KR20050044549A - 아실포스핀 및 이의 유도체의 멀티머 형태 - Google Patents

아실포스핀 및 이의 유도체의 멀티머 형태 Download PDF

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Publication number
KR20050044549A
KR20050044549A KR1020047007699A KR20047007699A KR20050044549A KR 20050044549 A KR20050044549 A KR 20050044549A KR 1020047007699 A KR1020047007699 A KR 1020047007699A KR 20047007699 A KR20047007699 A KR 20047007699A KR 20050044549 A KR20050044549 A KR 20050044549A
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KR
South Korea
Prior art keywords
alkyl
substituted
phenyl
unsubstituted
lithium
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
KR1020047007699A
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English (en)
Korean (ko)
Inventor
볼프쟝-삐에르
후크게브하르트
Original Assignee
시바 스페셜티 케미칼스 홀딩 인크.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 시바 스페셜티 케미칼스 홀딩 인크. filed Critical 시바 스페셜티 케미칼스 홀딩 인크.
Publication of KR20050044549A publication Critical patent/KR20050044549A/ko
Withdrawn legal-status Critical Current

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Classifications

    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/02Phosphorus compounds
    • C07F9/28Phosphorus compounds with one or more P—C bonds
    • C07F9/50Organo-phosphines
    • C07F9/53Organo-phosphine oxides; Organo-phosphine thioxides
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/02Phosphorus compounds
    • C07F9/28Phosphorus compounds with one or more P—C bonds
    • C07F9/50Organo-phosphines
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/02Phosphorus compounds
    • C07F9/28Phosphorus compounds with one or more P—C bonds
    • C07F9/50Organo-phosphines
    • C07F9/5036Phosphines containing the structure -C(=X)-P or NC-P
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/02Phosphorus compounds
    • C07F9/28Phosphorus compounds with one or more P—C bonds
    • C07F9/50Organo-phosphines
    • C07F9/53Organo-phosphine oxides; Organo-phosphine thioxides
    • C07F9/5337Phosphine oxides or thioxides containing the structure -C(=X)-P(=X) or NC-P(=X) (X = O, S, Se)
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/02Phosphorus compounds
    • C07F9/547Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom
    • C07F9/553Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom having one nitrogen atom as the only ring hetero atom
    • C07F9/576Six-membered rings
    • C07F9/58Pyridine rings
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/46Polymerisation initiated by wave energy or particle radiation
    • C08F2/48Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Molecular Biology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Biochemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Polymerisation Methods In General (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Cosmetics (AREA)
KR1020047007699A 2001-11-20 2002-11-13 아실포스핀 및 이의 유도체의 멀티머 형태 Withdrawn KR20050044549A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP01811113.8 2001-11-20
EP01811113 2001-11-20

Publications (1)

Publication Number Publication Date
KR20050044549A true KR20050044549A (ko) 2005-05-12

Family

ID=8184252

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020047007699A Withdrawn KR20050044549A (ko) 2001-11-20 2002-11-13 아실포스핀 및 이의 유도체의 멀티머 형태

Country Status (10)

Country Link
US (1) US7109250B2 (https=)
EP (1) EP1446410A1 (https=)
JP (1) JP2005509685A (https=)
KR (1) KR20050044549A (https=)
CN (1) CN1589276A (https=)
AU (1) AU2002366198A1 (https=)
BR (1) BR0214324A (https=)
CA (1) CA2467576A1 (https=)
MX (1) MXPA04004729A (https=)
WO (1) WO2003044030A1 (https=)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BR0312133A (pt) * 2002-06-11 2005-04-05 Ciba Sc Holding Ag Formas dìmeras e multìmeras de óxidos de monoacifosfinas e bis-acifosfinas, processo para a preparação das mesmas, bem como composição fotopolimerizável
ES2660319T3 (es) * 2003-08-29 2018-03-21 Igm Group B.V. Recubrimientos de fibra óptica
EP1814891B1 (en) * 2004-11-23 2011-01-26 Basf Se Bisacylphosphanes and their use as photoinitiators; process for preparing acylphosphanes
US7547735B1 (en) * 2006-12-04 2009-06-16 Henkel Corporation UV curable compositions
JP6445438B2 (ja) * 2012-10-01 2018-12-26 イーティーエイチ・チューリッヒ アシルホスファン類の製造方法
ES2706881T3 (es) * 2014-05-30 2019-04-01 Igm Resins Italia Srl Fotoiniciadores de óxido de acilfosfina multifuncionales
WO2017100231A1 (en) * 2015-12-08 2017-06-15 3M Innovative Properties Company Two-component self-adhesive dental composition, storage stable initiator system, and use thereof
CN105334697B (zh) * 2015-12-08 2019-10-11 深圳市华星光电技术有限公司 光刻胶组合物及彩色滤光片的制作方法
EP3409680B1 (en) * 2017-05-30 2021-01-06 IGM Group B.V. Synthesis of bis(acyl)phosphines by activation of unreactive metal phosphides

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4265723A (en) * 1979-07-06 1981-05-05 Basf Aktiengesellschaft Photocurable molding, impregnating and coating compositions
DE3034697A1 (de) * 1980-09-15 1982-05-06 Basf Ag, 6700 Ludwigshafen Acylphosphinsulfidverbindungen, ihre herstellung und verwendung
US5218009A (en) * 1989-08-04 1993-06-08 Ciba-Geigy Corporation Mono- and di-acylphosphine oxides
ES2098260T3 (es) * 1989-08-04 1997-05-01 Ciba Geigy Ag Oxidos de mono- y diacilfosfina.
TW303379B (https=) * 1994-03-02 1997-04-21 Ciba Sc Holding Ag
DE19618720A1 (de) 1995-05-12 1996-11-14 Ciba Geigy Ag Bisacyl-bisphosphine, -oxide und -sulfide
US6075065A (en) * 1996-12-20 2000-06-13 Takeda Chemical Industries, Ltd. Photocurable resin composition and a method for producing the same
KR100593519B1 (ko) * 1997-04-22 2006-06-28 코닌클리즈케 디에스엠 엔.브이. 액상 경화성 수지 조성물
JP2001200007A (ja) * 2000-01-19 2001-07-24 Shin Etsu Chem Co Ltd 光硬化性樹脂組成物及び光ファイバー用被覆材
GB2360283B (en) * 2000-02-08 2002-08-21 Ciba Sc Holding Ag Monoacylarylphosphines and acylphosphine oxides and sulphides
GB2365430B (en) * 2000-06-08 2002-08-28 Ciba Sc Holding Ag Acylphosphine photoinitiators and intermediates
US6979733B2 (en) * 2001-08-03 2005-12-27 Diversa Corporation Epoxide hydrolases, nucleic acids encoding them and methods of making and using them

Also Published As

Publication number Publication date
JP2005509685A (ja) 2005-04-14
US7109250B2 (en) 2006-09-19
BR0214324A (pt) 2004-11-03
US20050004247A1 (en) 2005-01-06
CN1589276A (zh) 2005-03-02
CA2467576A1 (en) 2003-05-30
WO2003044030A1 (en) 2003-05-30
AU2002366198A1 (en) 2003-06-10
MXPA04004729A (es) 2004-07-30
EP1446410A1 (en) 2004-08-18

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Legal Events

Date Code Title Description
PA0105 International application

Patent event date: 20040520

Patent event code: PA01051R01D

Comment text: International Patent Application

PG1501 Laying open of application
PC1203 Withdrawal of no request for examination
WITN Application deemed withdrawn, e.g. because no request for examination was filed or no examination fee was paid