KR20050067751A - Elevator rotation device and rotation method of loadlock chamber - Google Patents
Elevator rotation device and rotation method of loadlock chamber Download PDFInfo
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- KR20050067751A KR20050067751A KR1020030098765A KR20030098765A KR20050067751A KR 20050067751 A KR20050067751 A KR 20050067751A KR 1020030098765 A KR1020030098765 A KR 1020030098765A KR 20030098765 A KR20030098765 A KR 20030098765A KR 20050067751 A KR20050067751 A KR 20050067751A
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
- H01L21/67201—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the construction of the load-lock chamber
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
- H01L21/6773—Conveying cassettes, containers or carriers
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
- H01L21/67766—Mechanical parts of transfer devices
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
- H01L21/67778—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading involving loading and unloading of wafers
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- Condensed Matter Physics & Semiconductors (AREA)
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- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Robotics (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
본 발명은 로드락 챔버의 엘리베이터 회전장치 및 그 회전방법에 관한 것으로서, 로드락 챔버(10)의 내부에 소정 간격 이격 설치되어 엘리베이터(20)에 의하여 승하강 이동되는 상, 하부 씨일플레이트(16a)(16b)와, 하부 씨일플레이트(16b)와 엘리베이터(20)의 샤프트(22) 끝단에 설치되어 상부 씨일플레이트(16a)를 회전시킬 수 있는 회전수단(30)이 포함된다. 따라서 승하강 이동되는 엘리베이터에 회전수단을 설치함으로서, 일측면이 폐쇄된 웨이퍼카세트의 사용으로 웨이퍼의 슬라이딩 현상이 방지되며, 웨이퍼 트랜스 로봇이나 핸들러의 조정 기준 위치를 확인 할 수 있는 효과가 있다.The present invention relates to an elevator rotating apparatus of the load lock chamber and a method of rotating the upper and lower seal plates (16a) installed in the load lock chamber 10 spaced apart at a predetermined interval to move up and down by the elevator (20) 16b, a lower seal plate 16b and a rotating means 30 installed at the end of the shaft 22 of the elevator 20 to rotate the upper seal plate 16a are included. Therefore, by installing the rotating means in the elevator to move up and down, the sliding phenomenon of the wafer is prevented by using a wafer cassette with one side closed, there is an effect that can confirm the adjustment reference position of the wafer trans robot or handler.
Description
본 발명은 로드락 챔버의 엘리베이터 회전장치 및 그 회전방법에 관한 것으로서, 보다 상세하게는 회전 가능한 엘리베이터로 하여 슬라이딩 현상이 방지되는 웨이퍼카세트를 사용할 수 있는 로드락 챔버의 엘리베이터 회전장치 및 그 회전방법에 관한 것이다.The present invention relates to an elevator rotating apparatus of a load lock chamber and a rotating method thereof, and more particularly, to an elevator rotating apparatus and a rotating method of a load lock chamber which can use a wafer cassette in which a sliding phenomenon is prevented as a rotatable elevator. It is about.
로드락 챔버는 외부로부터 웨이퍼카세트에 웨이퍼가 장입 및 인출되는 반도체 제조 설비이다.The load lock chamber is a semiconductor manufacturing facility in which wafers are charged and withdrawn from the outside into the wafer cassette.
웨이퍼의 이동 방식은 SMIF장치에 패드를 적재하면 SMIF장치의 웨이퍼 트랜스 로봇이 웨이퍼를 로드락 엘리베이터의 독립적인 웨이퍼카세트 내에 적재하며, 웨이퍼 핸들링 챔버내의 웨이퍼 트랜스 아암이 로드락의 웨이퍼카세트 내에서 웨이퍼를 들고 프로세스챔버로 적재하는 것이다.The wafer movement method is to place a pad in the SMIF device, and the wafer trans robot of the SMIF device loads the wafer into an independent wafer cassette of the load lock elevator, and the wafer trans arm in the wafer handling chamber moves the wafer into the wafer cassette of the load lock. Lifting and loading into the process chamber.
도 1은 종래의 기술에 따른 로드락 챔버를 개략적으로 도시한 것으로서, 로드락 챔버(10)의 일측면에는 회전 개방되는 로드락 도어(12)가 설치되고, 타측면에는 웨이퍼 핸들링챔버(14)가 길이 방향으로 설치된다.1 is a schematic view of a load lock chamber according to the related art, in which a load lock door 12 is rotatably opened on one side of the load lock chamber 10, and the wafer handling chamber 14 is provided on the other side. Is installed in the longitudinal direction.
웨이퍼 핸들링챔버(14)의 내부에는 웨이퍼(W)를 들고 프로세스 챔버로 이동시키는 핸들러(15)가 설치된다. Inside the wafer handling chamber 14, a handler 15 is installed to pick up the wafer W and move it into the process chamber.
그리고 로드락 챔버(10)의 내부에는 웨이퍼카세트(1)가 장착되는 카세트 플레이트(18)가 설치되고, 카세트 플레이트(18)의 하면에 공간을 구획하는 씨일플레이트(16)가 가로 방향으로 설치된다. In the load lock chamber 10, a cassette plate 18 on which the wafer cassette 1 is mounted is installed, and a seal plate 16 partitioning a space on the lower surface of the cassette plate 18 is installed in the horizontal direction. .
그리고 씨일플레이트(16)의 하측으로는 샤프트(22)를 포함하는 엘리베이터(20)가 설치된다. 샤프트(22)에는 벨로우즈 씨일(24)이 설치된다.An elevator 20 including a shaft 22 is provided below the seal plate 16. The bellows seal 24 is installed in the shaft 22.
작동은, 엘리베이터(20)가 상승된 상태에서 로드락 도어(12)가 개방되고, 카세트 플레이트(18) 상에 올려져 있는 웨이퍼카세트(1)에 웨이퍼 트랜스 로봇(미도시)으로 하여 웨이퍼(W)를 적재시킨다. 이어서 프로세스 챔버로 웨이퍼를 이동시키기 위하여 웨이퍼카세트(1)의 각 슬롯마다 그 위치에 맞게 엘리베이터(20)가 승하강 동작을 한다. 위치 조정된 웨이퍼카세트(1)에서 핸들러(15)가 웨이퍼(W)를 추출하여 프로세스 챔버로 이동시킨다.The operation is performed by using a wafer trans robot (not shown) on the wafer cassette 1 mounted on the cassette plate 18 with the load lock door 12 open while the elevator 20 is raised. )). Subsequently, the elevator 20 moves up and down according to the position of each slot of the wafer cassette 1 to move the wafer into the process chamber. In the positioned wafer cassette 1, the handler 15 extracts the wafer W and moves it to the process chamber.
그런데 이와 같은 종래의 로드락 챔버(10)에서 사용되는 웨이퍼카세트(1)는 전면측으로 웨이퍼 트랜스 로봇이 진입할 수 있도록 개방되어 있으며, 후측으로는 핸들러(15)가 진입할 수 있도록 개방되어 있다.However, the wafer cassette 1 used in the conventional load lock chamber 10 is opened to allow the wafer trans robot to enter the front side, and to open the handler 15 to the rear side.
이로 인하여 웨이퍼카세트(1) 내의 웨이퍼(W)는 주변의 미세한 가스의 흐름이나 엘리베이터(20)의 구동에 의하여 슬라이딩 현상이 발생하기 쉬우며, 웨이퍼 트랜스 로봇이나 핸들러(15)의 위치 조정 기준이 없어서 대략 육안으로 확인하여 티칭(teaching)할 수밖에 없는 문제점이 있었다.As a result, the wafer W in the wafer cassette 1 is easily slid due to the flow of minute gas or driving of the elevator 20, and there is no reference for adjusting the position of the wafer trans robot or the handler 15. There was a problem that can only be confirmed by teaching (teaching) with the naked eye.
본 발명은 상술한 바와 같은 종래의 문제점을 해결하기 위한 것으로서, 승하강 이동되는 엘리베이터에 회전수단을 설치함으로서, 슬라이딩 현상이 방지되는 웨이퍼카세트를 사용할 수 있는 로드락 챔버의 엘리베이터 회전장치 및 그 회전방법을 제공하는데 그 목적이 있다. The present invention is to solve the conventional problems as described above, by installing a rotating means in the elevator to move up and down, elevator rotation apparatus of the load lock chamber which can use a wafer cassette to prevent the sliding phenomenon and its rotation method The purpose is to provide.
또한 본 발명의 다른 목적은, 일측면이 폐쇄된 웨이퍼카세트의 사용으로 웨이퍼 트랜스 로봇이나 핸들러의 조정 기준 위치를 확인 할 수 있는 로드락 챔버의 엘리베이터 회전장치 및 그 회전방법을 제공하는데 그 목적이 있다.Another object of the present invention is to provide an elevator rotating device and a rotating method of a load lock chamber capable of confirming an adjustment reference position of a wafer trans robot or handler by using a wafer cassette whose one side is closed. .
상기의 목적을 달성하기 위하여 본 발명은, 로드락 챔버의 엘리베이터에 있어서, 로드락 챔버의 내부에 소정 간격 이격 설치되어 엘리베이터에 의하여 승하강 이동되는 상, 하부 씨일플레이트와, 하부 씨일플레이트와 엘리베이터의 샤프트 끝단에 설치되어 상부 씨일플레이트를 회전시킬 수 있는 회전수단이 포함되는 로드락 챔버의 엘리베이터 회전장치를 제공한다.In order to achieve the above object, the present invention, in the elevator of the load lock chamber, installed in the load lock chamber spaced apart by a predetermined interval, the upper and lower seal plates, the lower seal plate and the lower seal plate of the elevator It is provided at the end of the shaft provides an elevator rotating device of the load lock chamber including a rotating means for rotating the upper seal plate.
또한, 본 발명은 로드락 챔버의 엘리베이터 회전방법에 있어서, 웨이퍼카세트를 로딩/언로딩시키기 위하여 로드락 도어 측으로 회전시키는 단계와, 로딩/언로딩이 완료된 웨이퍼카세트를 웨이퍼 핸들링챔버측으로 하강시키는 단계와, 웨이퍼카세트를 웨이퍼 핸들링챔버측으로 회전시키는 단계와, 웨이퍼 핸들링챔버에서 핸들러로 하여 웨이퍼를 로딩/언로딩하는 단계와, 웨이퍼의 로딩/언로딩이 완료되면, 엘리베이터의 구동으로 웨이퍼카세트가 상승하는 단계를 포함하는 로드락 챔버의 엘리베이터 회전방법을 제공한다.The present invention also provides a method of rotating an elevator in a load lock chamber, the method comprising: rotating a wafer cassette to a load lock door side for loading / unloading the wafer, and lowering the loaded / unloaded wafer cassette to the wafer handling chamber side; Rotating the wafer cassette toward the wafer handling chamber; loading / unloading the wafer as a handler in the wafer handling chamber; and loading / unloading of the wafer when the wafer is finished, raising the wafer cassette by driving the elevator. It provides an elevator rotation method of the load lock chamber comprising a.
이하 첨부된 도면을 참조하여 본 발명에 따른 바람직한 실시 예를 상세하게 설명한다. Hereinafter, exemplary embodiments of the present invention will be described in detail with reference to the accompanying drawings.
도 2는 본 발명에 따른 로드락 챔버의 엘리베이터 회전장치의 구성도이고, 도 3은 본 발명에 따른 로드락 챔버의 엘리베이터 회전장치의 작동도이고, 도 4는 본 발명에 따른 로드락 챔버의 엘리베이터 회전방법을 나타낸 흐름도이며, 선행기술에 도시된 실시예와 동일한 구성부재에 대해서는 도 1을 참조하여 동일한 도면 부호로서 설명한다.2 is a configuration diagram of the elevator rotation apparatus of the load lock chamber according to the present invention, Figure 3 is an operation of the elevator rotation apparatus of the load lock chamber according to the present invention, Figure 4 is an elevator of the load lock chamber according to the present invention It is a flowchart showing a rotation method, and the same structural member as the embodiment shown in the prior art is described with the same reference numeral with reference to FIG.
본 발명에 따른 로드락 챔버(10)는, 도 2에 도시된 바와 같이, 일측면에 회전 가능하게 설치되는 로드락 도어(12)와, 타측면에 길이 방향으로 설치되는 웨이퍼 핸들링챔버(14)와, 로드락챔버(10)의 내부에서 승하강 이동되는 엘리베이터(20)로 크게 구성된다.The load lock chamber 10 according to the present invention, as shown in Figure 2, the load lock door 12 is rotatably installed on one side, the wafer handling chamber 14 is installed in the longitudinal direction on the other side And an elevator 20 which is moved up and down inside the load lock chamber 10.
그리고 로드락 챔버(10)의 내부에는 웨이퍼카세트(50)가 안착되는 카세트 플레이트(18)가 설치되고, 카세트 플레이트(18)의 하부로는 상, 하부 씨일플레이트(16a)(16b)가 소정 간격으로 이격 설치된다.In the load lock chamber 10, a cassette plate 18 on which a wafer cassette 50 is seated is installed, and upper and lower seal plates 16a and 16b are disposed at a lower portion of the cassette plate 18 at predetermined intervals. Are spaced apart.
그리고 하부 씨일플레이트(16b)의 하측으로는 샤프트(22)를 포함하는 엘리베이터(20)가 설치된다. 샤프트(22) 상에는 벨로우즈 씨일(24)이 설치된다.An elevator 20 including a shaft 22 is installed below the lower seal plate 16b. The bellows seal 24 is installed on the shaft 22.
여기서 본 발명의 특징에 따라서 하부 씨일플레이트(16b)와 엘리베이터(20)의 샤프트(22) 끝단에 상부 씨일플레이트(16a)를 회전시킬 수 있는 회전수단(30)이 설치된다. Here, in accordance with a feature of the present invention, the lower seal plate 16b and the rotating means 30 capable of rotating the upper seal plate 16a at the end of the shaft 22 of the elevator 20 are installed.
회전수단(30)은, 하부 씨일플레이트(16b)의 하면에 정, 역회전 가능한 구동모터(31)가 고정 설치되며, 구동모터(31)와 연결되는 축하단에는 제 1 풀리(32)가 설치된다.Rotating means 30 is fixed to the lower seal plate (16b) the lower side of the drive motor 31 that can be rotated forward and reverse fixedly installed, the first end pulley 32 is installed in the shaft end connected to the drive motor (31). do.
그리고 하부 씨일플레이트(16b)에 관통되어, 하부 씨일플레이트(16b)를 고정시키는 메탈씨일(34)이 설치되며, 메틸씨일(34)의 내부로 회전 가능하게 관통되어, 상부 씨일플레이트(16a)에 고정 설치되는 씨일샤프트(36)가 축방향으로 설치된다.Then, a metal seal 34 penetrating the lower seal plate 16b and fixing the lower seal plate 16b is installed, and rotatably penetrates into the methyl seal 34 to allow the upper seal plate 16a. The seal shaft 36 fixedly installed at) is installed in the axial direction.
메틸씨일(34)과 씨일샤프트(36) 사이에는 미도시된 베어링이 포함되어 하부 씨일플레이트(16b)를 고정시키면서 씨일샤프트(36)만의 회전이 가능하다.A bearing not shown is included between the methyl seal 34 and the seal shaft 36 to rotate only the seal shaft 36 while fixing the lower seal plate 16b.
그리고 씨일샤프트(36)의 하단에는 제 2 풀리(33)가 설치되어 제 1 풀리(32)와 벨트(38)로 동력을 전달받게 된다.A second pulley 33 is installed at the lower end of the seal shaft 36 to receive power from the first pulley 32 and the belt 38.
또한, 제 2 풀리(33)의 내측으로는 베어링(39)이 설치되고, 이 베어링(39)에 엘리베이터(20)의 샤프트(22)가 연결 설치되어 샤프트(22)의 회전이 방지된다.In addition, a bearing 39 is provided inside the second pulley 33, and the shaft 22 of the elevator 20 is connected to the bearing 39 to prevent rotation of the shaft 22.
한편, 이와 같은 구성으로 하여 일측면이 폐쇄되어 있는 웨이퍼카세트(50)를 사용할 수 있다.On the other hand, the wafer cassette 50 whose one side is closed by such a structure can be used.
이와 같이 구성된 본 발명에 따른 로드락 챔버의 엘리베이터 회전방법은 다음과 같다.Elevator rotation method of the load lock chamber according to the present invention configured as described above is as follows.
도 4를 참조하면, 웨이퍼카세트(50)를 로딩/언로딩시키기 위하여 로드락 도어(12) 측으로 회전시키는 단계(100)와, 로딩/언로딩된 웨이퍼카세트(50)를 웨이퍼 핸들링챔버(14)측으로 하강시키는 단계(200)와, 웨이퍼카세트(50)를 웨이퍼 핸들링챔버(14)측으로 회전시키는 단계(300)와, 웨이퍼 핸들링챔버(14)에서 핸들러(15)로 하여 웨이퍼(W)를 로딩/언로딩하는 단계(400)와, 웨이퍼(W)의 로딩/언로딩이 완료되면, 엘리베이터(20)의 구동으로 웨이퍼카세트(50)가 상승하는 단계(500)를 포함한다.Referring to FIG. 4, a step 100 of rotating the wafer cassette 50 toward the load lock door 12 in order to load / unload the wafer cassette 50, and load / unload the wafer cassette 50 to the wafer handling chamber 14. Lowering the side 200, rotating the wafer cassette 50 to the wafer handling chamber 14 side 300, and loading the wafer W as the handler 15 in the wafer handling chamber 14; Unloading step 400, and when the loading / unloading of the wafer (W) is completed, the wafer cassette 50 is driven (500) by the drive of the elevator (20).
이와 같은 구동을 도 3을 참고하여 좀더 자세히 설명하면, 엘리베이터(20)는 웨이퍼카세트(50)가 올려져 있는 카세트 플레이트(18)와, 상, 하부 씨일플레이트(16a)(16b)를 상승시키고, 그 상태에서 로드락 도어(12)가 개방된다.3, the elevator 20 raises the cassette plate 18 on which the wafer cassette 50 is placed, and the upper and lower seal plates 16a and 16b. In that state, the load lock door 12 is opened.
이때, 회전수단(30)은 상부 씨일플레이트(16a)를 회전시켜 웨이퍼카세트(50)의 개방부를 로드락 도어(12)측으로 향하게 한다. 즉, 구동모터(31)에 전원이 인가되면, 제 1 풀리(32)가 회전하고 그 동력이 벨트(38)를 통하여 제 2 풀리(33)에 전달된다.At this time, the rotating means 30 rotates the upper seal plate 16a to direct the opening of the wafer cassette 50 toward the load lock door 12 side. That is, when power is applied to the drive motor 31, the first pulley 32 rotates and the power is transmitted to the second pulley 33 through the belt 38.
제 2 풀리(33)와 일체로 연결되어 있는 씨일샤프트(36)는 메탈씨일(34)내에서 상부 씨일플레이트(16a)만을 소정 각도로 회전시키게 된다. 따라서 상부 씨일플레이트(16a)와 카세트 플레이트(18), 그 상부의 웨이퍼카세트(50)는 회전을 하게 된다.The seal shaft 36, which is integrally connected to the second pulley 33, rotates only the upper seal plate 16a at a predetermined angle in the metal seal 34. Therefore, the upper seal plate 16a, the cassette plate 18, and the wafer cassette 50 thereon rotate.
이와 같은 상태에서 웨이퍼카세트(50)의 로딩이 완료되면, 웨이퍼카세트(50)를 엘리베이터(20)로 하여 웨이퍼 핸들링챔버(14)측으로 하강시킨다.When loading of the wafer cassette 50 is completed in such a state, the wafer cassette 50 is lowered to the wafer handling chamber 14 side by using the elevator 20.
그리고 회전수단(30)으로 하여 상부 씨일플레이트(16a)를 회전시켜 웨이퍼카세트(50)의 개방부를 웨이퍼 핸들링챔버(14)측으로 향하게 한다. 구동 방법은 위와 동일하나 구동모터(31)를 역회전시키는 것이다.The upper seal plate 16a is rotated by the rotating means 30 to direct the opening of the wafer cassette 50 toward the wafer handling chamber 14. The driving method is the same as above but the reverse rotation of the drive motor (31).
그리고 웨이퍼(W)를 프로세스 챔버로 이동시키기 위하여 웨이퍼카세트(50)의 각 슬롯마다의 위치에 맞게 엘리베이터(20)가 승하강 동작을 반복하며, 핸들러(15)로 하여 웨이퍼(W)를 로딩하게 된다. 이때, 일측면이 폐쇄된 웨이퍼카세트(50)를 사용함으로서, 웨이퍼 위치의 기준이 생기게 되므로 보다 정확한 티칭(teaching)을 할 수 있다.In order to move the wafer W into the process chamber, the elevator 20 repeats the lifting and lowering operation according to the position of each slot of the wafer cassette 50, and the handler 15 loads the wafer W. do. At this time, by using the wafer cassette 50 with one side closed, the reference of the wafer position is generated, so that more accurate teaching can be performed.
한편, 핸들러(15)의 웨이퍼(W) 로딩이 완료되면, 엘리베이터(20)의 구동으로 웨이퍼카세트(50)가 재상승하게 된다.On the other hand, when the loading of the wafer W of the handler 15 is completed, the wafer cassette 50 is driven up again by the driving of the elevator 20.
한편, 웨이퍼의 언로딩 단계도 동일한 방법으로 이루어진다.On the other hand, the unloading step of the wafer is made in the same way.
따라서 회전수단(30)은 엘리베이터(20)의 회전 구동이 가능하게 함으로서, 일측면이 폐쇄된 웨이퍼카세트(50)를 사용할 수 있게 되었으며, 이는 종래에 양측면이 개방된 웨이퍼카세트에 비하여 웨이퍼(W)의 파손이 방지된다.Therefore, the rotation means 30 enables the drive of the rotation of the elevator 20, thereby enabling the use of the wafer cassette 50 with one side closed, which is conventionally compared with the wafer cassette with both sides open. Breakage is prevented.
이상에서는 본 발명을 특정의 바람직한 실시 예에 대하여 도시하고 또한 설명하였으나, 본 발명은 상술한 실시 예에 한정되지 아니하며, 본 발명이 속하는 기술분야에서 통상의 지식을 가진 자라면 이하 청구범위에 기재된 본 발명의 요지를 벗어남이 없이 다양한 변경실시가 가능할 것이다.Although the present invention has been illustrated and described with respect to certain preferred embodiments, the present invention is not limited to the above-described embodiments, and a person skilled in the art to which the present invention pertains has the present invention set forth in the claims below. Various modifications may be made without departing from the spirit of the invention.
이상에서 설명한 바와 같이 본 발명인 로드락 챔버의 엘리베이터 회전장치 및 그 회전방법은, 승하강 이동되는 엘리베이터에 회전수단을 설치함으로서, 일측면이 폐쇄된 웨이퍼카세트의 사용으로 웨이퍼의 슬라이딩 현상이 방지되며, 웨이퍼 트랜스 로봇이나 핸들러의 조정 기준 위치를 확인 할 수 있는 효과가 있다.As described above, the elevator rotating device and the rotating method of the load lock chamber of the present invention, by installing the rotating means in the elevator to move up and down, the sliding phenomenon of the wafer is prevented by the use of a wafer cassette closed one side, It is effective to check the adjustment reference position of wafer trans robot or handler.
도 1은 종래의 기술에 따른 로드락 챔버를 개략적으로 도시한 도면이고,1 is a view schematically showing a load lock chamber according to the prior art,
도 2는 본 발명에 따른 로드락 챔버의 엘리베이터 회전장치의 구성도이고,2 is a block diagram of an elevator rotating apparatus of the load lock chamber according to the present invention,
도 3은 본 발명에 따른 로드락 챔버의 엘리베이터 회전장치의 작동도이고,3 is an operation of the elevator rotating apparatus of the load lock chamber according to the present invention,
도 4는 본 발명에 따른 로드락 챔버의 엘리베이터 회전방법을 나타낸 흐름도이다.4 is a flowchart illustrating a method of rotating the elevator of the load lock chamber according to the present invention.
＜도면의 주요부분에 대한 부호의 설명＞<Description of the code | symbol about the principal part of drawing>
10 : 로드락 챔버 12 : 로드락 도어10: load lock chamber 12: load lock door
14 : 웨이퍼 핸들링 챔버 15 : 핸들러14 wafer handling chamber 15 handler
16a, 16b : 상, 하부 씨일플레이트 18 : 카세트 플레이트16a, 16b: upper and lower seal plates 18: cassette plate
20 : 엘리베이터 22 : 샤프트20: elevator 22: shaft
30 : 회전수단 31 : 구동모터30: rotation means 31: drive motor
32, 33 : 제 1, 2 풀리 34 : 메탈씨일(metal seal)32, 33: 1st, 2nd pulley 34: metal seal
36 : 씨일샤프트 38 : 벨트36: seal shaft 38: belt
39 : 베어링 50 : 웨이퍼카세트39: bearing 50: wafer cassette
Claims (4)
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| KR1020030098765A KR20050067751A (en) | 2003-12-29 | 2003-12-29 | Elevator rotation device and rotation method of loadlock chamber |
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