JP4345793B2 - Analysis electromagnet, control method thereof, and ion implantation apparatus - Google Patents

Description

  The present invention is used in, for example, an ion implantation apparatus, an analysis electromagnet that performs a momentum analysis (for example, mass spectrometry) of a ribbon-like ion beam by a magnetic field, a control method thereof, and an ion implantation including the analysis electromagnet Relates to the device.

  In order to perform ion implantation with a high throughput on a large substrate, an ion beam in a ribbon shape (this may be referred to as a sheet shape or a belt shape, the same applies hereinafter) may be used.

  Examples of an ion implantation apparatus and an analysis electromagnet for the ion implantation apparatus in which a ribbon-like ion beam is incident on a substrate after performing momentum analysis (for example, mass spectrometry; the same applies hereinafter) through an analysis electromagnet. For example, it is described in Patent Document 1.

  A conventional analysis electromagnet described in Patent Document 1 will be described with reference to FIG. In this figure, the yoke 36 is indicated by a two-dot chain line for easy understanding of the shapes of the coils 12 and 18. Assuming that the traveling direction of the ion beam 2 is the Z direction and the two directions substantially orthogonal to each other in the plane substantially orthogonal to the Z direction are the X direction and the Y direction, the analyzing electromagnet 40 has the Y direction. A long, vertically long ribbon-like ion beam 2 enters from the entrance 24 and exits from the exit 26.

  The analysis electromagnet 40 has a configuration in which two upper and lower coils 12 and 18 as described in FIG. 1 of Patent Document 1 and a yoke 36 corresponding to the yoke described in FIG. 21 of the same document are combined. is doing.

  The coil 12 is a saddle-shaped coil (referred to as a banana-shaped coil in Patent Document 1), and is a set of body parts facing each other across the path (beam path) of the ion beam 2 (Patent Document 1). Is called a coil main body part) 14 and a pair of crossover parts that are connected by jumping up diagonally so as to avoid the beam path between the ends in the direction along the Z direction of both main body parts 14 (see FIG. (Referred to as an end flip-up portion in Patent Document 1) 16. The reason why the crossing portion 16 is slanted up at the entrance 24 and the exit 26 is to secure a beam passage region so that the ion beam 2 does not hit it.

  The coil 18 is also a bowl-shaped coil having the same structure as that of the coil 12 (however, the coil 12 is substantially plane-symmetrical with the coil 12), and a set of main body portions 20 and a set of crossover portions. 22.

  Each of the coils 12 and 18 is a multi-turn coil in which a conductor (covered conductor) whose periphery is covered with an insulating material is wound many times, and the planar shape of the coil is a fan shape. It is manufactured by a method in which bending portions are formed in the vicinity of both end portions to form the transition portions 16 and 22. As the conductor, a hollow conductor (hollow conductor) in which a coolant (for example, cooling water) flows is usually used. In this specification, “insulation” means electrical insulation.

  A yoke 36 collectively surrounds the outer sides of the main body portions 14 and 20 of the coils 12 and 18.

JP 2004-152557 A (paragraphs 0006, 0022, FIG. 1, FIG. 21)

  The analysis electromagnet 40 has the following problems.

(1) at the inlet 24 and outlet 26, a large projection distances L ₁ in the directions of beam incidence and emission of the connecting portions 16, 22 from the yoke 36. This is mainly due to the following reason.

(A) In order to deflect the ribbon-shaped ion beam 2 that is long in the Y direction as uniformly as possible, the main body portions 14 and 20 of the coils 12 and 18 are elongated vertically by increasing the dimension a in the Y direction. However, since the coils 12 and 18 are formed by bending the fan-shaped coils as described above to form the crossing portions 16 and 22, respectively. the dimension a is substantially directly reflected to the distance L ₁ overhang. Therefore, the overhang distance L ₁ increases as the dimension a increases.

(B) Since the coils 12 and 18 are formed by bending the fan-shaped coil as described above to form the crossing portions 16 and 22, the main body portions 14 and 20 are restricted due to bending limitations. It is unavoidable that relatively large bent portions 30 and 32 are formed near the boundary between the crossover portions 16 and 22, and the end portions of the yoke 36 and the crossover portions are equivalent to the presence of the bent portions 30 and 32. distance L ₂ is increased between the end of 16 and 22, this distance L ₂ is for inclusion in the projection distance L _1, increases the projection distance L _1. As the dimension a is increased, the curvature radii of the bent portions 30 and 32 have to be increased due to restrictions on the bending process, and the distance L _{2 and the} overhang distance L ₁ become larger.

That is, the overhang distance L ₁ can be expressed by the following equation.

[Equation 1]
L ₁ = a + L ₂

(C) Since the crossing portions 16 and 22 are slanted up, this also causes the overhang distance L ₁ to be increased.

As described above, when the overhanging distance L _{1 of the connecting} portions 16 and 22 from the yoke 36 is large, the analysis electromagnet 40 is increased in size, and as a result, the area required for installing the analysis electromagnet 40 is increased. The weight of the analysis electromagnet 40 is also increased. In addition, the magnetic field generated by the crossing portions 16 and 22 outside the yoke 36 (sometimes called a fringe field) also increases the possibility of disturbing the form (shape and posture; the same applies hereinafter) of the ion beam 2.

  (2) Power consumption in the coils 12 and 18 is large. This is mainly due to the following reason.

(A) Although the crossover portions 16 and 22 do not generate a magnetic field for deflecting the ion beam 2, the overhang distance L ₁ of the crossover portions 16 and 22 is large as described above. The length becomes longer and the wasteful power consumption in the crossing portions 16 and 22 is large, which increases the power consumption in the coils 12 and 18.

    (B) Since the coils 12 and 18 are multi-turn coils of a coated conductor as described above, it is difficult to take a large proportion of the conductor area (that is, the space factor of the conductor) in the cross section of the coils 12 and 18. As a result, power loss increases and power consumption increases. When the covered conductor is a hollow conductor, the space factor of the conductor is smaller and the power loss is larger, so that the power consumption is larger.

  Thus, the present invention provides an analysis electromagnet that can reduce the power consumption while reducing the size of the analysis electromagnet by reducing the extension distance of the coil transition portion from the yoke in the beam incident / exit direction. This is the main purpose.

  Another object of the present invention is to provide a method for controlling the analysis electromagnet and an ion implantation apparatus including the analysis electromagnet.

One of the analyzing electromagnets according to the present invention is such that the traveling direction of the ion beam is the Z direction, and two directions substantially orthogonal to each other in a plane substantially orthogonal to the Z direction are the X direction and the Y direction. An analysis electromagnet in which a ribbon-like ion beam having a dimension in the Y direction larger than the dimension in the direction is incident, generates a magnetic field along the Y direction in a beam path that is a path of the ion beam, and bends the ion beam in the X direction Because
A pair of main body portions opposed to each other in the X direction across the beam path, and at least one set of connecting portions connecting the end portions in the direction along the Z direction of both main body portions while avoiding the beam path A coil for generating a magnetic field for bending the ion beam in the X direction,
A yoke that collectively surrounds the outside of the main body of the coil,
The coil is laminated on the outer peripheral surface of the laminated insulator by winding a plurality of layers in which an insulating sheet and a conductor sheet whose main surfaces are along the Y direction are overlapped, and a laminated insulator is formed on the outer peripheral surface. The fan-shaped cylindrical laminated coil has a configuration in which a notch portion is provided leaving the main body portion and the transition portion.
The upper yoke constituting the yoke is detachable. The same applies to other analysis electromagnets described below.

  In this analysis electromagnet, the coil has a configuration in which the cutout portion is provided in the fan-shaped cylindrical laminated coil as described above, leaving the main body portion and the crossover portion. It is in a state of extending substantially parallel to the Y direction from the portion. Therefore, even when the dimension of the main body part in the Y direction is increased, the dimension of the transition part in the Y direction of the beam does not increase because the dimension of the transition part in the Y direction is increased correspondingly. With such a structure, it is possible to reduce the overhang distance in the beam entering / exiting direction from the yoke of the connecting portion of the coil.

  In addition, since the overhang distance of the transition part of the coil can be reduced, the length of the transition part can also be shortened, so that useless power consumption in the transition part can be reduced. In addition, the coil has a structure in which conductor sheets are laminated with an insulating sheet interposed therebetween, so that the space factor of the conductor is higher than that of a multi-turn coil in which the coated conductor is wound many times, and the power loss is much less. Few. Therefore, power consumption can be reduced.

Another analysis electromagnet according to the present invention includes a pair of main bodies and both main bodies that are opposed to each other in the X direction across the beam path and cover approximately half or more of one side of the ion beam in the Y direction. A saddle-shaped coil having a pair of crossing portions that connect between end portions in a direction along the Z direction, avoiding the beam path, in cooperation with the second coil, A first coil that generates a magnetic field that bends the beam in the X direction;
A pair of main body portions that are opposed to each other in the X direction across the beam path and cover approximately half or more of the other side of the ion beam in the Y direction, and between the end portions in the direction along the Z direction of both main body portions A saddle-shaped coil having a pair of connecting portions that are connected to each other while avoiding the beam path, and is disposed so as to overlap with the first coil in the Y direction, and cooperates with the first coil. A second coil that acts to generate a magnetic field that bends the ion beam in the X direction;
A yoke that collectively surrounds the outside of the main body of the first coil and the second coil,
In addition, the first coil and the second coil are respectively laminated on the outer peripheral surface of the laminated insulator by winding a plurality of layers of an insulating sheet and a conductor sheet whose main surfaces are along the Y direction, and further winding the outer periphery thereof. The fan-shaped cylindrical laminated coil having a laminated insulator formed on the surface is provided with a notch portion leaving the main body portion and the transition portion.

Still another analyzing electromagnet according to the present invention is a beam path between a pair of main body portions opposed to each other in the X direction across the beam path and ends of the two main body portions in the direction along the Z direction. An inner coil for generating a main magnetic field that bends the ion beam in the X direction.
A pair of body portions outside the inner coil and facing each other in the X direction across the beam path, and the ends of the two body portions in the direction along the Z direction are connected to each other while avoiding the beam path. One or more first outer coils for generating a sub-magnetic field for assisting or correcting the main magnetic field, wherein the coil is a saddle-shaped coil having a set of crossing portions.
A pair of body portions outside the inner coil and facing each other in the X direction across the beam path, and the ends of the two body portions in the direction along the Z direction are connected to each other while avoiding the beam path. One or more saddle-shaped coils having a pair of crossing portions that are arranged to overlap the first outer coil in the Y direction and generate a sub-magnetic field that assists or corrects the main magnetic field A second outer coil of
A yoke that collectively surrounds the outside of the main body of the inner coil, the first outer coil, and the second outer coil;
And the inner coil, the first outer coil and the second outer coil are laminated on the outer peripheral surface of the laminated insulator by winding the insulating sheet and the conductor sheet each having a principal surface along the Y direction a plurality of times, A laminated insulator is formed on the outer peripheral surface, and the outer peripheral surface is laminated by winding a plurality of layers of an insulating sheet and a conductor sheet whose main surface is along the Y direction, and further laminated on the outer peripheral surface. In the fan-shaped cylindrical laminated coil formed with a cutout portion, the main body portion and the transition portion are left.

Still another analysis electromagnet according to the present invention includes a pair of main body portions and both of which are opposed to each other in the X direction across the beam path and cover approximately half or more of one side of the ion beam in the Y direction. A saddle-shaped coil having a pair of connecting portions that connect the end portions in the direction along the Z direction of the main body portion so as to avoid the beam path, in cooperation with the second inner coil A first inner coil that generates a main magnetic field that bends the ion beam in the X direction;
A pair of main body portions that are opposed to each other in the X direction across the beam path and cover approximately half or more of the other side of the ion beam in the Y direction, and between the end portions in the direction along the Z direction of both main body portions A saddle-shaped coil having a pair of connecting portions that are connected to each other while avoiding the beam path, and is arranged so as to overlap with the first inner coil in the Y direction. In cooperation with the second inner coil for generating a main magnetic field that bends the ion beam in the X direction;
A pair of main body portions outside the first inner coil and facing each other in the X direction across the beam path and the ends of the two main body portions in the direction along the Z direction are connected to each other while avoiding the beam path. One or more first outer coils for generating a sub-magnetic field for assisting or correcting the main magnetic field, wherein the coil is a saddle-shaped coil having a pair of crossing portions
A pair of main body portions outside the second inner coil and facing each other in the X direction across the beam path, and the ends of the two main body portions in the direction along the Z direction are connected to each other while avoiding the beam path. A saddle-shaped coil having a pair of crossing portions that are arranged to overlap the first outer coil in the Y direction and generate a sub-magnetic field for assisting or correcting the main magnetic field One or more second outer coils;
A yoke that collectively surrounds the outside of the main body of the first inner coil, the second inner coil, the first outer coil, and the second outer coil;
In addition, the first inner coil and the first outer coil are laminated on the outer peripheral surface of the laminated insulator by winding a plurality of layers in which an insulating sheet and a conductor sheet whose main surfaces are along the Y direction are overlapped with each other. A laminated insulator is formed on the outer circumferential surface of the laminated insulating sheet and a conductor sheet whose main surface is along the Y direction. The laminated sheet is wound by multiple turns and further laminated on the outer circumferential surface. The fan-shaped cylindrical laminated coil has a configuration in which a cutout portion is provided leaving the main body portion and the transition portion,
The second inner coil and the second outer coil are laminated on the outer peripheral surface of the laminated insulator by winding a plurality of layers of an insulating sheet and a conductor sheet whose main surface is along the Y direction. A fan in which a laminated insulator is formed, and on the outer peripheral surface thereof, an insulating sheet and a conductor sheet whose main surfaces are aligned in the Y direction are wound and laminated several times, and further, a laminated insulator is formed on the outer peripheral surface. The cylindrical tube-shaped laminated coil has a configuration in which a cutout portion is provided leaving the main body portion and the transition portion.

  Each bridging portion of each coil includes two vertical portions that are substantially perpendicular to the end portion in the direction along the Z direction of the main body and extend substantially parallel to the Y direction. And a lateral portion that is substantially perpendicular to the portion and extends substantially parallel to the XZ plane.

  According to the control method of the analysis electromagnet according to the present invention, the current passed through the first outer coil and the second outer coil so that the form of the ion beam emitted from the analysis electromagnet approaches the form of the ion beam at the time of incidence. Is to control.

  The ion implantation apparatus according to the present invention is an ion implantation apparatus for performing ion implantation by irradiating a substrate with an ion beam, wherein the ribbon-shaped ion beam having a dimension in the Y direction larger than a dimension in the Y direction of the substrate is used. The ion source to be generated, the analysis electromagnet that bends the ion beam from the ion source, and the implantation position at which the ion beam that has passed through the analysis electromagnet is incident on the substrate intersects the main surface of the ion beam. And a substrate driving device that moves in the direction.

  According to the first to fourth aspects of the present invention, each coil has a structure in which the cutout portion is provided in the fan-shaped cylindrical laminated coil as described above, leaving the main body portion and the crossover portion. The part extends from the end of the main body part substantially in parallel to the Y direction. Therefore, even when the dimension of the main body part in the Y direction is increased, the dimension of the transition part in the Y direction of the beam does not increase because the dimension of the transition part in the Y direction is increased correspondingly. With such a structure, it is possible to reduce the overhang distance of the coil crossing portion in the beam incident / exit direction from the yoke.

  As a result, the analysis electromagnet can be reduced in size, and the area required for installing the analysis electromagnet can be reduced. It is also possible to reduce the weight of the analysis electromagnet. In addition, the possibility that the magnetic field generated by the crossing portion of the coil disturbs the form of the ion beam is reduced.

  Moreover, since the overhang distance of the transition part of each coil can be reduced, the length of the transition part can also be shortened, so that useless power consumption in the transition part can be reduced. In addition, each coil has a structure in which conductor sheets are laminated with an insulating sheet interposed therebetween, so that the space factor of the conductor is higher than that of a multi-turn coil in which a plurality of coated conductors are wound, and the power loss is much less. Few. Therefore, power consumption can be reduced.

  As a result, for example, a magnetic field having a required strength can be generated with less power consumption than a conventional analysis electromagnet. It is also possible to generate a magnetic field stronger than that of a conventional analysis electromagnet with the same power consumption. In the latter case, the radius of curvature of the ion beam deflection can be reduced, and the analysis electromagnet can be further miniaturized.

  According to invention of Claim 2, there exists the following further effect. That is, since the first coil and the second coil as described above are provided, it is easy to deal with an ion beam having a large dimension in the Y direction.

  According to invention of Claim 3, there exists the following further effect. That is, since the first outer coil and the second outer coil as described above are provided in addition to the inner coil, a magnetic field having a highly uniform magnetic flux density distribution in the Y direction can be generated in the beam path of the ion beam. Can do. As a result, it is possible to suppress the disturbance of the ion beam form during extraction. This effect becomes more prominent when the size of the target ion beam in the Y direction is large.

  According to invention of Claim 4, there exists the following further effect. That is, since the first outer coil and the second outer coil as described above are provided in addition to the first inner coil and the second inner coil, it is easy to deal with an ion beam having a large dimension in the Y direction. At the same time, a magnetic field with high uniformity of magnetic flux density distribution in the Y direction can be generated in the beam path of the ion beam. As a result, the disturbance of the ion beam form at the time of extraction can be further reduced. This effect becomes more prominent when the size of the target ion beam in the Y direction is large.

  According to invention of Claim 5-8, there exists the following further effect. That is, each crossing portion of each coil is connected to two end portions extending substantially parallel to the Y direction and connected to the end portion of the main body portion in the direction along the Z direction, Since it has a lateral portion that is substantially perpendicular to the vertical portion and extends substantially parallel to the XZ plane, the distance over which the transition portion from the yoke extends in the beam entrance / exit direction is more reliably reduced. can do. As a result, the effects such as downsizing and low power consumption of the analysis electromagnet described above with regard to claims 1 to 4 can be achieved more reliably.

  The invention according to claim 9 has the following further effect. That is, a plurality of first outer coils and a plurality of second outer coils are provided, so that the magnetic flux density distribution in the Y direction of the magnetic field generated in the beam path can be more finely corrected. A highly uniform magnetic field can be generated. As a result, the disturbance of the ion beam form at the time of extraction can be further reduced. This effect becomes more prominent when the size of the target ion beam in the Y direction is large.

  The invention according to claim 10 has the following further effect. That is, by providing the magnetic poles as described above, the magnetic field is easily concentrated in the gap between the two magnetic poles, so that it is easy to generate a magnetic field having a high magnetic flux density in the beam path.

  The invention according to claim 11 has the following further effect. That is, since each coil has a substantially plane-symmetric shape in the Y direction with respect to the symmetry plane, it is easy to generate a magnetic field having good symmetry in the Y direction in the beam path. This contributes to minimizing the disturbance of the ion beam form during extraction.

According to the thirteenth aspect of the present invention, the following further effect is obtained. That is, by controlling the currents flowing through the first outer coil and the second outer coil as described above, the form of the ion beam at the time of emission can be made closer to the form at the time of incidence.

According to the invention of the fourteenth aspect , the following further effect is obtained. That is, since the analysis electromagnet as described above is provided, the entire ion implantation apparatus can be miniaturized as the analysis electromagnet is miniaturized, and the area necessary for installing the ion implantation apparatus can be reduced. . It is also possible to reduce the weight of the ion implantation apparatus. In addition, the power consumption of the ion implantation apparatus as a whole can be reduced as the power consumption of the analysis electromagnet can be reduced.

  In addition, since the ion source for generating a ribbon-like ion beam whose dimension in the Y direction is larger than the dimension in the Y direction of the substrate is provided, it is larger than the case where the divergence or widening of the ion beam in the Y direction is used. Also for these substrates, ion implantation can be performed at a high processing speed (throughput). This effect becomes more prominent when the substrate to be processed and thus the size of the ion beam in the Y direction are large.

According to the fifteenth aspect of the present invention, the following further effect can be obtained. That is, since the ion source is configured as described above, it is possible to generate an ion beam with good uniformity of the beam current density distribution in the Y direction from the ion source. Therefore, the uniformity of ion implantation with respect to the substrate can be improved. This effect becomes more prominent when the substrate to be processed and thus the size of the ion beam in the Y direction are large.

According to the sixteenth aspect of the present invention, the following further effect is obtained. That is, since the ion source includes the reflective electrode as described above, the lifetime of electrons in the plasma generation container can be extended, the plasma generation efficiency by the impact of the electrons can be increased, and the plasma density can be increased. As a result, the amount of ion beam to be generated can be increased.

(1) About Ion Implantation Device FIG. 1 is a schematic plan view showing an embodiment of an ion implantation device according to the present invention. In this specification and the drawings, the traveling direction of the ion beam 50 is always the Z direction, and the two directions substantially orthogonal to each other in the plane substantially orthogonal to the Z direction are the X direction and the Y direction. For example, the X direction and the Z direction are horizontal directions, and the Y direction is a vertical direction. Note that the Y direction is a constant direction, but the X direction is not an absolute direction and changes depending on the position on the path of the ion beam 50 (see, for example, FIGS. 1 and 4). Further, in this specification, the case where ions constituting the ion beam 50 are positive ions is described as an example.

  This ion implantation apparatus is an apparatus that performs ion implantation by irradiating a substrate 60 with a ribbon-like ion beam 50, an ion source 100 that generates a ribbon-like ion beam 50, and an ion beam 50 from the ion source 100. Electromagnet 200 that performs momentum analysis by bending it in the X direction, and the main surface 52 of the ion beam 50 (FIGS. 2 and 3) at the implantation position where the ion beam 50 that has passed through the analysis electromagnet 200 is incident on the substrate 60. And a substrate driving device 500 that moves in a direction intersecting with (see arrow C).

  In this specification, the “main surface” means not the end surface of a ribbon-shaped or sheet-shaped material (for example, ion beam 50, insulating sheets 266, 267, conductor sheets 268, 269, etc. described later), but the larger surface. is doing. Further, “downstream side” or “upstream side” means the downstream side or the upstream side when viewed in the traveling direction Z of the ion beam 50.

  The ion implantation apparatus further includes an analysis slit 70 that performs momentum analysis of the ion beam 50 in cooperation with the analysis electromagnet 200, and an acceleration / deceleration device 400 that performs deflection and acceleration / deceleration of the ion beam 50. The path of the ion beam 50 from the ion source 100 to the substrate 60 is maintained in a vacuum atmosphere.

The ion beam 50 generated from the ion source 100 and transported to the substrate 60 has, for example, a ribbon shape in which the dimension W _{Y in the} Y direction is larger than the dimension W _X in the X direction, as shown in FIG. That is, W _Y > W _X. Even if the ion beam 50 has a ribbon shape, it does not mean that the dimension W _{X in the} X direction is as thin as paper or cloth. For example, the dimension W _{X in} the X direction of the ion beam 50 is about 30 mm to 80 mm, and the dimension W _{Y in the} Y direction is about 300 mm to 500 mm, although it depends on the dimension of the substrate 60. The larger surface of the ion beam 50, that is, the surface along the YZ plane is the main surface 52.

As in the example shown in FIG. 3, the ion source 100 generates a ribbon-like ion beam 50 in which the dimension W _{Y in} the Y direction is larger than the dimension T _{Y in} the Y direction of the substrate 60. For example, if the dimension T _Y is 300 mm to 400 mm, the dimension W _Y is about 400 mm to 500 mm.

  The substrate 60 is, for example, a semiconductor substrate, a glass substrate, or another substrate. The planar shape may be a circle or a rectangle.

  The analysis slit 70 has a slit 72 extending substantially parallel to the Y direction. The analysis slit 70 is preferably provided in the vicinity of the focal point 56 in the X direction of the ion beam 50 emitted from the analysis electromagnet 200 as in this example, in order to increase the resolution of the momentum analysis.

  The accelerator / decelerator 400 is, for example, as described in Japanese Patent No. 3738734, and deflects the ion beam 50 in the X direction by an electrostatic field and accelerates or decelerates the ion beam 50. is there.

  Although such an accelerator / decelerator 400 is not essential, when it is provided, the accelerator / decelerator 400 can deflect not only the ion beam 50 but also the ion beam 50 in the X direction. Therefore, the ion beam 50 having a desired energy can be selected and derived, and energy contamination (mixing of undesired energy ions) can be suppressed. In addition, since these functions can be realized by one accelerator / decelerator 400, the transport path of the ion beam 50 can be shortened as compared with the case where a separate energy analyzer is provided. Transport efficiency can be improved. In particular, when the ion beam 50 has a low energy and a large current, the ion beam 50 is likely to diverge due to the space charge effect during transportation, so that the effect of shortening the transport distance becomes significant.

(2) About the analysis electromagnet 200 Below, the structure of the whole analysis electromagnet 200, the detail of the structure of each coil, the manufacturing method of each coil, the feature of the analysis electromagnet 200, a control method, another embodiment, etc. are demonstrated in order.

(2-1) Overall Configuration of Analysis Electromagnet 200 One embodiment of the analysis electromagnet 200 is shown in FIGS. 6 shows the vacuum vessel 236 removed. The analysis electromagnet 200 receives the ribbon-like ion beam 50, generates a magnetic field along the Y direction in the beam path 202 which is a path of the ion beam 50, and bends the ion beam 50 in the X direction to analyze momentum. Is to do. The magnetic field is schematically represented by magnetic lines 204 in FIG. That is, when the ion beam 50 is incident on the analysis electromagnet 200, the ion beam 50 is deflected to the right by receiving the Lorentz force F _X directed to the right as viewed in the traveling direction Z by the magnetic field while traveling, and thereby the momentum. Analysis is performed. A center trajectory 54 of the ion beam 50 is indicated by a one-dot chain line in FIG. Let the radius of curvature be R. An angle (deflection angle) for deflecting the ion beam 50 by the analysis electromagnet 200 is defined as α.

  The radius of curvature R is, for example, 300 mm to 1500 mm. The deflection angle α is, for example, 60 degrees to 90 degrees. FIG. 4 illustrates a case where the deflection angle α is 90 degrees.

  The analysis electromagnet 200 also includes a first inner coil 206, a second inner coil 212, one or more (three in this embodiment) first outer coils 218, and one or more (this implementation), also referring to FIG. The embodiment includes three second outer coils 224, a yoke 230, and a set of magnetic poles 232. The beam path 202 is surrounded by a vacuum container 236 made of a non-magnetic material and is maintained in a vacuum atmosphere. This vacuum vessel 236 is also called an analysis tube.

  Since the first inner coil 206 and the second inner coil 212 are extracted and shown in FIG. 8, it is easier to understand by referring to them.

  Each coil 206, 212, 218, 224, in this embodiment, is substantially plane in the Y direction with respect to a symmetry plane 234 (see FIG. 5 etc.) that passes through the center in the Y direction of the beam path 202 and is parallel to the XZ plane. It has a symmetrical shape. The same applies to a coil 320 (see FIGS. 22 and 24), a first coil 326, and a second coil 328 (see FIG. 25), which will be described later. Such plane symmetry makes it easy to generate a magnetic field having good symmetry in the Y direction in the beam path 202. This contributes to minimizing the disturbance of the shape of the ion beam 50 when it is emitted from the analysis electromagnet 200.

  In the following, when it is necessary to distinguish the plurality of first outer coils 218 and the plurality of second outer coils 224 from each other, as shown in FIGS. 5, 9, 13, etc. Are the first outer coils 218a, 218b, and 218c in order from the upper side in the Y direction, and the second outer coil 224 is plane-symmetric with the first outer coil 218 as described above. The second outer coils 224a, 224b, and 224c are used.

  In the drawings, the underline is attached to the reference numerals indicating the coils 206 and the like, which means that the entire coils and the like are shown.

  The first inner coils 206 are opposed to each other in the X direction across the beam path 202 with reference mainly to FIGS. 8 and 12 and one side in the Y direction of the ion beam 50 (upper side in this embodiment). A pair of main body portions 208 that cover approximately half or more (in other words, substantially more than half) of the two, and end portions in the direction along the Z direction of the two main body portions 208 (in other words, the inlet 238 side of the analyzing electromagnet 200) And an end portion on the outlet 240 side (the same applies to other coils), and a saddle type coil having a pair of connecting portions 210 that are connected to each other while avoiding the beam path 202. In cooperation with the second inner coil 212, a main magnetic field for bending the ion beam 50 in the X direction is generated. The main magnetic field refers to such a magnetic field that bends the ion beam 50 with a predetermined radius of curvature R mainly by the magnetic field.

  The reason why it is called a saddle type is that when the first inner coil 206 is viewed as a whole, it has a shape similar to a saddle. The same applies to the other coils 212, 218, 224 and coils 326, 328 described later.

  The crossing portion 210 is provided away from the beam path 202 on the upper side in the Y direction in order to prevent the ion beam 50 from hitting and to reduce the influence of the magnetic field generated there on the ion beam 50. For the same purpose, other coil transition portions are also provided apart from the beam path 202 on the upper side or the lower side in the Y direction.

  Referring mainly to FIG. 8, the second inner coils 212 are opposed to each other in the X direction across the beam path 202, and are substantially on the other side in the Y direction of the ion beam 50 (the lower side in this embodiment). A pair of main body portions 214 that cover more than half (in other words, substantially more than half) and the end portions in the direction along the Z direction of both main body portions 214 are connected to each other while avoiding the beam path 202. A saddle-shaped coil having a pair of crossing portions 216, which is disposed so as to overlap with the first inner coil 206 in the Y direction, and cooperates with the first inner coil 206 to cooperate with the ion beam 50. Generates a main magnetic field that bends in the X direction. That is, the second inner coil 212 generates a magnetic force line 204 in the same direction as the first inner coil 206.

  The second inner coil 212 has the same size and structure as the first inner coil 206. The number of windings of the conductor (specifically, the conductor sheet 268; see FIG. 10 and the like) is usually the same as that of the first inner coil 206. However, as described above, the first inner coil 206 is symmetrical with respect to the symmetry plane 234. The crossover part 216 is provided on the opposite side (that is, the lower side) of the crossing part 210 in the Y direction across the beam path 202.

  A slight gap (for example, about 20 mm) 242 is provided between the first inner coil 206 and the second inner coil 212 as shown by a line in FIG. There can be provided a total of two cooling plates 312 (see FIG. 19) to be described later, one on the first inner coil 206 side and one on the second inner coil 212 side.

  Each of the first outer coils 218 mainly includes a pair of body portions 220 that are outside the first inner coil 206 and are opposed to each other in the X direction with the beam path 202 interposed therebetween, with reference mainly to FIG. A saddle-shaped coil having a pair of connecting portions 222 that connect the end portions in the direction along the Z direction of both the main body portions 220 while avoiding the beam path 202, the main magnetic field A secondary magnetic field is generated to assist or correct the above. The first outer coils 218 are arranged so as to overlap in the Y direction.

  More specifically, the main body portion 220 of each first outer coil 218 and the lateral portion of the crossover portion 222 (portion corresponding to the lateral portion 284 shown in FIG. 12) are arranged so as to overlap each other in the Y direction. Although it may be difficult to say that the vertical portion of the crossover portion 222 (the portion corresponding to the vertical portion 282 shown in FIG. 12) is arranged as described above when viewed strictly, It can be said that the first outer coils 218 are arranged so as to overlap each other in the Y direction. The same applies to each second outer coil 224.

  Each first outer coil 218 has substantially the same structure as the first inner coil 206. However, the dimension in the Y direction is smaller than that of the first inner coil 206. Also, the number of windings of the conductor is usually smaller than that of the first inner coil 206. Each first outer coil 218 has the same number of turns of the conductor (specifically, the conductor sheet 269; see FIG. 10 and the like). The dimensions of the first outer coils 218 in the Y direction are different in this embodiment, but may be the same. The same applies to each second outer coil 224.

  For example, the dimensions in the Y direction of the main body portion and the transition portion of each coil are about 230 mm for the first inner coil 206 and the second inner coil 212, about 50 mm for the first outer coil 218 a and the second outer coil 224 a, It is about 60 mm for the first outer coil 218b and the second outer coil 224b, and is about 100 mm for the first outer coil 260c and the second outer coil 224c.

  In FIG. 7, between the first outer coils 218, between the second outer coils 224, and between the lowermost first outer coil 218 (218 c) and the uppermost second outer coil 224 (224 c), Although indicated by lines, slight gaps 244, 246, and 248 are provided (see also FIG. 9). The cooling plate 312 (refer FIG. 19) mentioned later can be provided there. For example, the size of the gaps 244 and 246 is about 10 mm, and the size of the gap 248 is about 20 mm to match the gap 242. The gaps 244, 246 are provided along the entire circumference along the outer coils 218, 224.

  Each first outer coil 218 may generate a magnetic field in the same direction as the first inner coil 206 and the second inner coil 212, or may generate a magnetic field in the opposite direction, and control the direction of the magnetic field by controlling the direction of the magnetic field. It may be reversed. The same applies to each second outer coil 224. A part of the lines of magnetic force (magnetic field) generated in the main body 220 of each first outer coil 218 spreads toward the beam path 202 (in other words, leaks out), and thus affects the main magnetic field. Accordingly, each first outer coil 218 can generate a sub-magnetic field that assists or corrects the main magnetic field. In that case, each first outer coil 218 has an effect of assisting or correcting the main magnetic field mainly in the region near the inner side. The same applies to each second outer coil 224.

  Each of the second outer coils 224 mainly includes a pair of main body portions 226 that are outside the second inner coil 212 and face each other in the X direction with the beam path 202 interposed therebetween, mainly referring to FIG. A saddle type coil having a pair of crossing portions 228 connecting the end portions in the direction along the Z direction of both the main body portions 226 avoiding the beam path 202, the main magnetic field A secondary magnetic field is generated to assist or correct the above. Each second outer coil 224 is arranged so as to overlap in the Y direction. In addition, it is arranged so as to overlap with the first outer coil 218 in the Y direction.

  Each second outer coil 224 has substantially the same structure as the second inner coil 212. However, the dimension in the Y direction is smaller than that of the second inner coil 212. Also, the number of windings of the conductor is usually smaller than that of the second inner coil 212. The number of turns of the conductor (specifically, the conductor sheet) of each second outer coil 224 and the dimension in the Y direction are as described above.

  As an example of the number of turns of each conductor, the number of turns of the conductors of the first inner coil 206 and the second inner coil 212 is about 110, respectively, and the conductors of the first outer coil 218 and the second outer coil 224 are respectively. Each winding is about 85 times.

  The main body portions 208, 214, 220, and 226 of each coil are portions that are almost entirely located within the yoke 230 and generate a target magnetic field (main magnetic field or sub magnetic field) in the beam path 202. It can also be said. The same applies to a main body 322 of a coil 320 described later.

  The crossing portions 210, 216, 222, and 228 of each coil are electrically connected between ends in a direction along the Z direction of a pair of main body portions, and cooperate with the main body portion to form a loop-shaped conductive member. It can also be said that it is a part that forms a path. The same applies to transition portions 324 and 325 of a coil 320 described later.

  5 is a longitudinal sectional view taken along the line AA in FIG. 4, and FIG. 5 shows the main body portions 208, 214, 220, and 226 of the coils 206, 212, 218, and 224. . 24 to 26 described later also show the main body of each coil.

  The yoke 230 is made of a ferromagnetic material and collectively surrounds the outside of the main body portions 208, 214, 220, and 226 of the coils 206, 212, 218, and 224. Such a yoke 230 also has an effect of reducing the leakage magnetic field to the outside. The plane shape of the yoke 230 has a so-called fan shape as shown in FIG. The yoke 230 has a square frame shape (cross section along the XY plane). Such a yoke 230 may be called a window frame type yoke.

  In this embodiment, the upper yoke 231 constituting the yoke 230 is detachable. How to use the upper yoke 231 will be described later.

Each of the pair of magnetic poles 232 is made of a ferromagnetic material, and protrudes inward from the yoke 230 so as to face each other in the Y direction with the beam path 202 interposed therebetween. For example, it protrudes about 15 mm. The planar shape of each magnetic pole 232 has an arc shape along the central orbit 54 of the ion beam 50 shown in FIG. This is sometimes called a fan shape. The gap length G between the magnetic poles 232 is somewhat larger (for example, about 100 mm to 150 mm) than the dimension W _{Y in} the Y direction of the ion beam 50. Although such a magnetic pole 232 is not essential, if it is provided, the magnetic field lines 204 tend to concentrate in the gap between the magnetic poles 232, so that it is easy to generate a magnetic field having a high magnetic flux density in the beam path 202. become.

The gap length G between the magnetic poles 232 has, for example, a size that is 1/2 or more of the curvature radius R. As a specific example, when the curvature radius R is 800 mm, the gap length G is, for example, 500 mm. The gap length G usually has a size equal to or larger than the width W _G of each magnetic pole 232. That is, _G ≧ W G. With such a dimensional relationship, the magnetic pole 232 and the yoke 230 need not be unnecessarily enlarged.

  5 to 7, it seems that there are gaps between the first inner coil 206 and the first outer coil 218 and between the second inner coil 212 and the second outer coil 224. However, in this embodiment, the laminated insulator 262 shown in FIGS. 9 and 10 is interposed between them.

(2-2) Structure and the like of each coil Next, the structure and the like of each coil will be described in detail. FIG. 9 is a schematic diagram showing an enlarged cross section of the first inner coil and the first outer coil along line DD in FIG. FIG. 10 is an exploded cross-sectional view of the first inner coil and the uppermost first outer coil shown in FIG.

  The first inner coil 206 and the first outer coil 218 have an insulating sheet 266 whose main surface 266a extends along the Y direction and a conductor sheet 268 whose main surface 268a extends along the Y direction on the outer peripheral surface of the first laminated insulator 261. The superposed one (set 264) is wound and laminated several times (stacked in the direction of arrow 270 crossing the Y direction, the same applies hereinafter), and a second laminated insulator 262 is formed on the outer peripheral surface thereof. An insulating sheet 267 whose main surface 267a extends along the Y direction and a conductor sheet 269 whose main surface 269a extends along the Y direction are stacked one on top of the other (set 265), and the third stack is formed on the outside. Notch portions 272 to 275 (FIG. 7) are formed on the fan-shaped cylindrical laminated coil 290 (see FIG. 14) on which the insulator 263 is formed, leaving the main body portions 208 and 220 and the transition portions 210 and 222. Has a structure in which the irradiation).

  In order to facilitate understanding of the notches 272 to 275, the notches 272 to 275 of the first inner coil 206 are shown in FIG. The first outer coil 218 is also provided with notches 272 to 275 similar to this.

  The yoke 230 fits into the two notches 272 and 273 located in the inner and outer directions of the radius of curvature R. That is, it has a shape that matches the shape of the yoke 230. The same applies to notches 276 to 279 of the coil 320 described later. The two notches 274 and 275 on the traveling direction Z side of the ion beam 50 form the upper half of the inlet 238 and the outlet 240, respectively.

  The second laminated insulator 262 may be viewed as constituting the first inner coil 206 (shown as such in FIG. 10), and viewed as constituting the first outer coil 218. Alternatively, it may be seen that both the coils 206 and 218 are shared.

  As shown in FIG. 15, the laminated coil 290 shown in FIG. 14 includes an inner coil 292 and an outer coil 294 having the same cross-sectional structure as FIG. Also in this case, the second laminated insulator 262 may be regarded as constituting the inner coil 292 (shown as such in FIG. 15), and may be regarded as constituting the outer coil 294. Alternatively, it may be seen that both the coils 292 and 294 are shared.

  When the portions 272a to 275a of the laminated coil 290 corresponding to the notches 272 to 275 are removed by cutting or the like to form the notches 272 to 275, the inner coil 292 becomes the first inner side. The outer coil 294 becomes the first outer coil 218.

  Further, in this embodiment, in order to divide the first outer coil 218 into three (in three stages), the outer coil 294 of the laminated coil 290 is provided with the gap 244 by cutting or the like.

  The laminated insulators 261, 262, and 263 of the laminated coil 290 are formed by, for example, winding a prepreg sheet a plurality of times and laminating. A prepreg sheet 300 in FIG. 16 is the prepreg sheet. The prepreg sheet is a sheet obtained by impregnating a support having insulation properties and heat resistance with a resin having insulation properties and treating it in a semi-cured state.

  The support is made of, for example, glass fiber or carbon fiber. The resin is made of, for example, an epoxy resin or a polyimide resin. The laminated insulators 261 to 263 formed using such a prepreg sheet can also be referred to as fiber reinforced plastic (FRP). The thickness of the laminated insulators 261 to 263 may be selected according to the strength required as a structural material.

  The insulating sheets 266 and 267 are, for example, sheets made of Nomex (registered trademark), Lumirror (registered trademark) or Kapton (registered trademark), or other insulating sheets, respectively. The thickness of the insulating sheets 266 and 267 may be selected according to the required withstand voltage. For example, it is about 75 μm, but it may be thinner.

  The conductor sheets 268 and 269 are each made of, for example, a copper sheet or an aluminum sheet. These thicknesses may be selected according to the current value to be passed. For example, the thickness in the case of a copper sheet is about 0.4 mm, and the thickness in the case of an aluminum sheet is about 0.5 mm. What is necessary is just to select the width | variety of the direction corresponded to these Y directions according to the dimension of the Y direction of the coil required. For example, it is 230 mm (the width before processing described later is, for example, about 234 mm). The widths of the laminated insulators 261 to 263 and the insulating sheets 266 and 267 may be matched with this.

  Contrary to FIG. 10, the insulating sheet 266 and the conductor sheet 268 are overlapped with each other by arranging the conductor sheet 268 on the inner side of the first inner coil 206 (left side in FIG. 10, that is, the laminated insulator 261 side). The insulating sheet 266 may be placed on the outer side. If necessary, the insulating sheets 266 may be stacked on both sides of the conductor sheet 268. The same applies to the insulating sheet 267 and the conductor sheet 269 of the first outer coil 218.

When viewed in plan, the conductor sheet 268 of the first inner coil 206 has a structure in which it is wound in a fan shape a plurality of times as shown in FIG. 11, and terminals 340 are connected to both ends thereof. However, the number of windings is not limited to that shown in the figure. By passing a current I _M through the conductor sheet 268, the magnetic lines of force 204 that form the main magnetic field can be generated. FIG. 12 also shows the same current I _M and magnetic field lines 204.

  The conductor sheet 269 of the first outer coil 218 has the same structure as that shown in FIG.

  The second inner coil 212 and the second outer coil 224 also have the same structure as the first inner coil 206 and the first outer coil 218. However, as described above, the first inner coil 206 and the first outer coil 218 have a plane-symmetric shape with respect to the plane of symmetry 234.

  In addition, a member for reinforcing the coil or the like may be further provided on the outer peripheral portion of the outer laminated insulator 263 (in the case of the coil shown in FIG. 23, the laminated insulator 262) as necessary.

  An example of the structure of the transition part of each coil will be described in more detail with reference to FIG. 12 by taking the first inner coil 206 as an example.

  Each bridging portion 210 of the first inner coil 206 is connected to the end portion of the main body portion 208 in the direction along the Z direction at substantially right angles, and extends in two vertical portions 282 substantially parallel to the Y direction. And a lateral portion 284 connected to both longitudinal portions 282 substantially at right angles and extending substantially parallel to the XZ plane. That is, the vertical portions 282 are connected by the horizontal portion 284. Accordingly, the first inner coil 206 has a horizontal conductive path 286 substantially perpendicular to the Y direction and a vertical conductive path 288 substantially parallel to the Y direction. That is, except for the corners, most of the conductive paths of the first inner coil 206 are configured by combining both conductive paths 286 and 288. The current densities in the conductive paths 286 and 288 are substantially the same everywhere.

  The crossover portions 216, 222, and 228 of the other coils 212, 218, and 224 also have the same structure as that of the crossover portion 210. Accordingly, each of the other coils 212, 218, and 224 also has a horizontal conductive path that is substantially orthogonal to the Y direction and a vertical conductive path that is substantially parallel to the Y direction. That is, except for the corners, most of the conductive paths of these coils are configured by combining a horizontal conductive path and a vertical conductive path. The current densities in the horizontal conductive path and the vertical conductive path are substantially the same everywhere. The same applies to a coil 320 described later.

  It is preferable that the crossing portion of each coil has the above-described structure, and by doing so, it is possible to more reliably reduce the overhang distance of the crossing portion from the analysis electromagnet 200 in the beam entering / exiting direction. This overhang distance will be described in detail later.

An example of the power supply configuration for each coil is shown in FIG. In this example, a DC main power source 250 is connected to each of the first inner coil 206 and the second inner coil 212, and the first inner coil 206 and the second inner coil 212 are substantially connected to each other from the main power source 250. The current I _M having the same magnitude can be supplied to the two. Note that the two main power sources 250 do not necessarily need to be separate, and may be a main power source that combines them.

Further, in this example, a DC sub-power source 252 is connected to each first outer coil 218 (218a to 218c) and each second outer coil 224 (224a to 224c), and each first power source 252 is connected to each first power source 252. can the outer coil 218 and the second outer coil 224 flow the current I _S, moreover it can be controlled independently of the current I _S flowing through the respective first outer coil 218 and the second outer coil 224. Incidentally, the plurality of sub-power supply 252 is not necessarily required to be separately disposed, they are combined into one, each independently current I _S flowing through the respective first outer coil 218 and the second outer coil 224 It is also possible to use one sub-power supply that can be controlled.

(2-3) Method for Manufacturing Each Coil Next, an example of the method for manufacturing each coil will be described by taking the first inner coil 206 and the first outer coil 218 as examples.

  First, the sector-shaped cylindrical laminated coil 290 shown in FIG. 14 is manufactured. This is done as follows.

  First, as shown in FIG. 16, a mold 296 having an arcuate portion 297 projecting outward opposite to the arcuate portion 291 of the laminated coil 290 shown in FIG. As described above, the prepreg sheet 300 as described above is wound a plurality of times. Thereby, the laminated insulator 261 shown in FIGS. 15 and 17 is formed.

  Next, as shown in FIG. 17, the mold 296 is rotated in the same manner as described above so that the insulating sheet 266 and the conductor sheet 268 are overlapped with each other, and are wound around the outer peripheral surface of the laminated insulator 261 by multiple turns. To do. Thus, a laminated body of the insulating sheet 266 and the conductor sheet 268 shown in FIG. 15 is formed.

  Next, similarly to the case of FIG. 16, the prepreg sheet 300 is wound around the outer peripheral surface of the laminated body of the insulating sheet 266 and the conductor sheet 268 a plurality of times. Thereby, the laminated insulator 262 shown in FIG. 15 is formed.

  Next, as in the case of FIG. 17, the insulating sheet 267 and the conductor sheet 269 are overlapped with each other and wound around the outer peripheral surface of the laminated insulator 262 a plurality of times. Thereby, a laminated body of the insulating sheet 267 and the conductor sheet 269 shown in FIG. 15 is formed.

  Next, similarly to the case of FIG. 16, the prepreg sheet 300 is wound around the outer peripheral surface of the laminate of the insulating sheet 267 and the conductor sheet 269 a plurality of times. Thereby, the laminated insulator 263 shown in FIG. 15 is formed.

  When the mold 296 is removed after the above process, as shown in FIG. 18, the laminated coil 290a is formed of the inner coil 292 and the outer coil 294, but the arc-shaped portion 291a projects outwardly opposite to the arc-shaped portion 291. can get.

  In addition, the conductor sheet 268 can be connected to the terminal 340 (see FIG. 11) using the lead plate by sandwiching the lead plate between the winding start portion and the winding end portion of the conductor sheet 268, respectively. . The same applies to the conductor sheet 269.

  Further, before winding as described above, abrasive grains (shots) such as metal particles are sprayed on the main surfaces 268a, 269a on both the front and back sides of the conductor sheets 268, 269 (that is, shot blasting is performed) to It is preferable to keep it rough. By doing so, the surface area can be increased and the adhesion with the insulating sheets 266, 267 and the like can be improved. Although the shot blast treatment is effective even when applied to at least one main surface of the conductor sheets 268 and 269, it is preferable to apply the shot blast treatment to both main surfaces. The same applies to the insulating sheets 266 and 267.

  Similarly, it is preferable that the main surfaces 266a and 267a on both sides of the insulating sheets 266 and 267 are also subjected to shot blasting to roughen the surface. By doing so, it is possible to increase the surface area and further improve the adhesion with the conductor sheets 268, 269 and the like.

  Next, after winding a heat-shrink tape (not shown) around the outer periphery of the laminated coil 290a, the arc-shaped portion 291a is pressed (pressed) as shown by an arrow 302 as shown in FIG. The molded product to be formed is heated and cured. As a result, a laminated coil 290b that is the basis of the laminated coil 290 shown in FIG. 11 is obtained. By winding the heat shrinkable tape, the strength of the structure is improved. Instead of the heat shrinkable tape, a prepreg tape having the same configuration as that of the prepreg sheet described above may be wound.

  Next, after the laminated coil 290b is vacuum impregnated with resin, it is cured by heating under pressure. In short, this is to perform resin molding. Thereby, the laminated coil 290 shown in FIG. 14 is obtained. By performing this resin molding, the adhesion strength between the layers of the laminated coil 290 can be increased to increase the strength of the coil, and the electrical insulation performance can be improved.

  Next, after cutting the both ends of the laminated coil 290 in the axial direction (in other words, the height direction) to make a flat surface, the portions 272a to 275a corresponding to the notches are cut, The notches 272 to 275 are formed.

  When the outer coil 294 is a plurality of the first outer coils 218, the outer coil 294 is grooved in a portion corresponding to the gap 244 to form the gap 244.

  Next, the laminated coil 290c subjected to cutting and grooving as described above is immersed in an etching solution for etching the material of the conductive sheets 268 and 269 (as described above, copper or aluminum) to perform an etching process. Thereby, burrs and the like of the conductor sheets 268 and 269 generated on the processed surface during the cutting and grooving are removed to prevent a short circuit (layer short) between the conductor sheets 268 and 269, and the insulating sheet 266, The end surfaces of the conductor sheets 268 and 269 are recessed more roundly than the end surfaces of the H.267, and the creeping distance of the interlayer insulation of the conductor sheets 268 and 269 can be increased to improve the insulation performance.

  Then, a heat shrink tape is wound around the entire laminated coil 290d subjected to the etching process as described above, and is cured by heating. As a result, a fan-shaped cylindrical laminated coil in which the first inner coil 206 and the first outer coil 218 shown in FIGS. 4 to 10 and the like are integrated can be obtained. By winding the heat shrinkable tape, the strength of the structure is improved. However, when the coil has a forced cooling structure as described below, the cooling plate 312 may be attached as follows before winding the heat shrink tape. Instead of the heat shrinkable tape, a prepreg tape having the same configuration as that of the prepreg sheet described above may be wound.

  That is, as shown in FIG. 19, the cooling plate 312 having the refrigerant passage 314 is placed on the upper and lower end surfaces 306 to 307 and the gaps 244 of the first inner coil 206 and the first outer coil 218 with the insulator 316 interposed therebetween. Install with pressure contact. The cooling plate 312 is preferably provided not only on the upper and lower end surfaces in the Y direction of the main body portions 208 and 220 of the coils 206 and 218 but also on the upper and lower end surfaces in the Y direction of the transition portions 210 and 222. That is, it is preferable to provide in as wide a region as possible. For example, cooling water flows through each refrigerant passage 314. In this example, the insulator 316 is wound around the cooling plate 312, but it is not always necessary to wind it.

  With the cooling plate 312, the coils 206 and 218 can be forcibly cooled from their end faces. Such a cooling structure is sometimes called an end cooling system.

  In the above case, a thermal diffusion compound (for example, silicone grease) having good thermal conductivity is interposed between the cooling plate 312 and the insulator 316 and between the insulator 316 and the end surfaces of the coils 206 and 218 (for example, silicone grease). It is preferable to leave it applied. By doing so, it is possible to eliminate the air layer as much as possible, and to further improve the heat conduction performance and thus the cooling performance.

  Further, each of the gaps 244 is formed in a wedge shape that narrows toward the inside of the coil 218 (left side in FIG. 19), and the cooling plate 312 attached to the gap 244 is also formed in a similar wedge shape, and the cooling plate 312 is press-fitted. Also good. By doing so, the gap between the end face of the coil 218 and the cooling plate 312 can be reduced to improve the adhesion, so that the cooling performance can be further improved.

  When the cooling plate 312 is provided as described above, the heat-shrinkable tape or prepreg tape may be wound around the entire coil in the state shown in FIG. Thereby, the cooling plate 312 can be fixed and adhered.

  And finally, you may mold the whole coil including the 1st inner side coil 206 and the 1st outer side coil 218 with resin, also when the cooling plate 312 is not provided, as needed. By doing so, the moisture resistance performance, insulation performance, mechanical strength, etc. of the coil can be further improved. In that case, it is preferable to mix 5-30 weight% filler (filler) with the said resin. If it does so, the crack-proof performance etc. of resin can be improved.

  Similarly to the above, the second inner coil 212 and the second outer coil 224 can be manufactured as a combination of the coils 212 and 224. Also, the coil 320 shown in FIGS. 22 to 24, the first coil 326 and the second coil 328 shown in FIG. 25, the inner coil 330, the first outer coil 218, and the second outer coil 224 shown in FIG. It can be manufactured in the same manner as described above. The inner and outer coils can be manufactured integrally.

  The assembly of the analysis electromagnet 200 shown in FIGS. 4 and 5 using the coils 206, 218, 212, and 224 may be performed by the following procedure, for example. That is, with the upper yoke 231 of the yoke 230 removed, the yoke 230 is first integrated with the second inner coil 212 and the second outer coil 224, and then the vacuum vessel 236 is inserted from above. Then, the integrated first inner coil 206 and first outer coil 218 are inserted from above, and finally the upper yoke 231 is attached.

(2-4) Features of Analyzing Electromagnet 200 In the analyzing electromagnet 200, the first inner coil 206 and the first outer coil 218 are provided with the main body portions 208, 220 and the fan-shaped cylindrical laminated coil 290 as described above. Since the cutout portions 272 to 275 are provided with the crossover portions 210 and 222 being left, the crossover portions 210 and 222 extend substantially in parallel to the Y direction from the end portions of the main body portions 208 and 220. It is in the state. Therefore, even when the dimensions of the main body portions 208 and 220 in the Y direction are increased, the dimensions of the crossover portions 210 and 222 in the Y direction need only be increased correspondingly, so that the crossover portions 210 and 222 in the beam incident / exit direction are sufficient. The overhang distance of does not increase.

The above will be described with reference to FIG. 8 by taking the first inner coil 206 as an example. When the dimension a in the Y direction of the main body 208 is increased, the dimension c in the Y direction of the transition section 210 is correspondingly increased. Can be increased. Specifically, the dimensions a and c are substantially equal to each other. Therefore, even when the dimension a is increased, the overhanging distance L ₃ (see FIG. 4) of the transition portion 210 in the incident / exit direction of the ion beam 50 does not increase. The overhang distance L ₃ is determined by the distance L ₅ between the end face of the yoke 230 and the end face of the transition part 210 and the thickness b of the transition part 210. That is, the overhang distance L ₃ can be expressed by the following equation. Incidentally, as can be seen from the above description of the structure of the first inner coil 206, the thickness of the main body 208 is also b.

[Equation 2]
L ₃ = b + L ₅

The above formula 2 does not include the dimension a in the Y direction, unlike the above formula 1 that represents the overhang distance L ₁ of the conventional analysis electromagnet 40. This is a feature that is greatly different from the conventional analysis electromagnet 40.

Moreover, the distance L ₅ can also be made smaller than the distance L ₂ of the conventional analysis electromagnet 40. This is because the crossover part 210 is not formed by bending the crossover part 16 obliquely by bending as in the conventional coil 12, but as described above, the cutout part 272 is formed in the fan-shaped cylindrical laminated coil 290. This is because the crossing portion 210 extends substantially parallel to the Y direction. In addition, it is because the corner portion 254 at the boundary between the main body portion 208 and the crossover portion 210 can be brought into a state close to a right angle with little roundness by cutting or the like.

For the above reasons, the overhanging distance L ₃ of the transition portion 210 from the yoke 230 in the beam incident / exit direction can be reduced.

  The same applies to the second inner coil 212 and the second outer coil 224.

For example, when the dimension a in the Y direction is the same 250 mm, the protruding distance L ₁ is about 300 mm in the conventional analysis electromagnet 40, whereas the protruding distance L ₃ is only about 110 mm in the analysis electromagnet 200.

For the same reason as described above, even when the inner coils 206 and 212 and the outer coils 218 and 224 are doubled as in the analysis electromagnet 200 of this embodiment, the beam entering from the yoke 230 of the outer coil 218 is reduced. The overhang distance L ₄ in the emission direction can be reduced. In the conventional analysis electromagnet 40, if the coils are arranged in an inner / outer double manner, the overhang distance of the transition portion becomes very large.

  For the above reason, the analysis electromagnet 200 can be reduced in size, and the area required for the installation of the analysis electromagnet 200 can be reduced. The analysis electromagnet 200 can be reduced in weight. Further, the possibility that the magnetic field generated by the transition portions of the coils 206, 218, 212, and 224 disturbs the form of the ion beam 50 is reduced.

  In addition, since the overhang distance of the transition part of each coil 206, 218, 212, 224 can be reduced, the length of the transition part can also be shortened, so that wasteful power consumption in the transition part can be reduced. Can do.

  In addition, as described above, each coil 206, 218, 212, 224 has a structure in which the conductor sheets 268, 269 are laminated with the insulating sheets 266, 267 sandwiched therebetween, so that a multi-turn in which the coated conductor is wound many times. Compared with the coil, the space factor of the conductor is higher and the power loss is less. Therefore, power consumption can be reduced.

  For example, when the dimension a in the Y direction of each coil is 250 mm, the space factor of the conductor of the multi-turn coil of the conventional coated conductor is about 60 to 70% even when it is not hollow (not a hollow conductor). In the case of a conductor, the space factor of the conductors of the coils 206, 218, 212, and 224 can be about 84 to 85%.

  As a result, according to the analysis electromagnet 200, a magnetic field having a required strength can be generated with less power consumption than the conventional analysis electromagnet 40. It is also possible to generate a magnetic field stronger than that of the conventional analysis electromagnet 40 with the same power consumption. In the latter case, the radius of curvature R of the ion beam deflection can be reduced, and the analysis electromagnet 200 can be further downsized.

  For example, when the dimension a in the Y direction of each coil is 250 mm and a magnetic field of 0.2 Tesla is generated by the two coils 206 and 212 as in the conventional analysis electromagnet 40 (the coils 218 and 224 are not used) The power consumption of the conventional analysis electromagnet 40 is about 67 kW, whereas the power consumption of the analysis electromagnet 200 is about 24 kW.

Furthermore, since the analysis electromagnet 200 of this embodiment includes the first inner coil 206 and the second inner coil 212 as described above, the dimension W _{Y in the} Y direction is larger than that of the upper and lower coils. It becomes easy to deal with the ion beam 50.

  In addition, the first outer coil 218 and the second outer coil 224 can generate a sub magnetic field for correcting the main magnetic field. By this sub-magnetic field, the main magnetic field can be corrected to improve the uniformity of the magnetic flux density distribution in the Y direction. Since the sub magnetic field generated by each of the outer coils 218 and 224 may be weaker than the main magnetic field, control is easy.

By the main magnetic field and the sub magnetic field as described above, a magnetic field with high uniformity of magnetic flux density distribution in the Y direction can be generated in the beam path 202. As a result, the disorder (bending, inclination, etc., the same applies hereinafter) of the shape of the ion beam 50 when emitted from the analysis electromagnet 200 can be kept small. This effect becomes more remarkable when the dimension W _{Y in} the Y direction of the target ion beam 50 is large.

  Even if there is one each of the first outer coil 218 and the second outer coil 224, it is possible to achieve the effect of correcting the main magnetic field. However, as in this embodiment, a plurality of first outer coils 218 and a plurality of second coils 224 are provided. It is preferable to provide the outer coil 224. In that case, the magnetic flux density distribution in the Y direction of the magnetic field generated in the beam path 202 can be more finely corrected by these outer coils 218 and 224, so that a more uniform magnetic field can be generated in the Y direction. it can. As a result, the disturbance of the form of the ion beam 50 at the time of extraction can be further reduced.

(2-5) Control method of analysis electromagnet 200 An example of the control method of the analysis electromagnet 200 will be described. The form of the ion beam 50 emitted from the analysis electromagnet 200 approaches the form of the ion beam 50 at the time of incidence. What is necessary is just to control the electric current sent through each 1st outer side coil 218 and each 2nd outer side coil 224. FIG.

  More specifically, in the ion beam 50 emitted from the analysis electromagnet 200, the inside of the radius of curvature R is greater than a predetermined center axis (center axis 318 shown in FIGS. 20 and 21) substantially parallel to the Y direction. The first outer coil 218 and the second outer coil 224 corresponding to the portion that is bent too much, and the first outer coil 218 and the second outer coil 218 corresponding to the portion where the inner bending is insufficient. At least one of increasing the current flowing through the outer coil 224 is performed to bring the shape of the ion beam 50 emitted from the analysis electromagnet 200 closer to that parallel to the central axis. As a result, the form of the ion beam 50 emitted from the analysis electromagnet 200 can be made straight without inclination and close to the form upon incidence.

  Examples of the form of the ion beam 50 emitted from the analysis electromagnet 200 are shown in FIGS. 20 and 21, respectively. In both figures, a predetermined central axis substantially parallel to the X direction is 318, the symmetry plane is 234, the central trajectory of the ion beam 50 is 54, and the radius of curvature is R.

  In the case of the form shown in FIG. 20, since the form of the ion beam 50 is not disturbed when viewed in the traveling direction Z of the ion beam 50, the ion beam 50 is passed through the first outer coils 218a to 218c and the second outer coils 224a to 224c. It is only necessary to maintain the current value.

  In the case of the form shown in FIG. 21, since the ion beam 50 is distorted (bent) in a circular arc shape that is close to a letter shape when viewed in the traveling direction Z, that is, the ion beam 50 is bent too much inside the radius of curvature R toward the upper side in the Y direction. Since the lower part is bent inwardly, the current flowing through the first outer coil 218a is greatly reduced, the current flowing through the first outer coil 218b is slightly reduced, and the first outer coil 218c and the second outer coil 224c are reduced. The current flowing through the second outer coil 224b is slightly reduced, and the current flowing through the second outer coil 224a is greatly reduced. As a result, while maintaining the position of the central trajectory 54 of the ion beam 50 emitted from the analysis electromagnet 200, the form thereof can be brought close to that of the central axis 318. That is, it can be brought close to the form shown in FIG.

  Even when the form of the ion beam 50 emitted from the analysis electromagnet 200 is disturbed by a pattern other than that shown in FIG. 21, it can be corrected by the same concept as described above to approximate the form shown in FIG.

  The main problem when the form of the ion beam 50 emitted from the analysis electromagnet 200 is disturbed is as follows. According to the control method, the occurrence of such a problem can be prevented.

  An analysis slit 70 shown in FIG. 1 is usually provided on the downstream side of the analysis electromagnet 200. Since the slit 72 of the analysis slit 70 is a straight line, when the shape of the ion beam 50 is disturbed, a portion cut by the analysis slit 70 is generated, and the amount of the ion beam 50 of a desired ion species passing through the analysis slit 70 is reduced. . Since a cut portion is generated, the uniformity of the ion beam 50 is also deteriorated. If the width of the slit 72 in the X direction is increased in order to avoid cutting, the resolution decreases.

  In addition to the above problems in the analysis slit 70, when ion implantation is performed on the substrate 60 using the ion beam 50 having a disordered shape, there arises a problem that the uniformity of implantation is deteriorated.

(2-6) Other Embodiments of Analysis Electromagnet 200 Next, other embodiments of the analysis electromagnet 200 will be described. Portions that are the same as or correspond to those of the previous embodiment shown in FIGS. 4 to 7 and the like are denoted by the same reference numerals, and redundant description is omitted. Hereinafter, differences from the embodiment will be mainly described.

  The analysis electromagnet 200 shown in FIG. 24 also refers to FIG. 22 as a coil, a pair of body portions 322 facing each other in the X direction across the beam path 202 and the direction along the Z direction of both body portions 322. Are provided with two sets of crossing portions 324 and 325 that connect the ends of the ion beam 50 avoiding the beam path 202, and a coil 320 that generates a magnetic field that bends the ion beam 50 in the X direction. In FIG. 22, the upper two transition portions 324 are one set of transition portions, and the lower two transition portions 325 are another set of transition portions.

  As shown in FIG. 23, the coil 320 has the same cross-sectional structure as the first inner coil 206 (see FIG. 10) and the inner coil 292 of the laminated coil 290 (see FIG. 15). That is, the coil 320 has a configuration in which notched portions 276 to 281 are provided in the fan-shaped cylindrical laminated coil having the same structure as the inner coil 292 except for the main body portion 322 and the transition portions 324 and 325. Yes. The coil 320 can also be made by the same manufacturing method as described above.

  The coil 320 is such that the first inner coil 206 and the second inner coil 212 (see FIG. 8) are integrated vertically into one coil.

  The notches 276 and 277 have the same shape as the notches 272 and 273. The notches 278 and 279 have a plane symmetrical shape with respect to the notches 276 and 277 and a plane of symmetry (see FIG. 24). More specifically, the notches 280 and 281 are through holes, and form the inlet 238 and the outlet 240, respectively. The ion beam 50 can pass through here. More specifically, the ion beam 50 can pass through the vacuum vessel 236.

  In order to pass the vacuum vessel 236 through the coil 320, for example, the vacuum vessel 236 may be inserted in the Z direction through the notches 280 and 281. In that case, if the vacuum vessel 236 has a flange or the like, it may be removed once. The same method may be used when assembling the analysis electromagnet 200.

  Each transition part 324 has the same structure as the transition part 210 of the first inner coil 206. Each crossover part 325 has a plane-symmetric shape with respect to each crossover part 324 and the symmetry plane 234.

The dimension a _{1 in} the Y direction of the main body 322 is substantially equal to the sum of the dimension c _{1 in} the Y direction of the transition part 324 and the dimension c _{1 in} the Y direction of the transition part 325 (ie, 2c ₁ ). Yes.

  The analysis electromagnet 200 of this embodiment also has a structure in which the coil 320 is integrated with the first inner coil 206 and the second inner coil 212. Therefore, for the same reason as described above, the transition portion of the coil 320 is used. It is possible to reduce the overhang distance of 324 and 325 from the yoke 230 to reduce the size of the analysis electromagnet 200 and to reduce the power consumption.

  The analysis electromagnet 200 shown in FIG. 25 includes a first coil 326 and a second coil 328 that generate a magnetic field that cooperates with each other to bend the ion beam 50 in the X direction. Both the coils 326 and 328 have the same structure as the first inner coil 206 and the second inner coil 212 (see FIG. 8), respectively. Accordingly, the first coil 326 and the second coil 328 can also be produced by the same manufacturing method as described above.

  In the analysis electromagnet 200 of this embodiment, the first coil 326 and the second coil 328 have the same structure as the first inner coil 206 and the second inner coil 212. It is possible to reduce the overhang distance from the yoke 230 of the crossover portion, to reduce the size of the analysis electromagnet 200, and to reduce the power consumption.

Further, since the first coil 326 and the second coil 328 as described above are provided, it is easy to deal with the ion beam 50 having a large dimension W _{Y in the} Y direction.

  The analysis electromagnet 200 shown in FIG. 26 has a structure similar to that of the coil 320 as the coil, an inner coil 330 that generates a main magnetic field that bends the ion beam 50 in the X direction, and an outer coil that is outside the inner coil 330. The first outer coil 218 and the second outer coil 224 as described above for generating a sub magnetic field for assisting or correcting the magnetic field are provided. That is, an inner coil 330 is provided instead of the first inner coil 206 and the second inner coil 212 shown in FIG. Accordingly, the inner coil 330, the first outer coil 218, and the second outer coil 224 can also be manufactured by the same manufacturing method as described above.

  A specific matter when manufacturing these coils will be described. Using the laminated coil 290 (see FIG. 14) having a required axial dimension (height), the inner coil 292 and the outer coil 294 are used. 22 is provided with a notch similar to the notches 276 to 281 in FIG. 22 by cutting or the like, and the outer coil 294 is provided with a gap similar to the gap 248 shown in FIG. 7 by cutting or the like. 218 and the second outer coil 224 may be formed. Dividing the first outer coil 218 and the second outer coil 224 into a plurality of parts is the same as in the case of FIG.

  The number of the first outer coils 218 is two in the example shown in FIG. 26, but is not limited thereto, and may be one or more. The same applies to the second outer coil 224.

  The analysis electromagnet 200 of this embodiment also includes the inner coil 330, the first outer coil 218, and the second outer coil 224 as described above. Therefore, for the same reason as described above, from the yoke 230 at the transition portion of the coil. The overhang distance can be reduced to reduce the size of the analysis electromagnet 200, and the power consumption can be reduced.

Further, since the first outer coil 218 and the second outer coil 224 as described above are provided in addition to the inner coil 330, the magnetic flux density distribution in the Y direction is highly uniform in the beam path 202 of the ion beam 50. A magnetic field can be generated. As a result, it is possible to suppress the disturbance of the shape of the ion beam 50 during extraction. This effect becomes more remarkable when the dimension W _{Y in} the Y direction of the target ion beam 50 is large.

  Further, since the plurality of first outer coils 218 and the plurality of second outer coils 224 are provided, the magnetic flux generated in the beam path 202 by the outer coils 218 and 224 by the outer coils 218 and 224 in the Y direction as described above. Since the density distribution can be corrected more finely, a magnetic field with higher uniformity can be generated in the Y direction. As a result, the disturbance of the form of the ion beam 50 at the time of extraction can be further reduced.

(3) Ion Source 100 An example of the ion source 100 shown in FIG. 1 will be described with reference to FIGS.

  The ion source 100 includes a scanning electron source 104 that generates electrons 110 scanned in the Y direction, a plasma generation container 122 into which the electrons 110 from the scanning electron source 104 are incident, and the plasma generation container 122. And an extraction electrode system 134 for extracting the ion beam 50 from the plasma 132 generated in (1).

  In this embodiment, the scanning electron source 104 includes a filament 108 that emits electrons 110, an extraction electrode 112 that extracts the electrons 110 from the filament 108, and an electron 110 that is extracted from the extraction electrode 112. A pair of scanning electrodes 114 that scan in the direction is provided, and these are accommodated in a vacuum vessel 106 having a divergent shape.

  A filament power supply 118 for heating the filament 108 and emitting electrons (thermoelectrons) 110 is connected to both ends of the filament 108. The filament power supply 118 is a DC power supply in this embodiment, but may be an AC power supply.

Connected between one end of the filament 108 and the extraction electrode 112 is an extraction power source 120 that applies the DC extraction voltage V _E with the former being on the negative electrode side (in other words, the latter is on the positive electrode side). In short, the energy of the extracted electrons 110 is determined by the magnitude of the extraction voltage V _E , and the energy becomes V _E eV. The energy of the electrons 110 is set such that the gas 128 can be ionized by electron impact in the plasma generation container 122. For example, when the gas 128 is a gas as will be described later, it may be about 500 eV to 3 keV, more specifically about 1 keV. That is, the magnitude of the extraction voltage V _E may be, for example, about 500 V to 3 kV, more specifically about 1 kV.

In this example, a pair of scanning electrodes 114 are connected to scanning power supplies 116 and 117 that apply triangular-wave scanning voltages V _S1 and V _S2 that are 180 degrees out of phase with each other. The two scanning power supplies 116 and 117 are provided in order to always set the potential between the pair of scanning electrodes 114 to 0 V, but without doing so, a triangular wave-shaped scanning is performed between the pair of scanning electrodes 114. One scanning power supply for applying a voltage may be provided.

  Here, an example is shown in which the electrons 110 are electrostatically scanned by the electrostatic scanning means comprising the scanning electrode 114 and a power source therefor. Instead, the electrons 110 are scanned in the Y direction by a magnetic field. Magnetic field scanning means may be provided. More specifically, a scanning coil that scans the electrons 110 in the Y direction with a magnetic field and a power source for the scanning coil may be provided.

  A plasma generation container 122 is connected to the tip of the vacuum container 106 constituting the scanning electron source 104. The wall surface of the plasma generating container 122 on the connection side is provided with a slit-shaped electron incident port 124 extending along the Y direction, and the electrons 110 scanned in the Y direction enter the plasma generating container 122 through the slit. Is done. The electron entrance 124 is preferably formed in such a slit shape, and by doing so, a gas 128 (see below) introduced into the plasma generation container 122 flows out to the scanning electron source 104 side. Can be suppressed.

A gas (including vapor) 128 for ionization is introduced into the plasma generation container 122 through a gas inlet 126. The gas 128 is a gas containing a desired element (for example, a dopant such as B, P, or As). More specific examples include gases containing source gases such as BF ₃ , PH ₃ , AsH ₃ , and B ₂ H ₆ .

  The plasma generation container 122 has an ion extraction slit 130 extending along the Y direction on the surface in the Z direction (the surface direction in FIG. 27), which is the extraction direction of the ion beam 50. The ion beam 50 is extracted in the Z direction through the ion extraction slit 130.

As shown in this example, a negative reflection voltage V _R is applied from the reflection power source 146 to a portion in the plasma generation container 122 opposite to the electron entrance port 124 to reflect the incident electrons 110. It is preferable to provide a plate-like reflective electrode 142. Reference numeral 44 denotes an insulator. The reflective electrode 142 is preferably sized to cover the entire area of the electrons 110 scanned in the Y direction.

The absolute value | V _R | of the reflected voltage V _R is preferably substantially equal to the absolute value | V _E | of the extraction voltage V _E. When | V _R | is much smaller than | V _E |, the action of reflecting the electrons 110 by the reflecting electrode 142 becomes small, and the electrons 110 easily collide with the reflecting electrode 142 and disappear, and | V _R | becomes | V _If it is larger than _E |, the action of reflecting the electrons 110 by the reflecting electrode 142 becomes too large, and the reflected electrons are less likely to be present in the plasma generation container 122. In any case, the reflected electrons 110 are converted into plasma. This is because it cannot be used very effectively for the generation of 132 and the effect of increasing the generation efficiency of the plasma 132 cannot be expected much.

As shown in FIG. 28, a ribbon-like ion beam 50 as described above is passed through the ion extraction slit 130 from the plasma 132 in the plasma generation container 122 outside the plasma generation container 122 and in the vicinity of the ion extraction slit 130. An extraction electrode system 134 is provided in the direction. The extraction electrode system 134 is composed of one electrode 136 in the illustrated example, but may be composed of two or more electrodes. Each electrode has a slit (refer to the slit 137 of the electrode 136) having a shape corresponding to the ion extraction slit 130 of the plasma generation container 122. In this example, for extraction of the ion beam, the beam is extracted from the beam extraction power supply 140 with the former on the negative electrode side (in other words, the latter on the positive electrode side) between the electrode 136 constituting the extraction electrode system 134 and the plasma generation vessel 122. A direct current beam extraction voltage V _EX is applied. In short, the energy of the extracted ion beam 50 is determined by the magnitude of the beam extraction voltage V _EX .

  Explaining the operation of the ion source 100, the scanning electron source 104 is scanned into the plasma generation container 122 in the Y direction, and wide electrons 110 are incident in the Y direction. Thus, a plasma 132 that is wide in the Y direction is generated in the plasma generation container 122. In addition, since the generation of the plasma 132 is continuously performed uniformly by the electrons 110 scanned in the Y direction, the plasma 132 having good uniformity in the Y direction is generated.

  A ribbon-like ion beam 50 having a long cross section in the Y direction is extracted from the plasma 132 by an extraction electrode system 134 through an ion extraction slit 130 extending in the Y direction. In addition, since the plasma 132 having good uniformity in the Y direction is generated as described above, the ion beam 50 having good uniformity of the beam current density distribution in the Y direction can be generated.

  By transporting such an ion beam 50 to the substrate 60 shown in FIG. 1 and irradiating the substrate 60, the ion beam 50 is irradiated uniformly over a wide area of the large-area substrate 60, and uniform over a wide area. Ion implantation can be performed with good properties.

  In addition, when the reflective electrode 142 is provided as in this example, the electrons 110 that have entered the plasma generation container 122 can be reflected to the inside of the plasma generation container 122, so that the lifetime of the electrons 110 in the plasma generation container 122 is long. The plasma density can be increased by increasing the generation efficiency of the plasma 132 due to the impact of the electrons 110. As a result, the amount of ion beam to be generated can be increased.

  A filament that emits thermoelectrons is provided in the plasma generation container 122, and a DC voltage (arc voltage) is applied between the filament and the plasma generation container 122 with the former set as the negative electrode side. The ionization of the gas 128 by the impact caused by the above may be used in combination with the ionization of the gas 128 by the electron 110. By doing so, it is possible to generate the ion beam 50 having a higher current by generating the plasma 132 having a higher density.

  The shape and number of the filaments are not limited to specific ones. For example, a plurality of U-shaped filaments may be provided, or one or a plurality of linear (in other words, rod-shaped) filaments may be provided.

Further, in both cases where the filament is used together and when the filament is not used, the beam measuring device 80 (see FIG. 1) for measuring the beam current density distribution in the Y direction of the ion beam 50 in the vicinity of the implantation position is used. The scanning speed of the electrons 110 may be controlled so that the beam current density distribution measured by the beam measuring instrument 80 approaches to be uniform. For example, the waveforms of the scanning voltages V _S1 and V _S2 output from the scanning power supplies 116 and 117 may be shaped into a waveform deformed from a triangular waveform so that the measurement beam current density distribution approaches to be uniform. More specifically, based on the measurement information from the beam measuring device 80, increasing the scanning speed of the electrons 110 in the region corresponding to the region where the beam current density is relatively large, In particular, at least one of reducing the scanning speed of the electrons 110 in an area corresponding to a small area, preferably both, may be performed.

  By controlling as described above, the beam current density distribution in the Y direction of the ion beam 50 incident on the substrate 60 can be made more uniform, and the uniformity of ion implantation into the substrate 60 can be further improved. When the filament is used in combination, the plasma density in the vicinity of the filament tends to increase, and the effect of controlling as described above becomes greater. The above control may be performed by the control device 90 shown in FIG.

  In the ion implantation apparatus shown in FIG. 1, by using the ion source 100 as described above and the analysis electromagnet 200 as described above, a large substrate having a large dimension in the Y direction (for example, a diameter of about 300 mm to 400 mm). Also for 60, ion implantation with good uniformity can be performed.

1 is a schematic plan view showing an embodiment of an ion implantation apparatus according to the present invention. It is a schematic perspective view which shows an example of a ribbon-shaped ion beam partially. It is a figure which shows the example of the relationship of the dimension in the Y direction of an ion beam and a board | substrate. It is a top view which shows one Embodiment of the analysis electromagnet which concerns on this invention. FIG. 5 is a cross-sectional view taken along line AA in FIG. 4. It is a perspective view which shows the analysis electromagnet shown in FIG. 4 except a vacuum vessel. It is a perspective view which shows the coil of the analysis electromagnet shown in FIG. FIG. 8 is a perspective view showing a first inner coil and a second inner coil shown in FIG. 7. It is the schematic which expands and shows the cross section of a 1st inner side coil and a 1st outer side coil along line DD in FIG. It is sectional drawing which decomposes | disassembles and shows the 1st inner side coil and uppermost 1st outer side coil which were shown in FIG. It is a schematic plan view which shows a mode that the conductor sheet shown in FIG. 10 is wound. It is a perspective view which shows the 1st inner side coil shown in FIG. It is a figure which shows an example of the power supply structure for the coils of the analysis electromagnet shown in FIG. It is a perspective view which shows an example of the laminated coils used as the origin of the 1st inner side coil, the 1st outer side coil, etc. which were shown in FIG. It is a figure which decomposes | disassembles and shows the cross section of an inner side coil and an outer side coil along line FF in FIG. It is a top view which shows an example of a mode that a prepreg sheet is wound using a type | mold. It is a top view which shows an example of a mode that an insulating sheet and a conductor sheet are wound using a type | mold. It is a top view which shows an example of the laminated coil after winding using the type | mold. It is sectional drawing which shows an example which attached the cooling plate to the 1st inner side coil and the 1st outer side coil. It is a figure which shows the example of the ion beam which has a normal form immediately after radiate | emitting from an analysis electromagnet. It is a figure which shows an example of the ion beam which has a distorted form immediately after radiate | emitting from an analysis electromagnet. It is a perspective view which shows the other example of the coil of an analysis electromagnet. It is a figure which decomposes | disassembles and shows the cross section of a coil along line JJ in FIG. It is sectional drawing which shows other embodiment of the analysis electromagnet based on this invention, and is equivalent to FIG. It is sectional drawing which shows other embodiment of the analysis electromagnet based on this invention, and is equivalent to FIG. It is sectional drawing which shows other embodiment of the analysis electromagnet which concerns on this invention, and is equivalent to FIG. It is sectional drawing which shows an example of an ion source seeing from an ion beam extraction direction side. It is a figure which shows the ion source shown in FIG. 27 seeing from the back side of a scanning electron source. It is a perspective view which shows an example of the conventional analysis electromagnet, and in order to make the shape of a coil easy to understand, the yoke is shown with the dashed-two dotted line.

Explanation of symbols

DESCRIPTION OF SYMBOLS 50 Ion beam 60 Substrate 100 Ion source 104 Scanning electron source 110 Electron 122 Plasma generation container 200 Analysis electromagnet 206 First inner coil 208 Main body part 210 Transition part 212 Second inner coil 214 Main body part 216 Transition part 218 First outer coil 220 Main body 222 Crossover portion 224 Second outer coil 226 Main body portion 228 Crossover portion 230 Yoke 232 Magnetic poles 261 to 263 Laminated insulator 266, 267 Insulation sheet 268, 269 Conductor sheet 272-281 Notch 282 Vertical portion 284 Horizontal portion 290 Lamination Coil 320 Coil 326 First coil 328 Second coil 330 Inner coil 500 Substrate driving device

Claims (16)

If the traveling direction of the ion beam is the Z direction, and two directions substantially orthogonal to each other in the plane substantially orthogonal to the Z direction are the X direction and the Y direction, the dimension in the Y direction is larger than the dimension in the X direction. An analysis electromagnet that receives a ribbon-shaped ion beam, generates a magnetic field along the Y direction in a beam path that is a path of the ion beam, and bends the ion beam in the X direction.
A pair of main body portions opposed to each other in the X direction across the beam path, and at least one set of connecting portions connecting the end portions in the direction along the Z direction of both main body portions while avoiding the beam path A coil for generating a magnetic field for bending the ion beam in the X direction,
A yoke that collectively surrounds the outside of the main body of the coil,
The upper yoke constituting the yoke is made removable.
The coil is laminated on the outer peripheral surface of the laminated insulator by winding a plurality of layers in which an insulating sheet and a conductor sheet whose main surfaces are along the Y direction are overlapped, and a laminated insulator is formed on the outer peripheral surface. An analysis electromagnet having a configuration in which a cutout portion is provided in a sector-shaped cylindrical coil, leaving the main body portion and the transition portion. If the traveling direction of the ion beam is the Z direction, and two directions substantially orthogonal to each other in the plane substantially orthogonal to the Z direction are the X direction and the Y direction, the dimension in the Y direction is larger than the dimension in the X direction. An analysis electromagnet that receives a ribbon-shaped ion beam, generates a magnetic field along the Y direction in a beam path that is a path of the ion beam, and bends the ion beam in the X direction.
A pair of main body portions that are opposed to each other in the X direction across the beam path and cover approximately half or more of one side of the ion beam in the Y direction, and between the end portions in the direction along the Z direction of both main body portions A saddle-shaped coil having a pair of connecting portions that are connected to each other while avoiding the beam path, and in cooperation with the second coil, generates a magnetic field that bends the ion beam in the X direction. Coils,
A pair of main body portions that are opposed to each other in the X direction across the beam path and cover approximately half or more of the other side of the ion beam in the Y direction, and between the end portions in the direction along the Z direction of both main body portions A saddle-shaped coil having a pair of connecting portions that are connected to each other while avoiding the beam path, and is disposed so as to overlap with the first coil in the Y direction, and cooperates with the first coil. A second coil that acts to generate a magnetic field that bends the ion beam in the X direction;
A yoke that collectively surrounds the outside of the main body of the first coil and the second coil,
The upper yoke constituting the yoke is made removable.
In addition, the first coil and the second coil are respectively laminated on the outer peripheral surface of the laminated insulator by winding a plurality of layers of an insulating sheet and a conductor sheet whose main surfaces are along the Y direction, and further winding the outer periphery thereof. An analysis electromagnet having a configuration in which a cutout portion is provided in a fan-shaped cylindrical laminated coil having a laminated insulator formed on a surface, leaving the main body portion and a transition portion. If the traveling direction of the ion beam is the Z direction, and two directions substantially orthogonal to each other in the plane substantially orthogonal to the Z direction are the X direction and the Y direction, the dimension in the Y direction is larger than the dimension in the X direction. An analysis electromagnet that receives a ribbon-shaped ion beam, generates a magnetic field along the Y direction in a beam path that is a path of the ion beam, and bends the ion beam in the X direction.
A pair of main body portions opposed to each other in the X direction across the beam path, and a transition portion that connects the end portions in the direction along the Z direction of both main body portions while avoiding the beam path. An inner coil that generates a main magnetic field that bends the ion beam in the X direction;
A pair of body portions outside the inner coil and facing each other in the X direction across the beam path, and the ends of the two body portions in the direction along the Z direction are connected to each other while avoiding the beam path. One or more first outer coils for generating a sub-magnetic field for assisting or correcting the main magnetic field, wherein the coil is a saddle-shaped coil having a set of crossing portions.
A pair of body portions outside the inner coil and facing each other in the X direction across the beam path, and the ends of the two body portions in the direction along the Z direction are connected to each other while avoiding the beam path. One or more saddle-shaped coils having a pair of crossing portions that are arranged to overlap the first outer coil in the Y direction and generate a sub-magnetic field that assists or corrects the main magnetic field A second outer coil of
A yoke that collectively surrounds the outside of the main body of the inner coil, the first outer coil, and the second outer coil;
The upper yoke constituting the yoke is made removable.
And the inner coil, the first outer coil and the second outer coil are laminated on the outer peripheral surface of the laminated insulator by winding the insulating sheet and the conductor sheet each having a principal surface along the Y direction a plurality of times, A laminated insulator is formed on the outer peripheral surface, and the outer peripheral surface is laminated by winding a plurality of layers of an insulating sheet and a conductor sheet whose main surface is along the Y direction, and further laminated on the outer peripheral surface. An analysis electromagnet having a configuration in which a cutout portion is provided in the fan-shaped cylindrical laminated coil in which the main body portion and the transition portion are left. If the traveling direction of the ion beam is the Z direction, and two directions substantially orthogonal to each other in the plane substantially orthogonal to the Z direction are the X direction and the Y direction, the dimension in the Y direction is larger than the dimension in the X direction. An analysis electromagnet that receives a ribbon-shaped ion beam, generates a magnetic field along the Y direction in a beam path that is a path of the ion beam, and bends the ion beam in the X direction.
A pair of main body portions that are opposed to each other in the X direction across the beam path and cover approximately half or more of one side of the ion beam in the Y direction, and between the end portions in the direction along the Z direction of both main body portions A saddle-shaped coil having a pair of crossing portions that are connected to each other while avoiding the beam path, and generates a main magnetic field for bending the ion beam in the X direction in cooperation with the second inner coil. A first inner coil;
A pair of main body portions that are opposed to each other in the X direction across the beam path and cover approximately half or more of the other side of the ion beam in the Y direction, and between the end portions in the direction along the Z direction of both main body portions A saddle-shaped coil having a pair of connecting portions that are connected to each other while avoiding the beam path, and is arranged so as to overlap with the first inner coil in the Y direction. In cooperation with the second inner coil for generating a main magnetic field that bends the ion beam in the X direction;
A pair of main body portions outside the first inner coil and facing each other in the X direction across the beam path and the ends of the two main body portions in the direction along the Z direction are connected to each other while avoiding the beam path. One or more first outer coils for generating a sub-magnetic field for assisting or correcting the main magnetic field, wherein the coil is a saddle-shaped coil having a pair of crossing portions
A pair of main body portions outside the second inner coil and facing each other in the X direction across the beam path, and the ends of the two main body portions in the direction along the Z direction are connected to each other while avoiding the beam path. A saddle-shaped coil having a pair of crossing portions that are arranged to overlap the first outer coil in the Y direction and generate a sub-magnetic field for assisting or correcting the main magnetic field One or more second outer coils;
A yoke that collectively surrounds the outside of the main body of the first inner coil, the second inner coil, the first outer coil, and the second outer coil;
The upper yoke constituting the yoke is made removable.
In addition, the first inner coil and the first outer coil are laminated on the outer peripheral surface of the laminated insulator by winding a plurality of layers in which an insulating sheet and a conductor sheet whose main surfaces are along the Y direction are overlapped with each other. A laminated insulator is formed on the outer circumferential surface of the laminated insulating sheet and a conductor sheet whose main surface is along the Y direction. The laminated sheet is wound by multiple turns and further laminated on the outer circumferential surface. The fan-shaped cylindrical laminated coil has a configuration in which a cutout portion is provided leaving the main body portion and the transition portion,
The second inner coil and the second outer coil are laminated on the outer peripheral surface of the laminated insulator by winding a plurality of layers of an insulating sheet and a conductor sheet whose main surface is along the Y direction. A fan in which a laminated insulator is formed, and on the outer peripheral surface thereof, an insulating sheet and a conductor sheet whose main surfaces are aligned in the Y direction are wound and laminated several times, and further, a laminated insulator is formed on the outer peripheral surface. An analysis electromagnet having a configuration in which a cutout portion is provided in a cylindrical tube-shaped laminated coil, leaving the main body portion and the transition portion. If the traveling direction of the ion beam is the Z direction, and two directions substantially orthogonal to each other in the plane substantially orthogonal to the Z direction are the X direction and the Y direction, the dimension in the Y direction is larger than the dimension in the X direction. An analysis electromagnet that receives a ribbon-shaped ion beam, generates a magnetic field along the Y direction in a beam path that is a path of the ion beam, and bends the ion beam in the X direction.
A pair of main body portions opposed to each other in the X direction across the beam path, and at least one set of connecting portions connecting the end portions in the direction along the Z direction of both main body portions while avoiding the beam path A coil for generating a magnetic field for bending the ion beam in the X direction,
A yoke that collectively surrounds the outside of the main body of the coil,
The upper yoke constituting the yoke is made removable.
The coil is laminated on the outer peripheral surface of the laminated insulator by winding a plurality of layers in which an insulating sheet and a conductor sheet whose main surfaces are along the Y direction are overlapped, and a laminated insulator is formed on the outer peripheral surface. The fan-shaped cylindrical laminated coil has a configuration in which a cutout portion is provided leaving the main body portion and the transition portion,
Each crossing portion of the coil includes two vertical portions that are substantially perpendicular to the end portion in the direction along the Z direction of the main body portion and extend substantially parallel to the Y direction, and both vertical portions. And a transverse portion connected substantially perpendicular to the XZ plane and extending substantially parallel to the XZ plane. If the traveling direction of the ion beam is the Z direction, and two directions substantially orthogonal to each other in the plane substantially orthogonal to the Z direction are the X direction and the Y direction, the dimension in the Y direction is larger than the dimension in the X direction. An analysis electromagnet that receives a ribbon-shaped ion beam, generates a magnetic field along the Y direction in a beam path that is a path of the ion beam, and bends the ion beam in the X direction.
A pair of main body portions that are opposed to each other in the X direction across the beam path and cover approximately half or more of one side of the ion beam in the Y direction, and between the end portions in the direction along the Z direction of both main body portions A saddle-shaped coil having a pair of connecting portions that are connected to each other while avoiding the beam path, and in cooperation with the second coil, generates a magnetic field that bends the ion beam in the X direction. Coils,
A pair of main body portions that are opposed to each other in the X direction across the beam path and cover approximately half or more of the other side of the ion beam in the Y direction, and between the end portions in the direction along the Z direction of both main body portions A saddle-shaped coil having a pair of connecting portions that are connected to each other while avoiding the beam path, and is disposed so as to overlap with the first coil in the Y direction, and cooperates with the first coil. A second coil that acts to generate a magnetic field that bends the ion beam in the X direction;
A yoke that collectively surrounds the outside of the main body of the first coil and the second coil,
The upper yoke constituting the yoke is made removable.
In addition, the first coil and the second coil are respectively laminated on the outer peripheral surface of the laminated insulator by winding a plurality of layers of an insulating sheet and a conductor sheet whose main surfaces are along the Y direction, and further winding the outer periphery thereof. The fan-shaped cylindrical laminated coil having a laminated insulator formed on the surface has a configuration in which a notch portion is provided leaving the main body portion and the transition portion,
Each of the transition portions of the first coil and the second coil is connected to the end of the main body portion in the direction along the Z direction at substantially right angles, and extends in two vertical directions substantially parallel to the Y direction. An analytical electromagnet having a portion and a lateral portion connected substantially perpendicular to both longitudinal portions and extending substantially parallel to the XZ plane. If the traveling direction of the ion beam is the Z direction, and two directions substantially orthogonal to each other in the plane substantially orthogonal to the Z direction are the X direction and the Y direction, the dimension in the Y direction is larger than the dimension in the X direction. An analysis electromagnet that receives a ribbon-shaped ion beam, generates a magnetic field along the Y direction in a beam path that is a path of the ion beam, and bends the ion beam in the X direction.
A pair of main body portions opposed to each other in the X direction across the beam path, and a transition portion that connects the end portions in the direction along the Z direction of both main body portions while avoiding the beam path. An inner coil that generates a main magnetic field that bends the ion beam in the X direction;
A pair of body portions outside the inner coil and facing each other in the X direction across the beam path, and the ends of the two body portions in the direction along the Z direction are connected to each other while avoiding the beam path. One or more first outer coils for generating a sub-magnetic field for assisting or correcting the main magnetic field, wherein the coil is a saddle-shaped coil having a set of crossing portions.
A pair of body portions outside the inner coil and facing each other in the X direction across the beam path, and the ends of the two body portions in the direction along the Z direction are connected to each other while avoiding the beam path. One or more saddle-shaped coils having a pair of crossing portions that are arranged to overlap the first outer coil in the Y direction and generate a sub-magnetic field that assists or corrects the main magnetic field A second outer coil of
A yoke that collectively surrounds the outside of the main body of the inner coil, the first outer coil, and the second outer coil;
The upper yoke constituting the yoke is made removable.
And the inner coil, the first outer coil and the second outer coil are laminated on the outer peripheral surface of the laminated insulator by winding the insulating sheet and the conductor sheet each having a principal surface along the Y direction a plurality of times, A laminated insulator is formed on the outer peripheral surface, and the outer peripheral surface is laminated by winding a plurality of layers of an insulating sheet and a conductor sheet whose main surface is along the Y direction, and further laminated on the outer peripheral surface. In the fan-shaped cylindrical laminated coil formed, the notch portion is provided leaving the main body portion and the transition portion,
Each of the transition portions of the inner coil, the first outer coil, and the second outer coil is connected to the end portion of the main body portion in the direction along the Z direction substantially at right angles and substantially parallel to the Y direction. An analysis electromagnet having two elongated vertical portions and a lateral portion connected to both vertical portions substantially at right angles and extending substantially parallel to the XZ plane. If the traveling direction of the ion beam is the Z direction, and two directions substantially orthogonal to each other in the plane substantially orthogonal to the Z direction are the X direction and the Y direction, the dimension in the Y direction is larger than the dimension in the X direction. An analysis electromagnet that receives a ribbon-shaped ion beam, generates a magnetic field along the Y direction in a beam path that is a path of the ion beam, and bends the ion beam in the X direction.
A pair of main body portions that are opposed to each other in the X direction across the beam path and cover approximately half or more of one side of the ion beam in the Y direction, and between the end portions in the direction along the Z direction of both main body portions A saddle-shaped coil having a pair of crossing portions that are connected to each other while avoiding the beam path, and generates a main magnetic field for bending the ion beam in the X direction in cooperation with the second inner coil. A first inner coil;
A pair of main body portions that are opposed to each other in the X direction across the beam path and cover approximately half or more of the other side of the ion beam in the Y direction, and between the end portions in the direction along the Z direction of both main body portions A saddle-shaped coil having a pair of connecting portions that are connected to each other while avoiding the beam path, and is arranged so as to overlap with the first inner coil in the Y direction. In cooperation with the second inner coil for generating a main magnetic field that bends the ion beam in the X direction;
A pair of main body portions outside the first inner coil and facing each other in the X direction across the beam path and the ends of the two main body portions in the direction along the Z direction are connected to each other while avoiding the beam path. One or more first outer coils for generating a sub-magnetic field for assisting or correcting the main magnetic field, wherein the coil is a saddle-shaped coil having a pair of crossing portions
A pair of main body portions outside the second inner coil and facing each other in the X direction across the beam path, and the ends of the two main body portions in the direction along the Z direction are connected to each other while avoiding the beam path. A saddle-shaped coil having a pair of crossing portions that are arranged to overlap the first outer coil in the Y direction and generate a sub-magnetic field for assisting or correcting the main magnetic field One or more second outer coils;
A yoke that collectively surrounds the outside of the main body of the first inner coil, the second inner coil, the first outer coil, and the second outer coil;
The upper yoke constituting the yoke is made removable.
In addition, the first inner coil and the first outer coil are laminated on the outer peripheral surface of the laminated insulator by winding a plurality of layers in which an insulating sheet and a conductor sheet whose main surfaces are along the Y direction are overlapped with each other. A laminated insulator is formed on the outer circumferential surface of the laminated insulating sheet and a conductor sheet whose main surface is along the Y direction. The laminated sheet is wound by multiple turns and further laminated on the outer circumferential surface. The fan-shaped cylindrical laminated coil has a configuration in which a cutout portion is provided leaving the main body portion and the transition portion,
The second inner coil and the second outer coil are laminated on the outer peripheral surface of the laminated insulator by winding a plurality of layers of an insulating sheet and a conductor sheet whose main surface is along the Y direction. A fan in which a laminated insulator is formed, and on the outer peripheral surface thereof, an insulating sheet and a conductor sheet whose main surfaces are aligned in the Y direction are wound and laminated several times, and further, a laminated insulator is formed on the outer peripheral surface. The cylindrical tube-shaped laminated coil has a configuration in which a notch portion is provided leaving the main body portion and the transition portion,
Each transition part of the first inner coil, the second inner coil, the first outer coil, and the second outer coil is connected to an end portion in the direction along the Z direction of the main body part at a substantially right angle. An analysis electromagnet having two longitudinal portions extending substantially parallel to a direction and a lateral portion connected substantially perpendicular to both longitudinal portions and extending substantially parallel to the XZ plane.   A plurality of the first outer coils are provided, the first outer coils are arranged in the Y direction, and the second outer coils are provided in the same number as the first outer coils. The analysis electromagnet according to claim 3, 4, 7, or 8, wherein the outer coils are respectively arranged so as to overlap in the Y direction.   The analysis electromagnet according to claim 1, further comprising a pair of magnetic poles protruding inward from the yoke so as to face each other in the Y direction across the beam path.   11. The coil according to claim 1, wherein each of the coils has a substantially plane-symmetric shape in the Y direction with respect to a symmetry plane passing through the center in the Y direction of the beam path and parallel to the XZ plane. Analysis electromagnet. The fan-shaped cylindrical laminated coil is the original, and the arc-shaped portion (291a) that should be the arc-shaped portion (291) inside the fan-shaped cylindrical laminated coil projects outward. The analysis electromagnet according to any one of claims 1 to 11, which is formed into a fan-shaped cylindrical shape by pressurizing the arc-shaped portion (291a) of the laminated coil to be recessed inward.   A flow of the ion beam emitted from the analysis electromagnet according to claim 3, 4, 7, 8, or 9 is caused to flow in the first outer coil and the second outer coil so as to approach the shape of the ion beam at the time of incidence. A method for controlling an electromagnet that controls current. An ion implantation apparatus for performing ion implantation by irradiating a substrate with an ion beam,
An ion source for generating the ribbon-like ion beam having a dimension in the Y direction larger than a dimension in the Y direction of the substrate;
The analysis electromagnet according to any one of claims 1 to 12 , wherein an ion beam from the ion source is bent;
An ion implantation apparatus comprising: a substrate driving device configured to move the substrate in a direction intersecting a main surface of the ion beam at an implantation position where the ion beam having passed through the analysis electromagnet is incident on the substrate. The ion source is
A scanning electron source for generating electrons scanned in the Y direction;
A container in which electrons from the scanning electron source are incident, gas is introduced, and the gas is ionized by impact of the electrons to generate plasma, and has an ion extraction slit extending along the Y direction. A plasma generation vessel;
Wherein provided on the outside of the plasma production chamber consists of more than one electrode, the plasma generating container according to claim from the plasma through the ion extraction slit and a lead-out electrode system to draw the ribbon ion beam 14 The ion implantation apparatus as described. The ion source includes a reflective electrode that reflects the incident electrons when a negative voltage is applied to a portion of the plasma generation container opposite to the side where the electrons are incident from the scanning electron source. The ion implantation apparatus according to claim 15, further comprising:

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