MXPA04004729A - Formas multimericas de acilfosfinas y sus derivados. - Google Patents
Formas multimericas de acilfosfinas y sus derivados.Info
- Publication number
- MXPA04004729A MXPA04004729A MXPA04004729A MXPA04004729A MXPA04004729A MX PA04004729 A MXPA04004729 A MX PA04004729A MX PA04004729 A MXPA04004729 A MX PA04004729A MX PA04004729 A MXPA04004729 A MX PA04004729A MX PA04004729 A MXPA04004729 A MX PA04004729A
- Authority
- MX
- Mexico
- Prior art keywords
- unsubstituted
- substituted
- once
- nonconsecutive
- uninterrupted
- Prior art date
Links
- -1 biphenylyl Chemical group 0.000 abstract 2
- 125000004178 (C1-C4) alkyl group Chemical group 0.000 abstract 1
- 125000000229 (C1-C4)alkoxy group Chemical group 0.000 abstract 1
- 125000002373 5 membered heterocyclic group Chemical group 0.000 abstract 1
- 125000004070 6 membered heterocyclic group Chemical group 0.000 abstract 1
- 125000003118 aryl group Chemical group 0.000 abstract 1
- 150000001875 compounds Chemical class 0.000 abstract 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 abstract 1
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 abstract 1
- 229910052736 halogen Inorganic materials 0.000 abstract 1
- 125000005843 halogen group Chemical group 0.000 abstract 1
- 125000005647 linker group Chemical group 0.000 abstract 1
- 125000001624 naphthyl group Chemical group 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
- C07F9/02—Phosphorus compounds
- C07F9/28—Phosphorus compounds with one or more P—C bonds
- C07F9/50—Organo-phosphines
- C07F9/53—Organo-phosphine oxides; Organo-phosphine thioxides
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
- C07F9/02—Phosphorus compounds
- C07F9/28—Phosphorus compounds with one or more P—C bonds
- C07F9/50—Organo-phosphines
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
- C07F9/02—Phosphorus compounds
- C07F9/28—Phosphorus compounds with one or more P—C bonds
- C07F9/50—Organo-phosphines
- C07F9/5036—Phosphines containing the structure -C(=X)-P or NC-P
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
- C07F9/02—Phosphorus compounds
- C07F9/28—Phosphorus compounds with one or more P—C bonds
- C07F9/50—Organo-phosphines
- C07F9/53—Organo-phosphine oxides; Organo-phosphine thioxides
- C07F9/5337—Phosphine oxides or thioxides containing the structure -C(=X)-P(=X) or NC-P(=X) (X = O, S, Se)
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
- C07F9/02—Phosphorus compounds
- C07F9/547—Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom
- C07F9/553—Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom having one nitrogen atom as the only ring hetero atom
- C07F9/576—Six-membered rings
- C07F9/58—Pyridine rings
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- General Health & Medical Sciences (AREA)
- Molecular Biology (AREA)
- Life Sciences & Earth Sciences (AREA)
- Biochemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Inorganic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Polymerisation Methods In General (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Cosmetics (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP01811113 | 2001-11-20 | ||
| PCT/EP2002/012680 WO2003044030A1 (en) | 2001-11-20 | 2002-11-13 | Multimer forms of acylphosphines and their derivatives |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| MXPA04004729A true MXPA04004729A (es) | 2004-07-30 |
Family
ID=8184252
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| MXPA04004729A MXPA04004729A (es) | 2001-11-20 | 2002-11-13 | Formas multimericas de acilfosfinas y sus derivados. |
Country Status (10)
| Country | Link |
|---|---|
| US (1) | US7109250B2 (https=) |
| EP (1) | EP1446410A1 (https=) |
| JP (1) | JP2005509685A (https=) |
| KR (1) | KR20050044549A (https=) |
| CN (1) | CN1589276A (https=) |
| AU (1) | AU2002366198A1 (https=) |
| BR (1) | BR0214324A (https=) |
| CA (1) | CA2467576A1 (https=) |
| MX (1) | MXPA04004729A (https=) |
| WO (1) | WO2003044030A1 (https=) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| BR0312133A (pt) * | 2002-06-11 | 2005-04-05 | Ciba Sc Holding Ag | Formas dìmeras e multìmeras de óxidos de monoacifosfinas e bis-acifosfinas, processo para a preparação das mesmas, bem como composição fotopolimerizável |
| CN1842504B (zh) * | 2003-08-29 | 2010-12-08 | 西巴特殊化学品控股有限公司 | 光纤涂料 |
| CN101065388B (zh) * | 2004-11-23 | 2011-12-21 | 西巴特殊化学品控股有限公司 | 制备酰基磷烷及其衍生物的方法 |
| US7547735B1 (en) * | 2006-12-04 | 2009-06-16 | Henkel Corporation | UV curable compositions |
| ES2720760T3 (es) | 2012-10-01 | 2019-07-24 | Eth Zuerich | Un procedimiento para la preparación de acilofosfanos |
| JP6599446B2 (ja) * | 2014-05-30 | 2019-10-30 | アイジーエム レシンス イタリア ソチエタ レスポンサビリタ リミタータ | 多官能性アシルホスフィンオキシド光重合開始剤 |
| WO2017100231A1 (en) * | 2015-12-08 | 2017-06-15 | 3M Innovative Properties Company | Two-component self-adhesive dental composition, storage stable initiator system, and use thereof |
| CN105334697B (zh) * | 2015-12-08 | 2019-10-11 | 深圳市华星光电技术有限公司 | 光刻胶组合物及彩色滤光片的制作方法 |
| EP3409680B1 (en) * | 2017-05-30 | 2021-01-06 | IGM Group B.V. | Synthesis of bis(acyl)phosphines by activation of unreactive metal phosphides |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4265723A (en) * | 1979-07-06 | 1981-05-05 | Basf Aktiengesellschaft | Photocurable molding, impregnating and coating compositions |
| DE3034697A1 (de) * | 1980-09-15 | 1982-05-06 | Basf Ag, 6700 Ludwigshafen | Acylphosphinsulfidverbindungen, ihre herstellung und verwendung |
| EP0736540A3 (de) * | 1989-08-04 | 1997-06-18 | Ciba Geigy | Mono- und Diacylphosphinoxide |
| US5218009A (en) | 1989-08-04 | 1993-06-08 | Ciba-Geigy Corporation | Mono- and di-acylphosphine oxides |
| TW303379B (https=) * | 1994-03-02 | 1997-04-21 | Ciba Sc Holding Ag | |
| DE19618720A1 (de) | 1995-05-12 | 1996-11-14 | Ciba Geigy Ag | Bisacyl-bisphosphine, -oxide und -sulfide |
| US6075065A (en) * | 1996-12-20 | 2000-06-13 | Takeda Chemical Industries, Ltd. | Photocurable resin composition and a method for producing the same |
| EP0975693B2 (en) * | 1997-04-22 | 2006-01-18 | Koninklijke DSM N.V. | Liquid curable resin composition |
| JP2001200007A (ja) * | 2000-01-19 | 2001-07-24 | Shin Etsu Chem Co Ltd | 光硬化性樹脂組成物及び光ファイバー用被覆材 |
| GB2360283B (en) * | 2000-02-08 | 2002-08-21 | Ciba Sc Holding Ag | Monoacylarylphosphines and acylphosphine oxides and sulphides |
| GB2365430B (en) | 2000-06-08 | 2002-08-28 | Ciba Sc Holding Ag | Acylphosphine photoinitiators and intermediates |
| CA2456229A1 (en) * | 2001-08-03 | 2003-02-13 | Diversa Corporation | Epoxide hydrolases, nucleic acids encoding them and methods for making and using them |
-
2002
- 2002-11-13 AU AU2002366198A patent/AU2002366198A1/en not_active Abandoned
- 2002-11-13 WO PCT/EP2002/012680 patent/WO2003044030A1/en not_active Ceased
- 2002-11-13 CN CNA028229142A patent/CN1589276A/zh active Pending
- 2002-11-13 BR BR0214324-0A patent/BR0214324A/pt not_active Application Discontinuation
- 2002-11-13 US US10/495,958 patent/US7109250B2/en not_active Expired - Fee Related
- 2002-11-13 CA CA002467576A patent/CA2467576A1/en not_active Abandoned
- 2002-11-13 JP JP2003545667A patent/JP2005509685A/ja active Pending
- 2002-11-13 EP EP02790367A patent/EP1446410A1/en not_active Withdrawn
- 2002-11-13 MX MXPA04004729A patent/MXPA04004729A/es unknown
- 2002-11-13 KR KR1020047007699A patent/KR20050044549A/ko not_active Withdrawn
Also Published As
| Publication number | Publication date |
|---|---|
| EP1446410A1 (en) | 2004-08-18 |
| BR0214324A (pt) | 2004-11-03 |
| WO2003044030A1 (en) | 2003-05-30 |
| JP2005509685A (ja) | 2005-04-14 |
| CN1589276A (zh) | 2005-03-02 |
| US20050004247A1 (en) | 2005-01-06 |
| US7109250B2 (en) | 2006-09-19 |
| KR20050044549A (ko) | 2005-05-12 |
| AU2002366198A1 (en) | 2003-06-10 |
| CA2467576A1 (en) | 2003-05-30 |
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