 radiated from the analysis electromagnet 200, a slit 70 is arranged to analyze the momentum of the ion beam 50 in cooperation with the analysis electromagnet 200. As also shown in FIG. 27, the analysis slit 70 has a slit 72 extending substantially parallel to the Y direction. The reason for arranging the analysis slit 70 near the focus 56 of the ion beam 50 is that both the transfer efficiency and the momentum analysis capability of the ion beam 50 are improved.

The ion implanter may include focus correcting lenses 600 and 610 to correct the position of the focus 56 of the ion beam 50; Orbital control lenses 700a and 700b for controlling the orbital state of the ion beam 50 in the Y direction; It further includes an acceleration / deceleration device 400 which performs deflection and acceleration / deceleration of the ion beam 50. These components will be described in detail below.

(2) About the analysis electromagnet 200

Hereinafter, the whole structure of the analysis electromagnet 200, the detailed structure of a coil, a coil manufacturing method, the characteristic of the analysis electromagnet 200, a control method, another example, etc. are demonstrated in order.

(2-1) Overall structure of the analysis electromagnet 200

Examples of analytical electromagnets 200 are shown in FIGS. 4-6 and the like. 6 shows an analysis electromagnet with the vacuum vessel 246 omitted. The analysis electromagnet 200 has a magnetic field along the Y direction in the beam path 202 through which the ribbon-shaped ion beam 50 impinges on the electromagnet, and the ion beam 50 passes, and the ion beam 50 is X It is configured to bend in the direction to perform momentum analysis. The magnetic field is schematically illustrated by magnetic lines of force 204 in FIG. 5 and the like. When the ion beam 50 impinges on the analytical electromagnet 200, the ongoing ion beam 50 receives a Lorentz force Fx directed to the right by the magnetic field, as viewed in the travel direction Z, and thus the right side. Is biased. As a result, momentum analysis is performed. The center trajectory of the ion beam 50 is indicated by dashed-dotted lines in FIG. 4, and the radius of curvature is indicated by R. The angle (deflection angle) at which the ion beam 50 is deflected by the analysis electromagnet 200 is represented by α.

For example, the radius of curvature R is 300 to 1500 mm and the deflection angle α is 60 to 90 degrees. 4 exemplarily shows a case in which the deflection angle α is 90 degrees.

Referring to FIG. 7, the analysis electromagnet 200 includes a first inner coil 206, a second inner coil 212, one or more (three in this embodiment) first outer coil 218, one or more. (Three in this embodiment) a second external coil 224, a yoke 230, and a set of magnetic poles 232. The beam path 202 is surrounded by a vacuum vessel 236 made of nonmagnetic material and maintained in a vacuum atmosphere. Vacuum vessel 236 is also referred to as an analyzer tube.

The first and second internal coils 206, 212 are extracted and shown in FIG. 8. Referring to the drawings, the coil can be more easily understood.

In this example, the coils 206, 212, 218, 224 are substantially in the Y direction about the symmetry plane 234 (see FIG. 5, etc.) passing through the center in the Y direction of the beam path 202 and parallel to the XZ plane. It has a surface symmetrical shape. The coil 320 (see FIGS. 22 and 24, etc.), the first coil 326 and the second coil 328 (see FIG. 25) described below are configured in a similar manner. In the case of employing such a surface symmetric structure, a magnetic field having high symmetry in the Y direction can be easily generated in the beam path 202. This contributes to suppressing the shaking of the shape of the ion beam 50 upon radiation from the analysis electromagnet 200.

Hereinafter, as illustrated in FIGS. 5, 9, 13, and the like, when the plurality of first external coils 218 and the plurality of second external coils 224 need to be distinguished from each other, the first external coils 218 may be used. Is referred to as the first outer coils 218a, 218b and 218c starting from the top in the Y direction and the second outer coil 224 as the second outer coils 224a, 224b and 224c starting from the bottom in the Y direction. This is because the second outer coil is face symmetrical with respect to the first outer coil 218 as described above.

In the case where a sign indicating a component, for example coil 206, is underlined in the figure, such a sign refers to the entire component, such as a coil.

Referring primarily to FIGS. 8 and 12, the first internal coils 206 oppose each other in the X direction across the beam path 202 and on one side (upper side in the embodiment) of the ion beam 50 in the Y direction. A set of body portions 208 covering approximately half or more (in other words, substantially half or more) of the end portions of the body portions 208 in the Z direction, avoiding the beam path 202. In other words, the end of the inlet 238 side of the analysis electromagnet 200 and the end of the outlet 240, which may also be applied to other coils. Saddle shaped coil. The first internal coil cooperates with the second internal coil 212 to generate a main magnetic field that bends the ion beam 50 in the X direction. The main magnetic field is a magnetic field that causes the ion beam 50 to bend to a substantially predetermined radius of curvature R. The first inner coil 206 is referred to as a saddle shaped coil because, as a whole, the coil has a shape similar to the saddle. The same applies to the other coils 212, 218, 224 and the coils 326, 328 described later.

In order to prevent the ion beam 50 from colliding with the connecting portion 210 and to reduce the influence of the magnetic field generated by the connecting portion on the ion beam 50, the connecting portion is directed upward in the Y direction. It is separated from. For the same purpose as above, the connections of the other coils are separated from the beam path 202 toward the top or the bottom in the Y direction.

Referring primarily to FIG. 8, the second internal coils 212 are opposed to each other in the X direction across the beam path 202 and approximately half of the other side (lower side in the embodiment) of the ion beam 50 in the Y direction or One set of body portions 214 covering more (in other words, substantially half or more) and the ends of the body portions 214 in the Z direction while avoiding the beam path 202 are connected to each other. It is a saddle-shaped coil having a set of connecting portion 216 to. The second inner coil is disposed to overlap the first inner coil 206 in the Y direction, and generates a main magnetic field that cooperates with the first inner coil 206 to bend the ion beam 50 in the X direction. . That is, the second internal coil 212 generates a magnetic force line 204 in the same direction as the first internal coil 206.

The second inner coil 212 has a similar dimension and structure to the first inner coil 206. In general, the number of turns of the conductor (specifically, the conductor sheet 268, FIG. 10, etc.) is equal to the number of turns of the first internal coil 206. However, as described above, the second internal coil has a shape that is plane symmetrical about the plane of symmetry 234 with respect to the first internal coil 206. The connector 216 is disposed on the opposite side (ie, lower side) in the Y direction with respect to the connector 210 across the beam path 202.

Although indicated by lines in FIG. 8, a small (eg, about 20 mm) gap 242 is formed between the first internal coil 206 and the second internal coil 212. In the gap, a total of two cooling plates 312 (see FIG. 19), which will be described later, may be disposed, that is, one cooling plate is on the side of the first internal coil 206, and one cooling plate is on the second internal coil 212. ) Side.

Referring primarily to FIG. 7, each of the first outer coils 218 is outside the first inner coils 206 and a set of body portions 220 opposite each other in the X direction across the beam path 202. And a set of connecting portions 222 connecting the ends of the body portion 220 to each other in the Z direction while avoiding the beam path 202. The first external coil generates a sub magnetic field that supports or corrects the main magnetic field. The first external coils 218 are arranged to overlap each other in the Y direction.

Specifically, the body portion 220 and the lateral portions (parts corresponding to the lateral portions 284 shown in FIG. 12) of each of the first outer coils 218 overlap each other in the Y direction. It is arranged. Strictly speaking, it is difficult to say that the vertical portions (parts corresponding to the vertical portions 282 shown in FIG. 12) of the connecting portion 222 are overlapped as described above, but when viewed as a whole, the first external coil ( It can be said that 218 are arranged to overlap each other in the Y direction. The second outer coil 224 is similarly constructed.

The first outer coil 218 has a structure substantially similar to the first inner coil 206. However, the dimension in the Y direction is smaller than the dimension of the first inner coil 206 and the number of windings of the conductor is generally smaller than the number of the first inner coil 206. The first outer coil 218 has the same number of conductors (specifically, see conductor sheet 269, FIG. 10, etc.) turns. In an embodiment, the first outer coil 218 has different Y direction dimensions. Alternatively, the first outer coils have the same Y direction dimension. The second outer coil 224 is similarly configured.

For example, in the first inner coil 206 and the second inner coil 212, the Y direction dimension of the main body portion and the connecting portion is about 230 mm, and in the first outer coil 218a and the second outer coil 224a. The dimension of is about 50 mm, and the dimension in the first outer coil 218b and the second outer coil 224b is about 60 mm, in the first outer coil 218c and the second outer coil 224c. The dimensions of the book are about 100 mm.

Although indicated with lines in FIG. 7, between the first outer coils 218, between the second outer coils 224, and the lowermost first outer coils 218 and 218c and the uppermost second outer coil 224. Small gaps 244, 246 and 248 are formed in 224c (see also FIG. 9). In the gap, a cooling plate 312 (see FIG. 19) to be described later may be disposed. For example, the dimensions of the gaps 244 and 246 are about 10 mm, and the dimensions of the gap 248 correspond to the dimensions of the gap 242 or about 20 mm. The gaps 244 and 246 are disposed around their respective circumferences along the respective outer coils 218 and 224.

The first outer coil 218 may generate a magnetic field in the same direction or in the opposite direction as the magnetic field generated by the first inner coil 206 and the second inner coil 212. Alternatively, the direction of the magnetic field can be reversed by control. The second outer coil 224 is configured in a similar manner. A portion of the magnetic force line (magnetic field) generated by the body portion 220 of the first external coil 218 spreads (in other words, leaks) toward the beam path 202, whereby the main magnetic field is affected. Accordingly, the first external coil 218 may generate a sub magnetic field that supports or corrects the main magnetic field. In this case, each first outer coil 218 has the effect of supporting or correcting a magnetic field in an area near the inside of the coil. The second outer coil 224 is configured in a similar manner.

Referring primarily to FIG. 7, each second outer coil 224 is outside the second inner coil 212 and has a set of body portions 226 facing each other in the X direction across the beam path 202. ) And a set of connecting portions 228 connecting the ends of the main body portion 226 to each other in the Z direction while avoiding the beam path 202. The second external coil generates a sub magnetic field that supports or corrects the main magnetic field. The second outer coils 224 are disposed to overlap each other in the Y direction and to overlap the first outer coils 218 in the Y direction.

The second outer coil 224 has a structure substantially similar to the second inner coil 212. However, the dimension in the Y direction is smaller than that of the second inner coil 212, and the number of turns of the conductor is generally smaller than the number of turns of the second inner coil 212. The number of turns of the conductor (specifically the conductor sheet) and the dimension in the Y direction of the second outer coil 224 are as described above.

An example of the number of turns of each conductor will be described. The number of turns of the first inner coil 206 and the second inner coil 212 is about 110 turns, and the number of turns of the first outer coil 218 and the second outer coil 224 is about 85 turns. It is Turon.

Since the main body portions 208, 214, 220, and 226 of the coil are disposed on the yoke 230 substantially as a whole, the main body portion is a portion that generates a predetermined magnetic field (main or sub magnetic field) in the beam path 202. I can speak. The main body portion 322 of the coil 320 described later is similarly configured.

The connecting portions 210, 216, 222, and 228 of the coil may be said to be portions which electrically connect the ends of each of the set of main body portions to each other in the Z direction and cooperate with the main body portions to form a loop-shaped conductive path. The connecting portions 324 and 325 of the coil 320 to be described later are similarly configured.

FIG. 5 is a longitudinal cross-sectional view taken along line A-A in FIG. 4, showing the body portions 208, 214, 220, 226 of the coils 206, 212, 218, 224. 24 to 26 which will be described later also show the main body of the coil.

The yoke 230 is made of ferromagnetic material and collectively surrounds the outside of the body portions 208, 214, 220, 226 of the coils 206, 212, 218, 224. The yoke 230 thus configured also gives the effect of reducing magnetic field leakage to the outside. The yoke 230 has a plan view shape of a so-called fan type as shown in FIG. 4. The shape of the cross section (cross section along the XY plane) of the yoke 230 is a shape of a rectangular frame. The yoke 230 configured as described above is also referred to as a window frame type yoke.

In an embodiment, the upper yoke 231 constituting the yoke 230 is removable. A method of using the upper yoke 231 will be described later.

The set of magnetic poles 232 is made of ferromagnetic material and protrudes inwardly from the yoke 230, for example about 15 mm, to face each other in the Y direction across the beam path 202. The top view shape of each magnetic pole 232 is an arch shape extended along the center track 54 of the ion beam 50 shown in FIG. This shape is also referred to as a fan-like shape. The gap length G between the magnetic poles 232 is somewhat larger (eg, by 100 to 150 mm) than the dimension Wy of the ion beam 50 in the Y direction. Stimulus 232 is not essential. However, if the magnetic poles are arranged, the magnetic field lines 204 can be easily concentrated in the gaps between the magnetic poles 232, so that it is easy to generate a magnetic field having a high magnetic flux density in the beam path 202.

For example, the gap length G between the poles 232 has a size equal to or less than one half of the radius of curvature R. FIG. Specifically, if the radius of curvature R is 800 mm, the gap length G is for example 500 mm. In general, the gap length _G is greater than the width W _G of the magnetic pole 232. That is, G≥W _G. According to such a dimensional relationship, it is possible to prevent the magnetic pole 232 and the yoke 230 from expanding unnecessarily.

5-7, a gap appears between the first inner coil 206 and the first outer coil 218 and between the second inner coil 212 and the second outer coil 224. . In an embodiment, the stack insulator 262 shown in FIGS. 9 and 10 is interposed in the gap.

(2-2) coil structure

Next, the structure of the coil and the like will be described in detail. FIG. 9 is a schematic diagram illustrating an enlarged cross-sectional view of the first inner and outer coils taken along the line DD of FIG. 7, and FIG. 10 is an exploded view of the first inner coil and the uppermost first outer coil shown in FIG. 9. It is a cross section.

The first inner coil 206 and the first outer coil 218 are notched in a fan-shaped cylindrical stacked coil 290 while leaving the main body portions 208 and 220 and the connecting portions 210 and 222. (272 to 275; see FIG. 7) are arranged. In the fan-shaped cylindrical stack coil, the lamination (set 264) of the insulating sheet 266 in which the main surface 266a extends along the Y direction and the conductor sheet 268 in which the main surface 268a extends along the Y direction are made. The first stack insulator 261 (stacked in the direction of arrow 270 that intersects the Y direction, which applies equally below) is stacked in a state of being wound with several windings, and the second stack insulator 262 is formed of the lamination. The lamination (set 265) of the insulating sheet 267 formed on the outer circumferential surface, the main surface 267a extending along the Y direction, and the conductor sheet 269 on which the main surface 269a extends along the Y direction, has several The stack is wound in two windings, and a third stack insulator 263 is formed outside the lamination.

To facilitate understanding of notches 272-275, notches 272-275 of first internal coil 206 are shown in FIG. 12. Similar notches 272-275 are also disposed in the first outer coil 218.

The yoke 230 fits into two notches 272 and 273 located in the outward and inward direction of the radius of curvature R. As shown in FIG. That is, these notches have a shape corresponding to the shape of the yoke 230. The notches 276 to 279 of the coil 320 described later are similarly configured. Two notches 274 and 275 on the advancing direction Z side of the ion beam 50 form an upper half of the inlet 238 and the outlet 240, respectively.

The second stack insulator 262 may constitute a first inner coil 206 (FIG. 10 shows this case), or may constitute a first outer coil 218, and coils 206 and 218. May be shared by

FIG. 15 shows a cross-sectional structure of the stack coil 290 shown in FIG. As shown in FIG. 15, the stack coil is constituted by inner and outer coils 292 and 294 having the same cross-sectional structure as in FIG. Even in this case, the second stack insulator 262 may constitute an internal coil 292 (FIG. 15 shows this case), or may constitute an external coil 294, and coils 292 and 294. May be shared by

In the stack coil 290, the portions 272a to 275a respectively corresponding to the notches 272 to 275 are cut out by a cutting process or the like to form the notches 272 to 275. FIG. Thereafter, the inner coil 292 is configured as the first inner coil 206, and the outer coil 294 is configured as the first outer coil 218.

In addition, in this embodiment, in order to separate the 1st external coil 218 into three parts (three steps), the structure by which the clearance gap is arrange | positioned in the external coil 294 of the stack coil 290 by a cutting process etc. is shown. Have

Each stack insulator 261, 262, 263 of the stack coil 290 is formed by, for example, winding a prepreg sheet with a plurality of windings. The prepreg sheet 300 of FIG. 16 is a prepreg sheet. A prepreg sheet is a sheet | seat processed in the semi-hardened state by immersing insulating resin in the support member which has insulation and heat resistance.

The support member is constituted by, for example, glass fibers or carbon fibers. The resin is composed of, for example, an epoxy resin or a polyimide resin. Stack insulators 261-263 formed using such a prepreg sheet may be referred to as fiber reinforced plastic (FRP). The thickness of the stack insulators 261 to 263 may be appropriately selected depending on the strength required as the structural member.

Each insulating sheet 266, 267 is, for example, a sheet composed of Nomex (registered trademark), Lumilar (registered trademark), or Kapton (registered trademark), or other insulating sheet. The thickness of the insulation sheets 266 and 267 may be appropriately selected depending on the required insulation strength and the like. For example, the thickness may be about 75 μm or smaller.

Each conductor sheet 268, 269 is constituted by, for example, a copper sheet or an aluminum sheet. The thickness may be appropriately selected depending on the current passing through. For example, in the case of copper sheets, the thickness is about 0.4 mm, and in the case of aluminum sheets, the thickness is about 0.5 mm. The width in the direction corresponding to the Y direction of these sheets may be appropriately selected according to the Y direction dimension of the coil required, for example, about 230 mm (eg, the width before the process described later is about 234 mm). Further, the widths of the stack insulators 261 to 263 and the insulating sheets 266 and 267 can also be appropriately set in accordance with the above values.

Insulating sheet 266 and conductor sheet 268 may overlap in a manner opposite to that of FIG. 10, as described below. The conductor sheet 268 may be disposed on the inner side (the left side of FIG. 10, that is, the stack insulator 261 side) of the first internal coil 206, and the insulating sheet 266 may be disposed to overlap the outer side. As needed, the insulating sheet 266 can be arrange | positioned so that it may overlap with both sides of the conductor sheet 268, respectively. The insulating sheet 267 and the conductor sheet 269 of the first external coil 218 are similarly configured.

As shown in plan view, the conductor sheet 268 of the first internal coil 206 has a structure similar to that of a fan, with a plurality of windings, as shown in FIG. 11, and the terminal 340 of the sheet. It is connected to the end. However, the number of windings is not limited to that shown. When the current IM flows through the conductor sheet 268, a magnetic force line 204 that forms a main magnetic field may be generated. The same current IM and magnetic field lines 204 are also shown in FIG. 12.

As shown in plan view, the conductor sheet 269 of the first outer coil 218 also has a structure similar to that in FIG.

The second inner coil 212 and the second outer coil 224 are configured similarly to the first inner coil 206 and the first outer coil 218. As described above, the coil has a plane symmetrical shape about the symmetry plane 234 with respect to the first inner coil 206 and the first outer coil 218.

If necessary, a member or the like for reinforcing the coil may be further disposed on the outer circumference of the outer stack insulator 263 (in the case of the coil shown in FIG. 23, the stack insulator 262).

Taking the first internal coil 206 as an example, an example of the structure of the connecting portion of the coil will be described in more detail with reference to FIG. 12.

Each connecting portion 210 of the first inner coil 206 is connected with two vertical portions 282 substantially perpendicular to the end of the body portion 208 in the Z direction and extending substantially parallel to the Y direction. And a lateral portion 284 connected substantially perpendicular to the vertical portion 282 and extending substantially parallel to the XZ plane. That is, the vertical portions 282 are connected to each other by the lateral portions 284. Thus, the first internal coil 206 includes a lateral conductive path 286 substantially perpendicular to the Y direction and a vertical conductive path 288 substantially parallel to the Y direction. That is, most of the conductive path of the first internal coil 206 is composed of a combination of the conductive paths 286 and 288 excluding the edge portion. The current densities at all positions of the conductive paths 286 and 288 are set equal to each other.

The connections 216, 222, 228 of the other coils 212, 218, 224 are configured similarly to the connections 210. Thus, each of the other coils 212, 218, 224 have a lateral conduction path substantially perpendicular to the Y direction and a vertical conduction path substantially parallel to the Y direction. That is, most of the conductive path of the coil is composed of a combination of the lateral conductive path and the vertical conductive path excluding the edge portion. The current densities at all positions of the lateral and vertical conductive paths are set equal to each other. The coil 320 described later is similarly configured.

The connection portion of the coil is preferably configured as described above. According to the structure, the protruding distance of the connection portion from the analysis electromagnet 200 can be reliably shortened in the direction of incidence and radiation of the beam. The protrusion distance will be described in detail below.

A structural example of the power supply of the coil is shown in FIG. In the example, DC main power source 250 is connected to first internal coil 206 and second internal coil 212, respectively. The main power supply 250 may supply current IM having substantially the same level to each other to the first internal coil 206 and the second internal coil 212, respectively. The two main power supplies 250 need not be disposed separately, but can be configured as a single combined main power supply.

Also in this example, the DC sub power source 252 is connected to the first external coils 218 (218a to 218c) and the second external coils 224 (224a to 224c), respectively. The sub power source 252 may supply current IS to the first external coil 218 and the second external coil 224, respectively, and flows through the first external coil 218 and the second external coil 224. The current IS can be controlled independently. The plurality of sub power supplies 252 need not be individually disposed, but a single combined power supply capable of independently controlling the current IS flowing through the first external coil 218 and the second external coil 224, respectively. It can be configured as a sub power supply.

(2-3) coil manufacturing method

Next, an example of a coil manufacturing method will be described using the first inner coil 206 and the first outer coil 218 as an example.

First, a fan-shaped cylindrical stack coil 290 shown in FIG. 14 is manufactured. This manufacturing method is carried out in the following manner.

First, as shown in FIG. 16, the mandrel 296 having a sharp portion 297 protruding outwardly as opposed to the sharp portion 291 of the stack coil 290 shown in FIG. 14 is indicated by arrow 299 . By rotating in a predetermined direction about the axis 298, the prepreg sheet 300 as described above is wound by a plurality of windings. As a result, the stack insulator 261 shown in Figs. 15 and 17 is formed.

Next, as shown in FIG. 17, the mandrel 296 is rotated in the same manner as described above, so that the insulating sheet 266 and the conductive sheet 268 overlap each other on the outer circumferential surface of the stack insulator 261. It is wound up with a plurality of windings and laminated. As a result, the lamination of the insulating sheet 266 and the conductor sheet 268 shown in FIG. 15 is formed.

Next, as in the case of FIG. 16, the prepreg sheet 300 is wound around the outer circumferential surface of the lamination of the insulating sheet 266 and the conductive sheet 268 with a plurality of windings, and the stack insulator 262 shown in FIG. 15 is shown. To form.

Next, as in the case of FIG. 17, the insulation sheet 267 and the conductor sheet 269 are wound with a plurality of windings on the outer circumferential surface of the stack insulator 262 in a state where they overlap each other, and the insulation sheet shown in FIG. 15 is obtained. Laminations of the 267 and the conductor sheet 269 are formed.

Next, as in the case of FIG. 16, the prepreg sheet 300 is wound around the outer circumferential surface of the lamination of the insulating sheet 267 and the conductor sheet 269 with a plurality of windings, and the stack insulator 263 shown in FIG. 15 is shown. To form.

After the step, after removing the mandrel 296, the stack coil is constituted by the inner coil 292 and the outer coil 294, but the sharp portion 291a protrudes outwardly, ie, outwardly, to the sharp portion 291. (290a) is obtained.

When a lead plate is disposed at the start and end portions of the conductor sheet 268, the conductor sheet 268 may be connected to the terminal 340 using the lead plate. The conductor sheet 269 is similarly constructed.

Before the winding step, preferably, abrasive particles (shots) such as metal grains are blown to the main surfaces 268a and 269a on the front and rear sides of the conductor sheets 268 and 269 to roughen the surface (that is, the shot blasting step is applied). ). According to this structure, the surface area can be increased, and intimate contact with the insulating sheets 266 and 267 can be improved. Even when the shot blasting process is applied only to one main surface of each of the conductor sheets 268 and 269, the effect can be obtained. However, it is desirable to apply the process to both major surfaces. This may also be applied to the insulating sheets 266 and 267.

Similarly, it is preferable to apply a shot blast process to the main surfaces 266a and 267a on the front and rear sides of the insulating sheets 266 and 267 to roughen the surface. According to this structure, the surface area can be increased, and the intimate contact with the conductor sheets 268, 269 and the like can be further improved.

Next, after winding the heat shrinkable tape (not shown) around the outer circumference of the stack coil 290a, a molding is formed by pressing the sharp portion 291a to form the sharp portion 291 as indicated by arrow 302 in FIG. Run the process. The resulting article is heat cured. As a result, a stack coil 290b that forms the stack coil 290 shown in FIG. 11 is obtained. The strength of the structure is improved due to the winding of the heat shrinkable tape. Instead of the heat shrinkable tape, a prepreg tape configured similar to the prepreg sheet described above can be wound.

Next, after vacuum infiltrating resin into the stack coil 290b, it heat-cures under a pressurized state. In short, this means carrying out the resin molding process. As a result, the stack coil 290 shown in FIG. 14 is obtained. The resin molding process can increase the adhesive strength between the layers of the stack coil 290 to improve the strength and electrical insulation of the coil.

Next, a cutting process is performed to both end surfaces of the stack coil 290 in the axial direction (in other words, the height direction) to form a flat surface. Thereafter, a cut process is performed on the portions 272a to 275a corresponding to the notches to form the notches 272 to 275.

In the case where the external coil 294 is configured as the plurality of first external coils 218, a groove processing step is applied to a portion of the external coil 294 corresponding to the gap 244 to form the gap 244.

Next, the stack coil 290c to which the cutting process and the grooving process are applied is immersed in an etching solution for etching the material of the conductor sheets 268 and 269 (as described above, copper or aluminum) to perform an etching process. do. As a result, burrs and the like of the conductor sheets 268 and 269 generated on the machining surface are removed during the cutting process and the grooving process, thereby preventing short circuits (layer short circuits) between the layers between the conductor sheets 268 and 269. And the end faces of the conductor sheets 268 and 269 become more concave than the end faces of the insulating sheets 266 and 267, thereby increasing the creepage distance of the layer insulation in the conductor sheets 268 and 269. Insulation performance can be improved.

After winding a heat shrinkable tape around the whole stack coil 290d to which the above-mentioned etching process was applied, it heat-hardens. As a result, a fan-shaped cylindrical stack coil in which the first inner coil 206 and the first outer coil 218 shown in Figs. The strength of the structure is improved due to the winding of the heat shrinkable tape. When the coil has a forced cooling structure described later, the cooling plate 312 can be attached in the following manner before winding the heat shrinkable tape. Instead of the heat shrinkable tape, it is possible to wind up a prepreg tape that is configured similarly to the prepreg sheet described above.

As shown in FIG. 19, a cooling plate 312 having a refrigerant passage 314 is provided with an upper end surface 306 and a lower end surface 307, a first internal coil 206 and a first interior through an insulator 316. It is attached to the gap 244 of the outer coil 218 by pressure contact, respectively. Preferably, the cooling plate 312 is not only an upper end surface and a lower end surface in the Y direction of the main body portions 208 and 220 of the coils 206 and 218, but also an upper end surface and a lower end portion in the Y direction of the connection portions 210 and 222. It is also arranged on the face. That is, it is preferable that a cooling plate is arrange | positioned as wide as possible. For example, coolant flows through the refrigerant passage 314. In an example, an insulator 316 is wound around the cooling plate 312. However, winding the insulator is not essential.

Coils 206 and 218 may be forcedly cooled through the end face by cold plate 312. This cooling structure is also referred to as an end cooling system.

In the above case, a high thermal conductivity thermal diffusion component (such as silicon grease) is interposed between the cold plate 312 and the insulator 316 and between the end surfaces of the insulator 316 and the coils 206 and 218 (eg, application). Is preferred. According to such a structure, an air space can be removed as much as possible, and heat conductivity performance and cooling performance can be improved.

Each gap 244 may be configured as a wedge-like shape that becomes narrower as it travels toward the inner side (left side of FIG. 19) of the coil 218. In addition, since the cooling plate 312 attached to the gap may be configured in a similar shape to the wedge, the cooling plate 312 is press-inserted into the gap. According to such a structure, the clearance gap formed between the end surface of the coil 218 and the cooling plate 312 can be made small, and a close contact can be improved. Therefore, the cooling performance can be further improved.

When the cooling plate 312 is arrange | positioned as mentioned above, after heat-shrinkable tape or a prepreg tape is wound around the whole coil in the state shown in FIG. 19, it heat-cures. Due to this, the fixing and intimate contact of the cooling plate 312 can be realized.

Finally, as needed, in both the case where the cooling plate 312 is disposed and in the case where the cooling plate is not disposed, the entire coil including the first inner coil 206 and the first outer coil 218 is It may be molded into a resin. According to such a structure, the moisture resistance, insulation, mechanical strength, etc. of a coil can be improved further. In this case, 5 to 30 wt% of filler (filler) may be mixed with the resin. According to such a structure, the crack resistance of a resin, etc. can be improved.

In a manner similar to that described above, the second inner coil 212 and the second outer coil 224 can be manufactured as coils in which these coils are incorporated. Coils described later, that is, the coil 320 shown in FIGS. 22 to 24, the first and second coils 326 and 328 shown in FIG. 25, and the internal coil 330 and the first and first shown in FIG. 26. 2 The outer coils 218 and 224 are manufactured in a similar manner as described above. The inner and outer coils can be made integral with each other.

Using the coils 206, 212, 218, and 224, the analysis electromagnet 200 and the like shown in FIGS. 4 and 5 can be assembled, for example, according to the following procedure. That is, in a state where the upper yoke 231 of the yoke 230 is removed and separated, the member in which the second internal coil 212 is integrated with the second external coil 224 is inserted into the yoke 230 from the upper side. Thereafter, the vacuum container 236 is inserted from above, and the member in which the first internal coil 206 is integrated with the first external coil 218 is inserted from above. Finally, the upper yoke 231 is attached.

(2-4) Characteristics of the analysis electromagnet 200 and the like

In the analysis electromagnet 200, the first inner coil 206 and the first outer coil 218 are fan-shaped cylindrical stack coils (left with main body parts 208 and 220 and connecting parts 210 and 222). Since the notches 272 to 275 are disposed in the 290, the connecting portions 210 and 222 extend substantially parallel in the Y direction from the ends of the main body portions 208 and 220. Therefore, even in the case where the dimension in the Y direction of the main body portions 208 and 220 increases, the case in which the dimension in the Y direction of the connecting portions 210 and 222 increases correspondingly is addressed. As a result, the protruding distance of the connecting portions 210 and 222 in the beam incident and radial directions does not increase.

The above items will be described with reference to FIG. 8 by taking the first internal coil 206 as an example. When the dimension a in the Y direction of the body portion 208 increases, it is coped by changing the dimension b in the Y direction of the connecting portion 210 correspondingly. Specifically, dimensions a and c are substantially identical to each other. Therefore, even if the dimension a increases, the protruding distance L ₃ (see FIG. 4) of the connecting portion 210 does not increase in the incident and radial directions of the ion beam 50. The protruding distance L ₃ is determined by the distance L ₅ between the end face of the yoke 230 and the end face of the connection portion 210 and the thickness b of the connection portion 210. That is, the protruding distance L3 may be expressed as follows. As can be seen from the description of the structure of the first internal coil 206, the body portion 208 also has a thickness b .

[Equation 2]

L ₃ = b + L ₅

Unlike Equation 1 described above, which represents the protruding distance L1 of the conventional analysis electromagnet 40, Equation 2 does not include the dimension a in the Y direction. This is a feature that is significantly different from the conventional analytical electromagnet 40.

In addition, the distance L ₅ may be smaller than the length L ₂ of the conventional analysis electromagnet 40. The reason for this is as follows. Unlike the conventional coil 12, the connecting portion 210 is not formed by inclinedly raising the connecting portion 16 by a bending process, and the notch portion 272 is formed in the fan-shaped cylindrical stack coil 290 as described above. 275 to 275, and the connection portion 210 extends substantially parallel in the Y direction. In addition, the edge portion 254 between the body portion 208 and the connection portion 210 may be in a state where these portions are less rounded or substantially vertical by a cutting process or the like.

For the same reason as above, the protruding distance L ₃ of the connection portion 210 from the yoke 230 in the direction of incidence and radiation of the beam may be reduced.

The second inner coil 212 and the second outer coil 224 are similarly configured.

When the dimension a in the Y direction is set to the same value, that is, 250 mm, the protrusion distance L ₁ of the conventional analysis electromagnet 40 is about 300 mm, whereas the protrusion distance L of the analysis electromagnet 200 is different. ₃ ) is about 110 mm.

For the same reasons as described above, even when the inner coils 206 and 212 and the outer coils 218 and 224 are arranged in duplicate, such as in the analysis electromagnet 200, the beams from the yoke 230 in the direction of incidence and radiation of the beam The protruding distance L ₄ of the outer coil 218 can be reduced. In the conventional analysis electromagnet 40, when the coils are arranged in double inside and outside, the protruding distance of the connection part greatly increases.

For the same reason as above, since the analysis electromagnet 200 can be miniaturized, the area required for installing the analysis electromagnet 200 can be reduced. In addition, the weight of the analysis electromagnet 200 may be reduced. In addition, the possibility that the magnetic field generated by the connections of the coils 206, 212, 218, 224 interfere with the shape of the ion beam 50 is reduced.

According to this configuration, the protruding distance of the connecting portion of the coils 206, 212, 218, and 224 can be reduced, and the length of the connecting portion can be shortened, thereby reducing the waste of power at the connecting portion.

As described above, the coils 206, 212, 218, and 224 have a structure in which the conductor sheets 268 and 269 are stacked with the insulating sheets 266 and 267 interposed therebetween. Thus, when compared to a multi-turn coil in which the sheath conductor is wound several times, the space factor of the conductor is high and the power loss is correspondingly low. As a result, power consumption can be reduced.

For example, consider the case where the dimension a in the Y direction of each coil is set to 250 mm. In the prior art, the dripping rate of the conductor of the multi-winding coil of the sheathed conductor is about 60 to 70% even when the conductor is not hollow (not the hollow conductor), and further decreases in the case of the hollow conductor. Alternatively, the droplet rate of the conductors of the coils 206, 212, 218, 224 may be set to about 84 to 85%.

As a result, in the analysis electromagnet 200, it is possible to generate a magnetic field of the required intensity with less power consumption than in the conventional analysis electromagnet 40. At the same power consumption, it is possible to generate a stronger magnetic field than that generated by the conventional analytical electromagnet 40. In the latter case, since the radius of curvature R of the ion beam deflection can be reduced, the analysis electromagnet 200 can be further miniaturized.

The dimension a in the Y direction of each coil is 250 mm, and a magnetic field of 0.2 tesla is generated by two coils 206 and 212 (coils 218 and 224 are not used) in the same manner as the conventional analytical electromagnet 40. In the case, the power consumption of the analysis electromagnet 40 is about 67 kW, whereas the power consumption of the analysis electromagnet 200 is only about 24 kW.

The ion implanter shown in FIG. 1 has an analytical electromagnet 200 having the features described above. Therefore, as the size of the analysis electromagnet 200 becomes smaller, the entire ion implanter can be downsized, so that the necessary area for installing the ion implanter can be reduced. The weight of the ion implanter can also be reduced. In addition, as the power consumption of the analysis electromagnet 200 decreases, the power consumption of the entire ion implanter may also be reduced.

In addition, since the analysis electromagnet 200 includes the first internal coil 206 and the second internal coil 212 as described above, compared to the case where one coil is used for each of the upper side and the lower side, The ion beam 50 with the large dimension Wy can be easily coped.

In addition, the first external coil 218 and the second external coil 224 may generate a sub magnetic field that supports or corrects the main magnetic field. Because of the sub magnetic field, the main magnetic field can be corrected, and the homogeneity of the magnetic flux density distribution in the Y direction can be improved. The sub magnetic fields 218 and 224 generated by the external coils 218 and 224 may be weaker than the main magnetic field and thus can be easily controlled.

Due to the above-described main and sub magnetic fields, it is possible to generate a magnetic field with high homogeneity in the magnetic flux density distribution in the Y direction in the beam path 202. As a result, fluctuations in the form of the ion beam 50 (bending, tilting, etc., which are equally applicable to the following) at the time of radiation from the analysis electromagnet 200 can be suppressed to a low level. This effect is more remarkable when the dimension Wy in the Y direction of the ion beam 50 is large.

Even when one first external coil 218 and one second external coil 224 are used, the effect of correcting the main magnetic field can be obtained. However, it is preferable to arrange the plurality of first outer coils 218 and the plurality of second outer coils 224 as in the example. In this case, the magnetic flux density distribution in the Y direction of the magnetic field generated in the beam path 202 can be more finely corrected by these external coils 218 and 224. Therefore, a magnetic field with higher homogeneity in the Y direction can be generated. As a result, fluctuations in the form of the ion beam 50 at the time of radiation can be suppressed to a lower level.

(2-5) Control Method of Analysis Electromagnet 200

An example of a control method of the analysis electromagnet 200 will be described. The current flowing through the first external coil 218 and the second external coil 224 allows the shape of the ion beam 50 radiated from the analysis electromagnet 200 to approach the shape of the ion beam 50 at the time of incidence. Can be controlled.

Specifically, the shape of the ion beam 50 radiated from the analysis electromagnet 200 is excessively inward of the radius of curvature R in the ion beam 50 radiated from the analysis electromagnet 200 with respect to the central axis. Reducing the current flowing through the first outer coil 218 and the second outer coil 224 corresponding to the bent portion, and the first outer coil 218 and the second outer portion corresponding to the portion lacking inward bending. By implementing at least one of increasing the current flowing through the coil 224, a form parallel to a predetermined center axis (center axis 318 shown in FIGS. 20 and 21) substantially parallel to the Y direction is approached. It is supposed to. For this reason, the ion beam 50 radiated | emitted from the analysis electromagnet 200 becomes a straight line which is not inclined, and has a form close to the form at the time of incidence.

20 and 21 show examples of the form of the ion beam 50 emitted from the analysis electromagnet 200, respectively. In the figure, the predetermined central axis substantially parallel to the Y direction is indicated by 318 , the plane of symmetry is indicated by 234 , the central trajectory of the ion beam 50 is denoted by 54 and the radius of curvature is denoted by R have.

In the case of the form shown in FIG. 20, the shape of the ion beam 50 is not shaken when viewed in the advancing direction of the ion beam 50, so that the first outer coils 218a to 218c and the second outer coils 224a to The value of the current flowing through 224c may be maintained.

In the case of the type shown in FIG. 21, the ion beam 50 is distorted (curved) in an arch shape similar to the L shape when viewed in the travel direction Z, that is, the curvature as it proceeds further upward in the Y direction. It bends more excessively toward the inside of the radius R and more excessively bent toward the inside as it proceeds further downward. Therefore, the current flowing through the first outer coil 218a is greatly reduced, the current flowing through the first outer coil 218b is slightly reduced, and the first outer coil 218c and the second outer coil 224c are reduced. The current flowing through is maintained at the current value, the current flowing through the second outer coil 224b decreases slightly, and the current flowing through the second outer coil 224a decreases significantly. As a result, while maintaining the position of the center trajectory 54 of the ion beam 50 radiated from the analysis electromagnet 200, the shape of the ion beam can be approximated to the form parallel to the central axis 318. That is, the shape can be made close to the shape shown in FIG.

If the shape of the ion beam 50 radiated from the analysis electromagnet 200 is shaken in a shape different from that shown in FIG. 21, the correction is performed in the same concept as that described above, and the shape is closer to the shape shown in FIG. 20. can do.

When the shape of the ion beam 50 radiated from the analysis electromagnet 200 is shaken, the following problem mainly occurs. According to the control method, such a problem can be prevented from occurring.

In general, the analysis slits 71 shown in FIGS. 1 and 27 are disposed downstream of the analysis electromagnet 200. The slit 72 of the analysis slit 70 is linear. Therefore, when the shape of the ion beam 50 is shaken, a portion cut by the analysis slit 70 occurs, and the amount of the ion beam 50 of a predetermined ion species passing through the analysis slit 70 decreases. Since the cleavage occurs, the homogenization of the ion beam 50 is impaired. Increasing the width of the slit 72 in the X direction to prevent such cutting occurs, the resolution is lowered.

In addition to the above-described problem of the analysis slit 70, when ion implantation is performed to the substrate 60 using the ion beam 50 whose shape is shaken, a problem arises that the homogeneous implantation is damaged.

(2-6) Another Example of Analysis Electromagnet 200

Next, another example of the analysis electromagnet 200 will be described. The same reference numerals are given to the same or corresponding parts as in the previous example shown in FIGS. 4 to 7 to avoid overlapping descriptions. The following description focuses on the differences from the previous examples.

Referring also to FIG. 22, the analysis electromagnet 200 shown in FIG. 24 avoids the set of body portions 322 and the beam path 202 facing each other in the X direction across the beam path 202. And a coil 320 having two sets of connecting portions 324 and 325 connecting the ends of the body portion 322 to each other in the Z direction, which bends the ion beam 50 in the X direction. Generates a magnetic field that causes Two connecting portions 324 on the upper side of FIG. 22 are one set of connecting portions, and two connecting portions 325 on the lower side are other sets of connecting portions.

As can be seen in FIG. 23, which shows the cross-sectional structure of the coil 320, the coil has the same cross-section as the first internal coil 206 (see FIG. 10) and the internal coil 292 (see FIG. 15) of the stack coil 290. Has a structure. That is, the coil 320 has notches 276 to 281 disposed on a fan-shaped cylindrical stack coil having the same structure as the internal coil 292 while leaving the main body 322 and the connecting portions 324 and 325. Has a structure. In addition, the coil 320 may be manufactured by the same manufacturing method as described above.

The coil 320 is configured as one coil in which the aforementioned first and second internal coils 206 and 212 (see FIG. 8) are vertically integrated with each other.

The shape of the notches 276 and 277 is similar to the shape of the notches 272 and 273 described above. The notches 278 and 279 have a surface symmetry with respect to the notches 276 and 277 about a symmetry plane (see FIG. 24). In detail, the notches 280 and 281 are through-holes, which form the inlet 238 and the outlet 240, respectively, and the ion beam 50 may pass through the notch. More specifically, ion beam 50 may pass through the notch through vacuum vessel 236.

The vacuum container 236 may pass through the coil 320 by inserting the vacuum container 236 in the Z direction through the notches 280 and 281. In this case, when a flange or the like is placed in the vacuum container 236 to interfere, the flange or the like is detached once. The analytical electromagnet 200 can be assembled by a similar method.

The connection part 324 has a structure similar to the connection part 210 of the first internal coil 206. The connection part 325 has a surface symmetry with respect to the connection part 324 about the symmetry plane 234.

The dimension a1 in the Y direction of the main body portion is substantially equal to the sum of the dimension c1 in the Y direction of the connecting portion 324 and the dimension c1 in the Y direction of the connecting portion 325 (that is, 2c1).

In the example analysis electromagnet 200, the coil 320 is also configured as one coil in which the above-described first and second internal coils 206 and 212 are integrated with each other. Therefore, for the same reason as described above, the protruding distance of the connecting portions 324 and 325 of the coil 320 from the yoke 230 is reduced, thereby obtaining the effect of miniaturizing the analysis electromagnet 200 and reducing power consumption.

The analysis electromagnet 200 shown in FIG. 25 includes first and second coils 326 and 328 that, in cooperation with each other, generate magnetic fields that cause the ion beam 50 to bend in the X direction. The coils 326 and 328 are similar in structure to the first and second internal coils 206 and 212 (see FIG. 8), respectively. Accordingly, the first and second coils 326 and 328 may also be manufactured by the same manufacturing method as described above.

In the example analysis electromagnet 200, the first and second coils 326 and 328 have a similar structure to the first and second internal coils 206 and 212. Therefore, for the same reason as described above, the protruding distance of the connection portion of the coil from the yoke 230 is reduced, thereby obtaining the effect of miniaturizing the analysis electromagnet 200 and reducing power consumption.

Since the analysis electromagnet includes the first and second coils 326 and 328, it is possible to easily cope with the ion beam 50 having a large dimension Wy in the Y direction.

The analysis electromagnet 200 shown in FIG. 26 has a structure similar to that of the coil 320 and an internal coil 330 that generates a main magnetic field that causes the ion beam 50 to be bent in the X direction, and configured as described above. And external to the inner coil 330 and including first and second outer coils 218 and 224 for generating a sub magnetic field that supports or corrects the main magnetic field. That is, instead of the first and second internal coils 206, 212 shown in FIG. 5 and the like, the analysis electromagnet includes an internal coil 330. Therefore, the inner coil 330 and the first and second outer coils 218 and 224 may be manufactured by the same manufacturing method as described above.

The characteristic matters at the time of manufacturing these coils are demonstrated. Using the stack coil 290 (see FIG. 14) in which the axial dimension (height) is set to a predetermined value, a notch similar to the notches 276 to 281 in FIG. 292, 294). In the external coil 294, a gap similar to the gap 248 shown in FIG. 7 is provided by a cutting process or the like, thereby forming the first and second external coils 218 and 224. In a manner similar to that of FIG. 7, each of the first and second outer coils 218, 224 is composed of a plurality of coils.

In the example shown in FIG. 26, the number of the first external coils 218 is two, but is not limited to two. The number of first outer coils is any number of one or more. The second outer coil 224 is similarly constructed.

The example analysis electromagnet 200 also includes an inner coil 330 and first and second outer coils 218, 224 configured as described above. Therefore, for the same reason as described above, the protruding distance of the connection portion of the coil from the yoke 230 is reduced, thereby obtaining the effect of miniaturizing the analysis electromagnet 200 and reducing power consumption.

The analysis electromagnet, in addition to the inner coil 330, includes first and second outer coils 218, 224 configured as described above. Therefore, a magnetic field with high homogeneity of the magnetic flux density distribution in the Y direction can be generated in the beam path 202 of the ion beam 50. As a result, fluctuations in the form of the ion beam 50 at the time of radiation can be suppressed to a low level. This effect is more remarkable when the dimension Wy in the Y direction of the target ion beam 50 is large.

Since the plurality of first outer coils 218 and the plurality of second outer coils 224 are arranged, the magnetic flux in the Y direction of the magnetic field generated in the beam path 202 by these outer coils 218 and 224. The density distribution can be calibrated more finely. Therefore, it is possible to generate a magnetic field with a higher homogeneity in the Y direction. As a result, fluctuations in the form of the ion beam 50 at the time of radiation can be suppressed to a lower level.

In addition, in the case where the ion implanter shown in FIG. 1 includes the analytical electromagnet 200 of each example, the entire ion implanter can be miniaturized in accordance with the miniaturization of the analytical electromagnet 200. Can be reduced. The weight of the analytical electromagnet can also be reduced. In addition, as the power consumption of the analysis electromagnet 200 is reduced, the power consumption of the entire ion implanter may be reduced.

(3) About the focus correcting lens 600, 610

Referring to FIG. 1, the ion beam 50 has a property of being spread by the space charge of the beam itself. Therefore, the position of the focus 56 of the small current ion beam 50 that can ignore the influence of the space charge is due to the difference in the way of diffusing the ion beam, and the large current ion beam 50 that cannot ignore the influence of the space charge. Significantly different from the location of the focus. Specifically, the focus 56 in the case of the large current ion beam 50 moves toward the downstream side as compared with the case of the small current ion beam 50. This is because the ion beam 50 spreads widely due to the space charge.

Thus, for example, even when the analysis slit 70 is disposed at the focal position of the small current ion beam, the focus 56 of the high current ion beam is deviated to the downstream side from the position of the analysis slit 70, and thus the ion beam Reduces the transmission efficiency and resolution.

In order to solve this problem, the focal correction lens 600, 610 that corrects the position of the focus 56 of the ion beam 50 with the position of the analysis slit 70 by the electrostatic field is ion source 100. And between the analysis electromagnet 200, the analysis electromagnet 200, and the analysis slit 70. The focus correcting lenses 600, 610 belong to the class of electric field lenses (in other words, electrostatic lenses, the same also applies below).

In the case where the focus correcting lens is disposed and the level of the beam current of the ion beam 50 generated from the ion source 100 is variable, for example, the analysis slit 70 has a relatively small beam current (eg, a variable range). Preferably near the focus 56 in the case of a minimum level.

The focus correcting lenses 600 and 610 will be described in detail with reference to FIGS. 28 to 39. 28 and 1 show that an ion implanter is disposed between a first focus correcting lens 600 disposed between an ion source 100 and an analysis electromagnet 200, and an analysis electromagnet 200 and an analysis slit 70. An example having the second focus correcting lens 610 is illustrated. Alternatively, only one of the focus correcting lenses 600, 610 may be disposed, or both lenses may be disposed and only one of them may be used.

When only one of the focus correcting lenses 600, 610 is disposed or only one of the lenses is used, the position of the focus 56 of the ion beam 50 by the focus correcting lenses 600, 610 is analyzed. Calibration to match the position of 70) is performed. In the case where the bifocal correction lenses 600 and 610 are disposed and the bifocal correction lenses 600 and 610 are used, the lenses cooperate with each other to analyze the position of the focus 56 of the ion beam 50 in the analysis slit 70. Perform the calibration to match the position of).

30 to 32 show examples of calibration. In the figure, the trajectory of the ion beam 50 before calibration is indicated by a double-dotted line, and the trajectory after calibration is indicated by a solid line.

30, no correction is performed, the ion beam 50 spreads in the X direction as indicated by the dashed line under the influence of the space charge, and the focus 56 is displaced toward the downstream side with respect to the analysis slit 70. In this case, the ion beam 50 is constrained in the X direction by the focus correcting lens 600 upstream of the analysis electromagnet 200, and the position of the focus 56 returns toward the upstream side, whereby the position Shows an example of performing a calibration that matches the position of the analysis slit 70.

FIG. 31 shows that the calibration is not carried out, the ion beam 50 spreads in the X direction as indicated by the dashed line under the influence of the space charge, and the focus 56 is displaced toward the downstream side with respect to the analysis slit 70. When it is, the ion beam 50 is constrained in the X direction by the focus correcting lens 610 downstream of the analysis electromagnet 200, and the position of the focus 56 returns toward the upstream side, whereby the position Shows an example of performing a calibration that matches the position of the analysis slit 70.

32, no correction is performed, the ion beam 50 spreads in the X direction as indicated by the double-dotted line under the influence of the space charge, and the focus 56 is displaced toward the downstream side with respect to the analysis slit 70. The ion beam 50 is constrained in the X direction at a specific level of step by the focus correcting lenses 600 and 610 upstream and downstream of the analysis electromagnet 200. 610 cooperates with one another to return the position of the focus 56 toward the upstream side, thereby performing an example of performing a calibration that matches the position of the analysis slit 70.

In this manner, the focus correcting lenses 600, 610 can perform a calibration that matches the position of the focus 56 of the ion beam 50 with the position of the analysis slit 70. Therefore, it is possible to prevent the focus 56 of the ion beam 50 from being separated from the position of the analysis slit 70 by the influence of the space charge. As a result, the transfer efficiency and resolution of the ion beam 50 can be improved while canceling the influence of the space charge.

The example of FIG. 30 is demonstrated compared with the example of FIG. In the case of the example of FIG. 30, the ion beam 50 may be constrained by the focus correcting lens 600 before the ion beam 50 spreads and collides with the wall of the analysis electromagnet 200 or the like and is thus lost. This has the advantage that the transmission efficiency of the beam 50 can be easily improved. Therefore, when one of the focus correcting lenses 600 and 610 is used (arranged), the focus correcting lens 600 is preferable. However, when the ion beam 50 is excessively constrained by the focus correcting lens 600, the current density of the ion beam 50 increases, the space charge effect increases, and thus the ion beam 50 easily spreads. have. Therefore special care is required.

To satisfy the above matters, as in the example of FIG. 32, the ion beam 50 may be confined in a shared state by the bifocal correction lenses 600 and 610. That is, the ion beam 50 may be constrained to a certain level (specifically, the level at which the ion beam 50 can efficiently pass through the analysis electromagnet 200) by the focus correcting lens 600 on the upstream side. And finally constrained by the focus correcting lens 610 on the downstream side. In the case of arranging and using the bifocal correcting lenses 600 and 610, the focus position of the ion beam 50 can be easily and surely corrected, and the transfer efficiency of the ion beam 50 can be improved. Therefore, the effect of improving both the transfer efficiency and resolution of the ion beam 50 becomes more remarkable while canceling the influence of the space charge.

Specific examples of the structure of the focus correcting lenses 600 and 610 will be described.

As shown in FIG. 28, the focus correcting lens 600 has an inlet electrode 602, an intermediate electrode 604, and an outlet electrode arranged in the advancing direction Z of the ion beam 50 while forming a gap therebetween. 606. As in the example of FIG. 29, the electrodes 602, 604, 606 oppose each other in the X direction across the gap through which the ion beam 50 passes and are substantially parallel to the major surface 52 of the ion beam 50. One electrode pair 602a, 602b; 604a, 604b; 606a, 606b. The electrodes 602a, 602b, 604a, 604b, 606a, 606b are disposed substantially perpendicular to the direction of travel Z of the ion beam 50. The electrodes 602a, 602b; 604a, 604b; 606a, 606b are either electrically connected to each other through a conductor or electrically connected to each other.

Referring to Figure 28, inlet and outlet electrodes [602, 606; Specifically, the electrodes 602a and 602b, 606a and 606b constituting the electrode are maintained at the same potential. In an example, the electrode is maintained at the bottom level. According to this configuration, the electric field can be prevented from protruding upstream and downstream in the Z direction of the ion beam 50 from the focus correcting lens 600. Therefore, it is possible to prevent the electric field from protruding and adversely affecting the ion beam 50 or the like.

The intermediate electrode 604 (in particular, the electrodes 604a and 604b constituting the electrode) is connected to a DC power supply 608 that applies a DC voltage V1 of a negative or positive (negative in the example shown in FIG. 28) to the electrode. . The potential of the intermediate electrode 604 (in this example, the potential with respect to the ground potential) is different from the potential of the inlet and outlet electrodes 602, 606 by the DC voltage V1 and the focus 56 of the ion beam 50. Is maintained at a potential that matches the position of the analysis slit 70. This may also be applied to the DC voltage V2 described later.

In the focus correcting lens 600, the inlet and outlet electrodes 602, 606 are maintained at the same potential, and the intermediate electrode 604 is maintained at a potential different from that of the inlet and outlet electrodes 602, 606. The focus correcting lens thus functions as a unipotential lens that constrains the ion beam 50. Therefore, the ion beam 50 may be constrained in the X direction without changing the energy of the ion beam 50.

Alternatively, the polarity of the DC power supply 608 may be reversed, and a positive DC voltage V1 may be applied to the middle electrode 604 of the focus correcting lens 600. Alternatively, the focus correcting lens 600 functions as a uniform potential lens and can confine the ion beam 50 in the X direction without changing the energy of the ion beam. When a positive DC voltage V1 is applied, electrons in the drift space without an electric field are attracted to the intermediate electrode 604, and the amount of electrons in the drift space decreases, resulting in an ion beam resulting from the space charge effect. 50) divergence is improved. In contrast, in the case of the negative DC voltage V1, such a phenomenon can be prevented from occurring. Therefore, it is preferable to apply a negative DC voltage V1 as in the example shown in FIG. This may also be applied to the DC voltage V2 described later.

As the absolute value (level) of the DC voltage V1 applied from the DC power supply 608 to the intermediate electrode 604 increases, the ion beam 50 can be more strongly constrained. The extent to which the ion beam 50 is constrained depends on the energy of the ion beam 50 as the beam passes through the focus correcting lens 600. The higher the energy of the ion beam 50, the smaller the deflection function applied to the ion beam 50 by the DC voltage V1. Therefore, in order to constrain the ion beam 50 strongly, the absolute value of the DC voltage V1 increases.

Referring to FIG. 29, the focus correcting lens 610 may include an inlet electrode 602 (a pair of electrodes 602a and 602b), an intermediate electrode 604 (a pair of electrodes 604a and 604b), and an outlet of the focus correcting lens 600. Inlet electrode 612 (pair of electrodes 612a, 612b), intermediate electrode 614; pair of electrodes 614a, 614b, and outlet electrode 616 that are configured similarly to electrodes 606; pair of electrodes 606a, 606b, respectively. A pair of electrodes 616a and 616b. The intermediate electrode 614 is connected to a DC power source 618 similar to the DC power source 608. The DC power supply 618 applies a negative or positive DC voltage V2 to the middle electrode 614 (in the example shown in FIG. 28). The structure and function of the focus correcting lens 610 and the DC power supply 618 are similar to the focus correcting lens 600 and the DC power supply 608. Therefore, the above description is cited, and overlapping descriptions are avoided.

In the case where the focus correcting lenses 600 and 610 have the structure of the above-mentioned universal lens, the focus correcting lenses 600 and 610 only perform the function of restraining the ion beam 50. If the analysis slit 70 is arranged near the focal point 56 when the beam current is relatively small as described above, the focusing function is performed by the restraining function of the focus correcting lenses 600 and 610 when the beam current is relatively large. 56 is prevented from moving downstream of the analysis slit 70. As a result, even when the level of the beam current of the ion beam 50 is changed, it can appropriately cope with it, and it is possible to prevent the focus 56 of the ion beam 50 from being separated from the position of the analysis slit 70. .

The result of the simulation of correcting the focus position of the ion beam 50 using the focus correcting lens 600 on the downstream side of the analysis electromagnet 200 will be described. Mass separation was performed under the following conditions while an ion beam 50 containing As + and having an energy of 13.5 keV and a beam current of 30 mA collided from the ion source 100 onto the analytical electromagnet 200.

(A) Space charge neutralization rate of the ion beam 50 is 100%

In this case, the space charge does not affect the ion beam 50. This is therefore the same as in the case of small current ion beams. At this time, the focus 56 of the ion beam 50 is formed at a position separated by about 640 mm downstream from the outlet of the analysis electromagnet 200. In this simulation, the analysis slit 70 is not arranged, but the analysis slit 70 will be placed at a position of 640 mm in the actual ion implanter. An example of the beam current distribution of the ion beam 50 in the X direction is shown in FIG. 33. In the figure, the ordinate indicates the accumulated value of the current in the Y direction per 1 mm in the X direction. That is, since the ion beam 50 has a ribbon shape long in the Y direction, the ordinate indicates the current value obtained by accumulating the Y-direction current per mm in the X direction of the beam. In short, the figure corresponds to the current density distribution in the X direction. This may also apply to the ordinates of FIGS. 34 and 35.

In this case, the half-value width of the beam current is about 22 mm, and the resolution m / Δm of the mass spectrometry by the analysis electromagnet 200 is about 27.3.

(B) When the space charge neutralization rate of the ion beam 50 is 95% and the focus correcting lens 600 does not work

In this case, the ion beam 50 is spread by the influence of the space charge. This is therefore the same as in the case of high current ion beams. At this time, the focus 56 of the ion beam 50 is formed at a position separated by about 1,300 mm downstream from the outlet of the analysis electromagnet 200. An example of the beam current distribution of the ion beam 50 in the X direction is shown in FIG. 34.

In this case, the half width of the beam current is about 95 mm, and the resolution m / Δm of the mass spectrometry by the analysis electromagnet 200 is about 7.1.

(C) When the space charge neutralization rate of the ion beam 50 is 95%, and the focus position correction is performed by the focus correcting lens 600

In this case, the focus 56 of the ion beam 50 is applied to the intermediate electrode 604 of the focus correcting lens 600 such that it is formed at a position about 640 mm downstream from the outlet of the analysis electromagnet 200. DC voltage (V1) was adjusted. At this time, the DC voltage V1 was -10 kV. An example of the beam current distribution of the ion beam 50 in the X direction at a position of 640 mm is shown in FIG. 35.

In this case, the half width of the beam current is about 42 mm, and the resolution m / Δm of the mass spectrometry by the analysis electromagnet 200 is about 16. In comparison with the case of (B), the resolution was improved more than twice.

Next, control of the DC voltages V1 and V2 applied to the focus correcting lenses 600 and 610 will be described.

As shown in the example of FIG. 28, for example, arrow H shows a movable first beam current measuring device 620 that receives the ion beam 50 passing through the analysis slit 70 and measures the beam current IF. Move as indicated by and insert into the path of the ion beam 50 downstream of the analysis slit 70. For example, the beam current measuring device 620 is a Faraday cup. Preferably, the beam current measuring device 620 has a width Kx in which the entire ion beam 50 passing through the analysis slit 70 collides in the X direction. When the ion beam 50 has a ribbon shape with respect to the Y direction, one beam current measuring device 620 can be used when measuring at one point in the Y direction. When measuring at several points in the Y direction, the beam current measuring device 620 may be a multi-point beam current measuring device in which a plurality of measuring devices (for example, Faraday cups) are arranged side by side in the Y direction, and one beam current It may have a structure for moving the measuring device 620 in the Y direction.

Thereafter, the DC voltages V1 and V2 output from the DC power supplies 608 and 618 are adjusted so as to maximize the beam current IF measured by the beam current measuring apparatus 620. That is, the DC voltage V1 is adjusted when the focus correcting lens 600 is used, the DC voltage V2 is adjusted when the focus correcting lens 610 is used, and the focus correcting lenses 600 and 610 are adjusted. If is used, adjust the DC voltages V1 and V2. Specifically, as described above, since the DC voltages V1 and V2 may be negative or positive, the absolute values | V1 | and | V2 | are adjusted. Therefore, the DC voltages V1 and V2 with the maximum beam current IF are maintained.

36 shows an example of the change of the beam current IF when the absolute value | V1 | of the DC voltage V1 is adjusted. When the position of the focal point 56 of the ion beam 50 coincides with the analysis slit 70, such a curve is obtained because the amount of the ion beam 50 passing through the analysis slit 70 is maximized. In this example, the voltage V1a from which the maximum beam current IF is obtained is maintained. Even when the absolute value | V2 | of the DC voltage V2 is adjusted, a curve similar to the above curve is obtained.

FIG. 37 shows an example of the change of the beam current IF when the absolute values of the DC voltages V1, V2 are adjusted. In this example, the plurality of absolute values V1b, V1c, V1d of the DC voltage V1; Absolute value is not limited to these values] is used as a parameter, and the absolute value | V2 | of the DC voltage V2 is changed. Therefore, DC voltages V1 and V2 with the maximum beam current IF can be obtained. In this example, the voltages V1d and V2a from which the maximum beam current IF is obtained are maintained. Unlike the case of FIG. 37, a plurality of absolute values of the DC voltage V2 are used as parameters, and the absolute values of the DC voltage V1 may be changed.

According to the adjustment method, when the position of the focus 56 of the ion beam 50 coincides with the analysis slit 70, the beam current IF is maximum. Therefore, it is possible to easily perform the calibration of matching the focus position of the ion beam 50 with the analysis slit 70 by the focus correcting lenses 600 and 610.

The ion implanter is a DC voltage output from the DC power supply 608, 618, which is controlled by the control content similar to the above-described adjustment method so that the beam current IF measured by the beam current measuring device 620 is maximized. V1, V2) (specifically, these absolute values | V1 | and | V2 |) may further include a first focus control device 622 (see FIG. 28). According to this structure, a calibration that matches the focal position of the ion beam 50 with the analysis slit 70 can be performed in a power saving manner.

As shown in the example of FIG. 38, a second beam current measuring device 624 for measuring the beam current IS flowing through the analysis slit 70 is used, and the DC voltage output from the DC power supplies 608 and 618. (V1, V2) (specifically, these absolute values | V1 | and | V2 |) are adjusted so that the beam current IS measured by the second beam current measuring device 624 is maximized. In this case, the analysis slit 70 is electrically insulated from a structure such as a vacuum vessel, and grounded via the second beam current measuring device 624. Examples in which the DC voltages V1 and V2 are used individually or in combination are the same as the above examples.

FIG. 39 shows an example of the change of the beam current IS when the absolute value | V1 | of the DC voltage V1 is adjusted. When the position of the focal point 56 of the ion beam 50 coincides with the analysis slit 70, such a curve is obtained because the amount of the ion beam 50 impinging on the analysis slit 70 is minimal. In this example, the voltage V1e from which the minimum beam current IS is obtained is maintained. Even when the absolute value | V2 | of the DC voltage V2 is adjusted, a curve similar to the above curve is obtained.

When one of the DC voltages V1, V2 is used as a parameter and the other is changed, a curve similar to that in which the curve of FIG. 38 is valley-inverted is obtained.

According to the adjustment method, when the position of the focal point 56 of the ion beam 50 coincides with the analysis slit 70, the measured beam current IS is minimum. Therefore, the correction for matching the focus position of the ion beam 50 with the analysis slit 70 can be easily performed by the focus correcting lenses 600 and 610.

The ion implanter is provided with a DC voltage output from the DC power supply 608, 618, which is controlled by control similar to the above-described adjustment method so that the beam current IS measured by the beam current measuring device 624 is minimized. V1, V2) (specifically, these absolute values | V1 | and | V2 |) may further include a second focus control device 622 (see FIG. 38). According to this structure, a calibration that matches the focal position of the ion beam 50 with the analysis slit 70 can be performed in a power saving manner.

(4) About the acceleration / deceleration device 400

The acceleration / deceleration device 400 shown in FIG. 1 deflects the ion beam 50 passing through the analysis slit 70 in the X direction by the electrostatic field, and accelerates or decelerates the ion beam 50 by the electrostatic field. Let's do it. Preferably, the acceleration / deceleration device 400 is disposed on the downstream side as far as possible to effectively exert the effect of suppressing the energy pollution described later. In the example shown in FIG. 1, the acceleration / deceleration device is arranged between the analysis slit 70 and the injection position, ie between the analysis slit 70 and the substrate drive device 500.

In providing the acceleration / deceleration device 400, the acceleration / deceleration device 400 may not only accelerate / decelerate the ion beam 50 but may also deflect the ion beam 50 in the X direction. Therefore, the ion beam 50 of predetermined energy can be selectively induced, and energy contamination (mixing of unwanted energy ions) can be suppressed. In addition, these effects can be realized by one acceleration / deceleration device 400. Therefore, the delivery path of the ion beam 50 can be shortened as compared with the case where the energy analyzer is arranged separately. Therefore, the transmission efficiency of the ion beam 50 can be improved. Especially when the ion beam 50 has a low energy and a large current, the ion beam 50 during transmission is easily diverged by the space charge effect. Therefore, the effect of shortening the transmission distance becomes remarkable.

40 shows a more specific example of an acceleration / deceleration device 400. The acceleration / deceleration device 400 includes first to third electrodes 402 arranged in the order of the first electrode 402, the second electrode 404, and the third electrode 406 in the traveling direction starting from the upstream side. , 404, 406. In an example, each electrode has openings 412 and 416 extending in the Y direction, through which ion beam 50 flows. In an example, electrode 402 consists of one electrode. Alternatively, the electrode may consist of two electrodes with the same potential interposed between them and in the X direction. The same can be applied to the electrode 406. The electrode 404 has a gap 414 extending in the Y direction, and the ion beam 50 flows through the gap.

A potential V1 with respect to the ground potential is applied to the first electrode 402. In general, the potential V1 is a high potential of positive (acceleration mode) or negative (deceleration mode).

When the potential is applied to the electrodes 402, 404, 406 or the electrode members 404a, 404b described below, if the potential is a value other than OV, voltage application means corresponding to the electrode (for example, from a DC power supply or a DC power supply) Potential is supplied from a voltage distribution resistor or the like (not shown) for distributing the voltage of the same. When the potential is 0 V, the corresponding electrode is grounded.

In general, the second electrode 404 is set to a potential that is at a level between the first electrode 402 and the third electrode 406. In the case of known electrostatic acceleration tubes, the second electrode 404 consists of a single electrode. In this example, the second electrode is configured to be separated into two electrode members 404a and 404b facing each other in the X direction across the path of the ion beam 50. Further, different potentials V2a and V2b; V2a? V2b are applied to the electrode members 404a and 404b, respectively, so that the ion beam 50 is deflected in the X direction. Specifically, a potential V2b lower than the potential V2a of the counter electrode 404a (counter electrode) is applied to the electrode member 404b on the side where the ion beam 50 is deflected, or is set to V2b <V2a. . Means for applying such a potential are as described above.

A gap 414 flowing through the ion beam 50 is disposed between the two electrode members 404a and 404b constituting the electrode 404. Preferably, the gap 414 bends in the deflection direction of the ion beam 50 as in this example. Specifically, the gap bends along the trajectory of ions 418 having a particular energy, ie specifically the desired energy after deflection. According to this structure, the ion beam 50 composed of the ions 418 having the desired energy can be efficiently induced.

A potential V3, which is generally 0 V, is applied to the third electrode 406. That is, the third electrode is grounded.

Preferably, the third electrode 406 downstream of the second electrode 404 is disposed along the trajectory of ions 418 having a particular energy, specifically the desired energy after deflection by the electrode 404. . According to this structure, the ions 418 having the desired energy can be efficiently induced, and the ions 420 and 422 having energy other than the desired energy and the neutral particles 424 are efficiently carried out by the electrode 406. Can be blocked. Therefore, energy pollution can be suppressed more efficiently.

The difference between the potentials V2a and V2b applied to the electrode members 404a and 404b constituting the electrode 404 is that the ion 418 having the desired (target) energy is the central trajectory of the acceleration / deceleration device 400. And, specifically, to pass through a central trajectory (more specifically, the gap 414 and the opening 416) of the electrodes 404, 406, including a second electrode 404 having a deflection function.

Table 1 collectively shows an example of the electrode and the potential applied to the electrode. Examples 1 and 2 are in an acceleration mode in which the ion beam 50 is accelerated by the acceleration / deceleration device 400, and example 3 is in a deceleration mode in which the ion beam 50 is decelerated. In the case of Example 1, acceleration energy of 30 keV can be realized, and in case of Example 2, acceleration energy of 130 keV can be realized. In the case of Example 3, acceleration energy of 8 keV can be realized. In any case, the potential V2b of the electrode member 404b, which is one electrode constituting the second electrode 404, is set lower than the potential V2a of the counter electrode 404a.

Potential V1 [kW] Potential V2a [kW] Potential V2b [kW] Potential V3 [kW] Example 1 30 0 -48 0 Example 2 130 100 52 0 Example 3 -8 0 -One 0

According to the acceleration / deceleration device 400, the ion beam 50 may be deflected by a second electrode 404 composed of two electrode members 404a and 404b and to which different potentials V2a and V2b are applied. . At this time, since the amount of deflection depends on the energy of the ion beam 50 at the time of deflection, the ions 418 having the desired energy can be separated from the ions 420 and 422 having different energies. The ions 420 are ions having energy lower than the desired energy, and the deflection amounts of these ions are larger than the deflection amounts of the ions 418. The ions 422 are ions having energy higher than the desired energy, and the deflection amounts of these ions are smaller than the deflection amounts of the ions 418. Neutral particles 424 may be separated because they travel in a straight line without being deflected. That is, since the acceleration / deceleration apparatus 400 exhibits an energy separation function, the acceleration / deceleration apparatus 400 can selectively induce the ion beam 50 composed of the ions 418 having the desired energy, and can suppress energy contamination. In an example, ions 420 and 422 other than ions 418 having the desired energy and neutral particles 424 impinge on electrode 406 downstream of second electrode 404, thereby blocking these ions. And removed.

In addition, the acceleration / deceleration device 400 also exhibits the original function of accelerating or decelerating the ion beam 50 in addition to the energy separation function described above. Since these functions can be realized by a single acceleration / deceleration device 400, it is not necessary to arrange the energy separator separately. When compared with the case where the energy separator is installed separately, the delivery path of the ion beam 50 can be shortened. Therefore, the transmission efficiency of the ion beam 50 can be improved.

In addition, the ion beam 50 may be accelerated between two stages, ie between the electrodes 402 and 404, and between the electrodes 404 and 406. Example 2 of Table 1 shows an example of such a case. Prior to acceleration in subsequent stages (ie, during low energy periods), ion beam 50 may be deflected by electrode 404. In comparison with the case where deflection is performed after full acceleration, the ion beam 50 can be easily deflected. Specifically, the difference between the potentials V2a and V2b applied to the two electrode members 404A and 404B constituting the electrode 404 can be made small. As a result, there is an advantage that electrical insulation is facilitated in the vicinity of the electrode 404.

Ions and neutral particles other than ions 418 having the desired energy may be blocked and removed by electrode 406 downstream of electrode 404. Therefore, energy pollution can be suppressed more efficiently. In particular, in the deceleration mode (see Example 3 in Table 1), it is easy for the neutral particles 424 to be generated by the charge conversion during the deceleration of the ion beam 50 between the electrode 402 and the electrode 404. It is known empirically. Even when many neutral particles 424 occur, these particles travel in a straight line and impinge on the electrode 406 to be blocked. Thus, the neutral particles 424 can be effectively removed from the acceleration / deceleration device 400.

In the acceleration mode, electrons are generally radiated, ions with energies other than the desired energy are accelerated from the location of the colliding electrode to the higher potential side, and X-rays with high energy corresponding to those accelerated electrons are accelerated. The electrons arise from the part of the electrode that collides. Known electrostatic acceleration tubes do not have a deflection function. Thus, the accelerated electrons can reach the high potential electrode (the electrode corresponding to the electrode 404) without being bent, and are accelerated by the large energy corresponding to the potential of the higher potential electrode to the higher potential electrode. Since they collide, X-rays having high energy are generated therefrom.

Alternatively, as in the acceleration / deceleration device 400, the second electrode 404 is composed of two electrode members 404a and 404b, and different potentials are applied to the electrode member, whereby an electrode having a deflection function is provided. Is provided. According to this structure, electrons emitted from the location where the ions with unwanted energy collide with each other are bent by the electrode 404 and thus cannot reach the higher potential electrode 402. Specifically, the electrons are bent toward the electrode member 404a having the higher potential among the two electrode members 404a and 404b constituting the electrode 404 and then collide with the electrode member 404a. At this time, the acceleration energy of the electron is the energy corresponding to the potential of the electrode member 404a, which is lower than when the electron collides with the electrode 402 of higher potential. For example, as in Example 1 of Table 1, the energy of the colliding electrons is about 0 eV and X-rays are substantially not generated. In the case of Example 2, the energy is about 100 keV, which is lower than about 130 keV when the electrons strike the electrode 402. In any case, therefore, the energy of the generated X-rays may be lower than the energy in known electrostatic acceleration tubes.

If necessary, other electrodes can be arranged upstream of the electrode 402 or downstream of the electrode 406. For example, a high potential electrode for accelerating or decelerating the ion beam 50 may be disposed upstream of the electrode 402. An electrode of negative potential for suppressing reversed electrons may be disposed downstream of the electrode 406.

(5) About the orbital control lenses 700a and 700b

In the ion implanter which irradiates the substrate 60 with the ribbon type ion beam 50 to perform ion implantation, an orbital state (for example, a state diverging or converging in parallel) in the longitudinal direction of the ion beam is important. Do. In order to carry out high-density ion implantation into a large area (eg substantially the entire surface) of the substrate 60, it is important to have a parallel relationship in the Y direction of the ion beam 50.

In order to satisfy this, the following orbital control lenses 700a and 700b may be disposed between the analysis electromagnet 200 and the acceleration / deceleration device 400. Orbital control lenses 700a and 700b belong to the class of electric field lenses.

In the example shown in FIG. 1, the orbital control lens 700a is disposed between the analysis slit 70 and the acceleration / deceleration device 400 in the Y direction by an electrostatic field with an ion beam 50 passing through the lens. It is. However, the trajectory control lens 700a may be disposed between the analysis electromagnet 200 and the analysis slit 70 (when the focus correcting lens 610 is disposed). The same applies to the track control lens 700b described later.

Referring also to FIG. 41, the orbital control lens 700a is formed in the middle of the inlet electrode 702, which is arranged in series in the advancing direction Z of the ion beam 50 while forming gaps 708 and 710 therebetween. An electrode 704 and an outlet electrode 706 are provided. The length in the Y direction of the electrodes 702, 704, 706 is slightly larger than the dimension Wy in the Y direction of the ion beam 50 passing through, for example, about 400 to 500 mm. For example, the distance of the gaps 708, 710 in the Y plane is about 40-50 mm. However, the dimensions are not limited to these values.

The inlet electrode 702 has a pair of electrodes 702a and 702b facing each other in the X direction across the gap 712 through which the ion beam 50 passes. The intermediate electrode 704 has a pair of electrodes 704a and 704b facing each other in the X direction across the gap 714 through which the ion beam 50 passes. The outlet electrode 706 has a pair of electrodes 706a and 706b facing each other in the X direction across the gap 716 through which the ion beam 50 passes. The dimension in the X direction of the gaps 712, 714, 716 is determined according to the dimension Wx of the X direction of the ion beam 50 passing through, for example, about 50 to 100 mm. However, the dimensions are not limited to these values.

The electrodes 702a and 702b are electrically connected to each other and set to the same potential by conductive means such as lead wires (not shown). The electrodes 704a and 704b have a similar structure. The electrodes 706a and 706b have a similar structure.

On the upstream and downstream surfaces of the advancing direction Z of the ion beam 50, the intermediate electrode 704 has convex surfaces 720 and 722 that are arcuately curved in the Y direction. In the example, the convex surfaces 720 and 722 are not curved in the X direction. The inlet and outlet electrodes 702 and 706 extend along the convex surfaces 720 and 722 of the intermediate electrode 704 (specifically, form a constant gap) on a surface opposite the convex surfaces 720 and 722. And concave surfaces 718, 724, which extend while extending. Therefore, the gaps 708 and 710 are also arcuately curved in the Y-direction, and are not curved in the X-direction.

The inlet and outlet electrodes 702 and 706 are electrically connected to each other by conductive means such as lead wires and maintained at the same potential. In the example, electrodes 702 and 706 are maintained at ground potential. According to this structure, the electric field can be prevented from protruding upstream and downstream in the Z direction of the ion beam 50 from the orbital control lens 700a. Therefore, it is possible to prevent the electric field from protruding and adversely affecting the ion beam 50 or the like.

The intermediate electrode 704 is a potential different from the potentials of the inlet and outlet electrodes 702 and 706 and causing the orbital state in the Y direction of the ion beam 50 derived from the orbital control lens 700a to become a predetermined state. maintain. 42 to 45, an example of an orbital state will be described below. A variable voltage DC power supply 732 that maintains the intermediate electrode 704 at such a potential is connected between the inlet and outlet electrodes 702 and 706 and to the intermediate electrode 704. In the example of FIG. 41, the direction of the DC power supply 732 is set so that the middle electrode 704 side becomes negative. Alternatively, the direction may be reversed.

In the track control lens 700a, the inlet and outlet electrodes 702 and 706 are maintained at the same potential, and the intermediate electrode 704 is maintained at a potential different from that of the inlet and outlet electrodes 702 and 706. The lens thus functions as a unipotential lens. When the ion implanter includes the orbital control lens 700a, the orbital state in the Y direction of the ion beam 50 can be set to a desired state without changing the energy of the ion beam 50. Explain such an example.

42 shows that when the intermediate electrode 704 is maintained at a potential lower than the potential of the inlet and outlet electrodes 702, 706, specifically the inlet and outlet electrodes 702, 706 are held at 0 V and the intermediate electrode ( Equipotential lines near the gaps 708 and 710 between the electrodes in the YZ plane (i.e., coordinates X = 0) of the central region in the X direction of the orbital control lens 700a when 704 V is applied to 704. 728 shows an example of a distribution. Equipotential lines 728 that are curved in the form of convex lenses are formed.

When the ions constituting the ion beam 50 collide with the orbital control lens 700a having the distribution of the equipotential lines 728, a convergence effect occurs in the Y direction. For example, this allows the divergent incident ion beam to be directed as a parallel beam. Alternatively, parallel incident ion beam 50 may be directed as a converging beam. When the negative potential of the intermediate electrode 704 is further enhanced, the diverging incident ion beam 50 can be directed as a diverging beam. When the potential of the intermediate electrode 704 is set or reversed as a positive potential, it is possible to divert the ion beam 50 in the Y direction.

43 and 44, a voltage of 0 V is applied to the inlet and outlet electrodes 702 and 706, a voltage of -15,000 V is applied to the intermediate electrode 704 similarly as described above, and an energy of 15 keV is applied. An example where the ion beam 50 which consists of monovalent arsenic (As) ions (atomic weight 75 AMU) which has is collided with the orbital control lens 700a is shown. Although not shown, an equipotential line similar to that shown in FIG. 42 is formed near the gaps 708, 710 in FIGS. 43 and 44. In the same manner as in FIG. 42, FIGS. 43 to 45 and 47 show the YZ plane with coordinates of X = 0.

43 shows an example in which the incident ion beam 50 diverging in the Y direction is guided as a parallel beam. In the example, the divergence angle of the incident ion beam 50 is ± 1 degree to ± 9 degrees (the central region in the Y direction is ± 1 degree, and the angle is increased in steps of 1 degree as the beam deviates in the vertical direction). . In the specification, the parallel beam means ions whose trajectories (advancing directions) of the ion beam 50 derived from different positions in the Y direction are substantially parallel to each other, as shown in FIG. 43. In the example, the beam is also parallel in the Z direction, which is the advancing direction of the entire ion beam 50.

FIG. 44 shows an example in which the incident ion beam 50 is guided as a converging beam, which is parallel in the Y direction (i.e., the divergence angle is 0 degrees, and equally applies below). The ion beam 50 has a property that the beam is diverged by the space charge effect. Especially in the ion beam 50 with low energy and large beam current, such a characteristic appears strong. Therefore, as in the example, when the convergent ion beam 50 is taken from the orbital control lens 700a and balanced by divergence due to the space charge effect between the orbital control lens 700a and the substrate 60 (offset) At that time, the ion beam 50 incident on the substrate 60 may be formed as a substantially parallel beam.

45 is composed of monovalent arsenic (As) with a voltage of 0 V applied to the inlet and outlet electrodes 702, 706, a voltage of +10,000 V applied to the intermediate electrode 704, and an energy of 15 keV. And an example in which the ion beam 50 parallel in the y direction is guided as a diverging beam similarly to the above. A beam diverging means is disposed downstream of the trajectory control lens 700a. The divergence due to the former and the convergence due to the latter are combined with each other so that the ion beam 50 can be formed as a parallel beam. According to this structure, the dimension in the Y direction of the ion beam 50 can be further increased.

When the ion implanter includes the orbital control lens 700a, the orbital state in the Y direction of the ion beam 50 can be set to a desired state without changing the energy of the ion beam 50. For example, the ion beam 50 may be formed as a parallel beam, and may lead to an ion beam 50 having a high degree of parallelism. Thus, for example, when the ion beam is formed as a parallel beam, the case where the energy of the ion beam 50 is not changed is a preferable example.

For example, when the ion beam 50 derived from the orbital control lens 700a is formed as a parallel beam, highly homogeneous ion implantation can be performed in a large area (eg, substantially the entire surface) of the substrate 60. In addition, it is possible to prevent the shaded portion in which the ion beam 50 does not collide with the microstructure on the surface of the substrate 60.

In addition, the intermediate electrode 704 constituting the orbital control lens 700a has convex surfaces 720 and 722 curved in the Y direction as described above, and the inlet and outlet electrodes 702 and 706 have convex surfaces. And concave surfaces 718 and 724 extending along. Therefore, the homogeneity in the Y direction of the electric field can be greatly improved in the gaps 708 and 710 between the electrodes (see FIG. 42). As a result, even when the dimension in the Y direction is large, the orbital state in the Y direction of the ion beam 50 can be set to a desired state having high homogeneity. Thus, an example using the ribbon ion beam 50 is particularly preferred. When the concave surfaces 718 and 724 of the inlet and outlet electrodes 702 and 706 are flat, or the convex surfaces 720 and 722 of the intermediate electrode 704 are flat, the equipotential lines (&quot; Since nonuniformity, narrowness, or wideness in the Y direction occurs between the gaps in 728, the homogeneity in the Y direction of the electric field in the gaps 708, 710 is low.

46 is a perspective view illustrating another example of the trajectory control lens with the power supply. The track control lens 700b may be used instead of the track control lens 700a. The same reference numerals are given to portions corresponding to or corresponding to those of the track control lens 700a shown in FIG. 41 and the like. In the following description, a description will be given focusing on a different point from the orbital control lens 700a.

On the upstream and downstream sides of the advancing direction Z of the ion beam 50, the intermediate electrode 704 constituting the trajectory control lens 700b has a concave surface 721, 723 that is arcuately curved in the Y direction. . In the example, the projections 721 and 723 are not curved in the X direction. The inlet and outlet electrodes 702 and 706 extend along the concave surfaces 721 and 723 of the intermediate electrode 704 on a surface corresponding to the concave surfaces 721 and 723 (specifically, extending at regular intervals). Convex surfaces 719 and 725 are provided. Therefore, the gaps 708 and 710 are curved in an arcuate direction in the Y direction, but are not curved in the X direction.

The intermediate electrode 704 is a potential different from the potentials of the inlet and outlet electrodes 702 and 706 and causing the orbital state in the Y direction of the ion beam 50 derived from the orbital control lens 700b to become a predetermined state. maintain. An example of the orbital state will be described later with reference to FIG. 47. A variable voltage DC power supply 732 that maintains the intermediate electrode 704 at such a potential is connected between the inlet and outlet electrodes 702 and 706 and to the intermediate electrode 704. In the example of FIG. 46, the direction of the DC power supply 732 is set so that the intermediate electrode 704 side is positive. Alternatively, the direction may be reversed.

In the vicinity of the track control lens 700b, an equipotential line curved in the form of a concave lens is formed as opposed to that shown in FIG.

Even in the track control lens 700b, the inlet and outlet electrodes 702 and 706 are maintained at the same potential, and the intermediate electrode 704 is maintained at a potential different from that of the inlet and outlet electrodes 702 and 706. The lens thus functions as a unipotential lens. When the ion implanter includes the orbital control lens 700b, the orbital state in the Y direction of the ion beam 50 can be set to a desired state without changing the energy of the ion beam 50.

When ions collide with the orbital control lens 700b, a convergence effect in the Y direction occurs. For example, due to this, as shown in FIG. 47, the divergent incident ion beam 50 is guided as a parallel beam. FIG. 47 shows that when the intermediate electrode 704 is maintained at a potential higher than the potential of the inlet and outlet electrodes 702, 706, or specifically the inlet and outlet electrodes 702, 706 are maintained at 0 V, An example in the case where a voltage of +15,000 V is applied to the electrode 704 is shown. The ion beam 50 is composed of monovalent arsenic ions having an energy of 15 keV. The divergence angle of the incident ion beam is ± 1 degree to ± 9 degrees.

In addition, the trajectory control lens 700b may transmit the parallel incident ion beam 50 as a convergent beam. When the positive potential of the intermediate electrode 704 becomes stronger, the divergent incident ion beam 50 can be guided as a converging beam. When the polarity of the intermediate electrode 704 is reversed to that described above or set to a negative potential, the ion beam 50 can diverge in the Y direction.

Since the functions and effects of the track control lens 700b other than those described above are the same as those of the track control lens 700a described above, redundant description will be omitted.

(6) About the homogenizing lens 750

Instead of the track control lenses 700a and 700b, a homogenizing lens 750 as in the example shown in FIGS. 48 and 49 may be disposed. Homogenized lens 750 belongs to the class of electric field lenses.

The homogenizing lens 750 is disposed between the analysis electromagnet 200 and the acceleration / deceleration device 400. Specifically, the homogenizing lens is disposed between the analysis slit 70 and the acceleration / deceleration device 400 (for example, between the focus correction lens 610 and the analysis slit 70 when the focus correcting lens 610 is disposed). It may be disposed, or may be disposed between the analysis electromagnet 200 and the analysis slit 70.

The homogenizing lens 750 has a plurality of electrode pairs (for example, ten) arranged in plural in the Y direction. In each pair, the pair of electrodes 752 (electrode pair) oppose each other in the X direction across the ion beam 50. In the example shown, for each pair of electrodes 752, the vicinity of the opposing tip ends has a semi-cylindrical or semi-columnar shape, or alternatively constitutes a plate electrode (parallel plate electrode). As shown in Fig. 49, two electrodes 752 paired opposite to each other are electrically connected in electrical conduction in parallel with each other. In FIG. 49, the wire for parallel connection may appear to cross the ion beam 50. This is for illustration only. In practice, the wire does not cross the ion beam 50.

As an example of the homogenizing lens power source for applying independent DC voltages between the reference potential part (ground potential part) and the electrode pairs in the above-described stage, an independent variable voltage homogenizing lens power source 754 is respectively applied to the electrode pairs in the stage. It is arranged. That is, the number of homogenizing lens power sources 754 is equal to the number of electrode pairs. Instead of this structure, for example, a single homogenizing lens power source formed by integrating a plurality of power sources into one unit can be used, and the DC voltage applied to the electrode pair can be controlled independently.

As the DC voltage applied to the electrode pair, a negative voltage is more preferable than a positive voltage. When using a negative voltage, the electrons in the plasma which exist around the ion beam 50 can be prevented from being attracted to the electrode 752 together with the ion beam. When electrons are drawn, divergence of the ion beam 50 due to the space charge effect is enhanced. This can be prevented from occurring.

When adjusting the DC voltage applied to the electrode pair, an electric field EY in the Y direction (the electric field EY in FIG. 49 shows an example) is generated in the path of the ion beam 50, and the ion beam 50 is removed. The constituent ions may be bent in the Y direction according to the intensity of the electric field EY.

Therefore, because of the homogenizing lens 750, a plurality of orbits in the Y direction of the ion beam 50 can be bent in the Y direction by the electrostatic field, and can homogenize the beam current density distribution in the Y direction of the ion beam at the injection position. have. As a result, the homogeneity of ion implantation on the substrate 60 can be further improved. This effect is more remarkable when the Y direction dimension of the board | substrate 60 and the ion beam 50 is large.

The beam measuring device 80 and the homogenization control device 90 for measuring the beam current density distribution in the Y direction of the ion beam 50 at the injection position can be arranged, and the following control can be performed using these devices ( See FIG. 1).

In the example, the beam measuring device 80 is a multi-point beam measuring device in which a plurality of measuring devices (eg, Faraday cups) for measuring the beam current of the ion beam 50 are arranged side by side in the Y direction. Alternatively, a structure in which one beam measuring device moves in the Y direction by the moving mechanism may be adopted. After the measurement information D1 indicating the beam current density distribution is output from the beam measuring device 80, it is supplied to the homogenization control device 90. The measurement information D1 is composed of a set number of plural or n1 (n1 equals to the number of Faraday cups) measurement information.

On the basis of the measurement information D1 from the beam measuring device 80, the homogenization control device 90 determines the number of control signals S2 of plural or n2 (n2 is equal to the number of electrode pairs). 754 to control each homogenizing lens power source 754, thereby controlling the homogenization improvement of the beam current density distribution. Specifically, when there is a low current density region in which the beam current density is lower than the current density in another region, the homogenization control device 90 lowers the voltage applied to the electrode pair corresponding to the low current density region, so that the electric field EY From the periphery towards the area of the homogenizing lens 750 corresponding to the low current density area, in the opposite case, the reverse operation (ie, the operation of raising the voltage to reduce or reverse the electric field EY) is performed. By controlling the homogenization of the beam current density distribution in the Y direction of the ion beam 50 at the injection position.

As in the example shown in FIG. 48, shielding plates 756 and 758 may be disposed on the upstream side and the downstream side of the electrode 752 constituting the homogenizing lens 750, respectively. The shielding plates 756 and 758 have a length that covers the entirety of the electrodes 752 arranged at a plurality of positions in the Y direction, and are electrically grounded. If the shield plates 756 and 758 are arranged, it is possible to prevent the electric field of the electrode 752 from leaking upstream and downstream of the homogenizing lens 750. As a result, an unwanted electric field can be prevented from acting on the ion beam 50 upstream and downstream of the homogenizing lens 750 and undesirably bending the ion beam 50.

(7) About the deflection electromagnet 800

Instead of the trajectory control lenses 700a and 700b and the homogenizing lens 750, a deflection electromagnet 800 is disposed as in the example shown in FIGS. 50 and 53. The deflection electromagnet 800 can be said to be one kind of magnetic lens.

The deflection electromagnet 800 is disposed between the analysis electromagnet 200 and the injection position (ie, the position where the ion beam 50 impinges the substrate 60). For example, the deflection electromagnet is disposed between the analysis electromagnet 200 and the acceleration / deceleration device 400. Specifically, the deflection electromagnet is provided between the analysis slit 70 and the acceleration / deceleration device 400 or between the analysis electromagnet 200 and the analysis slit 70 (in case the focus correcting lens 610 is disposed, Between the focus correcting lens 600 and the analysis slit 70.

50 is a front view showing an example of a deflecting electromagnet with a power supply, and FIG. 51 is a side view taken along the line M-M in FIG. 50, showing a case in which the diverging beam is formed as a parallel beam.

The ribbon ion beam 50 impinges on the deflection electromagnet 800, and the deflection electromagnet generates magnetic fields B1 and B2 along the X direction in the beam path 802 through which the ion beam 50 passes. The deflection electromagnet 800 is opposed to each other in the X direction across the beam path 802 and is approximately half or more (in other words, substantially half) of one side (eg, upper side) of the ion beam 50 in the Y direction. Or a first pair of poles 810 having a pair of poles 812 covering each other in the X direction across the beam path 802 and the other side of the ion beam 50 in the Y direction (eg , Between the second magnetic pole pair 820 and the first magnetic pole pair 810 having a pair of magnetic poles 812 covering approximately half or more (in other words, substantially half or more) of the lower side). And a coil 834 to 837 for generating magnetic fields B1 and B2 opposite to each other in the gap 816 of the gap and in the gap 826 between the second pair of magnetic poles 820.

The length in the X direction (applies equally to the gap length G ₁ ; or less) of the gap 816 between the first pair of magnetic poles 810 is substantially constant in the Y direction. In addition, the gap length G ₂ of the gap 816 between the second pair of magnetic poles 820 is also substantially constant in the Y direction. Preferably, the gap lengths G ₁ , G ₂ are substantially equal to each other. This example is constructed in this way.

In this example, the coils 834, 835 are wound around the paired poles 812, which make up the first pole pair 810, respectively. The coils 834, 835 are connected in series with each other and are connected to the DC power supply 840. The coil is excited by the DC power supply 840 to generate a magnetic field B1 directed to the right in the X direction, for example, as shown in FIG.

The coils 836 and 837 are wound around the paired magnetic poles 822 constituting the first magnetic pole pair 820, respectively. The coils 836, 837 are connected in series with each other and are connected to the DC power supply 842. The coil is excited by the DC power supply 842 so that an excitation current that is opposite to the current of the coils 834 and 835 flows to generate a magnetic field B2 that is directed to the left in the X direction, for example, as shown in FIG.

The coil winding method, the number of windings, the DC power supply for the coil, and the like are not limited to these examples. For example, all coils 834 and 837 may be connected in series and may be excited by a single DC power supply. Alternatively, the coil may be wound only on one of the left and right poles 812 and one of the left and right poles 822, or may be wound in the middle of one or both of the yokes 830, 832 described below. In any case, magnetic fields B1 and B2 opposite to each other are generated. The examples shown in Figs. 53 to 55 are similarly constructed.

As shown in FIG. 51, in the deflection electromagnet 800, the lengths L6 and L7 of the ion beam propagation direction Z of the magnetic poles 812 and 822 constituting the first and second magnetic pole pairs 810 and 820. ) Increases from the center 804 of the beam path 802 to the outside in the Y direction (in the vertical direction). Accordingly, the shape of the side view of each magnetic pole 812 and 822 has a shape similar to the shape of a triangle or wedge having a wider outer side in the Y direction. Preferably, the magnetic poles 812 and 822 are substantially face symmetrical in the Y direction about the plane of symmetry 806 passing through the center 804 in the Y direction of the beam path 802 and parallel to the XZ plane. It has a shape. This example is similarly constructed.

As in the example shown in FIG. 51, when the deflecting electromagnet 800 is dedicated to forming the diverging ion beam 50 as a parallel beam, the inlet planes 813, 823 of the poles 812, 822 are It is preferably formed in a convex arch shape in the ion beam traveling direction Z, and the exit planes 814 and 824 are formed linearly. According to this structure, the angle of incidence and emission of the ion beam 50 with respect to the inlet planes 813, 823 and the outlet planes 814, 824 can be close to the right angle at any position in the Y direction. Therefore, the ion beam 50 can be easily formed as a parallel beam.

In an example, the coils 834, 837 are wound along the poles 812, 822 and have a shape obtained by deforming the rectangle. However, winding the coil along the stimulus is not essential. For example, in the same manner as the example shown in FIG. 54, the coil may have a shape similar to a rectangle. This is because the shapes of the magnetic poles 812 and 822 are important.

In the deflection electromagnet 800, the gaps 816 between the first pair of magnetic poles 810 and the gaps 826 between the pair of second magnetic poles 820 are opposite to each other as described above. Is generated. Thus, the Lorentz forces F1 and F2 applied to the ion beam 50 passing through the gaps 816 and 826 are directed inward as shown in FIG. 51. As a result, the function of restraining the ion beam 50 is exerted.

Further, the lengths L6 and L7 of the ion beam propagation direction Z of the magnetic poles 812 and 822 constituting the first and second magnetic pole pairs 810 and 820 are from the center 804 of the beam path 802. It increases as it moves outward in the Y direction. Thus, the ion beam 50 bends stronger as it travels longer distances between the magnetic poles 812, 822 and moves outward in the Y direction from the center 804 of the beam path 802. As a result, the orbital state of the ion beam 50 in the Y direction can be controlled.

For example, when the Y direction is the core, the ion beam 50 has a characteristic that the beam is diverged in the Y direction by the space charge effect. For example, as shown in FIG. 51, in general, the divergence angle of the ion beam is small near the center 804 in the Y direction and becomes larger toward the outside away from the center 804. This is because, in the diverging beam, the divergence degree becomes larger as it proceeds toward the end portion.

In contrast, the lengths L6 and L7 of the ion beam propagation direction Z of the magnetic poles 812 and 822 bend more strongly when the ion beam further falls outward from the center 804. Thus, the divergence of the ion beam 50 can be appropriately canceled (deleted), and the ion beam can be formed into a parallel beam. That is, the ion beam 50 diverging in the Y direction may be induced while being formed as a substantially parallel beam.

The degree of changing the lengths L6 and L7 of the ion beam propagation direction Z of the magnetic poles 812 and 822 may be determined according to the divergence degree of the incident ion beam 50. That is, the lengths L6 and L7 can be changed in the case of handling the largely diverging ion beam 50, and the lengths L6 and L7 in the case of handling the slightly diverging ion beam 50. Can be made small.

When the ion beam 50 that is substantially parallel in the Y direction is incident on the deflection electromagnet 800, the ion beam 50 that converges in the Y direction can be induced. The ion beam 50 has a property that the beam diverges by the space charge effect. Especially in the ion beam 50 having a low energy and a large beam current, such a characteristic appears strong. Therefore, when the convergent ion beam 50 is taken out of the deflection electromagnet 800 and balanced by the divergence caused by the space charge effect between the deflection electromagnet 800 and the substrate 60 (when offset), the substrate 60 Can be formed as a substantially parallel beam.

The direction of the current flowing through the coils 834 to 837 is, for example, the DC power source 840, 842 such that the directions of the magnetic fields B1 and B2 are opposite to those of FIGS. 50 and 51, as in the example shown in FIG. 52. ) Can be reversed by connecting inversely. However, the directions of the magnetic fields B1 and B2 remain opposite to each other.

In the example of FIG. 52, the Lorentz forces F1, F2 applied to the ion beam 50 passing through the gaps 816, 826 are directed outward. As a result, the function of spreading the ion beam 50 is exerted. Even in this example, the ion beam 50 bends stronger as it travels longer distances between the poles 812, 822 and further outwardly in the Y direction from the center 804 of the beam path 802. As a result, the orbital state of the ion beam 50 in the Y direction can be controlled.

For example, the Y direction is the key. In the case where the ion beam 50 converges (constrains) in the Y direction, for example through another device, the divergence angle of the ion beam is generally near the center 804 in the Y direction, for example as shown in FIG. 52. Small at and larger toward the outside away from center 804. This is because, in the diverging beam, the divergence degree becomes larger as it proceeds toward the end portion.

In contrast, when the lengths L6 and L7 of the ion beam propagation direction Z of the magnetic poles 812 and 822 are changed as described above, the ion beam 50 has the beam farther outward from the center 804. It bends stronger when it loses. Thus, the divergence of the ion beam 50 can be appropriately canceled (deleted), and the ion beam can be formed into a parallel beam. That is, the ion beam 50 that converges in the Y direction may be induced while being formed as a substantially parallel beam.

The degree of changing the lengths L6 and L7 of the ion beam propagation direction Z of the magnetic poles 812 and 822 may be determined according to the degree of convergence of the incident ion beam 50. That is, the lengths L6 and L7 can be changed in the case of handling the largely convergent ion beam 50, and the lengths L6 and L7 in the case of handling the slightly converged ion beam 50. Can be made small.

When the ion beam 50 which is substantially parallel in the Y direction is incident on the deflection electromagnet 800, the ion beam 50 diverging in the Y direction can be induced. For example, a beam converging device is disposed downstream of the deflection electromagnet 800. Divergence attributable to the former and convergence attributable to the latter can be combined together so that the ion beam 50 can be formed as a parallel beam. According to this structure, the dimension Wy in the Y direction of the ion beam 50 can be further increased.

In any of the above cases, the deflection electromagnet 800 is characterized in that unwanted lens function is hardly seen in the X direction as compared with the case of using an electrostatic field.

The deflection electromagnet 800 has a back surface (a face opposite to the gap 816) of the X direction of one of the magnetic poles 812 constituting the first magnetic pole pair 810 (the same applies to the left side of FIG. 50, below). The same applies to the following], and a first yoke that magnetically connects the rear surface of one of the magnetic poles 822 constituting the second magnetic pole pair 820 on the same side as the magnetic pole 812 in the X direction. 830 and the other side of the magnetic pole 812 constituting the first magnetic pole pair 810 (the same applies to the right side and the lower side in FIG. 50) in the X direction and the same as the magnetic pole 812 in the X direction. And a second yoke 832 magnetically connecting the back surface of the other of the magnetic poles 822 constituting the second magnetic pole pair 820 in the X direction.

According to this structure, the magnetic flux is formed by the first magnetic pole pair 810, the second magnetic pole pair 820, the first yoke 830, and the second yoke 832 to form a loop (see magnetic fields B1 to B4). A loop magnetic circuit is formed so as to. Accordingly, the leakage magnetic field to the outside can be reduced, and the magnetic fields B1 and B2 are formed in the gap 826 between the second magnetic pole pair 820 and the first magnetic pole pair 810 that require the magnetic field. Can occur efficiently.

FIG. 53 is a front view showing another example of the deflecting electromagnet together with the power supply, and FIG. 54 is a side view taken along the line N-N in FIG. 53, showing a case where the diverging beam is formed as a parallel beam. The same reference numerals are given to the same or corresponding portions as those of the examples shown in FIGS. 50 to 52. In the following description, a difference from such an example will be described.

In the deflection electromagnet 800, as shown in FIG. 54, the length L6 of the ion beam propagation direction Z of the magnetic poles 812 and 822 constituting the first and second magnetic pole pairs 810 and 820. L7) is substantially constant in the Y direction. Preferably, the lengths L6 and L7 are substantially equal to each other. This example is similarly constructed.

In order to meet this end, as illustrated in Figure 53, the center of the first magnetic pole pairs 810, the gap length of (G ₁₎ and the second magnetic pole pairs 820, the gap length of (G ₂₎ of the beam path 802 of the The further away from 804 in the Y direction, the smaller it becomes. Preferably, the gap 816 of the first pair of poles 810 and the gap 826 of the pair of second poles 820 pass through the center 804 in the Y direction of the beam path 802 and in the XZ plane. It has a shape that is substantially face symmetrical in the Y direction about the parallel symmetry plane 806. This example is similarly constructed.

If the gap lengths G ₁ , G _{2 in the} Y direction are changed as described above, the magnetic flux density at a position close to the beam path 802 is low and becomes higher toward the outer side from the center 804. Thus, the ion beam 50 bends stronger as the ion beam moves further outward in the Y direction from the center 804 of the beam path 802. As a result, the orbital state of the ion beam 50 in the Y direction can be controlled in the same manner as in the previous example.

For example, as shown in FIG. 54, the divergent incident ion beam 50 can be directed as a substantially parallel beam. 54 corresponds to FIG. 51. When the ion beam 50 that is substantially parallel in the Y direction is incident on the deflecting electromagnet 800, it may induce an ion beam 50 that converges in the Y direction. The purpose and function of this structure is as described above.

The direction of the current flowing through the coils 834 to 837 is opposite to that in the case described above so that the directions of the magnetic fields B1 and B2 are opposite to those in the example of FIG. 54, as in the example shown in FIG. 52. Can be. However, the directions of the magnetic fields B1 and B2 remain opposite to each other. 55 corresponds to FIG. 52.

In the case of FIG. 55, the incident ion beam 50 converging in the Y direction can be directed as a substantially parallel beam. When the ion beam 50 that is substantially parallel in the Y direction is incident on the deflection electromagnet 800, the ion beam 50 diverging in the Y direction can be induced. The purpose and function of this structure is as described above.

The degree of change of the gap lengths G ₁ and G _{2 in the} Y direction may be determined according to the degree of convergence (or divergence) of the incident ion beam. That is, in the case of handling the ion beam 50 that diverges (or converges) greatly, the gap lengths G ₁ and G ₂ may be largely changed, and the ion beam 50 that diverges (or converges) is handled small. In this case, the change in the gap lengths G ₁ and G ₂ may be small.

When the deflection electromagnet 800 is disposed in the ion implanter shown in FIG. 1, the parallel relationship in the Y direction of the ion beam 50 incident on the substrate 60 can be improved. As a result, highly homogeneous ion implantation can be performed to the substrate 60.

When the trajectory is changed by accelerating or decelerating the ion beam, such as in an electric field lens, particles (eg, neutral particles) having an energy different from the energy of the incident ion beam by the accelerated or decelerated energy are generated to generate the substrate 60. There is a possibility of getting into (this is called energy pollution). In contrast, in the deflection electromagnet 800, the trajectory of the ion beam is bent by the magnetic field, and unlike the electric field lens, the trajectory is not changed by accelerating or decelerating the ion beam. Therefore, no energy pollution occurs. As a result, the deflection electromagnet 800 may be disposed between the acceleration / deceleration device 400 and the injection position, or may be disposed at a position proximate to the substrate 60. That is, in the deflection electromagnet 800, no energy contamination is caused, and thus the parallel relationship of the ion beam 50 in the vicinity of the substrate 60 can be improved. Therefore, the parallel relationship of the ion beam 50 which injects into the board | substrate 60 can be improved more reliably.

1 is a schematic plan view showing an embodiment of the ion implanter of the present invention,

2 is a schematic perspective view partially showing an example of a ribbon ion beam,

3 is a diagram showing an example of the dimensional relationship in the Y direction between the ion beam and the substrate,

4 is a plan view illustrating an example of the analysis electromagnet shown in FIG. 1;

5 is a cross-sectional view taken along the line A-A of FIG. 4,

6 is a perspective view illustrating the analysis electromagnet shown in FIG. 4 with the vacuum container omitted;

FIG. 7 is a perspective view illustrating the analysis electromagnet shown in FIG. 4;

FIG. 8 is a perspective view illustrating the first and second internal coils shown in FIG. 7;

FIG. 9 is a schematic diagram showing an enlarged cross section of the first inner and outer coils taken along the line D-D of FIG. 7;

FIG. 10 is a cross-sectional view illustrating an exploded view of the first inner coil and the uppermost first outer coil illustrated in FIG. 9;

FIG. 11 is a schematic plan view showing a manner of winding the conductor sheet shown in FIG. 10;

12 is a perspective view illustrating the first internal coil illustrated in FIG. 8;

FIG. 13 is a diagram showing an example of a power supply structure for the coil of the analysis electromagnet shown in FIG. 4;

FIG. 14 is a perspective view showing an example of a stack coil that is the original first and second internal coils shown in FIG. 7;

15 is an exploded view showing cross sections of the inner and outer coils taken along the line F-F of FIG. 14,

16 is a plan view illustrating an example of a method of winding a prepreg sheet using a mandrel;

17 is a plan view illustrating an example of a method of winding an insulating sheet and a conductor sheet using a mandrel,

18 is a plan view illustrating an example of a stacked coil wound using a mandrel,

19 is a cross-sectional view illustrating an example of attaching a cooling plate to first and second internal coils;

20 is a diagram showing an example of an ion beam having a conventional form immediately after being emitted from an analytical electromagnet,

21 is a diagram illustrating an example of an ion beam having a distorted shape immediately after being emitted from an analytical electromagnet,

22 is a perspective view illustrating another example of a coil of an analysis electromagnet,

FIG. 23 is an exploded view illustrating a cross-sectional view of the coil taken along the line J-J of FIG. 22;

24 is a cross-sectional view showing another example of the analysis electromagnet corresponding to FIG. 5;

25 is a cross-sectional view showing still another example of the analysis electromagnet corresponding to FIG. 5;

FIG. 26 is a cross-sectional view showing still another example of the analysis electromagnet corresponding to FIG. 5;

27 is a front view showing an example of the analysis slit shown in FIG. 1,

FIG. 28 is a diagram illustrating an example of the vicinity of the focus correcting lens shown in FIG. 1;

29 is a perspective view illustrating an example of the vicinity of a focus correcting lens;

30 is a diagram illustrating an example of correcting a focus position of an ion beam by a focus correcting lens disposed upstream of an analysis electromagnet,

31 is a diagram illustrating an example of correcting a focus position of an ion beam by a focus correcting lens disposed downstream of an analysis electromagnet,

32 is a diagram illustrating an example of correcting a focal position of an ion beam by a focus correcting lens disposed upstream and downstream of an analysis electromagnet,

33 is a schematic diagram showing an example of the beam current distribution of the ion beam at a position separated by 640 mm from the exit of the analysis electromagnet when the space charge of the ion beam is not completely neutralized,

34 is a schematic diagram showing an example of the beam current distribution of the ion beam at a position separated by 640 mm from the exit of the analysis electromagnet when the space charge of the ion beam is not completely neutralized,

35 shows an example of the beam current distribution of the ion beam at a position separated by 640 mm from the exit of the analysis electromagnet when the focal position of the ion beam is corrected by the focus correcting lens when the spatial charge of the ion beam is not completely neutralized. It is a schematic diagram showing

36 is a schematic diagram showing an example of the relationship between the DC voltage applied to the intermediate electrode of the focus correcting lens and the beam current measured by the first beam current measuring device;

37 is a schematic diagram showing another example of the relationship between the DC voltage applied to the intermediate electrode of the focus correcting lens and the beam current measured by the first beam current measuring device;

FIG. 38 is a diagram partially showing an example of the vicinity of a second beam current measuring device for measuring the beam current flowing through the analysis slit, FIG.

39 is a schematic diagram showing an example of the relationship between the DC voltage applied to the intermediate electrode of the focus correcting lens and the beam current measured by the second beam current measuring device;

40 is a cross-sectional view showing an example of the acceleration / deceleration device shown in FIG. 1,

FIG. 41 is an enlarged perspective view of the track control lens shown in FIG. 1 together with a power supply; FIG.

42 is a diagram showing an example of distribution of equipotential lines between electrodes of the track control lens shown in FIG. 41,

FIG. 43 is a diagram showing an example in which the incident ion beam diverging in the Y direction is guided as a parallel beam in the track control lens shown in FIG. 41;

FIG. 44 is a view showing an example in which the incident ion beam parallel to the Y direction is guided as a convergent beam in the track control lens shown in FIG. 41;

FIG. 45 is a diagram showing an example in which the incident ion beam diverging in the Y direction is guided as the diverging beam in the track control lens shown in FIG. 41;

46 is a perspective view illustrating another example of the track control lens with a power supply;

FIG. 47 is a diagram showing an example in which the incident ion beam diverging in the Y direction is guided as a parallel beam in the track control lens shown in FIG. 46;

48 is a plan view illustrating an example of a homogenizing lens,

FIG. 49 is a view showing the homogenizing lens shown in FIG. 48 together with an example of a power supply when viewed in the ion traveling direction,

50 is a front view showing an example of a deflection electromagnet with a power supply,

FIG. 51 is a side view taken along the line M-M in FIG. 50, illustrating the case where the diverging beam is formed as a parallel beam,

FIG. 52 is a side view taken along the line M-M in FIG. 50, illustrating the case where the converging beam is formed as a parallel beam,

53 is a front view showing another example of the deflection electromagnet with a power supply,

FIG. 54 is a side view taken along the line N-N in FIG. 53, illustrating the case where the diverging beam is formed as a parallel beam,

FIG. 55 is a side view taken along the line N-N of FIG. 53, showing the case where the converging beam is formed as a parallel beam,

Fig. 56 is a perspective view showing an example of a conventional analytical electromagnet in which yokes are indicated by double-dotted lines to help understand the shape of the coil.

Claims (13)

Ribbon traveling direction of the ion beam is set as the Z direction, two directions substantially orthogonal to each other in a plane substantially orthogonal to the Z direction are set as the X and Y directions, respectively, and the dimension in the Y direction is larger than the dimension in the X direction As an ion implanter in which a type ion beam is transmitted to irradiate a substrate and performs ion implantation, An ion source for generating a ribbon ion beam having a dimension in a Y direction greater than a dimension in a Y direction of the substrate; An analysis electromagnet which analyzes the momentum by bending the ion beam from the ion source in the X direction, and forms a focal point of the ion beam of a predetermined momentum downstream; An analysis slit disposed near the focal point of the ion beam from the analysis electromagnet and analyzing the momentum of the ion beam in cooperation with the analysis electromagnet; An acceleration / deceleration device for bending the ion beam passing through the analysis slit in the X direction by an electrostatic field and accelerating or decelerating the ion beam by the electrostatic field; Substrate driving apparatus for moving the substrate in a direction intersecting with the main surface of the ion beam at an injection position where the ion beam passing through the acceleration / deceleration device is incident on the substrate. To include, the analysis electromagnet, A set of body portions opposed to each other in the X direction across the beam path through which the ion beam passes, and at least one set of connecting portions connecting the ends of the body portions to each other in the Z direction while avoiding the beam path, A coil that generates a magnetic field that bends the ion beam in the X direction, A yoke collectively surrounding the outside of the body portion of the coil, The coil of the analysis electromagnet has a structure in which a notch portion is arranged in a fan-shaped stacked coil while leaving the main body portion and the connecting portion, and the stack coil has an outer circumferential surface of a laminated insulator. Winding the lamination with a plurality of turns, stacking the lamination of the conductor sheet and the insulating sheet, the main surface of which extends along the Y direction; An ion implanter configured to form an insulator laminated on an outer circumferential surface of the stack. Ribbon traveling direction of the ion beam is set as the Z direction, two directions substantially orthogonal to each other in a plane substantially orthogonal to the Z direction are set as the X and Y directions, respectively, and the dimension in the Y direction is larger than the dimension in the X direction As an ion implanter in which a type ion beam is transmitted to irradiate a substrate and performs ion implantation, An ion source for generating a ribbon ion beam having a dimension in a Y direction greater than a dimension in a Y direction of the substrate; An analysis electromagnet which analyzes the momentum by bending the ion beam from the ion source in the X direction, and forms a focal point of the ion beam of a predetermined momentum downstream; An analysis slit disposed near the focal point of the ion beam from the analysis electromagnet and analyzing the momentum of the ion beam in cooperation with the analysis electromagnet; An acceleration / deceleration device for bending the ion beam passing through the analysis slit in the X direction by an electrostatic field and accelerating or decelerating the ion beam by the electrostatic field; Substrate driving apparatus for moving the substrate in a direction intersecting with the main surface of the ion beam at an injection position where the ion beam passing through the acceleration / deceleration device is incident on the substrate. To include, the analysis electromagnet, A set of body portions opposed to each other in the X direction across the beam path through which the ion beam passes and covering approximately half or more of one side of the ion beam in the Y direction, and the body in the Z direction while avoiding the beam path A saddle-shaped coil having a set of connecting portions connecting the ends of the portions to each other, the first coil generating a magnetic field in cooperation with the second coil to bend the ion beam in the X direction; A set of body portions that oppose each other in the X direction across the beam path and cover approximately half or more of the other side of the ion beam in the Y direction, and connect the ends of the body portions in the Z direction while avoiding the beam path A second saddle-shaped coil having a set of connecting portions, the second coil being disposed to overlap the first coil in the Y direction, and generating a magnetic field to cooperate with the first coil to bend the ion beam in the X direction; Coils, A yoke collectively surrounding the outside of the main body portion of the first coil and the second coil, Each of the first and second coils of the analysis electromagnet has a structure in which a notch portion is disposed in a fan-shaped cylindrical stack coil while leaving the main body portion and the connecting portion, and the stack coil has an outer circumferential surface of the laminated insulator. Winding the laminations with a plurality of windings, stacking the laminations of the conductor sheet and the insulating sheet, the main surface of which extends along the Y direction; An ion implanter configured to form an insulator laminated on an outer circumferential surface of the stack. Ribbon traveling direction of the ion beam is set as the Z direction, two directions substantially orthogonal to each other in a plane substantially orthogonal to the Z direction are set as the X and Y directions, respectively, and the dimension in the Y direction is larger than the dimension in the X direction As an ion implanter in which a type ion beam is transmitted to irradiate a substrate and performs ion implantation, An ion source for generating a ribbon ion beam having a dimension in a Y direction greater than a dimension in a Y direction of the substrate; An analysis electromagnet which analyzes the momentum by bending the ion beam from the ion source in the X direction, and forms a focal point of the ion beam of a predetermined momentum downstream; An analysis slit disposed near the focal point of the ion beam from the analysis electromagnet and analyzing the momentum of the ion beam in cooperation with the analysis electromagnet; An acceleration / deceleration device for bending the ion beam passing through the analysis slit in the X direction by an electrostatic field and accelerating or decelerating the ion beam by the electrostatic field; A substrate driving device for moving the substrate in a direction intersecting with a main surface of the ion beam at an injection position where the ion beam passing through the acceleration / deceleration device is incident on the substrate; To include, the analysis electromagnet, A set of body parts opposed to each other in the X direction across the beam path through which the ion beam passes, and a connecting portion connecting the ends of the body parts to each other in the Z direction while avoiding the beam path, wherein the ion beam is X An internal coil that generates a main magnetic field that bends in a direction; A set of body parts outside the inner coil and opposite each other in the X direction across the beam path, and a set of connections connecting the ends of the body parts to each other in the Z direction while avoiding the beam path; One or more first external coils that are saddle shaped coils and generate a sub magnetic field that supports or corrects the main magnetic field; A set of body parts outside the inner coil and opposite each other in the X direction across the beam path, and a set of connections connecting the ends of the body parts to each other in the Z direction while avoiding the beam path; At least one second outer coil, the saddle-shaped coil, disposed in the Y direction to overlap with the first outer coil, and generating a sub magnetic field to support or correct the main magnetic field; A yoke collectively surrounding the outer side of the main body of the inner coil and the first and second outer coils, Each of the inner coil and the first and second outer coils of the analysis electromagnet has a structure in which a notch portion is disposed in a fan-shaped cylindrical stack coil while leaving the main body portion and the connecting portion, and the stack coil includes: Winding the lamination with a plurality of windings, stacking the lamination of the conductive sheet and the insulating sheet whose main surface extends along the Y direction on the outer circumferential surface of the laminated insulator; Forming laminated insulators on the outer circumferential surface of the stack; Winding the lamination with a plurality of windings, stacking the lamination of the conductor sheet and the insulating sheet, the main surface of which extends along the Y direction, on the outer circumferential surface of the stack; An ion implanter configured to form an insulator laminated on an outer circumferential surface of the stack. Ribbon traveling direction of the ion beam is set as the Z direction, two directions substantially orthogonal to each other in a plane substantially orthogonal to the Z direction are set as the X and Y directions, respectively, and the dimension in the Y direction is larger than the dimension in the X direction As an ion implanter in which a type ion beam is transmitted to irradiate a substrate and performs ion implantation, An ion source for generating a ribbon ion beam having a dimension in a Y direction greater than a dimension in a Y direction of the substrate; An analysis electromagnet which analyzes the momentum by bending the ion beam from the ion source in the X direction, and forms a focal point of the ion beam of a predetermined momentum downstream; An analysis slit disposed near the focal point of the ion beam from the analysis electromagnet and analyzing the momentum of the ion beam in cooperation with the analysis electromagnet; An acceleration / deceleration device for bending the ion beam passing through the analysis slit in the X direction by an electrostatic field and accelerating or decelerating the ion beam by the electrostatic field; Substrate driving apparatus for moving the substrate in a direction intersecting with the main surface of the ion beam at an injection position where the ion beam passing through the acceleration / deceleration device is incident on the substrate. To include, the analysis electromagnet, A set of body portions opposed to each other in the X direction across the beam path through which the ion beam passes and covering approximately half or more of one side of the ion beam in the Y direction, and the body in the Z direction while avoiding the beam path A saddle-shaped coil having a set of connecting portions connecting the ends of the portions to each other, the first inner coil generating a main magnetic field in cooperation with the second inner coil to bend the ion beam in the X direction; A set of body portions that oppose each other in the X direction across the beam path and cover approximately half or more of the other side of the ion beam in the Y direction, and connect the ends of the body portions in the Z direction while avoiding the beam path The second internal coil having a set of connecting portions, the second internal coil being disposed to overlap the first internal coil in the Y direction, and generating a main magnetic field to cooperate with the first internal coil to bend the ion beam in the X direction. and, A set of body parts that are outside of the first inner coil and that face each other in the X direction across the beam path, and a set of connections that connect the ends of the body part to each other in the Z direction while avoiding the beam path At least one first external coil having a saddle-shaped coil, wherein said at least one first external coil generates a sub-magnetic field that supports or corrects said main magnetic field; A set of body parts outside the second internal coil and facing each other in the X direction across the beam path, and a set of connecting portions connecting the ends of the body part to each other in the Z direction while avoiding the beam path; At least one second external coil having a saddle-shaped coil disposed in the Y direction and overlapping with the first external coil and generating a sub magnetic field for supporting or correcting the main magnetic field; A yoke collectively surrounding the outer side of the body portion of the first and second inner coils and the first and second outer coils, Each of the first internal coil and the first external coil of the analysis electromagnet has a structure in which a notch part is disposed in a fan-shaped cylindrical stack coil while leaving the main body part and the connecting part, and the stack coil is laminated. Winding the lamination with a plurality of windings, stacking the lamination of the conductive sheet and the insulating sheet, the main surface of which extends along the Y-direction, on the outer peripheral surface of the insulator; Forming laminated insulators on the outer circumferential surface of the stack; Winding the lamination with a plurality of windings, stacking the lamination of the conductor sheet and the insulating sheet, the main surface of which extends along the Y direction, on the outer circumferential surface of the stack; Is formed by forming an insulator laminated on the outer circumferential surface of the stack, Each of the second internal coil and the second external coil of the analysis electromagnet has a structure in which a notch part is disposed in a fan-shaped cylindrical stack coil while leaving the main body part and the connecting part, and the stack coil is laminated. Winding the lamination with a plurality of windings, stacking the lamination of the conductive sheet and the insulating sheet, the main surface of which extends along the Y-direction, on the outer peripheral surface of the insulator; Forming laminated insulators on the outer circumferential surface of the stack; Winding the lamination with a plurality of windings, stacking the lamination of the conductor sheet and the insulating sheet, the main surface of which extends along the Y direction, on the outer circumferential surface of the stack; An ion implanter configured to form an insulator laminated on an outer circumferential surface of the stack. 5. The ion implanter of claim 1, wherein the analysis electromagnet further comprises a set of magnetic poles protruding inwardly from the yoke to oppose each other in the Y direction across the beam path. . The method according to any one of claims 1 to 4, And a focus correcting lens disposed between at least one of the ion source and the analyzing electromagnet, between the analyzing electromagnet and the analyzing slit, the focus correcting lens analyzing the position of the focus of the ion beam by an electrostatic field. An ion implanter that is calibrated to match the position of the slit. The said focus correcting lens is provided with the inlet electrode, the intermediate electrode, and the outlet electrode arrange | positioned in the ion beam traveling direction, forming the clearance gap between them, Each of the inlet electrode, the middle electrode and the outlet electrode of the focus correcting lens has a pair of electrodes facing each other in the X direction and electrically conducting with each other across a gap through which the ion beam passes, The inlet electrode and the outlet electrode of the focus correcting lens are maintained at the same potential, and the intermediate electrode is kept at a potential that is different from the potential of the inlet and outlet electrodes and that the focus of the ion beam matches the position of the analysis slit. Ion implanter. The acceleration / deceleration device according to any one of claims 1 to 4, wherein the acceleration / deceleration device is arranged in the order of the first electrode, the second electrode, and the third electrode in the ion beam traveling direction starting from the upstream side. A first electrode and a third electrode, and accelerate or decelerate the ion beam at two stages between the first electrode and the second electrode and between the second electrode and the third electrode; Consisting of two electrode members opposed to each other in the X direction across and applied with different potentials to deflect the ion beam in the X direction, the third electrode being the trajectory of an ion beam having specific energy after deflection. It is disposed along the ion implanter. The method according to any one of claims 1 to 4, An inlet electrode, an intermediate electrode, and an outlet disposed between the analysis electromagnet and the acceleration / deceleration device, bent in the Y direction by an electrostatic field, and arranged in the direction of the ion beam travel, forming a gap therebetween. Further comprising a track control lens having an electrode, Each of the inlet electrode, the middle electrode and the outlet electrode of the orbital control lens has a pair of electrodes facing each other in the X direction and electrically conducting with each other across a gap through which the ion beam passes, The intermediate electrode of the track control lens has a convex surface curved in the Y direction on each of the upstream side and the downstream side in the ion beam traveling direction, Each of the inlet electrode and the outlet electrode of the orbital control lens has a concave surface extending along the convex surface on a surface opposite the convex surface of the intermediate electrode, The inlet electrode and the outlet electrode of the orbital control lens are maintained at the same potential, and the intermediate electrode is different from the potential of the inlet and outlet electrode and defines the orbital state in the Y direction of the ion beam derived from the orbital control lens. An ion implanter that is held at a potential that results in a state of being. The method according to any one of claims 1 to 4, An inlet electrode, an intermediate electrode, and an outlet disposed between the analysis electromagnet and the acceleration / deceleration device, bent in the Y direction by an electrostatic field, and arranged in the direction of the ion beam travel, forming a gap therebetween. Further comprising a track control lens having an electrode, Each of the inlet electrode, the middle electrode and the outlet electrode of the orbital control lens has a pair of electrodes facing each other in the X direction and electrically conducting with each other across a gap through which the ion beam passes, The intermediate electrode of the orbital control lens has a concave surface curved in the Y direction on each of the upstream side and the downstream side in the ion beam traveling direction, Each of the inlet electrode and the outlet electrode of the orbital control lens has a convex surface extending along the concave surface on a surface opposite the concave surface of the intermediate electrode, The inlet electrode and the outlet electrode of the orbital control lens are maintained at the same potential, and the intermediate electrode is different from the potential of the inlet and outlet electrode and defines the orbital state in the Y direction of the ion beam derived from the orbital control lens. An ion implanter that is held at a potential that results in a state of being. The method according to any one of claims 1 to 4, A plurality of pairs of electrodes disposed between the analysis electromagnet and the acceleration / deceleration device that face each other in the X direction and electrically conduct with each other in the Y direction across the gap through which the ion beam passes, and the plurality of electrodes by the electrostatic field And a homogenizing lens that bends the trajectory at the plane of the ion beam in the Y direction and homogenizes the beam current density distribution in the Y direction of the ion beam at the implantation position. The method according to any one of claims 1 to 4, A deflected electromagnet disposed between the analytical electromagnet and an injection position and generating a magnetic field extending along the X direction in a beam path through which the ion beam passes, The deflection electromagnet, A first pair of poles having a pair of poles opposite each other in the X direction across the beam path and covering approximately half or more of one side of the ion beam in the Y direction, A second pair of magnetic poles having a pair of magnetic poles opposite each other in the X direction across the beam path and covering approximately half or more of the other side of the ion beam in the Y direction, A coil generating an opposite magnetic field in the gap of the first pole pair and the gap of the second pole pair, And the length of the magnetic poles constituting the first and second magnetic pole pairs toward the ion beam propagation direction is larger the further away from the center of the beam path in the Y direction. The method according to any one of claims 1 to 4, A deflected electromagnet disposed between the analytical electromagnet and an injection position and generating a magnetic field extending along the X direction in a beam path through which the ion beam passes, The deflection electromagnet, A first pair of poles having a pair of poles opposite each other in the X direction across the beam path and covering approximately half or more of one side of the ion beam in the Y direction, A second pair of magnetic poles having a pair of magnetic poles opposite each other in the X direction across the beam path and covering approximately half or more of the other side of the ion beam in the Y direction, A coil generating an opposite magnetic field in the gap of the first pole pair and the gap of the second pole pair, The gap length of the first and second magnetic pole pairs becomes smaller as the distance from the center of the beam path toward the outer side in the Y direction.

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