KR20080014790A - Process for producing color filter, color filter, liquid crystal element, and liquid crystal display device - Google Patents

Abstract

This invention provides a process for producing a color filter comprising two or more groups of pixels, which exhibit respective different colors, provided on a substrate, the pixels being separated from each other by deep-color partition walls. The production process comprises a photosensitive layer formation step of forming, on a substrate, a photosensitive layer containing a deep-color photosensitive composition comprising a photoacid generator, a crosslinking agent, which acquires a crosslinking function upon action of the photoacid generator, and a colorant, an exposure step of exposing the photosensitive layer to cure the exposed area, a development step of removing the unexposed part in its photosensitive layer to form the partition walls, and a step of applying droplets of a color liquid composition to between the partition walls to form pixels between the partition walls.

Description

Manufacturing method of color filter, color filter, liquid crystal device and liquid crystal display device {PROCESS FOR PRODUCING COLOR FILTER, COLOR FILTER, LIQUID CRYSTAL ELEMENT, AND LIQUID CRYSTAL DISPLAY DEVICE}

The present invention relates to a method for producing a color filter, a color filter obtained by the method, a liquid crystal element using the color filter, and a liquid crystal display device. In particular, the present invention has two or more pixel groups representing different colors on a substrate, and each pixel constituting the pixel group is separated from each other by a dark-colored separation wall to impart droplets by inkjet or the like between the separation walls. The manufacturing method of a color filter formed, a color filter, the liquid crystal display element provided with this color filter, and the liquid crystal display device provided with this liquid crystal display element.

A color filter for a display device is a structure in which red, green, and blue dot images are arranged on a matrix on a substrate such as glass, and are separated by a deep dividing wall such as a black matrix in which each dot is at a boundary thereof. A conventionally known method for producing such a color filter uses a substrate, such as glass, as a support, and includes a photosensitive resin comprising 1) a dyeing method, 2) a printing method, and 3) application of the colored photosensitive resin liquid and repetition of exposure and development. Resin liquid method (colored resist method), 4) a method of transferring images formed on a branch member sequentially, to a final or branch member, and 5) applying a previously colored photosensitive resin liquid onto a branch member to form a colored layer. And a method of forming a multicolor image (transfer method) by a method of sequentially repeating a cycle of sequentially transferring, exposing and developing the photosensitive colored layer on a substrate by the number of colors. Moreover, the method of forming each pixel using the inkjet method is also known.

Among these methods, the colored resist method can produce a color filter having a high degree of position, and it is not advantageous in terms of cost because a large amount of loss is applied to the application of the photosensitive layer resin solution. On the other hand, in the method of forming each pixel using the inkjet method, since the loss of the resin liquid is small, the method is advantageous in terms of cost and has a problem that the position of the pixel is bad.

In order to overcome these problems, a color filter manufacturing method has been proposed in which a black matrix is formed by a colored resist method to form a separation wall and an RGB pixel is produced by an inkjet method. However, when this partition wall forming method is used, the surface of the partition wall is rough and fine unevenness occurs. For this reason, there exists a problem that the surface resistance of the transparent electrode ITO formed on the color filter increases.

In order to prevent this, there is a method of providing flatness by forming a protective layer on the color filter, but there is a problem in that the cost increases to form an extra layer.

Moreover, it is known to adjust surface roughness by performing a dry etching process on the surface of a partition wall (for example, refer Unexamined-Japanese-Patent No. 2001-343518). In this method, since a complicated dry etching process is required and the treatment process is increased, there is a problem that not only manufacturing cost but also difficulty in adjusting the surface roughness of the separation wall to a predetermined roughness.

The present invention has been made in consideration of the above situation, and provides a method for manufacturing a color filter, a color filter, a liquid crystal device, and a liquid crystal display device.

A first embodiment of the present invention is a manufacturing method of a color filter having two or more pixel groups representing different colors on a substrate, wherein each pixel of the pixel groups is separated from each other by a deep color separation wall.

A photosensitive layer forming step of forming a photosensitive layer comprising a photosensitive generator and a deep photosensitive composition containing a colorant and a crosslinking agent for obtaining a crosslinking function by the action of the photoacid generator, and exposing the photosensitive layer by exposure. An exposure step of curing the region, a developing step of forming a separation wall by removing the photosensitive layer of the unexposed part, and a step of forming each pixel between the separation walls by applying droplets of the colored liquid composition between the separation walls. It provides a method for producing a color filter.

A second embodiment of the present invention provides a color filter manufactured by the above production method, wherein the surface roughness (Ra value) of the separation wall is 5 nm or less.

A third embodiment of the present invention provides a liquid crystal display device having the color filter.

A fourth embodiment of the present invention provides a liquid crystal display device including the liquid crystal display device.

The manufacturing method of the color filter of this invention has the 2 or more pixel group which shows a different color on a board | substrate, and each pixel of the said pixel group is a manufacturing method of the color filter separated from each other by the dividing color separation wall, Comprising: A photosensitive layer forming step of forming a photosensitive layer comprising a deep photosensitive composition containing a crosslinking agent and a colorant which obtain a crosslinking function by the action of the photoacid generator and the photoacid generator, and exposing the photosensitive layer to an exposed area. An exposure step of curing, a developing step of forming a separating wall by removing the photosensitive layer of the unexposed part, and a step of forming each pixel between the separating walls by applying a droplet by the coloring liquid composition between the separating walls. It is a way to include. The word "pixel group" as used herein refers to a conceptual group of pixels having the same color, and does not mean a geographical group. Therefore, the pixels in each pixel group are not necessarily geographically determined.

The deep color photosensitive composition may further contain a copolymer containing at least one of methyl methacrylate or benzyl methacrylate.

The photoacid generator may be one or more compounds selected from the group consisting of organic halogen compounds, onium salts and sulfonic acid esters,

The crosslinking agent may be melamine resin or urea resin,

The height of the dividing wall may be 1.8 µm or more and 10 µm or less.

The optical density of the dividing wall may be 2.5 or more and 10 or less,

The partition wall may be black.

Hereinafter, this manufacturing method is demonstrated in order of process.

In the manufacturing method of this invention, first, the photosensitive layer is formed on a board | substrate. The deep photosensitive composition which can be used for forming a photosensitive layer is a negative photosensitive composition containing a photo-acid generator and a crosslinking agent and a coloring agent which acquire a crosslinking function by the action | action of the said photo-acid generator. When this negative photosensitive composition is exposed, a photoacid generator will decompose | generate and generate an acid, a crosslinking agent acquires a crosslinking function by the acid which generate | occur | produced in the photoacid generator, and a crosslinked structure is formed by this, and a composition hardens. The deep dividing wall on the substrate is formed by curing of this composition.

[Dark photosensitive composition]

The deep color photosensitive composition (hereinafter referred to as suitably photosensitive composition) contains a crosslinking agent and a coloring agent which acquire a crosslinking function by the action of a photoacid generator and the said photoacid generator.

Here, a deep color composition is a composition which has a high optical density, 2.5 or more is preferable, as for the value of the optical density, 2.5-10.0 are still more preferable, 2.5-6.0 are still more preferable, 3.0-5.0 are especially preferable. In addition, as described later, the optical density of the photosensitive composition is also important at an exposure wavelength (generally an ultraviolet region) in order to cure it under the action of a photo-initiation clock. That is, the value of the optical density of the photosensitive composition in an exposure wavelength may be 2.0-10.0, Preferably it is 2.5-6.0, Most preferably, it is 3.0-5.0. If it is less than 2.0, there is a concern that the shape of the separation wall may not be what is desired. If it exceeds 10.0, it becomes difficult to make the separation wall that cannot start polymerization.

(coloring agent)

Specific examples of the colorant used in the present invention include dyes and pigments having the following color index (C.I.) numbers.

In some embodiments, the deep color photosensitive resin composition of the present invention includes organic pigments, inorganic pigments, dyes, and the like. When the photopolymerizable resin layer must have light shielding properties, the photosensitive composition is composed of a metal oxide powder such as carbon black, titanium oxide or iron tetraoxide, a metal sulfide powder, a light blocking agent which is a metal powder, or a mixture of pigments such as red, blue, and green. And the like. Known coloring agents (dyes, pigments) can be used. When using a pigment in the said known coloring agent, it is preferable that a pigment is disperse | distributed uniformly in a deep color composition.

It is preferable that the ratio of the coloring agent in solid content of the said rich color composition is 30-70 mass% from a viewpoint of fully shortening image development time, It is more preferable that it is 40-60 mass%, It is still more preferable that it is 50-55 mass%. .

Examples of such known dyes or pigments include Victoria Pure Blue BO (CI42595), Auramine (CI41000), Fat Black HB (CI26150), CIPigment Yellow 1, CIPigment Yellow 3, CIPigment Yellow 12, CIPigment Yellow 13, CIPigment Yellow 14, CIPigment Yellow 5, CIPigment Yellow 16, CIPigment Yellow 17, CIPigment Yellow 20, CIPigment Yellow 24, CIPigment Yellow 31, CIPigment Yellow 55, CIPigment Yellow 60, CIPigment Yellow 61, CIPigment Yellow 65, CIPigment Yellow 71, CIPigment Yellow 73, CIPigment Yellow 74, CIPigment Yellow 81, CIPigment Yellow 83, CIPigment Yellow 93, CIPigment Yellow 95, CIPigment Yellow 97, CIPigment Yellow 98, CIPigment Yellow 100, CIPigment Yellow 101, CIPigment Yellow 104, CIPigment Yellow 106, CIPigment Yellow 108, CIPigment Yellow 109, CIPigment Yellow 110, CIPigment Yellow 113, CIPigment Yellow 114, CIPigment Yellow 116, CIPigment Yellow 117, CIPigment Yellow 119, CIPigment Yellow 120, CIPigmen t Yellow 126, CIPigment Yellow 127, CIPigment Yellow 128, CIPigment Yellow 129, CIPigment Yellow 138, CIPigment Yellow 139, CIPigment Yellow 150, CIPigment Yellow 151, CIPigment Yellow 152, CIPigment Yellow 153, CI Pigment Yellow 154, CIPigment Yellow 155, CIPigment Yellow 156, CIPigment Yellow 166, CIPigment Yellow 168, CIPigment Yellow 175, CI Pigment Yellow 180, C. I. Pigment Yellow 185;

CIPigment Orange 1, CIPigment Orange 5, CIPigment Orange 13, CIPigment Orange 14, CIPigment Orange 16, CIPigment Orange 17, CIPigment Orange 24, CIPigment Orange 34, CIPigment Orange 36, CIPigment Orange 38, CIPigment Orange 40, CIPigment Orange 43, CIPigment Orange 46, CIPigment Orange 49, CIPigment Orange 51, CIPigment Orange 61, CIPigment Orange 63, CIPigment Orange 64, CIPigment Orange 71, CIPigment Orange 73;

C.I. Pigment Violet 1, C.I.Pigment Violet 19, C.I.Pigment Violet 23, C.I.Pigment Violet 29, C.I.Pigment Violet 32, C.I.Pigment Violet 36, C.I.Pigment Violet 38;

CIPigment Red 1, CIPigment Red 2, CIPigment Red 3, CIPigment Red 4, CIPigment Red 5, CIPigment Red 6, CIPigment Red 7, CIPigment Red 8, CIPigment Red 9, CIPigment Red 10, CIPigment Red 11, CIPigment Red 12, CIPigment Red 14, CIPigment Red 15, CIPigment Red 16, CIPigment Red 17, CI Pigment Red 18, CIPigment Red 19, CIPigment Red 21, CIPigment Red 22, CIPigment Red 23, CIPigment Red 30, CIPigment Red 31, CIPigment Red 32, CIPigment Red 37, CIPigment Red 38, CIPigment Red 40, CIPigment Red 41, CIPigment Red 42, CIPigment Red 48: 1, CIPigment Red 48: 2, CIPigment Red 48: 3, CIPigment Red 48: 4, CIPigment Red 49: 1, CIPigment Red 49: 2, CIPigment Red 50: 1, CIPigmentRed 52: 1, CIPigment Red 53: 1, CIPigment Red 57: 1, CIPigment Red 57: 1, CIPigment Red 57: 2, CIPigment Red 58: 2, CIPigment Red 58: 4, CI Pigment Red 60: 1, CIPigment Red 63: 1, CIPigment Red 63: 2, CIPigment Red 64: 1, CIPigment Red 81: 1, CIPigment Re d 83, CIPigment Red 88, CIPigment Red 90: 1, CIPigment Red 97, CIPigment Red 101, CIPigment Red 102, CIPigment Red 104, CIPigment Red 105, CIPigment Red 106, CIPigment Red 108, CIPigment Red 112, CIPigment Red 113, CIPigment Red 114, CIPigment Red 122, CIPigment Red 123, CIPigment Red 144, CIPigment Red 146, CIPigment Red 149, CIPigment Red 150, CIPigment Red 151, CIPigment Red 166, CIPigment Red 168, CIPigment Red 170, CIPigment Red 171, CIPigment Red 172, CIPigment Red 174, CIPigment Red 175, CIPigment Red 176, CIPigment Red 177, CIPigment Red 178, CIPigment Red 179, CIPigment Red 180, CIPigment Red 185, CIPigment Red 187, CIPigment Red 188, CIPigment Red 190, CIPigment Red 193, CIPigment Red 194, CIPigment Red 202, CIPigment Red 206, CIPigment Red 207, CIPigment Red 208, CIPigment Red 209, CIPigment Red 215, CIPigment Red 216, CIPigment Red 220, CIPigment Red 224, CIPigment Red 226, CIPig ment Red 242, C. I. Pigment Red 243, C. I. Pigment Red 245, C. I. Pigment Red 254, C. I. Pigment Red 255, C. I. Pigment Red 264, C. I. Pigment Red 265;

C.I.Pigment Blue 15: C.I.Pigment Blue 15: 3, C.I.Pigment Blue 15: 4, C.I.Pigment Blue 15: 6, C.I.Pigment Blue 60

C.I.Pigment Green 7, C.I.Pigment Green 36

C.I.Pigment Braun 23, C.I.Pigment Braun 25

C.I. Pigment Black 1, C.I. Pigment Black 7 and the like.

In this invention, a black coloring agent is preferable among the said coloring agents. New examples of black coloring agents include carbon black, titanium carbon, iron oxide, titanium oxide, graphite and the like. Especially, carbon black is preferable.

It is preferable to use the said pigment in the state of a dispersion liquid. This dispersion liquid can be prepared by adding and disperse | distributing the composition obtained by mixing the said pigment and a pigment dispersant beforehand to the organic solvent (or vehicle) mentioned later. The vehicle refers to a portion of a medium in which a pigment is dispersed therein when the paint is in a liquid state, and is liquid, and includes a portion (binder) that binds to the pigment to harden the coating film and a component (organic solvent) that dissolves and dilutes the coating film. The dispersing machine used for dispersing the pigment is not particularly limited, and for example, a kneader described in Asakura Kunizu, "Pigment Dictionary", First Edition, Asakura Shoten, 2000, p. 438 Known dispersers such as mills, Atlidar, super mills, dissolvers, homo mixers, sand mills and the like can be used. Further, as described in the document 310, the fine grinding may be performed using mechanical force by mechanical grinding.

As for the number average particle diameter of the coloring agent (for example, pigment) used by this invention, the range of 0.001-0.1 micrometer is preferable from a viewpoint of dispersion stability, and the range of 0.01-0.08 micrometer is still more preferable. Moreover, when pigment number average particle diameter exceeds 0.1 micrometer, cancellation of the polarization by a pigment arises and contrast falls and it is unpreferable. On the other hand, the term "particle diameter" refers to the diameter of a circle having the same area as the electron micrograph image of the particle, and "number average particle diameter" refers to 100 particles when the particle size is obtained in the above-described manner for a large number of particles. Say the mean.

[Mine generator]

Examples of the photoacid generator that generates an acid by light irradiation include organic halogen compounds, onium salts, sulfonic acid esters, and the like. In these, an organic halogen compound is preferable, and halomethylated triazine and halomethylated oxadiazole compound are especially preferable. Specifically, a halomethylated triazine compound is represented by General formula (1).

General formula (1)

(In General Formula (1), R ¹ and R ² are halomethyl groups, and Y is an organic group having 5 or more carbon atoms.)

The halomethyl group may be, for example, a trichloromethyl group, tribromomethyl group, dichloromethyl group, dibromomethyl group, or the like, and the organic group having 5 or more carbon atoms represented by Y may have a substituent, for example, a phenyl group, a naphthyl group, A styryl group, a styrylphenyl group, a furyl vinyl group, a quaternized aminoethylamino group, etc. may be sufficient. Specific examples of halomethylated triazine compounds include the compounds described in paragraphs [0015] to [0025] of JP-A-2002-351075.

Specific examples of the halomethyloxadiazole compound include those described in the same publication paragraphs [0026] to [0033].

The quantity of the photo-acid generator is 0.05-15 mass% with respect to solid content in the photosensitive composition, Preferably it is 5-15 mass%. In this range, the swelling of the composition is suppressed in this range, and a sufficient amount of acid is generated by exposure, and the crosslinking function of the crosslinking agent is sufficiently expressed to form a high strength cured film.

[Bridge]

The crosslinking agent has a function of forming a crosslinked structure by the action of an acid generated from the photoacid generator and curing the film of the photosensitive composition. As the crosslinking agent, for example, a compound having at least one or more substituents (hereinafter, appropriately referred to as crosslinkable substituents) capable of forming crosslinked structures such as unsaturated double bonds may be used.

Specific examples of such crosslinkable substituents include (i) hydroxyalkyl groups such as hydroxyalkyl groups, alkoxyalkyl groups, acetoxyalkyl groups or derivatives thereof;

(ii) carbonyl groups such as formyl group, carboxyalkyl group or derivatives thereof;

(iii) nitrogen-containing group-containing substituents such as dimethylaminomethyl group, diethylaminomethyl group, dimethylolaminomethyl group, diethylolaminomethyl group, and morpholinomethyl group;

(iv) glycidyl group-containing substituents such as glycidyl ether group, glycidyl ester group and glycidylamino group;

(v) aromatic derivatives such as aryloxyalkyl groups such as benzyloxymethyl group and benzoyloxymethyl group and aralkyloxyalkyl groups;

(vi) polymerizable multiple bond-containing substituents such as vinyl group and isopropenyl group. The crosslinkable substituent of the crosslinking agent of the present invention is preferably a hydroxyalkyl group, an alkoxyalkyl group or the like, more preferably an alkoxymethyl group.

Examples of the crosslinking agent having the crosslinkable substituent include (i) a methylol group-containing melamine compound, a methylol group-containing benzoguanamine compound, a methylol group-containing urea compound, a methylol group-containing glycoluril compound, a methylol group-containing phenol compound, and the like. Methylol group-containing compound;

(ii) alkoxyalkyl group-containing compounds such as alkoxyalkyl group-containing melamine compounds, alkoxyalkyl group-containing benzoguanamine compounds, alkoxyalkyl group-containing urea compounds, alkoxyalkyl group-containing glycoluril compounds and alkoxyalkyl group-containing phenol compounds;

(iii) carboxymethyl group-containing compounds such as a carboxymethyl group-containing melamine compound, a carboxymethyl group-containing benzoguanamine compound, a carboxymethyl group-containing urea compound, a carboxymethyl group-containing glycoluril compound, and a carboxymethyl group-containing phenol compound;

(iv) epoxy compounds such as bisphenol A epoxy compounds, bisphenol F epoxy compounds, bisphenol S epoxy compounds, novolak resin epoxy compounds, resol resin epoxy compounds, and poly (hydroxystyrene) epoxy compounds.

The crosslinking agent of the present invention is preferably an alkoxymethylated urea compound or a resin thereof, or an alkoxymethylated glycoluril compound or a resin thereof. Preferable examples of the crosslinking agent that can be used in the present invention are described in Japanese Patent Laid-Open No. 2002-351075, paragraphs [0038] to [0047], and their description can also be referred to in the present invention.

Content of a crosslinking agent is based on the total solid of the photosensitive composition, Preferably it is 5-40 mass%, More preferably, it is selected according to the objective in the range of 10-30 mass%.

In addition to the above essential components, the deep color photosensitive composition used in the present invention preferably contains a binder polymer from the viewpoint of film formation tendency, and in particular, a copolymer containing at least one of methyl methacrylate or benzyl methacrylate. It is preferable to contain.

[Copolymer containing at least one of methyl methacrylate or benzyl methacrylate]

In the present invention, the copolymer containing at least one of methyl methacrylate or benzyl methacrylate is, for example, a copolymer containing methyl methacrylate, a copolymer containing benzyl methacrylate, methacryl Copolymers containing methyl acid and benzyl methacrylate may also be used.

The copolymer containing methyl methacrylate is, for example, methacrylic acid / methyl methacrylate copolymer (copolymerization ratio: 14 to 17.6 mol% / 82.4 to 86 mol%, weight average molecular weight 20,000 to 140,000), methacryl Acid / methyl methacrylate / ethyl acrylate copolymer (copolymerization ratio: 5-10 mol% / 70-60 mol% / 25-30 mol%, a weight average molecular weight 20,000-140,000) etc. may be sufficient.

The copolymer containing benzyl methacrylate is, for example, methacrylic acid / benzyl methacrylate copolymer (copolymerization ratio: 25 to 37 mol% / 75 to 63 mol%, weight average molecular weight 20,000 to 150,000), methacryl Acid / benzyl methacrylate / styrene copolymer (copolymerization ratio: 20 mol% / 17.8 mol% / 62.2 mol%, weight average molecular weights 20,000-140,000) etc. may be sufficient.

In addition, the copolymer containing methyl methacrylate and benzyl methacrylate may be, for example, methacrylic acid / methyl methacrylate / benzyl methacrylate copolymer (copolymerization ratio: 14.6 to 27.2 mol% / 79.1 to 3.27 mol) % / 16.3-40 mol%, weight average molecular weight 20,000-150,000), methacrylic acid / methyl methacrylate / benzyl methacrylate / 2-ethylhexyl acrylate copolymer (copolymerization ratio: 10-15 mol% / 70- 65 mol% / 10 mol% / 10 mol%, a weight average molecular weight 20,000-150,000), etc. may be sufficient.

Cresol novolac resins, polyhydroxystyrenes and derivatives thereof that are well used in commercially available negative resist compositions are colored after exposure and after baking. On the other hand, the methacrylic acid / benzyl methacrylate copolymer, the methacrylic acid / methyl methacrylate / benzyl methacrylate copolymer, etc. have little coloration after exposure and baking, and the light transmittance does not decrease. Particularly preferred.

It is preferable that it is 20-70 mass% with respect to the total solid of the photosensitive composition, and, as for content of the said copolymer used together as desired, it is more preferable that it is the range of 30-60 mass%.

[Other Ingredients]

The photosensitive composition can contain various additives for various purposes. Examples of additives include surfactants, adhesion promoters, plasticizers, and the like.

A surfactant can be used in order to improve applicability | paintability and the smoothness of the obtained coating film, The preferable specific example is BM-1000 (made by BM Chemie), Megafac F142D, Megafac F172, Megafac F173, Megafac F183, Megafac F176PF, Megafac F177PF (Now, Dainippon Ink & Chemicals Co., Ltd.), Fluorad FC-135, Fluorad FC-170C, Fluorad FC-430, Fluorad FC-431 (above, Sumitomo Industries Co., Ltd.), Surflon S -112, Surflon S-113, Surflon S-131, Surflon S-141, Surflon S-145 (above, manufactured by Asahiglass Co., Ltd.), SH-28PA, SH-190, SH-193, SZ-6032, SF- Fluorine-type or silicone type surfactant marketed under the brand name of 8428, DC-57, DC-190 (above, product made by Torre Silicone Corporation) is included.

The content of the surfactant may be 0.05 to 10% by mass of the total solids of the photosensitive composition, preferably 0.08% to 5% by mass, and particularly preferably 0.1 to 3% by mass. When there is too little content, the effect of addition will not fully be acquired, but when too much, there exists a tendency for the adhesiveness of a photosensitive layer and a base material to fall.

(UV absorber)

The photosensitive composition which concerns on this invention may contain a ultraviolet absorber as needed. A ultraviolet absorber is a compound of Unexamined-Japanese-Patent No. 5-72724, a salicylate type ultraviolet absorber, a benzophenone type ultraviolet absorber, a benzotriazole type ultraviolet absorber, a cyanoacrylate type ultraviolet absorber, and nickel chelate type, for example. You may select from a ultraviolet absorber, a hindered amine ultraviolet absorber, etc.

The specific example includes the compound described in Unexamined-Japanese-Patent No. 2001-142228 Paragraph No. [0028].

On the other hand, as for content of the ultraviolet absorber with respect to the total solid of the photosensitive composition, 0.5-15 mass% is common, 1-12 mass% is preferable, and 1.2-10 mass% is especially preferable.

(Board)

The substrate (permanent support) of the color filter may be a metallic support, a metal adhesive support, glass, ceramic, a synthetic resin film, or the like. The substrate is particularly preferably a glass plate or a synthetic resin film having transparency and good dimensional stability.

The photosensitive layer forming step is a step of dissolving or dispersing the deep color photosensitive composition as described above in a suitable solvent (dispersant) and applying and drying the surface of the substrate to form a photosensitive layer.

In some embodiments, the substrate is first cleaned and then the substrate is heat treated to stabilize the surface state. After the substrate is warmed, the photosensitive composition is applied.

As a coating solvent of a photosensitive composition, it is common to use ketones, such as acetone, methyl ethyl ketone, and methyl butyl ketone, and organic solvents, such as various ether and ester.

A coating method is not specifically limited, It can carry out using the glass substrate coater (for example, FAS Japan company make, brand name: MH-1600) etc. which have a well-known slit-shaped nozzle.

In some embodiments, after applying the photosensitive composition, a part of the solvent is volatilized to remove fluidity of the coating layer, and unnecessary coating liquid around the substrate is removed by preliminary baking with an edge beads remover (EBR) or the like to obtain a photosensitive layer.

Drying can be performed using a well-known drying apparatus (for example, VCD (vacuum drying apparatus; the product made by Tokyo-Okagyo Co., Ltd.), etc.).

Although preliminary baking is not specifically limited, For example, you may be preliminary baking for 3 minutes at 120 degreeC.

The thickness of the photosensitive layer is selected according to the desired height of the dividing wall to be formed.

In the present invention, the height h of the deep color separation wall (the distance between the highest point H of the deep color separation wall and the foot G of the waterline dropped on the substrate) is preferably 1.8 µm or more, and more preferably 1.9 µm to 10 µm. More preferably, it is 2.0 micrometer-7.0 micrometers, Especially preferably, it is the range of 2.2 micrometer-5.0 micrometers. If the height of the deep color separation wall is in the range of 1.8 µm to 10 µm, mixed color can be prevented more effectively. Therefore, the coating film thickness of the photosensitive composition may be selected in this range. If the film thickness is less than 1.8 µm, mixed color is liable to occur in the obtained color filter, and if it exceeds 10 µm, the formation of the deep color separation wall becomes difficult.

Next, the exposure process which hardens an exposure area | region by exposing the photosensitive layer formed by the said process is performed. What is necessary is just to select the exposure light source according to the absorption wavelength of the photo-acid generator contained in the photosensitive composition, Preferably the light source of an ultraviolet region is selected.

The light source used for light irradiation may be a medium pressure to ultra high pressure mercury lamp, a xenon lamp, a metal halide lamp, etc., for example.

Exposure is pattern exposure according to the shape of the separation wall, and may be performed by a method of exposing the entire surface through a mask, or may be scanning exposure.

Hereinafter, one example of pattern exposure through a mask will be described. The distance between the exposure mask surface and the photosensitive layer is set appropriately (for example, 200 µm) while the mask having the substrate and the image pattern (for example, a quartz exposure mask) is upright, and the entire surface of the substrate is exposed. .

Exposure is performed using the proximity exposure machine (for example, Hitachi Denshi Engineering Co., Ltd.) etc. which have an ultrahigh pressure mercury lamp, etc., and can select suitably (for example, 30OmJ / cm <2>) as an exposure amount.

By this exposure, a crosslinked structure is formed by an acid generated only in the exposure region in the photosensitive layer, and the exposure region is cured.

The baking treatment is performed after the pattern exposure described above. The conditions of the baking treatment vary depending on the photosensitive resin, the photoacid generator, the crosslinking agent, and the like, but are generally 15 seconds to 3 minutes, preferably 15 seconds to 1 minute at a temperature of 80 to 140 ° C, preferably 100 to 120 ° C. Do it with time. Crosslinking reaction advances in presence of the acid which generate | occur | produced at the time of pattern exposure, and also the baking process spreads the acid which generate | occur | produced on the surface (exposure surface side) of the photosensitive resin layer to the deep part of the film | membrane of the photosensitive layer resin layer, and bridge | crosslinking reaction to the deep part of a film | membrane. You can proceed.

Next, the development process of forming a separation wall is performed by removing the photosensitive layer of an unexposed part.

It is preferable that the pure water is sprayed on the surface of the photosensitive layer in advance with a shower nozzle or the like before the developing step, so that the surface of the photosensitive layer can be uniformly wetted.

Thereafter, the developer is developed with a developer to remove the unexposed portions to form a partition wall pattern. The developing solution which can be used in a developing process may be a lean aqueous solution of an alkaline substance, and it can select suitably from a well-known alkaline developing solution. Small amounts of an organic solvent miscible with water may be further added to the aqueous alkali solution.

[developer]

The alkaline substances which can be used for preparing the developer include, for example, alkali metal hydroxides (e.g. sodium hydroxide and potassium hydroxide), alkali metal carbonates (e.g. sodium carbonate and potassium carbonate) and alkali metal bicarbonates. (Eg sodium hydrogen chloride, potassium hydrogen carbonate), alkali metal silicates (eg sodium silicate, potassium silicate), alkali metal metasilicates (eg sodium metasilicate, potassium metasilicate), triethanolamine , Diethanolamine, monoethanolamine, morpholine, tetraalkylammonium hydroxides (for example, tetramethylammonium hydroxide), trisodium phosphate, and the like.

As for the density | concentration of the alkaline substance in a developing solution, 0.01-30 mass% is preferable, and, as for pH of a developing solution, 8-14 are preferable.

Examples of "water and miscible organic solvents" added to the developer as desired are methanol, ethanol, 2-propanol, 1-propanol, butanol, diacetone alcohol, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene Glycol mono n-butyl ether, benzyl alcohol, acetone, methyl ethyl ketone, cyclohexanone, ε-caprolactone, γ-butyrolactone, dimethylformamide, dimethylacetamide, hexamethylphosphoramide, ethyl lactate, methyl lactate , ε-caprolactam, N-methylpyrrolidone and the like.

As for the density | concentration in the developing solution of the water and miscible organic solvent, 0.1-30 mass% is preferable.

A well-known surfactant can also be added to a developing solution, As a density | concentration in the developing solution of the said surfactant, 0.01-10 mass% is preferable.

The developer can be used either as a solution or as a spray solution. When removing the uncured portion of the photosensitive layer, a method such as rubbing with a rotary brush or a wet sponge in the developer can be used, or a combination thereof can be used.

As for the liquid temperature of a developing solution, 40 degreeC is preferable normally from room temperature vicinity. The developing time changes depending on the composition of the deep color photosensitive layer, the alkalinity and temperature of the developing solution, and the type and concentration of the organic solvent, but is usually about 10 seconds to 2 minutes. If too short, the development of the unexposed part becomes insufficient, and the absorbance of the ultraviolet light is also insufficient, and if it is too long, the exposed part is also etched, making it difficult to suit the separation wall shape in any case. In this developing step, a partition wall shape is formed.

You may wash with water after alkali developing and remove the residual developer.

In the present invention, the surface roughness of the deep dividing wall can be reduced by controlling the coating surface property of the photosensitive layer in order to form the separating wall by pattern exposure without performing etching. According to the production method of the present invention, the surface roughness Ra value of the deep color separation wall can be 5 nm or less, preferably 4.0 nm or less, and more preferably 3.6 nm or less. When the surface roughness Ra value of the deep color separation wall becomes 5 nm or less, the movement of the colored liquid composition between the adjacent pixels along the surface of the deep color separation wall can be prevented. As a result, the mixed color due to the movement of the colored liquid composition between the adjacent pixels. Can be prevented.

In the above method, the photosensitive layer was formed on the support by a coating method, and then exposed and developed to form a separation wall. However, the formation method is not limited to this, and can be formed using a transfer method using a transfer material having a photosensitive layer. It may be. Hereinafter, the formation method using a transfer method is demonstrated.

Formation of Separation Wall Using Photosensitive Transfer Material

The photosensitive transfer material which forms at least the photosensitive layer on a support body is prepared.

(Photosensitive transfer material)

Forming a protective film on the photosensitive layer can prevent the photosensitive layer from being scratched. The photosensitive transfer material is formed by forming a photosensitive layer on a substrate by exfoliating a protective film and transferring the photosensitive layer onto the substrate, exposing the photosensitive layer on a substrate, baking the process as necessary, and developing a separator wall pattern. Can be.

(Support)

In the above-mentioned photosensitive transfer material, the branch member is chemically and thermally stable and can be appropriately selected from the one consisting of a plastic material. Specifically, a thin sheet such as Teflon (registered trademark), polyethylene terephthalate, polycarbonate, polyethylene, polypropylene, or a laminate thereof is preferable. As thickness of the said support body, 5-300 micrometers is suitable, Preferably it is 20-150 micrometers. Especially, a biaxially stretched polyethylene terephthalate film is especially preferable.

(Thermoplastic layer)

Said photosensitive transfer material may contain the thermoplastic resin layer as needed. It is preferable that such a thermoplastic resin layer is alkali-soluble, and it is comprised including at least a resin component, and it is preferable that a substantial softening point is 80 degrees C or less as said resin component. By forming such a thermoplastic resin layer, the favorable adhesiveness with respect to a permanent support body can be achieved in the deep color separation wall formation method mentioned later.

Examples of alkali-soluble thermoplastic resins having a softening point of 80 ° C. or lower include saponified products of ethylene and acrylic acid ester copolymers, saponified products of styrene and (meth) acrylic acid ester copolymers, saponified products of vinyl toluene and (meth) acrylic acid ester copolymers, Saponified products, such as poly (meth) acrylic acid ester, (meth) acrylic acid ester copolymers, such as butyl (meth) acrylate and vinyl acetate, etc. are contained.

The thermoplastic resin layer may contain at least one kind appropriately selected from the above thermoplastic resins. The thermoplastic resin layer has a softening point of about 80 ° C. or less described in “Plastic Performance Manual” (Nihon Plastic Co., Ltd., Gen. Nihon Plastic Kay Seiko, Co., Ltd., Published by Kogyo Chousaka, Published on October 25, 1968). The organic polymer may contain one selected from the one soluble in the aqueous alkali solution.

In some embodiments, the organic polymer material may be used by adding various plasticizers compatible with the polymer material to the organic polymer material having a softening point of 80 ° C. or more and lowering the actual softening point to 80 ° C. or less. In addition, various polymers, supercooled materials, adhesion improving agents, surfactants, and release agents may be added to these organic polymer materials in order to control the adhesion to the supporting members, in the range of which the actual softening point does not exceed 80 ° C.

Specific examples of preferred plasticizers include polypropylene glycol, polyethylene glycol, dioctyl phthalate, diheptyl phthalate, dibutyl phthalate, tricresyl phosphate, cresyl diphenyl phosphate biphenyl diphenyl phosphate.

(Protective film)

It is desirable to form a thin protective film on the photosensitive layer in order to protect it from contamination or damage during storage. The protective film may be made of the same or similar material as the support, but must be easily separated from the photosensitive layer.

As a protective film material, silicone paper, a polyolefin resin sheet, or a polytetrafluoroethylene sheet is suitable, for example, A polypropylene sheet is especially preferable. On the other hand, as for the thickness of a protective film, 4-40 micrometers is common, 5-30 micrometers is preferable, and 10-25 micrometers is especially preferable.

(Production Method of Photosensitive Transfer Material)

The photosensitive transfer material used in the production method of the present invention forms a thermoplastic resin layer by applying and drying a coating liquid (coating liquid for a thermoplastic resin layer) in which an additive of a thermoplastic resin layer is dissolved on a support. It can produce by apply | coating a deep color photosensitive composition coating liquid, and forming it. However, the thermoplastic resin layer may not necessarily be formed.

A photosensitive transfer material can also be produced by preparing a sheet having a thermoplastic resin layer formed on the support and a sheet having a photosensitive layer formed on a protective film, and bonding the thermoplastic resin layer and the deep photosensitive layer so as to contact each other. Can be.

In addition, in the said manufacturing method, although application | coating of the photosensitive layer to a support body or a protective film can be performed by a well-known coating apparatus etc. like coating to the said substrate surface, in this invention, the coating apparatus using a slit-shaped nozzle (slit Coater).

(Production of Separator Wall by Photosensitive Transfer Material)

First, after peeling off and removing the protective film of the said photosensitive transfer material, the surface of a photosensitive layer is bonded together on a permanent support body (a board | substrate in this invention), it heats, presses and laminates by a laminator etc. (laminated body).

The laminator used for bonding can be suitably selected from a conventionally well-known laminator, a vacuum laminator, etc. Autocut laminators can also be used to increase productivity.

Next, remove the limbs. In this way, a photosensitive layer is formed on the substrate. The exposure step, the baking step, the developing step, and the water washing step continuously carried out according to the desire after removing the branch member may be performed as in the above-described coating method, and thus the deep color separation wall can be obtained.

Thus, formation of the deep color photosensitive layer on a board | substrate can be formed by either a coating method or the transfer method.

As described above, in any of the methods, the deep dividing wall having a smooth surface can be easily formed in accordance with the exposure pattern.

(Formation of each pixel)

In the manufacturing method of the color filter of this invention, a deep color separation wall is manufactured by the manufacturing method of the said deep color separation wall on the said board | substrate, a coloring liquid composition of two or more colors is provided between the said deep color separation walls, and two or more colors are applied. The color filter which has the pixel group which consists of a some pixel which has is manufactured.

That is, with respect to the gaps between the deep color separation walls formed on the substrate in the developing step, a color liquid composition for forming two or more colors of pixels (for example, each of the RGB pixels) is applied to the voids to provide two or more colors. A plurality of pixels having is formed.

A well-known method, such as an inkjet method or a striped gisa coating method, may be sufficient as the method of providing this coloring liquid composition to a partition wall space | gap, and the inkjet method is cost-effective.

In addition, before forming each pixel in this way, the shape of the deep color dividing wall may be fixed, and although the system is not specifically limited, the following is mentioned. That is, the process a which re-exposes after image development (called a post exposure), and the process b which heat-processes to comparatively low temperature after image development. The heat treatment herein refers to irradiating a substrate having a deep dividing wall by heating the substrate having a deep dividing wall in an electric furnace, a dryer, or by radiating it from an infrared lamp.

Here, the exposure amount at the time of performing the said process a may be 500-3000mJ / cm <2> in air | atmosphere, Preferably it is 100-200mJ / cm <2>, The heating temperature at the time of performing the same process b may be 50-120 degreeC, Preferably it is about 70-100 degreeC, and in the process b, the heat time is about 10-40 minutes. If the temperature is lower than 50 ° C., there is a possibility that hardening of the deep dividing wall does not proceed. If the temperature is higher than 120 ° C., the shape of the deep dividing wall may collapse.

As for the inkjet method used for forming each pixel, known methods such as a method of thermal curing the ink, a photocuring method, and a method of performing an attack from the formation of a transparent aqueous phase layer on a substrate in advance can be used. have.

Preferably, after forming each pixel, the heating process of heat processing (so-called baking process) is prepared. In a heating process, the board | substrate which has a layer photopolymerized by light irradiation is heated in an electric furnace, a dryer, etc., or irradiated by irradiating from an infrared lamp. The temperature and time of heating depend on the composition of the deep photosensitive composition or the thickness of the formed layer, but generally from about 10 minutes to about 120 ° C. at about 120 ° C. to about 250 ° C. in terms of obtaining sufficient solvent resistance, alkali resistance and ultraviolet absorbance. Heating for minutes is preferred.

The pattern shape of the color filter thus formed is not particularly limited, and may be a stripe, a lattice, or a delta array, which is a general black matrix.

(Inkjet method)

The inkjet method used in the present invention is a method of continuously spraying charged ink to control the electric field, a method of intermittently spraying ink using a piezoelectric element, a method of heating ink and intermittently spraying using the foaming thereof. It may be selected from various methods such as.

The ink used may be oil-based or aqueous, and is preferably water-based ink based on the relationship of surface tension. In addition, the coloring material contained in the ink may be a dye or a pigment, and the use of the pigment is more preferable in terms of durability. Moreover, the coloring ink of the application | coating system used for manufacture of a well-known color filter (coloring resin composition, for example, description of Unexamined-Japanese-Patent No. 2005-3861-0063, and Unexamined-Japanese-Patent No. 10-195358. Inkjet compositions according to the publications [0009] to [0026] can also be used.

In the present invention, a component which is cured by heating or cured by energy rays such as ultraviolet rays may be added to the ink in consideration of the step after coloring. Various thermosetting resins can be used widely as a component hardening by heating. In addition, the component hardened | cured by an energy ray may be a component obtained by adding a photoreaction initiator to an acrylate derivative or a methacrylate derivative, for example. It is more preferable to have acryloyl group and a methacryloyl group in a molecule especially in consideration of heat resistance. These acrylate derivatives and methacrylate derivatives are preferably water-soluble. Even when the acrylate derivative and the methacrylate derivative are poorly soluble in water, they can be used after emulsification and the like.

In this case, the photocrosslinkable photosensitive composition which contained coloring agents, such as the pigment listed in the term of the said [photosensitive composition], can be used as a suitable thing.

Moreover, as ink which can be used in this invention, the thermosetting ink for color filters containing at least a binder and the bifunctional to trifunctional epoxy group containing monomer is also preferable.

In the present invention, the color filter is preferably a color filter pixelated by an inkjet method, and preferably has a color filter of three colors formed by attaching RGB three-color ink.

This color filter can be used as a display element in combination with a liquid crystal display element, an electrophoretic display element, an electrochromic display element, a PLZT, or the like. It can also be used for applications using a color camera or other color filters.

[Display device]

In the present invention, the display device refers to a display device such as a liquid crystal display device, a plasma display display device, an EL display device, a CRT display device, or the like. For the definition of the display device and the explanation of each display device, for example, "Electronic display device (Aki Sasaki by Co., Ltd., Kogyojo Sakai Co., Ltd. issued in 1990)", "Display device (Ibuki Junsho, Sankyo Auto Show ( Note) issued in 1989).

Among the display devices of the present invention, liquid crystal display devices are particularly preferable. The liquid crystal display device is described in, for example, "next-generation liquid crystal display technology (Tatsuo Uchida editing, Kogyo Co., Ltd., 1994)". There is no restriction | limiting in particular in the liquid crystal display device which can apply this invention, For example, this invention can be applied to the liquid crystal display device of various systems described in the said "next-generation liquid crystal display technology." The present invention is particularly effective for the liquid crystal display device of the color TFT type among them. The liquid crystal display device of the color TFT system is described, for example, in "Color TFT liquid crystal display (Kyouritsu Shupan Co., Ltd. 1996)." In addition, the present invention can be applied to a liquid crystal display device having an enlarged viewing angle such as a lateral electric field driving method such as IPS and a pixel division method such as MVA. These methods are described, for example, on page 43 in "EL, PDP, LCD Displays-The Latest Trends in Technology and Markets" (Tore Research Center, Jobs Kenkyu Co., 2001).

In addition to the color filter, the liquid crystal display may include various materials such as an electrode substrate, a polarizing film, a phase difference film, a backlight, a spacer, a viewing angle compensation film, and the like. The black matrix of the present invention can be applied to a liquid crystal display device composed of these known subsidiary materials. For these subsidiary materials, for example, the '94 liquid crystal display peripheral materials and chemicals market (Kenta Shima Kentaro Co., Ltd., 1994), "2003 liquid crystal related market and future prospects (the lower volume) (Omote Ryokichi ( Fuji Chimera Research Institute, 2003).

[Target use]

The color filter of the present invention can be applied to applications such as televisions, personal computers, liquid crystal projectors, game machines, portable terminals such as mobile phones, digital cameras, car navigation systems, and the like without particular limitation.

As for the indication of the Japanese application 2005-150788, the whole is integrated in this specification by reference.

Exemplary embodiments of the present invention are described below.

[1] A method for producing a color filter having two or more pixel groups representing different colors on a substrate, wherein each pixel of the pixel groups is separated from each other by a deep color separation wall:

A photosensitive layer forming step of forming a photosensitive layer comprising a deep photosensitive composition containing a crosslinking agent and a coloring agent which obtain a crosslinking function by the action of the photoacid generator and the photoacid generator on a substrate;

An exposure step of exposing the photosensitive layer to cure an exposure area;

A developing step of forming a separation wall by removing the photosensitive layer of the unexposed part; And

A method of manufacturing a color filter, comprising the steps of applying droplets with a colored liquid composition between the separating walls to form each pixel between the separating walls.

[2] The method for producing a color filter according to [1], wherein the deep color photosensitive composition further comprises a copolymer further comprising at least one of methyl methacrylate and benzyl methacrylate.

[3] The method for producing a color filter according to [1] or [2], wherein the photoacid generator is at least one compound selected from the group consisting of an organic halogen compound, an onium salt, and a sulfonic acid ester.

[4] The method for producing a color filter according to any one of [1] to [3], wherein the crosslinking agent is melamine resin or urea resin.

[5] The method for producing a color filter according to any one of [1] to [4], wherein the height of the separation wall is 1.8 µm or more and 10 µm or less.

[6] The method for producing a color filter according to any one of [1] to [5], wherein the optical density of the dividing wall is 2.5 or more and 10 or less.

[7] The method for producing a color filter according to any one of [1] to [6], wherein the dividing wall is black.

[8] A color filter, produced by the production method according to any one of [1] to [7], wherein the surface roughness (Ra value) of the separation wall is 5 nm or less.

[9] A liquid crystal display device comprising the color filter described in [8].

[10] A liquid crystal display device comprising the liquid crystal display device according to [9].

Hereinafter, the present invention will be described in detail with reference to Examples. However, the present invention is not limited to these. In addition, "%" and "part" mean "mass%" and "mass part" unless there is particular notice, and "molecular weight" shows a "mass average molecular weight."

(Example 1)

The alkali free glass substrate was wash | cleaned with the UV washing | cleaning apparatus, and brush cleaning was performed using the washing | cleaning agent after that, and the ultrasonic cleaning was performed with the ultrapure water. The substrate was heat-treated at 120 ° C. for 3 minutes to stabilize the surface state.

After cooling a board | substrate and warming at 23 degreeC, the photosensitive composition K1 which consists of a composition described below was apply | coated with the coater for glass substrates (FAS Japan company make, brand name: MH-1600) which has a slit-shaped nozzle. Subsequently, a VCD (vacuum drying device, manufactured by Tokyo Okagyo Co., Ltd.) is volatilized for 30 seconds to remove some of the solvent from the fluidity of the coating layer, and then the EBR (Edge Bead Remover) removes unnecessary coating liquid around the substrate. Prebaking was performed at 120 degreeC for 3 minutes, and the photosensitive layer K1 of 2 micrometers in thickness was obtained.

<Photosensitive composition K1>

25.0 parts of carbon black dispersion (the following composition)

Propylene glycol monomethyl ether acetate 37.4 parts

Methyl ethyl ketone 24.9 parts

Binder 1 9.1

1.2 parts of 2,2-bis (trichloromethyl) -6-[-4- (N, N-ethoxycarbonylmethyl) -3-bromophenyl] -s-triazine

2.4 parts of crosslinking agent (MW-30M Sanwa Chemical Co., Ltd. product)

Surfactant 1 0.044 parts

<Carbon Black Dispersion>

Carbon black (Nipex35 from Degussa) 13.1%

Dispersant 0.65%

6.72% of polymer (benzyl methacrylate / methacrylic acid = random copolymer of 72/28 molar ratio, molecular weight 370,000)

Propylene glycol monomethyl ether acetate 79.53%

<Binder 1>

27% polymer (benzyl methacrylate / methacrylic acid = 78/22 molar ratio random copolymer, molecular weight 3.8 million)

Propylene glycol monomethyl ether acetate 73%

<Surfactant 1>

Structure 1 30%

70% methyl ethyl ketone

Structure 1

(n = 6, x = 55, y = 5, Mw = 33940, Mw / Vn = 2.55

PO: propylene oxide, EO: ethylene oxide)

(Exposure process)

The distance between the exposure mask surface and the photosensitive layer K1 is 200 μm in a state in which the substrate and the mask (a quartz exposure mask having an image pattern) are placed vertically with a proximity exposure machine (manufactured by Hitachi Denshi Engineering Co., Ltd.) having an ultra-high pressure mercury lamp. It set and pattern-exposed by exposure amount 400mJ / cm <2> in nitrogen atmosphere.

(Baking process)

One minute after the exposure was completed, heat treatment (110 ° C., 60 seconds) was performed.

(Developing process)

Next, pure water was sprayed from the shower nozzle to uniformly wet the surface of the deep photosensitive layer K1, and then dried at 23 ° C. with a KOH-based developer (KOH, containing a nonionic surfactant, trade name: CDK-1, manufactured by FUJIFILM Electronics). Shower development was carried out at a flat nozzle pressure of 0.04 MPa for a second to obtain a patterned image. Subsequently, ultrapure water was jetted from the ultra-high pressure cleaning nozzle at a pressure of 9.8 MPa to remove the residue, and post exposure was performed at an exposure dose of 200 mJ / cm 2 under air to obtain a dividing wall having an optical density of 3.9. Thus, the surface unevenness | corrugation of the obtained partition wall was measured with the contact film thickness meter (the stylus type surface roughness meter P10 by Tencor Corporation), Ra was 3.2 nm, and the height of the partition wall was 2.0 micrometers.

[Plasma Waste Hydration Treatment]

The plasma coupling hydration process was performed on the following conditions using the cathode coupling type parallel plate type plasma processing apparatus for the board | substrate with which the separation wall was formed.

Gas Used: CF ₄ Gas Flow Rate: 80sccm

Pressure: 40Pa

RF power: 50W

Processing time: 30sec

Preparation of coloring ink for pixels

Among the following components, first, a pigment, a polymer dispersant, and a solvent were mixed, and the pigment dispersion liquid was obtained using three rolls and a bead mill. Other materials were added little by little, stirring this pigment dispersion liquid sufficiently with a Dissolver etc., and the coloring ink composition for red (R) pixels was prepared.

<The composition of the coloring ink for red pixels>

Pigment (C.I. Pigment Red 254) 5 copies

1 part of polymer dispersant (SOLSPERSE 24000 from AVECIA)

Binder (glycidyl methacrylate styrene copolymer) 3 parts

2 parts of 1 epoxy resin (Novolak-type epoxy resin, Yukocel company Epikote 154)

Second epoxy resin (neopentyl glycol diglycidyl ether) 5 parts

4 parts hardener (trimeric acid)

Solvent: 80 parts of ethyl 3-ethoxypropionate

A colored ink composition for green (G) pixels was prepared in the same manner as in the case of the red pixel portion coloring ink composition except that the same amount of C.I.Pigment Green 36 was used instead of C.I.Pigment Red 254 in the composition.

A colored ink composition for a blue (B) pixel was prepared in the same manner as in the case of the colored ink composition for a red pixel, except that the same amount of C.I.Pigment Blue 15: 6 was used instead of C.I.Pigment Red 254 in the composition.

Next, using an inkjet recording apparatus in the region (concave portion surrounded by the convex portion) divided by the separating wall of the image forming substrate obtained above using the above-mentioned R, G, B pixel coloring ink, The ink composition was discharged until the concentration was reached, and a color filter having a pattern of R, G, and B was produced. The color filter after image coloring was hardened completely with a black matrix and each pixel by baking for 30 minutes in 230 degreeC oven.

The defects such as defects in which the ink constituting each pixel of the color filter thus obtained enters properly between the separation walls and cause color mixing with adjacent pixels were not found. This is considered to be because the wettability of the ink on the upper surface of the partition wall is unexpectedly lowered by using the present invention, and the ink has not reached the neighboring pixel region.

(Overcoat layer)

Thereafter, the glass on which the colored layer was formed was washed with a low pressure mercury lamp (effective wavelength 254 nm) UV cleaning device to remove residues and foreign substances, and then the transparent overcoat agent was applied to the entire surface so that the film thickness was 1.5 µm. Baked for a minute. At this time, in order to form a transparent overcoat layer, the polyamic acid of the following general formula (A) and the epoxy compound of the general formula (B) were mixed and used at a weight ratio of 3: 1.

Formula (A)

R=메틸렌기, m=50

R = methylene group, m = 50

Formula (B)

(Formation of ITO)

ITO (indium tin oxide) was formed on the color filter in which the said overcoat layer was formed by sputtering, and the ITO transparent electrode substrate was obtained. When the ITO resistance of the color filter was measured (Mitsubishi Yuka "Loresta"; sheet resistance was measured by the four probe method), it was 13 Ω / square.

(Formation of spacer)

The spacer was formed on the above-mentioned ITO transparent electrode by the method similar to the spacer formation method of (Example 1) of Unexamined-Japanese-Patent No. 2004-240335.

(Formation of projection for liquid crystal orientation control)

The liquid crystal orientation control protrusion was formed on the ITO transparent electrode in which the said spacer was formed using the following coating liquid for positive photosensitive resin layers.

However, the following method used the exposure, image development, and baking process.

Proximity exposure machine (Hitachi Denshi Engineering Co., Ltd.) is arrange | positioned so that predetermined | prescribed photomask may be 100 micrometers from the surface of the photosensitive resin layer, and it proxies at 15OmJ / cm <2> of irradiation energy by ultra-high pressure mercury lamp through the said photomask. Miti exposure.

Subsequently, a 2.38% tetramethylammonium hydroxide aqueous solution was developed while spraying onto the substrate at 33 ° C. for 30 seconds using a shower developing device. In this way, the unnecessary part (exposure part) of the photosensitive resin layer was image-removed, and the board | substrate for liquid crystal display apparatuses with the liquid crystal aligning control protrusion which consisted of the photosensitive resin layer patterned in the desired shape on the color filter side board | substrate was obtained.

Next, the liquid crystal aligning control projection was formed on the liquid crystal display substrate by baking the liquid crystal display device substrate on which the liquid crystal alignment control projection was formed at 230 ° C. for 30 minutes.

<Prescription of coating liquid for positive photosensitive resin layer>

Positive resist liquid 53.3 parts

(Fuji Film Electronics Metallics Co., Ltd., FH-2413F)

Methyl ethyl ketone 46.7 parts

0.04 parts surfactant

(Megafac F-780F, Dainippon Ink & Chemicals Co., Ltd.)

(Making of liquid crystal display device)

Using the board | substrate for liquid crystal display devices obtained above, the liquid crystal display device was produced using the method as described in 1st Example-Unexamined-Japanese-Patent No. 11-242243.

(evaluation)

The screen of the liquid crystal display device was a good screen without color mixing. Moreover, the quality of black display was also favorable.

According to the present invention, it is possible to form a partition wall having a smooth surface stably in a small process, and as a result, a manufacturing method of a color filter capable of lowering the surface resistance of the transparent electrode (ITO) formed on the color filter, A color filter having a small surface roughness of a partition wall obtained by the method, a liquid crystal display device having the color filter, and a liquid crystal display device having the liquid crystal display device are provided.

According to the manufacturing method of the color filter of this invention, after forming the layer containing a deep photosensitive composition (henceforth a photosensitive layer suitably) on a board | substrate without requiring a dry etching process, it follows the shape of a partition wall. By the simple process of exposing and developing in an image aspect, the partition wall in which the fine unevenness | corrugation of the surface was improved stably can be obtained. As a result, it is possible to obtain a color filter having a low surface resistance of ITO at a low cost with few processes.

In addition, in the color filter formed by the manufacturing method of the present invention, defects such as color mixing with adjacent pixels are suppressed when the unevenness of the surface of the separating wall is improved to impart droplets by inkjet or the like to form each pixel. The surface resistance of ITO shows low effect, and it can use suitably for a liquid crystal display element.

All documents, patent applications, and technical specifications described herein are incorporated by reference to the same extent as if each document, patent application, and technical specification were specifically incorporated by reference.

Claims (10)

A method for producing a color filter having two or more pixel groups representing different colors on a substrate, wherein each pixel in the pixel groups is separated from each other by a deep color separation wall: A photosensitive layer forming step of forming a photosensitive layer comprising a deep photosensitive composition containing a crosslinking agent and a coloring agent which obtain a crosslinking function by the action of the photoacid generator and the photoacid generator on a substrate; An exposure step of exposing the photosensitive layer to cure an exposure area; A developing step of forming a separation wall by removing the photosensitive layer of the unexposed part; And A process for producing a color filter, comprising the steps of: applying droplets with a colored liquid composition between the separation walls to form respective pixels between the separation walls. The method of claim 1, The deep color photosensitive composition is a method for producing a color filter, characterized in that it contains a copolymer further comprising at least one of methyl methacrylate or benzyl methacrylate. The method of claim 1, The photoacid generator is a method of producing a color filter, characterized in that at least one compound selected from the group consisting of organic halogen compounds, onium salts and sulfonic acid esters. The method of claim 1, The crosslinking agent is a melamine resin or urea resin, characterized in that the manufacturing method of the color filter. The method of claim 1, The height of the said separation wall is 1.8 micrometers or more and the manufacturing method of the color filter characterized by the above-mentioned. The method of claim 1, The optical density of the dividing wall is 2.5 or more and 10 or less manufacturing method of the color filter. The method of claim 1, The separation wall is a manufacturing method of a color filter, characterized in that the black. The color filter manufactured by the manufacturing method of Claim 1 whose surface roughness (Ra value) of a partition wall is 5 nm or less. A liquid crystal display device comprising the color filter according to claim 8. A liquid crystal display device comprising the liquid crystal display device according to claim 9.