JP2006154804A - Method for manufacturing color filter, color filter , and display device having the color filter - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a method for manufacturing a color filter with high efficiency at low cost by forming pixels free of color mixing etc., with good position accuracy, and a color filter obtained by the method. <P>SOLUTION: In the method for manufacturing the color filter which has two or more pixel groups having colors different from each other on a substrate and in which the respective pixels constituting the pixel groups are partitioned from each other by deep color partition walls, the deep color partition walls of ≤0.04 in the value obtained by dividing the value (d) regulated by the distance from the intersection of L<SB>2</SB>and L<SB>3</SB>to the partition wall by (h) when the height from the substrate at the highest point in the height from the substrate of the deep color partition walls is defined as (h), the line parallel to the substrate in position of 0.8 (h) from the substrate as L<SB>1</SB>, the tangent at the point where L<SB>1</SB>and the deep color partition walls come into contact as L<SB>2</SB>, and the line parallel to the substrate in the position (h) as L<SB>3</SB>in the sectional shape of the deep color partition walls formed on the substrate are formed and thereafter, the respective pixels are formed between the deep color partition walls. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

  The present invention relates to a method for producing a color filter for a display device, a color filter obtained by the production method, and a display device having the same.

  A color filter for a display device has a structure in which red, green, and blue dot-like images are arranged in a matrix on a substrate such as glass, and the boundary is divided by a dark color separation wall such as a black matrix. As a method for producing such a color filter, conventionally, a substrate such as glass is used as a support, 1) a dyeing method, 2) a printing method, 3) application of a colored photosensitive resin solution, and repeated exposure and development. Colored photosensitive resin liquid method (colored resist method) (see, for example, Patent Documents 1, 2 and 3), 4) A method of sequentially transferring images formed on a temporary support onto a final or temporary support ( For example, refer to Patent Documents 4, 5 and 6.) 5) A colored layer is formed by applying a pre-colored photosensitive resin solution on a temporary support, and the photosensitive colored layer is formed directly on the substrate in order. A method (transfer system) for forming a multicolor image by a method of repeating transfer, exposure and development by the number of colors is known (for example, see Patent Document 7). A method using an ink jet method (see Patent Document 8) is also known.

  Among these methods, although the color resist method can produce a color filter with high positional accuracy, it is not advantageous in terms of cost due to a large loss in application of the photosensitive layer resin solution. On the other hand, the ink-jet method has a problem that the positional accuracy of the pixels is poor, although the loss of the resin liquid is small and advantageous in terms of cost. In order to overcome these problems, a color filter manufacturing method in which a black matrix is formed by a colored resist method and an RGB pixel is manufactured by an ink jet method has been proposed. Since the edges are rounded and each of the color inks that are subsequently ejected easily passes over the black matrix, there is a possibility that bleeding, bleeding, color mixing with adjacent pixels, white spots, etc. may occur. In order to prevent this, a method is disclosed in which the black matrix and the ink have a repelling property or the ink wettability of the black matrix gap is increased (Patent Documents 9, 10 and 11). However, these methods require a special material for the black matrix coloring resist or ink, or require a step of increasing the surface energy of the black matrix gap (surface modification treatment), which is costly. The problem still remains.

In addition, a method of performing water-repellent treatment on a separation wall by plasma treatment is known (Patent Document 12). However, it has been difficult to sufficiently eliminate color mixing with adjacent pixels and white spots even if the separation wall is subjected only to water repellent treatment.
JP-A-63-298304 JP-A 63-309916 JP-A-1-152449 JP-A-61-99103 JP-A-61-233704 JP-A 61-279802 JP-A-61-99102 JP-A-8-227010 JP-A-6-347637 JP-A-7-35915 JP-A-10-142418 JP 2001-343518 A

  Therefore, the present invention provides a method for manufacturing a color filter with low positional accuracy and high efficiency, a color filter obtained by this method, and a display device including this color filter. The purpose is to provide.

In view of such circumstances, the present inventor has conducted intensive research to solve the above problems, and as a result, if the cross-sectional shape of the dark color separation wall is set to a specific shape as described below, each of them is then performed by inkjet or the like. When forming pixels, it is possible to prevent defects such as bleeding and protrusion of each color ink, color mixture with adjacent pixels and white spots, and a good color filter can be obtained, thus completing the present invention.
That is, the present invention provides the following manufacturing method and the like.

<1> A method of manufacturing a color filter, comprising two or more pixel groups exhibiting different colors on a substrate, wherein each pixel constituting the pixel group is separated from each other by a dark color separation wall. In the cross-sectional shape of the dark color separation wall formed on the substrate, the height of the separation wall from the substrate at the highest height from the substrate is h, and the substrate is positioned at 0.8 h from the substrate. L ₂ a tangent at the point of contact parallel lines L _1, L ₁ and Hanarega _wall, when the substrate and a line parallel to the position of the h was L _3, Hanarega wall from the intersection of L ₂ and L ₃ After forming a dark color separation wall characterized in that a value d obtained by dividing the value d defined by the distance up to h is 0.04 or less, each pixel is formed between the dark color separation walls. A color filter manufacturing method characterized by the above.

<2> The method for producing a color filter according to <1>, wherein each pixel is formed between the dark color separation walls in a state where at least a part of the dark color separation walls is water-repellent. .
<3> The method of forming each pixel between the dark color separation walls is a method of causing the colored liquid composition forming each pixel to enter between the dark color separation walls by an ink jet method <1 > Or <2>.

  <4> The color filter according to any one of <1> to <3>, wherein a dark color separation wall is formed by exposing the dark color composition in an oxygen-poor atmosphere and then developing the composition. Manufacturing method.

  <5> The method for producing a color filter according to <4>, wherein the poor oxygen atmosphere is selected from an inert gas atmosphere, a reduced pressure, and an intermediate layer capable of blocking oxygen.

  <6> The color filter according to any one of <1> to <5>, wherein the means for making at least a part of the dark color separation wall repellent is a plasma treatment. Manufacturing method.

  <7> The color filter manufacturing method according to any one of <4> to <6>, wherein the dark color separation wall shape is fixed by performing re-exposure after development.

<8> The method for producing a color filter according to <7>, wherein an exposure amount in re-exposure is 1000 mJ / cm ² or more.

  <9> The method for producing a color filter according to any one of <4> to <8>, wherein after the development, the dark color separation wall shape is fixed by heating at 50 to 120 ° C.

  <10> The method for producing a color filter according to any one of <4> to <8>, wherein each pixel is formed by an ink jet method without a heating step exceeding 120 ° C. after development.

  <11> The method for producing a color filter according to any one of <4> to <10>, wherein the optical density of the dark color composition is 2.5 or more.

  <12> The method for producing a color filter according to any one of <4> to <11>, wherein the dark color composition is a photopolymerizable composition.

  <13> On a temporary support, a photosensitive transfer material having at least a layer composed of the dark color composition according to <12> and an intermediate layer capable of blocking oxygen is transferred onto a substrate, and dark color separation is performed. The method for producing a color filter according to <12>, wherein wall formation is performed.

  <14> The method for producing a color filter according to any one of <1> to <13>, wherein the dark color separation wall is black.

  <15> The method for producing a color filter according to any one of <1> to <14>, wherein the dark color separation wall has a black matrix-like structure.

  <16> A color filter manufactured by the color filter manufacturing method according to any one of <1> to <15>.

  <17> A display device comprising a color filter manufactured by the color filter manufacturing method according to any one of <1> to <15>.

  According to the present invention, when forming each pixel, it is possible to prevent defects such as bleeding, protrusion of each color ink, color mixing with adjacent pixels, and white spots, and a good color filter can be obtained at low cost. It becomes.

Hereinafter, the present invention will be described in detail.
The present invention is a method of manufacturing a color filter having two or more pixel groups exhibiting different colors on a substrate and each pixel constituting the pixel group being separated from each other by a dark color separation wall. In the cross-sectional shape of the dark color separation wall formed on the substrate, the height from the substrate at the highest height of the separation wall from the substrate is h, and the substrate is positioned at a position 0.8 h from the substrate. when parallel lines was L _1, L ₁ and a tangent at Hanarega wall contact points L _2, L ₃ of the substrate and a line parallel to the position of h and, Hanarega from the intersection of L ₂ and L ₃ After forming a dark color separation wall characterized in that a value d determined by the distance to the wall divided by h is 0.04 or less, each pixel is formed in the separation wall gap It is characterized by.

(Deep color composition)
The dark color separation wall of each pixel is formed from a dark color composition. Here, the dark color composition is a composition having a high optical density, and the value thereof is 2.0 to 10.0. The optical density of the dark color composition is preferably 2.5 to 6.0, particularly preferably 3.0 to 5.0. Further, since this dark color composition is preferably cured by a photoinitiating system as described later, the optical density with respect to the exposure wavelength (generally the ultraviolet region) is also important. That is, the value is 2.0 to 10.0, preferably 2.5 to 6.0, and most preferably 3.0 to 5.0. If it is less than 2.0, the shape of the separation wall may not be as desired, and if it exceeds 10.0, polymerization cannot be started and it is difficult to produce the separation wall itself. As long as it has such properties, the dark body in the composition may be an organic substance (various dyes such as dyes and pigments), or each form of carbon. May be. Such a dark body is not particularly limited, but a black body is most often used.

  Specific examples of the dark color used in the present invention include pigments and dyes described in JP-A-2005-17716 [0038] to [0054], JP-A-2004-361447 [0068] to [0072]. And the colorants described in JP-A-2005-17521 [0080] to [0088] can be suitably used.

    For the dark color composition of the present invention, organic pigments, inorganic pigments, dyes, and the like can be suitably used. When light-shielding properties are required for the photosensitive resin layer, carbon black, titanium oxide, and iron oxide tetraoxide. In addition to light-shielding agents such as metal oxide powder, metal sulfide powder, and metal powder, a mixture of pigments such as red, blue, and green can be used. Known colorants (dyes and pigments) can be used. Among the known colorants, when a pigment is used, it is preferably dispersed uniformly in the dark color composition.

From the viewpoint of sufficiently shortening the development time, the ratio of the dark color body in the solid content of the dark color composition is preferably 30 to 70% by mass, more preferably 40 to 60% by mass, More preferably, it is 50-55 mass%.
Further examples of the dark black color body include carbon black, titanium carbon, iron oxide, titanium oxide, and graphite. Among these, carbon black is preferable.

  The pigment is desirably used as a dispersion. This dispersion can be prepared by adding and dispersing a composition obtained by previously mixing the pigment and the pigment dispersant in an organic solvent (or vehicle) described later. The vehicle refers to a portion of a medium in which the pigment is dispersed when the paint is in a liquid state. The portion is a liquid that binds to the pigment and hardens the coating film (binder), and a component that dissolves and dilutes the portion. (Organic solvent). The disperser used for dispersing the pigment is not particularly limited. For example, the kneader described in Kazuzo Asakura, “Encyclopedia of Pigments”, first edition, Asakura Shoten, 2000, 438, Known dispersing machines such as a roll mill, an atrider, a super mill, a dissolver, a homomixer, and a sand mill can be used. Further, fine grinding may be performed using frictional force by mechanical grinding described on page 310 of the document.

  The dark color body (pigment) used in the present invention preferably has a number average particle diameter of 0.001 to 0.1 μm, more preferably 0.01 to 0.08 μm, from the viewpoint of dispersion stability. The “particle diameter” as used herein refers to the diameter when the electron micrograph image of the particle is a circle of the same area, and the “number average particle diameter” is the above-mentioned particle diameter for a number of particles, This 100 average value is said.

  The dark color composition preferably contains at least a polymerization initiator and a polyfunctional monomer in addition to the dark color body. Further, if necessary, a known additive such as a plasticizer, a filler, a stabilizer, a polymerization inhibitor, a surfactant, a solvent, an adhesion promoter, and the like can be further contained. Furthermore, the dark color composition is preferably softened or tacky at a temperature of at least 150 ° C., and is preferably thermoplastic. From such a viewpoint, it can be modified by adding a compatible plasticizer.

As a method for curing the dark color composition, a thermal initiation system using a thermal initiator and a photoinitiation system using a photoinitiator are generally used, but in the present invention, the shape of the separation wall after curing is described later. Therefore, it is preferable to use a photoinitiating system. The photopolymerization initiator used here generates an active species that initiates polymerization of a polyfunctional monomer, which will be described later, upon irradiation with radiation such as visible light, ultraviolet light, far ultraviolet light, electron beam, or X-ray (also referred to as exposure). It is a compound to be obtained and can be appropriately selected from known photopolymerization initiators or photopolymerization initiator systems.
For example, trihalomethyl group-containing compounds, acridine compounds, acetophenone compounds, biimidazole compounds, triazine compounds, benzoin compounds, benzophenone compounds, α-diketone compounds, polynuclear quinone compounds, xanthone compounds, diazo compounds Compound, etc. can be mentioned.

  Specifically, a trihalomethyl group-substituted trihalomethyloxazole derivative or s-triazine derivative described in JP-A No. 2001-117230, a trihalomethyl-s-triazine compound described in US Pat. No. 4,239,850, A trihalomethyl group-containing compound such as the trihalomethyloxadiazole compound described in Japanese Patent No. 4221976;

9-phenylacridine, 9-pyridylacridine, 9-pyrazinylacridine, 1,2-bis (9-acridinyl) ethane, 1,3-bis (9-acridinyl) propane, 1,4-bis (9-acridinyl) ) Butane, 1,5-bis (9-acridinyl) pentane, 1,6-bis (9-acridinyl) hexane, 1,7-bis (9-acridinyl) heptane, 1,8-bis (9-acridinyl) octane 1,9-bis (9-acridinyl) nonane, 1,10-bis (9-acridinyl) decane, 1,11-bis (9-acridinyl) undecane, 1,12-bis (9-acridinyl) dodecane, etc. Acridine compounds such as bis (9-acridinyl) alkane;

6- (p-methoxyphenyl) -2,4-bis (trichloromethyl) -s-triazine, 6- [p- (N, N-bis (ethoxycarbonylmethyl) amino) phenyl] -2,4-bis ( Triazine compounds such as (trichloromethyl) -s-triazine; 9,10-dimethylbenzphenazine, Michler's ketone, benzophenone / Michler's ketone, hexaarylbiimidazole / mercaptobenzimidazole, benzyldimethyl ketal, thioxanthone / amine, 2,2 ′ -Bis (2,4-dichlorophenyl) -4,4 ', 5,5'-tetraphenyl-1,2'-biimidazole and the like.

Among the above, at least one selected from a trihalomethyl group-containing compound, an acridine compound, an acetophenone compound, a biimidazole compound, and a triazine compound is preferable, and particularly selected from a trihalomethyl group-containing compound and an acridine compound. It is preferable to contain at least one kind. Trihalomethyl group-containing compounds and acridine compounds are also useful in that they are versatile and inexpensive.
Particularly preferred as the trihalomethyl group-containing compound is 2-trichloromethyl-5- (p-styrylstyryl) -1,3,4-oxadiazole, and as the acridine compound, 9-phenylacridine is preferred. Further, 6- [p- (N, N-bis (ethoxycarbonylmethyl) amino) phenyl] -2,4-bis (trichloromethyl) -s-triazine, 2- (p-butoxystyryl) -5 Trihalomethyl group-containing compounds such as trichloromethyl-1,3,4-oxadiazole, and Michler's ketone, 2,2′-bis (2,4-dichlorophenyl) -4,4 ′, 5,5′-tetraphenyl- 1,2'-biimidazole.

  The said photoinitiator may be used independently and may use 2 or more types together. The total amount of the photopolymerization initiator in the dark composition is preferably from 0.1 to 20% by weight, particularly preferably from 0.5 to 10% by weight, based on the total solid content (mass) of the dark color composition. When the total amount is less than 0.1% by mass, the photocuring efficiency of the composition is low and exposure may take a long time. When it exceeds 20% by mass, an image pattern formed during development is formed. May be lost or the pattern surface may be rough.

  The photopolymerization initiator may be configured using a hydrogen donor in combination. The hydrogen donor is preferably a mercaptan compound or an amine compound as defined below from the viewpoint that sensitivity can be further improved. The “hydrogen donor” herein refers to a compound that can donate a hydrogen atom to a radical generated from the photopolymerization initiator by exposure.

  The mercaptan-based compound is a compound having a benzene ring or a heterocyclic ring as a mother nucleus and having one or more, preferably 1 to 3, more preferably 1 to 2, mercapto groups directly bonded to the mother nucleus (hereinafter referred to as “ A mercaptan-based hydrogen donor). The amine compound is a compound having a benzene ring or a heterocyclic ring as a mother nucleus and having 1 or more, preferably 1 to 3, and more preferably 1 to 2 amino groups directly bonded to the mother nucleus (hereinafter referred to as “the amine compound”). , Referred to as “amine-based hydrogen donor”). These hydrogen donors may have a mercapto group and an amino group at the same time.

  Specific examples of the mercaptan-based hydrogen donor include 2-mercaptobenzothiazole, 2-mercaptobenzoxazole, 2-mercaptobenzimidazole, 2,5-dimercapto-1,3,4-thiadiazole, 2-mercapto-2. , 5-dimethylaminopyridine, and the like. Of these, 2-mercaptobenzothiazole and 2-mercaptobenzoxazole are preferable, and 2-mercaptobenzothiazole is particularly preferable.

  Specific examples of the amine-based hydrogen donor include 4,4′-bis (dimethylamino) benzophenone, 4,4′-bis (diethylamino) benzophenone, 4-diethylaminoacetophenone, 4-dimethylaminopropiophenone, ethyl. Examples include -4-dimethylaminobenzoate, 4-dimethylaminobenzoic acid, 4-dimethylaminobenzonitrile and the like. Of these, 4,4'-bis (dimethylamino) benzophenone and 4,4'-bis (diethylamino) benzophenone are preferable, and 4,4'-bis (diethylamino) benzophenone is particularly preferable.

  The hydrogen donor can be used alone or in admixture of two or more, and the formed image is difficult to drop off from the permanent support during development, and can be improved in strength and sensitivity. It is preferable to use a combination of one or more mercaptan hydrogen donors and one or more amine hydrogen donors.

  Specific examples of the combination of the mercaptan hydrogen donor and the amine hydrogen donor include 2-mercaptobenzothiazole / 4,4′-bis (dimethylamino) benzophenone, 2-mercaptobenzothiazole / 4,4′-. Examples thereof include bis (diethylamino) benzophenone, 2-mercaptobenzoxazole / 4,4′-bis (dimethylamino) benzophenone, 2-mercaptobenzoxazole / 4,4′-bis (diethylamino) benzophenone. More preferred combinations are 2-mercaptobenzothiazole / 4,4′-bis (diethylamino) benzophenone and 2-mercaptobenzoxazole / 4,4′-bis (diethylamino) benzophenone, and a particularly preferred combination is 2-mercaptobenzobenzone. Thiazole / 4,4′-bis (diethylamino) benzophenone.

  When the mercaptan hydrogen donor and the amine hydrogen donor are combined, the mass ratio (M: A) of the mercaptan hydrogen donor (M) to the amine hydrogen donor (A) is usually 1: 1-1: 4 is preferable, and 1: 1-1: 3 is more preferable. The total amount of the hydrogen donor in the dark color composition is preferably from 0.1 to 20% by weight, particularly preferably from 0.5 to 10% by weight, based on the total solid content (mass) of the dark color composition.

  As the polyfunctional monomer of the dark color composition, the following compounds can be used alone or in combination with other monomers. Specifically, t-butyl (meth) acrylate, ethylene glycol di (meth) acrylate, 2-hydroxypropyl (meth) acrylate, triethylene glycol di (meth) acrylate, trimethylolpropane tri (meth) acrylate, 2- Ethyl-2-butyl-propanediol di (meth) acrylate, pentaerythritol tri (meth) acrylate, pentaerythritol tetra (meth) acrylate, dipentaerythritol hexa (meth) acrylate, dipentaerythritol penta (meth) acrylate, polyoxy Ethylated trimethylolpropane tri (meth) acrylate, tris (2- (meth) acryloyloxyethyl) isocyanurate, 1,4-diisopropenylbenzene, 1,4-dihydroxy Nzenji (meth) acrylate, decamethylene glycol di (meth) acrylate, styrene, diallyl fumarate, triallyl trimellitate, lauryl (meth) acrylate, (meth) acrylamide, xylylenebis (meth) acrylamide, and the like.

Moreover, reaction of a compound having a hydroxyl group such as 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, and polyethylene glycol mono (meth) acrylate with a diisocyanate such as hexamethylene diisocyanate, toluene diisocyanate, and xylene diisocyanate. Things can also be used.
Of these, pentaerythritol tetraacrylate, dipentaerythritol hexaacrylate, dipentaerythritol pentaacrylate, and tris (2-acryloyloxyethyl) isocyanurate are particularly preferable.

  As content in the dark composition of a polyfunctional monomer, 5-80 mass% is preferable with respect to the total solid (mass) of a dark color composition, and 10-70 mass% is especially preferable. When the content is less than 5% by mass, the resistance to an alkaline developer at the exposed portion of the composition may be inferior, and when it exceeds 80% by mass, the tackiness of a dark color composition increases. Therefore, the handleability may be inferior.

(Dark color separation wall)
The dark color separation wall of each pixel is formed from the dark color composition. The dark color separation wall separates two or more pixel groups and is generally black, but is not limited to black. The dark colored product is preferably an organic material (various dyes such as dyes and pigments). The dark color separation wall is preferably formed by exposing the dark color photosynthesis composition in an oxygen-poor atmosphere and then developing it.
Under an oxygen-poor atmosphere when photocuring such a dark-colored composition means an inert gas, a reduced pressure, or a protective layer that can block oxygen, and these are described in detail below. .

The inert gas refers to a general gas such as N ₂ , H ₂ or CO ₂ or a rare gas such as He, Ne or Ar. Among these, N2 is preferably used because of safety, availability, and cost.

  Under reduced pressure refers to a state of 500 hPa or less, preferably 100 hPa or less.

  Examples of the protective layer capable of blocking oxygen include, for example, polyvinyl ether / maleic anhydride polymers, water-soluble salts of carboxyalkyl cellulose described in JP-A Nos. 46-2121 and 56-40824. Water-soluble cellulose ethers, water-soluble salts of carboxyalkyl starch, polyvinyl alcohol, polyvinylpyrrolidone, various polyacrylamides, various water-soluble polyamides, water-soluble salts of polyacrylic acid, gelatin, ethylene oxide polymers, various starches And a group of water-soluble salts thereof, styrene / maleic acid copolymers, maleate resins, and combinations of two or more thereof. Among these, a combination of polyvinyl alcohol and polyvinyl pyrrolidone is particularly preferable. The polyvinyl alcohol preferably has a saponification rate of 80% or more, and the content of polyvinyl pyrrolidone is preferably 1 to 75% by mass, more preferably 1 to 50% by mass, and still more preferably the alkali-soluble resin layer solid content. It is 10-40 mass%.

    In addition, various films can be used as the layer capable of blocking oxygen. For example, polyesters such as PET, polyamides such as nylon, and ethylene-vinyl acetate copolymers (EVAs) are also preferably used. be able to. These films may be stretched as necessary, and the thickness is suitably 5 to 300 μm, preferably 20 to 150 μm. Further, when the dark color separation wall is produced using a transfer material, the temporary support described below can be suitably used as a layer capable of blocking oxygen.

The oxygen permeability coefficient of the protective layer capable of blocking oxygen produced in this way is preferably 2000 cm ³ / (m ² · day · atm) or less, but 100 cm ³ / (m ² · day · atm) or less. Is more preferably 50 cm ³ / (m ² · day · atm) or less.
When the oxygen permeability is higher than 2000 cm ³ / (m ² · day · atm), oxygen cannot be blocked efficiently, and it may be difficult to make the separation wall into the shape described later.

In the present invention, the cross-sectional shape of the dark color separation wall formed on the substrate has a height from the substrate at the point where the height of the separation wall from the substrate is the highest as shown in FIG. When L _{1 is} a line parallel to the substrate at a position of 0.8 h, L ₂ is a tangent line at a point where L ₁ and the separation wall are in contact, and L ₃ is a line parallel to the substrate at a position of h, L ₂ and L A value obtained by dividing the value d defined by the distance from the intersection of ₃ to the separation wall by h is 0.04 or less.

On the substrate, when the high optical density photosensitive dark composition as described above is photopolymerized under the poor oxygen atmosphere described above, the composition itself absorbs from the surface of the composition toward the substrate. Since the exposure dose is attenuated, the surface is hardened as a result. Furthermore, since it is under an oxygen-poor atmosphere, inhibition of polymerization on the surface of the composition is suppressed, and as a result, the surface is further cured. Due to these two contributions, in the cross-sectional shape of the dark color separation wall formed on the substrate, the height from the substrate at the highest height of the separation wall from the substrate is h, and 0.8 h from the substrate. when the substrate and a line parallel to the position of the L _1, L ₁ and a tangent at Hanarega wall contact points L _2, L ₃ of the substrate and a line parallel to the position of h, the intersection of L ₂ and L ₃ The value obtained by dividing the value d defined by the distance from the to the separation wall by h is 0.04 or less. These values are measured by actually observing the dark color separation wall formed on the substrate vertically by cutting the substrate vertically to expose the cross section and directly observing with a microscope or the like. By passing through the process of fixing the image separation wall shape obtained in this way, once the ink has been ejected into the gap, it becomes difficult to get over the image separation wall, and as a result, bleeding, protrusion, color mixture with adjacent pixels, and white A good color filter can be obtained while preventing omission. The value in d / h is 0.04 or less, preferably 0.038 or less, particularly preferably 0.035 or less. FIG. 2 shows an embodiment of a color filter suitable for forming a separation wall having the shape described above. In these color filters, pixels having no color mixture can be obtained by making the separating wall have the above shape.

4 and 5 show SEM photographs of the dark color separation wall of the present invention. The values calculated from the figure are 1.88 μm for h and 0.037 μm for d, and the value for d / h is 0.02. It should be noted that when calculating the values of h and d from the SEM photograph, it is preferable to calculate from the shape excluding chips and foreign matters.
FIG. 6 is an SEM photograph showing an undesirable shape of the dark color separation wall. As calculated from the figure, h is 0.96 μm, d is 0.19 μm, and d / h is 0.2.

(Photosensitive transfer material)
In order to realize such a separating wall shape easily and at low cost, a photosensitive transfer material having at least a layer made of a photosensitive dark color composition and an oxygen blocking layer in this order on a temporary support is provided. There is a technique to use. When such a material is used, since the layer made of the photosensitive dark color composition is protected by the oxygen blocking layer, it automatically becomes in an oxygen-poor atmosphere. Therefore, there is no need to carry out the exposure process under an inert gas or under reduced pressure, so that there is an advantage that the current process can be used as it is.
Alternatively, a photosensitive transfer material having at least a layer composed of a photosensitive dark color composition on a temporary support may be used, and the temporary support may be used as a “protective layer capable of blocking oxygen”. In this case, it is not necessary to provide the oxygen barrier layer, and the number of steps can be reduced.

  The photosensitive transfer material may have a thermoplastic resin layer as necessary. Such a thermoplastic resin layer is alkali-soluble and includes at least a resin component, and the resin component preferably has a substantial softening point of 80 ° C. or less. By providing such a thermoplastic resin layer, it is possible to exhibit good adhesion to a permanent support in the dark color separation wall forming method described later.

  Examples of alkali-soluble thermoplastic resins having a softening point of 80 ° C. or lower include saponified products of ethylene and acrylate copolymers, saponified products of styrene and (meth) acrylate copolymers, vinyltoluene and (meth) acrylic. Examples thereof include saponification products of acid ester copolymers, saponification products such as poly (meth) acrylic acid esters, and (meth) acrylic acid ester copolymers such as butyl (meth) acrylate and vinyl acetate.

  For the thermoplastic resin layer, at least one of the above-mentioned thermoplastic resins can be appropriately selected and used. Further, “Plastic Performance Handbook” (edited by the Japan Plastics Industry Federation, All Japan Plastics Molding Industry Federation, published by the Industrial Research Council, Of those organic polymers having a softening point of about 80 ° C. or lower, issued on October 25, 1968), those soluble in an alkaline aqueous solution can be used.

  In addition, for an organic polymer substance having a softening point of 80 ° C. or higher, by adding various plasticizers compatible with the polymer substance to the organic polymer substance, the substantial softening point is 80 ° C. or lower. It can also be used by lowering. In addition, these organic polymer substances include various polymers, supercooling substances, adhesion improvers or interfaces within the range where the substantial softening point does not exceed 80 ° C. for the purpose of adjusting the adhesive force with the temporary support. Activators, mold release agents, etc. can also be added.

  Specific examples of preferable plasticizers include polypropylene glycol, polyethylene glycol, dioctyl phthalate, diheptyl phthalate, dibutyl phthalate, tricresyl phosphate, cresyl diphenyl phosphate biphenyl diphenyl phosphate.

The temporary support in the above photosensitive transfer material can be appropriately selected from those that are chemically and thermally stable and composed of a flexible substance. Specifically, a thin sheet such as Teflon (registered trademark), polyethylene terephthalate, polycarbonate, polyethylene, polypropylene, polyester, or a laminate thereof is preferable. As thickness of the said temporary support body, 5-300 micrometers is suitable, Preferably it is 20-150 micrometers. If the thickness is less than 5 μm, the temporary support tends to be easily broken when peeled off, and if the exposure is performed via the temporary support, the resolution tends to be lowered if the thickness exceeds 300 μm.
Among the above specific examples, a biaxially stretched polyethylene terephthalate film is particularly preferable.

(substrate)
As the substrate (permanent support) constituting the color filter, a metallic support, a metal bonded support, glass, ceramic, a synthetic resin film, or the like can be used. Particularly preferred are transparent glass and synthetic resin film having good dimensional stability.

(Formation of dark color separation wall)
Hereinafter, a case where a dark color separation image wall is formed using a photosensitive transfer material will be described. A photosensitive transfer material in which a dark color composition layer, an oxygen barrier layer, and a cover sheet is provided on the oxygen barrier layer is prepared on a temporary support. First, after removing and removing the cover sheet, the exposed surface of the oxygen barrier layer is bonded onto a permanent support (substrate) and heated and pressurized through a laminator or the like to laminate (laminate). As the laminator, those appropriately selected from conventionally known laminators, vacuum laminators and the like can be used, and an auto-cut laminator can also be used in order to further increase the productivity.

Subsequently, it peels between a temporary support body and the photosensitive resin layer, and a temporary support body is removed. Subsequently, in a state where a desired photomask (for example, quartz exposure mask) is vertically set above the removal surface after removal of the temporary support, the distance between the exposure mask surface and the photosensitive resin layer is appropriately set (for example, , 200 μm) and exposure. Next, after the irradiation, development processing is performed using a predetermined processing solution to obtain a patterning image, and subsequently, washing processing is performed as necessary to obtain a dark color separation wall.
When the temporary support is used as a protective layer capable of blocking oxygen, the desired photomask (for example, a quartz exposure mask) is placed above the temporary support while leaving the temporary support (without peeling). In a state in which is vertically set, the distance between the exposure mask surface and the temporary support is appropriately set (for example, 200 μm) and exposed. Next, the temporary support is removed, and after irradiation, development processing is performed using a predetermined processing solution to obtain a patterning image. Subsequently, washing processing is performed as necessary to obtain a dark color separation wall.

The exposure is performed, for example, with a proximity type exposure machine (for example, manufactured by Hitachi High-Tech Electronics Engineering Co., Ltd.) having an ultrahigh pressure mercury lamp, and the exposure amount may be appropriately selected (for example, 300 mJ / cm ² ). it can.
After the irradiation, development processing is performed using a predetermined processing solution. As the developer used in the development process, a dilute aqueous solution of an alkaline substance is used, but it may be further added with a small amount of an organic solvent miscible with water. Examples of the light source used for the light irradiation include medium to ultrahigh pressure mercury lamps, xenon lamps, metal halide lamps, and the like.
Prior to the development, it is preferable to spray pure water with a shower nozzle or the like to uniformly wet the surface of the dark color photosensitive resin layer. As the developer used in the development process, a dilute aqueous solution of an alkaline substance is used, but it may be further added with a small amount of an organic solvent miscible with water.

  Suitable alkaline substances include alkali metal hydroxides (eg, sodium hydroxide, potassium hydroxide), alkali metal carbonates (eg, sodium carbonate, potassium carbonate), alkali metal bicarbonates (eg, sodium bicarbonate). , Potassium bicarbonate), alkali metal silicates (eg, sodium silicate, potassium silicate), alkali metal metasilicates (eg, sodium metasilicate, potassium metasilicate), triethanolamine, diethanolamine, monoethanolamine, Examples include morpholine, tetraalkylammonium hydroxides (for example, tetramethylammonium hydroxide), trisodium phosphate, and the like. The concentration of the alkaline substance is preferably 0.01 to 30% by mass, and the pH is preferably 8 to 14.

  Examples of the “water-miscible organic solvent” include, for example, methanol, ethanol, 2-propanol, 1-propanol, butanol, diacetone alcohol, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol mono n-butyl ether. Benzyl alcohol, acetone, methyl ethyl ketone, cyclohexanone, ε-caprolactone, γ-butyrolactone, dimethylformamide, dimethylacetamide, hexamethylphosphoramide, ethyl lactate, methyl lactate, ε-caprolactam, N-methylpyrrolidone and the like are preferable. . The concentration of the organic solvent miscible with water is preferably 0.1 to 30% by mass. Furthermore, a known surfactant can be added, and the concentration of the surfactant is preferably 0.01 to 10% by mass.

  The developer can be used as a bath solution or a spray solution. When removing the uncured portion of the photosensitive resin layer, methods such as rubbing with a rotating brush or wet sponge in the developer can be combined. The liquid temperature of the developer is usually preferably from about room temperature to 40 ° C. The development time is usually about 10 seconds to 2 minutes, depending on the composition of the photosensitive resin layer, the alkalinity and temperature of the developer, and the type and concentration when an organic solvent is added. If it is too short, the development of the non-exposed area may be insufficient, and the absorbance of ultraviolet rays may be insufficient, and if it is too long, the exposed area may be etched. In either case, it is difficult to make the separation wall shape suitable. It is also possible to put a water washing step after the development processing. In this developing step, the separating wall shape is formed as described above.

(Water repellent treatment)
In the present invention, it is preferable that at least a part of the separation wall is made water-repellent by applying a water-repellent treatment to the dark-colored separation wall (hereinafter, also simply referred to as “separation wall”). This eliminates inconveniences such as when the droplets of the colored liquid composition are subsequently applied between the separation walls by a method such as ink jet, the ink gets over the separation walls and mixes with the adjacent color. Because of that.
As the water repellent treatment, a method of applying a water repellent material on the upper surface of the separation wall, a method of newly providing a water repellent layer, a method of imparting water repellency by plasma treatment, and a method of kneading a water repellent substance on the separation wall And a method of imparting water repellency with a photocatalyst.

Hereinafter, the water repellent treatment will be described in detail.
(1) <Method of kneading a water-repellent substance into the separation wall>
As a means for preventing “color mixing”, there is a method of producing a separation wall using a photoresist obtained from the dark color composition of the present invention containing the fluororesin (A).
The fluorine-containing resin includes a monomer unit based on a monomer having an ethylenic double bond and an Rf group (a), and a single unit based on a monomer having an ethylenic double bond and an acidic group (b). It is a copolymer containing a monomer unit, and it is preferable that an acid value is 1-300 mgKOH / g.
Examples of the ethylenic double bond include a (meth) acryloyl group, a vinyl group, and an allyl group.
As a monomer having an ethylenic double bond and an Rf group (a), CH ₂ = CR ¹ COOQ ² Rf, CH ₂ = CR ¹ OCOQ ¹ Rf, CH ₂ = CR ¹ OQ ¹ Rf, CH ₂ = CR ¹ CH ₂ OQ ¹ Rf, CH ₂ = CR ¹ COOQ ² NR ¹ SO ₂ Rf, CH ₂ = CR ¹ COOQ ² NR ¹ CORf, CH ₂ = CR ¹ COOQ ² NR ¹ COOQ ² Rf, CH ₂ = CR ¹ COOQ ² OQ ¹ Rf, and the like. However, R ¹ represents a hydrogen atom or a methyl group, Q ¹ represents a single bond or a divalent organic group having 1 to 6 carbon atoms, and Q ² represents a divalent organic group having 1 to 6 carbon atoms. Q ¹ and Q ² may have a cyclic structure.

Specific examples of ^{_{Q 1, Q 2, -CH 2}} -, - CH 2 CH 2 -, - CH (CH 3) -, - CH 2 CH 2 CH 2 -, - C (CH 3) 2 -, - _{CH (CH 2 CH 3) -} , - CH 2 CH 2 CH 2 CH 2 -, - CH (CH 2 CH 2 CH 3) -, - CH 2 (CH 2) 3 CH 2 -, - CH (CH 2 CH _{(CH 3) 2) -,} - CH 2 CH (OH) CH 2 -, - CH 2 CH 2 NHCOOCH 2 -, - CH 2 CH (OH) CH 2 OCH 2 - and the like. Q ¹ may be a single bond. Of these, —CH ₂ —, —CH ₂ CH ₂ —, and —CH ₂ CH (OH) CH ₂ — are preferable from the viewpoint of ease of synthesis.

Specific examples of the monomer having an ethylenic double bond and an Rf group (a) include the following.
_{CH 2 = CHCOOCH 2 CF 2 O} (CF 2 CF 2 O) n-1 CF 3 (n is _{3~9), CH 2 = CHCOOCH 2} CF (CF 3) O (CF 2 CF (CF 3) O) n _-1 C ₆ F ₁₃ (n is _{2~6), CH 2 = CHCOOCH 2} CF (CF 3) O (CF 2 CF (CF 3) O) n-1 C 3 F 7 (n is 2-6).
_{CH 2 = C (CH 3)} COOCH 2 CH 2 NHCOOCH 2 CF 2 O (CF 2 CF 2 O) n-1 CF 3 (n is _{3~9), CH 2 = C (} CH 3) COOCH 2 CH 2 NHCOOCH _{2 CF (CF 3) O (} CF 2 CF (CF 3) O) n-1 C 3 F 7 (n is _{2~6), CH 2 = C (} CH 3) COOCH 2 CH 2 NHCOOCH 2 CF (CF 3 _{) O (CF 2 CF (CF} 3) O) n-1 C 6 F 13 (n is 2-6).
_{CH 2 = C (CH 3)} COOCH 2 CH (OH) CH 2 OCH 2 CF 2 O (CF 2 CF 2 O) n-1 CF 3 (n is _{3~9), CH 2 = C (} CH 3) COOCH _{2 CH (OH) CH 2 OCH} 2 CF (CF 3) O (CF 2 CF (CF 3) O) n-1 C 6 F 13 (n is _{2~6), CH 2 = C (} CH 3) COOCH 2 _{CH (OH) CH 2 OCH 2} CF (CF 3) O (CF 2 CF (CF 3) O) n-1 C 3 F 7 (n is 2-6).

  The content of the monomer unit based on the monomer having an ethylenic double bond and Rf group (a) in the fluororesin is preferably 1 to 95%, more preferably 5 to 80%, and more preferably 20 to 20%. 60% is more preferable. Within such a range, the fluororesin exhibits good ink repellency and the developability of the photosensitive composition of the present invention is good.

Examples of the monomer having an acidic group (b) include a monomer having a carboxyl group, a monomer having a phenolic hydroxyl group, a sulfonic acid group, and a monomer having a hydroxyl group.
Examples of the monomer having a carboxyl group include acrylic acid, methacrylic acid, vinyl acetic acid, crotonic acid, itaconic acid, maleic acid, fumaric acid, cinnamic acid, and salts thereof. These may be used alone or in combination of two or more.

  Examples of the monomer having a phenolic hydroxyl group include o-hydroxystyrene, m-hydroxystyrene, and p-hydroxystyrene. In addition, one or more hydrogen atoms of these benzene rings are an alkyl group such as a methyl group, an ethyl group or an n-butyl group, an alkoxy group such as a methoxy group, an ethoxy group or an n-butoxy group, a halogen atom or an alkyl group. Examples thereof include compounds in which one or more hydrogen atoms are substituted with a halogen atom, a haloalkyl group, a nitro group, a cyano group, or an amide group. These may be used alone or in combination of two or more.

  Examples of the monomer having a sulfonic acid group include vinyl sulfonic acid, styrene sulfonic acid, (meth) allyl sulfonic acid, 2-hydroxy-3- (meth) allyloxypropane sulfonic acid, and (meth) acrylic acid-2-sulfoethyl. , (Meth) acrylic acid-2-sulfopropyl, 2-hydroxy-3- (meth) acryloxypropanesulfonic acid, 2- (meth) acrylamido-2-methylpropanesulfonic acid, or salts thereof. These may be used alone or in combination of two or more.

  Specific examples of the monomer having a hydroxyl group include vinylphenol, 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, 3-hydroxypropyl (meth) acrylate, and 4-hydroxybutyl (meth) acrylate. 5-hydroxypentyl (meth) acrylate, 6-hydroxyhexyl (meth) acrylate, 4-hydroxycyclohexyl (meth) acrylate, neopentyl glycol mono (meth) acrylate, 3-chloro-2-hydroxypropyl (meth) acrylate, Glycerin mono (meth) acrylate, 2-hydroxyethyl vinyl ether, 4-hydroxybutyl vinyl ether, cyclohexanediol monovinyl ether, 2-hydroxyethyl allyl ether, N-hydro Shimechiru (meth) acrylamide, N, N-bis (hydroxymethyl), and the like.

Furthermore, the monomer having a hydroxyl group may be a monomer having a polyoxyalkylene chain whose terminal is a hydroxyl group. For example, CH ₂ = CHOCH ₂ C ₆ H ₁₀ CH ₂ O (C ₂ H ₄ O) _g H (where g is an integer of 1 to 100, the same shall apply hereinafter), CH ₂ = CHOC ₄ H ₈ O (C _{2 H 4 O) g H,} CH 2 = CHCOOC 2 H 4 O (C 2 H 4 O) g H, CH 2 = C (CH 3) COOC 2 H 4 O (C 2 H 4 O) g H, CH ₂ = CHCOOC ₂ H ₄ O (C ₂ H ₄ O) _h (C ₃ H ₆ O) _k H (where h is 0 or an integer from 1 to 100, k is an integer from 1 to 100, h + k is from 1 to 100. hereinafter the _{same.), CH 2 = C (} CH 3) COOC 2 H 4 O (C 2 H 4 O) h (C 3 H 6 O) k H and the like. These may be used alone or in combination of two or more.

  The content of the monomer unit based on the monomer having an acidic group (b) in the fluororesin is preferably 0.1 to 40%, more preferably 0.5 to 30%, and 1 to 20%. Further preferred. Within such a range, the fluorine-containing resin exhibits good ink repellency and the developability of the photosensitive composition becomes good.

Monomer based on monomer unit based on monomer having fluorine-containing resin having ethylenic double bond and Rf group (a), and monomer having ethylenic double bond and acidic group (b) In the case of a copolymer having a body unit, it has a monomer unit based on a monomer having no Rf group (a) and acidic group (b) (hereinafter referred to as “other monomer”). You may do it.
Other monomers include hydrocarbon olefins, vinyl ethers, isopropenyl ethers, allyl ethers, vinyl esters, allyl esters, (meth) acrylic esters, (meth) acrylamides, aromatic Examples include vinyl compounds, chloroolefins, fluoroolefins, and conjugated dienes. These compounds may contain a functional group, and examples thereof include a hydroxyl group, a carbonyl group, an alkoxy group, and an amide group. Moreover, you may have group which has a polysiloxane structure. However, monomer units based on these other monomers do not have an Rf group (a) and an acidic group (b). These may be used alone or in combination of two or more. In particular, (meth) acrylic acid esters and (meth) acrylamides are preferable because they are excellent in heat resistance of a coating film formed from the photosensitive resin composition of the present invention.

In the fluororesin, the proportion of monomer units based on other monomers is preferably 80% or less, and more preferably 70% or less. Within this range, the developability of the photosensitive composition of the present invention will be good.
The fluororesin in the present invention is a monomer unit based on a monomer having the above ethylenic double bond and Rf group (a), and a single unit having an ethylenic double bond and an acidic group (b). In addition to being obtained by synthesizing a copolymer containing monomer units based on a monomer, a compound having an Rf group (a) and / or a compound having an acidic group (b) in a polymer having a reactive site It can also be obtained by various modification methods to be reacted.

As various modification methods for reacting a compound having an Rf group (a) with a polymer having a reactive site, for example, a monomer having an epoxy group is copolymerized in advance, and then an Rf group (a) and a carboxyl group are later included. Examples thereof include a method of reacting a compound and a method of previously copolymerizing an epoxy group-containing monomer and then reacting a compound having an Rf group (a) and a hydroxyl group.
Specific examples of the monomer having an epoxy group include glycidyl (meth) acrylate and 3,4-epoxycyclohexylmethyl acrylate.

Examples of the compound having an Rf group (a) and a carboxyl group include compounds represented by the following formula 3.
_{HOOC-C p-1 F 2} (p-1) -O- (C p F 2p -O) n-1 -C q F 2q + 1 ··· Equation 3
In Formula 3, p is an integer of 2 or 3, q is an integer of 1 to 20, and n is an integer of 2 to 50.

Examples of the compound having an Rf group (a) and a hydroxyl group include compounds represented by the following formula 4.
_{HOCH 2 -C p-1 F 2} (p-1) -O- (C p F 2p -O) n-1 -C q F 2q + 1 ··· Equation 4
In Formula 4, p represents an integer of 2 or 3, q represents an integer of 1 to 20, and n represents an integer of 2 to 50.

  Examples of various modification methods for reacting a polymer having a reactive site with a compound having an acidic group (b) include a method in which a monomer having a hydroxyl group is copolymerized in advance and then an acid anhydride is reacted. Moreover, the method of making the acid anhydride which has an ethylenic double bond copolymerize previously, and making the compound which has a hydroxyl group react later is mentioned.

  Specific examples of the monomer having a hydroxyl group include vinylphenol, 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, 3-hydroxypropyl (meth) acrylate, and 4-hydroxybutyl (meth) acrylate. 5-hydroxypentyl (meth) acrylate, 6-hydroxyhexyl (meth) acrylate, 4-hydroxycyclohexyl (meth) acrylate, neopentyl glycol mono (meth) acrylate, 3-chloro-2-hydroxypropyl (meth) acrylate, Glycerin mono (meth) acrylate, 2-hydroxyethyl vinyl ether, 4-hydroxybutyl vinyl ether, cyclohexanediol monovinyl ether, 2-hydroxyethyl allyl ether, N-hydro Shimechiru (meth) acrylamide, N, N-bis (hydroxymethyl), and the like.

Furthermore, the monomer having a hydroxyl group may be a monomer having a polyoxyalkylene chain whose terminal is a hydroxyl group. For example, CH ₂ = CHOCH ₂ C ₆ H ₁₀ CH ₂ O (C ₂ H ₄ O) _g H (where g is an integer of 1 to 100, the same shall apply hereinafter), CH ₂ = CHOC ₄ H ₈ O (C _{2 H 4 O) g H,} CH 2 = CHCOOC 2 H 4 O (C 2 H 4 O) g H, CH 2 = C (CH 3) COOC 2 H 4 O (C 2 H 4 O) g H, CH ₂ = CHCOOC ₂ H ₄ O (C ₂ H ₄ O) _h (C ₃ H ₆ O) _k H (where h is 0 or an integer from 1 to 100, k is an integer from 1 to 100, h + k is from 1 to 100. hereinafter the _{same.), CH 2 = C (} CH 3) COOC 2 H 4 O (C 2 H 4 O) h (C 3 H 6 O) k H and the like. These may be used alone or in combination of two or more.

Specific examples of the acid anhydride include phthalic anhydride, 3-methylphthalic anhydride, trimellitic anhydride, and the like.
Specific examples of the acid anhydride having an ethylenic double bond include maleic anhydride, itaconic anhydride, citraconic anhydride, methyl-5-norbornene-2,3-dicarboxylic anhydride, 3,4,5,6 anhydride -Tetrahydrophthalic acid, cis-1,2,3,6-tetrahydrophthalic anhydride, 2-buten-1-yl succinic anhydride, etc. are mentioned.

  The compound having a hydroxyl group may be a compound having one or more hydroxyl groups. Specific examples of the monomer having a hydroxyl group shown above, ethanol, 1-propanol, 2-propanol, 1- Alcohols such as butanol and ethylene glycol; cellsolves such as 2-methoxyethanol, 2-ethoxyethanol and 2-butoxyethanol; 2- (2-methoxyethoxy) ethanol; 2- (2-ethoxyethoxy) ethanol; And carbitols such as (2-butoxyethoxy) ethanol. A compound having one hydroxyl group in the molecule is preferred. These may be used alone or in combination of two or more.

The polymer having the reactive site, which is a fluorine-containing resin or a precursor of the fluorine-containing resin, is reacted by dissolving the monomer in a solvent together with a chain transfer agent as necessary and heating, and adding a polymerization initiator. It can be synthesized by the method.
The acid value of the fluororesin is preferably 1 to 300 mgKOH / g, more preferably 5 to 200 mgKOH / g, and particularly preferably 10 to 150 mgKOH / g. Within this range, the developability of the photosensitive composition of the present invention will be good. In addition, an acid value is the mass (unit mg) of potassium hydroxide required in order to neutralize 1 g of resin, and a unit is described in this specification as mgKOH / g.

The number average molecular weight of the fluororesin is preferably 500 or more and less than 20000, and more preferably 2000 or more and less than 15000. Within this range, the developability of the photosensitive composition of the present invention is good. The number average molecular weight is measured using polystyrene as a standard substance by gel permeation chromatography.
The blending amount of the fluororesin (A) is preferably from 0.01 to 50%, more preferably from 0.1 to 30%, particularly preferably from 0.2 to 10%, based on the solid content in the photosensitive composition. . Within such a range, the photosensitive composition exhibits good ink repellency and ink tumbling properties and good developability.

(2) <Method of providing a water repellent layer>
As a means for preventing “color mixing”, there is a method of producing a partition wall having ink repellency at a position matching the separation wall on the substrate on which the separation wall is formed.
It is preferable to use a silicone rubber layer as the partition wall having ink repellency. The silicone rubber layer coated on the surface layer must have a repulsive effect on the solution and ink used for coloring, and is not limited to this, but the molecular weight having the following repeating units: It is mainly composed of thousands to hundreds of thousands of linear organic polysiloxane.

  Here, n is an integer of 2 or more, and R is an independent alkyl group having 1 to 10 carbon atoms, an alkenyl group, or a phenyl group. Silicone rubber can be obtained by sparsely cross-linking such a linear organic polysiloxane. The cross-linking agent is acetoxysilane, ketoxime silane, alkoxysilane, aminosilane, amidosilane, alkenoxysilane, etc. used for so-called room temperature (low temperature) curable silicone rubber, and usually ends as a linear organic polysiloxane. In combination with a hydroxyl group, a deacetic acid type, a deoxime type, a dealcohol type, a deamine type, a deamide type, and a deketone type silicone rubber are obtained. A small amount of an organic tin compound is added to the silicone rubber as a catalyst. In order to bond the photosensitive resin layer and the silicone rubber layer, various types of adhesive layers may be used between the layers, and aminosilane compounds and organic titanate compounds are particularly preferable. Instead of providing an adhesive layer between the photosensitive resin layer and the silicone rubber layer, an adhesive component may be added to the silicone rubber layer. As this additional adhesive component, an aminosilane compound or an organic titanate compound can be used.

    The exposure for producing the partition wall is performed from the back side of the substrate using the separation wall as a mask, and further, the irradiation UV light is scattered to expand the incident light from the size of the transmission part and to act on the photosensitive resin. The portion of the resin that is solubilized by reaction is made larger on the silicone rubber surface layer side. After exposure in this way, a partition wall having a silicone rubber surface layer can be produced by developing with an n-heptane / ethanol mixture.

(3) <Method of imparting water repellency by plasma treatment>
As a means for preventing “color mixing”, there is a method of performing water repellency treatment by plasma on a substrate on which a separation wall is formed.
As the gas containing at least fluorine atoms introduced in this step, one or more halogen gases selected from CF ₄ , CHF ₃ , C ₂ F ₆ , SF ₆ , C ₃ F ₈ , and C ₅ F ₈ are used. It is preferable. In particular, C ₅ F ₈ (octafluorocyclopentene) has an ozone depletion ability of 0, and at the same time, has an atmospheric life (CF ₄ : 50,000 years, C ₄ F ₈ : 3200 years) as compared with conventional gases. It is very short with 98 years. Therefore, the global warming potential is 90 (100-year integrated value assuming CO ₂ = 2), which is very small (CF ₄ : 6500, C ₄ F ₈ : 8700) compared to conventional gases, and the ozone layer and the global environment It is extremely effective for protection and is desirable for use in the present invention.

Further, as the introduced gas, a gas such as oxygen, argon, or helium may be used in combination as necessary. In this step, when a mixed gas of at least one halogen gas selected from CF ₄ , CHF ₃ , C ₂ F ₆ , SF ₆ , C ₃ F ₈ , and C ₅ F ₈ and O ₂ is used, It becomes possible to control the degree of ink repellency on the surface of the image separation wall processed in this step. However, in the mixed gas, the oxidation reaction mixture ratio by O ₂ exceeds 30% of O ₂ is dominant, because the ink repellency enhancing effect is prevented, also, O ₂ mixing ratio is more than 30% When the mixed gas is used, it is necessary to use the mixture ratio of O ₂ within 30% or less.
In addition, plasma generation methods such as low frequency discharge, high frequency discharge, and microwave discharge can be used. Conditions such as pressure, gas flow rate, discharge frequency, and processing time during plasma processing are arbitrarily set. can do.

(4) <Method of applying a water repellent material to the upper surface of the separation wall>
As a means for preventing “color mixing”, there is a method in which a water repellent material is applied to the entire surface of a substrate on which a separation wall is formed.
Water repellent materials such as fluoropolymers such as polytetrafluoroethylene, silicone rubber, perfluoroalkyl acrylate, hydrocarbon acrylate, methyl siloxane, etc. are generally considered to be water repellent materials and have a contact angle of 60 ° or more to the colorant. If it is a thing, it will not specifically limit.
As a method for applying the water repellent material, it is possible to select the most suitable method for each material such as slit coat, spin coat, dip coat, roll coat, etc., as long as it does not affect the substrate, separation wall, etc. is there.

Next, UVO ₃ treatment is performed from the back side of the substrate through the separation wall, and the water-repellent film other than the separation wall is selectively removed or hydrophilized (the contact angle with respect to the colorant is 30 ° before and after the treatment). (There is an opening above).
If the water repellent material can be removed or hydrophilized, the patterning method can be selected according to the material, such as laser ablation, plasma ashing, dry treatment such as corona discharge treatment, and wet treatment using alkali. Is possible. In addition, if it is possible to form a pattern of a water repellent material on the separation wall, a lift-off method or the like is also effective.

(5) <Method of imparting water repellency with a photocatalyst>
As a means for preventing “color mixing”, there is a method of imparting water repellency to a substrate on which a separation wall is formed by a photocatalyst.
First, for forming a separation image wall, comprising a photocatalyst containing layer side substrate having a substrate and a photocatalyst containing layer formed on the substrate, and a transparent base material and a wettability changing layer formed on the transparent base material. Prepare a substrate. Next, the photocatalyst-containing layer and the wettability changing layer are arranged so as to form a predetermined gap, and a pattern is formed by irradiating energy from a predetermined direction to a pattern forming a separation wall using, for example, a photomask or the like. Perform the process. As a result, a pattern is formed which includes a hydrophilic region in which the wettability on the wettability changing layer of the portion irradiated with energy is changed and a water-repellent region of a portion not irradiated with energy.

  Next, a fountain solution application step of applying fountain solution onto the hydrophilic region is performed. Since the portion other than the hydrophilic region is a water-repellent region, the fountain solution is not attached, and the fountain solution can be applied only to the hydrophilic region. Next, a step of forming a separation wall in the water repellent region is performed. At this time, portions other than the water-repellent region that forms the separation wall are protected by the fountain solution. This makes it possible to easily form a separation wall only in the aqueous region with high definition.

Next, a dampening water drying process for drying the dampening water is performed. Thereafter, a pixel portion forming coating solution or the like for forming the pixel portion is applied between the image separation walls by, for example, an ink jet apparatus to form the pixel portion to be a color filter.
By using the above-described method, it is possible to form a colored layer such as a separation wall or a pixel portion with high definition. Each of the above steps will be described separately.

1. Pattern Formation Step First, the pattern formation step in the present invention will be described. The pattern forming step in the present invention is for water-repellent and ink-philic properties, and for forming a separating image wall having a wettability changing layer that changes so that the contact angle with water is lowered by the action of a photocatalyst accompanying energy irradiation. And a photocatalyst containing layer containing a photocatalyst and a photocatalyst containing layer side substrate having a substrate are arranged with a gap so that the wettability changing layer and the photocatalyst containing layer are 200 μm or less, and then energy is applied. Irradiation to form a pattern comprising a hydrophilic region and a water-repellent region on the separation wall forming substrate.

  In this step, by forming a water repellent region and a hydrophilic region whose wettability has been changed by the action of the photocatalyst associated with energy irradiation on the separation image wall forming substrate, It is possible to protect the hydrophilic region that does not form the film with dampening water, thereby forming a high-definition colored portion. Hereinafter, each structure of a pattern formation process is demonstrated.

(Substrate for separating image wall)
First, the separation wall forming substrate used in the present invention will be described. The substrate for forming a separating wall used in the present invention is water-repellent and ink-philic, and further has a wettability changing layer that changes so that the contact angle with water is lowered by the action of a photocatalyst accompanying energy irradiation. If it has, it will not specifically limit, The said wettability change layer may be formed on the transparent base material. Hereinafter, each structure of the board | substrate for separating image wall formation of this invention is demonstrated.

(1) Wettability changing layer First, the wettability changing layer used in the substrate for forming a separation image wall of the present invention will be described. The wettability changing layer used in the present invention is a layer that is water-repellent and ink-philic, and further changes so that the contact angle with water decreases due to the action of a photocatalyst accompanying energy irradiation. In the present invention, by having the wettability changing layer, in the pattern formation described later, it is possible to make a portion irradiated with energy a hydrophilic region and a portion not irradiated with energy a water repellent region. Become. At this time, the region where the colored portion is formed is a water-repellent region, and the region where the colored portion is not formed is a hydrophilic region, so that the hydrophilic region where the colored portion is not formed is protected with dampening water, and the parent of the water-repellent region. Taking advantage of the ink properties, it is possible to form colored portions only in the water-repellent region using, for example, oil-based ink as a colored portion forming coating liquid.

In the present invention, the critical surface tension before energy irradiation of the wettability changing layer is in the range of 20 mN / m or more and less than 50 mN / m, and particularly in the range of 35 mN / m or more and less than 50 mN / m. preferable.
When the critical surface tension is within the above range, the wettability changing layer before energy irradiation can be made a water-repellent region having water repellency and ink affinity. Here, by setting the wettability changing layer before the energy irradiation to be ink-philic, it becomes possible to uniformly apply a colored portion forming coating liquid or the like for forming the colored portion.

  In addition, the contact angle between the wettability changing layer and the 70 mN / m liquid before energy irradiation is preferably in the range of 50 ° to less than 120 °, and more preferably in the range of 70 ° to less than 120 °. When the contact angle with the liquid is lower than the above range, for example, in the dampening water application process described later, dampening water may adhere to the water-repellent region. This is because it becomes difficult to form the colored portion with high definition.

In addition, the critical surface tension of the wettability changing layer whose wettability has been changed by the action of the photocatalyst upon energy irradiation may be in the range of 50 mN / m or more and less than 75 mN / m, particularly 60 mN / m or more and less than 75 mN / m. preferable. This is because when the critical surface tension is within the above range, the wettability changing layer whose wettability has been changed by the action of the photocatalyst can be made hydrophilic.
Further, the contact angle between the wettability changing layer having changed wettability and the liquid of 70 mN / m is preferably in the range of 0 ° to less than 50 °, and more preferably in the range of 0 ° to less than 40 °.
When the contact angle with the liquid is higher than the above range, the hydrophilicity is not sufficient, for example, when dampening water is applied, there is a possibility of repelling, and a region other than forming the colored portion This is because the fountain solution makes it difficult to protect and it is difficult to form a high-definition colored portion.

In addition, the contact angle with the liquid here is measured using a contact angle measuring instrument (Kyowa Interface Science Co., Ltd. CA-Z type) with a liquid having various surface tensions (from the microsyringe to the liquid. 30 seconds after dropping), and the result was obtained or the result was graphed. In this measurement, as a liquid having various surface tensions, a wetting index standard solution manufactured by Pure Chemical Co., Ltd. was used.
Here, the wettability changing layer in the present invention contains fluorine in the wettability changing layer, and when the fluorine content on the surface of the wettability changing layer is irradiated with energy to the wettability changing layer, The wettability changing layer may be formed so as to be lower than that before energy irradiation due to the action of the photocatalyst.

In the wettability changing layer having such characteristics, a pattern composed of a portion having a small fluorine content can be easily formed by pattern irradiation with energy. Here, fluorine has an extremely low surface energy. Therefore, the surface of a substance containing a large amount of fluorine has a smaller critical surface tension. Therefore, the critical surface tension of the portion having a small fluorine content is larger than the critical surface tension of the surface of the portion having a large fluorine content. This means that the portion with a low fluorine content is a hydrophilic region compared to the portion with a high fluorine content. Therefore, forming a pattern composed of a portion having a smaller fluorine content than the surrounding surface forms a hydrophilic region pattern in the water repellent region.
Therefore, when such a wettability changing layer is used, the pattern of the hydrophilic region can be easily formed in the water repellent region by irradiating the pattern with energy. When applying the coating liquid for forming, etc., the hydrophilic region that does not form the colored portion is protected with dampening water, and the colored portion is formed with high definition only in the water-repellent and water-repellent water-repellent region. It becomes possible.

  As described above, the fluorine content contained in the wettability changing layer containing fluorine is not irradiated with energy in the hydrophilic region with low fluorine content formed by energy irradiation. When the fluorine content in the water-repellent region is 100, it is preferably 10 or less, preferably 5 or less, particularly preferably 1 or less.

  By setting it within such a range, it is possible to make a great difference in wettability between the hydrophilic region irradiated with energy and the water repellent region not irradiated with energy. Therefore, it becomes possible to easily apply dampening water only to the hydrophilic region, and to apply the colored portion forming composition only to the water repellent region, so that the colored portion can be formed with high definition. It becomes. This rate of decrease is based on weight.

  For the measurement of the fluorine content in such a wettability changing layer, various commonly used methods can be used. For example, X-ray photoelectron spectroscopy (ES-CA) (Electron Spectroscopy) It is also referred to as “Spectroscopic for Chemical Analysis”), and is not particularly limited as long as it is a method capable of quantitatively measuring the amount of fluorine on the surface, such as X-ray fluorescence analysis and mass spectrometry.

  As a material used for such a wettability changing layer, the wettability of the above-described wettability changing layer, that is, a material whose wettability is changed by the photocatalyst in the photocatalyst containing layer opposed by energy irradiation, and by the action of the photocatalyst. The main chain is not particularly limited as long as it has a main chain that is difficult to degrade and decompose, and specific examples include organopolysiloxane. In the present invention, the organopolysiloxane is preferably an organopolysiloxane containing a fluoroalkyl group.

  Examples of such an organopolysiloxane include (1) an organopolysiloxane that exerts great strength by hydrolyzing and polycondensing chloro or alkoxysilane by sol-gel reaction or the like, and (2) water repellency and oil repellency. Mention may be made of organopolysiloxanes such as organopolysiloxanes crosslinked with excellent reactive silicones.

In the case of (1) above, the general formula: Y _n SiX _(4-n)
(Here, Y represents an alkyl group, a fluoroalkyl group, a vinyl group, an amino group, a phenyl group or an epoxy group, X represents an alkoxyl group, an acetyl group or a halogen. N is an integer from 0 to 3. It is preferable that it is an organopolysiloxane which is one or two or more hydrolysis condensates or cohydrolysis condensates of the silicon compound represented by Here, the number of carbon atoms of the group represented by Y is preferably in the range of 1 to 20, and the alkoxy group represented by X is a methoxy group, an ethoxy group, a propoxy group, or a butoxy group. preferable.

  In particular, an organopolysiloxane containing a fluoroalkyl group can be preferably used, and specific examples thereof include one or two or more hydrolytic condensates and cohydrolytic condensates of the following fluoroalkylsilanes. In general, those known as fluorine-based silane coupling agents can be used.

_{CF 3 (CF 2) 3 CH} 2 CH 2 Si (OCH 3) 3, CF 3 (CF 2) 5 CH 2 CH 2 Si (OCH 3) 3, CF 3 (CF 2) 7 CH 2 CH 2 Si (OCH ₃ ) ₃ , CF ₃ (CF ₂ ) ₉ CH ₂ CH ₂ Si (OCH ₃ ) ₃ , (CF ₃ ) ₂ CF (CF ₂ ) ₄ CH ₂ CH ₂ Si (OCH ₃ ) ₃ , (CF ₃ ) ₂ CF _{(CF 2) 6 CH 2 CH} 2 Si (OCH 3) 3, (CF 3) 2 CF (CF 2) 8 CH 2 CH 2 Si (OCH 3) 3, CF 3 (C 6 H 4) C 2 H 4 Si (OCH ₃ ) ₃ , CF ₃ (CF ₂ ) ₃ (C ₆ H ₄ ) C ₂ H ₄ Si (OCH ₃ ) ₃ , CF ₃ (CF ₂ ) ₅ (C ₆ H ₄ ) C ₂ H ₄ Si ( OCH ₃ ) ₃ , CF ₃ (CF ₂ ) _{7 (C 6 H 4) C 2} H 4 Si (OCH 3) 3, CF 3 (CF 2) 3 CH 2 CH 2 SiCH 3 (OCH 3) 2, CF 3 (CF 2) 5 CH 2 CH 2 SiCH 3 ( OCH ₃ ) ₂ , CF ₃ (CF ₂ ) ₇ CH ₂ CH ₂ SiCH ₃ (OCH ₃ ) ₂ , CF ₃ (CF ₂ ) ₉ CH ₂ CH ₂ SiCH ₃ (OCH ₃ ) ₂ , (CF ₃ ) ₂ CF ( _{CF 2) 4 CH 2 CH 2} SiCH 3 (OCH 3) 2, (CF 3) 2 CF (CF 2) 6 CH 2 CH 2 Si CH 3 (OCH 3) 2, (CF 3) 2 CF (CF 2) _{8 CH 2 CH 2 Si CH 3} (OCH 3) 2, CF 3 (C 6 H 4) C 2 H 4 SiCH 3 (OCH 3) 2, CF 3 (CF 2) 3 (C 6 H 4) C 2 H ₄ SiC _{3 (OCH 3) 2, CF} 3 (CF 2) 5 (C 6 H 4) C 2 H 4 SiCH 3 (OCH 3) 2, CF 3 (CF 2) 7 (C 6 H 4) C 2 H 4 SiCH ₃ (OCH ₃ ) ₂ , CF ₃ (CF ₂ ) ₃ CH ₂ CH ₂ Si (OCH ₂ CH ₃ ) ₃ , CF ₃ (CF ₂ ) ₅ CH ₂ CH ₂ Si (OCH ₂ CH ₃ ) ₃ , CF ₃ ( _{CF 2) 7 CH 2 CH 2} Si (OCH 2 CH 3) 3, CF 3 (CF 2) 9 CH 2 CH 2 Si (OCH 2 CH 3) 3; _{and, CF 3 (CF 2) 7} SO 2 N ( _{C 2 H 5) C 2 H} 4 CH 2 Si (OCH 3) 3.

By using a polysiloxane containing a fluoroalkyl group as described above as a binder, the water repellency of the non-irradiated part of the wettability changing layer is greatly improved. It becomes possible to prevent adhesion. In addition, since the substance is ink-philic, it is possible to apply oil-based ink or the like as a colored portion forming coating liquid for forming a colored portion. Moreover, it becomes possible to attach dampening water to the hydrophilic area | region which is an energy irradiation part.
Examples of the reactive silicone (2) include compounds having a skeleton represented by the following general formula.

However, n is an integer of 2 or more, R ^1, R ² are each independently substituted or unsubstituted alkyl having 1 to 10 carbon atoms, alkenyl, aryl or cyanoalkyl group, overall 40% at a molar ratio The following are vinyl, phenyl, and halogenated phenyl. Further, those in which R ¹ and R ² are methyl groups are preferable because the surface energy becomes the smallest, and the methyl groups are preferably 60% or more by molar ratio. In addition, the chain end or side chain has at least one reactive group such as a hydroxyl group in the molecular chain.
Moreover, you may mix the stable organosilicone compound which does not carry out a crosslinking reaction like dimethylpolysiloxane with said organopolysiloxane.

  In the present invention, various materials such as organopolysiloxane can be used in the wettability changing layer as described above. However, as described above, it is possible to include fluorine in the wettability changing layer. It is effective for pattern formation. Therefore, it can be said that it is preferable that fluorine be contained in a material that is not easily deteriorated or decomposed by the action of the photocatalyst, specifically, that the organopolysiloxane material contains fluorine to form a wettability changing layer.

  The wettability changing layer in the present invention may further contain a surfactant. Specifically, hydrocarbons such as NIKKOL BL, BC, BO, BB series manufactured by Nikko Chemicals Co., Ltd., ZONYL FSN, FSO manufactured by DuPont, Surflon S-141, 145 manufactured by Asahi Glass Co., Ltd., Dainippon Megafac F-141, 144 manufactured by Ink Chemical Industry Co., Ltd., Footgent F-200, F251 manufactured by Neos Co., Ltd., Unidyne DS-401, 402 manufactured by Daikin Industries, Ltd., Fluorard FC-170 manufactured by 3M Co., Ltd. Fluorine-based or silicone-based nonionic surfactants such as 176, and cationic surfactants, anionic surfactants, and amphoteric surfactants can also be used.

  In addition to the above surfactants, the wettability changing layer includes polyvinyl alcohol, unsaturated polyester, acrylic resin, polyethylene, diallyl phthalate, ethylene propylene diene monomer, epoxy resin, phenol resin, polyurethane, melamine resin, polycarbonate. , Polyvinyl chloride, Polyamide, Polyimide, Styrene butadiene rubber, Chloroprene rubber, Polypropylene, Polybutylene, Polystyrene, Polyvinyl acetate, Polyester, Polybutadiene, Polybenzimidazole, Polyacrylonitrile, Epichlorohydrin, Polysulfide, Polyisoprene, etc. Can be contained.

Such a wettability changing layer is formed by preparing a coating liquid by dispersing the above-described components in a solvent together with other additives as necessary, and coating the coating liquid on a transparent substrate. Can do. As the solvent to be used, alcohol-based organic solvents such as ethanol and isopropanol are preferable. The application can be performed by a known application method such as spin coating, spray coating, dip coating, roll coating, or bead coating. In the case where an ultraviolet curable component is contained, the wettability changing layer can be formed by performing a curing treatment by irradiating ultraviolet rays.
Further, the wettability changing layer used in the present invention may be a self-supporting material as long as it is formed of a material whose surface wettability can be changed by the action of a photocatalyst. The material which does not have property may be sufficient. In addition, having self-supporting property as used in the field of this invention means that it can exist in a tangible state without another support material.

  When the wettability changing layer is a material having a self-supporting property, for example, a commercially available resin film made of a material that can become the wettability changing layer can be used, which can be said to be advantageous in terms of cost. As such a material, if the above-mentioned material formed into a film has a self-supporting property, it can be used. For example, polyethylene, polycarbonate, polypropylene, polystyrene, polyester, polyvinyl fluoride Acetal resin, nylon, ABS, PTFE, methacrylic resin, phenol resin, polyvinylidene fluoride, polyoxymethylene, polyvinyl alcohol, polyvinyl chloride, polyethylene terephthalate, silicone and the like.

The wettability changing layer in the present invention is preferably a wettability changing layer having no self-supporting property. This is because the above-described wettability changing layer formed of a material that greatly changes the wettability usually has few self-supporting materials.
By using the wettability changing layer of the above-described component in the present invention, the action of the photocatalyst in the photocatalyst containing layer is used to oxidize, decompose, etc. the organic group that is a part of the above component, and It is possible to change the wettability to make it hydrophilic and to make a great difference in wettability with the non-energy-irradiated part. Therefore, it is possible to easily apply the fountain solution only to the hydrophilic region, and it is possible to easily form the colored portion only in the water-repellent region, so that a high-definition colored portion is formed. In addition, the color filter can be manufactured by an easy process.

In addition, the wettability changing layer used in the present invention is not particularly limited as long as the wettability changing layer is changed by the action of the photocatalyst as described above. preferable. For example, in the case where a photocatalyst is contained in the wettability changing layer, when the work is performed in a bright place in a dampening water application step or a colored portion forming step described later, the sensitivity is increased by dampening water. Due to the action of the photocatalyst, the wettability of the wettability changing layer changes, and it may be difficult to form a colored portion with high definition. In the present invention, if the photocatalyst is not included in the wettability changing layer, there is no need to worry about the above-mentioned problems. Therefore, it is possible to manufacture a color filter with a simple device, and then the color filter. This is because there is no need to worry about being affected by the passage of time, and it can be used without problems for a long time.
Among the water repellent treatment methods (1) to (5), the water repellent treatment method using plasma is particularly preferable from the viewpoint of “simpleness of the process”.

(Formation of each pixel)
Next, the colored liquid composition for forming the RGB pixels is made to enter the gaps in the separation wall formed in the developing step. As a method for causing the colored liquid composition to enter the separation wall gap, a known method such as an ink jet method or a stripe Geyser coating method can be used, and the ink jet method is preferable in terms of cost. In addition, before forming each pixel in this way, the shape of the dark color separation wall may be fixed, and the means is not particularly limited, but includes the following. That is, 1) re-exposure after development (sometimes referred to as post-exposure), and 2) heat treatment at a relatively low temperature after development. The heat treatment here refers to heating a substrate having a dark color separation wall in an electric furnace, a dryer or the like, or irradiating an infrared lamp.

Here, the exposure amount when performing the above 1) is 500 to 3000 mJ / cm ² , preferably 1000 to 2000 mJ / cm ² in the atmosphere, and lower exposure in the poor oxygen atmosphere. It is also possible to expose in quantity. Similarly, the heating temperature in the case of 2) is 50 to 120 ° C., preferably about 70 to 100 ° C., and the heating time is about 10 to 40 minutes. When the temperature is lower than 50 ° C., there is a concern that the hardening of the dark color separation wall will not proceed, and when it is higher than 120 ° C., there is a concern that the shape of the dark color separation wall will collapse.

  Regarding the ink jet method used for forming each pixel, a known method such as a method of thermally curing ink, a method of photocuring, or a method of performing droplet ejection after forming a transparent image receiving layer on a substrate in advance is used. be able to.

  Preferably, after each pixel is formed, a heating step of performing a heat treatment (so-called baking treatment) is provided. That is, a substrate having a layer photopolymerized by light irradiation is heated in an electric furnace, a dryer or the like, or an infrared lamp is irradiated. The temperature and time of heating depend on the composition of the photosensitive dark color composition and the thickness of the formed layer, but generally from about 120 ° C. to the point of obtaining sufficient solvent resistance, alkali resistance, and ultraviolet absorbance. Heating at about 250 ° C. for about 10 minutes to about 120 minutes is preferred.

  The pattern shape of the color filter thus formed is not particularly limited, and may be a general black matrix stripe shape, a lattice shape, or a delta arrangement. (See FIG. 2).

(Inkjet method)
The ink jet system used in the present invention includes a method in which charged ink is continuously ejected and controlled by an electric field, a method in which ink is ejected intermittently using a piezoelectric element, and an ink is intermittently heated by using its foam. Various methods such as a method of injecting the ink can be employed.
The ink used may be oily or water-based. The coloring material contained in the ink can be used for both dyes and pigments, and the use of pigments is more preferable from the viewpoint of durability. In addition, a coating-type colored ink (colored resin composition, for example, described in JP-A No. 2005-3861 [0034] to [0063]) or JP-A No. 10-195358 [0009] is used for producing a known color filter. ]-[0026] The inkjet composition as described above can also be used.

In consideration of the process after coloring, a component that is cured by heating or that is cured by energy rays such as ultraviolet rays can be added to the ink in the present invention. Various thermosetting resins are widely used as components that are cured by heating, and examples of components that are cured by energy rays include those obtained by adding a photoinitiator to an acrylate derivative or a methacrylate derivative. In particular, in view of heat resistance, those having a plurality of acryloyl groups and methacryloyl groups in the molecule are more preferable. These acrylate derivatives and methacrylate derivatives are preferably water-soluble, and even those that are sparingly soluble in water can be used after being emulsified.
In this case, the photosensitive resin composition containing a colorant such as a pigment, as mentioned in the section <Deep color composition>, can be used as a suitable one.
Further, as the ink that can be used in the present invention, a thermosetting ink for a color filter containing at least a binder and a bifunctional to trifunctional epoxy group-containing monomer can also be used as a suitable ink.

The color filter in the present invention is preferably a color filter in which pixels are formed by an inkjet method, and it is preferable to form three color filters by spraying RGB three color inks.
This color filter is used as a display element in combination with a liquid crystal display element, an electrophoretic display element, an electrochromic display element, PLZT, or the like. It can also be used for applications using color cameras and other color filters.

(Overcoat layer)
In some cases, an overcoat layer is provided on the entire surface after the color filter is manufactured in order to improve resistance. The overcoat layer can protect the solidified layers of the inks R, G, and B and can flatten the surface, but it is preferably not provided from the viewpoint of increasing the number of steps.

Examples of the resin (OC agent) that forms the overcoat layer include an acrylic resin composition, an epoxy resin composition, and a polyimide resin composition. Above all, it is excellent in transparency in the visible light region, and the resin component of the photocurable composition for color filters is usually composed mainly of an acrylic resin and has excellent adhesion, so that the acrylic resin composition Things are desirable.
Examples of the overcoat layer include those described in paragraphs 0018 to 0028 of JP-A No. 2003-287618, and commercially available overcoat agents such as “Optomer SS6699G” manufactured by JSR.

[Display device]
The display device of the present invention refers to a display device such as a liquid crystal display device, a plasma display display device, an EL display device, or a CRT display device. For the definition of display devices and explanation of each display device, refer to “Electronic Display Devices (Akio Sasaki, published by Industrial Research Institute 1990)”, “Display Devices (written by Junaki Ibuki, Sangyo Tosho Co., Ltd.) Issue)).
Among the display devices of the present invention, a liquid crystal display device is particularly preferable. The liquid crystal display device is described in, for example, “Next-generation liquid crystal display technology (edited by Tatsuo Uchida, published by Kogyo Kenkyukai 1994)”. The liquid crystal display device to which the present invention can be applied is not particularly limited, and can be applied to various types of liquid crystal display devices described in, for example, the “next generation liquid crystal display technology”. Among these, the present invention is particularly effective for a color TFT liquid crystal display device. The color TFT liquid crystal display device is described in, for example, “Color TFT liquid crystal display (issued in 1996 by Kyoritsu Publishing Co., Ltd.)”. Further, the present invention can be applied to a liquid crystal display device with a wide viewing angle such as a lateral electric field driving method such as IPS and a pixel division method such as MVA. These methods are described, for example, on page 43 of “EL, PDP, LCD Display -Technology and Latest Trends in the Market- (Toray Research Center Research Division 2001)”.

  In addition to the color filter, the liquid crystal display device includes various members such as an electrode substrate, a polarizing film, a retardation film, a backlight, a spacer, and a viewing angle guarantee film. The black matrix of the present invention can be applied to a liquid crystal display device composed of these known members. For example, “'94 Liquid Crystal Display Peripheral Materials and Chemicals Market (Kentaro Shima, CMC Co., Ltd., 1994)”, “2003 Liquid Crystal Related Market Status and Future Prospects (Volume 2)” (Table Yoshiyoshi) Fuji Chimera Research Institute, published in 2003) ”.

[Target use]
The color filter of the present invention can be applied to applications such as televisions, personal computers, liquid crystal projectors, game machines, mobile phones and other portable terminals, digital cameras, car navigation systems and the like.

  The present invention will be described more specifically with reference to the following examples. The materials, reagents, ratios, equipment, operations, and the like shown in the following examples can be appropriately changed without departing from the spirit of the present invention. Therefore, the scope of the present invention is not limited to the specific examples shown below. In the following examples, “%” and “parts” represent “mass%” and “parts by mass” unless otherwise specified, and the molecular weight indicates the weight average molecular weight.

[Production method of dark color composition]
In the dark color composition K1, first, K pigment dispersion 1 and propylene glycol monomethyl ether acetate in the amounts shown in Table 1 were weighed, mixed at a temperature of 24 ° C. (± 2 ° C.) and stirred at 150 RPM for 10 minutes. 1, methyl ethyl ketone, binder 2, hydroquinone monomethyl ether, DPHA solution, 2,4-bis (trichloromethyl) -6- [4- (N, N-diethoxycarbonylmethyl) amino-3-bromophenyl] -S-triazine and surfactant 1 are weighed out, added in this order at a temperature of 25 ° C (± 2 ° C), and stirred at a temperature of 40 ° C (± 2 ° C) for 150 RPM for 30 minutes. In addition, the quantity of Table 1 is a mass part, and has the following composition in detail.

<K pigment dispersion 1>,
・ Carbon black (Nippex 35 manufactured by Degussa) 13.1%
・ Dispersant 0.65%

-Polymer (benzyl methacrylate / methacrylic acid = 72/28 molar ratio random copolymer, molecular weight 37,000) 6.72%
Propylene glycol monomethyl ether acetate 79.53%

<Binder 2>
・ Polymer (benzyl methacrylate / methacrylic acid = 78/22 molar ratio random copolymer, molecular weight 38,000) 27%
・ Propylene glycol monomethyl ether acetate 73%

<DPHA solution>
Dipentaerythritol hexaacrylate (containing 500 ppm of polymerization inhibitor MEHQ, manufactured by Nippon Kayaku Co., Ltd., trade name: KAYARAD DPHA) 76%
・ Propylene glycol monomethyl ether acetate 24%

<Surfactant 1>
・ The following structure 1 30%

・ Methyl ethyl ketone 70%

[Example 1]
The alkali-free glass substrate was cleaned with a UV cleaning apparatus, then brush-cleaned with a cleaning agent, and further ultrasonically cleaned with ultrapure water. The substrate was heat-treated at 120 ° C. for 3 minutes to stabilize the surface state.
After cooling the substrate and adjusting the temperature to 23 ° C., a glass substrate coater (manufactured by FS Japan Co., Ltd., trade name: MH-1600) having a slit-like nozzle has the composition described in the above table. Dark color composition K1 was applied. Subsequently, after a part of the solvent was dried by VCD (vacuum drying device, manufactured by Tokyo Ohka Kogyo Co., Ltd.) for 30 seconds to eliminate the fluidity of the coating layer, the EBR (edge bead remover) was unnecessary around the substrate. The coating solution was removed and prebaked at 120 ° C. for 3 minutes to obtain a dark photosensitive layer K1 having a thickness of 2 μm.
With a proximity type exposure machine (manufactured by Hitachi High-Tech Electronics Engineering Co., Ltd.) that has an ultra-high pressure mercury lamp, the exposure mask surface and the dark color photosensitive film with the substrate and mask (quartz exposure mask with image pattern) standing vertically The distance between the layers K1 was set to 200 μm, and pattern exposure was performed at an exposure amount of 300 mJ / cm ² in a nitrogen atmosphere.

Next, pure water is sprayed with a shower nozzle to uniformly wet the surface of the dark photosensitive layer K1, and then a KOH developer (KOH, containing nonionic surfactant, product names: CDK-1, Fuji). The film was diluted 100 times with Film Electronics Materials Co., Ltd., and was subjected to shower development at 23 ° C. for 80 seconds and a flat nozzle pressure of 0.04 MPa to obtain a patterning image. Subsequently, ultrapure water was sprayed at a pressure of 9.8 MPa with an ultra-high pressure cleaning nozzle to remove the residue, and post exposure was performed in the atmosphere with an exposure amount of 2000 mJ / cm ² to obtain an optical density of 3.9. A dark color separation wall was obtained. The substrate with the dark color separation wall thus obtained was cut vertically with the entire substrate to expose the cross section, and directly observed with a microscope or the like. The separation wall height h at the point where the height of the separation wall from the substrate is the highest, the line L ₁ , L ₁ parallel to the substrate and the tangent line L ₂ , h at the contact point of the separation wall at the position of 0.8 h position when the substrate and a line parallel _{L 3} of, when defined as a distance d from the intersection of _{L 2} and _{L 3} to Hanarega walls, h = 1.6 [mu] m, a d = 0.061μm, d / h = 0.038.

[Plasma water repellency treatment]
The substrate on which the separation wall was formed was subjected to plasma water repellency treatment under the following conditions using a cathode coupling parallel plate type plasma treatment apparatus.
Gas used: CF ₄ gas flow rate: 80 sccm
Pressure: 40Pa
RF power: 50W
Processing time: 30 sec

-Preparation of colored ink for pixels-
Among the following components, first, a pigment, a polymer dispersant, and a solvent were mixed, and a pigment dispersion was obtained using a three roll and bead mill. While sufficiently stirring the pigment dispersion with a dissolver or the like, other materials were added little by little to prepare a colored ink composition for red (R) pixels.
<Composition of colored ink for red pixels>
・ Pigment (CI Pigment Red 254) 5 parts ・ Polymer dispersant (Solsperse 24000 manufactured by AVECIA) 1 part ・ Binder (glycidyl methacrylate-styrene copolymer) 3 parts ・ First epoxy resin (novolak type epoxy resin) ,
Epicoat 154 manufactured by Yuka Shell Co., Ltd.) 2 parts, second epoxy resin (neopentyl glycol diglycidyl ether) 5 parts, curing agent (trimellitic acid) 4 parts, solvent: ethyl 3-ethoxypropionate 80 parts

Further, C.I. I. Pigment Red 254 instead of C.I. I. A colored ink composition for green (G) red pixels was prepared in the same manner as in the red pixel portion colored ink composition except that the same amount of pigment green 36 was used.
Further, C.I. I. Pigment Red 254 instead of C.I. I. A blue (B) pixel colored ink composition was prepared in the same manner as the red pixel colored ink composition except that the same amount of CI Pigment Blue 15: 6 was used.

  Next, using the color inks for R, G, and B pixels described above, an ink jet method is used in a region (a concave portion surrounded by a convex portion) partitioned by a separation wall of the color filter substrate obtained above. The recording apparatus was used to discharge the ink composition until a desired concentration was obtained, thereby producing a color filter composed of R, G, and B patterns. The color filter after image coloring was baked in an oven at 230 ° C. for 30 minutes to completely cure the black matrix and each pixel.

In the color filter thus obtained, the ink constituting each pixel fits exactly in the dark color separation wall gap, and no defects such as bleeding, protrusion, color mixture with adjacent pixels and white spots were found.
A transparent electrode of ITO (Indium Tin Oxide) was further formed by sputtering on the R pixel, G pixel, B pixel and black matrix of the color filter substrate obtained above. Separately, a glass substrate was prepared as a counter substrate, and patterning was performed for the PVA mode on the transparent electrode and the counter substrate of the color filter substrate, respectively.
The ITO resistance of this color filter was measured ("Loresta" manufactured by Mitsubishi Chemical Corporation; sheet resistance was measured by the four-probe method), and a very low value of 12Ω / □ was shown. This is presumably because the flatness of the black matrix surface was unexpectedly increased by using the present invention.

A photospacer was provided in a portion corresponding to the upper part of the separation wall on the ITO transparent electrode, and an alignment film made of polyimide was further provided thereon.
Then, after printing an epoxy resin sealant at a position corresponding to the outer periphery of the black matrix provided around the pixel group of the color filter and dropping the PVA mode liquid crystal and bonding it to the counter substrate The bonded substrate was heat treated to cure the sealant. A polarizing plate HLC2-2518 manufactured by Sanritsu Co., Ltd. was attached to both surfaces of the liquid crystal cell thus obtained. Next, a backlight of a cold cathode tube was constructed and placed on the back side of the liquid crystal cell provided with the polarizing plate to obtain a liquid crystal display device.

[Example 2]
Development was performed using the same materials and procedures as in Example 1, and a dark color separation wall having an optical density of 4.0 was obtained without performing post exposure. The shape of the dark color separation wall thus obtained was observed in the same procedure as in Example 1. As a result, h = 1.7 μm, d = 0.065 μm, and d / h = 0.038. there were.

  Next, after coloring the R, G, and B pixels in the same manner as in Example 1, the color filter was baked in an oven at 230 ° C. for 30 minutes to completely cure both the black matrix and each pixel. A transparent electrode of ITO (Indium Tin Oxide) was further formed by sputtering on the R pixel, G pixel, B pixel and black matrix of the color filter substrate obtained above.

  In the color filter thus obtained, the ink constituting each pixel fits exactly in the dark color separation wall gap, and no defects such as bleeding, protrusion, color mixture with adjacent pixels and white spots were found. Further, the ITO resistance of the color filter was measured (“Loresta” manufactured by Mitsubishi Chemical Corporation; sheet resistance was measured by a four-probe method), and a very low value of 11Ω / □ was shown. This is presumably because the flatness of the black matrix surface was unexpectedly increased by using the present invention.

[Production method of dark photosensitive transfer material K1]
On a 75 μm thick polyethylene terephthalate film temporary support, a coating solution for a thermoplastic resin layer having the following formulation H1 was applied and dried using a slit nozzle. Next, an intermediate layer coating solution having the following formulation P1 was applied and dried. Further, the dark color composition K1 was applied and dried. Thus, a thermoplastic resin layer having a dry film thickness of 14.6 μm, an intermediate layer having a dry film thickness of 1.6 μm, and a dark photosensitive layer having a dry film thickness of 2 μm are provided on the temporary support. A protective film (thickness 12 μm polypropylene film) was pressure-bonded to the film.
In this way, a dark color photosensitive transfer material in which the temporary support, the thermoplastic resin layer, the intermediate layer (oxygen barrier film), and the dark color photosensitive layer of black (K) are integrated is prepared, and the sample name is dark color photosensitive. The transfer material was K1.

<Coating liquid for thermoplastic resin layer: Formulation H1>
・ Methanol 11.1 parts ・ Propylene glycol monomethyl ether acetate 6.36 parts ・ Methyl ethyl ketone 52.4 parts ・ Methyl methacrylate / 2-ethylhexyl acrylate / benzyl methacrylate / methacrylic acid copolymer (copolymerization composition ratio (molar ratio) = 55) /11.7/4.5/28.8, molecular weight = 100,000, Tg≈70 ° C.) 5.83 parts styrene / acrylic acid copolymer (copolymerization composition ratio (molar ratio) = 63/37, average Molecular weight = 10,000, Tg≈100 ° C.) 13.6 parts · 2,2-bis [4- (methacryloxypolyethoxy) phenyl] propane (manufactured by Shin-Nakamura Chemical Co., Ltd.) 9.1 parts · Fluoropolymer _{(C 6 F 13 CH 2 CH} 2 OCOCH = CH 2 40 parts of H _{(OCH (CH 3)} and _{CH 2) 7 OCOCH = CH 2} 55 parts
Copolymer of _{H (OCHCH 2) 7 OCOCH =} CH 2 5 parts, average molecular weight 30,000, 30% methyl ethyl ketone solution, manufactured by Dainippon Ink and Chemicals, trade name: Megafac F780F) 0.54 parts

<Intermediate layer coating solution: Formulation P1>
-PVA205 (polyvinyl alcohol, manufactured by Kuraray Co., Ltd., degree of saponification = 88%, degree of polymerization 550) 32.2 parts-Polyvinylpyrrolidone (APS Japan, K-30) 14.9 parts-Distilled water 524 parts・ 429 parts of methanol

[Example 3]
The alkali-free glass substrate was washed with a rotating brush having nylon hair while spraying a glass detergent solution adjusted to 25 ° C. for 20 seconds by showering, and after washing with pure water shower, silane coupling solution (N-β (aminoethyl)) A 0.3% by mass aqueous solution of γ-aminopropyltrimethoxysilane, trade name: KBM603, manufactured by Shin-Etsu Chemical Co., Ltd.) was sprayed for 20 seconds with a shower and washed with pure water. This substrate was heated at 100 ° C. for 2 minutes by a substrate preheating apparatus.
The cover film is removed from the dark photosensitive transfer material produced by the above-mentioned manufacturing method on the obtained silane coupling treated glass substrate, and the surface of the dark photosensitive layer exposed after the removal and the silane coupling treated glass substrate. The substrate was heated to 100 ° C. for 2 minutes using a laminator (manufactured by Hitachi Industries (Lamic II type)), a rubber roller temperature of 130 ° C., and a linear pressure of 100 N / cm. Lamination was performed at a conveyance speed of 2.2 m / min. Subsequently, the polyethylene terephthalate temporary support was peeled off at the interface with the thermoplastic resin layer to remove the temporary support. After peeling off the temporary support, exposure is performed with a proximity type exposure machine (manufactured by Hitachi High-Tech Electronics Engineering Co., Ltd.) having an ultra-high pressure mercury lamp with the substrate and mask (quartz exposure mask with image pattern) standing vertically. The distance between the mask surface and the dark color photosensitive resin composition layer was set to 200 μm, and pattern exposure was performed at an exposure amount of 70 mJ / cm ² .

Next, development is performed with a 0.5% aqueous KOH solution to remove the unexposed portion of the dark photosensitive layer, the intermediate layer below it, and the thermoplastic resin layer to form a black matrix pattern-like dark color separation wall on the glass substrate. Obtained. Subsequently, the entire surface of the substrate from the surface of the substrate was post-exposed at 2000 mJ / cm 2 with an aligner in the atmosphere to obtain a dark color separation wall having an optical density of 4.0.
The shape of the dark color separation wall thus obtained was observed in the same procedure as in Example 1. As a result, h = 1.5 μm, d = 0.053 μm, and d / h = 0.035. there were.

Next, water repellent treatment was performed by the following method.
[Water repellent treatment by coating method]
A fluorosurfactant (manufactured by Sumitomo 3M, Fluorard FC-430) is preliminarily added on the substrate on which the separation wall has been formed (based on the solid content of the photosensitive resin). An alkali-soluble photosensitive resin (Hoechst Shapan Co., Ltd., positive photoresist AZP4210) was applied using a slit nozzle so as to have a film thickness of 2 μm, and heat treatment was performed at 90 ° C. for 30 minutes in a hot air circulating dryer. Went.
Next, exposure was performed through the separation wall from the back surface of the substrate on which the separation wall was formed with an exposure amount of 110 mJ / cm ² (38 mW / cm ² × 2.9 seconds), and an inorganic alkali developer (manufactured by Hoechst Japan, AZ400K developer, 1: 4) After immersing and shaking for 80 seconds, rinse with pure water for 30 to 60 seconds to form a water-repellent resin layer on the image separation wall, thereby changing the surface energy difference between the inside and outside of the pixel. Was provided. The surface energy inside and outside the pixel after the formation of the water-repellent resin layer was 10 to 15 dyne / cm outside the pixel (on the resin layer) and around 55 dyne / cm inside the pixel (on the glass substrate).

  Next, after coloring the R, G, and B pixels in the same manner as in Example 1, the color filter was baked in an oven at 230 ° C. for 30 minutes to completely cure both the black matrix and each pixel.

In the color filter thus obtained, the ink constituting each pixel fits exactly in the dark color separation wall gap, and no defects such as bleeding, protrusion, color mixture with adjacent pixels and white spots were found. A transparent electrode of ITO (Indium Tin Oxide) was further formed by sputtering on the R pixel, G pixel, B pixel and black matrix of the color filter substrate obtained above.
The ITO resistance of this color filter was measured ("Loresta" manufactured by Mitsubishi Chemical Corporation; sheet resistance was measured by the four-probe method), and a very low value of 10Ω / □ was shown. This is presumably because the flatness of the black matrix surface was unexpectedly increased by using the present invention.

[Example 4]
The same material and procedure as in Example 3 are used until the development, post-exposure is not performed, and the black matrix substrate is baked in an oven at 80 ° C. for 40 minutes to cure the black matrix. 1 dark color separation wall was obtained. The shape of the dark color separation wall thus obtained was observed in the same procedure as in Example 1. As a result, h = 1.5 μm, d = 0.054 μm, and d / h = 0.036. there were.

  Next, after coloring the R, G, and B pixels in the same manner as in Example 1, the color filter was baked in an oven at 230 ° C. for 30 minutes to completely cure both the black matrix and each pixel.

In the color filter thus obtained, the ink constituting each pixel fits exactly in the dark color separation wall gap, and no defects such as bleeding, protrusion, color mixture with adjacent pixels and white spots were found. A transparent electrode of ITO (Indium Tin Oxide) was further formed by sputtering on the R pixel, G pixel, B pixel and black matrix of the color filter substrate obtained above.
The ITO resistance of this color filter was measured ("Loresta" manufactured by Mitsubishi Chemical Corporation; sheet resistance was measured by the four-probe method), and a very low value of 12Ω / □ was shown. This is presumably because the flatness of the black matrix surface was unexpectedly increased by using the present invention.

[Example 5]
In Example 3, a dark color separation wall was prepared in the same manner as in Example 3 except that the dark photosensitive transfer material K1 was changed to the following dark photosensitive transfer material K2.
[Production method of dark photosensitive transfer material K2]
The dark color composition K1 was applied and dried on a 16 μm thick polyethylene terephthalate film (Tetron G2 manufactured by Teijin DuPont Films Ltd.) temporary support using a slit-shaped nozzle. In this manner, a dark photosensitive resin layer having a dry film thickness of 2.0 μm was provided on the temporary support, and finally a protective film (12 μm thick polypropylene film) was pressure-bonded.
In this way, a dark color photosensitive transfer material in which the temporary support and the dark color photosensitive resin layer were integrated was prepared, and the sample name was dark color photosensitive transfer material K2.

[Comparative Example 1]
Instead of performing exposure under nitrogen in the exposure step of Example 1, a substrate with a black matrix-like dark color separation wall was obtained by performing exactly the same processes and operations as in Example 1 except that exposure under the atmosphere was performed. . The optical density of the dark color separation wall thus obtained was 3.9.
The shape of the dark color separation wall thus obtained was observed in the same procedure as in Example 1. As a result, h = 1.7 μm, d = 0.14 μm, and d / h = 0.082. . Next, after coloring the R, G, and B pixels in the same manner as in Example 1, baking was performed under the same conditions. As a result, the ink got over the dark color separation wall, and color mixing with adjacent pixels had occurred. Further, when the ITO resistance was measured in the same manner as in the example, it was 22Ω / □, and the flatness of the black matrix surface was not so high.
The above results are summarized in Table 2. FIG. 3 shows cross-sectional shapes of the color filters of the example and the comparative example.

It is a conceptual diagram which shows the cross-sectional shape of the deep color separation wall in this invention. It is a conceptual diagram which shows the pattern of a color filter. It is a conceptual diagram which shows the cross-sectional shape of a color filter. SEM photograph showing the cross-sectional shape of the dark color separation wall in the present invention SEM photograph showing the cross-sectional shape of the dark separation wall in the present invention (viewed from the side) SEM photograph showing the cross-sectional shape of the dark color separation wall in the comparative example

Explanation of symbols

1 Dark color separation wall 2 Substrate

Claims (17)

A manufacturing method of a color filter having two or more pixel groups exhibiting different colors on a substrate, wherein each pixel constituting the pixel group is separated from each other by a dark color separation wall, In the cross-sectional shape of the dark color separation wall formed on the line, the height from the substrate at the highest height of the separation wall from the substrate is h, and a line parallel to the substrate at a position 0.8 h from the substrate. distance of when the L _1, L ₁ and a tangent at Hanarega wall contact points L _2, L ₃ of the substrate and a line parallel to the position of h, until Hanarega wall from the intersection of L ₂ and L ₃ A value obtained by dividing the value d defined by 1 by h is 0.04 or less. After forming a dark color separation wall, each pixel is formed between the dark color separation walls. Color filter manufacturing method.   2. The method for producing a color filter according to claim 1, wherein each pixel is formed between the dark color separation walls in a state where at least a part of the dark color separation walls has water repellency.   3. The method of forming each pixel between the dark color separation walls is a method of causing a colored liquid composition forming each pixel to enter between the dark color separation walls by an ink jet method. A method for producing a color filter as described in 1.   The method for producing a color filter according to any one of claims 1 to 3, wherein a dark color separation wall is formed by exposing the dark color composition in an oxygen-poor atmosphere and then developing the dark color composition.   The method for producing a color filter according to claim 4, wherein the oxygen-poor atmosphere is selected from an inert gas atmosphere, a reduced pressure, and an intermediate layer capable of blocking oxygen.   The method for producing a color filter according to any one of claims 2 to 5, wherein the means for making at least a part of the dark color separation wall repellent is a plasma treatment.   The method for producing a color filter according to any one of claims 4 to 6, wherein the dark color separation wall shape is fixed by performing re-exposure after development. The method for producing a color filter according to claim 7, wherein an exposure amount in the re-exposure is 1000 mJ / cm ² or more.   The method for producing a color filter according to any one of claims 4 to 8, wherein the dark color separation wall shape is fixed by heating at 50 to 120 ° C after development.   10. The color filter manufacturing method according to claim 4, wherein each pixel is formed by an ink jet method without a heating step exceeding 120 ° C. after the development.   The method for producing a color filter according to any one of claims 4 to 10, wherein the optical density of the dark color composition is 2.5 or more.   The method for producing a color filter according to any one of claims 4 to 11, wherein the dark color composition is a photopolymerizable composition.   A photosensitive transfer material having at least a layer composed of the dark color composition according to claim 12 and an intermediate layer capable of blocking oxygen is transferred onto a substrate on a temporary support to form a dark color separation wall. The method for producing a color filter according to claim 12, wherein the method is performed.   The method for producing a color filter according to any one of claims 1 to 13, wherein the dark color separation wall is black.   The method for producing a color filter according to any one of claims 1 to 14, wherein the dark color separation wall has a black matrix-like structure.   The color filter manufactured by the color filter manufacturing method of any one of Claims 1-15.   A display device comprising a color filter manufactured by the color filter manufacturing method according to claim 1.