TW200513794A - Precursor paste and method of producing the same - Google Patents

Precursor paste and method of producing the same

Info

Publication number
TW200513794A
TW200513794A TW093125238A TW93125238A TW200513794A TW 200513794 A TW200513794 A TW 200513794A TW 093125238 A TW093125238 A TW 093125238A TW 93125238 A TW93125238 A TW 93125238A TW 200513794 A TW200513794 A TW 200513794A
Authority
TW
Taiwan
Prior art keywords
paste
producing
same
fine
based compound
Prior art date
Application number
TW093125238A
Other languages
Chinese (zh)
Inventor
Chikafumi Yokoyama
Original Assignee
3M Innovative Properties Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 3M Innovative Properties Co filed Critical 3M Innovative Properties Co
Publication of TW200513794A publication Critical patent/TW200513794A/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Gas-Filled Discharge Tubes (AREA)
  • Conductive Materials (AREA)
  • Casting Or Compression Moulding Of Plastics Or The Like (AREA)
  • Surface Treatment Of Glass (AREA)
  • Compositions Of Macromolecular Compounds (AREA)

Abstract

To provide a fine structure precursor paste that allows it to produce PDP ribs or other fine structures with high aspect ratio and high accuracy without causing pattern deformation or other defects. The photosensitive paste comprises a photosensitive material, fine ceramic particles dispersed as primary particles in the paste, and a surfactant comprising a phosphorus based compound and a sulfonate-based compound.
TW093125238A 2003-08-22 2004-08-20 Precursor paste and method of producing the same TW200513794A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003208442A JP2005068181A (en) 2003-08-22 2003-08-22 Precursor paste of microstructure, microstructure and method for producing the same

Publications (1)

Publication Number Publication Date
TW200513794A true TW200513794A (en) 2005-04-16

Family

ID=34208978

Family Applications (1)

Application Number Title Priority Date Filing Date
TW093125238A TW200513794A (en) 2003-08-22 2004-08-20 Precursor paste and method of producing the same

Country Status (7)

Country Link
EP (1) EP1656589A2 (en)
JP (2) JP2005068181A (en)
KR (1) KR20060118406A (en)
CN (1) CN1839352A (en)
CA (1) CA2536520A1 (en)
TW (1) TW200513794A (en)
WO (1) WO2005019934A2 (en)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7442336B2 (en) 2003-08-21 2008-10-28 Molecular Imprints, Inc. Capillary imprinting technique
US7019819B2 (en) 2002-11-13 2006-03-28 Molecular Imprints, Inc. Chucking system for modulating shapes of substrates
KR20070056116A (en) 2004-08-26 2007-05-31 쓰리엠 이노베이티브 프로퍼티즈 컴파니 Method of forming microstructures with a template
US7478791B2 (en) 2005-04-15 2009-01-20 3M Innovative Properties Company Flexible mold comprising cured polymerizable resin composition
KR101293059B1 (en) 2005-12-08 2013-08-05 몰레큘러 임프린츠 인코퍼레이티드 Method for expelling gas positioned between a substrate and a mold
US10670962B2 (en) 2017-02-20 2020-06-02 Samsung Electronics Co., Ltd. Photosensitive compositions, preparation methods thereof, and quantum dot polymer composite pattern produced therefrom
JP2019019673A (en) * 2017-07-11 2019-02-07 日立オートモティブシステムズ株式会社 pump

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2738393B1 (en) * 1995-09-06 2000-03-24 Kyocera Corp PLASMA DISPLAY SUBSTRATE AND METHOD FOR THE PRODUCTION THEREOF
JP3699336B2 (en) * 2000-06-08 2005-09-28 スリーエム イノベイティブ プロパティズ カンパニー Manufacturing method of rib for plasma display panel substrate

Also Published As

Publication number Publication date
KR20060118406A (en) 2006-11-23
JP2005068181A (en) 2005-03-17
EP1656589A2 (en) 2006-05-17
CN1839352A (en) 2006-09-27
WO2005019934A2 (en) 2005-03-03
CA2536520A1 (en) 2005-03-03
WO2005019934A3 (en) 2005-06-02
JP2007503604A (en) 2007-02-22

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