KR20080009628A - Pattern inspection apparatus - Google Patents

Abstract

A pattern inspection apparatus is provided to design a lens to form an image only at a specific wavelength and obtain high resolution of an image. A pattern inspection apparatus includes a tape transporting unit(10), an inspecting unit(1), a scanning member(2), a marker unit(3), and a control unit(4). The tape transporting unit includes an unwinding reel(11) or a winding reel(12) transporting a TAB(Tape Automated Bonding) tape(5). The inspecting unit takes photographs of patterns(5a) by scanning an illumination light and a reflection light in the TAB tape fed from the unwinding reel. The scanning member scans on the patterns of inspection. The marker unit marks a pattern of a failure by punching or painting.

Description

Pattern inspection device {PATTERN INSPECTION APPARATUS}

1 is a block diagram of a wiring pattern inspection apparatus of a first embodiment of the present invention;

2 is an enlarged view of the vicinity of an inspection unit;

3 is a diagram showing a case where two lenses are provided in correspondence with two illumination regions and an image pickup device;

4 is a view for explaining an image capturing test pattern in the first embodiment;

FIG. 5 is a diagram showing a case where a plurality of CCD line sensors are arranged in order to capture a wide inspection pattern; FIG.

6 shows an example of a transmission illumination image and a reflection illumination image;

7 is a block diagram of a wiring pattern inspection apparatus of a second embodiment of the present invention;

FIG. 8 is a view for explaining an image capturing test pattern in the second embodiment; FIG.

9 is a block diagram of a wiring pattern inspection apparatus of a third embodiment of the present invention;

FIG. 10 is a view for explaining an operation of picking up an inspection pattern in the third embodiment. FIG.

<Description of the symbols for the main parts of the drawings>

One… Inspection unit 1a... Transmission lighting means

1b... Reflective illuminating means 1c, 1d... Imaging means (CCD line sensor)

1e... Cylindrical lens 2, 2 '... Injection means

3... Marker portion 4.. Control

5... TAB tape 5a... Check pattern

6... Lens 11.. Discharge reel

12... Winding reel 10.. Tape conveying mechanism

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a pattern inspection apparatus, and in particular, compares a reflection illumination image and a transmission illumination image obtained by illuminating a wiring pattern formed on a substrate such as a tape automated bonding (TAB) tape by reflective illumination and transmission illumination. And a wiring pattern inspection device for determining the quality of a product.

In the inspection of the wiring pattern, a method and an apparatus for distinguishing a defect from a dust (foreign material) adhered to the substrate surface or the back and the wiring pattern and preventing false detection, for example, Patent Document 1, Patent Document 2, Patent Document 3 and the like have been proposed.

This publication compares a reflection illumination image obtained by receiving reflective illumination light on a substrate on which a wiring pattern is formed with a transmission illumination image obtained by receiving transmission illumination light, and identifies defects common to both images as defects in the wiring pattern. It is described.

[Patent Document 1: Japanese Patent Application Laid-Open No. 2004-61491]

[Patent Document 2: Japanese Patent Application Laid-Open No. 2005-24386]

[Patent Document 3: Japanese Patent Application Laid-Open No. 2004-212159]

Paragraph 0014-0015 of the said patent document 2 shows the procedure of obtaining a reflection illumination image and a transmission illumination image as follows.

(i) Transmissive illumination light is irradiated to the board | substrate, and the imaging means (CCD line sensor 1c) and the transmissive illumination means 1a are scanned, and the transmissive illumination image of a board | substrate is obtained.

(ii) The illumination is switched to reflected (falling) illumination, and the imaging means (CCD line sensor 1c) and the reflected (falling) illumination means 1b are scanned to obtain a reflected illumination image of the substrate.

As described above, in Patent Document 2, in order to obtain two kinds of images of a transmission illumination image and a reflection illumination image, the imaging means and the illumination means must be scanned twice in one inspection area. Therefore, the problem that a test takes time has arisen.

As a means for solving the problem, the technique described in Patent Document 3 gives important implications. In the above publication, it is shown that the transmission illumination image and the reflection illumination image are simultaneously obtained by changing the wavelengths of the transmission illumination light and the reflection illumination light and using a sensor capable of detecting each wavelength independently.

Using this technique, both the transmission illumination image and the reflection illumination image can be obtained by simply irradiating the illumination illumination light and the reflection illumination light simultaneously to the inspection area and scanning the imaging means and the illumination means once.

However, this method has the following problems.

In an actual wiring pattern inspection apparatus, a lens (a lens unit in which a plurality of lenses are combined) is provided on the light incidence side of an imaging means (CCD sensor) to enlarge an area to be inspected and project it on the imaging means. In recent years, in order to inspect the wiring pattern which becomes fine every year with high precision, the lens which has a higher resolution is desired.

In the case where the wavelengths of the transmitted illumination light and the reflected illumination light are different, the lens unit must also image-transform the projection illumination light and the reflection illumination light on the imaging means in the same manner. In other words, the lens unit needs to have an optical characteristic equivalent to light having a different wavelength.

However, in general, the design for having an optical characteristic equivalent to light having a different wavelength is more difficult than the design of an optical system for forming light of one wavelength (monochrome light), and the resolution is also lowered. In order to improve the resolution, the cost of the device becomes expensive, for example, the material of the lens becomes expensive.

This invention is made | formed in view of the said situation, The objective of this invention is the pattern which can obtain both a transmission illumination image and a reflection illumination image only by scanning once with an imaging means and an illumination means, without reducing a resolution. It is to provide an inspection apparatus.

(1) The board | substrate which exists in the visual field of the said lens by dividing the test | inspection area | region (the visual field area | region of a lens) of the board | substrate projected by a lens into two, a 1st area | region which irradiates a reflection illumination light, and a 2nd area | region which irradiates a transmission illumination light. Reflective illumination means for irradiating the reflected illumination light to the first region which is a part of the region, and transmissive illumination for irradiating the transmitted illumination light to the second region, which is another portion of the region within the field of view of the lens and not illuminated by the reflected illumination light. Install the means. Further, first imaging means for imaging the first area and second imaging means for imaging the second area are provided.

Then, the substrate, the two imaging means, and the lens are relatively scanned in the direction in which the first region and the second region are arranged to obtain a reflection illumination image and a transmission illumination image of the inspection region by one scanning movement. Based on both images, the quality of the pattern is determined.

(2) In said (1), the said board | substrate is an elongate strip | belt-shaped TAB tape in which the wiring pattern by metal was formed on the resin film, and the said moving means conveys the said TAB tape to a tape longitudinal direction.

(3) In the above (1), the substrate is an elongated strip-shaped TAB tape having a wiring pattern formed of a metal on a resin film, and the moving means uses the two imaging means and the lens as one set. Move in the longitudinal direction of the TAB tape.

(4) The said board | substrate is a long strip-shaped TAB tape in which the wiring pattern by the metal was formed on the resin film in said (1), The said moving means uses the said two imaging means and the said lens as a single said, Move in the width direction of the TAB tape.

(5) The wavelength of reflected illumination light and the wavelength of transmitted illumination light are made the same.

Best Mode for Carrying Out the Invention

1 is a block diagram of a wiring pattern inspection apparatus of a first embodiment of the present invention. In addition, although the case where a board | substrate is a TAB tape is demonstrated also in any Example shown below, this invention is applicable to the pattern inspection of the various board | substrates which can transmit light other than a TAB tape. For example, since a silicon wafer transmits infrared rays, when infrared rays are used for the reflected illumination light and the transmitted illumination light, the same inspection can be performed with respect to the wiring pattern formed on the silicon wafer.

In the pattern inspection apparatus of this embodiment, as shown in the above drawings, the tape conveyance mechanism 10, the delivery reel 11 made of the delivery reel 11, the winding reel 12, and the like that convey the TAB tape 5 are used. The inspection unit 1 which irradiates the transmitted TAB tape 5 to the transmitted illumination light and the reflected illumination light, and image | photographs the pattern 5a, and the scanning means 2 which scans the inspection part 1 on the inspection pattern 5a of a TAB tape. And a marker portion 3 for marking a defective pattern.

In the marker part 3, the pattern determined as defective is punctured with a punch, or a mark such as coloring is made so as to visually confirm that the part is defective.

Moreover, the wiring pattern test | inspection apparatus of this Example compares the image of the transmitted illumination image pattern, the reflected illumination image pattern, and the master pattern used as a reference, determines the quality of a product, and also the inspection part 1 and the scanning means 2 And a controller 4 for controlling the operation of the marker portion 3 and the tape conveyance mechanism 10. In the control part 4, the reference pattern used as a reference | standard of a pattern inspection is previously input. There are two types of reference patterns, ones for reflection illumination and ones for transmission illumination. In addition, the reference pattern may be an image which picked up the actual wiring pattern judged as good quality, and may use CAD data.

Next, an example of the configuration of the inspection unit will be described.

As shown in FIG. 1, the inspection unit 1 includes one lens (lens unit) 6 that enlarges and projects an area for inspecting the TAB tape 5 and a substrate within the field of view of the lens 6. Transmissive illumination means 1a which illuminates by the transmitted light on the back surface side of the TAB tape 5 with respect to the area, ie, the part of the substrate area enlarged by the lens, and the transmission of the substrate area within the field of view of the lens 6. In the area | region which is not illuminated by illumination light, the reflection illumination means 1b which illuminates with reflection light (falling-light) on the surface side is provided. Moreover, the imaging means 1c which image | photographs the image of the inspection pattern 5a by the transmitted illumination light, and the image of the inspection pattern 5a by the reflected illumination light are provided on the opposite side to the TAB tape 5 of the lens 6 An imaging means 1d for imaging is provided.

The light source of the permeation | transmission illumination means 1a transmits the resin film of the TAB tape 5, and selects suitably what radiates the wavelength reflected in the pattern formed in the TAB tape 5. In this embodiment, the LED which emits light of wavelength 850 nm or more is used, and the same thing was used for the light source of the reflective illuminating means 1b.

The lens 6 is housed in a barrel by combining a plurality of lenses, and is designed to have desired optical characteristics with respect to light having a wavelength of 850 nm.

The imaging means 1c and 1d have light reception sensitivity to the wavelength of the said illumination light. For example, it is a CCD line sensor or an area sensor, and below, the case where a CCD line sensor is used as imaging means 1c, 1d is demonstrated.

2 is an enlarged view of the vicinity of the inspection unit 1. Fig. 2A shows the TAB tape side as seen from the imaging means side, and Fig. 2B is a side view.

As shown in Fig. 2A, the area of the substrate (the area of the substrate enlarged by the lens 6) within the field of view of the lens 6 is the area to which the reflected illumination light is irradiated by the reflective illumination means 1b. It is divided into two areas, X (reflected illumination area X) and area Y (transmission illumination area Y) of the substrate to which the transmitted illumination light is irradiated by the transmission illumination means 1a. In addition, the arrow direction (the longitudinal direction of the TAB tape 5) of the said figure is defined as the direction in which the reflection illumination area | region X and the transmission illumination area | region Y are arranged.

Moreover, on the opposite side to the board | substrate of the lens 6, the 1st imaging means 1c which image | photographs a transmissive illumination image in the position where the transmissive illumination area Y is projected, The agent which image | photographs a reflected illumination image in the position where the reflective illumination area X is projected, 2 imaging means 1d are provided.

Transmissive illumination light and the reflected illumination light, on the emission side of the illumination light of the transmission illumination means 1a and the reflection illumination means 1b, so as not to mix with each other on the substrate to be inspected, the cylindrical lens 1e corresponding to the length of both illumination means. Is disposed, and the illumination light is focused in the width direction of the illumination means. Moreover, by condensing illumination light in this way, the transmission illumination area | region Y and the reflection illumination area | region X can approach, and the lens 6 and the inspection part 1 can be miniaturized.

In addition, as shown in Fig. 3, it is conceivable to provide two lenses 6a and 6b corresponding to the two illumination regions and the imaging elements 1c and 1d, but this is not practical for the following reasons.

Since lenses are high resolution, they require high optical performance and are expensive. When two lenses are used, the cost of the lens is doubled, and the cost of the entire apparatus becomes expensive.

In addition, as shown in the background art, in the inspection, since the reflected illumination image and the transmitted illumination image are compared, both images must have the same resolution. For this reason, it is necessary to match the optical characteristics of the two lenses, but in reality, it is difficult to match them with precision, and the cost is high if they are to be matched.

As described above, the lens is configured by combining a plurality of lenses. When two lenses are used, the weight becomes heavy and the device becomes large.

FIG. 4 is a view for explaining an image capturing operation of the test pattern 5a, and the drawing shows the imaging means 1c and 1d, the lens 6, the transmission illumination means 1a and the reflection illumination means 1b ( The case where the inspection part 1 is integrally moved to the conveyance direction of a TAB tape is shown.

In this case, the reflection illumination region X and the transmission illumination region Y are arranged side by side in the longitudinal direction of the TAB tape 5, and the inspection of the TAB tape 5 is performed by the scanning means 2 scanning the inspection unit 1. On the pattern 5a, the imaging means (CCD line sensor) 1c, 1d, the lens 6, the transmission illumination means 1a and the reflection illumination means 1b are scanned in the direction of the arrow in the figure.

The inspection pattern 5a is first illuminated by the transmission illumination, and the transmission illumination image is obtained by the first imaging means 1c. Subsequently, it is illuminated by the reflection illumination, and the reflection illumination image is obtained by the second imaging means 1d.

When the whole inspection part 1 passes through the inspection pattern 5a, the transmission illumination image and the reflection illumination image of the whole inspection pattern 5a are obtained.

In addition, the reflection illumination area X by the reflection illumination means 1b, the transmission illumination area Y by the transmission illumination means 1a, the 1st imaging means 1c, and the 2nd imaging means 1d are with respect to a scanning direction. It is necessary to set the length of the orthogonal direction to the length which covers the width | variety of the test | inspection pattern 5a by one scan.

The light source of the transmissive lighting means 1a and the reflective illuminating means 1b is comprised, for example by arranging a plurality of LEDs. Therefore, adjustment of the length of the transmission illumination area | region Y and the reflection illumination area | region X is performed by changing the number of LEDs of each illumination means 1a and 1b to arrange in the width direction of the inspection pattern 5a.

On the other hand, the length of the CCD line sensor used for the 1st imaging means 1c and the 2nd imaging means 1d is marketed. Therefore, in order to image a wide inspection pattern, as shown in FIG. 5, several CCD line sensors are arranged side by side.

Next, the operation of the pattern inspection apparatus of this embodiment will be described with reference to Figs. 1, 2, and 4. In addition, the control (algorithm) for the inspection of a pattern is basically the same as that of patent document 2, and is.

The same wiring pattern is continuously produced in the TAB tape 5 continuously, and the control part 4 drives the tape conveyance mechanism 10, and conveys the TAB tape 5 to the inspection part 1.

When the test pattern 5a which becomes the test object of the TAB tape 5 is conveyed to the predetermined position of the test | inspection part 1 by the said tape conveyance mechanism 10, the TAB tape 5 stops at that position.

The tape conveyance direction upstream side in the board | substrate area | region in the visual field of the lens 6 from the lower side (side of the side where the wiring pattern 5a is not provided) of the TAB tape 5 by the transmission illumination means 1a. The transmitted illumination light is irradiated.

Moreover, by the reflective illumination means 1b, the tape conveyance direction downstream in the board | substrate area | region in the visual field of the lens 6 from the upper side of the TAB tape 5 (the side where the wiring pattern 5a is provided). The reflected illumination light is irradiated to the side.

By the scanning means 2, the inspection part 1 (transmission illumination means 1a, the reflection illumination means 1b, the imaging means 1c, 1d, the lens 6) is made into the reflection illumination area X and the transmission illumination area | region Scanning is performed such that the entirety of the inspection pattern 5a passes under the inspection portion 1 in the direction in which the Y regions are arranged, that is, in the longitudinal direction of the TAB tape 5.

Accordingly, the illumination light emitted from the transmission illumination means 1a passes through the TAB tape 5 and is received by the imaging means (CCD line sensor) 1c, and the control unit 4 transmits an illumination image of the inspection pattern 5a. Is acquired and stored.

In addition, the illumination light emitted from the reflected light illuminating means 1b is reflected by the TAB tape 5 and received by the imaging means (CCD line sensor) 1d, and the controller 4 reflects the reflected illuminating image of the inspection pattern 5a. It is acquired and stored. FIG. 6 is a diagram showing an example of a transmission illumination image and a reflection illumination image in the case of thinning, thickening, foreign matter, and the like.

The control unit 4 compares the stored transmission illumination image with the reference pattern for transmission illumination, and determines whether or not the wiring pattern of the transmission illumination image is within a range of a predetermined dimension with respect to the reference pattern, that is, the pattern becomes "thick." Or tapering.

And when a defect is not detected in a wiring pattern, the inspected wiring pattern is judged as good quality.

On the other hand, as shown in Fig. 6A, when the transmission illumination image and the wiring pattern for the transmission illumination are thinner than the reference pattern, the inspected wiring pattern is determined as a defective product of the wiring defect.

In addition, when the wiring pattern for transmissive illumination becomes thicker than the reference pattern, for example, as shown in Fig. 6B, the inspected wiring pattern is determined as a defective candidate. The position of the area A including the thickened portion of the wiring pattern of the defective candidate is stored.

Next, the image of the reflection illumination image of the predetermined range of the periphery of the position corresponding to the said area | region A is compared with the image of the same position of the reference pattern for reflection illumination, and a test | inspection of thinning and thickening is performed.

As a result of this inspection, as shown in Fig. 6B, when the thickness is detected also in the reflection illumination image in the same manner as the inspection result by the transmission illumination image, the wiring pattern is determined as defective.

On the other hand, although thickening was detected by the transmission illumination image, as shown in Fig. 6C, in the reflection illumination image, when tapering was detected, as opposed to the inspection result by the transmission illumination image, The cause of thickening is determined as "foreign substance" on the pattern, and the wiring pattern is determined as good quality.

In addition, although the thickness is detected by the transmission illumination image, as shown in FIG. 6 (d), when neither the thickness nor the thickness is detected in the reflection illumination image, it is the cause of the thickness by the transmission illumination image. It is assumed that it is due to the thickening (rooting) in the lower side of the pattern, and the wiring pattern is determined to be defective.

When the inspected pattern is determined to be a defective product, the position of the pattern is stored in the controller, and when the pattern is conveyed to the marker portion 3 by the tape conveyance mechanism 10, marking such as drilling and coloring is performed.

When the test | inspection of the test | inspection pattern 5a is complete | finished, the TAB tape 5 is conveyed by the tape conveyance mechanism 10, and the test pattern which becomes a next test | inspection object is conveyed to the predetermined position of the test | inspection part 1.

Fig. 7 is a block diagram of the wiring pattern inspection apparatus of the second embodiment of the present invention. In the present embodiment, the inspection unit 1 is fixed without being provided with a scanning means. Therefore, relative movement of the test | inspection part 1 and the TAB tape 5 for the test | inspection part 1 to image the test pattern 5a is performed by the tape conveyance mechanism 10. FIG.

The configuration of the inspection unit 1 is basically the same as that of the first embodiment, and is transmitted by the transmitted light at the back side of the TAB tape 5 with respect to the lens 6 and a part of the substrate region in the field of view of the lens 6. Reflective illuminating means 1b for illuminating and reflective illuminating means 1b for illuminating with reflected light on the surface side of the TAB tape 5 with respect to other regions of the substrate within the field of view of the lens 6, and transmissive Imaging means 1c which image | photographs the image of the test | inspection pattern 5a by illumination light, and imaging means 1d which image | photographs the image of the test | inspection pattern 5a by reflected illumination light.

Next, the operation | movement which picks up the test pattern 5a is demonstrated using FIG.

Similarly to the first embodiment, the reflective illumination region X and the transmissive illumination region Y are arranged side by side in the longitudinal direction of the TAB tape 5, and on the lens 6, first imaging means for imaging the transmissive illumination region Y (1c) and the 2nd imaging means 1d which image | photograph the reflected illumination area | region X are provided.

When imaging the inspection pattern 5a of the TAB tape 5 by the 1st and 2nd imaging elements 1c and 1d, the TAB tape 5 uses the tape conveyance mechanism 10 of the said figure. It is scanned in the direction of the arrow (the longitudinal direction of the TAB tape 5, that is, the direction in which the reflective illumination region X and the transmission illumination region Y are arranged).

When the whole inspection pattern 5a passes under the inspection part 1, the permeation illumination image and the reflection illumination image of the whole inspection pattern 5a are obtained.

The operation of the apparatus of this embodiment is basically the same as that of the first embodiment, and the description will be mainly focused on other parts.

The TAB tape 5 is conveyed to the inspection part 1 by the tape conveyance mechanism 10.

When the inspection pattern 5a used as the inspection target of the TAB tape 5 is conveyed to a predetermined position of the inspection unit 1 (the conveying direction upstream side of the inspection unit 1), the TAB tape 5 is conveyed at the position. This stops once.

By the transmission illumination means 1a and the reflection illumination means 1b, the inside of the visual field of the lens 6 is divided and illuminated, and the transmission illumination area | region Y and the reflection illumination area | region X are arranged in the conveyance direction of the TAB tape 5, Is formed.

By the tape conveyance mechanism 10, the TAB tape 5 is conveyed and the whole inspection pattern 5a is scanned in the direction which the reflection illumination area | region X and the transmission illumination area | region Y area line up. Thereby, the transmissive illumination image of the inspection pattern 5a is acquired by the CCD line sensor 1c, and the reflected illumination image of the inspection pattern 5a is acquired by the CCD line sensor 1d, and is stored in the control part 4.

The control unit 4 compares the stored transmission illumination image with the reference pattern for transmission illumination, and determines whether or not the inspection pattern 5a is determined by the procedure shown in the first embodiment. The marking is carried out by 3).

When the test | inspection of the test | inspection pattern 5a is complete | finished, the TAB tape 5 is conveyed by the tape conveyance mechanism 10, and the test pattern which becomes a next test | inspection object is conveyed to the predetermined position of the test | inspection part 1.

9 is a block diagram of a wiring pattern inspection apparatus of a third embodiment of the present invention. In the present embodiment, similarly to the first embodiment, the inspection unit 1 is provided with the scanning means 2 ', but the scanning means 2' conveys the inspection unit 1 with the TAB tape 5. It moves in the direction orthogonal to the direction (width direction of the TAB tape 5).

Therefore, arrangement | positioning of the transmission illumination means 1a of the inspection part 1, the reflection illumination means 1b, and the imaging means 1c, 1d corresponding to them is the lens 6 with respect to 1st, 2nd Example. It is arrange | positioned in the state rotated 90 degrees about the optical axis of (). In addition, in FIG. 9, only the transmissive illumination means 1a and the 1st imaging means 1c which receive a transmissive illumination image are shown in order to avoid that a figure becomes complicated, In reality, the reflective illuminating means ( 1b) and 2nd imaging means 1d which receive a reflected illumination image are provided.

An operation of imaging the test pattern 5a will be described with reference to FIG. 10.

Unlike the first and second embodiments, the reflection illumination region X and the transmission illumination region Y are formed side by side in the direction orthogonal to the longitudinal direction of the TAB tape 5 (width direction of the TAB tape 5). . On the lens 6, the 1st imaging means 1c which image | photographs the transmissive illumination area | region Y, and the 2nd imaging means 1d which image | photographs the reflected illumination area | region X are provided.

By the scanning means 2 ', the transparent illuminating means 1a, the reflective illuminating means 1b, and the imaging means (CCD line sensor) 1c, 1d are arranged so that the reflected illuminating region X and the transmissive illuminating region Y region are arranged. It scans in the direction, ie, the direction orthogonal to the longitudinal direction of the TAB tape 5 (the width direction of the TAB tape 5).

When the whole inspection pattern 5a passes under the inspection part 1, the permeation illumination image and the reflection illumination image of the whole inspection pattern 5a are obtained.

The operation of the apparatus of this embodiment is basically the same as that of the first embodiment, and the description will be mainly focused on other parts.

The TAB tape 5 is conveyed to the inspection part 1 by the tape conveyance mechanism 10. When the inspection pattern 5a used as the inspection target of the TAB tape 5 is conveyed to a predetermined position of the inspection unit 1 (the conveying direction upstream side of the inspection unit 1), the TAB tape 5 is conveyed at the position. This stops once.

By the transmission illumination means 1a and the reflection illumination means 1b, the inside of the visual field of the lens 6 is distinguished and illuminated, and the transmission illumination area | region Y and the reflection illumination area | region X are arranged in the width direction of the TAB tape 5, Is formed.

By the scanning means 2 ', the inspection part 1 produces the inspection part 5a in the direction in which the reflection illumination area X and the transmission illumination area Y area are arranged, ie, the width direction of the TAB tape 5. Pass under 1).

Thereby, the transmission illumination image of the inspection pattern 5a is acquired by the imaging means (CCD line sensor) 1c, and the reflection illumination image of the inspection pattern 5a is acquired by the imaging means (CCD line sensor) 1d. And stored in the controller 4.

The control unit 4 compares the stored transmission illumination image with the reference pattern for transmission illumination, and determines whether or not the inspection pattern 5a is determined by the procedure shown in the first embodiment. The marking is carried out by 3).

When the test | inspection of the test | inspection pattern 5a is complete | finished, the TAB tape 5 is conveyed by the tape conveyance mechanism 10, and the test pattern which becomes a next test | inspection object is conveyed to the predetermined position of the test | inspection part 1.

In addition, as described in the first embodiment, the reflection illumination area X and the transmission illumination area Y, and the first imaging means 1c and the second imaging means 1d have a length in a direction orthogonal to the scanning direction. It is necessary to set it to the length which covers the area | region to test | inspect by one scan. As shown in Fig. 5, when a plurality of CCD line sensors are arranged in a row, the inspection area for acquiring an image by scanning one inspection unit 1 becomes wider, so that the inspection time of the entire TAB tape can be shortened. have.

In the present invention, the following effects can be obtained.

(1) The field of view of the lens is divided into two areas, one for irradiating the transmitted illumination light and one for irradiating the reflected illumination light, and irradiating the reflected illumination light and the transmitted illumination light to each of the regions, respectively, to the imaging means provided correspondingly. Since it is comprised so that water may be received, both a transmission illumination image and a reflection illumination image can be obtained only by scanning an imaging means and an illumination means once.

(2) By using the same wavelength for the transmitted illumination light and the reflected illumination light, the lens can design in which only a specific wavelength is imaged, and the resolution of the image to be imaged can be improved.

(3) Since only one lens needs to be used and expensive lens materials do not need to be used, an increase in apparatus cost can be prevented.

Claims (5)

By irradiating the transparent illumination light which permeate | transmits the said board | substrate with the board | substrate with which the pattern was formed, and the reflected illumination light reflected by the said board | substrate, In the pattern inspection apparatus which acquires the transmission illumination image and the reflection illumination image of the said board | substrate, and judges the quality of the said pattern based on both images, One lens that enlarges and projects the region of the substrate to be inspected; Reflective illuminating means for irradiating reflected illumination light to a first region which is part of a substrate region within the field of view of the lens; Transmission illumination means for irradiating transmission illumination light to a second region, which is another region of the substrate region within the field of view of the lens; First imaging means illuminated by said reflective illuminating means and for imaging a first area enlarged by said lens; Second imaging means for imaging the second area illuminated by the transmission illumination means and enlarged by the lens; And a moving means for relatively moving said substrate, said two imaging means, and said lens in parallel in the direction in which said first region and said second region are aligned. The method according to claim 1, The said board | substrate is a long strip | belt-shaped TAB tape in which the wiring pattern by metal was formed on the resin film, The said moving means is a conveyance mechanism which conveys the said TAB tape to a tape longitudinal direction, The pattern inspection apparatus characterized by the above-mentioned. The method according to claim 1, The said board | substrate is a long strip | belt-shaped TAB tape in which the wiring pattern by metal was formed on the resin film, And the moving means is an imaging and lens unit moving mechanism which moves the two imaging means and the lens integrally in the longitudinal direction of the TAB tape. The method according to claim 1, The said board | substrate is a long strip | belt-shaped TAB tape in which the wiring pattern by metal was formed on the resin film, And the moving means is an imaging and lens unit moving mechanism which moves the two imaging means and the lens integrally in the width direction of the TAB tape. The method according to claim 1, 2, 3 or 4, The wavelength of the reflection illumination light irradiated by the said reflection illumination means, and the wavelength of the transmission illumination light irradiated by the said transmission illumination means are the same wavelength, The pattern inspection apparatus characterized by the above-mentioned.

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