KR20060118406A - 전구체 페이스트 및 그의 제조 방법 - Google Patents

전구체 페이스트 및 그의 제조 방법 Download PDF

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Publication number
KR20060118406A
KR20060118406A KR1020067003498A KR20067003498A KR20060118406A KR 20060118406 A KR20060118406 A KR 20060118406A KR 1020067003498 A KR1020067003498 A KR 1020067003498A KR 20067003498 A KR20067003498 A KR 20067003498A KR 20060118406 A KR20060118406 A KR 20060118406A
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KR
South Korea
Prior art keywords
paste
mold
lip
photosensitive
pattern
Prior art date
Application number
KR1020067003498A
Other languages
English (en)
Korean (ko)
Inventor
치까후미 요꼬야마
Original Assignee
쓰리엠 이노베이티브 프로퍼티즈 컴파니
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 쓰리엠 이노베이티브 프로퍼티즈 컴파니 filed Critical 쓰리엠 이노베이티브 프로퍼티즈 컴파니
Publication of KR20060118406A publication Critical patent/KR20060118406A/ko

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Gas-Filled Discharge Tubes (AREA)
  • Conductive Materials (AREA)
  • Casting Or Compression Moulding Of Plastics Or The Like (AREA)
  • Surface Treatment Of Glass (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
KR1020067003498A 2003-08-22 2004-08-17 전구체 페이스트 및 그의 제조 방법 KR20060118406A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2003-00208442 2003-08-22
JP2003208442A JP2005068181A (ja) 2003-08-22 2003-08-22 微細構造体前駆ペースト、微細構造体及びその製造方法

Publications (1)

Publication Number Publication Date
KR20060118406A true KR20060118406A (ko) 2006-11-23

Family

ID=34208978

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020067003498A KR20060118406A (ko) 2003-08-22 2004-08-17 전구체 페이스트 및 그의 제조 방법

Country Status (7)

Country Link
EP (1) EP1656589A2 (zh)
JP (2) JP2005068181A (zh)
KR (1) KR20060118406A (zh)
CN (1) CN1839352A (zh)
CA (1) CA2536520A1 (zh)
TW (1) TW200513794A (zh)
WO (1) WO2005019934A2 (zh)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7442336B2 (en) 2003-08-21 2008-10-28 Molecular Imprints, Inc. Capillary imprinting technique
US7019819B2 (en) 2002-11-13 2006-03-28 Molecular Imprints, Inc. Chucking system for modulating shapes of substrates
JP2008511124A (ja) 2004-08-26 2008-04-10 スリーエム イノベイティブ プロパティズ カンパニー テンプレートで微細構造を形成する方法
US7478791B2 (en) 2005-04-15 2009-01-20 3M Innovative Properties Company Flexible mold comprising cured polymerizable resin composition
EP1958025B1 (en) * 2005-12-08 2011-05-18 Molecular Imprints, Inc. Method for expelling gas positioned between a substrate and a mold
KR102601648B1 (ko) 2017-02-20 2023-11-14 삼성전자주식회사 감광성 조성물, 이를 제조하기 위한 방법, 및 이로부터 제조된 양자점-폴리머 복합체 패턴
JP2019019673A (ja) * 2017-07-11 2019-02-07 日立オートモティブシステムズ株式会社 ポンプ

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2738393B1 (fr) * 1995-09-06 2000-03-24 Kyocera Corp Substrat d'affichage a plasma et procede pour sa fabrication
JP3699336B2 (ja) * 2000-06-08 2005-09-28 スリーエム イノベイティブ プロパティズ カンパニー プラズマディスプレイパネル基板用リブの製造方法

Also Published As

Publication number Publication date
JP2005068181A (ja) 2005-03-17
WO2005019934A3 (en) 2005-06-02
EP1656589A2 (en) 2006-05-17
TW200513794A (en) 2005-04-16
JP2007503604A (ja) 2007-02-22
CA2536520A1 (en) 2005-03-03
CN1839352A (zh) 2006-09-27
WO2005019934A2 (en) 2005-03-03

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