KR20060049618A - 표면 개질된 실리카 겔 - Google Patents
표면 개질된 실리카 겔 Download PDFInfo
- Publication number
- KR20060049618A KR20060049618A KR1020050051847A KR20050051847A KR20060049618A KR 20060049618 A KR20060049618 A KR 20060049618A KR 1020050051847 A KR1020050051847 A KR 1020050051847A KR 20050051847 A KR20050051847 A KR 20050051847A KR 20060049618 A KR20060049618 A KR 20060049618A
- Authority
- KR
- South Korea
- Prior art keywords
- silica gel
- modified silica
- formula
- surface modified
- alkyl
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical class O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims abstract description 192
- 238000000576 coating method Methods 0.000 claims abstract description 92
- 239000011248 coating agent Substances 0.000 claims abstract description 90
- 239000000463 material Substances 0.000 claims abstract description 73
- 238000000034 method Methods 0.000 claims abstract description 47
- 239000006224 matting agent Substances 0.000 claims abstract description 40
- 229910002027 silica gel Inorganic materials 0.000 claims description 67
- 239000000741 silica gel Substances 0.000 claims description 67
- 239000000017 hydrogel Substances 0.000 claims description 36
- 239000002966 varnish Substances 0.000 claims description 31
- 239000002245 particle Substances 0.000 claims description 27
- 238000001035 drying Methods 0.000 claims description 24
- 230000008569 process Effects 0.000 claims description 22
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 13
- 239000000203 mixture Substances 0.000 claims description 13
- 229920000642 polymer Polymers 0.000 claims description 13
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 12
- 125000000217 alkyl group Chemical group 0.000 claims description 12
- 239000003795 chemical substances by application Substances 0.000 claims description 12
- 239000003973 paint Substances 0.000 claims description 12
- -1 alkoxy radical Chemical class 0.000 claims description 10
- 229910052799 carbon Inorganic materials 0.000 claims description 10
- 238000005498 polishing Methods 0.000 claims description 10
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 8
- 239000000839 emulsion Substances 0.000 claims description 7
- 239000008199 coating composition Substances 0.000 claims description 6
- 238000009472 formulation Methods 0.000 claims description 5
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims description 4
- WCYWZMWISLQXQU-UHFFFAOYSA-N methyl Chemical compound [CH3] WCYWZMWISLQXQU-UHFFFAOYSA-N 0.000 claims description 4
- 239000002518 antifoaming agent Substances 0.000 claims description 2
- 238000004519 manufacturing process Methods 0.000 claims description 2
- 229920002379 silicone rubber Polymers 0.000 claims description 2
- 239000004945 silicone rubber Substances 0.000 claims description 2
- 239000007921 spray Substances 0.000 claims description 2
- 239000004033 plastic Substances 0.000 claims 1
- 239000012744 reinforcing agent Substances 0.000 claims 1
- 239000000499 gel Substances 0.000 abstract description 16
- 238000002360 preparation method Methods 0.000 abstract description 14
- 230000004048 modification Effects 0.000 abstract description 11
- 238000012986 modification Methods 0.000 abstract description 11
- 238000005259 measurement Methods 0.000 description 66
- DOIRQSBPFJWKBE-UHFFFAOYSA-N dibutyl phthalate Chemical compound CCCCOC(=O)C1=CC=CC=C1C(=O)OCCCC DOIRQSBPFJWKBE-UHFFFAOYSA-N 0.000 description 40
- 239000000523 sample Substances 0.000 description 29
- 239000011521 glass Substances 0.000 description 25
- 239000000377 silicon dioxide Substances 0.000 description 24
- 239000000725 suspension Substances 0.000 description 23
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 23
- 238000012360 testing method Methods 0.000 description 22
- 239000000047 product Substances 0.000 description 18
- 230000000052 comparative effect Effects 0.000 description 16
- 239000011148 porous material Substances 0.000 description 14
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 12
- 238000009826 distribution Methods 0.000 description 11
- 239000004698 Polyethylene Substances 0.000 description 9
- 239000008367 deionised water Substances 0.000 description 9
- 229910021641 deionized water Inorganic materials 0.000 description 9
- 230000000694 effects Effects 0.000 description 9
- 239000013049 sediment Substances 0.000 description 9
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 8
- 238000010521 absorption reaction Methods 0.000 description 8
- 239000007788 liquid Substances 0.000 description 8
- 238000003756 stirring Methods 0.000 description 8
- 238000002845 discoloration Methods 0.000 description 7
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 6
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 230000006399 behavior Effects 0.000 description 6
- 239000002244 precipitate Substances 0.000 description 6
- 238000010079 rubber tapping Methods 0.000 description 6
- 239000000126 substance Substances 0.000 description 6
- 238000001704 evaporation Methods 0.000 description 5
- 230000013011 mating Effects 0.000 description 5
- 238000004062 sedimentation Methods 0.000 description 5
- 239000002904 solvent Substances 0.000 description 5
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 4
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 4
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 4
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 4
- 239000004964 aerogel Substances 0.000 description 4
- 238000004458 analytical method Methods 0.000 description 4
- 230000008901 benefit Effects 0.000 description 4
- 125000004432 carbon atom Chemical group C* 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 4
- 238000012937 correction Methods 0.000 description 4
- 230000008020 evaporation Effects 0.000 description 4
- 239000000976 ink Substances 0.000 description 4
- 238000000926 separation method Methods 0.000 description 4
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 4
- 230000004580 weight loss Effects 0.000 description 4
- VXKUOGVOWWPRNM-UHFFFAOYSA-N 3-ethoxypropyl acetate Chemical compound CCOCCCOC(C)=O VXKUOGVOWWPRNM-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 3
- 241000612182 Rexea solandri Species 0.000 description 3
- 239000004115 Sodium Silicate Substances 0.000 description 3
- 229910000831 Steel Inorganic materials 0.000 description 3
- 239000007853 buffer solution Substances 0.000 description 3
- BTANRVKWQNVYAZ-UHFFFAOYSA-N butan-2-ol Chemical compound CCC(C)O BTANRVKWQNVYAZ-UHFFFAOYSA-N 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- 238000011156 evaluation Methods 0.000 description 3
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 3
- 239000004615 ingredient Substances 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- 239000003607 modifier Substances 0.000 description 3
- 238000001139 pH measurement Methods 0.000 description 3
- 229910052911 sodium silicate Inorganic materials 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- 239000010959 steel Substances 0.000 description 3
- 239000008096 xylene Substances 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- WCUXLLCKKVVCTQ-UHFFFAOYSA-M Potassium chloride Chemical compound [Cl-].[K+] WCUXLLCKKVVCTQ-UHFFFAOYSA-M 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 229920000180 alkyd Polymers 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- 229910021529 ammonia Inorganic materials 0.000 description 2
- 239000007900 aqueous suspension Substances 0.000 description 2
- 238000003556 assay Methods 0.000 description 2
- 239000011230 binding agent Substances 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 238000002485 combustion reaction Methods 0.000 description 2
- 239000013068 control sample Substances 0.000 description 2
- 239000002274 desiccant Substances 0.000 description 2
- 238000000227 grinding Methods 0.000 description 2
- 238000000265 homogenisation Methods 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 229910052809 inorganic oxide Inorganic materials 0.000 description 2
- 239000004922 lacquer Substances 0.000 description 2
- 230000031700 light absorption Effects 0.000 description 2
- 230000007246 mechanism Effects 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 238000011022 operating instruction Methods 0.000 description 2
- 125000005375 organosiloxane group Chemical group 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000012071 phase Substances 0.000 description 2
- 229920000058 polyacrylate Polymers 0.000 description 2
- 229920000573 polyethylene Polymers 0.000 description 2
- 239000004814 polyurethane Substances 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 239000002243 precursor Substances 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 238000009938 salting Methods 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 238000012546 transfer Methods 0.000 description 2
- 230000000007 visual effect Effects 0.000 description 2
- 239000011800 void material Substances 0.000 description 2
- 239000003039 volatile agent Substances 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- OAYXUHPQHDHDDZ-UHFFFAOYSA-N 2-(2-butoxyethoxy)ethanol Chemical compound CCCCOCCOCCO OAYXUHPQHDHDDZ-UHFFFAOYSA-N 0.000 description 1
- RNAMYOYQYRYFQY-UHFFFAOYSA-N 2-(4,4-difluoropiperidin-1-yl)-6-methoxy-n-(1-propan-2-ylpiperidin-4-yl)-7-(3-pyrrolidin-1-ylpropoxy)quinazolin-4-amine Chemical compound N1=C(N2CCC(F)(F)CC2)N=C2C=C(OCCCN3CCCC3)C(OC)=CC2=C1NC1CCN(C(C)C)CC1 RNAMYOYQYRYFQY-UHFFFAOYSA-N 0.000 description 1
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 1
- XHMWPVBQGARKQM-UHFFFAOYSA-N 3-ethoxy-1-propanol Chemical compound CCOCCCO XHMWPVBQGARKQM-UHFFFAOYSA-N 0.000 description 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 1
- 229910002012 Aerosil® Inorganic materials 0.000 description 1
- 241000282461 Canis lupus Species 0.000 description 1
- 229920000742 Cotton Polymers 0.000 description 1
- 229920003270 Cymel® Polymers 0.000 description 1
- 241000282326 Felis catus Species 0.000 description 1
- 238000004566 IR spectroscopy Methods 0.000 description 1
- 239000000020 Nitrocellulose Substances 0.000 description 1
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000004721 Polyphenylene oxide Substances 0.000 description 1
- 239000006096 absorbing agent Substances 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 230000032683 aging Effects 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 235000013405 beer Nutrition 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- 239000004359 castor oil Substances 0.000 description 1
- 235000019438 castor oil Nutrition 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 238000005253 cladding Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 239000007822 coupling agent Substances 0.000 description 1
- 238000013016 damping Methods 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- OYQYHJRSHHYEIG-UHFFFAOYSA-N ethyl carbamate;urea Chemical class NC(N)=O.CCOC(N)=O OYQYHJRSHHYEIG-UHFFFAOYSA-N 0.000 description 1
- 238000013210 evaluation model Methods 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 238000011049 filling Methods 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 230000004927 fusion Effects 0.000 description 1
- 238000001879 gelation Methods 0.000 description 1
- ZEMPKEQAKRGZGQ-XOQCFJPHSA-N glycerol triricinoleate Natural products CCCCCC[C@@H](O)CC=CCCCCCCCC(=O)OC[C@@H](COC(=O)CCCCCCCC=CC[C@@H](O)CCCCCC)OC(=O)CCCCCCCC=CC[C@H](O)CCCCCC ZEMPKEQAKRGZGQ-XOQCFJPHSA-N 0.000 description 1
- 238000000892 gravimetry Methods 0.000 description 1
- 125000005842 heteroatom Chemical group 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 230000002209 hydrophobic effect Effects 0.000 description 1
- 238000010348 incorporation Methods 0.000 description 1
- 239000006115 industrial coating Substances 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 239000010985 leather Substances 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- JDSHMPZPIAZGSV-UHFFFAOYSA-N melamine Chemical compound NC1=NC(N)=NC(N)=N1 JDSHMPZPIAZGSV-UHFFFAOYSA-N 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 229920001220 nitrocellulos Polymers 0.000 description 1
- 238000010899 nucleation Methods 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 239000006223 plastic coating Substances 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 229920005862 polyol Polymers 0.000 description 1
- 150000003077 polyols Chemical class 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 229910052573 porcelain Inorganic materials 0.000 description 1
- 239000001103 potassium chloride Substances 0.000 description 1
- 235000011164 potassium chloride Nutrition 0.000 description 1
- 235000019353 potassium silicate Nutrition 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 238000004321 preservation Methods 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
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- 206010037844 rash Diseases 0.000 description 1
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- 150000003839 salts Chemical class 0.000 description 1
- 238000005070 sampling Methods 0.000 description 1
- 238000010008 shearing Methods 0.000 description 1
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000011877 solvent mixture Substances 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000006228 supernatant Substances 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- 239000004408 titanium dioxide Substances 0.000 description 1
- ZSDSQXJSNMTJDA-UHFFFAOYSA-N trifluralin Chemical compound CCCN(CCC)C1=C([N+]([O-])=O)C=C(C(F)(F)F)C=C1[N+]([O-])=O ZSDSQXJSNMTJDA-UHFFFAOYSA-N 0.000 description 1
- 238000005303 weighing Methods 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
- 150000003738 xylenes Chemical class 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09C—TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
- C09C1/00—Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
- C09C1/28—Compounds of silicon
- C09C1/30—Silicic acid
- C09C1/3081—Treatment with organo-silicon compounds
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/14—Colloidal silica, e.g. dispersions, gels, sols
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
- C09D5/04—Thixotropic paints
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/40—Additives
- C09D7/42—Gloss-reducing agents
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/40—Additives
- C09D7/60—Additives non-macromolecular
- C09D7/61—Additives non-macromolecular inorganic
- C09D7/62—Additives non-macromolecular inorganic modified by treatment with other compounds
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/40—Additives
- C09D7/66—Additives characterised by particle size
- C09D7/68—Particle size between 100-1000 nm
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/40—Additives
- C09D7/66—Additives characterised by particle size
- C09D7/69—Particle size larger than 1000 nm
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/51—Particles with a specific particle size distribution
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/11—Powder tap density
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/12—Surface area
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/14—Pore volume
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/19—Oil-absorption capacity, e.g. DBP values
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/22—Rheological behaviour as dispersion, e.g. viscosity, sedimentation stability
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/40—Electric properties
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/34—Silicon-containing compounds
- C08K3/36—Silica
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K9/00—Use of pretreated ingredients
- C08K9/04—Ingredients treated with organic substances
- C08K9/06—Ingredients treated with organic substances with silicon-containing compounds
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Wood Science & Technology (AREA)
- Life Sciences & Earth Sciences (AREA)
- Materials Engineering (AREA)
- Inorganic Chemistry (AREA)
- Nanotechnology (AREA)
- Dispersion Chemistry (AREA)
- Silicon Compounds (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Paints Or Removers (AREA)
- Pigments, Carbon Blacks, Or Wood Stains (AREA)
- Inks, Pencil-Leads, Or Crayons (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102004029069.5 | 2004-06-16 | ||
| DE102004029069A DE102004029069A1 (de) | 2004-06-16 | 2004-06-16 | Oberflächenmodifizierte Silicagele |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| KR20060049618A true KR20060049618A (ko) | 2006-05-19 |
Family
ID=35079384
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020050051847A Ceased KR20060049618A (ko) | 2004-06-16 | 2005-06-16 | 표면 개질된 실리카 겔 |
Country Status (15)
| Country | Link |
|---|---|
| US (1) | US7612137B2 (enExample) |
| EP (1) | EP1607448A3 (enExample) |
| JP (1) | JP4886222B2 (enExample) |
| KR (1) | KR20060049618A (enExample) |
| CN (1) | CN1712455A (enExample) |
| AU (1) | AU2005202577B2 (enExample) |
| BR (1) | BRPI0502524A (enExample) |
| DE (1) | DE102004029069A1 (enExample) |
| IL (1) | IL169176A0 (enExample) |
| MX (1) | MXPA05006188A (enExample) |
| MY (1) | MY142515A (enExample) |
| NO (1) | NO20052964L (enExample) |
| RU (1) | RU2005118355A (enExample) |
| TW (1) | TW200604098A (enExample) |
| ZA (1) | ZA200504885B (enExample) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2010143902A3 (en) * | 2009-06-11 | 2011-03-17 | Korea Institute Of Energy Research | Aerogel mat and manufacturing method thereof and manufacturing device thereof |
| JP2013203804A (ja) * | 2012-03-27 | 2013-10-07 | Tokuyama Corp | エアロゲル及び該エアロゲルからなる艶消し剤 |
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| DE102004005411A1 (de) * | 2004-02-03 | 2005-08-18 | Degussa Ag | Hydrophobe Fällungskieselsäure für Entschäumerformulierungen |
| US7276156B2 (en) * | 2005-05-26 | 2007-10-02 | Tony Mason Lockerman | Storm drain filter |
| US7767180B2 (en) | 2006-05-26 | 2010-08-03 | Degussa Gmbh | Precipitated silicas having special surface properties |
| DE102006048850A1 (de) * | 2006-10-16 | 2008-04-17 | Evonik Degussa Gmbh | Amorphe submicron Partikel |
| DE102006024590A1 (de) * | 2006-05-26 | 2007-11-29 | Degussa Gmbh | Hydrophile Kieselsäure für Dichtungsmassen |
| DE102007025685A1 (de) * | 2007-06-01 | 2008-12-04 | Evonik Degussa Gmbh | RTV-Zweikomponenten-Silikonkautschuk |
| US8623140B2 (en) | 2007-07-25 | 2014-01-07 | 3M Innovative Properties Company | System and method for making a film having a matte finish |
| DE102007052269A1 (de) * | 2007-11-02 | 2009-05-07 | Evonik Degussa Gmbh | Fällungskieselsäuren für lagerstabile RTV-1 Siliconkautschukformulierungen ohne Stabilisator |
| US7985292B2 (en) | 2007-11-26 | 2011-07-26 | Evonik Degussa Corporation | Precipitated silica for thickening and creating thixotropic behavior in liquid systems |
| EP2244827A1 (en) * | 2007-12-12 | 2010-11-03 | All-Tech Associates Inc. | Metal oxide particles and methods of making and using the same |
| DE102008035867A1 (de) * | 2008-08-01 | 2010-02-04 | Evonik Degussa Gmbh | Neuartige Fällungskieselsäuren für Trägeranwendungen |
| DE102009045104A1 (de) | 2009-09-29 | 2011-03-31 | Evonik Degussa Gmbh | Neuartige Mattierungsmittel für UV-Lacke |
| DE102009045109A1 (de) | 2009-09-29 | 2011-03-31 | Evonik Degussa Gmbh | Oberflächenmodifizierte Semi-Gele |
| US20110244382A1 (en) | 2010-04-06 | 2011-10-06 | Christopher Alyson M | Hydrophobic silica particles and method of producing same |
| US9546285B2 (en) | 2010-11-18 | 2017-01-17 | Basf Coatings Gmbh | Polyurethane coating composition, multilayer surface coatings having a matt surface produced therefrom and processes for producing the multilayer surface coatings |
| WO2013148241A1 (en) | 2012-03-26 | 2013-10-03 | Cabot Corporation | Treated fumed silica |
| CN107614264B (zh) | 2014-12-05 | 2020-02-04 | 佛罗里达大学研究基金会有限公司 | 使用相变材料作为支撑体的3d打印 |
| WO2016130953A1 (en) | 2015-02-13 | 2016-08-18 | University Of Florida Research Foundation, Inc. | High speed 3d printing system for wound and tissue replacement |
| US11390835B2 (en) | 2015-05-08 | 2022-07-19 | University Of Florida Research Foundation, Inc. | Growth media for three-dimensional cell culture |
| US11027483B2 (en) | 2015-09-03 | 2021-06-08 | University Of Florida Research Foundation, Inc. | Valve incorporating temporary phase change material |
| WO2017096263A1 (en) | 2015-12-04 | 2017-06-08 | University Of Florida Research Foundation, Incorporated | Crosslinkable or functionalizable polymers for 3d printing of soft materials |
| CN106470505A (zh) * | 2016-07-29 | 2017-03-01 | 李哲元 | 节能环保耐高温型远红外线保健半导体发热浆料 |
| JP6166440B2 (ja) * | 2016-08-26 | 2017-07-19 | 株式会社トクヤマ | エアロゲル及び該エアロゲルからなる艶消し剤 |
| US11124644B2 (en) | 2016-09-01 | 2021-09-21 | University Of Florida Research Foundation, Inc. | Organic microgel system for 3D printing of silicone structures |
| WO2020159916A1 (en) * | 2019-02-01 | 2020-08-06 | W.R. Grace & Co.-Conn. | Silica-based matting agents and methods of making and using the same |
| US11370937B2 (en) * | 2019-03-04 | 2022-06-28 | Momentive Performance Materials Inc. | Protective coating composition and coated metallic substrate comprising same |
| JP7322156B2 (ja) * | 2019-09-30 | 2023-08-07 | エルジー・ケム・リミテッド | シリカゾル、これを用いて製造したシリカエアロゲルブランケットおよびその製造方法 |
| JP7473291B2 (ja) * | 2020-05-18 | 2024-04-23 | 関西ペイント株式会社 | 艶消し塗料組成物 |
| EP3995320A1 (de) * | 2020-11-09 | 2022-05-11 | Continental Reifen Deutschland GmbH | Energieeffizientes lösungsmittelfreies verfahren zur organosilanisierung von silikat- und siliciumdioxid-materialien |
| US11773234B2 (en) * | 2021-02-09 | 2023-10-03 | Pq, Llc | Silica gel as reinforcement agent for rubber compounds |
| KR20240088921A (ko) * | 2021-10-13 | 2024-06-20 | 그레이스 게엠베하 | 소광제 및 이를 함유하는 폴리우레탄 코팅 조성물 |
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| US4097302A (en) * | 1976-02-17 | 1978-06-27 | Scm Corporation | Flatting agents |
| JPS54101795A (en) * | 1978-01-30 | 1979-08-10 | Toyo Soda Mfg Co Ltd | Hydrophobic rendering method for oxide fine powder |
| JPS61148284A (ja) * | 1984-12-21 | 1986-07-05 | Toray Silicone Co Ltd | 固体材料処理剤 |
| NZ232095A (en) * | 1989-02-15 | 1992-01-29 | Grace W R & Co | Flatting agent produced by milling a hydrous inorganic oxide hydrogel |
| DE4041827A1 (de) | 1990-12-24 | 1992-07-02 | Degussa | Faellungskieselsaeurepaste |
| DE4202023A1 (de) | 1992-01-25 | 1993-07-29 | Degussa | Haftpromoter fuer kautschuk- und kunststoffmischungen |
| JPH07207187A (ja) * | 1994-01-17 | 1995-08-08 | Nippon Unicar Co Ltd | シリルアルキル基とポリオキシアルキレン基とを有する反応性オルガノポリシロキサンで表面処理された無機粉体およびそれを含有する化粧料 |
| JP3261903B2 (ja) * | 1994-11-29 | 2002-03-04 | 三菱マテリアル株式会社 | 高分散性疎水性金属酸化物粉体およびその製造方法 |
| JPH0930810A (ja) * | 1995-07-20 | 1997-02-04 | Nippon Silica Ind Co Ltd | 表面処理したシリカゲルの製造方法 |
| DE19527278A1 (de) | 1995-07-26 | 1997-01-30 | Degussa | Fällungskieselsäure |
| JPH09157545A (ja) * | 1995-12-08 | 1997-06-17 | Nippon Paint Co Ltd | 塗料用艶消し剤、艶消し塗料組成物および艶消し塗膜 |
| IN191468B (enExample) * | 1996-03-29 | 2003-12-06 | Degussa | |
| US6191122B1 (en) | 1996-03-29 | 2001-02-20 | DEGUSSA HüLS AKTIENGESELLSCHAFT | Partially hydrophobic precipitated silicas |
| US5807501A (en) * | 1997-02-20 | 1998-09-15 | Dow Corning Corporation | Neutral-aged hydrophobic organosilicate-modified silica gels |
| US5750610A (en) * | 1997-02-24 | 1998-05-12 | Dow Corning Corporation | Hydrophobic organosilicate-modified silica gels |
| JP4904567B2 (ja) * | 2000-11-15 | 2012-03-28 | 日本アエロジル株式会社 | 非晶質微細シリカ粒子とその用途 |
| DE10058616A1 (de) | 2000-11-25 | 2002-05-29 | Degussa | Fällungskieselsäuren mit hoher Struktur |
| JP2003020218A (ja) * | 2001-07-02 | 2003-01-24 | Matsushita Electric Ind Co Ltd | 疎水化乾燥ゲルの製造方法およびそれを用いた断熱材 |
| DE10138492A1 (de) | 2001-08-04 | 2003-02-13 | Degussa | Hydrophobe, nicht getemperte Fällungskieselsäure mit hohem Weißgrad |
| DE10138490A1 (de) | 2001-08-04 | 2003-02-13 | Degussa | Hydrophobe Fällungskieselsäure mit hohem Weißgrad und extrem niedriger Feuchtigkeitsaufnahme |
| DE10138491A1 (de) | 2001-08-04 | 2003-02-13 | Degussa | Verfahren zur Herstellung einer hydrophoben Fällungskieselsäure mit hohem Weißgrad und extrem niedriger Feuchtigkeitsaufnahme |
| EP1295906A1 (de) | 2001-09-20 | 2003-03-26 | Degussa AG | Silikonkautschukformulierungen mit hydrophoben Kieselsäuren |
| JP2003192330A (ja) * | 2001-10-18 | 2003-07-09 | Mitsubishi Chemicals Corp | シリカゲル組成物並びにこれを用いた樹脂充填剤，樹脂組成物及び樹脂成型体 |
| DE10203500A1 (de) | 2002-01-30 | 2003-08-07 | Degussa | Raumtemperaturvernetzende Einkomponenten-Silikonkautschukformulierungen mit hydrophoben Kieselsäuren |
| BR0317453A (pt) * | 2002-12-18 | 2005-11-16 | Degussa | Sìlica estruturada, tipo aerogel de superfìcie modificada |
| ES2290625T3 (es) * | 2003-05-14 | 2008-02-16 | Evonik Degussa Gmbh | Silices de precipitacion modificadas en la superficie. |
| DE102004005409A1 (de) | 2004-02-03 | 2005-08-18 | Degussa Ag | Hydrophile Fällungskieselsäure für Entschäumerformulierungen |
| DE102004005411A1 (de) | 2004-02-03 | 2005-08-18 | Degussa Ag | Hydrophobe Fällungskieselsäure für Entschäumerformulierungen |
| DE102004029073A1 (de) * | 2004-06-16 | 2005-12-29 | Degussa Ag | Lackformulierung mit verbesserten rheologischen Eigenschaften |
| US7767180B2 (en) | 2006-05-26 | 2010-08-03 | Degussa Gmbh | Precipitated silicas having special surface properties |
| DE102006024590A1 (de) | 2006-05-26 | 2007-11-29 | Degussa Gmbh | Hydrophile Kieselsäure für Dichtungsmassen |
| DE102006048850A1 (de) | 2006-10-16 | 2008-04-17 | Evonik Degussa Gmbh | Amorphe submicron Partikel |
-
2004
- 2004-06-16 DE DE102004029069A patent/DE102004029069A1/de not_active Ceased
-
2005
- 2005-04-21 EP EP05103230A patent/EP1607448A3/de not_active Withdrawn
- 2005-05-19 US US11/132,293 patent/US7612137B2/en not_active Expired - Fee Related
- 2005-06-09 MX MXPA05006188A patent/MXPA05006188A/es active IP Right Grant
- 2005-06-10 TW TW094119401A patent/TW200604098A/zh unknown
- 2005-06-14 JP JP2005174051A patent/JP4886222B2/ja not_active Expired - Fee Related
- 2005-06-14 MY MYPI20052692A patent/MY142515A/en unknown
- 2005-06-14 AU AU2005202577A patent/AU2005202577B2/en not_active Ceased
- 2005-06-15 RU RU2005118355/15A patent/RU2005118355A/ru not_active Application Discontinuation
- 2005-06-15 IL IL169176A patent/IL169176A0/en unknown
- 2005-06-15 CN CNA2005100764374A patent/CN1712455A/zh active Pending
- 2005-06-15 ZA ZA200504885A patent/ZA200504885B/en unknown
- 2005-06-16 KR KR1020050051847A patent/KR20060049618A/ko not_active Ceased
- 2005-06-16 BR BR0502524-9A patent/BRPI0502524A/pt not_active Application Discontinuation
- 2005-06-16 NO NO20052964A patent/NO20052964L/no not_active Application Discontinuation
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2010143902A3 (en) * | 2009-06-11 | 2011-03-17 | Korea Institute Of Energy Research | Aerogel mat and manufacturing method thereof and manufacturing device thereof |
| KR101047965B1 (ko) * | 2009-06-11 | 2011-07-12 | 한국에너지기술연구원 | 에어로겔 매트, 이의 제조방법 및 제조장치 |
| US8663739B2 (en) | 2009-06-11 | 2014-03-04 | Korea Institute Of Energy Research | Aerogel mat and manufacturing method thereof |
| JP2013203804A (ja) * | 2012-03-27 | 2013-10-07 | Tokuyama Corp | エアロゲル及び該エアロゲルからなる艶消し剤 |
Also Published As
| Publication number | Publication date |
|---|---|
| BRPI0502524A (pt) | 2006-02-07 |
| NO20052964L (no) | 2005-12-19 |
| MXPA05006188A (es) | 2005-12-20 |
| NO20052964D0 (no) | 2005-06-16 |
| US7612137B2 (en) | 2009-11-03 |
| EP1607448A3 (de) | 2010-11-17 |
| JP2006001832A (ja) | 2006-01-05 |
| RU2005118355A (ru) | 2006-12-20 |
| MY142515A (en) | 2010-12-15 |
| US20050282934A1 (en) | 2005-12-22 |
| AU2005202577B2 (en) | 2010-09-16 |
| JP4886222B2 (ja) | 2012-02-29 |
| ZA200504885B (en) | 2006-04-26 |
| EP1607448A2 (de) | 2005-12-21 |
| DE102004029069A1 (de) | 2005-12-29 |
| IL169176A0 (en) | 2009-02-11 |
| AU2005202577A1 (en) | 2006-01-12 |
| TW200604098A (en) | 2006-02-01 |
| CN1712455A (zh) | 2005-12-28 |
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